Slow wave RF propagation line including a network of nanowires

Abstract

The instant disclosure describes a radiofrequency propagation line including a conducting strip connected to a conducting plane parallel to the plane of the conducting strip, wherein the conducting plane includes a network of nanowires made of an electrically conductive, non-magnetic material extending orthogonally to the plane of the conducting strip, in the direction of said conducting strip.

Claims

1. A radiofrequency propagation line comprising a conductive strip formed on a first insulating layer having a first thickness, h1, associated with a conductive plane parallel to the plane of said strip, wherein the conductive plane comprises a network of nanowires made of an electrically-conductive and non-magnetic material extending through a second insulating layer having a second thickness, h2, so as to contact the first insulating layer, orthogonally to the plane of the conductive strip, towards said strip, a ratio h1/h2 between the thicknesses of the first and second insulating layers being smaller than 0.05.

2. The propagation line of claim 1, wherein the second insulating layer is a ceramic layer formed on a conductive plane, the ceramic layer being itself coated with the first insulating layer.

3. The propagation line of claim 2, wherein the ceramic layer is an alumina layer.

4. The propagation line of claim 1, wherein the first thickness, h1, of the first insulating layer is in the range from 0.5 to 2 m and the network of nanowires have a length from 50 m to 1 mm.

5. The propagation line of claim 1, wherein each nanowire in the network of nanowires has a diameter from 30 to 200 nm and a spacing between the nanowires from 60 to 450 nm.

6. A radiofrequency component support comprising, under a first insulating layer having a first thickness, h1, a second insulating layer having a second thickness, h2, the second insulating layer crossed by nanowires connected to a conductive plane, a ratio h1/h2 being smaller than 0.05.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) The foregoing and other features and advantages will be discussed in detail in the following non-limiting description of specific embodiments in connection with the accompanying drawings, among which:

(2) FIG. 1, previously described, is a perspective view illustrating a prior art microstrip-type propagation line;

(3) FIG. 2, previously described, is a copy of FIG. 4a of U.S. Pat. No. 6,950,590;

(4) FIG. 3, previously described, illustrates the structure described in M. Colombe et al.'s above-mentioned article;

(5) FIG. 4 is a cross-section view of an embodiment of a slow wave microstrip-type line;

(6) FIG. 5 shows an enlargement of a portion of FIG. 4; and

(7) FIG. 6 is a curve illustrating the phase speed of a line according to physical characteristics of this line.

(8) It should be noted that generally, as usual in the representation of microelectronic components, the elements of the various drawings are not drawn to scale.

DETAILED DESCRIPTION OF THE INVENTION

(9) FIG. 4 shows an embodiment of a microstrip-type line. A conductive strip 31 is laid on a first insulating layer 33 having a thickness h1, formed on a second insulating layer 35 laid on a ground plane 37 which may be formed above a substrate 39. Insulating layer 33 may be a layer of silicon oxide or of another insulating material currently used in integrated circuit manufacturing. Layer 37 for example has a thickness from 0.5 to 2 m. Second insulating layer 35 for example is a layer of a ceramic such as alumina. Layer 35 is provided with substantially vertical cavities (in a plane orthogonal to the plane of strip line 31). The cavities are filled with nanowires 36 made of a non-magnetic conductive material, for example, copper, aluminum, silver, or gold, in electric contact with ground plane 37. Various ways to manufacture a nanowire network in an alumina membrane of variable porosity are known and may be used. According to an advantage, nanowires 36 may have a small diameter, for example, from 30 to 200 nm with an edge-to-edge distance from 60 to 450 nm. Their length, which corresponds to thickness h2 of insulating layer 35, may be in the range from 50 m to 1 mm, that is, if h1 is equal to 2.5 m, ratio h1/h2 will be in the range from 0.0025 to 0.05.

(10) FIG. 5 illustrates the shape of electric field lines E and of magnetic field lines H, when a signal is applied to line 31. For electric field E, the thickness of the insulating layer where this field spreads is limited to thickness h of layer 33, given that the ends of nanowires 36 in the interface plane between layers 33 and 35 correspond to an equipotential line at the same potential as conductive plane 37 (FIG. 4), currently the ground. Thus, the electric field does not vary below this interface between layers 33 and 35. However, from the point of view of magnetic field H, the field lines freely penetrate into second insulating material 35 without being disturbed by the nanowires, which are made of non-magnetic material.

(11) This provides again the advantage of an increase of the quality factor of the transmission line mentioned in above-mentioned U.S. Pat. No. 6,950,590. This advantage is here obtained in a simple propagation line of the type having a micro strip and a ground plane, where the micro strip may have a width of a few m only, for example, from 3 to 10 m.

(12) FIG. 6 shows the variation of phase speed V.sub.T according to ratio h1/h2. It should be noted that V.sub. remains substantially constant as long as ratio h1/h2 is greater than 0.4 but rapidly decreases as soon as h1/h2 becomes smaller than 0.2. In particular, V.sub. decreases by half as soon as h1/h2 becomes smaller than 0.05. It should be noted that such values of h1/h2, and thus of V.sub., are not suggested in M. Colombe's above-mentioned article and could not be reached with the types of substrate which are described therein.

(13) The diameter of the nanowires may be selected so that it is smaller than the skin depth of the semiconductor material forming the nanowires at the provided usage frequency. As an example, for copper, the skin depth at 60 GHz is in the order of 250 nm. It would be easy to form nanowires of smaller diameter. The smaller the diameter, the less eddy current will create in the nanowires and the smaller the losses due to the magnetic field.

(14) The present invention is likely to have many alterations and modifications which will occur to those skilled in the art. More specifically, the present invention has been described in relation with a specific embodiment relating to a strip-type propagation line. It should be noted that generally, a radiofrequency component support comprising, under a first insulating layer, a second insulating layer crossed by nanowires connected to a conductive plane, is provided for any application where it is desired to have a material having a first insulating thickness in terms of electric field distribution and a second insulating thickness greater than the first one in terms of magnetic field distribution. The second insulating layer crossed by nanowires may be air.

(15) In the described embodiment, the nanowires are vertical nanowires extending from a conductive plane. It should be noted that the nanowires are not necessarily strictly vertical but may extend along porosities of a layer of a selected material, for example, a ceramic, the important point being to have an electric continuity between the end of the nanowires in contact with the conductive plane and their end located at the upper level of insulating layer 35 (FIG. 4).