Arrangement and lithography apparatus with arrangement

Abstract

An arrangement for a lithography apparatus has a component and a weight compensating device to compensate for a weight of the component. The weight compensating device includes a first magnetic device and a second magnetic device. The first magnetic device is designed to exert a first magnetic force on the component. The first magnetic force exceeds the weight of the component. The first magnetic force acts counter to the weight of the component. The second magnetic device is designed to exert a second magnetic force on the component. The second magnetic force acts in the direction of the weight of the component. The first magnetic force corresponds to the sum of the second magnetic force and the weight. The second magnetic device is designed to reduce the second magnetic force at the same time and by the same absolute value as the first magnetic force.

Claims

1. An arrangement, comprising: a component having a weight, and a weight compensating device configured to compensate the weight of the component, the weight compensating device comprising first and second magnetic devices, wherein: the first magnetic device is configured to exert a first magnetic force on the component; the first magnetic force acts to counter the weight of the component; the second magnetic device is configured to exert a second magnetic force on the component; the second magnetic force acts in a direction of the weight of the component; the first magnetic force is the sum of the second magnetic force and the weight of the component; the second magnetic device is configured so that, during use of the arrangement when the first magnetic force changes by an absolute value, the second magnetic force changes: a) at the same time that the first magnetic force changes; and b) by the same absolute value as the change in the first magnetic force; and the arrangement is a lithography arrangement.

2. The arrangement of claim 1, wherein: the first magnetic device comprises first and second elements; the first element comprises a material selected from the group consisting of magnetic materials and magnetisable materials; the second element comprises a material selected from the group consisting of magnetic materials and magnetisable materials; and the first and second elements are configured to exert a magnetic force on each other.

3. The arrangement of claim 2, wherein at least of the following holds: the first element comprises a permanent magnet; and the second element comprises a permanent magnet.

4. The arrangement of claim 2, further comprising first and second supporting devices, wherein: a first member selected is connected to the component; a second member is connected to a supporting element selected from the group consisting of the first supporting element and the second supporting element; the first member is selected from the group consisting of the first element and the second element; the second member is selected from the group consisting of the first element and the second element; and the first member is different from the second member.

5. The arrangement of claim 4, wherein at least one of the following holds: the first supporting device is a holding frame; and the second supporting device is a supporting frame.

6. The arrangement of claim 2, wherein a distance between the first and second elements is adjustable.

7. The arrangement of claim 2, wherein: the second magnetic device comprises third and fourth elements; the third element comprises a material selected from the group consisting of magnetic materials and magnetizable materials; the fourth element comprises a material selected from the group consisting of magnetic materials and magnetizable materials; and the third and fourth elements are configured to exert a magnetic force on each other.

8. The arrangement of claim 7, wherein at least one of the following holds: the third element comprises a permanent magnet; and the fourth element comprises a permanent magnet.

9. The arrangement of claim 7, further comprising first and second supporting devices, wherein: a first member selected is connected to the component; a second member is connected to a supporting element selected from the group consisting of the first supporting element and the second supporting element; the first member is selected from the group consisting of the third element and the fourth element; the second member is selected from the group consisting of the third element and the fourth element; and the first member is different from the second member.

10. The arrangement of claim 7, wherein a distance between the third and fourth elements is adjustable.

11. The arrangement of claim 2, further comprising an actuator configured to position the component by exerting a magnetic force on at least one element selected from the group consisting of the first element, the second element, the third element and the fourth element.

12. The arrangement of claim 1, wherein: the first magnetic device comprises at least one permanent magnet; the second magnetic device comprises at least one permanent magnet; and the arrangement is configured so that, during use of the arrangement, a first percentage loss of a magnetic force per unit of time of the at least one permanent magnet of the first magnetic device is different from a second percentage loss of a magnetic force per unit of time of at least one permanent magnet of the second magnetic device so that the first magnetic force of the first magnetic device and the second magnetic force of the second magnetic device decrease by the same absolute value and at the same time.

13. The arrangement of claim 12, wherein: the first percentage loss is less than the second percentage loss; the first magnetic force is greater than the second magnetic force; and the first magnetic force and second magnetic force decrease by the same absolute value and at the same time.

14. The arrangement of claim 1, wherein: the first magnetic device comprises a first permanent magnet comprising a first material; and the first magnetic device comprises a first permanent magnet comprising a second material which is different from the first material.

15. The arrangement of claim 1, wherein the component is between the first and second magnetic devices.

16. The arrangement of claim 1, wherein: the first magnetic device is beneath the component to press the first magnetic force on the component; and the second magnetic device is above the component to press the second magnetic force on the component.

17. The arrangement of claim 1, wherein: the first magnetic device is above the component to pull the first magnetic force on the component; and the second magnetic device is beneath the component to pull the second magnetic force on the component.

18. The arrangement of claim 1, further comprising a plurality of first magnetic device and a plurality of second magnetic devices.

19. The arrangement of claim 18, wherein the second magnetic devices are configured to reduce a sum of the second magnetic forces at the same time and by the same absolute value as a sum of the first magnetic forces.

20. The arrangement of claim 1, wherein the component comprises a holding frame for an optical element.

21. The arrangement of claim 1, wherein the optical element comprises a mirror or a lens.

22. The arrangement of claim 1, wherein: the second magnetic device comprises first and second elements; the first element comprises a material selected from the group consisting of magnetic materials and magnetizable materials; the second element comprises a material selected from the group consisting of magnetic materials and magnetizable materials; and the first and second elements are configured to exert a magnetic force on each other.

23. An apparatus, comprising: an illumination system; a projection system; and an arrangement according to claim 1, wherein the apparatus is a lithography apparatus.

24. The apparatus of claim 23, wherein the illumination system comprises the arrangement.

25. The apparatus of claim 23, wherein the projection system comprises the arrangement.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) Further advantageous configurations and aspects of the disclosure are the subject of the subclaims and also of the exemplary embodiments of the disclosure described below. In the text that follows, the disclosure is explained in more detail on the basis of preferred embodiments with reference to the accompanying figures.

(2) FIG. 1 shows a schematic view of an EUV lithography apparatus;

(3) FIG. 2 shows a schematic view of an arrangement according to an exemplary embodiment;

(4) FIG. 3 shows the arrangement from FIG. 2 with aged permanent magnets;

(5) FIG. 4 shows the absolute values for the difference in the first magnetic force and the second magnetic force of the first and second magnetic devices represented in FIGS. 2 and 3, over time;

(6) FIG. 5 shows a schematic view of a further exemplary embodiment of an arrangement;

(7) FIG. 6 shows the arrangement from FIG. 5 with aged permanent magnets;

(8) FIG. 7 shows a schematic view of a further exemplary embodiment of an arrangement;

(9) FIG. 8 shows the arrangement from FIG. 7 with aged permanent magnets;

(10) FIG. 9 shows a schematic view of a further exemplary embodiment of an arrangement; and

(11) FIG. 10 shows a schematic view of a further exemplary embodiment of an arrangement.

DESCRIPTION OF EXEMPLARY EMBODIMENTS

(12) Unless otherwise indicated, the same reference numerals in the figures designate elements that are the same or functionally the same. It should also be noted that the representations in the figures are not necessarily to scale. It should be explicitly pointed out at this stage that particularly the forces indicated (in newtons) in the text and in the figures are given purely by way of example and are not in any way to be understood as restrictive. The specific figures indicated are intended merely to serve for easier understanding of the specific exemplary embodiment.

(13) FIG. 1 shows a schematic view of an EUV lithography apparatus 100 according to one embodiment, which includes a beam shaping system 102, an illumination system 104 and a projection system 106. The beam shaping system 102, the illumination system 104 and the projection system 106 are respectively provided in a vacuum housing, which is evacuated with the aid of an evacuation device that is not represented any more specifically. The vacuum housings are surrounded by a machine room (not represented any more specifically), in which the drive devices for mechanically moving or adjusting the optical elements are provided. Electrical controllers and the like may also be provided in this machine room.

(14) The beam shaping system 102 has an EUV light source 108, a collimator 110 and a monochromator 112. A plasma source or a synchrotron, which emit radiation in the EUV range (extreme ultraviolet range), that is to say for example in the wavelength range from 0.1 nm to 30 nm, may be provided for example as the EUV light source 108. The radiation emitted by the EUV light source 108 is first focused by the collimator 110, after which the desired operating wavelength is filtered out by the monochromator 112. Consequently, the beam shaping system 102 adapts the wavelength and the spatial distribution of the light emitted by the EUV light source 108. The EUV radiation 114 generated by the EUV light source 108 has a relatively low transmissivity through air, for which reason the beam guiding spaces in the beam shaping system 102, in the illumination system 104 and in the projection system 106 are evacuated.

(15) In the example represented, the illumination system 104 has a first mirror 116 and a second mirror 118. These mirrors 116, 118 may for example be formed as facet mirrors for pupil shaping and conduct the EUV radiation 114 to a photomask 120.

(16) The photomask 120 is likewise formed as a reflective optical element and may be arranged outside the systems 102, 104, 106. The photomask 120 has a structure, a reduced image of which is depicted on a wafer 122 or the like via the projection system 106. For this purpose, the projection system 106 has in the beam guiding space for example a third mirror 124 and a fourth mirror 126. It should be noted that the number of mirrors of the EUV lithography apparatus 100 is not restricted to the number represented, and it is also possible for more mirrors or fewer mirrors to be provided. Furthermore, the mirrors are generally curved on their front side for beam shaping.

(17) An arrangement 200 for an EUV lithography apparatus 100 is described below by way of example for the fourth mirror 126 (hereinafter just mirror 126). The arrangement 200 may however also be used in the case of all the other mirrors of the EUV lithography apparatus 100. Furthermore, the arrangement 200 may also be provided for other components of a lithography apparatus. This applies in particular to lenses, the mounting of the photomask 120 or the mounting of the wafer 122.

(18) FIG. 2 shows a schematic view of an arrangement 200 according to an exemplary embodiment. The arrangement 200 has a mirror 126 and a weight compensating device 202. The weight compensating device 202 for its part includes a first magnetic device 204 and a second magnetic device 206. The first magnetic device 204 represented shows a first element 208, which has a first permanent magnet 210, and a second element 212, which has a second permanent magnet 214. The second magnetic device 206 represented shows a third element 216, which has a third permanent magnet 218, and a fourth element 220, which has a fourth permanent magnet 222.

(19) The first permanent magnet 210 and the second permanent magnet 214 of the first magnetic device 204 are at a distance 224 from one another, while the third permanent magnet 218 and the fourth permanent magnet 222 of the second magnetic device 206 are at a distance 226 from one another. The first permanent magnet 210 of the first magnetic device 204 is connected to a first supporting device 228, the second permanent magnet 214 of the first magnetic device 204 is connected to the mirror 126 on a first side 230, the third permanent magnet 218 of the second magnetic device 206 is connected to the mirror 126 on a second side 232, and the fourth permanent magnet 222 of the second magnetic device 206 is connected to a second supporting device 234. In this case, the first supporting device 228 and/or the second supporting device 234 may be a supporting frame (force frame) of the lithography apparatus 100. The mirror 126 shown in FIG. 2 has on its second side 232 an optically effective surface 236.

(20) The permanent magnets 210, 214, 218, 222 have a magnetic south pole S and a magnetic north pole N. The magnetic north poles N of the first permanent magnet 210 and of the second permanent magnet 214 point toward one another. Similarly, the magnetic north poles of the third permanent magnet 218 and of the fourth permanent magnet 222 point toward one another. As a result, the first permanent magnet 210 and the second permanent magnet 214 exert a repellent magnetic force on one another, just like the third permanent magnet 218 and the fourth permanent magnet 222. As a consequence, the second permanent magnet 214 of the first magnetic device 204 presses with a first magnetic force F.sub.1 onto the first side 230 of the mirror 126 and the third permanent magnet 218 of the second magnetic device 206 presses with a second magnetic force F.sub.2 onto the second side 232 of the mirror 126.

(21) The first magnetic force F.sub.1 of the first magnetic device 204 exceeds the weight F.sub.G of the mirror 126 and acts counter to the weight F.sub.G of the mirror 126. The second magnetic force F.sub.2 of the second magnetic device 206 acts in the direction of the weight F.sub.G of the mirror 126. In this case, the first magnetic force F.sub.1 corresponds to the sum of the second magnetic force F.sub.2 and the weight F.sub.G. In this case, the second magnetic device 206 reduces the second magnetic force F.sub.2 at the same time and by the same absolute value as the first magnetic force

(22) The fact that the first magnetic force F.sub.1 corresponds to the sum of the second magnetic force F.sub.2 and the weight F.sub.G, means that the mirror 126 can be kept in balance by the weight compensating device 202 . No additional force is necessary for the mounting of the mirror 126. The fact that the second magnetic force F.sub.2 is reduced at the same time and by the same absolute value as the first magnetic force F.sub.1 means that the first magnetic force F.sub.1 corresponds at all times to the sum of the second magnetic force F.sub.2 and the weight F.sub.G. Compensation for the weight F.sub.G is consequently ensured at all times.

(23) FIG. 2 shows the arrangement 200 at a first point in time t.sub.1. The first magnetic force F.sub.1a at the first point in time t.sub.1 is 1000 N, the second magnetic force F.sub.1a at the first point in time t.sub.1 is 100 N and the weight F.sub.G is 900 N. Because 1000 N100 N=900 N, the resultant force on the mirror 126 at the first point in time t.sub.1 is therefore zero.

(24) FIG. 3 shows the arrangement 200 from FIG. 2 with aged permanent magnets 210, 214, 218, 222 at a second point in time t.sub.2. The permanent magnets 210, 214, 218, 222 may lose magnetic force over time. The second point in time t.sub.2 is for example seven years later than the second point in time t.sub.1. The first magnetic force Fib at the second point in time t.sub.2 is 995 N, the second magnetic force Feb at the second point in time t.sub.2 is 95 N and the weight F.sub.G is 900 N. Because 995 N95 N=900 N, the resultant force on the mirror 126 at the point in time t.sub.2 is therefore also zero. The permanent magnets 218, 222 of the second magnetic device 206 have accordingly lost 5% of magnetic force F.sub.2, while the permanent magnets 210, 214 of the first magnetic device 204 have only lost 0.5% of magnetic force

(25) FIG. 4 shows the absolute values for the difference F.sub.1 and F.sub.2 in the first magnetic force F.sub.1 and the second magnetic force F.sub.2 of the first and second magnetic devices 204, 206 represented in FIGS. 2 and 3, over time. The variation from the first point in time t.sub.1 to the second point in time t.sub.2 is represented. The first magnetic force F.sub.1 and the second magnetic force F.sub.2 decrease over time. Therefore, the absolute values for the difference F.sub.1 and F.sub.2 over time increase. It can be seen that the absolute value for the difference F.sub.1 in the first magnetic force F.sub.1 increases at the same time as the absolute value for the difference F.sub.2 in the second magnetic force F.sub.2. As a result, the second magnetic force F.sub.2 is reduced at the same time and by the same absolute value as the first magnetic force F.sub.1.

(26) The changes F.sub.1, F.sub.2 shown in FIG. 4 are linear. Alternatively, the changes F.sub.1, F.sub.2 may also follow a non-linear progression.

(27) A first percentage loss of the magnetic force F.sub.1 per unit of time of at least one permanent magnet 210, 214 of the first magnetic device 204 is different from a second percentage loss of the magnetic force F.sub.2 per unit of time of at least one permanent magnet 218, 222 of the second magnetic device 206. In this case, the first percentage loss is less than the second percentage loss. Furthermore, the first magnetic force F.sub.1 is greater than the second magnetic force F.sub.2. In this way, the first magnetic force F.sub.1 and the second magnetic force F.sub.2 may decrease with the same absolute value and at the same time.

(28) The first magnetic force F.sub.1 is greater than the second magnetic force F.sub.2, so that a smaller percentage decrease in the first magnetic force F.sub.1 in comparison with the second magnetic force F.sub.2 leads to a decrease of the same absolute value in the first magnetic force F.sub.1 and the second magnetic force F.sub.2. At all times, the sum of the second magnetic force F.sub.2 and the weight F.sub.G of the mirror 126 therefore corresponds to the first magnetic force F.sub.1. In any event, the demagnetization curve of at least one permanent magnet 210, 214 of the first magnetic device 204 and the demagnetization curve of at least one permanent magnet 218, 222 of the second magnetic device 206 are made to match one another in such a way that the first magnetic force F.sub.1 and the second magnetic force F.sub.2 decrease by the same absolute value and at the same time. In order to achieve this, at least one permanent magnet 210, 214 of the first magnetic device 204 includes a different material than at least one permanent magnet 218, 222 of the second magnetic device 206.

(29) In one exemplary embodiment, a permanent magnet 210, 214 of the first magnetic device 204 may include samarium cobalt (Sm.sub.2Co.sub.17). In this case, a permanent magnet 218, 222 of the second magnetic device 206 may include neodymium iron boron (Nd.sub.2Fe.sub.14B). Alternatively or in addition, a permanent magnet 218, 222 of the second magnetic device 206 may include a ferrite. Ferrites are ferrimagnetic ceramic materials which, in a certain composition, have magnetically hard properties.

(30) The demagnetization curve of at least one permanent magnet 210, 214 of the first magnetic device 204 and the demagnetization curve of at least one permanent magnet 218, 222 of the second magnetic device 206 are made to match one another. At the same time, the demagnetization curves are influenced by a series of factors. Such factors are for example the aging of the materials, the temperature dependence of the materials and the magnetization process of the materials. Furthermore, the form of the magnet may have an influence on the demagnetization curve. In particular, external electromagnetic fields also influence the demagnetization curve of a material. The materials are chosen such that the first magnetic force F.sub.1 can at all times correspond as equal to the sum of the second magnetic force F.sub.2 and the weight F.sub.G.

(31) FIG. 5 shows a schematic view of a further exemplary embodiment of an arrangement 200. By contrast with the exemplary embodiment from FIG. 2 and FIG. 3, in the arrangement 200 from FIG. 5 the first magnetic device 204 is arranged above the mirror 126. The second magnetic device 206 is arranged underneath the mirror 126.

(32) Furthermore, the magnetic north pole N of the first permanent magnet 210 is aligned in the direction of the magnetic south pole S of the second permanent magnet 214, so that the first permanent magnet 210 and the second permanent magnet 214 attract one another. Furthermore, the magnetic north pole N of the fourth permanent magnet 222 is aligned in the direction of the magnetic south pole S of the third permanent magnet 218, so that the fourth permanent magnet 222 and the third permanent magnet 218 attract one another. Accordingly, the first magnetic device 204 pulls on the mirror 126 counter to the direction of the weight F.sub.G with a first magnetic force F.sub.1. Furthermore, the second magnetic device 206 pulls on the mirror 126 in the direction of the weight F.sub.G with a second magnetic force F.sub.2.

(33) FIG. 5 shows the arrangement 200 at a first point in time t.sub.1. The first magnetic force F.sub.1a at the first point in time t.sub.1, which is pulling on the mirror 126, is 1000 N, the second magnetic force F2a at the first point in time t.sub.1, which is pulling on the mirror 126, is 100 N and the weight F.sub.G is 900 N. Because 1000 N100 N=900 N, the resultant force on the mirror 126 at the first point in time t.sub.1 is therefore zero.

(34) FIG. 6 shows the arrangement 200 from FIG. 5 with aged permanent magnets 210, 214, 218, 222 at a second point in time t.sub.2. The second point in time t.sub.2 is for example seven years later than the first point in time t.sub.1. The permanent magnets 218, 222 of the second magnetic device 206 have in this time lost 5% of magnetic force F.sub.2, while the permanent magnets 210, 214 of the first magnetic device 204 have in this time only lost 0.5% of magnetic force F.sub.1. The first magnetic force Fib at the second point in time t.sub.2, which is pulling on the mirror 126, is therefore 995 N, the second magnetic force Feb at the second point in time t.sub.2, which is pulling on the mirror 126, is therefore 95 N and the weight F.sub.G is 900 N. Because 995 N95 N=900 N, the resultant force on the mirror 126 also at the second point in time t.sub.2 is zero. The second magnetic force F.sub.2 is consequently reduced at the same time and by the same absolute value as the first magnetic force F.sub.1.

(35) FIG. 7 shows a schematic view of a further exemplary embodiment of an arrangement 200. In principle, the first magnetic device 204 and the second magnetic device 206 may be divided into any number of first and second magnetic devices 204, 206. By contrast with the exemplary embodiment from FIG. 2 and FIG. 3, in the arrangement 200 from FIG. 7 two first magnetic devices 204 and two second magnetic devices 206 are provided. In the arrangement 200 represented in FIG. 7, the optically effective surface 236 of the mirror 126 is provided between the two second magnetic devices 206.

(36) FIG. 7 shows the arrangement 200 at a first point in time t.sub.1. The first magnetic forces F.sub.1a at the first point in time t.sub.1 are respectively 500 N, the second magnetic forces F.sub.2a at the first point in time t.sub.1 are respectively 50 N and the weight F.sub.G is 900 N. Because 2*500 N2*50 N=900 N, the resultant force on the mirror 126 at the first point in time t.sub.1 is therefore zero.

(37) FIG. 8 shows the arrangement 200 from FIG. 7 with aged permanent magnets 210, 214, 218, 222 at a second point in time t.sub.2. The second point in time t.sub.2 is for example seven years later than the first point in time t.sub.1. The permanent magnets 218, 222 of the second magnetic device 206 have in this time lost 5% of magnetic force F.sub.2, while the permanent magnets 210, 214 of the first magnetic device 204 have in this time only lost 0.5% of magnetic force F.sub.1. The first magnetic forces F.sub.1b at the second point in time t.sub.2 are therefore respectively 497.5 N, the second magnetic forces F.sub.2b at the second point in time t.sub.2 are therefore respectively 47.5 N and the weight F.sub.G is 900 N. Because 2*497.5 N2*47.5 N=900 N, the resultant force on the mirror 126 at the second point in time t.sub.2 is also zero. The second magnetic forces F.sub.2 are consequently reduced at the same time and by the same absolute value as the first magnetic forces F.sub.1.

(38) In the exemplary embodiment represented in FIGS. 7 and 8, the respective first magnetic devices 204 have the same first magnetic forces F.sub.1 and the respective second magnetic devices 206 likewise have the same magnetic forces F.sub.2. Alternatively, it is sufficient if the second magnetic devices 206 reduce a sum of the second magnetic forces F.sub.2 at the same time and by the same absolute value as a sum of the first magnetic forces F.sub.1.

(39) FIG. 9 shows a schematic view of a further exemplary embodiment of an arrangement 200. By contrast with the exemplary embodiment from FIG. 5 and FIG. 6, in the arrangement 200 from FIG. 9 a magnetizable material 900, for example iron, is arranged instead of the fourth permanent magnet 222. The third permanent magnet 218 and the magnetizable material 900 may exert an attractive magnetic force on one another, the material 900 being magnetized via the permanent magnet 218. The second magnetic device 206 can consequently pull on the mirror 126 with a second magnetic force F.sub.2.

(40) By analogy with the embodiment according to FIGS. 5 and 6, in the first magnetic device 204 according to FIG. 9 the first permanent magnet 210 and/or the second permanent magnet 214 lose magnetic force. In the case of the second magnetic device 206, only the third permanent magnet 218 loses magnetic force; the fourth element 220 does not have a permanent magnet, and therefore also does not lose force over time. Here, too, the first magnetic force F.sub.1 is equal to the sum of the second magnetic force F.sub.2 and the weight F.sub.G, the first magnetic force F.sub.1 and the second magnetic force F.sub.2 being reduced at the same time and by the same absolute value.

(41) The arrangement 200 may have an actuator 902. By contrast with the weight compensating device 202, which provides passive weight compensation and positioning of the mirror 126, the actuator 902 serves for actively controlling the position of the mirror 126 in the vertical direction Z.

(42) The actuator 902 may in turn include a coil 904, which is arranged around the first permanent magnet 210. The coil 904 can exert a magnetic force on the second permanent magnet 214. This allows the mirror 126 to be positioned via the actuator 902.

(43) In principle, distances 224, 226 between the permanent magnets 210, 214, 218, 222 and/or the magnetizable material 900 are dictated by the geometry of the arrangement 200, by the mass of the elements involved and by the magnetic forces of the permanent magnets 210, 214, 218, 222. Alternatively, the first supporting device 228 and/or the second supporting device 234 may be moved in the vertical direction Z. In this way, the distance 224 between the first element 208 and the second element 212 of the first magnetic device 204 and the distance 226 between the third element 216 and the fourth element 220 of the second magnetic device 206 can be influenced.

(44) FIG. 10 shows a schematic view of a further exemplary embodiment of an arrangement 200. The arrangement 200 has a component 126 and a weight compensating device 202. The weight compensating device 202 is constructed rotationally symmetrical with respect to an axis 1000. Furthermore, the weight compensating device 202 has a tube 1002, connecting elements 1004 and a housing 1006. The tube 1002 of the weight compensating device 202 extends along the axis 1000. In this case, the tube 1002 is connected to the housing 1006 by way of the connecting elements 1004, so that it is guided in a constrained manner along the axis 1000. The direction of the axis 1000 is likewise the direction in which the weight compensating device 202 exerts the compensating force on the mirror 126 in order to hold it. The weight compensating device 202 shown has a first magnetic device 204 and a second magnetic device 206.

(45) The first magnetic device 204 includes three permanent magnet rings 1008, 1010, 1012. A first outer permanent magnet ring 1012 is connected to the housing 1006. A first inner permanent magnet ring 1008 and a second inner permanent magnet ring 1010 are connected to the tube 1002. The first inner permanent magnet ring 1008 and the second inner permanent magnet ring 1010 are magnetized in the direction of the axis 1000. By contrast with this, the first outer permanent magnet ring 1012 is magnetized radially with respect to the axis 1000.

(46) The second magnetic device 206 includes two permanent magnet rings 1014, 1016. A second outer permanent magnet ring 1016 is connected to the housing 1006. A third inner permanent magnet ring 1014 is connected to the tube 1002.

(47) Furthermore, the first magnetic device 204 is designed to exert on the mirror 126 a first magnetic force F.sub.1, which exceeds the weight F.sub.G of the mirror 126 and acts counter to the weight F.sub.G of the mirror 126. The second magnetic device 206 is designed to exert on the mirror 126 a second magnetic force F.sub.2 that acts in the direction of the weight F.sub.G of the mirror 126 (i.e. to pull on the mirror 126). In this case, the first magnetic force F.sub.1 is equal to the sum of the second magnetic force F.sub.2 and the weight F.sub.G. Furthermore, the second magnetic device 206 is designed to reduce the second magnetic force F.sub.2 at the same time and by the same absolute value as the first magnetic force F.sub.1.

(48) The tube 1002 is connected to the mirror 126, in order to exert the compensating force on the mirror 126. This connection by way of a coupling device 1018 assigned to the weight compensating device 202 is only indicated schematically in FIG. 10. The coupling device 1018 mounts the mirror 126 freely movably in a plane perpendicular to the axis 1000. In the direction of the weight F.sub.G, i.e. in the direction of the axis 1000, on the other hand, the mirror 126 is held by the weight compensating device 202.

(49) Furthermore, FIG. 10 shows a first actuator 1020 and a second actuator 1022. The actuators 1020, 1022so-called Lorentz actuatorsserve for positioning the mirror 126 by way of the tube 1002.

(50) The first actuator 1020 is formed by a first coil 1024 and the second inner permanent magnet ring 1010. The first coil 1024 of the first actuator 1020 is arranged circumferentially with respect to the axis 1000. The magnetic field of the first coil 1024 of the first actuator 1020 exerts a force on the second inner permanent magnet ring 1010, which is connected to the tube 1002. As a result, the force is transferred to the tube 1002. The first coil 1024 of the first actuator 1020 is connected to the housing 1006.

(51) The second actuator 1022 is formed by a second coil 1026 and the first inner permanent magnet ring 1008. The second coil 1026 of the second actuator 1022 is likewise arranged circumferentially with respect to the axis 1000. The magnetic field of the second coil 1026 of the second actuator 1022 exerts a force on the first inner permanent magnet ring 1008, which is connected to the tube 1002. As a result, the force is transferred to the tube 1002. The second coil 1026 of the second actuator 1022 is connected to the housing 1006. The first coil 1024 of the first actuator 1020 is arranged above the outer permanent magnet ring 1012. By contrast, the second coil 1026 of the second actuator 1022 is arranged underneath the outer permanent magnet ring 1012.

(52) In FIG. 10, the direction of the electrical current is represented for the coils 1024, 1026. The symbols (out of the plane toward the viewer) and (into the plane away from the viewer) are used.

(53) Various arrangements 200 have been explained on the basis of the mirror 126 of the EUV lithography apparatus 100. However, the configurations represented may of course also be applied to any other mirror of the EUV lithography apparatus 100.

(54) Furthermore, exemplary embodiments of an arrangement 200 in an EUV lithography apparatus 100 have been explained. The lithography apparatus does not have to be an EUV lithography apparatus 100. Light of another wavelength (for example 193 nm via an ArF excimer laser) may also be used. Furthermore, lenses may also be used instead of the mirrors mentioned.

(55) Although the disclosure has been described on the basis of various exemplary embodiments, it is not in any way restricted to them but may be modified in a wide variety of ways.

LIST OF REFERENCE SIGNS

(56) 100 EUV lithography apparatus 102 beam shaping system 104 illumination system 106 projection system 108 EUV light source 110 collimator 112 monochromator 114 EUV radiation 116 first mirror 118 second mirror 120 photo mask 122 wafer 124 third mirror 126 fourth mirror 200 arrangement 202 weight compensating device 204 first magnetic device 206 second magnetic device 208 first element 210 first permanent magnet 212 second element 214 second permanent magnet 216 third element 218 third permanent magnet 220 fourth element 222 fourth permanent magnet 224 distance 226 distance 228 first supporting device 230 first side of the mirror 232 second side of the mirror 234 second supporting device 236 optically effective surface 900 magnetizable material 902 actuator 904 coil 1000 axis 1002 tube 1004 connecting element 1006 housing 1008 first inner permanent magnet ring 1010 second inner permanent magnet ring 1012 first outer permanent magnet ring 1014 third inner permanent magnet ring 1016 second outer permanent magnet ring 1018 coupling device 1020 first actuator 1022 second actuator 1024 first coil 1026 second coil t.sub.1 first point in time t.sub.2 second point in time F.sub.G weight F.sub.1 first magnetic force F.sub.1a first magnetic force at the first point in time F.sub.1b first magnetic force at the second point in time F.sub.2 second magnetic force F.sub.2a second magnetic force at the first point in time F.sub.2b second magnetic force at the second point in time F absolute value for the difference in a magnetic force F.sub.1 absolute value for the difference in the first magnetic force F.sub.2 absolute value for the difference in the second magnetic force S magnetic south pole N magnetic north pole Z vertical direction