Sliding member and sliding machine

Abstract

The sliding member according to the present invention includes: a base material; and a sliding film that covers a surface of the base material and constitutes a sliding surface, and is used under a wet condition where lubricant oil exists. The sliding film according to the present invention is a laminated film that includes: an underlying layer formed on the surface of the base material; and an outermost layer formed at least on a part of the underlying layer. This outermost layer is characterized by including specific boron-containing amorphous carbon (specific B-DLC) that contains 4-50% B and 5-50% H when the outermost layer as a whole is 100 at %. This specific B-DLC itself wears away during the sliding to smooth the sliding surface, and an excellent low friction property is exhibited. The underlying layer of the specific B-DLC contributes to improvement in the wear resistance property of the sliding film.

Claims

1. A sliding member comprising: a base material; and a sliding film that covers a surface of the base material and constitutes a sliding surface, the sliding member being used under a wet condition where lubricant oil exists, the sliding film comprising a laminated film, the laminated film comprising: an underlying layer formed on the surface of the base material; and an outermost layer formed at least on a part of the underlying layer, the outermost layer comprising specific boron-containing amorphous carbon (referred hereinafter to as a specific B-DLC), the specific B-DLC containing 4-50 at % (referred simply to as %) boron (B) and 26-50% hydrogen (H) when the outermost layer as a whole is 100%, the sliding member having a layer thickness ratio (T1/R2) of 3-200, wherein the layer thickness ratio (T1/R2) is defined as a ratio of a layer thickness (T1) of the outermost layer to a surface roughness (R2) based on an arithmetic average roughness (Ra) of the underlying layer.

2. The sliding member as recited in claim 1, wherein the layer thickness ratio is 5.8-37.5.

3. The sliding member as recited in claim 2, wherein the layer thickness ratio is 12.6-23.3.

4. The sliding member as recited in claim 1, wherein the outermost layer comprises a specific B-DLC that contains 23-50% B when the outermost layer as a whole is 100%.

5. The sliding member as recited in claim 1, wherein the underlying layer comprises nitride, carbide or hard amorphous carbon harder than the outermost layer.

6. The sliding member as recited in claim 5, wherein the hard amorphous carbon of the underlying layer is silicon-containing amorphous carbon (referred hereinafter to as a Si-DLC) that contains silicon (Si).

7. The sliding member as recited in claim 1, wherein the surface roughness of the underlying layer is 0.1 micrometers or more as the Ra.

8. A sliding machine comprising: a pair of sliding members having sliding surfaces that face each other and can relatively move; and lubricant oil that can be interposed between the sliding surfaces facing each other, at least one of the sliding members comprising the sliding member as recited in claim 1.

Description

BRIEF DESCRIPTION OF DRAWINGS

(1) FIG. 1A is an explanatory view illustrating the vicinity of a sliding surface (laminated film).

(2) FIG. 1B is an explanatory view illustrating a case in which the layer thickness of an outermost layer is sufficient for the surface roughness of an underlying layer.

(3) FIG. 1C is an explanatory view illustrating a case in which the layer thickness of an outermost layer is insufficient for the surface roughness of an underlying layer.

(4) FIG. 2 is a schematic view illustrating a film forming apparatus.

(5) FIG. 3 is an explanatory view illustrating an aspect of a ring-on-block friction test.

(6) FIG. 4 is a bar graph illustrating the friction coefficient of each sample with the wear depth.

(7) FIG. 5A is a dispersion diagram illustrating a relationship between the initial surface roughness and the friction coefficient at sliding surfaces.

(8) FIG. 5B is a dispersion diagram illustrating a relationship between the initial surface roughness and the wear depth at sliding surfaces.

(9) FIG. 6 is a set of microscope photographs obtained by observing the sliding surface of each sample.

(10) FIG. 7 is a diagram illustrating the sliding surface of Sample 1 after friction test.

(11) FIG. 8 is a diagram illustrating the sliding surface of Sample 2 after friction test.

(12) FIG. 9 is a diagram illustrating the sliding surface of Sample 3 after friction test.

(13) FIG. 10 is a diagram illustrating the sliding surface of Sample 4 after friction test.

(14) FIG. 11 is a diagram illustrating the sliding surface of Sample C4 after friction test.

(15) FIG. 12 is a dispersion diagram illustrating a relationship between the layer thickness ratio and the friction coefficient at sliding surfaces.

(16) FIG. 13 is a diagram illustrating the sliding surface of Sample 5 after friction test.

(17) FIG. 14 is a diagram illustrating the sliding surface of Sample 6 after friction test.

DESCRIPTION OF EMBODIMENTS

(18) The present invention will be described in more detail with reference to embodiments of the present invention. One or more features freely selected from the description herein may be added to the above-described features of the present invention. The contents described herein can be applied not only to the sliding member and the sliding machine of the present invention but to a method of manufacturing them. Features regarding the manufacturing method, when understood as a product-by-process, may also be features regarding a product. Which embodiment is the best or not may be different in accordance with objectives, required performance and other factors.

(19) <<Outermost Layer>>

(20) (1) The outermost layer according to the present invention comprises a specific B-DLC (film). It is preferred that the specific B-DLC contains 4-50% B in an embodiment, or 23-50% B in another embodiment, or 24-40% B in still another embodiment, or 25-35% B in yet another embodiment, or 27-33% B in a further embodiment. It is also preferred that the specific B-DLC contains 5-50% H in an embodiment, or 26-50% H in another embodiment, or 27-40% H in still another embodiment, or 28-35% H in a further embodiment. B and H affect the hardness and therefore the wear property of the specific B-DLC. An unduly small amount thereof excessively increases the hardness of B-DLC, while an unduly large amount excessively reduces the hardness of B-DLC. In both cases, smoothing of the outermost layer will be hindered.

(21) If the content of O is unduly large, the specific B-DLC will be excessively softened, so that successful film forming may be difficult. It is therefore preferred that the content of O is less than 6% in an embodiment, or less than 3% in another embodiment. The specific B-DLC may contain Al, Mn, Mo, Si, Ti, Cr, W, V, Ni and the like. The content of these elements is not limited, but the total content thereof may preferably be less than 8 at % in an embodiment, or less than 4 at % in another embodiment. The composition of the specific B-DLC may be uniform or may vary with respect to the thickness direction of the outermost layer, or may have some gradient.

(22) (2) The sliding surface according to the present invention wears away over time to be smoothed due to the specific B-DLC film sliding with a counterpart material. Therefore, the surface roughness before starting the sliding (initial surface roughness) is not particularly limited. Thus, the initial surface roughness of the sliding surface may be 0.1 micrometers or more in an embodiment, or 0.15 micrometers or more in another embodiment, or 0.2 micrometers or more in a further embodiment. However, it is preferred as the initial surface roughness is reduced. For example, the surface roughness may preferably be 0.4 micrometers or less in an embodiment, or 0.3 micrometers or less in another embodiment, as the Ra.

(23) The specific B-DLC, which develops self smoothing ability, may preferably have a surface hardness of 25 GPa or less in an embodiment, or 20 GPa or less in another embodiment, for example. Note that the surface hardness of a heat-treated steel base material is about 8 GPa.

(24) In view of ensuring the toughness as well as the self smoothing ability, the elastic modulus of the specific B-DLC may preferably be 200 GPa or less in an embodiment, or 170 GPa or less in another embodiment, or 150 GPa or less in a further embodiment, for example. However, unduly low elastic modulus will reduce the hardness. Therefore, the elastic modulus may preferably be 100 GPa or more in an embodiment, or 120 GPa or more in another embodiment.

(25) <<Underlying Layer>>

(26) In the present invention, the type of the underlying layer is not limited, but the underlying layer may preferably have excellent wear resistance property and slidability (low friction property) because the underlying layer may be exposed at the sliding surface. Since the low friction of the sliding surface is achieved by smoothing the outermost surface, the surface roughness of the underlying layer in the present invention is not limited. However, the surface roughness may preferably be 0.6 micrometers or less in an embodiment, or 0.2 micrometers or less in another embodiment, or 0.1 micrometers or less in a further embodiment, as the Ra. The layer thickness of the underlying layer is also not limited. If the thickness is about 1-5 micrometers, for example, the effect of the surface roughness of the base material on which the underlying layer is formed can be absorbed, and stable low frictional sliding can be ensured.

(27) <<Base Material>>

(28) The base material above which the sliding surface is formed is not limited in its material, but may ordinarily comprise a metal material, in particular a steel (carbon steel or alloy steel) material. The base material surface may be subjected to appropriate surface treatment, such as nitriding and carburizing. The surface roughness may preferably be, but is not limited to, 0.3 micrometers or less in an embodiment, or 0.1 micrometers or less in another embodiment, as the Ra. In order to enhance the interfacial adhesion with the underlying layer, one or more intermediate layers such as formed of Cr and CrC may be formed on the base material surface.

(29) <<Generation of Each Layer>>

(30) Method of generating the outermost layer and the underlying layer is not limited, but the specific B-DLC to be the outermost layer and Si-DLC, B-DLC, TiN or the like to be the underlying layer can be efficiently formed using plasma CVD method, ion plating method, sputtering method (in particular unbalanced magnetron sputtering method) or other appropriate method, for example.

(31) When the specific B-DLC (film) is formed using direct-current plasma CVD method, for example, reactive gases and carrier gas are introduced into a vacuum chamber in which the base material formed thereon with the underlying layer is placed. In this state, plasma is generated by discharging so that the plasma-ionized C, CH, B and the like in the reactive gases adhere to the surface to be treated (base material surface or underlying layer surface) thereby to form the specific B-DLC. In this operation, by employing (i) a lowered treatment temperature and (ii) plasma control, there can be readily formed the specific B-DLC film in which the hydrogen amount is large and which can easily be smoothed by wear.

(32) Specifically, the lowered treatment temperature reduces the plasma density thereby to provide a highly hydrogen-containing specific B-DLC in which a large amount of hydrogen in the raw material gases is incorporated. In addition, by controlling the plasma into a state in which the negative glow discharges overlap one another, hydrocarbon used as a reactive gas is likely to decompose, so that the specific B-DLC is readily formed to have a large amount of H and an appropriate ratio of C (Csp.sup.2) of sp.sup.2 hybridized orbital.

(33) Examples of the reactive gases to be used include: hydrocarbon gases, such as methane (CH.sub.4), acetylene (C.sub.2H.sub.2) and benzene (C.sub.6H.sub.6); and TEB (triethyl boron), TMB (trimethyl boron), B.sub.2H.sub.6 (diborane) and other boron compounds which are to be B sources. The carrier gas may be argon gas, but using hydrogen gas mitigates the ion bombardment to the surface of B-DLC which is being generated, so that the specific B-DLC is readily formed to have a large amount of H and an appropriate ratio of Csp.sup.2.

(34) Si-DLC to be the underlying layer can also be formed using the direct-current plasma CVD method in a similar manner to that for the specific B-DLC by substituting the gas as the B source with TMS (tetramethyl silane) as the Si source or other appropriate gas and adjusting the treatment condition. In addition, TiN to be the underlying layer can also be formed using the direct-current plasma CVD method in a similar manner to that for the specific B-DLC by substituting the gas as the B source with TiCl.sub.4 (titanium tetrachloride) as the Ti source or other appropriate gas and adjusting the treatment condition.

(35) <<Intended Use>>

(36) Specific form and intended use of the sliding member of the present invention are not limited, and the sliding member of the present invention can be used for a wide variety of sliding machines. Examples of such sliding members include: a shaft and a bearing; a piston and a liner; gears that are geared with each other; a cam and a valve lifter or a follower that constitute a dynamic valve system; a valve and a valve guide; and a rotor and a rotor housing. Examples of sliding machines include a driving unit, such as an engine and a transmission, which is mounted on a car or other vehicle.

EXAMPLES

Manufacturing of Samples

(37) Various samples (sliding members) listed in Table 1A and Table 1B were manufactured (both tables may be collectively referred to as Table 1 in simple). Each sample was configured such that each of various coatings was formed on one surface to be a sliding surface of a block test piece as the base material (15.7 mm6.5 mm10 mm). Note, however, that the sliding surface of Sample C1 was the polished surface of the base material without any film.

(38) <Base Material>

(39) A quenched and tempered material (HV 70050) of carburized steel (JIS SCM420) was used as the base material of Sample C1. Quenched and tempered materials (HRC 58) of martensite-based stainless steel (JIS SUS440C) were used as the base materials of other samples than Sample C1. A surface (surface to be treated) of each base material was polished to the surface roughness (Ra) as listed in Table 1 before film forming. Unless otherwise stated, surface roughness values as referred to in the present example are all based on the arithmetic average roughness (Ra) in accordance with JIS B0601: '01.

(40) <Film Forming>

(41) (1) Each of Samples 1-4 and Samples C8-C11 was configured such that a Si-DLC film (underlying layer) and a B-DLC film (outermost layer) were formed in this order on the base material surface to form a laminated film. Film forming of these films was performed by a direct-current plasma CVD (PCVD) method using a film forming apparatus 1 as shown in FIG. 2 under the film forming conditions listed in Table 1A. Specific method is as follows.

(42) Film forming apparatus 1 comprises: a stainless chamber 10; a base table 11 having conductivity; a gas introduction pipe 12; and a gas exhaust pipe 13. Various gas cylinders 15 are connected to the gas introduction pipe 12 via valves (not shown) and a mass flow controller (mass flow) 14.

(43) Raw material storage containers 18, which can be heated by heaters 17, are also connected to the gas introduction pipe 12 via valves (not shown) and a mass flow controller (mass flow) 16. A rotary pump (not shown) and a diffusion pump (not shown) are connected to the gas exhaust pipe 13 via valves (not shown).

(44) Film forming using the film forming apparatus 1 was performed in a procedure as below. Base materials 19 are placed on the base table 11 in the chamber 10 of the film forming apparatus 1. The chamber 10 is then sealed and evacuated to vacuum using the rotary and diffusion pumps connected to the gas exhaust pipe 13. Gasses adjusted to a desired composition as listed in Table 1A are introduced from the gas introduction pipe 12 to the chamber 10 evacuated to vacuum. A voltage is applied in the chamber 10 from a plasma power source. In this way, a glow discharge environment 110 is formed around the base materials 19.

(45) Film forming procedure is specifically as follows. Discharge heating, ion nitriding and pre-sputtering were performed first in this order (pre-treatment step). Treatment conditions at that time (type of used gas, introduction amount of gas, chamber inner pressure, base material temperature, and applied voltage) are listed in Table 2. The same treatment was performed for all the samples.

(46) Subsequent to the pre-treatment step, a synthetic treatment step for forming a Si-DLC film was performed, which was followed by a synthetic treatment step for forming a B-DLC film. Treatment conditions therein are listed in Table 1A.

(47) TMS (tetramethyl silane) as the raw material gas for the Si-DLC film and TEB (triethyl boron) as the raw material gas for the B-DLC film were put into respective raw material storage containers 18 provided separately, and were heated by the heaters 17 and supplied after being vaporized. The composition (the content of Si or B and H) was controlled by adjusting the ratio (flow ratio) of TMS or TEB and CH.sub.4 and the synthetic temperature as listed in Table 1.

(48) (2) Each of Samples C2 and C3 is configured such that only a Si-DLC film is formed on the base material surface, and Sample C7 is configured such that only a B-DLC film is formed on the base material surface. These single films were formed in line with the treatment conditions as listed in Table 1 in similar manners to those for the above-described laminated films.
(3) Each of Samples C4 and C5 is configured such that a B-DLC film is formed by sputtering on the surface to be treated of the base material using an unbalanced magnetron sputtering apparatus (available from Kobe Steel, Ltd). Specifically, after a Cr-based intermediate layer was formed on a surface of the base material, the B-DLC film was formed thereon by sputtering B.sub.4C and graphite targets using Ar gas while introducing CH.sub.4 gas (hydrocarbon-based gas).
(4) Sample C6 is configured such that a molybdenum disulfide-based coating (MK-4190 available from TOYO DRILUBE CO., LTD.) is formed on the base material surface.
(5) Each of Samples 5 and 6 is configured such that the Si-DLC film in Samples 1-4 is changed to a TiN film (nitride film) and a B-DLC film (outermost layer) is formed on the underlying layer. Film forming of these laminated films was performed under the conditions listed in Table 1B, basically as with Samples 1-4. Note, however, that TiCl.sub.4 (titanium tetrachloride) was used as the raw material when forming the TiN film (underlying layer) after the previously-described pre-treatment step. Like TMS used for Samples 1-4, TiCl.sub.4 (titanium tetrachloride) was put into the raw material storage container 18, heated by the heater 17, and supplied after being vaporized. Film forming of the TiN film was performed while adjusting the ratio (flow ratio) of TiCl.sub.4 and N.sub.2 or the like and the synthetic temperature as listed in Table 1B.
<<Measurement/Observation>>

(49) For each sample listed in Table 1, respective properties were measured. Results thereof are collectively listed in Table 1. Specifically, the surface roughness (Ra) was measured using a white light interferometric non-contact surface profiler (New View 5022 available from Zygo Corporation). The film thickness (layer thickness) was measured using an accurate film thickness measuring apparatus (CALOTEST available from CSEM Instruments SA). The B amount and the Si amount in each coated film were measured by EPMA analysis (JXA-8200 available from JEOL Ltd.), and the H amount was measured by RB S/HFS analysis (Pelletron 3SDH available from National Electrostatics Corporation).

(50) <<Friction Test>>

(51) The above-described coated surface of each sample was used as the sliding surface (except for Sample C1) to perform a friction test using a ring-on-block friction tester (LFW-1 available from FALEX CORPORATION). FIG. 3 illustrates an overview of the aspect of the friction test. Specifically, the sliding surface 21f (15.7 mm6.5 mm) of the block test piece 21 according to each sample was contacted slidably with a sliding surface 22f of a ring test piece 22 rotating in a bath 20 filled with lubricant oil L, while being pressed against the sliding surface 22f, and the friction coefficient at that time and the wear depth after the test were measured. A carburized material (SAE4620, (phi)35 mm8.8 mm, surface roughness Ra of 0.20.1 micrometers) was used as the ring test piece 22. The used lubricant oil was genuine engine oil available from TOYOTA MOTOR CORPORATION (Toyota Castle SN 0W-20/ILSAC standard: GF-5, MoDTC-free). Test conditions were as follows: load F for pressing the block test piece 21 against the ring test piece 22 was 133 N; sliding speed between both test pieces was 0.3 m/s; oil temperature of the lubricant oil was 80 degrees C. (fixed); and test time was 30 minutes. The friction coefficient was an average value during one minute immediately before the end of the test. The friction depth was calculated, from the shape obtained using the white light interferometric non-contact surface profiler, as a depth from the non-sliding surface to the deepest part of the sliding surface. Results thus obtained are collectively listed in Table 1.

(52) <<Evaluation>>

(53) (1) Friction Coefficient

(54) FIG. 4 illustrates the friction coefficients according to the samples of Table 1A in comparison. As apparent from FIG. 4 and Table 1A, Samples 1-4 and Sample C7 each having the specific B-DLC at the sliding surface (outermost layer) developed significantly smaller friction coefficients than those of other samples. For example, it has been revealed that Sample 1 has a friction coefficient of not more than 0.01 and develops a super-low friction property.

(55) It has been found that, in Sample 1, the wear depth of the outermost layer is 0.7 micrometers to the initial thickness before the friction test of 0.7 micrometers, and almost all of the B-DLC film of the outermost layer is in a worn state at a part of the sliding surface. It has also been found, however, that the wear of Sample 1 does not progress beyond the initial thickness of the outermost layer, and the wear resistance property is thus ensured owing to the underlying layer. Therefore, it appears that, in Sample 1, the B-DLC film constituting the outermost layer wears away during the sliding to form a smooth sliding surface while the Si-DLC film constituting the underlying layer ensures the wear resistance property, so that both layers act synergistically to stably exhibit a considerably low friction property.

(56) As found from the comparison of the layer thickness and the wear depth of Samples 2-4 listed in Table 1A, the wear depth is smaller than the layer thickness when the layer thickness of the B-DLC film constituting the outermost layer is sufficient. It appears that this is because, if the sliding surface is sufficiently smoothed due to the wear of the B-DLC film to have a considerably reduced friction coefficient, then the sliding surface does not wear away any more.

(57) (2) Effect of Initial Surface Roughness

(58) FIG. 5A illustrates a relationship between the surface roughness (initial surface roughness) and the friction coefficient of the sliding surfaces (outermost layers) before the friction test, and FIG. 5B illustrates a relationship between the initial surface roughness and the wear depth. From these graphs, it is found that the friction coefficient and the wear depth tend to be small as the initial surface roughness is small. It is also found, however, that the comparison of Sample C4 or Sample C5 with Samples 1-4 shows that the friction coefficient is significantly different depending on the composition (B amount, H amount) of the B-DLC film constituting the sliding surface even with a comparable initial surface roughness.

(59) FIG. 6 illustrates appearances of sliding surfaces of Sample 2, Sample C4 and Sample C5 after the friction test. It has been found that, in the case of a hard B-DLC film with a small amount of B and H as in Sample C4 and Sample C5, the slidability is poor largely due to the effect of the initial surface roughness, and the film delamination is likely to occur. It has also been found that, in the case of the specific B-DLC with a relatively large amount of B and H as in Sample 2, the smooth sliding surface is stably maintained even though the initial surface roughness is large, and the film delamination or the like does not occur.

(60) (3) Change of Sliding Surface

(61) FIG. 7 to FIG. 11 illustrate appearances of sliding surfaces of Samples 1-4 and Sample C4 before and after the friction test. In each figure, the 3D image illustrated at the left-hand side and the surface roughness curves in the 3D image cross-section illustrated at the right-hand side are rendered through the measurement using the white light interferometric non-contact surface profiler.

(62) As apparent from FIG. 7 to FIG. 10, the sliding surface (B-DLC film) according to Samples 1-4 changes into an outer shape depending on the counterpart sliding material (in other words, fits to the surface of the counterpart sliding material) even though the initial surface roughness before the friction test is large, and a considerably low friction property can be exhibited. In contrast, as apparent from FIG. 11, the sliding surface (B-DLC film) according to Sample C4 has a less smoothed sliding surface during the sliding, so that the friction coefficient is less likely to decrease even though the initial surface roughness is smaller than those of Samples 2-4.

(63) (4) Relationship Between Layer Thickness and Friction Coefficient

(64) FIG. 12 illustrates a relationship between the layer thickness ratio and the friction coefficient of Samples 1-4, and Samples C4 and C8-C11. It is found from FIG. 12 that the low friction can sufficiently be achieved when the layer thickness ratio is within an appropriate range as in Samples 1-4. It is also found, however, that the low friction cannot sufficiently be achieved with the hard B-DLC single layer film even though the layer thickness ratio is within an appropriate range as in Sample C4.

(65) As described above, it has been confirmed that there can be obtained a sliding member which can achieve both of the low friction property and the wear resistance property at a higher level, by providing the sliding surface with the laminated film comprising: the outermost layer comprising the specific B-DLC which contains relatively large amount of B and H; and the underlying layer which is excellent in the wear resistance property or the slidability.

(66) As found from Table 1B, the above advantages are obtained not only in the cases of Samples 1-4 where the underlying layer is a Si-DLC film but in the cases of Samples 5 and 6 where the underlying layer is a TiN film. Specifically, FIG. 13 and FIG. 14 illustrate appearances of sliding surface of Sample 5 and Sample 6 before and after the friction test in the same manner to the Sample 4 (FIG. 10). As apparent from the above, even in the cases of underlying layer is TiN film, sliding surface (B-DLC film) fits to the counterpart sliding material, and a considerably low friction property can be exhibited. Also FIG. 12 illustrates a relationship between the layer thickness and the friction coefficient of Sample 5 and Sample 6. It is found from FIG. 12 that the low friction can sufficiently be achieved when the layer thickness ratio is within an appropriate range as Sample 5 and Sample 6 with the outmost layer comprising the specific B-DLC.

(67) TABLE-US-00001 TABLE 1A Properties of sliding surface Surface roughness Ra Film forming conditions (m) Gas introduction Composition of Outer most Base Structure amount Synthetic Synthetic each layer layer Underlying material Sample of sliding (sccm) temperature time (the balance: C/at %) (initial) layer (SUS440C) No. surface TEB TMS CH.sub.4 Ar H.sub.2 ( C.) (min) B Si H R1 R2 R0 1 Outermost 12 30 30 295 6 28 (30) 0.12 0.12 0.01 layer Underlying 2 100 45 45 475 30 6 28 layer 2 Outermost 12 30 30 340 40 31 (30) 0.15 0.12 0.01 layer Underlying 4 100 45 45 505 20 6 28 layer 3 Outermost 12 30 30 340 40 31 (30) 0.23 0.23 0.13 layer Underlying 4 100 45 45 505 20 6 28 layer 4 Outermost 4 24 30 30 320 100 24 33 0.15 0.12 0.01 layer Underlying 4 100 45 45 500 20 6 28 layer C1 No costing 0.01 (SCM420) C2 Single layer 4 100 45 45 515 6 28 0.14 0.01 C3 Single layer 4 100 45 45 515 6 28 0.20 0.13 C4 Single layer 200 8 18 0.13 0.13 0.13 C5 Single layer 200 8 18 0.18 0.16 0.16 C6 Single layer 1.48 0.01 C7 Single layer 12 30 30 330 35 28 30 0.17 0.01 C8 Outermost 12 30 30 460 5 27 Not measured 0.17 0.17 0.13 layer Underlying 2 100 45 45 490 30 6 28 layer C9 Outermost 12 30 30 460 5 27 Not measured 0.27 0.27 0.25 layer Underlying 2 100 45 45 490 30 6 28 layer C10 Outermost 12 30 30 455 5 27 Not measured 0.37 0.37 0.36 layer Underlying 4 100 45 45 485 30 6 28 layer C11 Outermost 12 30 30 455 5 27 Not measured 0.61 0.61 0.64 layer Underlying 4 100 45 45 485 30 6 28 layer Properties of sliding surface Layer thickness (m) T1: Outermost Layer Results of Structure layer thickness friction test Sample of sliding T2: Underlying ratio Friction Wear depth No. surface layer T1/R2 coefficient (m) Notes 1 Outermost 0.7 5.8 0.005 0.7 Underlying layer is layer equivalent to Si-DLC film Underlying 1.7 of Sample C2 layer 2 Outermost 2.8 23.3 0.015 1.6 Underlying layer is layer equivalent to Si-DLC film Underlying 2.0 of Sample C2 layer 3 Outermost 2.9 12.6 0.022 1.4 Underlying layer is layer equivalent to Si-DLC film Underlying 2.0 of Sample C2 layer 4 Outermost 4.5 37.5 0.013 1.2 Underlying layer is layer equivalent to Si-DLC film Underlying 2.0 of Sample C2 layer C1 No costing 0.055 1.6 Sliding surface is base material surface itself C2 Single layer 2.1 0.023 0.3 Si-DLC C3 Single layer 2.1 0.039 0.2 Si-DLC C4 Single layer 3.5 15.4 0.046 0.2 Sputtered B-DLC C5 Single layer 3.5 12.5 Delaminated Sputtered B-DLC C6 Single layer 12.0 Wore away Molybdenum disulfide- based costing C7 Single layer 2.8 0.004 2.4 B-DLC C8 Outermost 0.4 2.4 0.064 0.4 layer Underlying 1.8 layer C9 Outermost 0.4 1.5 0.054 0.7 layer Underlying 1.8 layer C10 Outermost 0.4 1.1 0.045 1 layer Underlying 1.8 layer C11 Outermost 0.4 0.7 0.083 1.64 layer Underlying 1.8 layer Note 1) Surface roughness (Ra) was measured using a white light interferometric non-contact surface profiler (New View 5022 available from Zygo Corporation). Note 2) Film thickness was measured using an accurate film thickness measuring apparatus (CALOTEST available from CSEM Instruments SA). Note 3) B content and Si content were measured by EPMA analysis (JXA-8200 available from JEOL Ltd). Note 4) H content was measured by RBS/HFS analysis (Pelletron 3SDH available from National Electrostatics Corporation). Note 5) Values in parentheses are estimated values.

(68) TABLE-US-00002 TABLE 1B Properties of sliding surface Composition Surface roughness Ra of each (m) Film forming conditions layer Outer most Base Structure Gas introduction amount Synthetic Synthetic (the balance: layer Underlying material Sample of sliding (sccm) temperature time C/at %) (initial) layer (SUS440C) No. surface TEB TiCl.sub.4 N.sub.2 Ar H.sub.2 ( C.) (min) B Si H R1 R2 R0 5 Outermost 12 30 30 370 30 26 29 0.08 0.12 0.01 layer Underlying 2 10 30 45 585 80 layer 6 Outermost 12 30 30 370 30 26 29 0.16 0.23 0.01 layer Underlying 2 10 30 45 585 80 layer Properties of sliding surface Layer thickness (m) T1: Outermost Layer Structure layer thickness Results of friction test Sample of sliding T2: Underlying ratio Friction Wear depth No. surface layer T1/R2 coefficient (m) Notes 5 Outermost 2.3 19.2 0.019 1.5 Underlying layer is TiN layer film Underlying 1.3 layer 6 Outermost 2.3 10.0 0.023 1.9 Underlying layer is TiN layer film Underlying 1.3 layer Note 1) Surface roughness (Ra) was measured using a white light interferometric non-contact surface profiler (New View 5022 available from Zygo Corporation). Note 2) Film thickness was measured using an accurate film thickness measuring apparatus (CALOTEST available from CSEM Instruments SA). Note 3) B content and Si content were measured by EPMA analysis (JXA-8200 available from JEOL Ltd). Note 4) H content was measured by RBS/HFS analysis (Pelletron 3SDH available from National Electrostatics Corporation). Note 5) Values in parentheses are estimated values.

(69) TABLE-US-00003 TABLE 2 Gas introduction Chamber Base amount inner material Applied (sccm) pressure temperature voltage H.sub.2 N.sub.2 Ar (Pa) ( C.) (V) Discharge heating 40 150 300 Ion nitriding 40 500 320 500 390 Pre-sputtering 50 50 550 500 270