Graphene optoelectronic detector and method for detecting photonic and electromagnetic energy by using the same
09620597 ยท 2017-04-11
Assignee
Inventors
- Yon-Hua Tzeng (Tainan, TW)
- Chun-Cheng Chang (Changhua County, TW)
- Pin-Yi Li (Taipei, TW)
- Yueh-Chieh Chu (Tainan, TW)
Cpc classification
Y02E10/547
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
H10F30/10
ELECTRICITY
H10D62/13
ELECTRICITY
International classification
H01L29/16
ELECTRICITY
H01L31/028
ELECTRICITY
Abstract
A graphene optoelectronic detector is disclosed, which comprises: an insulating substrate with a graphene layer disposed thereon; a first electrode disposed on the graphene layer or between the graphene layer and the insulating substrate; and a second electrode disposed on the graphene layer or between the graphene layer and the insulating substrate, wherein there is a predetermined distance between the first electrode and the second electrode, and the first electrode and the second electrode are at different electrical potentials, wherein a high-drift carrier moving region is disposed between the first electrode and the second electrode, and a low-drift carrier moving region is disposed outside the high-drift carrier moving region. In addition, the present invention further provides a method for detecting photons and electromagnetic energy using the aforementioned graphene detector.
Claims
1. A method for detecting photonic and electromagnetic energy, comprising the following steps: providing a graphene optoelectronic detector, comprising: an insulating substrate with a graphene layer disposed thereon; a first electrode disposed on the graphene layer or between the graphene layer and the insulating substrate; and a second electrode disposed on the graphene layer or between the graphene layer and the insulating substrate, wherein there is a predetermined distance between the first electrode and the second electrode, and the first electrode and the second electrode are at different electrical potentials, wherein a high-drift carrier moving region is disposed between the first electrode and the second electrode, and a low-drift carrier moving region is disposed outside the high-drift carrier moving region, applying photonic and electromagnetic energy onto the high-drift carrier moving region, wherein charge carriers in the high-drift carrier moving region scatter to the low-drift carrier moving region to obtain a decreased current value between the first electrode and the second electrode; and detecting and calculating the decreased current value to obtain an amount of the photonic and electromagnetic energy.
2. The method as claimed in claim 1, wherein the photonic and electromagnetic energy is infrared, visible light, UV light, electromagnetic radiation, extreme UV light, high-level radiation, or magnetic field.
3. The method as claimed in claim 1, wherein the predetermined distance is in a range from 1 m to 1000 m.
4. The method as claimed in claim 1, wherein the graphene layer is a monolayer graphene layer.
5. The method as claimed in claim 1, wherein the graphene layer is a stack of multiple layers of monolayer graphene.
6. The method as claimed in claim 1, wherein the first electrode further comprises a first extension portion, the second electrode further comprises a second extension portion, the first extension portion extends from the first electrode toward the second electrode, the second extension portion extends from the second electrode toward the first electrode, and the predetermined distance is between the first extension portion and the second extension portion.
7. The method as claimed in claim 6, wherein the predetermined distance is in a range from 1 m to 1000 m.
8. The method as claimed in claim 1, wherein the graphene layer is a patterned graphene layer, which comprises: a connection portion for connecting the first electrode and the second electrode, and at least one lateral extension portion, wherein an extension direction of the lateral extension portion intersects a longitudinal direction of the connection portion, and a width of the connection portion is smaller than those of the first electrode and the second electrode.
9. The method as claimed in claim 1, wherein at least one recess is further disposed in the graphene layer, which locates around the first electrode and the second electrode but does not locate on the high-drift carrier moving region between the first electrode and the second electrode.
10. A graphene optoelectronic detector, comprising: an insulating substrate with a graphene layer disposed thereon; a first electrode disposed on the graphene layer or between the graphene layer and the insulating substrate; and a second electrode disposed on the graphene layer or between the graphene layer and the insulating substrate, wherein there is a predetermined distance between the first electrode and the second electrode, and the first electrode and the second electrode is electronegativity, wherein a high-drift carrier moving region is disposed between the first electrode and the second electrode, and a low-drift carrier moving region is disposed outside the high-drift carrier moving region, and wherein, when photonic and electromagnetic energy is applied onto the high-drift carrier moving region, charge carriers in the high-drift carrier moving region scatter to the low-drift carrier moving region to obtain a decreased current value between the first electrode and the second electrode, and an amount of the photonic and electromagnetic energy is obtained by detecting and calculating the decreased current value.
11. The graphene optoelectronic detector as claimed in claim 10, wherein the photonic and electromagnetic energy is infrared, visible light, UV light, electromagnetic radiation, extreme UV light, high-level radiation, or magnetic field.
12. The graphene optoelectronic detector as claimed in claim 10, wherein the predetermined distance is in a range from 1 m to 1000 m.
13. The graphene optoelectronic detector as claimed in claim 10, the graphene layer is a monolayer graphene layer or a stack of multiple layers of graphene.
14. The graphene optoelectronic detector as claimed in claim 10, the first electrode further comprises a first extension portion, the second electrode further comprises a second extension portion, the first extension portion extends from the first electrode toward the second electrode, the second extension portion extends from the second electrode toward the first electrode, and the predetermined distance is between the first extension portion and the second extension portion.
15. The graphene optoelectronic detector as claimed in claim 14, wherein the predetermined distance is in a range from 1 m to 1000 m.
16. The graphene optoelectronic detector as claimed in claim 10, wherein the graphene layer in the high-drift carrier moving region further comprises: a connection portion for connecting the first electrode and the second electrode, and at least one lateral extension portion, wherein an extension direction of the lateral extension portion intersects a longitudinal direction of the connection portion, and a width of the connection portion is smaller than those of the first electrode and the second electrode.
17. The graphene optoelectronic detector as claimed in claim 10, wherein at least one recess is further disposed in the graphene layer, which locates around the first electrode and the second electrode but does not locate on the high-drift carrier moving region between the first electrode and the second electrode.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT
(11) The present invention has been described in an illustrative manner, and it is to be understood that the terminology used is intended to be in the nature of description rather than of limitation. Many modifications and variations of the present invention are possible in light of the above teachings. Therefore, it is to be understood that within the scope of the appended claims, the invention may be practiced otherwise than as specifically described.
Embodiment 1
(12) In the present embodiment, the graphene was growth by using a copper film (from Alfa Aesar, purity of 99.8%, thickness of 0.025 mm). First, the copper film was cleaned by immersing in an acetone solution, followed by ultra-sonication for 15 min. Next, the acetone solution was replaced by iso-propanol alcohol, and the copper film was further cleaned by ultra-sonication for another 15 min. In the present invention, the method for cleaning the copper film suitable for the present invention is not limited to the aforementioned process. Then, a thermal chemical vapor deposition was performed to grow a graphene layer on the copper film.
(13) Herein, the cleaned copper film was disposed on a quartz holder in a furnace, and a mechanical pump was used to reduce the chamber pressure to less than 410.sup.2 Torr, followed by using a turbo molecular pump to create a vacuum. When a high vacuum was achieved, the air evacuation valve was closed, followed by closing the turbo molecular pump. Next, 4 sccm H.sub.2 was introduced into the chamber until the pressure therein was greater than 0.5 Torr, the air evacuation valve was switched on, and gas was exhausted by using the mechanical pump. Then, 4 sccm H.sub.2 was continuously introduced therein, the inner pressure of the chamber was set to be 0.1 Torr, and the temperature of the chamber was increased by two steps. The first step was set to heat to 800 C. within 30 min, and the second step was set to heat to a temperature for growing graphene (1030 C.) within 30 min. After the temperature was maintained for 30 min, a magnetically controllable robot was used to put the copper foil into the furnace, and the temperature was maintained at 1030 C. to perform the annealing process for 60 min. Next, 10 sccm CH.sub.4, 2 sccm H.sub.2 and 1000 sccm Ar was introduced therein, and graphene was growth under 3.94 Torr, at 1030 C. for 20 min. Then, the introduction of the gas was stopped, and the copper foil was removed from the furnace by the magnetically controllable robot to rapidly reduce the temperature thereof to accomplish the process for manufacturing the graphene of the present embodiment. Herein, the aforementioned process is only one preferred process for preparing the graphene, but the present invention is not limited thereto.
(14) Next, the obtained graphene was transferred onto an insulating substrate. Herein, the method for transferring the graphene is not particularly limited, and the graphene can be transferred by any known process used in the art.
(15) In the present embodiment, the copper foil with monolayer graphene layers formed thereon was placed onto a coating machine, and coated with resin s1818, to obtain a resin/graphene/copper foil/graphene structure. Next, a mixing solvent of HNO.sub.3, H.sub.2O.sub.2 and DI water (1:1:2) was used to remove the bottom of the copper foil, and the graphene layer under the copper foil was also removed. The sample was put into DI water for cleaning, and then the copper foil covered with resin and graphene on only one side thereof was obtained (resin/graphene/copper foil). Then, the copper foil was put on a surface of a (NH.sub.4).sub.2S.sub.2O.sub.8 solution, and the side of the copper foil without the resin formed thereon was faced thereto. After copper was completely removed, the sample was cleaned with DI water. The floating resin/graphene film on the DI water was taken out with an insulating substrate, and the resin on the graphene layer was removed with acetone to finish the graphene transferring process.
(16) After the aforementioned graphene transferring process, a structure of
(17) Next, a photolithography process and a sputtering process were used to prepare electrodes. The process for preparing the electrodes is not particularly limited, and can be any known process in the art.
(18) In the present embodiment, as shown in
(19) Next, the sample was placed in a magnetron sputtering system, an Au target was placed therein, and the pressure of the chamber was reduced to 10.sup.6 Torr. Then, Ar was introduced into the chamber to increase the pressure thereof to 210.sup.2 Torr, the working power was 60 W, the sputtering time was 12 min, and an Au electrode 15 having a thickness of about 100 nm was obtained, as shown in
(20) As shown in
(21) As shown in
(22) As shown in
(23) Herein, the blue light was also applied onto different positions of the graphene optoelectronic detector of the present invention, to understand the relation between the current changes and the positions that the energy applied thereon. As shown in
(24) As shown in
(25) Hence, in the graphene optoelectronic detector of the present embodiment, as shown in
Embodiment 2
(26) The structure and the manufacturing process of the graphene optoelectronic detector of the present embodiment are similar to those illustrated in Embodiment 1, except that in the graphene optoelectronic detector of the present embodiment, at least one recess 121 is further disposed in the graphene layer 12, which locates around the first electrode 151 and the second electrode 152 but does not locate on the high-drift carrier moving region 12a between the first electrode 151 and the second electrode 152, as shown in
Embodiment 3
(27) The structure and the manufacturing process of the graphene optoelectronic detector of the present embodiment are similar to those illustrated in Embodiment 1, except that in the graphene optoelectronic detector of the present embodiment, the graphene layer 12 is not disposed around the whole peripheries of the first electrode 151 and the second electrode 152, and only disposed at the same sides of the first electrode 151 and the second electrode 152, as shown in
(28) When a 1 V bias was applied to the graphene optoelectronic detector of the present embodiment, blue light (405 nm, 68 mW) was applied onto the graphene optoelectronic detector and a current detector (not shown in the figure) was used to measure the current change. As shown in
Embodiment 4
(29) The structure and the manufacturing process of the graphene optoelectronic detector of the present embodiment are similar to those illustrated in Embodiment 1, except that in the graphene optoelectronic detector of the present embodiment, the graphene layer is a patterned graphene layer, which comprises: a connection portion 123 for connecting the first electrode 151 and the second electrode 152, and at least one lateral extension portion 124, wherein an extension direction of the lateral extension portion 124 intersects a longitudinal direction of the connection portion 123, and a width of the connection portion 123 is smaller than those of the first electrode 151 and the second electrode 152, as shown in
(30) As shown in
Embodiment 5
(31) The structure and the manufacturing process of the graphene optoelectronic detector of the present embodiment are similar to those illustrated in Embodiment 1, except that in the graphene optoelectronic detector of the present embodiment, as shown in
(32) When a 1 V bias was applied to the graphene optoelectronic detector of the present embodiment, blue light (405 nm, 68 mW) was applied onto the graphene optoelectronic detector and a current detector (not shown in the figure) was used to measure the current change. On the basis of the positions indicated in
(33) Although the present invention has been explained in relation to its preferred embodiment, it is to be understood that many other possible modifications and variations can be made without departing from the spirit and scope of the invention as hereinafter claimed.