MO-SI-B LAYERS AND METHOD FOR THE PRODUCTION THEREOF

Abstract

The present invention concerns substrates coated with an Mo.sub.1-x-ySi.sub.xB.sub.y layer, said layer comprising the T2 phase, and a method for the production thereof.

Claims

1. Coated substrate with a Mo.sub.1-x-ySi.sub.xB.sub.y layer, having the T2 phase.

2. Method for the production of a Mo.sub.1-x-ySi.sub.xB.sub.y layer by magnetron sputtering using three elementary sputter targets or alternative a MoSi composite target and an elementary B target, characterized in that the layers after deposition are heated to a temperature of at least 900 C., whereby a T2 phase is formed.

3. Forming tool with a Mo.sub.1-x-ySi.sub.xB.sub.y layer having the T2 phase, wherein the Mo.sub.1-x-ySi.sub.xB.sub.y layer was applied onto the surface of a tool by means of a method according to claim 2.

Description

[0017] Hereinafter, some experiments and analyses are represented in FIGS. 1 to 10 which should help in better understanding the invention.

[0018] FIG. 1 shows the oxidation mechanism Mo.sub.1-x-ySi.sub.xB.sub.y (basis material).

[0019] FIG. 2 shows a coating setup for the production of MoSiB layers according to the present invention according to a first example:

[0020] The Mo.sub.1-x-ySi.sub.xB.sub.y layers were produced with the following coating parameters: [0021] Coating pressure p.sub.TOTAL=1.10.sup.2 mbar in an essentially pure argon atmosphere [0022] Coating temperature T.sub.dep=500 C. [0023] Sputter output at the MoSi Target P.sub.MoSi=250 WDC sputtering [0024] Sputter output at the Si Target P.sub.Si200 WDC pulsed (f=150 kHz, =1256 ns) [0025] Sputter output at the B Target P.sub.B=250 WDC pulsed (f=150 kHz, =1256 ns)

[0026] The aim was to examine the phase stability, mechanical properties, thermal stability and resistance to oxidation.

[0027] FIG. 3 shows the structure and morphology of the deposited Mo.sub.1-x-ySi.sub.xB.sub.y layers.

[0028] FIG. 4 shows the analysis of the phase stability of the deposited Mo.sub.1-x-ySi.sub.xB.sub.y layers.

[0029] FIG. 5 shows the analysis of the mechanical properties of the deposited Mo.sub.1-x-ySi.sub.xB.sub.y layers.

[0030] FIG. 6 shows the analysis of the phase transformation of the deposited Mo.sub.1-x-ySi.sub.xB.sub.y layers, in particular using the example of Mo.sub.0.58Si.sub.0.28B.sub.0.14, during heat treatments in a vacuum atmosphere.

[0031] FIG. 7 shows the analysis of the stability of the mechanical properties of the deposited Mo.sub.1-x-ySi.sub.xB.sub.y layers after the heat treatments.

[0032] FIG. 8 shows the analysis of the resistance to oxidation of the deposited Mo.sub.1-x-ySi.sub.xB.sub.y layers.

[0033] FIG. 9 shows a summary of the analyzed layer properties of the deposited Mo.sub.1-x-ySi.sub.xB.sub.y layers.

[0034] FIG. 10 shows the analysis of the resistance to oxidation of the deposited Mo.sub.1-x-ySi.sub.xB.sub.y layers, when they are first pulverized and only afterwards examined as powder.