Displacement sensor, spectral characteristic measuring apparatus, color measuring apparatus, planar measured object quality monitoring apparatus, displacement measuring method, spectral characteristic measuring method, and color measuring method
09605949 ยท 2017-03-28
Assignee
Inventors
Cpc classification
G01J3/0208
PHYSICS
G01J3/42
PHYSICS
G01B11/14
PHYSICS
G01J3/0205
PHYSICS
G01J3/0291
PHYSICS
G01J3/027
PHYSICS
G01J3/021
PHYSICS
G01B2210/50
PHYSICS
G01J3/10
PHYSICS
International classification
G01J3/00
PHYSICS
G01B11/14
PHYSICS
G01J3/42
PHYSICS
Abstract
A displacement sensor includes a light source unit configured to apply light with different plural wavelengths in a direction oblique to a measurement region of a planar measured object, a spectroscope configured to measure spectral distribution of light reflected by the measurement region, a feature amount extracting module configured to extract a feature amount of the spectral distribution, and a displacement calculating module configured to calculate displacement of the measurement region based on the extracted feature amount and a relation between displacement and a feature amount acquired previously.
Claims
1. A displacement sensor comprising: a light source unit configured to apply measuring light in a direction oblique to a surface including a measurement region of a planar measured object; a spectroscope configured to measure a spectral distribution of the measuring light reflected by the measurement region; a feature amount extracting module configured to extract a feature amount of the spectral distribution; and a displacement calculating module configured to calculate a displacement of the measurement region based on the extracted feature amount and a relation between the displacement and a feature amount acquired previously, wherein the light source unit includes a light source configured to emit light with a wavelength of a predetermined range, and an optical element in which a transmission wavelength or a reflection wavelength changes according to an incidence angle or an incidence position, wherein the measuring light is light whose wavelength changes according to an emission direction, which is generated by applying the light from the light source to the optical element obliquely at an angle where an optical axis of the light source is constant, wherein a wavelength distribution is generated on the surface including the measurement region by the measuring light so that the light reflected from the measurement region is changed according to the displacement of the planar measured object, and wherein the feature amount is a peak wavelength or a peak frequency of the spectral distribution.
2. A displacement measuring method comprising: applying measuring light in a direction oblique to a surface including a measurement region of a planar measured object; measuring a spectral distribution of the measuring light reflected by the measurement region; extracting a feature amount of the spectral distribution; and calculating a displacement of the measurement region based on the extracted feature amount and a relation between the displacement and a feature amount acquired previously, wherein the measuring light is light whose wavelength changes according to an emission direction, which is generated by applying the light from a light source to an optical element obliquely at an angle where an optical axis of the light source is constant, wherein the light source unit is configured to emit light with a wavelength of a predetermined range, wherein a transmission wavelength or a reflection wavelength of the optical element changes according to an incidence angle or an incidence position, wherein a wavelength distribution is generated on the surface including the measurement region by the measuring light so that the light reflected from the measurement region is changed according to the displacement of the planar measured object, and wherein the feature amount is a peak wavelength or a peak frequency of the spectral distribution.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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DETAILED DESCRIPTION
(15) Exemplary embodiments of the invention will be described with reference to the drawings.
(16) In the first embodiment, a paper 500 as the measured object will be described, but the displacement sensor 10 is suitable to measure displacement of a film or other planar objects. As long as the measured object is the planar object, the measured object is not limited to continuous objects and the embodiment can be applied to measurement of displacement of a small piece or a portion of the apparatus.
(17) In the displacement sensor 10, a region with a desired size in the planar measured object is targeted for measurement of displacement and this region is called a measurement region M. Since a region having a certain level of size rather than one point of a pinpoint like laser measurement is targeted for measurement, the displacement sensor 10 is suitable for use in measurement of average displacement of a desired region. Also, displacement of, for example, paper, in which in laser measurement, accurate measurement cannot be made due to the so-called submarining, can be measured with high accuracy.
(18) The spectroscope 300 has a configuration similar to a related-art configuration. That is, an entrance slit 330, a parallel lens 340, a diffraction device 350, an integrating lens 360 and a line detector 370 are included in a body, and a collective lens 310 is connected through an optical fiber 320. Of course, the configuration is not limited to this configuration, and spectroscopes having other configurations may be used.
(19) The light source unit 200 includes a light source 210 and an optical element 220, and emits light whose wavelength changes according to an emission direction. The light source unit 200 is installed so that the emitted light is obliquely applied to a surface including the measurement region M of the paper 500.
(20) In the first embodiment, a light emitting diode for emitting diffused light with a wavelength of a predetermined range, for example, the range of 800 nm to 900 nm is used as the light source 210. Also, an optical filter using a dielectric multilayer film, for example, a band-pass filter is used as the optical element 220. The light source unit 200 is constructed so that light emitted from the light emitting diode obliquely enters the optical filter.
(21) Since the optical filter using the dielectric multilayer film utilizes the fact that light transmission characteristics change by interference of reflection occurring at the interface of each layer, the optical filter exhibits characteristics in which a wavelength of transmitted light differs according to an incidence angle when light is caused to obliquely enter. Among the optical filters, the band-pass filter using the dielectric multilayer film is constructed so as to transmit only a specific wavelength when light is caused to vertically enter, but the embodiment is constructed so as to cause light to obliquely enter intentionally in order to generate light whose wavelength changes according to an emission direction.
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(23) By obliquely applying light with a wavelength of a predetermined range to such an optical filter, light whose wavelength continuously changes according to an emission direction is emitted from the light source unit 200 as shown in
(24) Since the light emitted from the light source unit 200 is obliquely applied to a surface including the measurement region M of the paper 500, spectral distribution of light reflected by the measurement region M changes according to displacement of the paper 500.
(25) For example, in a position A near to the light source unit 200, spectral distribution having high intensity of light with a short wavelength is obtained as shown in
(26) Since this spectral distribution corresponds to displacement, when a relation between the displacement and the spectral distribution is previously associated, the spectroscope 300 can measure the spectral distribution of the measurement region M to measure the displacement of the paper 500 based on the obtained spectral distribution.
(27) In order to perform this processing, the operation module 100 includes a spectral distribution acquiring module 110, a feature amount extracting module 120 and a displacement calculating module 130.
(28) The spectral distribution acquiring module 110 acquires spectral distribution of the measurement region M measured by the spectroscope 300.
(29) The feature amount extracting module 120 acquires a feature amount from the acquired spectral distribution. In the first embodiment, a peak frequency of the spectral distribution is used as the feature amount as shown in
(30) A correspondence relation between displacement and a feature amount acquired previously is stored in the displacement calculating module 130. The correspondence relation may use a function form or a table form. Based on this correspondence relation, displacement of the measurement region M can be calculated from the feature amount extracted by the feature amount extracting module 120.
(31) In addition, the optical filter of the dielectric multilayer film is used as the optical element 220 of the light source unit 200, but it may be constructed so as to emit light whose wavelength changes according to an emission direction using other optical elements. For example, a prism made of glass having desired dispersion or a diffraction grating (a grating) may be used. A colored glass filter or a filter in which a transmission wavelength changes according to a place may be used. In these optical elements, the transmission wavelength changes according to an angle. In brief, any optical elements in which a transmission wavelength or a reflection wavelength changes according to an incidence angle or an incidence position may be used.
(32) According to the first embodiment as described above, the displacement sensor 10 can be constructed using the spectroscope 300. The displacement sensor 10 using the spectroscope 300 can suitably be used in a measuring apparatus in order to improve measurement accuracy by performing correction based on displacement, and can be applied to, for example, a color measuring apparatus, a whiteness measuring apparatus, a glossiness measuring apparatus, a moisture meter or a basis weight meter.
(33) Next, a second embodiment in which the displacement sensor 10 of the first embodiment described above is applied to a color measuring apparatus will be described. The invention is not limited to the color measuring apparatus, and can be widely applied to a spectral characteristic measuring apparatus. The color measuring apparatus of the second embodiment corrects spectral reflectance measured by using a spectroscope using a measured result of the displacement sensor using the spectroscope. Then, color measurement is operated using the corrected spectral reflectance. However, it may be constructed so as to calculate the spectral reflectance by correcting spectral distribution using the measured result of the displacement sensor.
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(35) The light source unit 200 is similar to the light source unit 200 in the displacement sensor 10 described above, and applies light whose wavelength changes according to an emission direction in a direction oblique to a surface including the measurement region M of the paper 500.
(36) Like the related-art color measuring apparatus 30, light emitted from a xenon lamp 410 and then reflected by the measurement region M enters an optical fiber 320 through a collective lens 310. The reflected light guided to the optical fiber 320 is captured in a body of the spectroscope 300, and spectral distribution is detected by a line detector 370. Here, the light is visible light in which a wavelength range of the xenon lamp 410 is, for example, 400 nm to 700 nm.
(37) Also, light emitted from the light source unit 200 and then reflected by the measurement region M enters the optical fiber 320 through the collective lens 310. The reflected light guided to the optical fiber 320 is captured in the body of the spectroscope 300, and spectral distribution is detected by the line detector 370. Here, the light is infrared light in which a wavelength range of the light source unit 200 is, for example, 800 nm to 900 nm.
(38) That is, since both of the reflected light from the measurement region M of light for color measurement by the xenon lamp 410 and the reflected light from the measurement region M of light for displacement measurement by the light source unit 200 are collected by the collective lens 310 and are captured in the body of the spectroscope 300, spectral distribution with different wavelength ranges in the same measurement region M can simultaneously be measured by one spectroscope 300. As a result, the spectroscope capable of making measurement in the range of 400 nm to 900 nm is used as the spectroscope 300.
(39) As shown in
(40) The spectral distribution acquiring module 151 acquires spectral distribution measured by the spectroscope 300. The spectral distribution includes spectral distribution for color measurement of 400 nm to 700 nm and spectral distribution for displacement measurement of 800 nm to 900 nm. The spectral distribution for color measurement is hereinafter called spectral distribution for measurement. The spectral distribution for displacement measurement is hereinafter called spectral distribution for correction since the spectral distribution for displacement measurement of 800 nm to 900 nm is used for correction of spectral distribution for color measurement.
(41) The spectral reflectance calculating module 152 calculates spectral reflectance from the spectral distribution for measurement acquired by the spectral distribution acquiring module 151. The spectral reflectance can be calculated using known spectral reflectance of a standard whiteboard and spectral distribution measured previously using a standard whiteboard at a reference point.
(42) The feature amount extracting module 153 extracts a feature amount of the spectral distribution for correction. As shown in
(43) Also, the feature amount extracting module 153 extracts a feature amount of spectral reflectance based on the spectral distribution for measurement at the time of creating a correction factor. The feature amount of spectral reflectance is a light quantity index corresponding to a light quantity, and can be used as, for example, a peak value within the wavelength range for measurement. Or, an approximate expression of spectral reflectance near to the peak may be obtained to use its vertex as a light quantity index or use an average value of spectral reflectance as a light quantity index.
(44) The correction factor creating module 154 creates a correction function for correcting the measured spectral reflectance, and calculates a correction factor based on the correction function, and corrects the measured spectral reflectance. The correction function is created before actual color measurement. A procedure for creating the correction function will be described below.
(45) The spectral reflectance correcting module 155 corrects spectral reflectance using a correction factor corresponding to spectral distribution for correction measured in actual color measurement. Accordingly, correction of spectral reflectance according to displacement of the paper 500 is made.
(46) The color operating module 156 performs color operation of the measurement region M using the corrected spectral reflectance, and outputs the color operation as a measured result.
(47) Next, the procedure for creating the correction function used in the case of correcting spectral reflectance will be described with reference to a flowchart of
(48) First, the spectral distribution acquiring module 151 acquires spectral distribution of a measured object at a reference point (S101). It is unnecessary that the measured object should be the paper 500 used in actual measurement. The reference point becomes a reference point of displacement, and spectral reflectance at the reference point becomes the criterion for a correction factor.
(49) Then, the feature amount extracting module 153 extracts a feature amount from the spectral distribution acquired at the reference point (S102). Concretely, as shown in
(50) Then, a position of the measured object in an optical axis direction is changed (S104). A changed distance is freely selected, and it is unnecessary to acquire the amount of displacement. Then, in the changed position, the spectral distribution acquiring module 151 acquires spectral distribution (S105), and the feature amount extracting module 153 extracts a feature amount from the acquired spectral distribution (S106). Here too, for spectral distribution for measurement of 400 nm to 700 nm, a light quantity index is extracted from spectral reflectance, and for spectral distribution for correction of 800 nm to 900 nm, a wavelength index is extracted.
(51) When the position of the measured object in the optical axis direction is changed, a value of spectral reflectance is changed for spectral distribution for measurement and a wavelength is changed for spectral distribution for correction as shown in
(52) When feature amounts of the light quantity index and the wavelength index are extracted, the wavelength index and the light quantity index are associated and preserved (S107). The processing (S104 to S107) for changing the position of the measured object in the optical axis direction and acquiring the spectral distribution and preserving the feature amounts is repeated by the predetermined number of times (S108) and when the predetermined number of times is ended, the correction factor creating module 154 calculates a correction function (S109).
(53) The correction function can be calculated, for example, by plotting a correspondence relation between the wavelength index and the light quantity index at the time of changing the position of the measured object in the optical axis direction based on a correspondence between the wavelength index and the light quantity index at the reference point and approximating the correspondence relation by a polynomial.
(54) For example, when the correspondence relation between the wavelength index and the light quantity index is plotted and a line as shown in
(55) In the case of actual measurement, spectral reflectance obtained by measurement is corrected according to a flowchart shown in
(56) The feature amount extracting module 153 extracts a wavelength index from spectral distribution for correction obtained by measurement (S201), and the correction factor creating module 154 calculates a light quantity correspondence value corresponding to the extracted wavelength index based on the correction function f (wavelength index) (S202). Then, the reciprocal of the light quantity correspondence value is set at a correction factor (S203).
(57) The spectral reflectance correcting module 155 corrects spectral reflectance obtained by measurement using this correction factor (S204). Accordingly, the spectral reflectance in which displacement to the reference point is corrected can be obtained, and color operation of the measurement region M using the spectral reflectance of the measurement region M can be performed with high accuracy.
(58) In addition, in the second embodiment described above, the wavelength range of spectral distribution for measurement is set at 400 nm to 700 nm and the wavelength range of spectral distribution for correction is set at 800 nm to 900 nm and the wavelength ranges of both light sources are varied, but the wavelength range of spectral distribution for correction may be overlapped with the wavelength range of spectral distribution for measurement. For example, the wavelength range of spectral distribution for correction may be set at 500 nm to 600 nm. In this case, the xenon lamp 410 for measurement and the light source 210 of the light source unit 200 for correction are alternately turned on, and spectral distribution for measurement and spectral distribution for correction are alternately acquired. In this configuration, the spectroscope 300 could be the spectroscope capable of making measurement in the range of 400 nm to 700 nm.
(59) According to the second embodiment as described above, the color measuring apparatus 30 can be constructed by using the displacement sensor 10 using the spectroscope 300. As a result, correction of spectral reflectance based on displacement can be made by a simple configuration, so that the high-accuracy color measuring apparatus can be implemented without causing the increases in size and cost.
(60) The embodiment of applying the displacement sensor to the color measuring apparatus has been described above since the importance of the color measuring apparatus has been recently increasing. The reason why the importance of the color measuring apparatus is increasing includes, for example, the importance of quality management of paper as a base increases since quality of printing improves, and it is necessary to manage opacity as before in order to prevent bleed-through although pulp usage is decreased for resource saving and the color measuring apparatus is indispensable for such management.
(61) Also, deforestation is strictly limited according to global environmental conservation, and demand for recycled paper is increasing and also quality requirements for the recycled paper are increasing. For example, there is a need to obtain a color comparable to that in the case of using virgin pulp, and the color measuring apparatus is required in order to meet this need.
(62) Further, in media such as newspapers or magazines with printing of only black in related art, color printing becomes widespread, or added value or quality of packaging materials such as colored cardboard or patterned cardboard is increasing and quality management by the color measuring apparatus is widely exercised. For the above reasons, the importance of the color measuring apparatus is increasing.
(63) In addition, the color measuring apparatus 20 to which the displacement sensor using the spectroscope 300 is applied can be mounted in an upper side scanning head 620 shown in
(64) Next, a modified example of the displacement sensor using the spectroscope 300 will be described.
(65) As shown in
(66) The light source unit 230 includes a light source 240 and a light source 250 with different wavelengths and optical axes, and is installed so that emitted light of each of the light sources is obliquely applied to a surface including a measurement region M of paper 500 from different positions. In the second embodiment, the light source 240 emits light of 820 nm and the light source 250 emits light of 880 nm.
(67) As shown in
(68) For example, in a position A near to the light source unit 230, spectral distribution having high intensity a of a wavelength of the light source 240 is obtained as shown in
(69) Since a ratio a/b between intensity of the wavelength of the light source 240 and intensity of the wavelength of the light source 250 corresponds to displacement, when a relation between the displacement and the ratio a/b between intensity of the wavelength of the light source 240 and intensity of the wavelength of the light source 250 is previously associated, the spectroscope 300 can measure spectral distribution of the measurement region M to measure displacement of the paper 500 based on the ratio a/b between intensity of the wavelength of the light source 240 and intensity of the wavelength of the light source 250 of the spectral distribution obtained.
(70) In order to perform this processing, the operation module 101 includes a spectral distribution acquiring module 111, a feature amount extracting module 121 and a displacement calculating module 131. The spectral distribution acquiring module 111 acquires spectral distribution of the measurement region M measured by the spectroscope 300.
(71) The feature amount extracting module 121 acquires a feature amount from the acquired spectral distribution. In the third embodiment, the ratio a/b between intensity a of the wavelength of the light source 240 and intensity b of the wavelength of the light source 250 is used as the feature amount.
(72) A correspondence relation between displacement and a feature amount acquired previously is stored in the displacement calculating module 131. The correspondence relation may use a function form or a table form. Based on this correspondence relation, displacement of the measurement region M can be calculated from the feature amount extracted by the feature amount extracting module 121.
(73) Also, according to the third embodiment as described above, the displacement sensor 11 can be constructed using the spectroscope 300. A color measuring apparatus can naturally be constructed using this displacement sensor 11, and this color measuring apparatus can also be applied to a planar measured object quality monitoring apparatus.