COATING SURFACES WITH NANOSTRUCTURES

Abstract

At least one substrate part for is provided for coating. A first deposition is provided on the at least one support part as microstructuring of at least one first substance selected from the group consisting of rhenium, ruthenium, rhodium, palladium, silver, osmium, iridium, platinum, gold, tin, zinc, copper, cobalt, lead, nickel and alloys comprising these, from at least one first compound which provides the at least one first substance. A second deposition is provided on the at least one support part as a nano-structuring of at least one second substance chosen from a group comprising rhenium, ruthenium, rhodium, palladium, silver, osmium, iridium, platinum, gold and/or alloys thereof, of at least one second compound which provides the at least one second substance, in a solution.

Claims

1.-17. (canceled)

18. A process for coating surfaces with nanostructures, comprising: providing at least one support part to be coated; providing a first deposition on the at least one support part as microstructuring of at least one first substance selected from the group consisting of rhenium, ruthenium, rhodium, palladium, silver, osmium, iridium, platinum, gold, tin, zinc, copper, cobalt, lead, nickel, and alloys comprising these, from at least one first compound which provides the at least one first substance; providing a second deposition as nanostructuring of at least one second substance selected from the group consisting of rhenium, ruthenium, rhodium, palladium, silver, osmium, iridium, platinum, gold, and alloys comprising these, from at least one second compound which provides the at least one second substance, in a solution.

19. The process as claimed in claim 18, wherein the second deposition is carried out electrochemically or by colloid synthesis.

20. The process as claimed in claim 18, wherein at least one reducing agent is used for the second deposition.

21. The process as claimed in claim 20, wherein at least one of formic acids, borohydride, hydrazine, hydrogen, citric acid and derivatives thereof, ascorbic acid, ethanol, vitamin B2 and potassium bitartrate are used as reducing agent.

22. The process as claimed in claim 18, wherein an aqueous solution is used for the second deposition.

23. The process as claimed in claim 18, wherein the concentration of the at least one second substance in the solution in the second deposition is at least 0.01 gram per liter.

24. The process as claimed in claim 20, wherein the concentration of the at least one reducing agent in the second deposition is in a range from about 0.05 milliMolar to about 5 Molar.

25. The process as claimed in claim 18, wherein the concentration of the at least one first substance in the first deposition is at least 0.1 gram per liter.

26. The process as claimed in claim 18, wherein at least one of the at least one first compound and the at least one second compound is selected from the group consisting of hexachloro or tetrachloro compounds, phosphates, sulfates, oxides, nitrates, halogens, carbonyls, acetates, cyanides, complex salts and oxygen- and chlorine-containing hydrogen acids of the at least one first substance and second substance.

27. The process as claimed in claim 18, wherein at least one substance from the group consisting of rhenium, ruthenium, rhodium, palladium, silver, osmium, iridium, platinum, gold, and alloys comprising these, and a compound containing metal ions is used in the first deposition.

28. The process as claimed in claim 27, wherein the compound containing metal ions is selected from the group consisting of acetates, sulfides and sulfates of metals of groups IVb, Vb, VIb, IVa and Va of the Periodic Table.

29. The process as claimed in claim 18, wherein the second deposition is carried out over a period of at least one hour.

30. The process as claimed in claim 18, wherein the first deposition is carried out in a period of from about one minute to about 60 minutes.

31. The process as claimed in claim 18, wherein the support part is provided with the at least one substance in the polycrystalline state.

32. The process as claimed in claim 18, wherein the support part consists of a material selected from the group consisting of glass, metals, semiconductors, polymers and PEM.

33. A coated component, produced by: providing at least one support part to be coated; providing a first deposition on the at least one support part as microstructuring of at least one first substance selected from the group consisting of rhenium, ruthenium, rhodium, palladium, silver, osmium, iridium, platinum, gold, tin, zinc, copper, cobalt, lead, nickel, and alloys comprising these, from at least one first compound which provides the at least one first substance; providing a second deposition as nanostructuring of at least one second substance selected from the group consisting of rhenium, ruthenium, rhodium, palladium, silver, osmium, iridium, platinum, gold, and alloys comprising these, from at least one second compound which provides the at least one second substance, in a solution.

Description

SUMMARY OF THE DRAWINGS

[0025] Examples will be illustrated by the following figures and examples. The figures show:

[0026] FIG. 1: a schematic process sequence of an example process;

[0027] FIG. 2A: scanning electron micrographs of the surface of a coated component;

[0028] FIG. 2B: scanning electron micrographs of the surface of a further coated component;

[0029] FIG. 3: graphical depiction of the impedance for neural stimulation;

[0030] FIG. 4: graphical depiction of the phase angle for neural stimulation;

[0031] FIG. 5: graph of the current density versus time in glucose oxidation;

[0032] FIG. 6: graph of the current density versus concentration in glucose oxidation;

[0033] FIG. 7: plot of the current density versus the potential E relative to RHE for methanol and ethanol oxidation using a borosilicate glass which has been coated with polycrystalline platinum; and

[0034] FIG. 8: plot of the current density versus the potential E relative to RHE for methanol and ethanol oxidation for a component which has been coated with platinum and has Rf=6000.

DETAILED DESCRIPTION

[0035] The features indicated in the examples and in the figures are ones which relate to the specific illustrative embodiments, but can equally well be combined with all features described individually or together in the general description.

[0036] FIG. 1 shows a schematic depiction of an example process. A support part denoted by the reference numeral 10, which comprises a support and a coating (not shown in detail) deposited thereon, is coated with a platinum-containing substance in a first deposition step. Coating is here carried out electrochemically in a two-electrode setup by ramping or direct current techniques. This results in formation of hemispherical deposits 14 in the form of a first coating 16 on a conductive surface 12 of the support part 10. In a second step, further platinum-containing material is deposited by colloid synthesis, with cubic or spherical deposits 18 of platinum firstly forming on the hemispheres 14 and, as the colloid synthesis progresses, nanotubes or nanowires 20 depositing on these deposits 18 to form a three-dimensional surface coating and result in a coated component 30.

[0037] FIGS. 2A and 2B show scanning electron micrographs of the coating of two components as per FIG. 1 which have been coated according to the scheme in FIG. 1 in different resolutions. The hemispherical base structures 14 and also the nanotubes or nanowires 20 as schematically shown in FIG. 1 can clearly be seen here.

[0038] The coated component 30 as per FIG. 2A was produced as follows: firstly, an uncoated support part 10 was produced by providing a support 11 with an electrically conductive coating on its surface 12. Borosilicate glass wafers having a length of 100 mm and a thickness of 500 m (PYREX BOROFLOAT, SCHOTT AG, Germany) and having a polycrystalline platinum layer were produced here as support 11 in a thin film process. For this, a layer of 200 nm of silicon nitride was firstly deposited on said wafer by PECVD and a 20 nm thick layer of titanium was subsequently deposited on this, a 100 nm thick layer of platinum was deposited thereon and a 50 nm thick layer of titanium was subsequently deposited thereon by PVD. The upper titanium layer was subsequently removed in the desired subregions by an etching process (RIE: reactive ion etching) in order to obtain an exposed, electrically conductive platinum layer. The coated component 10 here can, for example, be configured in the form of an electrode. However, it can also have any other suitable and desired form, depending on the later use of the coated component 30.

[0039] The electrically conductive support parts 10 produced in this way were subsequently conditioned by supplying current to the support part 10 by means of cyclic voltammetry in aqueous sulfuric acid solution until stable, i.e., not overlapping, more or less identical cyclic voltammograms were obtained.

[0040] The first deposition was subsequently carried out by electrochemically depositing platinum as first substance in hemispherical form on the polycrystalline platinum surface 12 of the support part 10 using current ramps. For this purpose, a solution of 0.14 M H.sub.2PtCl.sub.6 (ChemPur Feinchemikalien, Germany) was produced as first compound and 0.066 mM lead acetate trihydrate (Sigma-Aldrich, Germany) was produced as compound containing metal ions. A platinum wire having a diameter of, for example, 290 m was used as counterelectrode. The counterelectrode and the component 10 as electrode were subsequently connected to a current source and current ramps were run from an initial current density of from 1 to 4 mA/cm.sup.2 to a final current density of from 10 to 40 mA/cm.sup.2 over from 180 s to 720 s, a current ramp, e.g., being run in the range from 400 s to 720 s in order to obtain very high surface roughness values. When the final current density was reached, this was maintained for 30 seconds. A coating 16 having hemispheres 16, as can be seen in FIG. 1, was formed by means of this electrochemical deposition.

[0041] The second deposition was subsequently carried out by colloidal deposition (colloid synthesis). For this purpose, the support part 10 provided with the coating 16 was introduced into an aqueous solution of 2.9 mM H.sub.2PtCl.sub.6 (ChemPur Feinchemikalien, Germany) as second compound and 1.24 M formic acid (Merck, Germany). At the beginning of the colloidal deposition, the platinum concentration was still very high (0.6 g/l of platinum), but it decreased during the course of the synthesis. Mainly cubic or spherical structures 18 composed of platinum as second substance were thus formed on the hemispheres 14 (see FIG. 1) in the first 30 hours; nanotubes or nanowires 20 were subsequently formed in the time period from 30 hours to 72 hours; these nanotubes or nanowires 20 then formed, together with the hemispheres 14 and the cubic or spherical structures 18, a coating 22, so as to give the component 30.

[0042] The coated component depicted in FIG. 2B, which shows a scanning electron micrograph of same, was produced in a manner identical to that for component 30 shown in FIG. 2A, with the sole difference that a platinum wire having a diameter of 290 m was used as support 11 instead of a borosilicate glass wafer as support 11 with a coating, as described above. The left-hand picture of FIG. 2B shows spherical deposits 18 of platinum on hemispheres 14, and it can be seen even in the middle picture and very clearly in the right-hand picture of FIG. 2B that these have further nanostructuring in the form of nanowires 20.

[0043] FIG. 3 shows an example use of the coated component 30 for neural stimulation. Here, the impedance is plotted against the frequency and, in addition to that for component 30 according to the invention, the impedance curves of the support part 10 with only a polycrystalline platinum coating and of the support part 10 with the coating 16 were compared. It can clearly be seen that in the case of the component 30 (denoted by Pt NW), a very low impedance of about 510.sup.2 could be achieved even at a frequency of about 10 Hz, while in the case of the support part 10 with the polycrystalline coating (denoted by Pt polycrystalline) the impedance was about 410.sup.5 at 10 Hz and in the case of the support part 10 with the coating 16 (component 30) (denoted by Pt Black) it was about 310.sup.3. Curve fitting using ZPE (constant phase element) in FIGS. 3 and 4 represents modeling of the electrode-electrolyte interface.

[0044] In the same experiment, the phase angle was also determined. FIG. 4 shows a plot of the phase angle against the frequency. The component 30 (again denoted by Pt NW) displayed a phase angle close to 90 here up to frequencies of 100 Hz, and in the case of a support part 10 coated with a polycrystalline platinum layer this was close to 0 at 100 Hz and in the case of the support part 10 with a coating 16 (component 30) was about 30.

[0045] FIGS. 3 and 4 thus show a considerable decrease in impedance in the case of the component 30 compared to other coated components, which ultimately leads to a reduction in tissue damage and greater sensitivity in neural stimulation. E.g., no signs of cytotoxicity were observed.

[0046] FIGS. 5 and 6 show the use of the component 30 as glucose sensor or as biological fuel cell. FIG. 5 shows a comparison of hydrogen peroxide oxidation and glucose oxidation at a potential of 1.1 V relative to the RHE, where once again firstly only the support part 10 having a polycrystalline platinum coating and, secondly, the component 30 having two surface roughness values, namely one of Rf=4000 and one of Rf=6000, were used. It can clearly be seen that the current density in the oxidation of hydrogen peroxide remained more or less uninfluenced in the case of all three parts, while considerably higher current densities in the glucose oxidation were observed when using the components according to the invention. Here, the current densities for the component 30 with Rf=6000 were from about 2.5 times to 3 times as high as those of the component 30 with Rf=4000.

[0047] FIG. 6 shows a plot of the current density against the concentration of glucose in a biological fuel cell, this time in respect of the component 30 with Rf=4000 and Rf=6000, identical to that used in FIG. 5. It can clearly be seen that the component with Rf=6000 displays considerably higher current densities, increased by a factor of about 3, compared to the component with Rf=4000 in the physiologically interesting concentration range for glucose of from about 2 to 10 mM. FIGS. 5 and 6 show that long-term monitoring of the glucose content is also possible by means of the component 30 without use of any biological components. The component 30 can likewise be used for determining the glucose content in the presence of ascorbic acid and/or uric acid, for example in blood.

[0048] Finally, FIG. 7 and FIG. 8 show a plot of the current density against the potential for methanol and ethanol oxidation at room temperature using a component 30 with Rf=6000 (FIG. 8) and with polycrystalline platinum (FIG. 7) as comparison. There is a clear increase in the current density at a potential of about 0.5 V and the current density reaches a maximum close to a potential of 1 V; at 1 V it is about 23 000 times as high for methanol and about 3500 times as high (for ethanol) as per FIG. 8 than in the case of polycrystalline platinum as per FIG. 7.

[0049] The present disclosure provides both a process and a coated component by means of which it is possible to provide highly reactive surface coatings which have a large surface area and lead to an increase in measurable current densities or other parameters in economically feasible fields of use of the coated component. This component can be used in many fields of application which require catalytic reactions, for example in solar cells or in enzymatic biosensors.