Method for stabilizing a plasma and an improved ionization chamber

Abstract

A method for stabilizing a plasma is disclosed. The method includes (a) providing in an ionization chamber a number of high voltage wires and a gas suitable for forming a plasma, and (b) exposing the gas to a high voltage thereby igniting the gas to form the plasma. Upon ignition, the plasma is subjected to an amount of light. A use of the method to generate X-rays is also disclosed. The invention is further directed to an ionization chamber including (a) a gas suitable for forming a plasma, and (b) a number of high voltage wires for exposing the gas to a high voltage thereby igniting the gas to form the plasma. The ionization chamber includes a device for subjecting the plasma upon ignition to an amount of light. The invention relates to an X-ray generator including such ionization chamber and to a laser apparatus including such X-ray generator.

Claims

1. A method for stabilizing a plasma comprising: (a) providing in an ionization chamber, a number of high voltage wires and a gas suitable for forming a plasma; and (b) exposing the gas to a high voltage thereby igniting the gas to form the plasma, wherein upon ignition, the plasma is subjected to an amount of light having a radiation energy from 100 mW to 1500 mW.

2. The method according to claim 1, wherein the light has a wavelength between 10 and 1100 nanometers.

3. The method according to claim 1, wherein the light is continuous.

4. The method according to claim 3, wherein the light is substantially directed into the ionization chamber as a whole.

5. The method according to claim 1, further comprising the step of C using X-rays generated after exposing the gas to the light.

6. The method of claim 2, wherein the light is continuous while subjecting the plasma to the light.

7. An ionization chamber comprising: (a) a gas suitable for forming a plasma; and (b) a number of high voltage wires for exposing the gas to a high voltage thereby igniting the gas to form the plasma, wherein the ionization chamber comprises a device for subjecting the plasma upon ignition to an amount of light, having a radiation energy from 100 mW to 1500 mW.

8. The ionization chamber according to claim 7, wherein the device for subjecting the plasma to an amount of light comprises a light source with a wavelength between 10 and 1100 nanometers.

9. The ionization chamber according to claim 8, wherein the device for subjecting the plasma to an amount of light comprises a continuous light source.

10. The ionization chamber according to claim 7, wherein the device for subjecting the plasma to an amount of light is adapted for directing light substantially into the ionization chamber as a whole.

11. The ionization chamber according to claim 10, wherein the device for subjecting the plasma to an amount of light comprises one or a plurality of external light sources and optical waveguides for guiding the light into the ionization chamber.

12. The ionization chamber according to claim 11, wherein the optical waveguides comprise optical fibers.

13. A laser apparatus comprising an ionization chamber comprising: (a) a gas suitable for forming a plasma; and (b) a number of high voltage wires for exposing the gas to a high voltage thereby igniting the gas to form the plasma, wherein the ionization chamber comprises a device for subjecting the plasma upon ignition to an amount of light with radiation energy from 100 mW to 1500 mW, said device comprising a light source having the radiation energy from 100 mW to 1500 mW.

14. The laser apparatus according to claim 13 comprising an X-ray generator.

15. The laser apparatus according to claim 13, wherein the light is continuous.

16. The laser apparatus according to claim 13, wherein the light is substantially directed into the ionization chamber as a whole.

17. The laser apparatus of claim 13, wherein the light source is a continuous light source that provides continuous light at the radiation energy from 100 mW to 1500 mW.

18. The ionization chamber of claim 13, wherein the light source is a continuous light source that provides continuous light at the radiation energy from 100 mW to 1500 mW.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIG. 1 illustrated an embodiment in accordance with the present invention.

(2) FIG. 2 illustrated another embodiment in accordance with the present invention.

DESCRIPTION OF THE INVENTION

(3) In a first embodiment in accordance with the present invention a method for stabilizing a plasma comprising: a. providing in an ionization chamber a number of high voltage wires and a gas suitable for forming a plasma b. exposing the gas to a high voltage thereby igniting the gas to form the plasma,
characterized in that upon ignition the plasma is subjected to an amount of light.

(4) Applicant surprisingly found and confirmed experimentally that providing optical radiation (light) into the ionization chamber upon ignition of the plasma has the effect of suppressing the instability,the so-called jitter, in particular after not been ignited for a relatively long period of time.

(5) Without being bound by any theory, subjecting the plasma to light may help creating sufficient electrical charges on the surface or in the volume of the ionization chamber necessary to maintain the plasma upon ignition. It is believed that subjection to light enforces excitation of ions in the plasma thereby improving the stability of the plasma.

(6) The plasma may be ignited from any kind of ionizable gas, preferably selected from the group of noble gases such as helium (He), neon (Ne), argon (Ar), or mixtures thereof.

(7) In accordance with the present invention, within the ionization chamber the ionizable gas is under a pressure in the range of a medium vacuum, preferably in a range from 1 to 100 Pa.

(8) The light may have any wavelength suitable for suppressing the instability of a plasma. More specifically, the wavelength may be between 10 and 1100 nanometer, between 100 and 800 nanometer, between 400 and 800 nanometer (visible light range), or between 100 and 400 nanometer (UV range).

(9) The light may have a radiation energy from 1 mW to 5000 mW, from 1 mW to 3000 mW, preferably form 100 mW to 1500 mW.

(10) The light may be pulsed or continuous. Continuous light may have the advantage over pulsed light that precise synchronization between light pulse and ionization discharge is not required.

(11) The light may be focused on one or more of the high voltage wires in the ionization chamber, or on the ignited plasma center. Preferably, the light is substantially directed into the ionization chamber as a whole. It may be advantageous to expose substantially the whole ionization chamber to light instead of only part of it (or part of the plasma), as this may result in more efficient stabilization of the plasma upon ignition.

(12) In an embodiment in accordance with the present invention, the present invention provided an ionization chamber (1) comprising:

(13) a. a gas suitable for forming a plasma, and

(14) b. a number of high voltage wires (2) for exposing the gas to a high voltage thereby igniting the gas to form the plasma,

(15) characterized in that the ionization chamber comprises means for subjecting (3, 3, 4, 4) the plasma upon ignition to an amount of light.

(16) In the ionization chamber, a gas suitable for forming a plasma,also called an ionizable gas, is present in medium vacuum conditions. One or a number of high voltage wires are positioned preferably centrally in the ionization chamber and connected to a high voltage source.

(17) Upon ignition of the ionizable gas by applying a high voltage, the formed plasma is exposed to an amount of light for stabilizing the plasma.

(18) In accordance with the present invention, the means for subjecting the plasma to an amount of light may comprise any light source and/or optical system suitable for providing light with a wavelength between 10 and 1100 nanometer, between 100 and 800 nanometer, between 400 and 800 nanometer (visible light range), or between 100 and 400 (UV spectral range), the latter possibly resulting in better efficiency due to the higher photon energy

(19) The light source may have radiation energy from 1 mW to 5000 mW, from 1 mW to 3000 mW, preferably form 100 mW to 1500 mW and may be continuous or pulsed. In the latter case the optical source can be synchronized to the high voltage pulse applied to the wires in order to provide a pulse of light upon ignition of the plasma.

(20) The means for subjecting the plasma to an amount of light may be adapted for focusing the light onto the one or more high voltage wires, or on the ignited plasma center. Preferably, it may be adapted for directing light substantially into the ionization chamber as a whole, i.e. not focused on part of the ionization chamber or not focused at all.

(21) In an embodiment in accordance with the present invention, the means for subjecting the plasma to an amount of light may comprise one or a plurality of internal light sources, i.e. light sources installed within the ionization chamber, or one or a plurality of external light sources (3, 3), i.e. light sources installed outside the ionization chamber.

(22) In the latter case, the means for subjecting the plasma to an amount of light may additionally comprise one or multiple transparent windows (4) incorporated in the walls of the ionization chamber (1), or may alternatively comprise dedicated optics for guiding the light (4) from the external source(s) (3, 3) into the ionization chamber.

(23) The light source may be any light source suitable for generating light with wavelength and radiation energy in the ranges as indicated above, such as a continuous or flash lamp, a laser, a light emitting diode (LED), etc.

(24) Such optics for guiding the light from the external source(s) into the ionization chamber may comprise any kind of optical instrument suitable for guiding light such as for example mirrors, lenses, beam splitters, prisms, optical waveguides such as optical fibers, etc.

(25) In a particular embodiment of the present invention as illustrated in FIG. 1, the means for subjecting the plasma to an amount of light may comprise several Light Emitting Diodes (LED) (3) emitting in the visible spectral range (400-800 nm), wherein each LED output is coupled to an optical fiber (4). Each optical fiber output is inserted into the ionization chamber with sealed feedthrough. The optical fibers may be inserted at one or more sides, or at opposite sides of the ionization chamber.

(26) Alternatively and as illustrated in FIG. 2, the means for subjecting the plasma to an amount of light may comprise a flash lamp (3) emitting in the UV spectral range, and one or more windows (4) incorporated into the walls of the ionization chamber.

(27) In addition, in an embodiment according to the present invention, a method for stabilizing a plasma as described above may be used for generating X-rays. Generating X-rays is based then on the following principle: 1. a low pressure wire plasma which is stabilized upon ignition by subjecting it to an amount of light creates positive ions 2. The positive ions are accelerated towards a negatively polarized electrode and create secondary electrons upon collision with this electrode 3. The resulting electron beam is accelerated away from the same electrode and send to collide with a metallic plate 4. Upon collision of the electron beam on the metallic plate, X-ray are generated

(28) Further, in another embodiment according to the present invention, an ionization chamber as described above may be used in an X-ray generator, and an X-ray generator having such ionization chamber incorporated may be used in a laser apparatus.