BEANIE H STITCH
20250072547 ยท 2025-03-06
Inventors
- Karar Hadib Hamoud (Cleveland, OH, US)
- Haidar Hadib Hamoud (Cleveland, OH, US)
- Aisar Hadib Hamoud (Cleveland, OH, US)
- Ali Hadib Hamoud (Cleveland, OH, US)
Cpc classification
International classification
Abstract
This invention introduces a groundbreaking beanie design featuring a new stitch configuration, departing from conventional norms. Employing innovative stitch lining techniques, the crown of the beanie is artistically redefined, blending comfort with sophistication. The distinctive design involves two parallel vertical stitches interconnected by a solitary horizontal stitch, evoking the form of the letter H or the Greek letter Theta. The stitch lines exhibit fluidity, adapting seamlessly to fabric stretch when worn. This versatile stitch pattern is adaptable to both cuffless and cuffed beanies, signifying a versatile solution for diverse preferences. The invention revolutionizes beanie creation while accentuating the convergence of textile artistry and wearable functionality.
Claims
1. The method for creating a beanie using the stitch, comprising of the steps: Forming two vertical parallel stitches and connecting the two vertical parallel stitches with one horizontal stitch, creating an appearance resembling the letter H or the Greek letter Theta, this includes varying the spacing between the two vertical parallel stitches to accommodate the stretch of the fabric/beanie when worn, this may be on beanies with or without a cuff.
Description
BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWING(S)
[0005]
[0006] 5 hand rendered drawings of a beanie from alternating viewpoints titled: top stitch view, front stitch view, back stitch view, left stitch view, and right stitch view.
[0007]
[0008] A black and white photograph of the front of the beanie showcasing the horizontal stitch running along the top.
[0009]
[0010] A black and white photograph of the top of the beanie showcasing the full stitch pattern in the shape of two vertical lines connected by one horizontal line in which the spacing between vertical line 1 and vertical line 2 varies.
[0011]
[0012] A black and white photograph of the side of the beanie showcasing the side view of the stitch on the beanie.
[0013]
[0014] A black and white photograph of the inside of the beanie showcasing the stitch linings in the H design.
DETAILED DESCRIPTION OF THE INVENTION
[0015] The invention showcases a new beanie design stitch. It uses stitch lining techniques to outline the crown of the head in a way that is comfortable and sleek. This new design uses two vertical parallel stitches connected by one horizontal stitch. This forms the appearance of the letter H, or it may form the appearance of the Greek letter Theta. The lines may curve according to the stretch of the fabric/beanie when worn. This stitch may or may not be used on beanies with or without a cuff.