Orthogonal acceleration system for time-of-flight mass spectrometer
09576782 ยท 2017-02-21
Assignee
Inventors
Cpc classification
H01J49/403
ELECTRICITY
H01J49/0031
ELECTRICITY
H01J49/401
ELECTRICITY
International classification
Abstract
An orthogonal pulse accelerator for a Time-of-Flight mass analyzer includes an electrically-conductive first plate extending in a first plane, and a second plate spaced from the first plate. The second plate includes a grid that defines a plurality of apertures each having a first dimension extending in a first direction and a second dimension orthogonal to the first dimension, the first and second dimensions lying in the second plane and the second dimension begin larger than the first dimension. The first and second plates are positioned in the Time-of-Flight mass analyzer to receive, during operation of the mass analyzer, an ion beam propagating in the first direction in a region between the first and second plates, and the orthogonal pulse accelerator directs ions in the ion beam through the apertures.
Claims
1. An orthogonal pulse accelerator for a Time-of-Flight mass analyzer, comprising: an electrically-conductive first plate extending in a first plane; a second plate spaced from the first plate, the second plate extending in a second plane parallel to the first plane, the second plate comprising a grid that defines a plurality of apertures each having a first dimension extending in a first direction and a second dimension orthogonal to the first dimension, the first and second dimensions lying in the second plane and the second dimension being larger than the first dimension; an electrically-conductive third plate spaced from the second plate, the third plate comprising a second grid defining a second plurality of apertures; an electrically-conductive fourth plate spaced from the third plate, the fourth plate comprising a third grid defining a third plurality of apertures; and a voltage source configured to apply a constant voltage to the fourth plate during operation of the mass analyzer, wherein the first and second plates are positioned in the Time-of-Flight mass analyzer to receive, during operation of the mass analyzer, an ion beam propagating in the first direction in a region between the first and second plates while a first electric field between the first and second plates is essentially zero, and the orthogonal pulse accelerator directs ions in the ion beam through the plurality of apertures of the second plate when a second electric field is applied between the first and second plates, where ions passing through the plurality of apertures of the second plate are directed through the second plurality of apertures of the third plate and through the third plurality of apertures of the fourth plate.
2. The orthogonal pulse accelerator of claim 1, wherein at least some of the plurality of apertures are rectangular apertures, the first dimension corresponds to a width of each rectangle and the second dimension corresponds to a length of the rectangle.
3. The orthogonal pulse accelerator of claim 1, wherein the first dimension is between 0.05 mm-0.5 mm.
4. The orthogonal pulse accelerator of claim 3, wherein the second dimension is between 0.3 mm to 2.0 mm.
5. The orthogonal pulse accelerator of claim 1, wherein a grid density along the first direction is greater than in a direction orthogonal to the first direction.
6. The orthogonal pulse accelerator of claim 1, wherein the grid comprises electrically-conductive wires.
7. The orthogonal pulse accelerator of claim 1, wherein the third plate extends in a third plane downstream of the second plate and parallel to the second plane, the second plurality of apertures each having a third dimension extending in the first direction and a fourth dimension orthogonal to the third dimension, the third and fourth dimensions lying in the third plane, the third dimension being larger than the fourth dimension.
8. The orthogonal pulse accelerator of claim 1, wherein during operation of the mass analyzer, while the second electric field is applied between the first and second plates, an electric field strength in the region between the first and the second plates is essentially identical to an electric field strength in the region between the second and third plates.
9. The orthogonal pulse accelerator of claim 1, wherein the fourth plate comprises an entrance grid of a flight tube.
10. The orthogonal pulse accelerator of claim 1, wherein additional electrically-conductive elements are positioned between the third and fourth plates, and voltages applied to the additional electrically-conductive elements, and the voltage applied to the fourth plate, are kept constant.
11. A method, comprising: directing an ion beam in a first direction within a first region between a first electrically-conductive plate extending in a first plane and a second plate extending in a second plane parallel to the first plane, the second plate comprising a grid that defines a plurality of apertures each having a first dimension extending in the first direction and a second dimension orthogonal to the first dimension, the first and second dimensions lying in the second plane and the second dimension being larger than the first dimension; while receiving the ion beam propagating in the first direction in the first region between the first and second plates: (i) applying voltages to the first and second plates to provide a first electric field between the first and second plates; (ii) applying a first voltage to a third plate positioned in a third plane spaced apart from and parallel to the second plane on an opposite side of the second plane from the first plane; and (iii) applying a second voltage to a fourth plate positioned in a fourth plane spaced apart from and parallel to the third plane on an opposite side of the third plane from the second plane, the first and second voltages establishing a second electric field between the third and fourth plates; adjusting the first voltage to minimize field penetration from the second electric field into the first region, such that the first electric field is essentially zero; applying a third voltage on the first electrically-conductive plate to produce a third electric field between the first and second plates to accelerate at least a portion of ions in the ion beam in the first region through the apertures of the second plate such that a strength of the second electric field in a region between the first and second plates is essentially identical to an electric field strength in a region on the opposite side of the second plate, away from the first plate, while applying a fourth voltage on the third plate essentially simultaneous with the application of the third voltage on the first plate, such that a strength of the third electric field in the first region between the first and second plates is essentially identical to an electric field strength in a region on the opposite side of the second plate, away from the first plate, and directing the ions which have passed through the apertures of the second plate through apertures of the third plate, and then through apertures of the fourth plate, while maintaining a fourth electric field between the third plate and the fourth plate.
12. The method of claim 11, further comprising obstructing at least some ions incident on the apertures at a grazing incidence angle with respect to the second plane before the third voltage is applied.
13. The method of claim 11, wherein a separation distance between the second and third plates is essentially equal to a separation distance between the first and second plates along a direction orthogonal to the first direction.
14. The method of claim 11, wherein the second plate is arranged to cause a reduction in transmission of ions in the ion beam incident on the apertures at a grazing incidence angle with respect to the second plane while the first electric field between the first and second plates is essentially zero.
15. The method of claim 11, wherein the third plate extends in a third plane parallel to the second plane, the second plurality of apertures each having a third dimension extending in the first direction and a fourth dimension orthogonal to the third dimension, the third and fourth dimensions lying in the third plane, the third dimension being larger than the fourth dimension, wherein the ions in the ion beam pass through the second plurality of apertures.
16. The method of claim 11, further comprising reducing artifact signals from registering at a detector.
17. The method of claim 11, further comprising maintaining the second plate at ground potential.
18. The method of claim 15, further comprising applying a second voltage to the third plate such that an electric field strength between the second and third plate is essentially identical to the electric field strength between the first and second plate, while the first electric field is applied between the first and second plates.
19. The method of claim 11, wherein the fourth plate comprises an entrance grid of a flight tube.
20. The method of claim 11, wherein voltages applied to electrically-conductive elements between the third plate and the fourth plate, and the voltage applied to the fourth plate, are kept constant.
21. The method of claim 11, wherein, while the second electric field is generated, the voltages applied to the first, second, and third plates, provide a first stage of acceleration between the first and third plates, and the voltages applied to the fourth plates, and any electrically-conductive elements between the third and fourth plates, provide a second stage of acceleration between the third plate and the fourth plate.
22. The method of claim 11, wherein, while a first electric field between the first and second plates is essentially zero, the voltage applied to the third plate is adjusted to ensure that any electric field between the third and fourth plates is prevented from causing the electric field between the first and second plates to deviate from essentially zero field strength.
Description
DESCRIPTION OF DRAWINGS
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(10) Like reference symbols in the various drawings indicate like elements.
DETAILED DESCRIPTION
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(12) Ions are created in electrospray ion source 1 from liquid sample solution 2 flowing into sample probe 3. Sample ions move from the ion source 1 through dielectric capillary 10 into the vacuum stage 18. The ions continue to pass through skimmer 14, RF multipole ion guide 16, and are focused into a collimated ion beam 33 by electrostatic lens assembly 29. The collimated ion beam 33 passes into orthogonal acceleration (OA) pulsing region 34 between pusher electrode 36 and grid intermediate electrode 37 during the ion filling period, that is, while the OA pulsing region 34 is field free. The primary ion beam enters a region in the pulsing region 34 along an axis 17 that is parallel to the pusher electrode 36 and the grid intermediate electrode 37 surfaces during this ion filing period.
(13) A segment of the ion beam 33 is pulse-accelerated as an ion packet 35 from the pulsing region 34 toward TOF flight tube 43 when pulse voltages are abruptly applied to and maintained on the solid pusher electrode 36 and grid puller electrode 38 during the pulse-active period. The ion packet 35 is accelerated through pulse acceleration optics assembly 48 and through flight tube entrance grid 42 into the flight tube 43. The leading and trailing ends of ion packet 35 follow trajectories 47 and 46, respectively, as the ion packet 35 travels from the OA pulsing region 34 through the pulse acceleration optics assembly 48, the flight tube 43, reflectron 45, to TOF detector 49. Ions within the ion packet 35 travel nominally along trajectories between and parallel to trajectories 46 and 47.
(14) The OA configuration of
(15) During the ion filling period, it is preferable that the pulsing region 34 be free of electric fields that would deflect or distort the ion beam 33 as it passes into and through this region. To this end, the voltage applied to pusher electrode 36 is kept essentially the same as that applied to grid intermediate electrode 37 (except for a possible small voltage difference (e.g., PL1 bias, applied to the pusher electrode 36) to provide a steering correction of any misalignment between the primary ion beam axis 17 and the axis 63 of the pulsing region 34). For example, the voltage of the grid intermediate electrode 37 may be fixed at ground potential, so a nominal field-free region between the pusher electrode 36 and the grid intermediate electrode 37 is established when the potential on the pusher electrode 36 is nominally 0V. Also, in order to prevent the constant electric field in the second acceleration stage from penetrating through the grid puller electrode 38 and the grid intermediate electrode 37 into the pulsing region 34, a voltage (e.g., PL3 bias) is applied to the grid puller electrode 38 that compensates for this penetration, thereby ensuring that pulsing region 34 is field-free during the ion filling period. For example, PL3 bias may be a voltage of opposite polarity from the drift voltage, and adjusted to buck, or compensate for, field penetration from the acceleration field present in the second acceleration stage during the ion filling period.
(16) In some embodiments, the distance between the pusher electrode 36 and the grid intermediate electrode 37 is the same as the distance between the grid intermediate electrode 37 and the grid puller electrode 38.
(17) In such embodiments, during the pulsing period, with the grid intermediate electrode 37 maintained at ground potential, and the pulse voltage applied to the grid puller electrode 38 (Vp) equal and opposite polarity to the pusher electrode 36 voltage (+Vp), an essentially constant pulse-acceleration electric field is established between the pusher electrode 36 and the grid puller electrode 38. This field forms the first pulse-acceleration stage electric field during the pulsing period. The distance between the grid puller electrode 38 to the grid intermediate electrode 37 does not have to be the same as that from the pusher electrode 36 to the grid intermediate electrode 37, provided that the pulse voltages applied to pusher electrode 36 and grid puller electrode 38 are adjusted so that the electric field between the pusher electrode 36 and the grid intermediate electrode 37 is essentially the same as the electric field between the grid intermediate electrode 37 and the grid puller electrode 38 when these voltages are applied during the acceleration pulse.
(18) The second constant acceleration stage electric field is formed between grid puller electrode 38 (Vp) and flight tube entrance grid 42 (the drift tube voltage Vd) with the help of field termination rings electrodes 39, 40, and 41, which have voltages applied intermediate between the grid puller electrode 38 pulse voltage and the drift tube voltage so as to create the constant second stage electric field when the grid puller electrode 38 voltage equals Vp during the acceleration pulse.
(19) An exemplary selection of voltages is tabulated in Table 1 below for positive ions:
(20) TABLE-US-00001 Electrode Mode (+Ions) 36 37 38 39 40 41 42 Ion Filling PL1 Bias 0 v. PL3 Bias Vp + (Vd + Vp) Vp + (Vd + Vp) Vp + (Vd + Vp) Vd Pulsed +Vp 0 v. Vp Vp + (Vd + Vp) Vp + (Vd + Vp) Vp + (Vd + Vp) Vd
(21) Exemplary values of the variable parameter can be: PL1 bias=0 V, Vp=700 V, PL 3 bias=+20 V, Vd=10,000 V.
(22) For negative ions, the same absolute values of voltages as for positive ions, but opposite polarity, are exemplary.
(23) As shown in
(24) TOF performance degradation can be reduced in crossed-wire grid structures, such as grid puller electrode 38 and flight tube entrance grid 42, by increasing the spacing between the grid wires that are oriented orthogonal to the ion beam axis 17. It was thought that no similar benefit would be realized by configuring the grid intermediate electrode 37 the same way, because the electric field strength is the same on either side of this grid 37, so no significant grid scattering effects would result in any case.
(25) However, for the sake of consistency of construction and minimizing the number of different parts of the instrument (that is, for lowering the associated cost of production), the grid intermediate electrode 37 would typically be configured the same way as the grid puller electrode 38 and the flight tube entrance grid 42. This is illustrated in
(26) A commercial instrument incorporating the essential design features of
(27) Each ion beam segment, pulse accelerated from the primary ion beam 33 traversing the pulsing region 34, is separated during its passage through the TOF analyzer into constituent ions having different mass-to-charge values. The resulting output signal from the TOF detector 49 is digitized and recorded in digital memory as a function of time using an analog-to-digital converter (ADC) coupled to a memory array. Alternatively, a time-to-digital converter (TDC) may be used instead of an ADC to register the arrival times of ions. The time dependence of this output signal is interpreted as a mass-to-charge spectrum. Several thousands of such TOF spectra are typically integrated from an equal number of pulse accelerated primary ion beam segments to produce an average spectrum.
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(29) The spectrum portion shown in
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(31) Without wishing to be bound by theory, the relative positions of the artifact peaks and their response to changes in the bias voltage applied to the pusher electrode 36 and the bias voltage applied to the grid puller electrode 38 suggest that the artifact peaks are due to ions in the primary ion beam 33 that have penetrated the region between the grid intermediate electrode 37 and the grid puller electrode 38. In contrast, most of the primary ions remain within the pulsing region 34 between the pusher electrode 36 and the grid intermediate electrode 37. Those ions that have penetrated past the grid intermediate electrode 37 before the TOF pulse occurs then experience the field between the grid intermediate electrode 37 and grid puller electrode 38. This field was originally designed to counteract penetration of the field from the downstream acceleration stage (i.e. the second stage of acceleration) into the pulsing region 34 between the pusher electrode 36 and the grid intermediate electrode 37, and is consequently repulsive to ions moving in the direction from grid intermediate electrode 37 to grid puller electrode 38. Therefore, ions penetrating past the grid intermediate electrode 37 will be stopped (i.e., in the TOF direction, or from grid intermediate electrode 37 to grid puller electrode 38) and will instead turn around to proceed back into the pulsing region 34 between the pusher electrode and the grid intermediate electrode. Without being limited to any particular theory, it is believed the artifact peaks are due to these ions that have turned around and continue to move in the opposite direction from the pulse acceleration direction (i.e., away from pusher electrode 36 towards grid intermediate electrode 37) when the TOF acceleration pulse occurs. These ions will then be focused in a similar fashion as the other primary beam ions, but will exhibit a turn-around effect, and will be focused in time at the detector slightly later than the primary beam ions that have not deviated from the primary axis 17 prior to the TOF acceleration pulse, thereby creating an artifact peak.
(32) These stray ions may be generated from the primary ion beam by, for example, normal focusing aberrations characteristics of electrostatic lenses (e.g., electrostatic lens assembly 29), ion beam space charge effects, or mechanical misalignments, etc.
(33) A Simion model was created that included three-dimensional grid wires with dimensions as close as possible to the actual device. Simion is charged particle simulation software commercially available from Scientific Instrument Services (Ringoes, N.J.). Computational constraints relating to array size limit a full 3D model of the pulse optics to a model mesh resolution of no finer than 100 m. While the actual grid has gird wires having cross-sectional dimensions of about 30 m, and an aspect ratio and spacing of 30200 lines/inch (lpi), the model was constructed with grid dimensions of 9.450.8 lpi, and grid wires having a cross-sectional dimension of 100 m.
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(35) Upon discovering that the artifact peaks 204, 205, 214, 215, 225, 226 and 227 in the spectra of
(36) The grids used on the grid intermediate electrode 37, grid puller electrode 38 and flight tube entrance grid 42 have different wire spacing in two orthogonal directions, creating rectangular apertures in the grid. Such rectangular apertures have been demonstrated to result in less ion scattering when a grid separates regions of different field strengths, resulting in higher transmission and resolving power, than with square mesh grids. Nonetheless, only the puller electrode 38 and the flight tube entrance grid 42 separate regions of differing field strength. Grid intermediate electrode 37 does not, in fact, separate regions of differing field strengths. Nonetheless, some embodiments use grid electrodes having rectangular apertures for all three grid electrodes. One way to achieve a finer grid density in the primary beam direction without any other consequences is to rotate the grid intermediate electrode 37 by 90. This approach avoids the introduction of a new grid with different dimensions, and is therefore preferable from a manufacturing cost perspective. However, this should not be construed as limiting the invention, as the grid spacings of this intermediate grid can just as effectively be different from that of the puller and flight tube entrance grids.
(37) An experiment was performed that validated this approach. A grid configuration was provided by simply rotating the conventional grid intermediate electrode 37 by 90 degrees, as illustrated in
(38) After this change in the orientation of intermediate electrode grid 57 was made, TOF spectra were acquired under essentially the same conditions and instrument settings as those used to acquire the TOF m/z spectra of
(39) This modification of the orientation of the grid intermediate electrode, that is, configuring the grid intermediate electrode grid so that closely-spaced wires of the intermediate electrode grid are oriented orthogonal to the primary ion beam axis 17, was repeated on a second instrument of the same design, and the improved results were essentially identical.
(40) The efficacy of this approach depends on the actual grazing angles of incidence that the stray primary beam ions make with the grid intermediate electrode; the spacing between the grid intermediate electrode wires that are oriented perpendicular to the primary ion beam axis; as well as the thickness of the intermediate electrode wires; all of which determine the line-of-sight of the stray ions through the apertures of the intermediate electrode grid. The line-of-sight of an ion is its trajectory when not subjected to further external fields.
(41) The orientation of grid intermediate electrode 57 and the pulse voltage arrangements ensure that the electric field is the same on either side of the intermediate grid during the period of pulse acceleration. Hence, essentially no grid scattering occurs at this intermediate grid, regardless of the grid wire spacing.
(42) The Simion calculation shown in
(43) Other embodiments are in the following claims.