PUMPING METHOD IN A SYSTEM FOR PUMPING AND SYSTEM OF VACUUM PUMPS

20170045051 · 2017-02-16

    Inventors

    Cpc classification

    International classification

    Abstract

    The present invention relates to a pumping method in a pumping system (SP, SPP) comprising: a primary lubricated rotary vane vacuum pump (3) with a gas inlet port (2) connected to a vacuum chamber (1) and a gas outlet port (4) leading into a conduit (5) before coming out into the gas outlet (8) of the pumping system (SP, SPP), a non-return valve (6) positioned in the conduit (5) between the gas outlet port (4) and the gas outlet (8), and an ejector (7) connected in parallel to the non-return valve (6). According to this method, the primary lubricated rotary vane vacuum pump (3) is set into action in order to pump the gases contained in the vacuum chamber (1) through the gas outlet port (4). Simultaneously the ejector (7) is fed with working fluid, and the ejector (7) continues to be fed with working fluid all the while that the primary lubricated rotary vane vacuum pump (3) pumps the gases contained in the vacuum chamber (1) and/or all the while that the primary lubricated rotary vane vacuum pump (3) maintains a defined pressure in the vacuum chamber (1). The present invention also relates to a pumping system (SP, SPP) able to be used to implement this method.

    Claims

    1. Pumping method in a pumping system (SP, SPP) comprising: a primary lubricated rotary vane vacuum pump (3) with a gas inlet port (2) connected to a vacuum chamber (1) and a gas outlet port (4) leading into a conduit (5) before coming out into the gas outlet (8) of the pumping system (SP, SPP), a non-return valve (6) positioned in the conduit (5) between the gas outlet port (4) and the gas outlet (8), and an ejector (7) connected in parallel to the non-return valve (6), the method being characterized in that the primary lubricated rotary vane vacuum pump (3) is set into action in order to pump the gases contained in the vacuum chamber (1) through the gas outlet port (4); simultaneously the ejector (7) is fed with working fluid; and the ejector (7) continues to be fed with working fluid all the while that the primary lubricated rotary vane vacuum pump (3) pumps the gases contained in the vacuum chamber (1) and/or all the while that the primary lubricated rotary vane vacuum pump (3) maintains a defined pressure in the vacuum chamber (1).

    2. Pumping method according to claim 1, characterized in that the outlet of the ejector (7) rejoins the conduit (5) after the non-return valve (6).

    3. Pumping method according to claim 1 or 2, characterized in that the ejector (7) is dimensioned so as to have a minimal consumption of working fluid.

    4. Pumping method according to any one of the claims 1 to 3, characterized in that the nominal flow rate of the ejector (7) is selected depending on the volume of the exit conduit (5) of the primary lubricated rotary vane vacuum pump (3) which is limited by the non-return valve (6).

    5. Pumping method according to claim 4, characterized in that the flow rate of the ejector is from 1/500 to 1/20 of the nominal flow rate of the primary lubricated rotary vane vacuum pump (3).

    6. Pumping method according to any one of the claims 1 to 5, characterized in that the working fluid of the ejector (7) is compressed air and/or nitrogen.

    7. Pumping method according to any one of the claims 1 to 6, characterized in that the ejector (7) is single-staged or multi-staged.

    8. Pumping method according to any one of the claims 1 to 7, characterized in that the non-return valve (6) closes when the pressure at the suction end of the primary lubricated rotary vane vacuum pump (3) is between 500 mbar absolute and the final vacuum.

    9. Pumping method according to any one of the claims 1 to 8, characterized in that the ejector (7) is made of material having elevated chemical resistance to substances and gases commonly used in the chemical industry and/or the semi-conductor industry.

    10. Pumping method according to any one of the claims 1 to 9, characterized in that the ejector (7) is integrated into a cartridge which incorporates the non-return valve (6).

    11. Pumping method according to claim 10, characterized in that the cartridge itself is accommodated in the oil separator of the primary lubricated rotary vane vacuum pump.

    12. Pumping method according to any one of the claims 1 to 11, characterized in that the flow of gas at the pressure necessary for operation of the ejector (7) is provided by a compressor (10).

    13. Pumping method according to claim 12, characterized in that the compressor (10) is driven by the primary lubricated rotary vane pump (3).

    14. Pumping method according to claim 12, characterized in that the compressor (10) is driven autonomously, independently of the primary lubricated rotary vane pump (3).

    15. Pumping method according to any one of the claims 12 to 14, characterized in that the compressor (10) suctions the atmospheric air or gases in the gas exit conduit (8) after the non-return valve (6).

    16. Pumping method according to any one of the claims 1 to 15, characterized in that at least one operating parameter is measured and used to start up or stop the ejector (7).

    17. Pumping method according to claim 16, characterized in that the at least one operating parameter is the motor current of the lubricated rotary vane vacuum pump 3, the pressure of the gases in the space of the exit conduit of the primary lubricated rotary vane vacuum pump limited by the non-return valve 6, the temperature of the gases in the space of the exit conduit of the primary lubricated rotary vane vacuum pump limited by the non-return valve 6 or a combination of these parameters.

    18. Pumping system (SP, SPP) comprising: a primary lubricated rotary vane vacuum pump (3) with a gas inlet port (2) connected to a vacuum chamber (1) and a gas outlet port (4) leading into a conduit (5) before coming out into the gas outlet (8) of the system of vacuum pumps (SP), a non-return valve (6) positioned in the conduit (5) between the gas outlet port (4) and the gas outlet (8), and an ejector (7) connected in parallel to the non-return valve (6), the pumping system (SP, SPP) being characterized in that the ejector (7) is arranged to be able to be fed with working fluid all the while that the primary lubricated rotary vane vacuum pump (3) pumps the gases contained in the vacuum chamber (1) and/or all the while that the primary lubricated rotary vane vacuum pump (3) maintains a defined pressure in the vacuum chamber (1).

    19. Pumping system according to claim 18, characterized in that the outlet of the ejector (7) rejoins the conduit (5) after the non-return valve (6).

    20. Pumping system according to claim 18 or 19, characterized in that the ejector (7) is dimensioned so as to have a minimal consumption of working fluid.

    21. Pumping system according to any one of the claims 18 to 20, characterized in that the nominal flow rate of the ejector (7) is selected depending on the volume of the exit conduit (5) of the primary lubricated rotary vane vacuum pump (3) which is limited by the non-return valve (6).

    22. Pumping system according to claim 21, characterized in that the flow rate of the ejector is from 1/500 to 1/20 of the nominal flow rate of the primary lubricated rotary vane vacuum pump (3).

    23. Pumping system according to any one of the claims 18 to 22, characterized in that the working fluid of the ejector (7) is compressed air and/or nitrogen.

    24. Pumping system according to any one of the claims 18 to 23, characterized in that the ejector (7) is single-staged or multi-staged.

    25. Pumping system according to any one of the claims 18 to 24, characterized in that the non-return valve (6) closes when the pressure at the suction end of the primary lubricated rotary vane vacuum pump (3) is between 500 mbar absolute and the final vacuum.

    26. Pumping system according to any one of the claims 18 to 25, characterized in that the ejector (7) is made of material having elevated chemical resistance to substances and gases commonly used in the chemical industry and/or the semi-conductor industry.

    27. Pumping system according to any one of the claims 18 to 26, characterized in that the ejector (7) is integrated into a cartridge which incorporates the non-return valve (6).

    28. Pumping system according to claim 27, characterized in that the cartridge itself is accommodated in the oil separator of the primary lubricated rotary vane vacuum pump.

    29. Pumping system according to any one of the claims 18 to 28, characterized in that the system comprises a compressor (10) which provides the flow of gas at the pressure necessary for operation of the ejector (7).

    30. Pumping system according to claim 29, characterized in that the compressor (10) is driven by the primary lubricated rotary vane pump (3).

    31. Pumping system according to claim 29, characterized in that the compressor (10) is driven autonomously, independently of the primary lubricated rotary vane pump (3).

    32. Pumping system according to any one of the claims 29 to 31, characterized in that the compressor (10) suctions the atmospheric air or gases in the gas exit conduit (8) after the non-return valve (6).

    33. Pumping system according to any one of the claims 18 to 32, characterized in that it comprises at least one sensor (11, 12, 13) for measuring at least one operating parameter and for using it in order to start up or stop the ejector (7).

    34. Pumping system according to claim 34, characterized in that the at least one operating parameter is the motor current of the lubricated rotary vane vacuum pump 3, the pressure of the gases in the space of the exit conduit of the primary lubricated rotary vane vacuum pump limited by the non-return valve 6, the temperature of the gases in the space of the exit conduit of the primary lubricated rotary vane vacuum pump limited by the non-return valve 6 or a combination of these parameters.

    Description

    BRIEF DESCRIPTION OF DRAWINGS

    [0025] The features and the advantages of the present invention will appear with more details within the context of the description which follows with example embodiments given by way of illustration and in a non-limiting way with reference to the attached drawings:

    [0026] FIG. 1 represents in a diagrammatic way a pumping system suitable for implementation of a pumping method according to a first embodiment of the present invention;

    [0027] FIG. 2 represents in a diagrammatic way a pumping system suitable for implementation of a pumping method according to a second embodiment of the present invention; and

    [0028] FIG. 3 represents in a diagrammatic way a pumping system suitable for implementation of a pumping method according to a third embodiment of the present invention.

    DETAILED DESCRIPTION OF EMBODIMENTS OF THE INVENTION

    [0029] FIG. 1 represents a pumping system SP suitable for implementing a pumping method according to a first embodiment of the present invention.

    [0030] This pumping system SP comprises a chamber 1, which is connected to a suction port 2 of a primary lubricated rotary vane vacuum pump 3. The gas outlet port of the primary lubricated rotary vane vacuum pump 3 is connected to a conduit 5. A non-return discharge valve 6 is placed in the conduit 5, which after this non-return valve 6 continues into a gas exit conduit 8. The non-return valve 6, when it is closed, allows the formation of a space 4, contained between the gas outlet port of the primary vacuum pump 3 and itself. The pumping system SP also comprises an ejector 7, connected in parallel to the non-return valve 6. The suction port of the ejector is connected to the space 4 of the conduit 5, and its discharge port is connected to the conduit 8. The feed conduit 9 provides the working fluid for the ejector 7.

    [0031] From the start of the primary lubricated rotary vane vacuum pump 3, the working fluid for the ejector 7 is injected through the feed conduit 9. Then the primary lubricated rotary vane vacuum pump 3 suctions the gases in the chamber 1 through the port 2 connected at its inlet and compresses them to discharge them afterwards at its outlet in the conduit 5 through the non-return valve 6. When the closure pressure for the non-return valve 6 is reached, it closes. Starting from this moment the pumping of the ejector 7 makes the pressure in the space 4 decrease progressively to the value of its limit pressure. In parallel, the power consumed by the primary lubricated rotary vane vacuum pump 3 decreases progressively. This takes place in a short time period, for example for a certain cycle in 5 to 10 seconds.

    [0032] With a clever adjustment of the flow rate of the ejector 7 and of the closure pressure of the non-return valve 6 as a function of the flow rate of the primary lubricated rotary vane vacuum pump 3 and the space of the chamber 1, it is moreover possible to reduce the time before the closure of the non-return valve 6 with respect to the duration of the evacuation cycle and thus reduce the losses in working fluid during this time of operation of the ejector 7 without effect on the pumping. Furthermore, these losses, which are minute, are taken into account in the evaluation of the energy consumption. On the other hand, the advantage of simplicity gives an excellent reliability to the system as well as a lower price in comparison with similar pumps equipped with programmable automatic control and/or speed controller, controlled valves, sensors, etc.

    [0033] FIG. 2 represents a pumping system SP suitable for implementation of a pumping method according to a second embodiment of the present invention.

    [0034] With respect to the system represented in FIG. 1, the system represented in FIG. 2 further comprises a compressor 10 which provides the flow of gas at the pressure necessary for the operation of the ejector 7. In effect, this compressor 10 can suction the atmospheric air or gases in the gas exit 8 after the non-return valve 6. Its presence renders the pumping system independent of a compressed gas source, which can meet the demands of certain industrial environments. The compressor 10 can be driven by the primary lubricated rotary vane pump 3 or by its own electric motor, thus in a manner completely independent from the pump 3. In all cases the consumption of energy of the compressor 10 when it provides the flow of gas at the pressure necessary in order to make the ejector 7 operate is substantially smaller compared with the benefit achieved in the consumption of energy of the main pump 3.

    [0035] FIG. 3 represents a system of vacuum pumps SPP suitable for implementing a pumping method according to a third embodiment of the present invention.

    [0036] With respect to the systems shown in FIGS. 1 and 2, the system represented in FIG. 3 corresponds to a controlled pumping system, which further comprises sensors 11, 12, 13 which control, for example, the motor current (sensor 11) of the primary lubricated rotary vane vacuum pump 3, the pressure (sensor 13) of gases in the space of the exit conduit of the primary lubricated rotary vane vacuum pump (limited by the non-return valve 6), the temperature (sensor 12) of gases in the space of the exit conduit of the primary lubricated rotary vane vacuum pump (limited by the non-return valve 6) or a combination of these parameters. In effect, when the primary lubricated rotary vane vacuum pump 3 starts to pump the gases of the vacuum chamber 1, these cited parameters (in particular the current of its motor, the temperature and the pressure of gases in the space of the exit conduit 4) begin to change and reach threshold values detected by the corresponding sensors 11, 12, 13. This causes the startup of the ejector 7 (after a certain time lag). When these parameters return to the initial ranges (outside the set values) the ejector is stopped (again after a certain time lag). Of course the controlled pumping system SSP can have as compressed gas source a supply network or a compressor 10 in the conditions described in FIG. 2.

    [0037] Certainly the present invention is subject to numerous variations regarding its implementation. Although diverse embodiments have been described, it is well understood that it is not conceivable to identify in an exhaustive way all the possible embodiments. Of course replacing a described means with an equivalent means can be envisaged without departing from the scope of the present invention. All these modifications form part of the common knowledge of one skilled in the art in the field of vacuum technology.