LIQUID-CRYSTALLINE MEDIUM

Abstract

A liquid-crystalline medium which comprises at least one compound selected from the group of compounds of the formulae IA to IH,

##STR00001##

in which Z.sup.1 denotes a single bond, —CH.sub.2CH.sub.2—, —CH═CH—, —CH.sub.2O—, —OCH.sub.2—, —CF.sub.2O—, —OCF.sub.2—, —COO—, —OCO—, —C.sub.2F.sub.4—, —(CH.sub.2).sub.4—, —CHFCHF—, —CF.sub.2CH.sub.2—, —CH.sub.2CF.sub.2—, —C≡C—, —CF═CF—, —CH═CHCHO— or —CH.sub.2CF.sub.2O—,
and the use thereof for an active-matrix display, in particular based on the VA, PSA, PS-VA, PALC, FFS, PS-FFS, SA-VA, PS-IPS or IPS effect.

Claims

1. A liquid-crystalline medium comprising: at least one compound selected from the group of the compounds of the formulae IA to IH, ##STR00635## in which Z.sup.1 denotes a single bond, —CH.sub.2CH.sub.2—, —CH═CH—, —CH.sub.2O—, —OCH.sub.2, —CF.sub.2O—, —OCF.sub.2—, —COO—, —OCO—, —C.sub.2F.sub.4—, —(CH.sub.2).sub.4—, —CHFCHF—, —CF.sub.2CH.sub.2—, —CH.sub.2CF.sub.2—, —C≡C—, —CF═CF—, —CH═CHCHO— or —CH.sub.2CF.sub.2O—; at least one compound selected from the compounds of the formulae IIA and IIB: ##STR00636## in which R.sup.2A, R.sup.2B and R.sup.2C each, independently of one another, denote H, an alkyl or alkenyl radical having up to 15 C atoms which is unsubstituted, monosubstituted by CN or CF.sub.3 or at least monosubstituted by halogen, where, in addition, one or more CH.sub.2 groups in these radicals may be replaced by —O—, —S—, ##STR00637##  —C≡C—, —CF.sub.2O—, —OCF.sub.2—, —OC—O— or —O—CO— in such a wav that O atoms are not linked directly to one another, a cyclopropyl ring, cyclobutyl ring or cyclopentyl ring, L.sup.1-4 each, independently of one another, denote F, Cl, CF.sub.3 or CHF.sub.2, L.sup.5 is CH.sub.3, Z.sup.2 and Z.sup.2′ each, independently of one another, denote a single bond, —CH.sub.2CH.sub.2—, —CH═CH—, —CF.sub.2O—, —OCF.sub.2—, —CH.sub.2O—, —OCH.sub.2—, —COO—, —OCO—, —C.sub.2F.sub.4—, —CF═CF—, —C≡C— or —CH═CHCH.sub.2O—, p denotes 0, 1 or 2, g denotes 0 or 1, and v denotes 1 to 6; and wherein the medium has a negative dielectric anisotropy, Δε.

2. The liquid-crystalline medium according to claim 1, which comprises at least one compound of at least one of the following formulae: ##STR00638## ##STR00639##

3. The liquid-crystalline medium according to claim 1, wherein the proportion of the compound(s) of the formulae IA to IH in the medium as a whole is 1-50% by weight.

4. The liquid-crystalline medium according to claim 1, which additionally comprises one or more compounds selected from the group of the compounds of the formulae IIA, IIB and IIC, ##STR00640## in which R.sup.2A, R.sup.2B and R.sup.2C each, independently of one another, denote H, an alkyl or alkenyl radical having up to 15 C atoms which is unsubstituted, monosubstituted by CN or CF.sub.3 or at least monosubstituted by halogen, where, in addition, one or more CH.sub.2 groups in these radicals may be replaced by —O—, —S—, ##STR00641##  —C≡C—, —CF.sub.2O—, —OCF.sub.2—, —OC—O— or —O—CO— in such a way that O atoms are not linked directly to one another, a cyclopropyl ring, cyclobutyl ring or cyclopentyl ring, L.sup.1-4 each, independently of one another, denote F, Cl, CF.sub.3 or CHF.sub.2, Z.sup.2 and Z.sup.2′ each, independently of one another, denote a single bond, —CH.sub.2CH.sub.2—, —CH═CH—, —CF.sub.2O—, —OCF.sub.2—, —CH.sub.2O—, —OCH.sub.2—, —COO—, —OCO—, —C.sub.2F.sub.4—, —CF═CF—, —C≡C— or —CH═CHCH.sub.2O—, p denotes 0, 1 or 2, q denotes 0 or 1, and v denotes 1 to 6.

5. The liquid-crystalline medium according to claim 1, wherein the medium additionally comprises one or more compounds of the formula III, ##STR00642## in which R.sup.31 and R.sup.32 each, independently of one another, denote a straight-chain alkyl, alkenyl, alkoxy, alkoxyalkyl or alkenyloxy radical having up to 12 C atoms, ##STR00643## denotes ##STR00644##  and Z.sup.3 denotes a single bond, —CH.sub.2CH.sub.2—, —CH═CH—, —CF.sub.2O—, —OCF.sub.2—, —CH.sub.2O—, —OCH.sub.2—, —COO—, —OCO—, —C.sub.2F.sub.4—, —C.sub.4H.sub.9—, —C≡C— or —CF═CF—.

6. The liquid-crystalline medium according to claim 1, wherein the medium additionally comprises one or more compounds of the formulae L-1 to L-11, ##STR00645## ##STR00646## in which R, R.sup.1 and R.sup.2 each, independently of one another, denote H, an alkyl or alkenyl radical having up to 15 C atoms which is unsubstituted, monosubstituted by CN or CF.sub.3 or at least monosubstituted by halogen, where, in addition, one or more CH.sub.2 groups in these radicals may be replaced by —O—, —S—, ##STR00647##  —C≡C—, —OC—, —CF.sub.2O—, —OCF.sub.2—, —OC—O— or —O—CO— in such a way that O atoms are not linked directly to one another, a cyclopropyl ring, cyclobutyl ring or cyclopentyl ring, alkyl denotes an alkyl radical having 1-6 C atoms, and s denotes 1 or 2.

7. The liquid-crystalline medium according to claim 1, wherein the medium additionally comprises one or more terphenyls of the formulae T-1 to T-22, ##STR00648## ##STR00649## ##STR00650## in which R denotes a straight-chain alkyl or alkoxy radical having 1-7 C atoms, m denotes 0, 1, 2, 3, 4, 5 or 6, and n denotes 0, 1, 2, 3 or 4.

8. The liquid-crystalline medium according to claim 1, wherein the medium additionally comprises one or more compounds of the formulae O-1 to O-17, ##STR00651## ##STR00652## in which R.sup.1 and R.sup.2 each, independently of one another, denote H, an alkyl or alkenyl radical having up to 15 C atoms which is unsubstituted, monosubstituted by CN or CF.sub.3 or at least monosubstituted by halogen, where, in addition, one or more CH.sub.2 groups in these radicals may be replaced by —O—, —S—, ##STR00653##  —C≡C—, —CF.sub.2O—, —OCF.sub.2—, —OC—O— or —O—CO— in such a way that O atoms are not linked directly to one another, a cyclopropyl ring, cyclobutyl ring or cyclopentyl ring.

9. The liquid-crystalline medium according to claim 1, wherein the medium additionally comprises one or more compounds selected from the group of the compounds of the formulae BC, CR, PH-1, PH-2, BF-1, BF-2, BS-1 and BS-2, ##STR00654## in which R.sup.B1, R.sup.B2, R.sup.CR1, R.sup.CR2, R.sup.1, R.sup.2 each, independently of one another, denote H, an alkyl or alkenyl radical having up to 15 C atoms which is unsubstituted, monosubstituted by CN or CF.sub.3 or at least monosubstituted by halogen, where, in addition, one or more CH.sub.2 groups in these radicals may be replaced by —O—, —S—, ##STR00655##  —C≡C—, —CF.sub.2O—, —OCF.sub.2—, —OC—O— or —O—CO— in such a way that O atoms are not linked directly to one another, a cyclopropyl ring, cyclobutyl ring or cyclopentyl ring, c denotes 0, 1 or 2 and d denotes 1 or 2.

10. The liquid-crystalline medium according to claim 1, wherein the medium additionally comprises one or more compounds of the following formulae: ##STR00656## ##STR00657## ##STR00658## ##STR00659##

11. The liquid-crystalline medium according to claim 1, wherein the medium comprises 5-60% of the compound of the following formula: ##STR00660##

12. The liquid-crystalline medium according to claim 1, wherein the medium additionally comprises one or more compounds selected from the group of the compounds of the formulae P-1 to P-5, ##STR00661## in which R denotes straight-chain alkyl, alkoxy or alkenyl, each having 1 or 2 to 6 C atoms respectively, and X denotes F, Cl, CF.sub.3, OCF.sub.3, OCHFCF.sub.3 or CCF.sub.2CHFCF.sub.3.

13. The liquid-crystalline medium according to claim 1, wherein the medium additionally comprises one or more compounds selected from the group of the compounds of the following formulae: ##STR00662## ##STR00663## in which R denotes a straight-chain alkyl or alkoxy radical having 1-7 C atoms, m denotes 0, 1, 2, 3, 4, 5 or 6, n denotes 0, 1, 2, 3 or 4, R.sup.1, R.sup.2 each, independently of one another, denote H, an alkyl or alkenyl radical having up to 15 C atoms which is unsubstituted, monosubstituted by CN or CF.sub.3 or at least monosubstituted by halogen, where, in addition, one or more CH.sub.2 groups in these radicals may be replaced by —O—, —S—, ##STR00664##  —C≡C—, —CF.sub.2O—, —OCF.sub.2—, —OC—O— or —O—CO— in such a way that O atoms are not linked directly to one another, a cyclopropyl ring, cyclobutyl ring or cyclopentyl ring, c denotes 0, 1 or 2 d denotes 1 or 2, R and R.sup.10 each, independently of one another, denote H, an alkyl or alkenyl radical having up to 15 C atoms which is unsubstituted, monosubstituted by CN or CF.sub.3 or at least monosubstituted by halogen, where, in addition, one or more CH.sub.2 groups in these radicals may be replaced by —O—, —S—, ##STR00665##  —C≡C—, —CF.sub.2O—, —OCF.sub.2—, —OC—O— or —O—CO— in such a way that O atoms are not linked directly to one another, a cyclopropyl ring, cyclobutyl ring or cyclopentyl ring, alkyl and alkyl* each, independently of one another, denote a straight-chain alkyl radical having 1-6 C atoms, alkenyl and alkenyl* each, independently of one another, denote a straight-chain alkenyl radical having 2-6 C atoms, and x denotes 1 to 6.

14. The liquid-crystalline medium according to claim 1, wherein the medium comprises the compound of the formula CC-4-V1 and the compound of the formula CC-3-V1: ##STR00666##

15. The liquid-crystalline medium according to claim 1, wherein the medium comprises at least one polymerisable compound.

16. The liquid-crystalline medium according to claim 1, wherein the medium further comprises one or more additives.

17. The liquid-crystalline medium according to claim 16, wherein the additive is a free-radical scavenger, antioxidant, dopant and/or UV stabiliser.

18. A process for the preparation of a liquid-crystalline medium according to claim 1, comprising mixing at least one compound of the formulae IA to IH with at least one compound of the formula IIA or IIB of claim 1 and with at least one further compound wherein the further compound is a mesogenic compound, and optionally further mixing one or more additives and optionally further mixing at least one polymerisable compound.

19. An electro-optical display having active-matrix addressing, which comprises, as dielectric, a liquid-crystalline medium according to claim 1.

20. The electro-optical display according to claim 19, which is a VA, PSA, PA-VA, PS-VA, SA-VA, SS-VA, PALC, IPS, PS-IPS, FFS, UB-FFS or PS-FFS display.

21. The electro-optical display according to claim 20, which is an IPS, PS-IPS, FFS or PS-FFS display which has a planar alignment layer.

22. The liquid-crystalline medium according to claim 1, wherein the medium has a negative dielectric anisotropy, Δε, of less than −0.5.

23. The liquid-crystalline medium according to claim 1, wherein the medium has a negative dielectric anisotropy, Δε, of −0.5 to −8.0.

24. The liquid-crystalline medium according to claim 1, wherein the medium further comprises one or more compounds of the following formulae: ##STR00667## ##STR00668## ##STR00669## ##STR00670## ##STR00671## ##STR00672## ##STR00673## ##STR00674## ##STR00675## ##STR00676## ##STR00677## ##STR00678## in which alkyl and alkyl* each, independently of one another, denote a straight-chain alkyl radical having 1-6 C atoms, and alkenyl and alkenyl* each, independently of one another, denote a straight-chain alkenyl radical having 2-6 C atoms.

25. The liquid-crystalline medium according to claim 1, wherein the medium comprises one or more compounds of formula IIA or IIB of claim 1, which are of the following formulae: ##STR00679## ##STR00680## ##STR00681## in which alkyl and alkyl* each, independently of one another, denote a straight-chain alkyl radical having 1-6 C atoms, and alkenyl denotes a straight-chain alkenyl radical having 2-6 C atoms.

26. The liquid-crystalline medium according to claim 1, wherein the medium further comprises one or more stabilizer compounds of the following formulae: ##STR00682## ##STR00683## ##STR00684## ##STR00685## ##STR00686## ##STR00687## ##STR00688## ##STR00689## ##STR00690##

27. The liquid-crystalline medium according to claim 1, wherein the medium further comprises one or more reactive mesogen compounds of the following formulae: ##STR00691## ##STR00692## ##STR00693## ##STR00694## ##STR00695## ##STR00696## ##STR00697## ##STR00698## ##STR00699## ##STR00700## ##STR00701## ##STR00702## ##STR00703## ##STR00704## ##STR00705##

28. The liquid-crystalline medium according to claim 1, wherein the medium further comprises one or more SA-VA compounds of the following formulae: ##STR00706##

Description

WORKING EXAMPLES

[0301] The following examples are intended to explain the invention without limiting it. In the examples, m.p. denotes the melting point and C denotes the clearing point of a liquid-crystalline substance in degrees Celsius; boiling temperatures are denoted by m.p. Furthermore:

[0302] C denotes crystalline solid state, S denotes smectic phase (the index denotes the phase type), N denotes nematic state, Ch denotes cholesteric phase, I denotes isotropic phase, T.sub.g denotes glass-transition temperature. The number between two symbols indicates the conversion temperature in Celsius an.

[0303] The host mixture used for determination of the optical anisotropy Δn of the compounds of the formulae IA to IH is the commercial mixture ZLI-4792 (Merck KGaA). The dielectric anisotropy Δε is determined using commercial mixture ZLI-2857. The physical data of the compound to be investigated are obtained from the change in the dielectric constants of the host mixture after addition of the compound to be investigated and extrapolation to 100% of the compound employed. In general, 10% of the compound to be investigated are dissolved in the host mixture, depending on the solubility.

[0304] Unless indicated otherwise, parts or percent data denote parts by weight or percent by weight.

[0305] Above and below: [0306] V.sub.o denotes threshold voltage, capacitive [V] at 20° C., [0307] n.sub.e denotes extraordinary refractive index at 20° C. and 589 nm, [0308] n.sub.0 denotes ordinary refractive index at 20° C. and 589 nm, [0309] Δn denotes optical anisotropy at 20° C. and 589 nm, [0310] ε.sub.⊥ denotes dielectric permittivity perpendicular to the director at 20° C. and 1 kHz, [0311] ε.sub.∥ denotes dielectric permittivity parallel to the director at 20° C. and 1 kHz, [0312] Δε denotes dielectric anisotropy at 20° C. and 1 kHz, [0313] cl.p., T(N,I) denotes clearing point [° C.], [0314] γ.sub.1 denotes rotational viscosity measured at 20° C. [mPa.Math.s], determined by the rotation method in a magnetic field, [0315] K.sub.1 denotes elastic constant, “splay” deformation at 20° C. [pN], [0316] K.sub.2 denotes elastic constant, “twist” deformation at 20° C. [pN], [0317] K.sub.3 denotes elastic constant, “bend” deformation at 20° C. [pN], [0318] LTS denotes low-temperature stability (nematic phase), determined in a bulk sample.

[0319] Unless explicitly noted otherwise, all values indicated in the present application for temperatures, such as, for example, the melting point T(C,N), the transition from the smectic (S) to the nematic (N) phase T(S,N) and the clearing point T(N,I), are indicated in degrees Celsius (° C.). M.p. denotes melting point, cl.p.=clearing point. Furthermore, Tg=glass state, C=crystalline state, N=nematic phase, S=smectic phase and I=isotropic phase. The numbers between these symbols represent the transition temperatures.

[0320] The term “threshold voltage” for the present invention relates to the capacitive threshold (V.sub.0), also called the Freedericksz threshold, unless explicitly indicated otherwise. In the examples, as is generally usual, the optical threshold can also be indicated for 10% relative contrast (V.sub.10).

[0321] The display used for measurement of the capacitive threshold voltage consists of two plane-parallel glass outer plates at a separation of 20 μm, which each have on the insides an electrode layer and an unrubbed polyimide alignment layer on top, which cause a homeotropic edge alignment of the liquid-crystal molecules.

[0322] The display or test cell used for measurement of the tilt angle consists of two plane-parallel glass outer plates at a separation of 4 μm, which each have on the insides an electrode layer and a polyimide alignment layer on top, where the two polyimide layers are rubbed antiparallel to one another and cause a homeotropic edge alignment of the liquid-crystal molecules.

[0323] The polymerisable compounds are polymerised in the display or test cell by irradiation with UVA light (usually 365 nm) of a defined intensity for a pre-specified time, with a voltage simultaneously being applied to the display (usually 10 V to 30 V alternating current, 1 kHz). In the examples, unless indicated otherwise, a 50 mW/cm.sup.2 mercury vapour lamp is used, and the intensity is measured using a standard UV meter (make Ushio UNI meter) fitted with a 365 nm band-pass filter.

[0324] The tilt angle is determined by a rotational crystal experiment (Autronic-Melchers TBA-105). A low value (i.e. a large deviation from the 90° angle) corresponds to a large tilt here.

[0325] The VHR value is measured as follows: 0.3% of a polymerisable monomeric compound are added to the LC host mixture, and the resultant mixture is introduced into TN-VHR test cells (rubbed at 90°, alignment layer TN polyimide, layer thickness d 6 μm). The HR value is determined after 5 min at 100° C. before and after UV exposure for 2 h (sun test) at 1 V, 60 Hz, 64 ρs pulse (measuring instrument: Autronic-Melchers VHRM-105).

[0326] In order to investigate the low-temperature stability, also known as “LTS”, i.e. the stability of the LC mixture to spontaneous crystallisation-out of individual components at low temperatures, bottles containing 1 g of LC/RM mixture are stored at −10° C., and it is regularly checked whether the mixtures have crystallised out.

[0327] The so-called “HTP” denotes the helical twisting power of an optically active or chiral substance in an LC medium (in μm). Unless indicated otherwise, the HTP is measured in the commercially available nematic LC host mixture MLD-6260 (Merck KGaA) at a temperature of 20° C.

[0328] Unless explicitly noted otherwise, all concentrations in the present application are indicated in percent by weight and relate to the corresponding mixture as a whole, comprising all solid or liquid-crystalline components, without solvents. All physical properties are determined in accordance with “Merck Liquid Crystals, Physical Properties of Liquid Crystals”, Status November 1997, Merck KGaA, Germany, and apply for a temperature of 20° C., unless explicitly indicated otherwise.

[0329] The following mixture examples having negative dielectric anisotropy are suitable, in particular, for liquid-crystal displays which have at least one planar alignment layer, such as, for example, IPS and FFS displays, in particular UB-FFS (=ultra-bright FFS), and for VA displays.

MIXTURE EXAMPLES

Example M1

[0330]

TABLE-US-00008 BCH-32 8.00% Clearing point [° C.]: 76 CC-3-V1 9.00% Δn [589 nm, 20° C.]: 0.1096 CC-3-V2 17.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCP-3-1 4.50% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CCP-V2-1 4.50% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O1 4.00% K.sub.1 [pN, 20° C.]: 14.9 CCY-3-O2 10.50% K.sub.3 [pN, 20° C.]: 17.1 CLY-3-O2 1.00% V.sub.0 [pN, 20° C.]: 2.42 CPY-3-O2 4.50% γ.sub.1 [mPa s, 20° C.]: 111 CY-3-O2 15.50% LTS bulk [−20° C.]: >1000 h PCH-301 3.50% PY-3-O2 18.00%

Example M2

[0331]

TABLE-US-00009 B(S)-2O-O5 4.00% Clearing point [° C.]: 74.5 B(S)-2O-O4 3.00% Δn [589 nm, 20° C.]: 0.1098 BCH-32 6.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-3-V1 6.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CC-3-V2 22.00% Δε [1 kHz, 20° C.]: −3.1 CCP-3-1 11.50% K.sub.1 [pN, 20° C.]: 15.1 CCY-3-O2 10.50% K.sub.3 [pN, 20° C.]: 16.1 CLY-3-O2 1.00% V.sub.0 [pN, 20° C.]: 2.43 CY-3-O2 12.50% γ.sub.1 [mPa s, 20° C.]: 96 PCH-3O1 8.50% LTS bulk [−20° C.]: >1000 h PY-3-O2 12.00% PYP-2-3 3.00%

Example M3

[0332]

TABLE-US-00010 CC-3-V1 9.00% Clearing point [° C.]: 74.5 CC-3-V2 10.00% Δn [589 nm, 20° C.]: 0.1089 CCP-V2-1 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-3O1 3.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CCH-34 8.00% Δε [1 kHz, 20° C.]: −3.1 BCH-32 3.50% K.sub.1 [pN, 20° C.]: 14.1 CLY-3-O2 10.00% K.sub.3 [pN, 20° C.]: 16.0 CPY-2-O2 3.00% V.sub.0 [pN, 20° C.]: 2.40 CPY-3-O2 9.50% γ.sub.1 [mPa s, 20° C.]: 97 CY-3-O2 8.00% PY-1-O2 6.50% PCH-3O1 17.50% B(S)-2O-O5 4.00% B(S)-2O-O4 3.00%

Example M4

[0333]

TABLE-US-00011 B-2O-O5 4.00% Clearing point [° C.]: 74.5 BCH-32 8.00% Δn [589 nm, 20° C.]: 0.1096 CC-3-V1 9.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-3-V2 17.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCP-3-1 8.00% Δε [1 kHz, 20° C.]: −3.2 CCP-V2-1 5.00% K.sub.1 [pN, 20° C.]: 14.8 CCY-3-O2 10.50% K.sub.3 [pN, 20° C.]: 16.7 CLY-3-O2 1.00% V.sub.0 [pN, 20° C.]: 2.43 CPY-3-O2 2.50% γ.sub.1 [mPa s, 20° C.]: 104 CY-3-O2 14.00% LTS bulk [−20° C.]: >1000 h PCH-301 5.50% PY-3-O2 15.50%

Example M5

[0334]

TABLE-US-00012 B(S)-2O-O5 4.00% Clearing point [° C.]: 74.5 B(S)-2O-O4 3.00% Δn [589 nm, 20° C.]: 0.1096 BCH-32 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-3-V1 9.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CC-3-V2 17.00% Δε [1 kHz, 20° C.]: −3.2 CCP-3-1 10.50% K.sub.1 [pN, 20° C.]: 14.6 CCP-V2-1 5.00% K.sub.3 [pN, 20° C.]: 16.3 CCY-3-O2 8.00% V.sub.0 [pN, 20° C.]: 2.40 CLY-3-O2 1.00% γ.sub.1 [mPa s, 20° C.]: 94 CY-3-O2 15.00% LTS bulk [−20° C.]: >1000 h PCH-3O1 6.00% PY-1-O2 6.50% PY-2-O2 7.00%

Example M6

[0335]

TABLE-US-00013 CC-3-V1 7.00% Clearing point [° C.]: 74.5 CC-3-V2 17.00% Δn [589 nm, 20° C.]: 0.0992 CCH-34 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-35 7.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CCP-3-1 6.50% Δε [1 kHz, 20° C.]: −3.6 CCY-3-O2 11.00% K.sub.1 [pN, 20° C.]: 15.1 CPY-2-O2 3.00% K.sub.3 [pN, 20° C.]: 16.6 CPY-3-O2 11.00% V.sub.0 [pN, 20° C.]: 2.28 CY-3-O2 15.50% γ.sub.1 [mPa s, 20° C.]: 108 CY-3-O4 7.00% LTS bulk [−20° C.]: >1000 h PY-3-O2 11.00%

Example M7

[0336]

TABLE-US-00014 CC-3-V1 8.00% Clearing point [° C.]: 74 CC-3-V2 16.50% Δn [589 nm, 20° C.]: 0.0999 CCH-34 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCH-35 4.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.2 CCP-3-1 14.00% Δε [1 kHz, 20° C.]: −3.5 CCY-3-O1 6.50% K.sub.1 [pN, 20° C.]: 15.7 CCY-3-O2 10.00% K.sub.3 [pN, 20° C.]: 16.2 CPY-3-O2 2.00% V.sub.0 [pN, 20° C.]: 2.27 CY-3-O2 10.00% γ.sub.1 [mPa s, 20° C.]: 95 B(S)-2O-O5 4.00% B(S)-2O-O4 3.00% PP-1-3 3.50% Y-4O-O4 4.50% PY-1-O2 7.00% PY-2-O2 2.00%

Example M8

[0337]

TABLE-US-00015 BCH-32 8.00% Clearing point [° C.]: 75 CC-3-V1 9.00% Δn [589 nm, 20° C.]: 0.1096 CC-4-V1 17.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCP-3-1 3.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CCP-V2-1 5.00% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O1 3.50% K.sub.1 [pN, 20° C.]: 14.5 CCY-3-O2 10.50% K.sub.3 [pN, 20° C.]: 16.8 CLY-3-O2 1.00% V.sub.0 [pN, 20° C.]: 2.41 CPY-3-O2 4.50% γ.sub.1 [mPa s, 20° C.]: 111 CY-3-O2 15.50% LTS bulk [−20° C.]: >1000 h PCH-3O1 5.00% PY-3-O2 18.00%

Example M9

[0338]

TABLE-US-00016 CC-3-V1 5.50% Clearing point [° C.]: 75 CC-4-V1 10.00% Δn [589 nm, 20° C.]: 0.1094 CCP-V2-1 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-3O1 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CCH-34 5.00% Δε [1 kHz, 20° C.]: −3.1 CCH-35 5.00% K.sub.1 [pN, 20° C.]: 14.2 BCH-32 3.50% K.sub.3 [pN, 20° C.]: 15.9 CLY-3-O2 10.00% V.sub.0 [pN, 20° C.]: 2.40 CPY-2-O2 3.00% γ.sub.1 [mPa s, 20° C.]: 99 CPY-3-O2 9.50% LTS bulk [−20° C.]: >1000 h CY-3-O2 6.00% PY-1-O2 8.00% PCH-301 17.50% B(S)-2O-O5 4.00% B(S)-2O-O4 3.00%

Example M10

[0339]

TABLE-US-00017 B-2O-O5 4.00% Clearing point [° C.]: 74.5 BCH-32 8.00% Δn [589 nm, 20° C.]: 0.1093 CC-3-V1 9.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-4-V1 17.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CCP-3-1 7.50% Δε [1 kHz, 20° C.]: −3.2 CCP-V2-1 5.00% K.sub.1 [pN, 20° C.]: 14.4 CCY-3-O2 10.00% K.sub.3 [pN, 20° C.]: 16.6 CLY-3-O2 1.00% V.sub.0 [pN, 20° C.]: 2.42 CPY-3-O2 2.50% γ.sub.1 [mPa s, 20° C.]: 104 CY-3-O2 15.00% PCH-301 6.00% PY-3-O2 15.00%

Example M11

[0340]

TABLE-US-00018 B-2O-O5 4.00% Clearing point [° C.]: 75.5 BCH-32 8.00% Δn [589 nm, 20° C.]: 0.1088 CC-3-V1 9.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-4-V1 23.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CCP-3-1 6.50% Δε [1 kHz, 20° C.]: −3.2 CCP-V2-1 5.00% K.sub.1 [pN, 20° C.]: 15.2 CCY-3-O2 8.00% K.sub.3 [pN, 20° C.]: 16.6 CLY-3-O2 1.00% V.sub.0 [pN, 20° C.]: 2.43 CPY-3-O2 3.50% γ.sub.1 [mPa s, 20° C.]: 104 CY-3-O2 16.00% LTS bulk [−20° C.]: >1000 h PY-3-O2 16.00%

Example M12

[0341]

TABLE-US-00019 B(S)-2O-O5 4.00% Clearing point [° C.]: 75.5 B(S)-2O-O4 3.00% Δn [589 nm, 20° C.]: 0.1100 BCH-32 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-3-V1 9.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CC-4-V1 23.00% Δε [1 kHz, 20° C.]: −3.2 CCP-3-1 9.00% K.sub.1 [pN, 20° C.]: 15.5 CCP-V2-1 5.00% K.sub.3 [pN, 20° C.]: 16.2 CCY-3-O2 6.00% V.sub.0 [pN, 20° C.]: 2.38 CLY-3-O2 1.00% γ.sub.1 [mPa s, 20° C.]: 98 CY-3-O2 15.50% LTS bulk [−20° C.]: >1000 h PY-3-O2 14.00% PY-1-O4 2.50%

Example M13

[0342]

TABLE-US-00020 B(S)-2O-O5 4.00% Clearing point [° C.]: 75 B(S)-2O-O4 3.00% Δn [589 nm, 20° C.]: 0.1095 BCH-32 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-3-V1 9.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CC-4-V1 23.00% Δε [1 kHz, 20° C.]: −3.1 CCP-3-1 10.50% K.sub.1 [pN, 20° C.]: 14.6 CCP-V2-1 5.00% K.sub.3 [pN, 20° C.]: 15.9 CCY-3-O2 5.00% V.sub.0 [pN, 20° C.]: 2.39 CLY-3-O2 1.00% γ.sub.1 [mPa s, 20° C.]: 92 CY-3-O2 15.50% LTS bulk [−20° C.]: >1000 h PY-1-O2 8.00% PY-2-O2 8.00%

Example M14

[0343]

TABLE-US-00021 CC-3-V1 5.00% Clearing point [° C.]: 109.6 CC-4-V1 5.00% Δn [589 nm, 20° C.]: 0.0976 CCH-301 8.50% ε.sub.∥ [1 kHz, 20° C.]: 3.4 CCH-303 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CCH-501 3.00% Δε [1 kHz, 20° C.]: −3.5 CCP-3-1 6.00% K.sub.1 [pN, 20° C.]: 17.5 CCPC-33 2.00% K.sub.3 [pN, 20° C.]: 20.2 CCY-3-O1 5.00% V.sub.0 [pN, 20° C.]: 2.55 CCY-3-O2 9.00% γ.sub.1 [mPa s, 20° C.]: 206 CCY-3-O3 7.00% CCY-4-O2 8.00% CCY-5-O2 5.00% CPY-2-O2 6.00% CPY-3-O2 10.00% CY-3-O2 5.50% PCH-301 10.00%

Example M15

[0344]

TABLE-US-00022 CC-3-V1 7.50% Clearing point [° C.]: 74.5 CC-4-V1 19.50% Δn [589 nm, 20° C.]: 0.0982 CCH-34 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCH-35 4.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CCP-3-1 12.50% Δε [1 kHz, 20° C.]: −3.4 CCY-3-O1 6.00% K.sub.1 [pN, 20° C.]: 15.5 CCY-3-O2 10.50% K.sub.3 [pN, 20° C.]: 15.8 CPY-3-O2 2.00% V.sub.0 [pN, 20° C.]: 2.26 CY-3-O2 9.00% γ.sub.1 [mPa s, 20° C.]: 94 B(S)-2O-O5 4.00% LTS bulk [−20° C.]: >1000 h B(S)-2O-O4 3.00% PP-1-3 3.00% Y-4O-O4 5.00% PY-1-O2 6.00% PY-2-O2 3.00%

Example M16

[0345]

TABLE-US-00023 B(S)-2O-O5 4.00% Clearing point [° C.]: 75 B(S)-2O-O4 3.00% Δn [589 nm, 20° C.]: 0.1094 BCH-32 7.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-3-V1 9.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CC-3-V2 11.00% Δε [1 kHz, 20° C.]: −3.1 CC-4-V1 12.00% K.sub.1 [pN, 20° C.]: 15.6 CCP-3-1 10.00% K.sub.3 [pN, 20° C.]: 16.1 CCP-V2-1 5.00% V.sub.0 [pN, 20° C.]: 2.40 CCY-3-O2 5.50% γ.sub.1 [mPa s, 20° C.]: 94 CLY-3-O2 1.00% LTS bulk [−20° C.]: >1000 h CY-3-O2 15.00% PY-3-O2 14.00% PY-1-O4 3.00%

Example M17

[0346]

TABLE-US-00024 B(S)-2O-O5 4.00% Clearing point [° C.]: 74 B(S)-2O-O4 3.00% Δn [589 nm, 20° C.]: 0.1091 BCH-32 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-3-V1 7.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CC-3-V2 10.00% Δε [1 kHz, 20° C.]: −3.0 CC-4-V1 15.00% K.sub.1 [pN, 20° C.]: 15.3 CCP-3-1 10.50% K.sub.3 [pN, 20° C.]: 15.7 CCP-V2-1 5.00% V.sub.0 [pN, 20° C.]: 2.40 CCY-3-O2 4.50% γ.sub.1 [mPa s, 20° C.]: 94 CLY-3-O2 1.00% CY-3-O2 15.50% PY-3-O2 14.00% PY-1-O4 2.50%

Example M18

[0347]

TABLE-US-00025 CC-3-V1 5.00% Clearing point [° C.]: 75 CC-4-V1 23.00% Δn [589 nm, 20° C.]: 0.0985 CC-3-V2 14.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCY-3-O1 7.50% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CCY-3-O2 11.00% Δε [1 kHz, 20° C.]: −3.6 CPY-3-O2 9.50% K.sub.1 [pN, 20° C.]: 14.7 CY-3-O2 15.50% K.sub.3 [pN, 20° C.]: 16.4 PY-3-O2 5.50% V.sub.0 [pN, 20° C.]: 2.27 PY-1-O2 9.00% γ.sub.1 [mPa s, 20° C.]: 102

Example M19

[0348]

TABLE-US-00026 PCH-302 8.00% Clearing point [° C.]: 76.5 CC-3-V1 9.00% Δn [589 nm, 20° C.]: 0.1017 CC-3-V2 11.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-4-V1 12.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCP-V-1 2.50% Δε [1 kHz, 20° C.]: −3.5 CLY-2-O4 4.00% K.sub.1 [pN, 20° C.]: 15.2 CLY-3-O2 6.00% K.sub.3 [pN, 20° C.]: 16.6 CLY-3-O3 5.00% V.sub.0 [pN, 20° C.]: 2.29 CLY-4-O2 4.00% γ.sub.1 [mPa s, 20° C.]: 113 CLY-5-O2 4.00% LTS bulk [−20° C.]: >1000 h CPY-3-O2 7.00% CY-3-O2 15.00% CY-3-O4 2.50% PY-3-O2 10.00%

Example M20

[0349]

TABLE-US-00027 CCH-35 6.00% Clearing point [° C.]: 76 CC-3-V1 9.00% Δn [589 nm, 20° C.]: 0.1024 CC-3-V2 11.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-4-V1 12.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.3 CCP-V-1 3.00% Δε [1 kHz, 20° C.]: −3.7 CLY-2-O4 4.00% K.sub.1 [pN, 20° C.]: 15.7 CLY-3-O2 6.00% K.sub.3 [pN, 20° C.]: 16.3 CLY-3-O3 5.00% V.sub.0 [pN, 20° C.]: 2.23 CLY-4-O2 4.00% γ.sub.1 [mPa s, 20° C.]: 107 CLY-5-O2 4.00% LTS bulk [−20° C.]: >1000 h CPY-3-O2 4.50% CY-3-O2 15.00% PY-3-O2 7.50% PY-1-O2 9.00%

Example M21

[0350]

TABLE-US-00028 PCH-302 17.50% Clearing point [° C.]: 75.5 CC-3-V1 9.00% Δn [589 nm, 20° C.]: 0.1018 CC-3-V2 11.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-4-V1 12.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.2 CLY-2-O4 4.00% Δε [1 kHz, 20° C.]: −3.7 CLY-3-O2 6.00% K.sub.1 [pN, 20° C.]: 15.7 CLY-3-O3 5.00% K.sub.3 [pN, 20° C.]: 16.8 CLY-4-O2 4.00% V.sub.0 [pN, 20° C.]: 2.27 CLY-5-O2 4.00% γ.sub.1 [mPa s, 20° C.]: 107 CPY-3-O2 2.50% LTS bulk [−20° C.]: >1000 h CY-3-O2 14.00% PY-3-O2 3.00% B(S)-2O-O5 4.00% B(S)-2O-O4 4.00%

Example M22

[0351]

TABLE-US-00029 PCH-3O2 5.50% Clearing point [° C.]: 76 CCH-34 8.00% Δn [589 nm, 20° C.]: 0.1025 CCH-35 7.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-3-V1 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.3 CC-3-V2 11.00% Δε [1 kHz, 20° C.]: −3.7 CC-4-V1 11.50% K.sub.1 [pN, 20° C.]: 17.0 CLY-2-O4 4.00% K.sub.3 [pN, 20° C.]: 15.4 CLY-3-O2 6.00% V.sub.0 [pN, 20° C.]: 2.15 CLY-3-O3 5.00% γ.sub.1 [mPa s, 20° C.]: 98 CLY-4-O2 4.00% CLY-5-O2 4.00% CY-3-O2 6.50% PY-3-O2 5.50% PY-1-O2 9.00% B(S)-2O-O5 4.00% B(S)-2O-O4 4.00%

Example M23

[0352]

TABLE-US-00030 CCY-3-O1 3.00% Clearing point [° C.]: 94.5 CCY-3-O2 10.50% Δn [589 nm, 20° C.]: 0.0999 CLY-2-O4 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CLY-3-O2 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.5 CLY-3-O3 5.00% Δε [1 kHz, 20° C.]: −4.9 CLY-4-O2 4.00% K.sub.1 [pN, 20° C.]: 17.7 CLY-5-O2 5.00% K.sub.3 [pN, 20° C.]: 18.0 CPY-3-O2 4.50% V.sub.0 [pN, 20° C.]: 2.03 CC-3-V 11.00% γ.sub.1 [mPa s, 20° C.]: 148 CC-3-V2 11.00% CC-4-V1 12.00% CY-3-O2 15.00% CY-3-O4 3.00% B(S)-2O-O5 4.00% B(S)-2O-O4 3.00%

Example M24

[0353]

TABLE-US-00031 CCY-3-O2 5.50% Clearing point [° C.]: 88.5 CLY-2-O4 4.00% Δn [589 nm, 20° C.]: 0.1003 CLY-3-O2 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CLY-3-O3 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.1 CLY-4-O2 4.00% Δε [1 kHz, 20° C.]: −4.5 CLY-5-O2 5.00% K.sub.1 [pN, 20° C.]: 16.7 CPY-3-O2 8.50% K.sub.3 [pN, 20° C.]: 16.9 CC-3-V 14.00% V.sub.0 [pN, 20° C.]: 2.04 CC-3-V2 11.00% γ.sub.1 [mPa s, 20° C.]: 127 CC-4-V1 12.00% CY-3-O2 15.00% CY-3-O4 4.00% B(S)-2O-O5 4.00% B(S)-2O-O4 3.00%

Example M25

[0354]

TABLE-US-00032 B(S)-2O-O5 4.00% Clearing point [° C.]: 73.5 B(S)-2O-O4 3.00% Δn [589 nm, 20° C.]: 0.1093 BCH--32 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-3-V1 9.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CC-3-V2 11.00% Δε [1 kHz, 20° C.]: −3.1 CC-4-V1 12.00% K.sub.1 [pN, 20° C.]: 14.8 CCP-3-1 11.00% K.sub.3 [pN, 20° C.]: 15.7 CCP-V2-1 5.00% V.sub.0 [pN, 20° C.]: 2.39 CCY-3-O2 4.50% γ.sub.1 [mPa s, 20° C.]: 88 CLY-3-O2 1.00% LTS bulk [−20° C.]: >1000 h CY-3-O2 15.00% PY-1-O2 8.00% PY-1-O2 8.50%

Example M26

[0355]

TABLE-US-00033 CCH-34 6.00% Clearing point [° C.]: 76 CCH-35 6.00% Δn [589 nm, 20° C.]: 0.1029 CCH-23 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-3-V1 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.2 CC-3-V2 11.00% Δε [1 kHz, 20° C.]: −3.7 CC-4-V1 11.00% K.sub.1 [pN, 20° C.]: 17.3 CLY-2-O4 4.00% K.sub.3 [pN, 20° C.]: 14.8 CLY-3-O2 6.00% V.sub.0 [pN, 20° C.]: 2.12 CLY-3-O3 5.00% γ.sub.1 [mPa s, 20° C.]: 94 CLY-4-O2 4.00% CLY-5-O2 4.00% CPY-3-O2 1.00% CY-3-O2 3.00% PY-3-O2 8.00% PY-1-O2 10.00% B(S)-2O-O5 4.00% B(S)-2O-O4 4.00%

Example M27

[0356]

TABLE-US-00034 CC-3-V1 4.00% Clearing point [° C.]: 74.5 CC-4-V1 18.00% Δn [589 nm, 20° C.]: 0.0976 CC-3-V2 15.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCP-3-1 12.50% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCY-3-O1 6.00% Δε [1 kHz, 20° C.]: −3.4 CCY-3-O2 10.50% K.sub.1 [pN, 20° C.]: 15.3 CPY-3-O2 2.00% K.sub.3 [pN, 20° C.]: 15.6 CY-3-O2 9.50% V.sub.0 [pN, 20° C.]: 2.27 B(S)-2O-O5 4.00% γ.sub.1 [mPa s, 20° C.]: 91 B(S)-2O-O4 3.00% LTS bulk [−20° C.]: >1000 h PP-1-3 2.50% Y-4O-O4 5.00% PY-1-O2 5.00% PY-2-O2 3.00%

Example M28

[0357]

TABLE-US-00035 BCH-32 3.00% Clearing point [° C.]: 76 CC-3-V1 9.00% Δn [589 nm, 20° C.]: 0.1023 CC-3-V2 11.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-4-V1 12.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCP-3-1 9.00% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O1 5.50% K.sub.1 [pN, 20° C.]: 14.9 CCY-3-O2 10.50% K.sub.3 [pN, 20° C.]: 17.1 CLY-3-O2 1.00% V.sub.0 [pN, 20° C.]: 2.45 CPY-3-O2 4.00% γ.sub.1 [mPa s, 20° C.]: 105 CY-3-O2 15.00% LTS bulk [−20° C.]: >1000 h PCH-301 3.00% PY-3-O2 17.00%

Example M29

[0358]

TABLE-US-00036 BCH-32 3.00% Clearing point [° C.]: 76 CC-3-V1 9.00% Δn [589 nm, 20° C.]: 0.1103 CC-3-V2 11.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-4-V1 12.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CCP-3-1 7.50% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O2 7.00% K.sub.1 [pN, 20° C.]: 14.9 CLY-3-O2 1.00% K.sub.3 [pN, 20° C.]: 17.1 CPY-2-O2 4.50% V.sub.0 [pN, 20° C.]: 2.40 CPY-3-O2 11.00% γ.sub.1 [mPa s, 20° C.]: 110 CY-3-O2 14.50% LTS bulk [−20° C.]: >1000 h PCH-301 3.00% PY-3-O2 16.50%

Example M30

[0359]

TABLE-US-00037 BCH-32 3.00% Clearing point [° C.]: 75.9 CC-3-V1 9.00% Δn [589 nm, 20° C.]: 0.1108 CC-3-V2 11.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-4-V1 12.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CCP-3-1 5.00% Δε [1 kHz, 20° C.]: −3.5 CCY-3-O2 9.50% K.sub.1 [pN, 20° C.]: 15.0 CLY-3-O2 1.00% K.sub.3 [pN, 20° C.]: 17.1 CPY-2-O2 4.50% V.sub.0 [pN, 20° C.]: 2.34 CPY-3-O2 11.00% γ.sub.1 [mPa s, 20° C.]: 113 CY-3-O2 14.50% LTS bulk [−20° C.]: >1000 h PCH-301 3.00% PY-3-O2 16.50%

Example M31

[0360]

TABLE-US-00038 CCH-34 5.00% Clearing point [° C.]: 76 CCH-35 5.00% Δn [589 nm, 20° C.]: 0.1033 CCH-23 10.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-3-V1 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.2 CC-3-V2 11.00% Δε [1 kHz, 20° C.]: −3.7 CC-4-V1 11.00% K.sub.1 [pN, 20° C.]: 17.1 CLY-2-O4 4.00% K.sub.3 [pN, 20° C.]: 14.7 CLY-3-O2 6.00% V.sub.0 [pN, 20° C.]: 2.11 CLY-3-O3 5.00% γ.sub.1 [mPa s, 20° C.]: 94 CLY-4-O2 4.00% CLY-5-O2 4.00% CPY-3-O2 1.50% CY-3-O2 2.50% PY-3-O2 8.00% PY-1-O2 10.00% B(S)-2O-O5 4.00% B(S)-2O-O4 4.00%

Example M32

[0361]

TABLE-US-00039 CCH-34 5.00% Clearing point [° C.]: 76 CCH-35 5.00% Δn [589 nm, 20° C.]: 0.1018 CCH-23 10.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-3-V1 5.00% ε.sub.⊥[1 kHz, 20° C.]: 7.2 CC-3-V2 11.00% Δε [1 kHz, 20° C.]: −3.7 CC-4-V1 11.00% K.sub.1 [pN, 20° C.]: 17.2 CLY-2-O4 4.00% K.sub.3 [pN, 20° C.]: 14.7 CLY-3-O2 6.00% V.sub.0 [pN, 20° C.]: 2.12 CLY-3-O3 5.00% γ.sub.1 [mPa s, 20° C.]: 94 CLY-4-O2 4.00% CLY-5-O2 4.00% CPY-3-O2 1.50% CY-3-O2 4.00% PY-3-O2 8.00% PY-1-O2 8.50% B(S)-2O-O5 4.00% B(S)-2O-O4 4.00%

Example M33

[0362]

TABLE-US-00040 PCH-302 17.50% Clearing point [° C.]: 76 CC-3-V1 9.00% Δn [589 nm, 20° C.]: 0.1022 CC-3-V2 11.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-4-V1 12.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.2 CLY-2-O4 4.00% Δε [1 kHz, 20° C.]: −3.7 CLY-3-O2 6.00% K.sub.1 [pN, 20° C.]: 15.6 CLY-3-O3 5.00% K.sub.3 [pN, 20° C.]: 16.5 CLY-4-O2 4.00% V.sub.0 [pN, 20° C.]: 2.24 CLY-5-O2 4.00% γ.sub.1 [mPa s, 20° C.]: 108 CY-3-O2 16.00% LTS bulk [−20° C.]: >1000 h PGIY-2-O4 3.50% B(S)-2O-O5 4.00% B(S)-2O-O4 4.00%

Example M34

[0363]

TABLE-US-00041 CCP-V-1 10.00% Clearing point [° C.]: 86 CCY-3-O2 8.00% Δn [589 nm, 20° C.]: 0.1010 CLY-2-O4 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CLY-4-O2 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.2 CPY-2-O2 11.00% Δε [1 kHz, 20° C.]: −3.7 PGIY-2-O4 3.00% K.sub.1 [pN, 20° C.]: 16.2 B-2O-O5 4.00% K.sub.3 [pN, 20° C.]: 15.4 CC-3-V2 17.00% V.sub.0 [pN, 20° C.]: 2.15 CC-3-V1 8.00% γ.sub.1 [mPa s, 20° C.]: 130 CC-4-V1 8.00% CY-3-O4 20.00% CY-3-O4 1.00%

Example M35

[0364]

TABLE-US-00042 CCY-3-O2 2.00% Clearing point [° C.]: 87 CLY-2-O4 4.00% Δn [589 nm, 20° C.]: 0.1004 CLY-3-O2 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CLY-3-O3 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.2 CLY-4-O2 4.00% Δε [1 kHz, 20° C.]: −4.5 CLY-5-O2 5.00% K.sub.1 [pN, 20° C.]: 17.1 CPY-3-O2 8.00% K.sub.3 [pN, 20° C.]: 16.4 CC-3-V2 14.00% V.sub.0 [pN, 20° C.]: 2.01 CC-4-V1 23.00% γ.sub.1 [mPa s, 20° C.]: 135 CY-3-O2 15.50% LTS bulk [−20° C.]: >1000 h CY-3-O4 7.50% B(S)-2O-O5 4.00% B(S)-2O-O5 3.00%

Example M36

[0365]

TABLE-US-00043 CCY-3-O2 8.00% Clearing point [° C.]: 85 CLY-2-O4 5.00% Δn [589 nm, 20° C.]: 0.1001 CLY-4-O2 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CLY-5-O2 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.3 CPY-2-O2 11.00% Δε [1 kHz, 20° C.]: −3.8 PGIY-2-O4 6.00% K.sub.1 [pN, 20° C.]: 16.7 B-2O-O5 4.00% K.sub.3 [pN, 20° C.]: 15.0 CC-3-V2 17.00% V.sub.0 [pN, 20° C.]: 2.10 CC-3-V1 8.00% γ.sub.1 [mPa s, 20° C.]: 127 CC-4-V1 6.00% CY-3-O4 15.00% CCH-23 10.00%

Example M37

[0366]

TABLE-US-00044 CCY-3-O2 2.00% Clearing point [° C.]: 83.5 CLY-2-O4 5.00% Δn [589 nm, 20° C.]: 0.1005 CLY-4-O2 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CLY-5-O2 4.50% ε.sub.⊥ [1 kHz, 20° C.]: 7.2 CLY-3-O3 5.00% Δε [1 kHz, 20° C.]: −3.8 PGIY-2-O4 6.00% K.sub.1 [pN, 20° C.]: 16.6 CY-3-O4 19.00% K.sub.3 [pN, 20° C.]: 15.0 CC-3-V2 17.00% V.sub.0 [pN, 20° C.]: 2.11 CC-3-V1 8.00% γ.sub.1 [mPa s, 20° C.]: 119 CC-4-V1 0.50% LTS bulk [−20° C.]: >1000 h CCP-V1 10.00% CCH-23 10.00% B(S)-2O-O5 4.00% B(S)-2O-O4 4.00%

Example M38

[0367]

TABLE-US-00045 CCY-3-O2 7.00% Clearing point [° C.]: 84 CLY-4-O2 5.00% Δn [589 nm, 20° C.]: 0.1011 CLY-5-O2 2.50% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CLY-3-O3 2.50% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 PGIY-2-O4 5.50% Δε [1 kHz, 20° C.]: −3.7 CY-3-O4 16.00% K.sub.1 [pN, 20° C.]: 17.2 CC-3-V2 17.00% K.sub.3 [pN, 20° C.]: 15.5 CC-3-V1 8.00% V.sub.0 [pN, 20° C.]: 2.17 CC-4-V1 4.50% γ.sub.1 [mPa s, 20° C.]: 112 CCP-V1 10.00% CCH-23 10.00% B(S)-2O-O5 4.00% B(S)-2O-O4 4.00% B(S)-2O-O6 4.00%

Example M39

[0368]

TABLE-US-00046 CCY-3-O2 5.50% Clearing point [° C.]: 84 CLY-4-O2 5.00% Δn [589 nm, 20° C.]: 0.1018 CLY-5-O2 2.50% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CLY-3-O3 2.50% ε.sub.⊥ [1 kHz, 20° C.]: 7.4 PGIY-2-O4 2.00% Δε [1 kHz, 20° C.]: −3.9 CY-3-O4 14.50% K.sub.1 [pN, 20° C.]: 17.4 CC-3-V2 17.00% K.sub.3 [pN, 20° C.]: 15.7 CC-3-V1 8.00% V.sub.0 [pN, 20° C.]: 2.13 CC-4-V1 2.00% γ.sub.1 [mPa s, 20° C.]: 111 CCP-V1 15.00% CCH-23 10.00% B(S)-2O-O5 4.00% B(S)-2O-O4 4.00% B(S)-2O-O6 4.00% B-2O-O5 4.00%

Example M40

[0369]

TABLE-US-00047 CCY-3-O2 6.00% Clearing point [° C.]: 84 CLY-4-O2 5.00% Δn [589 nm, 20° C.]: 0.1014 CLY-2-O4 3.50% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CLY-5-O2 2.50% ε.sub.⊥ [1 kHz, 20° C.]: 7.4 CLY-3-O3 2.50% Δε [1 kHz, 20° C.]: −3.9 PGIY-2-O4 5.00% K.sub.1 [pN, 20° C.]: 17.2 CY-3-O4 14.50% K.sub.3 [pN, 20° C.]: 15.3 CC-3-V2 17.00% V.sub.0 [pN, 20° C.]: 2.11 CC-3-V1 8.00% γ.sub.1 [mPa s, 20° C.]: 114 CC-4-V1 4.00% CCP-V1 10.00% CCH-23 10.00% B(S)-2O-O5 4.00% B(S)-2O-O4 4.00% B-2O-O5 4.00%

Example M41

[0370]

TABLE-US-00048 CCY-3-O2 7.00% Clearing point [° C.]: 84 CLY-4-O2 5.00% Δn [589 nm, 20° C.]: 0.1020 CLY-3-O3 3.00% ε.sub.∥ [1 kHz, 20° C.]: 3.4 PGIY-2-O4 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CY-3-O4 12.00% Δε [1 kHz, 20° C.]: −3.7 CC-3-V2 17.00% K.sub.1 [pN, 20° C.]: 18.2 CC-3-V1 8.00% K.sub.3 [pN, 20° C.]: 15.4 CC-4-V1 9.00% V.sub.0 [pN, 20° C.]: 2.16 CCP-V1 8.00% γ.sub.1 [mPa s, 20° C.]: 104 CCH-23 10.00% B(S)-2O-O5 4.00% B(S)-2O-O4 4.00% B(S)-2O-O6 4.00% B(S)-4O-O5 4.00%

Example M42

[0371]

TABLE-US-00049 CCY-3-O2 11.00% Clearing point [° C.]: 93.5 CLY-4-O2 5.00% Δn [589 nm, 20° C.]: 0.1002 CLY-3-O2 9.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CLY-5-O2 9.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.9 CLY-3-O3 1.00% Δε [1 kHz, 20° C.]: −4.4 PGIY-2-O4 3.00% K.sub.1 [pN, 20° C.]: 18.5 CY-3-O4 15.00% K.sub.3 [pN, 20° C.]: 18.4 CC-3-V 15.00% V.sub.0 [pN, 20° C.]: 2.17 CC-3-V1 7.00% γ.sub.1 [mPa s, 20° C.]: 137 CC-3-V2 12.00% CC-4-V1 5.00% B(S)-2O-O5 4.00% B(S)-2O-O4 4.00%

Example M43

[0372]

TABLE-US-00050 CCY-3-O2 6.00% Clearing point [° C.]: 87 CLY-4-O2 5.00% Δn [589 nm, 20° C.]: 0.0996 CLY-3-O3 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CLY-3-O2 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.4 CLY-5-O2 9.00% Δε [1 kHz, 20° C.]: −3.9 PGIY-2-O4 6.00% K.sub.1 [pN, 20° C.]: 16.9 CY-3-O4 14.00% K.sub.3 [pN, 20° C.]: 16.5 CC-3-V 22.50% V.sub.0 [pN, 20° C.]: 2.17 CC-3-V1 7.00% γ.sub.1 [mPa s, 20° C.]: 113 CC-3-V2 10.00% CC-4-V1 3.50% B(S)-2O-O5 4.00% B(S)-2O-O4 4.00%

Example M44

[0373]

TABLE-US-00051 CCY-3-O2 10.00% Clearing point [° C.]: 86 CLY-4-O2 5.00% Δn [589 nm, 20° C.]: 0.1014 CLY-3-O3 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CLY-3-O2 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.4 CLY-5-O2 0.50% Δε [1 kHz, 20° C.]: −3.9 PGIY-2-O4 6.00% K.sub.1 [pN, 20° C.]: 17.3 CY-3-O4 11.00% K.sub.3 [pN, 20° C.]: 16.2 CC-3-V 20.50% V.sub.0 [pN, 20° C.]: 2.15 CC-3-V1 7.00% γ.sub.1 [mPa s, 20° C.]: 108 CC-3-V2 10.00% CC-4-V1 9.00% B(S)-2O-O5 4.00% B(S)-2O-O4 4.00% B(S)-2O-O6 4.00%

Example M45

[0374]

TABLE-US-00052 CC-3-V2 20.00% Clearing point [° C.]: 75 CC-4-V1 7.50% Δn [589 nm, 20° C.]: 0.0997 CCH-34 3.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-35 4.00% ε.sub.⊥[1 kHz, 20° C.]: 7 CCP-3-1 8.50% Δε [1 kHz, 20° C.]: −3.5 CCY-3-O2 11.50% K.sub.1 [pN, 20° C.]: 15.1 CPY-3-O2 11.00% K.sub.3 [pN, 20° C.]: 16.5 CY-3-O2 15.50% V.sub.0 [pN, 20° C.]: 2.29 CY-5-O2 6.00% γ.sub.1 [mPa s, 20° C.]: 108 PY-3-O2 6.00% PY-1-O2 7.00%

Example M46

[0375]

TABLE-US-00053 CC-3-V2 20.00% Clearing point [° C.]: 74.5 CC-4-V1 14.00% Δn [589 nm, 20° C.]: 0.0982 CCH-24 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCP-3-1 6.50% ε.sub.⊥[1 kHz, 20° C.]: 6.7 CCY-3-O1 5.50% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O2 11.00% K.sub.1 [pN, 20° C.]: 14.6 CPY-3-O2 8.00% K.sub.3 [pN, 20° C.]: 15.5 CY-3-O2 13.00% V.sub.0 [pN, 20° C.]: 2.31 PY-3-O2 10.00% γ.sub.1 [mPa s, 20° C.]: 98 PY-1-O2 7.00%

Example M47

[0376]

TABLE-US-00054 CC-3-V1 7.50% Clearing point [° C.]: 75 CC-4-V1 17.00% Δn [589 nm, 20° C.]: 0.0984 CC-3-V2 11.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-24 6.50% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CCY-3-O1 7.50% Δε [1 kHz, 20° C.]: −3.4 CCY-3-O2 11.00% K.sub.1 [pN, 20° C.]: 14.1 CPY-3-O2 10.00% K.sub.3 [pN, 20° C.]: 15.3 CCP-3-1 2.00% V.sub.0 [pN, 20° C.]: 2.25 CY-3-O2 11.50% γ.sub.1 [mPa s, 20° C.]: 98 PY-1-O2 8.00% PY-1-O2 8.00%

Example M48

[0377]

TABLE-US-00055 CC-3-V1 7.00% Clearing point [° C.]: 74.2 CC-4-V1 18.00% Δn [589 nm, 20° C.]: 0.1000 CCH-34 3.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-35 7.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CCP-3-1 9.00% Δε [1 kHz, 20° C.]: −3.4 CCY-3-O2 10.00% K.sub.1 [pN, 20° C.]: 15.1 CPY-3-O2 9.50% K.sub.3 [pN, 20° C.]: 16.5 CY-3-O2 15.50% V.sub.0 [pN, 20° C.]: 2.34 CY-3-O4 7.50% γ.sub.1 [mPa s, 20° C.]: 110 PY-3-O2 11.50% LTS bulk [−20° C.]: >1000 h PGIY-2-O4 2.00%

Example M49

[0378]

TABLE-US-00056 CC-3-V1 7.00% Clearing point [° C.]: 74.1 CC-4-V1 18.00% Δn [589 nm, 20° C.]: 0.0975 CCH-34 7.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-35 2.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCP-3-1 9.00% Δε [1 kHz, 20° C.]: −3.4 CCY-3-O1 10.00% K.sub.1 [pN, 20° C.]: 14.2 CPY-3-O2 9.50% K.sub.3 [pN, 20° C.]: 15.3 CY-3-O2 15.50% V.sub.0 [pN, 20° C.]: 2.24 CY-3-O4 11.00% γ.sub.1 [mPa s, 20° C.]: 112 PGIY-2-O4 4.50% PY-3-O2 6.50%

Example M50

[0379]

TABLE-US-00057 CC-3-V1 8.50% Clearing point [° C.]: 74 CC-4-V1 18.00% Δn [589 nm, 20° C.]: 0.0988 CCH-34 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-35 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCP-3-1 6.50% Δε [1 kHz, 20° C.]: −3.4 CCY-3-O2 10.00% K.sub.1 [pN, 20° C.]: 14.8 CPY-3-O2 10.00% K.sub.3 [pN, 20° C.]: 16.1 CY-3-O2 15.50% V.sub.0 [pN, 20° C.]: 2.29 CY-3-O4 9.00% γ.sub.1 [mPa s, 20° C.]: 109 PGIY-2-O4 4.00% LTS bulk [−20° C.]: >1000 h PY-3-O2 8.50%

Example M51

[0380]

TABLE-US-00058 CC-3-V1 8.50% Clearing point [° C.]: 74.4 CC-4-V1 18.00% Δn [589 nm, 20° C.]: 0.0992 CCH-34 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-35 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCP-3-1 8.50% Δε [1 kHz, 20° C.]: −3.4 CCY-3-O2 10.00% K.sub.1 [pN, 20° C.]: 15.1 CPY-3-O2 7.00% K.sub.3 [pN, 20° C.]: 16.1 CY-3-O2 15.50% V.sub.0 [pN, 20° C.]: 2.29 CY-3-O4 7.50% γ.sub.1 [mPa s, 20° C.]: 109 PGIY-2-O4 4.00% LTS bulk [−20° C.]: >1000 h PY-3-O2 9.00% B(S)-2O-O5 2.00%

Example M52

[0381]

TABLE-US-00059 CC-3-V1 8.50% Clearing point [° C.]: 74.1 CC-4-V1 18.00% Δn [589 nm, 20° C.]: 0.0990 CCH-34 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-35 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCP-3-1 10.50% Δε [1 kHz, 20° C.]: −3.4 CCY-3-O2 10.00% K.sub.1 [pN, 20° C.]: 15.1 CPY-3-O2 2.50% K.sub.3 [pN, 20° C.]: 15.7 CY-3-O2 15.50% V.sub.0 [pN, 20° C.]: 2.26 CY-3-O4 7.50% γ.sub.1 [mPa s, 20° C.]: 104 PGIY-2-O4 5.50% PY-3-O2 8.00% B(S)-2O-O5 4.00%

Example M53

[0382]

TABLE-US-00060 CC-3-V1 5.50% Clearing point [° C.]: 74 CC-4-V1 22.00% Δn [589 nm, 20° C.]: 0.0985 CCH-34 4.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-35 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCP-3-1 6.50% Δε [1 kHz, 20° C.]: −3.4 CCY-3-O1 10.00% K.sub.1 [pN, 20° C.]: 14.8 CCY-3-O2 10.00% K.sub.3 [pN, 20° C.]: 15.7 CY-3-O2 15.50% V.sub.0 [pN, 20° C.]: 2.27 PGIY-2-O4 4.00% γ.sub.1 [mPa s, 20° C.]: 105 PY-3-O2 17.00%

Example M54

[0383]

TABLE-US-00061 B(S)-2O-O5 4.00% Clearing point [° C.]: 75 B(S)-2O-O4 3.00% Δn [589 nm, 20° C.]: 0.1093 BCH-32 7.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-3-V1 9.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CC-4-V1 23.00% Δε [1 kHz, 20° C.]: −3.2 CCP-3-1 10.00% K.sub.1 [pN, 20° C.]: 15.4 CCP-V2-1 5.00% K.sub.3 [pN, 20° C.]: 16.1 CCY-3-O2 5.00% V.sub.0 [pN, 20° C.]: 2.39 CLY-3-O2 1.00% γ.sub.1 [mPa s, 20° C.]: 96 CY-3-O2 15.50% LTS bulk [−20° C.]: >1000 h PY-3-O2 14.00% PY-1-O4 3.00%

Example M55

[0384]

TABLE-US-00062 B(S)-2O-O5 4.00% Clearing point [° C.]: 74 B(S)-2O-O4 3.00% Δn [589 nm, 20° C.]: 0.1092 BCH-32 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-3-V1 9.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CC-4-V1 23.00% Δε [1 kHz, 20° C.]: −3.0 CCP-3-1 11.50% K.sub.1 [pN, 20° C.]: 14.6 CCP-V2-1 5.00% K.sub.3 [pN, 20° C.]: 15.7 CCY-3-O2 3.50% V.sub.0 [pN, 20° C.]: 2.41 CLY-3-O2 1.00% γ.sub.1 [mPa s, 20° C.]: 89 CY-3-O2 15.50% LTS bulk [−20° C.]: >1000 h PY-1-O2 8.00% PY-2-O2 8.50%

Example M56

[0385]

TABLE-US-00063 B-2O-O5 4.00% Clearing point [° C.]: 75 BCH-32 8.00% Δn [589 nm, 20° C.]: 0.1088 CC-3-V1 9.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-4-V1 20.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CCP-3-1 7.00% Δε [1 kHz, 20° C.]: −3.2 CCP-V2-1 5.00% K.sub.1 [pN, 20° C.]: 14.9 CCY-3-O2 10.00% K.sub.3 [pN, 20° C.]: 16.6 CLY-3-O2 1.00% V.sub.0 [pN, 20° C.]: 2.40 CPY-3-O2 2.00% γ.sub.1 [mPa s, 20° C.]: 105 CY-3-O2 15.50% LTS bulk [−20° C.]: >1000 h PCH-301 6.00% PY-3-O2 16.00%

Example M57

[0386]

TABLE-US-00064 PCH-302 17.50% Clearing point [° C.]: 76 CC-3-V1 9.00% Δn [589 nm, 20° C.]: 0.1020 CC-4-V1 23.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CLY-2-O4 4.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.2 CLY-3-O2 6.00% Δε [1 kHz, 20° C.]: −3.7 CLY-3-O3 5.00% K.sub.1 [pN, 20° C.]: 15.7 CLY-4-O2 4.00% K.sub.3 [pN, 20° C.]: 16.9 CLY-5-O2 4.00% V.sub.0 [pN, 20° C.]: 2.26 CPY-3-O2 2.00% γ.sub.1 [mPa s, 20° C.]: 110 CY-3-O2 14.00% LTS bulk [−20° C.]: >1000 h PY-3-O2 3.50% B(S)-2O-O5 4.00% B(S)-2O-O4 4.00%

Example M58

[0387]

TABLE-US-00065 PCH-302 8.00% Clearing point [° C.]: 75.5 CCH-23 8.00% Δn [589 nm, 20° C.]: 0.1017 CC-3-V1 9.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-4-V1 23.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.2 CLY-2-O4 4.00% Δε [1 kHz, 20° C.]: −3.7 CLY-3-O2 6.00% K.sub.1 [pN, 20° C.]: 15.8 CLY-3-O3 5.00% K.sub.3 [pN, 20° C.]: 15.7 CLY-4-O2 4.00% V.sub.0 [pN, 20° C.]: 2.19 CLY-5-O2 4.00% γ.sub.1 [mPa s, 20° C.]: 99 CPY-3-O2 2.00% LTS bulk [−20° C.]: >1000 h CY-3-O2 9.00% PY-3-O2 10.00% B(S)-2O-O5 4.00% B(S)-2O-O4 4.00%

Example M59

[0388]

TABLE-US-00066 CC-3-V1 7.00% Clearing point [° C.]: 74.5 CC-4-V1 18.00% Δn [589 nm, 20° C.]: 0.0997 CCH-34 3.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-35 6.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCP-3-1 11.00% Δε [1 kHz, 20° C.]: −3.4 CCY-3-O2 6.00% K.sub.1 [pN, 20° C.]: 14.4 CPY-3-O2 11.00% K.sub.3 [pN, 20° C.]: 15.4 CPY-2-O2 4.00% V.sub.0 [pN, 20° C.]: 2.25 CY-3-O2 15.50% γ.sub.1 [mPa s, 20° C.]: 108 CY-3-O4 5.00% LTS bulk [−20° C.]: >1000 h PY-3-O2 3.50% Y-4O-O4 5.00% PGIY-2-O4 5.00%

Example M60

[0389]

TABLE-US-00067 B(S)-2O-O5 5.00% Clearing point [° C.]: 74 B(S)-2O-O4 4.00% Δn [589 nm, 20° C.]: 0.1092 BCH-32 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-3-V1 9.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CC-4-V1 22.00% Δε [1 kHz, 20° C.]: −3.0 CCP-3-1 13.50% K.sub.1 [pN, 20° C.]: 15.2 CCP-V2-1 5.00% K.sub.3 [pN, 20° C.]: 15.7 CLY-3-O2 1.00% V.sub.0 [pN, 20° C.]: 2.40 CY-3-O2 15.50% γ.sub.1 [mPa s, 20° C.]: 93 CY-3-O4 3.00% PY-3-O2 14.00%

Example M61

[0390]

TABLE-US-00068 B(S)-2-3 10.00% Clearing point [° C.]: 74 BCH-32 5.50% Δn [589 nm, 20° C.]: 0.1085 CC-3-V1 9.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-4-V1 22.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.5 CCP-3-1 6.00% Δε [1 kHz, 20° C.]: −3.0 CCP-V2-1 5.00% K.sub.1 [pN, 20° C.]: 14.6 CCY-3-O2 10.50% K.sub.3 [pN, 20° C.]: 15.8 CLY-3-O2 1.00% V.sub.0 [pN, 20° C.]: 2.44 CPY-3-O2 5.00% γ.sub.1 [mPa s, 20° C.]: 105 CY-3-O2 15.00% LTS bulk [−20° C.]: >1000 h PY-3-O2 11.00%

Example M62

[0391]

TABLE-US-00069 B(S)-1-4 10.00% Clearing point [° C.]: 74.5 BCH-32 5.50% Δn [589 nm, 20° C.]: 0.1092 CC-3-V1 9.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-4-V1 22.00% ε.sub.⊥[1 kHz, 20° C.]: 6.6 CCP-3-1 5.50% Δε [1 kHz, 20° C.]: −3.0 CCP-V2-1 5.00% K.sub.1 [pN, 20° C.]: 14.8 CCY-3-O2 10.50% K.sub.3 [pN, 20° C.]: 15.9 CLY-3-O2 1.00% V.sub.0 [pN, 20° C.]: 2.42 CPY-3-O2 5.00% γ.sub.1 [mPa s, 20° C.]: 107 CY-3-O2 15.00% LTS bulk [−20° C.]: >1000 h PY-3-O2 11.50%

Example M63

[0392]

TABLE-US-00070 B(S)-1-6 10.00% Clearing point [° C.]: 75.5 BCH-32 5.50% Δn [589 nm, 20° C.]: 0.1087 CC-3-V1 9.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-4-V1 22.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.5 CCP-3-1 5.50% Δε [1 kHz, 20° C.]: −3.0 CCP-V2-1 5.00% K.sub.1 [pN, 20° C.]: 15.2 CCY-3-O2 10.50% K.sub.3 [pN, 20° C.]: 16.0 CLY-3-O2 1.00% V.sub.0 [pN, 20° C.]: 2.44 CPY-3-O2 5.00% γ.sub.1 [mPa s, 20° C.]: 110 CY-3-O2 15.00% LTS bulk [−20° C.]: >1000 h PY-3-O2 11.50%

Example M64

[0393]

TABLE-US-00071 CC-3-V1 6.00% Clearing point [° C.]: 75 CC-4-V1 24.00% Δn [589 nm, 20° C.]: 0.0981 CCH-34 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCP-3-1 12.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCY-3-O2 11.00% Δε [1 kHz, 20° C.]: −3.3 CPY-3-O2 7.50% K.sub.1 [pN, 20° C.]: 14.5 CY-3-O2 15.50% K.sub.3 [pN, 20° C.]: 15.8 CY-3-O4 4.00% V.sub.0 [pN, 20° C.]: 2.30 PY-3-O2 6.00% γ.sub.1 [mPa s, 20° C.]: 105 Y-4O-O4 4.50% PGIY-2-O4 5.50%

Example M65

[0394]

TABLE-US-00072 PCH-302 11.50% Clearing point [° C.]: 75.5 CCH-23 5.00% Δn [589 nm, 20° C.]: 0.1022 CC-3-V1 9.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-4-V1 23.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.2 CLY-2-O4 4.00% Δε [1 kHz, 20° C.]: −3.7 CLY-3-O2 6.00% K.sub.1 [pN, 20° C.]: 15.8 CLY-3-O3 5.00% K.sub.3 [pN, 20° C.]: 16.1 CLY-4-O2 4.00% V.sub.0 [pN, 20° C.]: 2.21 CLY-5-O2 4.00% γ.sub.1 [mPa s, 20° C.]: 103 CPY-3-O2 2.00% LTS bulk [−20° C.]: >1000 h CY-3-O2 11.00% PY-3-O2 7.50% B(S)-2O-O5 4.00% B(S)-2O-O4 4.00%

Example M66

[0395]

TABLE-US-00073 CCY-3-O2 5.50% Clearing point [° C.]: 89.5 CLY-2-O4 4.00% Δn [589 nm, 20° C.]: 0.1005 CLY-3-O2 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CLY-3-O3 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.1 CLY-4-O2 4.00% Δε [1 kHz, 20° C.]: −4.5 CLY-5-O2 5.00% K.sub.1 [pN, 20° C.]: 16.7 CPY-3-O2 8.50% K.sub.3 [pN, 20° C.]: 17.0 CC-3-V 14.00% V.sub.0 [pN, 20° C.]: 2.05 CC-4-V1 23.00% γ.sub.1 [mPa s, 20° C.]: 133 CY-3-O2 15.00% LTS bulk [−20° C.]: >1000 h CY-3-O4 4.00% B(S)-2O-O5 4.00% B(S)-2O-O4 3.00%

Example M67

[0396]

TABLE-US-00074 CCY-3-O2 4.00% Clearing point [° C.]: 89.5 CLY-2-O4 4.00% Δn [589 nm, 20° C.]: 0.0999 CLY-3-O2 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CLY-3-O3 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.0 CLY-4-O2 4.00% Δε [1 kHz, 20° C.]: −4.5 CLY-5-O2 5.00% K.sub.1 [pN, 20° C.]: 17.3 CPY-3-O2 11.00% K.sub.3 [pN, 20° C.]: 16.6 CCH-23 14.50% V.sub.0 [pN, 20° C.]: 2.04 CC-4-V1 23.00% γ.sub.1 [mPa s, 20° C.]: 139 CY-3-O2 14.50% LTS bulk [−20° C.]: >1000 h CY-3-O4 3.00% B(S)-2O-O5 4.00% B(S)-2O-O4 3.00%

Example M68

[0397]

TABLE-US-00075 CC-3-V1 7.00% Clearing point [° C.]: 75 CC-4-V1 20.00% Δn [589 nm, 20° C.]: 0.0992 CCH-34 3.50% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-35 7.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CCP-3-1 2.00% Δε [1 kHz, 20° C.]: −3.6 CCY-3-O2 13.00% K.sub.1 [pN, 20° C.]: 14.9 CPY-3-O2 11.50% K.sub.3 [pN, 20° C.]: 16.4 CY-3-O2 16.00% V.sub.0 [pN, 20° C.]: 2.27 CY-3-O4 4.00% γ.sub.1 [mPa s, 20° C.]: 114 CY-5-O2 4.00% PY-3-O2 8.50% PYP-2-3 3.50%

Example M69

[0398]

TABLE-US-00076 CC-3-V1 7.00% Clearing point [° C.]: 75 CC-4-V1 20.00% Δn [589 nm, 20° C.]: 0.0997 CCH-34 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-35 7.50% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CCP-3-1 3.00% Δε [1 kHz, 20° C.]: −3.6 CCY-3-O2 12.50% K.sub.1 [pN, 20° C.]: 15.1 CPY-3-O2 10.00% K.sub.3 [pN, 20° C.]: 16.3 CY-3-O2 15.00% V.sub.0 [pN, 20° C.]: 2.26 CY-3-O4 3.00% γ.sub.1 [mPa s, 20° C.]: 113 CY-5-O2 3.50% PY-3-O2 10.00% PGIY-2-O4 4.00%

Example M70

[0399]

TABLE-US-00077 CC-3-V1 7.00% Clearing point [° C.]: 75 CC-4-V1 20.00% Δn [589 nm, 20° C.]: 0.1001 CCH-34 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-35 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCY-3-O1 5.00% Δε [1 kHz, 20° C.]: −3.5 CCY-3-O2 12.50% K.sub.1 [pN, 20° C.]: 15.1 CPY-3-O2 8.00% K.sub.3 [pN, 20° C.]: 16.1 CY-3-O2 15.50% V.sub.0 [pN, 20° C.]: 2.26 CY-5-O2 4.50% γ.sub.1 [mPa s, 20° C.]: 113 PY-3-O2 11.00% PYP-2-3 4.50%

Example M71

[0400]

TABLE-US-00078 CC-3-V1 7.00% Clearing point [° C.]: 75 CC-4-V1 20.00% Δn [589 nm, 20° C.]: 0.0991 CCH-34 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-35 4.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CCP-3-1 12.50% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O2 6.00% K.sub.1 [pN, 20° C.]: 14.9 CY-3-O2 12.50% K.sub.3 [pN, 20° C.]: 15.2 B(S)-2O-O5 4.00% V.sub.0 [pN, 20° C.]: 2.26 B(S)-2O-O4 3.00% γ.sub.1 [mPa s, 20° C.]: 91 PP-1-3 4.00% LTS bulk [−20° C.]: >1000 h Y-4O-O4 5.00% PY-V2-O2 4.00% CCY-V-O2 6.00% CPY-V-O2 3.00% CPY-V-O4 4.00%

Example M72

[0401]

TABLE-US-00079 CC-3-V1 7.50% Clearing point [° C.]: 75 CC-4-V1 20.00% Δn [589 nm, 20° C.]: 0.0989 CCH-34 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-35 7.50% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CCP-3-1 2.50% Δε [1 kHz, 20° C.]: −3.6 CCY-3-O2 12.50% K.sub.1 [pN, 20° C.]: 15.2 CPY-3-O2 12.50% K.sub.3 [pN, 20° C.]: 16.8 CY-3-O2 15.50% V.sub.0 [pN, 20° C.]: 2.29 CY-3-O4 2.50% γ.sub.1 [mPa s, 20° C.]: 112 CY-5-O2 2.50% PY-3-O2 12.00% PGIY-2-O4 1.00%

Example M73

[0402]

TABLE-US-00080 CC-3-V1 7.50% Clearing point [° C.]: 75 CC-4-V1 20.00% Δn [589 nm, 20° C.]: 0.0997 CCH-34 3.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-35 7.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CCP-3-1 3.50% Δε [1 kHz, 20° C.]: −3.6 CCY-3-O2 13.00% K.sub.1 [pN, 20° C.]: 15.2 CPY-3-O2 12.00% K.sub.3 [pN, 20° C.]: 16.9 CY-3-O2 15.50% V.sub.0 [pN, 20° C.]: 2.30 CY-3-O4 5.00% γ.sub.1 [mPa s, 20° C.]: 114 CY-5-O2 2.50% PY-3-O2 12.50% PYP-2-3 1.00%

Example M74

[0403]

TABLE-US-00081 CC-3-V1 7.50% Clearing point [° C.]: 75.5 CC-4-V1 20.00% Δn [589 nm, 20° C.]: 0.0990 CCH-34 4.50% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-35 9.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCY-3-O1 2.00% Δε [1 kHz, 20° C.]: −3.6 CCY-3-O2 12.50% K.sub.1 [pN, 20° C.]: 15.5 CPY-3-O2 12.50% K.sub.3 [pN, 20° C.]: 16.7 CY-3-O2 15.50% V.sub.0 [pN, 20° C.]: 2.30 CY-5-O2 2.50% γ.sub.1 [mPa s, 20° C.]: 112 PY-3-O2 13.00% PYP-2-3 1.00%

Example M75

[0404]

TABLE-US-00082 CCY-3-O2 11.00% Clearing point [° C.]: 88 CLY-4-O2 5.00% Δn [589 nm, 20° C.]: 0.1015 CLY-3-O3 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CLY-3-O2 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.4 CLY-5-O2 2.00% Δε [1 kHz, 20° C.]: −3.9 PGIY-2-O4 6.00% K.sub.1 [pN, 20° C.]: 17.1 CY-3-O4 8.50% K.sub.3 [pN, 20° C.]: 16.8 CC-3-V 28.50% V.sub.0 [pN, 20° C.]: 2.19 CC-3-V1 7.00% γ.sub.1 [mPa s, 20° C.]: 107 CC-4-V1 11.00% B(S)-2O-O5 4.00% B(S)-2O-O4 4.00% B(S)-2O-O6 4.00%

Example M76

[0405]

TABLE-US-00083 CC-3-V1 5.50% Clearing point [° C.]: 74.3 CC-4-V1 22.00% Δn [589 nm, 20° C.]: 0.0986 CCH-34 6.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-35 3.50% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCP-3-1 6.50% Δε [1 kHz, 20° C.]: −3.4 CCY-3-O1 9.00% K.sub.1 [pN, 20° C.]: 14.9 CCY-3-O2 10.00% K.sub.3 [pN, 20° C.]: 15.8 CPY-3-O2 2.00% V.sub.0 [pN, 20° C.]: 2.27 CY-3-O2 15.50% γ.sub.1 [mPa s, 20° C.]: 107 PGIY-2-O4 3.00% PY-1-O4 2.00% PY-3-O2 15.00%

Example M77

[0406]

TABLE-US-00084 CC-3-V1 5.50% Clearing point [° C.]: 74.1 CC-4-V1 22.00% Δn [589 nm, 20° C.]: 0.0984 CCH-34 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-35 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CCP-3-1 6.50% Δε [1 kHz, 20° C.]: −3.4 CCY-3-O1 5.00% K.sub.1 [pN, 20° C.]: 14.8 CCY-3-O2 10.00% K.sub.3 [pN, 20° C.]: 15.7 CPY-2-O2 3.50% V.sub.0 [pN, 20° C.]: 2.29 CPY-3-O2 3.00% γ.sub.1 [mPa s, 20° C.]: 105 CY-3-O2 15.50% LTS bulk [−20° C.]: >1000 h CY-5-O2 2.00% PGIY-2-O4 2.00% PY-3-O2 15.00%

Example M78

[0407]

TABLE-US-00085 CC-3-V1 5.00% Clearing point [° C.]: 73.2 CC-4-V1 22.00% Δn [589 nm, 20° C.]: 0.1003 CCH-34 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-35 4.50% ε.sub.⊥[1 kHz, 20° C.]: 7.1 CCP-3-1 6.50% Δε [1 kHz, 20° C.]: −3.5 CCY-3-O1 5.00% K.sub.1 [pN, 20° C.]: 14.6 CCY-3-O2 10.00% K.sub.3 [pN, 20° C.]: 16.0 CPY-2-O2 2.50% V.sub.0 [pN, 20° C.]: 2.26 CPY-3-O2 2.50% γ.sub.1 [mPa s, 20° C.]: 107 CY-3-O2 15.50% CY-5-O2 3.50% PGIY-2-O4 4.00% PY-1-O2 13.50%

Example M79

[0408]

TABLE-US-00086 CC-3-V1 5.50% Clearing point [° C.]: 74.7 CC-4-V1 22.00% Δn [589 nm, 20° C.]: 0.0990 CCH-34 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-35 5.50% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CCP-3-1 7.00% Δε [1 kHz, 20° C.]: −3.5 CCY-3-O1 7.50% K.sub.1 [pN, 20° C.]: 14.9 CCY-3-O2 10.00% K.sub.3 [pN, 20° C.]: 16.3 CPY-3-O2 2.00% V.sub.0 [pN, 20° C.]: 2.29 CY-3-O2 15.50% γ.sub.1 [mPa s, 20° C.]: 108 CY-5-O2 3.00% PGIY-2-O4 4.00% PY-1-O2 14.00%

Example M80

[0409]

TABLE-US-00087 CC-3-V1 5.50% Clearing point [° C.]: 74.3 CC-4-V1 22.00% Δn [589 nm, 20° C.]: 0.0992 CCH-34 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-35 5.50% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CCP-3-1 7.00% Δε [1 kHz, 20° C.]: −3.5 CCY-3-O1 7.50% K.sub.1 [pN, 20° C.]: 14.8 CCY-3-O2 10.00% K.sub.3 [pN, 20° C.]: 16.2 CPY-3-O2 1.00% V.sub.0 [pN, 20° C.]: 2.28 CY-3-O2 15.50% γ.sub.1 [mPa s, 20° C.]: 106 CY-5-O2 3.50% PGIY-2-O4 5.00% PY-1-O2 13.50%

Example M81

[0410]

TABLE-US-00088 CC-4-V1 23.00% Clearing point [° C.]: 74.7 CC-3-V1 7.00% Δn [589 nm, 20° C.]: 0.0940 CCH-34 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.3 CCH-35 4.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.3 CLY-3-O2 5.00% Δε [1 kHz, 20° C.]: −2.9 CLY-3-O3 6.00% K.sub.1 [pN, 20° C.]: 14.5 CPY-2-O2 8.00% K.sub.3 [pN, 20° C.]: 15.4 CPY-3-O2 8.50% V.sub.0 [pN, 20° C.]: 2.43 CY-3-O2 15.50% γ.sub.1 [mPa s, 20° C.]: 99 CY-3-O4 7.00% LTS bulk [−20° C.]: >1000 h PCH-302 10.00% PYP-2-3 1.00%

Example M82

[0411]

TABLE-US-00089 CC-4-V1 23.00% Clearing point [° C.]: 75.2 CC-3-V1 7.00% Δn [589 nm, 20° C.]: 0.0948 CCH-34 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.4 CCH-35 4.50% ε.sub.⊥ [1 kHz, 20° C.]: 6.3 CCY-3-O1 8.00% Δε [1 kHz, 20° C.]: −2.9 CCY-3-O2 2.00% K.sub.1 [pN, 20° C.]: 14.2 CPY-2-O2 6.00% K.sub.3 [pN, 20° C.]: 15.4 CPY-3-O2 11.00% V.sub.0 [pN, 20° C.]: 2.42 CY-3-O2 16.00% γ.sub.1 [mPa s, 20° C.]: 101 CY-3-O4 7.00% LTS bulk [−20° C.]: >1000 h PCH-302 7.50% PYP-2-3 3.00%

Example M83

[0412]

TABLE-US-00090 CC-3-V1 7.00% Clearing point [° C.]: 75.5 CC-4-V1 20.00% Δn [589 nm, 20° C.]: 0.0991 CCH-34 3.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-24 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCP-3-1 7.50% Δε [1 kHz, 20° C.]: −3.5 CCY-3-O2 12.50% K.sub.1 [pN, 20° C.]: 14.9 CPY-3-O2 12.50% K.sub.3 [pN, 20° C.]: 16.5 CY-3-O2 15.50% V.sub.0 [pN, 20° C.]: 2.30 CY-3-O4 4.50% γ.sub.1 [mPa s, 20° C.]: 112 PY-3-O2 12.50% LTS bulk [−20° C.]: >1000 h

Example M84

[0413]

TABLE-US-00091 CC-3-V1 8.00% Clearing point [° C.]: 86.9 CC-4-V1 8.00% Δn [589 nm, 20° C.]: 0.1050 CCH-34 16.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCY-3-O2 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.0 CCY-3-O3 5.00% Δε [1 kHz, 20° C.]: −4.4 CCY-4-O2 8.00% K.sub.1 [pN, 20° C.]: 16.8 CLY-3-O2 8.00% K.sub.3 [pN, 20° C.]: 17.2 CPY-2-O2 8.00% V.sub.0 [pN, 20° C.]: 2.09 CPY-3-O2 7.00% γ.sub.1 [mPa s, 20° C.]: 146 CY-3-O2 15.00% PY-3-O2 12.00%

Example M85

[0414]

TABLE-US-00092 CC-3-V1 1.00% Clearing point [° C.]: 74.5 CC-4-V1 23.00% Δn [589 nm, 20° C.]: 0.0996 CCH-34 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-35 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCP-3-1 9.00% Δε [1 kHz, 20° C.]: −3.5 CCY-3-O2 12.00% K.sub.1 [pN, 20° C.]: 15.1 CPY-3-O2 10.00% K.sub.3 [pN, 20° C.]: 16.4 CY-3-O2 15.50% V.sub.0 [pN, 20° C.]: 2.30 CY-3-O4 4.00% γ.sub.1 [mPa s, 20° C.]: 111 PY-3-O2 15.50%

Example M86

[0415]

TABLE-US-00093 CY-3-O2 14.00% Clearing point [° C.]: 86.8 CY-3-O4 2.00% Δn [589 nm, 20° C.]: 0.1029 CY-5-O2 12.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCY-3-O1 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.0 CCY-3-O2 9.00% Δε [1 kHz, 20° C.]: −4.3 CCY-4-O2 8.00% K.sub.1 [pN, 20° C.]: 15.6 CPY-2-O2 8.00% K.sub.3 [pN, 20° C.]: 16.6 CPY-3-O2 8.00% V.sub.0 [pN, 20° C.]: 2.07 PYP-2-3 5.00% γ.sub.1 [mPa s, 20° C.]: 153 CC-3-V1 7.00% CCH-34 10.00% CC-4-V1 12.00%

Example M87

[0416]

TABLE-US-00094 CY-3-O2 12.00% Clearing point [° C.]: 86.6 CY-3-O4 2.00% Δn [589 nm, 20° C.]: 0.1043 CY-5-O2 12.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCY-3-O1 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.0 CCY-3-O2 9.00% Δε [1 kHz, 20° C.]: −4.3 CCY-4-O2 8.00% K.sub.1 [pN, 20° C.]: 16.3 CPY-2-O2 2.00% K.sub.3 [pN, 20° C.]: 16.2 CPY-3-O2 6.00% V.sub.0 [pN, 20° C.]: 2.05 PYP-2-3 5.00% γ.sub.1 [mPa s, 20° C.]: 145 CC-3-V1 7.00% BCH-32 4.00% CCH-34 13.00% CC-4-V1 10.00% B(S)-2O-O5 5.00%

Example M88

[0417]

TABLE-US-00095 BCH-32 7.00% Clearing point [° C.]: 86.4 CC-3-V1 7.00% Δn [589 nm, 20° C.]: 0.1098 CC-4-V1 9.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCH-34 14.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.0 CCY-3-O2 5.00% Δε [1 kHz, 20° C.]: −4.3 CCY-3-O3 5.00% K.sub.1 [pN, 20° C.]: 17.0 CCY-4-O2 8.00% K.sub.3 [pN, 20° C.]: 16.3 CLY-3-O2 8.00% V.sub.0 [pN, 20° C.]: 2.05 CPY-2-O2 6.00% γ.sub.1 [mPa s, 20° C.]: 139 CY-3-O2 14.00% PY-3-O2 12.00% B(S)-2O-O5 5.00%

Example M89

[0418]

TABLE-US-00096 CC-3-V1 7.00% Clearing point [° C.]: 75 CC-4-V1 23.00% Δn [589 nm, 20° C.]: 0.1003 CCH-34 3.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-35 7.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CCP-3-1 2.50% Δε [1 kHz, 20° C.]: −3.5 CCY-3-O1 6.00% K.sub.1 [pN, 20° C.]: 15.3 CCY-3-O2 10.00% K.sub.3 [pN, 20° C.]: 16.8 CPY-3-O2 10.00% V.sub.0 [pN, 20° C.]: 2.31 CY-3-O2 14.50% γ.sub.1 [mPa s, 20° C.]: 105 PY-3-O2 10.00% LTS bulk [−20° C.]: >1000 h PY-1-O2 7.00% LTS bulk [−25° C.]: >1000 h

Example M90

[0419]

TABLE-US-00097 CC-3-V1 7.00% Clearing point [° C.]: 75 CC-4-V1 20.00% Δn [589 nm, 20° C.]: 0.0998 CCH-34 3.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-35 7.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CCP-3-1 4.50% Δε [1 kHz, 20° C.]: −3.6 CCY-3-O2 12.50% K.sub.1 [pN, 20° C.]: 15.2 CPY-3-O2 12.50% K.sub.3 [pN, 20° C.]: 17.0 CY-3-O2 15.50% V.sub.0 [pN, 20° C.]: 2.30 CY-3-O4 4.50% γ.sub.1 [mPa s, 20° C.]: 113 PY-3-O2 13.50%

Example M91

[0420]

TABLE-US-00098 CC-3-V1 7.50% Clearing point [° C.]: 75.5 CC-4-V1 23.00% Δn [589 nm, 20° C.]: 0.0993 CCH-25 7.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCP-3-1 4.40% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CCY-3-O1 7.50% Δε [1 kHz, 20° C.]: −3.5 CCY-3-O2 12.00% K.sub.1 [pN, 20° C.]: 14.6 CPY-3-O2 8.00% K.sub.3 [pN, 20° C.]: 16.2 CY-3-O2 13.00% V.sub.0 [pN, 20° C.]: 2.26 PY-1-O2 9.00% γ.sub.1 [mPa s, 20° C.]: 107 PY-2-O2 8.00% LTS bulk [−20° C.]: >1000 h LTS bulk [−25° C.]: >1000 h

Example M92

[0421]

TABLE-US-00099 CC-3-V1 7.50% Clearing point [° C.]: 74 CC-4-V1 11.00% Δn [589 nm, 20° C.]: 0.0987 CCH-301 10.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-25 6.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CCH-24 6.00% Δε [1 kHz, 20° C.]: −3.3 CCP-V2-1 6.00% K.sub.1 [pN, 20° C.]: 13.9 CCY-3-O1 7.00% K.sub.3 [pN, 20° C.]: 15.1 CCY-3-O2 11.00% V.sub.0 [pN, 20° C.]: 2.28 CPY-3-O2 12.00% γ.sub.1 [mPa s, 20° C.]: 102 CY-3-O2 6.00% LTS bulk [−20° C.]: >1000 h PY-1-O2 9.50% PY-2-O2 8.00%

Example M93

[0422]

TABLE-US-00100 CC-3-V1 7.50% Clearing point [° C.]: 75 CC-4-V1 23.00% Δn [589 nm, 20° C.]: 0.0987 CCH-24 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-25 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CCP-3-1 3.00% Δε [1 kHz, 20° C.]: −3.4 CCY-3-O1 7.50% K.sub.1 [pN, 20° C.]: 14.5 CCY-3-O2 11.50% K.sub.3 [pN, 20° C.]: 15.6 CPY-3-O2 9.50% V.sub.0 [pN, 20° C.]: 2.27 CY-3-O2 11.00% γ.sub.1 [mPa s, 20° C.]: 103 PY-3-O2 4.00% LTS bulk [−20° C.]: >1000 h PY-1-O2 7.00% PY-2-O2 6.00%

Example M94

[0423]

TABLE-US-00101 CC-3-V1 7.50% Clearing point [° C.]: 76.5 CC-4-V1 23.00% Δn [589 nm, 20° C.]: 0.0993 CCH-24 7.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCP-3-1 4.50% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CCY-3-O1 7.50% Δε [1 kHz, 20° C.]: −3.5 CCY-3-O2 12.00% K.sub.1 [pN, 20° C.]: 14.4 CPY-3-O2 9.50% K.sub.3 [pN, 20° C.]: 15.9 CY-3-O2 12.50% V.sub.0 [pN, 20° C.]: 2.26 PY-3-O2 2.00% γ.sub.1 [mPa s, 20° C.]: 108 PY-1-O2 7.00% LTS bulk [−20° C.]: >1000 h PY-2-O2 7.00%

Example M95

[0424]

TABLE-US-00102 CC-3-V1 7.50% Clearing point [° C.]: 73.5 CC-4-V1 20.50% Δn [589 nm, 20° C.]: 0.0989 CCH-24 9.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCP-3-1 10.50% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CCY-3-O1 7.00% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O2 11.50% K.sub.1 [pN, 20° C.]: 14.9 CY-3-O2 12.00% K.sub.3 [pN, 20° C.]: 15.3 B(S)-2O-O5 4.00% V.sub.0 [pN, 20° C.]: 2.27 B(S)-2O-O4 3.00% γ.sub.1 [mPa s, 20° C.]: 94 PP-1-3 3.50% LTS bulk [−20° C.]: >1000 h PY-1-O2 8.00% LTS bulk [−25° C.]: >1000 h PY-2-O2 3.50%

Example M96

[0425]

TABLE-US-00103 CC-3-V1 7.50% Clearing point [° C.]: 75 CC-4-V1 11.00% Δn [589 nm, 20° C.]: 0.0986 CCH-301 10.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-24 6.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCH-34 6.00% Δε [1 kHz, 20° C.]: −3.4 CCP-V2-1 5.00% K.sub.1 [pN, 20° C.]: 14.0 CCY-3-O1 7.00% K.sub.3 [pN, 20° C.]: 15.2 CCY-3-O2 11.50% V.sub.0 [pN, 20° C.]: 2.25 CPY-3-O2 12.00% γ.sub.1 [mPa s, 20° C.]: 103 CY-3-O2 6.50% LTS bulk [−20° C.]: >1000 h PY-1-O2 9.50% PY-2-O2 8.00%

Example M97

[0426]

TABLE-US-00104 CC-3-V1 7.50% Clearing point [° C.]: 75 CC-4-V1 11.00% Δn [589 nm, 20° C.]: 0.0980 CCH-301 10.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-34 6.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CCH-35 6.00% Δε [1 kHz, 20° C.]: −3.5 CCP-V2-1 3.00% K.sub.1 [pN, 20° C.]: 14.7 CCY-3-O1 7.00% K.sub.3 [pN, 20° C.]: 16.2 CCY-3-O2 11.00% V.sub.0 [pN, 20° C.]: 2.28 CPY-3-O2 11.50% γ.sub.1 [mPa s, 20° C.]: 108 CY-3-O2 11.00% LTS bulk [−20° C.]: >1000 h PY-3-O2 16.00%

Example M98

[0427]

TABLE-US-00105 CC-3-V1 7.50% Clearing point [° C.]: 75 CC-4-V1 11.00% Δn [589 nm, 20° C.]: 0.0978 CCH-301 10.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-34 6.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CCH-35 6.00% Δε [1 kHz, 20° C.]: −3.5 CCP-3-1 3.00% K.sub.1 [pN, 20° C.]: 14.8 CCY-3-O1 7.00% K.sub.3 [pN, 20° C.]: 16.3 CCY-3-O2 11.00% V.sub.0 [V, 20° C.]: 2.28 CPY-3-O2 11.50% γ.sub.1 [mPa s, 20° C.]: 108 CY-3-O2 11.00% LTS bulk [−20° C.]: >1000 h PY-3-O2 16.00% LTS bulk [−25° C.]: >1000 h

Example M99

[0428]

TABLE-US-00106 CC-3-V1 7.50% Clearing point [° C.]: 74 CC-4-V1 11.00% Δn [589 nm, 20° C.]: 0.0981 CCH-301 16.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCH-24 6.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CCP-3-1 7.00% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O1 7.00% K.sub.1 [pN, 20° C.]: 13.7 CCY-3-O2 11.00% K.sub.3 [pN, 20° C.]: 15.5 CPY-3-O2 12.00% V.sub.0 [V, 20° C.]: 2.30 CY-3-O2 5.50% γ.sub.1 [mPa s, 20° C.]: 103 PY-1-O2 9.00% LTS bulk [−20° C.]: >1000 h PY-2-O2 8.00%

Example M100

[0429]

TABLE-US-00107 CC-3-V1 7.50% Clearing point [° C.]: 74.5 CC-4-V1 11.00% Δn [589 nm, 20° C.]: 0.0997 CCH-301 16.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCH-25 6.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CCP-V2-1 6.00% Δε [1 kHz, 20° C.]: −3.4 CCY-3-O1 7.00% K.sub.1 [pN, 20° C.]: 13.9 CCY-3-O2 11.50% K.sub.3 [pN, 20° C.]: 15.7 CPY-3-O2 12.00% V.sub.0 [V, 20° C.]: 2.28 CY-3-O2 5.50% γ.sub.1 [mPa s, 20° C.]: 106 PY-1-O2 9.50% LTS bulk [−20° C.]: >1000 h PY-2-O2 8.00%

Example M101

[0430]

TABLE-US-00108 CC-3-V1 7.50% Clearing point [° C.]: 75.5 CC-4-V1 11.00% Δn [589 nm, 20° C.]: 0.0996 CCH-301 10.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCH-34 6.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.2 CCH-35 6.00% Δε [1 kHz, 20° C.]: −3.5 CCP-V2-1 3.50% K.sub.1 [pN, 20° C.]: 14.4 CCY-3-O1 7.00% K.sub.3 [pN, 20° C.]: 16.0 CCY-3-O2 11.00% V.sub.0 [pN, 20° C.]: 2.26 CPY-3-O2 12.00% γ.sub.1 [mPa s, 20° C.]: 105 CY-3-O2 8.50% PY-1-O2 9.00% PY-2-O2 8.50%

Example M102

[0431]

TABLE-US-00109 CCP-V-1 12.00% Clearing point [° C.]: 74 CCP-V2-1 6.00% Δn [589 nm, 20° C.]: 0.1039 CCY-4-O2 12.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CPY-2-O2 9.50% ε.sub.⊥ [1 kHz, 20° C.]: 6.5 B(S)-2O-O4 0.50% Δε [1 kHz, 20° C.]: −2.9 CC-3-V1 11.00% K.sub.1 [pN, 20° C.]: 13.2 CC-4-V1 3.00% K.sub.3 [pN, 20° C.]: 14.9 CCH-24 4.00% V.sub.0 [pN, 20° C.]: 2.39 CCH-35 6.50% γ.sub.1 [mPa s, 20° C.]: 98 CY-3-O2 10.00% LTS bulk [−20° C.]: >1000 h PCH-301 9.00% LTS bulk [−25° C.]: >1000 h PY-1-O2 10.00% PY-2-O2 6.50%

Example M103

[0432]

TABLE-US-00110 BCH-32 8.00% Clearing point [° C.]: 75.5 CCH-23 15.00% Δn [589 nm, 20° C.]: 0.1166 CC-4-V1 12.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCP-3-1 4.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CCY-4-O2 6.00% Δε [1 kHz, 20° C.]: −3.1 CPY-2-O2 10.00% K.sub.1 [pN, 20° C.]: 13.5 CPY-3-O2 10.00% K.sub.3 [pN, 20° C.]: 14.5 CY-3-O2 13.00% V.sub.0 [pN, 20° C.]: 2.30 PCH-301 5.50% γ.sub.1 [mPa s, 20° C.]: 111 PY-1-O2 9.00% LTS bulk [−20° C.]: >1000 h PP-1-2V1 2.50% LTS bulk [−25° C.]: >1000 h PGIY-2-O4 4.50%

Example M104

[0433]

TABLE-US-00111 B-2O-O5 4.00% Clearing point [° C.]: 74 BCH-32 8.00% Δn [589 nm, 20° C.]: 0.1090 CC-3-V1 9.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CC-4-V1 20.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CCP-3-1 7.50% Δε [1 kHz, 20° C.]: −3.1 CCP-V2-1 5.00% K.sub.1 [pN, 20° C.]: 14.1 CCY-3-O2 9.00% K.sub.3 [pN, 20° C.]: 16.2 CLY-3-O2 1.00% V.sub.0 [pN, 20° C.]: 2.40 CPY-3-O 3.00% γ.sub.1 [mPa s, 20° C.]: 100 CY-3-O2 14.50% LTS bulk [−20° C.]: >1000 h PCH-301 3.50% LTS bulk [−25° C.]: >1000 h PY-1-O2 8.00% PY-2-O2 7.50%

Example M105

[0434]

TABLE-US-00112 BCH-32 8.00% Clearing point [° C.]: 75 CC-3-V1 9.00% Δn [589 nm, 20° C.]: 0.1097 CC-4-V1 17.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCP-3-1 3.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CCP-V2-1 5.00% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O1 3.50% K.sub.1 [pN, 20° C.]: 13.9 CCY-3-O2 10.50% K.sub.3 [pN, 20° C.]: 16.5 CLY-3-O2 1.00% V.sub.0 [pN, 20° C.]: 2.40 CPY-3-O2 5.50% γ.sub.1 [mPa s, 20° C.]: 107 CY-3-O2 14.50% LTS bulk [−20° C.]: >1000 h PCH-301 6.00% LTS bulk [−25° C.]: >1000 h PY-1-O2 8.50% PY-2-O2 8.50%

Example M106

[0435]

TABLE-US-00113 BCH-32 5.00% Clearing point [° C.]: 75 CC-3-V1 6.00% Δn [589 nm, 20° C.]: 0.1064 CC-4-V1 17.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCP-3-1 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CCP-3-3 3.00% Δε [1 kHz, 20° C.]: −3.3 CCY-3-1 2.00% K.sub.1 [pN, 20° C.]: 14.3 CCY-3-O2 10.50% K.sub.3 [pN, 20° C.]: 16.6 CCY-4-O2 5.00% V.sub.0 [pN, 20° C.]: 2.36 CPY-3-O2 3.50% γ.sub.1 [mPa s, 20° C.]: 117 CY-3-O2 15.50% LTS bulk [−20° C.]: >1000 h PCH-301 5.50% LTS bulk [−25° C.]: >1000 h PY-1-O4 6.00% PY-3-O2 12.50%

Example M107

[0436]

TABLE-US-00114 BCH-32 5.00% Clearing point [° C.]: 75 CC-3-V1 6.00% Δn [589 nm, 20° C.]: 0.1066 CC-4-V1 18.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCP-3-1 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCP-3-3 3.00% Δε [1 kHz, 20° C.]: −3.3 CCY-3-1 2.00% K.sub.1 [pN, 20° C.]: 13.9 CCY-3-O2 10.50% K.sub.3 [pN, 20° C.]: 16.5 CCY-4-O2 5.00% V.sub.0 [pN, 20° C.]: 2.35 CPY-3-O2 4.00% γ.sub.1 [mPa s, 20° C.]: 112 CY-3-O2 15.50% LTS bulk [−20° C.]: >1000 h PCH-301 5.50% LTS bulk [−25° C.]: >1000 h PY-1-O2 9.00% PY-2-O2 8.50%

Example M108

[0437]

TABLE-US-00115 CCP-V-1 12.00% Clearing point [° C.]: 75 CCY-4-O2 6.00% Δn [589 nm, 20° C.]: 0.1042 CPY-2-O2 11.50% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CPY-3-O2 6.50% ε.sub.⊥ [1 kHz, 20° C.]: 6.5 CC-3-V1 11.00% Δε [1 kHz, 20° C.]: −2.9 CC-4-V1 15.00% K.sub.1 [pN, 20° C.]: 13.3 CCH-34 5.50% K.sub.3 [pN, 20° C.]: 15.4 CY-3-O2 14.50% V.sub.0 [pN, 20° C.]: 2.41 PCH-301 7.00% γ.sub.1 [mPa s, 20° C.]: 97 PY-1-O2 10.00% LTS bulk [−20° C.]: >1000 h PY-2-O2 1.00%

Example M109

[0438]

TABLE-US-00116 B-2O-O5 4.00% Clearing point [° C.]: 74.5 BCH-32 7.00% Δn [589 nm, 20° C.]: 0.1088 CC-3-V1 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-4-V1 14.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CC-1V-V2 14.00% Δε [1 kHz, 20° C.]: −3.3 CCP-3-1 8.00% K.sub.1 [pN, 20° C.]: 14.7 CCY-3-O2 11.00% K.sub.3 [pN, 20° C.]: 16.9 CLY-3-O2 1.00% V.sub.0 [pN, 20° C.]: 2.41 CPY-3-O2 3.00% γ.sub.1 [mPa s, 20° C.]: 99 CY-3-O2 14.50% LTS bulk [−20° C.]: >1000 h PY-1-O2 8.00% LTS bulk [−25° C.]: >1000 h PY-2-O2 7.50%

Example M110

[0439]

TABLE-US-00117 B-2O-O5 4.00% Clearing point [° C.]: 75 BCH-32 8.00% Δn [589 nm, 20° C.]: 0.1080 CC-3-V1 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-4-V1 15.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.5 CC-2V-V2 15.00% Δε [1 kHz, 20° C.]: −2.9 CCP-3-1 8.00% K.sub.1 [pN, 20° C.]: 14.4 CCY-3-O2 9.00% K.sub.3 [pN, 20° C.]: 15.2 CLY-3-O2 1.00% V.sub.0 [pN, 20° C.]: 2.41 CPY-3-O2 4.00% γ.sub.1 [mPa s, 20° C.]: 92 CY-3-O2 12.00% LTS bulk [−20° C.]: >1000 h PY-1-O2 8.00% PY-2-O2 8.00%

Example M111

[0440]

TABLE-US-00118 BCH-32 4.00% Clearing point [° C.]: 76 CC-3-V1 7.00% Δn [589 nm, 20° C.]: 0.1090 CC-4-V1 14.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-1V-V2 14.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CCP-3-1 7.50% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O1 1.50% K.sub.1 [pN, 20° C.]: 14.6 CCY-3-O2 10.50% K.sub.3 [pN, 20° C.]: 17.6 CLY-3-O2 1.00% V.sub.0 [pN, 20° C.]: 2.44 CPY-3-O2 7.50% γ.sub.1 [mPa s, 20° C.]: 104 CY-3-O2 14.50% LTS bulk [−20° C.]: >1000 h PY-1-O2 9.50% LTS bulk [−25° C.]: >1000 h PY-2-O2 9.00%

Example M112

[0441]

TABLE-US-00119 BCH-32 5.50% Clearing point [° C.]: 75.5 CC-3-V1 7.00% Δn [589 nm, 20° C.]: 0.1086 CC-4-V1 14.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-2V-V2 14.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.5 CCP-3-1 9.00% Δε [1 kHz, 20° C.]: −3.0 CCY-3-O2 8.00% K.sub.1 [pN, 20° C.]: 14.3 CLY-3-O2 1.00% K.sub.3 [pN, 20° C.]: 15.8 CPY-3-O2 9.00% V.sub.0 [pN, 20° C.]: 2.43 CY-3-O2 14.50% γ.sub.1 [mPa s, 20° C.]: 97 PY-1-O2 9.00% LTS bulk [−20° C.]: >1000 h PY-2-O2 9.00% LTS bulk [−25° C.]: >1000 h

Example M113

[0442]

TABLE-US-00120 CCP-V-1 12.00% Clearing point [° C.]: 74 CCY-4-O2 9.00% Δn [589 nm, 20° C.]: 0.1035 CPY-2-O2 12.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CPY-3-O2 3.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.4 CC-3-V1 11.00% Δε [1 kHz, 20° C.]: −2.9 CC-4-V1 15.00% K.sub.1 [pN, 20° C.]: 13.0 CCH-34 4.50% K.sub.3 [pN, 20° C.]: 14.9 CY-3-O2 12.00% V.sub.0 [pN, 20° C.]: 2.40 PCH-301 8.50% γ.sub.1 [mPa s, 20° C.]: 95 PY-1-O2 10.00% LTS bulk [−20° C.]: >1000 h PY-2-O2 3.00%

Example M114

[0443]

TABLE-US-00121 BCH-32 5.50% Clearing point [° C.]: 75 CCP-V2-1 1.50% Δn [589 nm, 20° C.]: 0.1080 CCY-3-O2 11.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CLY-3-O2 1.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CPY-3-O2 12.00% Δε [1 kHz, 20° C.]: −3.3 CC-3-V1 11.00% K.sub.1 [pN, 20° C.]: 15.1 CCH-34 8.00% K.sub.3 [pN, 20° C.]: 16.7 CCH-35 5.00% V.sub.0 [pN, 20° C.]: 2.37 CY-3-O2 13.50% γ.sub.1 [mPa s, 20° C.]: 109 PCH-301 2.50% LTS bulk [−20° C.]: >1000 h PY-3-O2 18.00% CC-4-V1 11.00%

Example M115

[0444]

TABLE-US-00122 BCH-32 4.00% Clearing point [° C.]: 74.50 CC-3-V1 7.00% Δn [589 nm, 20° C.]: 0.1089 CC-4-V1 14.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-1V-V2 14.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CCP-3-1 7.00% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O1 2.00% K.sub.1 [pN, 20° C.]: 14.3 CCY-3-O2 10.50% K.sub.3 [pN, 20° C.]: 17.3 CLY-3-O2 1.00% V.sub.0 [pN, 20° C.]: 2.41 CPY-3-O2 7.00% γ.sub.1 [mPa s, 20° C.]: 103 CY-3-O2 14.50% LTS bulk [−20° C.]: >1000 h PY-1-O2 9.50% LTS bulk [−25° C.]: >1000 h PY-2-O2 9.50%

Example M116

[0445]

TABLE-US-00123 BCH-32 5.50% Clearing point [° C.]: 74.50 CC-3-V1 7.00% Δn [589 nm, 20° C.]: 0.1087 CC-4-V1 14.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-2V-V2 14.00% ε.sub.⊥[1 kHz, 20° C.]: 6.6 CCP-3-1 8.50% Δε [1 kHz, 20° C.]: −3.0 CCY-3-O1 8.50% K.sub.1 [pN, 20° C.]: 14.1 CLY-3-O2 1.00% K.sub.3 [pN, 20° C.]: 15.7 CPY-3-O2 8.50% V.sub.0 [pN, 20° C.]: 2.41 CY-3-O2 14.50% γ.sub.1 [mPa s, 20° C.]: 97 PY-1-O2 9.50% LTS bulk [−20° C.]: >1000 h PY-2-O2 9.00% LTS bulk [−25° C.]: >1000 h

Example M117

[0446]

TABLE-US-00124 CCP-3-1 1.00% Clearing point [° C.]: 89 CCP-V-1 10.00% Δn [589 nm, 20° C.]: 0.1031 CCY-3-O2 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CLY-2-O4 2.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.0 CLY-3-O2 8.00% Δε [1 kHz, 20° C.]: −4.3 CLY-3-O3 5.00% K.sub.1 [pN, 20° C.]: 19.7 CLY-4-O2 5.00% K.sub.3 [pN, 20° C.]: 16.5 CPY-3-O2 0.50% V.sub.0 [pN, 20° C.]: 2.07 PGIY-2-O4 3.50% γ.sub.1 [mPa s, 20° C.]: 114 B(S)-2O-O4 4.00% B(S)-2O-O5 5.00% B(S)-2O-O6 3.00% CC-3-V1 8.00% CC-4-V1 20.00% CCH-34 5.00% CCH-35 5.00% Y-4O-O4 10.00%

Example M118

[0447]

TABLE-US-00125 CCY-2-1 5.00% Clearing point [° C.]: 88 CCY-3-1 10.00% Δn [589 nm, 20° C.]: 0.1035 CCY-3-O2 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CLY-2-O4 2.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.9 CLY-3-O2 8.00% Δε [1 kHz, 20° C.]: −4.2 CLY-3-O3 5.00% K.sub.1 [pN, 20° C.]: 20.2 CLY-4-O2 2.00% K.sub.3 [pN, 20° C.]: 16.7 PYP-2-3 5.00% V.sub.0 [pN, 20° C.]: 2.10 B(S)-2O-O4 4.00% γ.sub.1 [mPa s, 20° C.]: 121 B(S)-2O-O5 5.00% B(S)-2O-O6 3.00% CC-3-V1 8.00% CC-4-V1 21.00% CCH-34 5.00% CCH-35 5.00% Y-4O-O4 8.00%

Example M119

[0448]

TABLE-US-00126 CCP-3-1 8.50% Clearing point [° C.]: 111.5 CCP-V-1 10.00% Δn [589 nm, 20° C.]: 0.1024 CCY-3-1 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCY-3-O1 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.4 CCY-3-O2 10.00% Δε [1 kHz, 20° C.]: −4.7 CCY-3-O3 10.00% K.sub.1 [pN, 20° C.]: 22.0 CCY-5-O2 8.00% K.sub.3 [pN, 20° C.]: 20.0 CLY-3-O3 1.00% V.sub.0 [pN, 20° C.]: 2.17 B(S)-2O-O4 4.00% γ.sub.1 [mPa s, 20° C.]: 190 B(S)-2O-O5 5.00% B(S)-2O-O6 3.00% CCH-34 5.00% CC-4-V1 18.00% Y-4O-O4 7.50%

Example M120

[0449]

TABLE-US-00127 CCP-V-1 10.00% Clearing point [° C.]: 11.5 CCY-3-1 7.00% Δn [589 nm, 20° C.]: 0.1018 CCY-3-O1 7.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCY-3-O2 9.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.6 CCY-3-O3 9.00% Δε [1 kHz, 20° C.]: −5.0 CCY-5-O2 8.00% K.sub.1 [pN, 20° C.]: 22.2 CLY-3-O3 5.00% K.sub.3 [pN, 20° C.]: 19.7 B(S)-2O-O4 4.00% V.sub.0 [pN, 20° C.]: 2.11 B(S)-2O-O5 5.00% γ.sub.1 [mPa s, 20° C.]: 192 B(S)-2O-O6 3.00% CCH-34 5.00% CC-4-V1 22.00% Y-4O-O4 6.00%

Example M121

[0450]

TABLE-US-00128 CCP-3-1 10.00% Clearing point [° C.]: 85 CCP-V-1 10.00% Δn [589 nm, 20° C.]: 0.1033 CCY-3-O1 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.9 CCY-3-O2 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.2 CLY-2-O4 2.00% Δε [1 kHz, 20° C.]: −4.3 CLY-5-O2 1.50% K.sub.1 [pN, 20° C.]: 16.6 CPY-3-O2 7.50% K.sub.3 [pN, 20° C.]: 16.7 B(S)-2O-O4 4.00% V.sub.0 [pN, 20° C.]: 2.07 B(S)-2O-O5 5.00% γ.sub.1 [mPa s, 20° C.]: 119 B(S)-2O-O6 3.00% CC-3-V1 7.00% CC-4-V1 18.00% CCH-34 3.50% CY-3-O2 10.00% Y-4O-O4 8.50%

Example M122

[0451]

TABLE-US-00129 CCP-V-1 8.50% Clearing point [° C.]: 85 CCY-2-1 5.00% Δn [589 nm, 20° C.]: 0.1030 CCY-3-1 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.9 CCY-3-O1 4.50% ε.sub.⊥ [1 kHz, 20° C.]: 8.2 CLY-3-O2 9.00% Δε [1 kHz, 20° C.]: −4.4 CLY-2-O4 9.00% K.sub.1 [pN, 20° C.]: 18.1 PYP-2-3 5.00% K.sub.3 [pN, 20° C.]: 15.2 B(S)-2O-O4 4.00% V.sub.0 [pN, 20° C.]: 1.97 B(S)-2O-O5 5.00% γ.sub.1 [mPa s, 20° C.]: 121 B(S)-2O-O6 3.00% CC-3-V1 7.00% CC-4-V1 15.00% CCH-34 5.00% CCH-35 5.00% Y-4O-O4 10.00%

Example M123

[0452]

TABLE-US-00130 BCH-32 5.50% Clearing point [° C.]: 74.5 CC-3-V1 7.00% Δn [589 nm, 20° C.]: 0.1087 CC-4-V1 14.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-2V-V2 14.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CCP-3-1 7.50% Δε [1 kHz, 20° C.]: −3.0 CCY-3-O2 8.50% K.sub.1 [pN, 20° C.]: 14.8 CLY-3-O2 1.00% K.sub.3 [pN, 20° C.]: 16.1 CPY-3-O2 8.50% V.sub.0 [pN, 20° C.]: 2.43 CY-3-O2 15.50% γ.sub.1 [mPa s, 20° C.]: 102 PY-3-O2 18.50%

Example M124

[0453]

TABLE-US-00131 BCH-32 5.50% Clearing point [° C.]: 74.5 CC-3-V1 7.00% Δn [589 nm, 20° C.]: 0.1091 CC-4-V1 14.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CC-2V-V2 14.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCP-3-1 5.00% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O2 12.00% K.sub.1 [pN, 20° C.]: 14.2 CLY-3-O2 1.00% K.sub.3 [pN, 20° C.]: 15.8 CPY-3-O2 8.50% V.sub.0 [pN, 20° C.]: 2.31 CY-3-O2 14.50% γ.sub.1 [mPa s, 20° C.]: 100 PY-1-O2 9.50% PY-2-O2 9.00%

Example M125

[0454]

TABLE-US-00132 BCH-32 2.00% Clearing point [° C.]: 75 CC-3-V1 7.00% Δn [589 nm, 20° C.]: 0.1095 CC-4-V1 14.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CC-2V-V2 14.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.3 CCP-3-1 5.00% Δε [1 kHz, 20° C.]: −3.6 CCY-3-O2 12.00% K.sub.1 [pN, 20° C.]: 14.3 CLY-3-O2 1.00% K.sub.3 [pN, 20° C.]: 16.3 CPY-3-O2 12.00% V.sub.0 [pN, 20° C.]: 2.24 CY-3-O2 14.50% γ.sub.1 [mPa s, 20° C.]: 107 PY-1-O2 9.50% PY-2-O2 9.00%

Example M126

[0455]

TABLE-US-00133 BCH-32 1.00% Clearing point [° C.]: 74.50 CCP-V2-1 3.00% Δn [589 nm, 20° C.]: 0.1076 CCY-3-O2 11.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CLY-3-O2 1.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CPY-3-O2 12.00% Δε [1 kHz, 20° C.]: −3.3 CC-3-V1 11.00% K.sub.1 [pN, 20° C.]: 15.7 CCH-34 8.00% K.sub.3 [pN, 20° C.]: 16.7 CCH-35 5.00% V.sub.0 [pN, 20° C.]: 2.36 CY-3-O2 6.50% γ.sub.1 [mPa s, 20° C.]: 102 PY-3-O2 9.50% PY-1-O2 9.00% PY-2-O2 7.00% CC-4-V1 17.00%

Example M127

[0456]

TABLE-US-00134 BCH-32 2.50% Clearing point [° C.]: 73.40 CCP-V2-1 4.00% Δn [589 nm, 20° C.]: 0.1063 CCY-3-O2 11.50% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CLY-3-O2 1.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CPY-3-O2 12.00% Δε [1 kHz, 20° C.]: −3.2 CC-3-V1 11.00% K.sub.1 [pN, 20° C.]: 14.8 CCH-24 8.00% K.sub.3 [pN, 20° C.]: 15.9 CCH-35 4.00% V.sub.0 [pN, 20° C.]: 2.36 CY-3-O2 6.50% γ.sub.1 [mPa s, 20° C.]: 102 PY-3-O2 8.00% PY-1-O2 7.50% PY-2-O2 7.00% CC-4-V1 17.00%

Example M128

[0457]

TABLE-US-00135 CCP-3-1 5.00% Clearing point [° C.]: 87 CCP-V-1 6.00% Δn [589 nm, 20° C.]: 0.1022 CLY-2-O4 2.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CLY-3-O2 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.0 CLY-3-O3 5.00% Δε [1 kHz, 20° C.]: −4.3 CLY-4-O2 5.00% K.sub.1 [pN, 20° C.]: 18.6 CLY-5-O2 3.00% K.sub.3 [pN, 20° C.]: 16.4 CPY-3-O2 6.50% V.sub.0 [pN, 20° C.]: 2.06 B(S)-2O-O4 4.00% γ.sub.1 [mPa s, 20° C.]: 111 B(S)-2O-O5 5.00% B(S)-2O-O6 3.00% CC-3-V1 8.00% CC-4-V1 20.00% CCH-23 9.50% Y-4O-O4 10.00%

Example M129

[0458]

TABLE-US-00136 CCP-3-1 7.00% Clearing point [° C.]: 84 CCP-V-1 4.00% Δn [589 nm, 20° C.]: 0.1016 CLY-2-O4 2.00% ε.sub.∥ [1 kHz, 20° C.]: 3.8 CLY-3-O2 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.0 CLY-3-O3 5.00% Δε [1 kHz, 20° C.]: −4.3 CLY-4-O2 5.00% K.sub.1 [pN, 20° C.]: 18.0 CLY-5-O2 3.00% K.sub.3 [pN, 20° C.]: 16.5 CPY-3-O2 6.50% V.sub.0 [pN, 20° C.]: 2.08 B(S)-2O-O4 4.00% γ.sub.1 [mPa s, 20° C.]: 109 B(S)-2O-O5 5.00% B(S)-2O-O6 3.00% CC-3-V1 8.00% CC-4-V1 20.00% CCH-13 9.50% Y-4O-O4 10.00%

Example M130

[0459]

TABLE-US-00137 BCH-32 6.50% Clearing point [° C.]: 74.50 CCP-3-1 2.00% Δn [589 nm, 20° C.]: 0.1080 CCY-3-O2 11.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCY-4-O2 2.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CPY-3-O2 12.00% Δε [1 kHz, 20° C.]: −3.5 CCH-34 6.00% K.sub.1 [pN, 20° C.]: 14.6 CCH-35 4.50% K.sub.3 [pN, 20° C.]: 15.7 CC-4-V1 19.00% V.sub.0 [pN, 20° C.]: 2.25 CY-3-O2 15.00% γ.sub.1 [mPa s, 20° C.]: 115 CY-5-O2 1.00% PCH-301 5.00% PY-3-O2 16.00%

Example M131

[0460]

TABLE-US-00138 CCP-V-1 10.50% Clearing point [° C.]: 86.5 CLY-2-O4 3.00% Δn [589 nm, 20° C.]: 0.1019 CLY-3-O2 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CLY-3-O3 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.9 CLY-4-O2 5.00% Δε [1 kHz, 20° C.]: −4.2 CLY-5-O2 4.50% K.sub.1 [pN, 20° C.]: 17.8 B(S)-2O-O4 4.00% K.sub.3 [pN, 20° C.]: 17.1 B(S)-2O-O5 4.00% V.sub.0 [pN, 20° C.]: 2.14 B(S)-2O-O6 3.00% γ.sub.1 [mPa s, 20° C.]: 106 CC-3-V1 8.00% CC-4-V1 16.00% CC-1V-V2 15.00% CY-3-O2 5.00% Y-4O-O4 9.00%

Example M132

[0461]

TABLE-US-00139 CCP-V-1 8.50% Clearing point [° C.]: 90 CCY-3-O2 5.00% Δn [589 nm, 20° C.]: 0.1013 CLY-2-O4 3.50% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CLY-3-O2 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.2 CLY-3-O3 5.00% Δε [1 kHz, 20° C.]: −4.4 CLY-4-O2 5.00% K.sub.1 [pN, 20° C.]: 18.8 CLY-5-O2 5.00% K.sub.3 [pN, 20° C.]: 16.6 B(S)-2O-O4 3.00% V.sub.0 [pN, 20° C.]: 2.04 B(S)-2O-O5 4.00% γ.sub.1 [mPa s, 20° C.]: 115 B(S)-2O-O6 3.00% CC-3-V1 8.00% CC-4-V1 15.00% CC-2V-V2 14.00% CY-3-O2 4.00% Y-4O-O4 9.00%

Example M133

[0462]

TABLE-US-00140 BCH-32 4.50% Clearing point [° C.]: 74 CCP-V2-1 1.50% Δn [589 nm, 20° C.]: 0.1068 CCY-3-O2 11.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CLY-3-O2 1.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CPY-3-O2 12.00% Δε [1 kHz, 20° C.]: −3.2 CC-3-V1 11.00% K.sub.1 [pN, 20° C.]: 15.2 CY-3-O2 9.00% K.sub.3 [pN, 20° C.]: 16.3 PY-3-O2 7.00% V.sub.0 [pN, 20° C.]: 2.37 PY-1-O2 8.00% γ.sub.1 [mPa s, 20° C.]: 103 PY-2-O2 6.00% CC-4-V1 17.00% CCH-25 8.00% CCH-35 4.00%

Example M134

[0463]

TABLE-US-00141 CLP-V-1 9.00% Clearing point [° C.]: 84 CCP-V-1 2.00% Δn [589 nm, 20° C.]: 0.1050 CLY-2-O4 2.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CLY-3-O2 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.0 CLY-3-O3 5.00% Δε [1 kHz, 20° C.]: −4.2 CLY-4-O2 5.00% K.sub.1 [pN, 20° C.]: 18.7 CLY-5-O2 3.00% K.sub.3 [pN, 20° C.]: 16.3 CPY-3-O2 6.00% V.sub.0 [pN, 20° C.]: 2.07 B(S)-2O-O4 4.00% B(S)-2O-O5 5.00% B(S)-2O-O6 3.00% CC-3-V1 8.50% CC-4-V1 20.00% CCH-13 9.50% Y-4O-O4 10.00%

Example M135

[0464]

TABLE-US-00142 CLP-1V-1 7.00% Clearing point [° C.]: 85 CCP-V-1 2.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CLY-2-O4 2.50% ε.sub.⊥ [1 kHz, 20° C.]: 8.0 CLY-3-O2 8.00% Δε [1 kHz, 20° C.]: −4.3 CLY-3-O3 5.00% K.sub.1 [pN, 20° C.]: 18.9 CLY-4-O2 5.00% K.sub.3 [pN, 20° C.]: 17.5 CLY-5-O2 3.00% V.sub.0 [pN, 20° C.]: 2.13 CPY-3-O2 6.00% B(S)-2O-O4 4.00% B(S)-2O-O5 5.00% B(S)-2O-O6 3.00% CC-3-V1 10.00% CC-4-V1 20.00% CCH-13 9.50% Y-4O-O4 10.00%

Example M136

[0465]

TABLE-US-00143 CC-3-V1 7.50% Clearing point [° C.]: 74.5 CC-4-V1 11.00% Δn [589 nm, 20° C.]: 0.0982 CCH-301 16.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCH-24 6.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CCP-V2-1 7.00% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O1 7.00% K.sub.1 [pN, 20° C.]: 13.6 CCY-3-O2 11.00% K.sub.3 [pN, 20° C.]: 15.3 CPY-3-O2 12.00% V.sub.0 [pN, 20° C.]: 2.29 CY-3-O2 5.50% γ.sub.1 [mPa s, 20° C.]: 102 PY-1-O2 9.00% LTS bulk [−20° C.]: >1000 h PY-2-O2 8.00%

Example M137

[0466]

TABLE-US-00144 CC-3-V1 7.00% Clearing point [° C.]: 74 CC-4-V1 17.00% Δn [589 nm, 20° C.]: 0.0979 CCH-301 12.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-24 6.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCP-V2-1 7.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O1 8.00% K.sub.1 [pN, 20° C.]: 14.0 CCY-3-O2 12.00% K.sub.3 [pN, 20° C.]: 15.3 CPY-3-O2 7.50% V.sub.0 [pN, 20° C.]: 2.35 CY-3-O2 2.50% γ.sub.1 [mPa s, 20° C.]: 97 PY-3-O2 5.00% LTS bulk [−20° C.]: >1000 h PY-1-O2 9.00% LTS bulk [−30° C.]: >1000 h PY-2-O2 7.00%

Example M138

[0467]

TABLE-US-00145 CC-3-V1 7.50% Clearing point [° C.]: 73.5 CC-4-V1 23.00% Δn [589 nm, 20° C.]: 0.0982 CCH-24 7.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCP-3-1 6.00% ε.sub.⊥[1 kHz, 20° C.]: 6.9 CCY-3-O1 7.50% Δε [1 kHz, 20° C.]: −3.4 CCY-3-O2 11.50% K.sub.1 [pN, 20° C.]: 14.3 CPY-3-O2 7.50% K.sub.3 [pN, 20° C.]: 15.7 CY-3-O2 12.50% V.sub.0 [pN, 20° C.]: 2.28 PY-3-O2 3.00% γ.sub.1 [mPa s, 20° C.]: 103 PY-1-O2 7.00% LTS bulk [−20° C.]: >1000 h PY-2-O2 7.00% LTS bulk [−25° C.]: >1000 h

Example M139

[0468]

TABLE-US-00146 BCH-32 8.00% Clearing point [° C.]: 75 CCH-23 14.00% Δn [589 nm, 20° C.]: 0.1158 CC-4-V1 16.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCP-3-1 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CPY-2-O2 12.00% Δε [1 kHz, 20° C.]: −3.0 CPY-3-O2 12.00% K.sub.1 [pN, 20° C.]: 13.4 CY-3-O2 14.00% K.sub.3 [pN, 20° C.]: 14.4 PCH-301 5.50% V.sub.0 [pN, 20° C.]: 2.31 PY-1-O2 9.00% γ.sub.1 [mPa s, 20° C.]: 107 PGIY-2-O4 4.50% LTS bulk [−20° C.]: >1000 h

Example M140

[0469]

TABLE-US-00147 BCH-32 8.00% Clearing point [° C.]: 75 CCH-23 16.50% Δn [589 nm, 20° C.]: 0.1161 CC-4-V1 12.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCP-3-1 5.50% ε.sub.⊥[1 kHz, 20° C.]: 6.6 CLY-3-O2 2.00% Δε [1 kHz, 20° C.]: −3.0 CPY-2-O2 11.00% K.sub.1 [pN, 20° C.]: 13.4 CPY-3-O2 11.00% K.sub.3 [pN, 20° C.]: 14.4 CY-3-O2 13.00% V.sub.0 [pN, 20° C.]: 2.30 PCH-301 6.00% γ.sub.1 [mPa s, 20° C.]: 107 PY-1-O2 9.50% LTS bulk [−20° C.]: >1000 h PGIY-2-O4 5.00%

Example M141

[0470]

TABLE-US-00148 CC-3-V1 7.50% Clearing point [° C.]: 75.5 CC-4-V1 19.00% Δn [589 nm, 20° C.]: 0.0983 CCH-24 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-25 7.00% ε.sub.⊥[1 kHz, 20° C.]: 6.7 CCP-V2-1 4.00% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O1 7.50% K.sub.1 [pN, 20° C.]: 14.6 CCY-3-O2 11.00% K.sub.3 [pN, 20° C.]: 15.1 CPY-3-O2 10.00% V.sub.0 [pN, 20° C.]: 2.30 CY-3-O2 8.00% γ.sub.1 [mPa s, 20° C.]: 98 PY-3-O2 4.00% PY-1-O2 7.00% PY-2-O2 7.00%

Example M142

[0471]

TABLE-US-00149 CC-3-V1 7.50% Clearing point [° C.]: 75 CC-4-V1 23.00% Δn [589 nm, 20° C.]: 0.0981 CCH-24 10.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCP-3-1 4.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CCY-3-O1 7.50% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O2 11.50% K.sub.1 [pN, 20° C.]: 14.4 CPY-3-O2 9.00% K.sub.3 [pN, 20° C.]: 15.4 CY-3-O2 10.50% V.sub.0 [pN, 20° C.]: 2.29 PY-3-O2 4.00% γ.sub.1 [mPa s, 20° C.]: 100 PY-1-O2 7.00% LTS bulk [−20° C.]: >1000 h PY-2-O2 6.00%

Example M143

[0472]

TABLE-US-00150 CC-3-V1 7.50% Clearing point [° C.]: 74 CC-4-V1 20.50% Δn [589 nm, 20° C.]: 0.0977 CCH-24 9.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCP-3-1 11.50% ε.sub.⊥[1 kHz, 20° C.]: 6.7 CCY-3-O1 6.50% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O2 11.00% K.sub.1 [pN, 20° C.]: 14.9 CY-3-O2 13.50% K.sub.3 [pN, 20° C.]: 15.3 B(S)-2O-O5 4.00% V.sub.0 [pN, 20° C.]: 2.32 B(S)-2O-O4 3.00% γ.sub.1 [mPa s, 20° C.]: 92 PP-1-3 4.00% LTS bulk [−20° C.]: >1000 h PY-1-O2 6.50% PY-2-O2 3.00%

Example M144

[0473]

TABLE-US-00151 CC-3-V1 7.50% Clearing point [° C.]: 74.5 CC-4-V1 21.00% Δn [589 nm, 20° C.]: 0.0971 CCH-24 6.50% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCP-3-1 7.50% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CCY-3-O1 7.50% Δε [1 kHz, 20° C.]: −3.0 CCY-3-O2 12.00% K.sub.1 [pN, 20° C.]: 13.5 CPY-3-O2 11.50% K.sub.3 [pN, 20° C.]: 14.4 CY-3-S2 16.00% V.sub.0 [pN, 20° C.]: 2.31 PY-1-O2 6.50% γ.sub.1 [mPa s, 20° C.]: 109 PY-2-O2 4.00% LTS bulk [−20° C.]: >1000 h

Example M145

[0474]

TABLE-US-00152 B(S)-2O-O4 4.00% Clearing point [° C.]: 74.3 CC-3-V1 6.00% Δn [589 nm, 20° C.]: 0.1020 CC-4-V1 18.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-34 7.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CCH-35 8.50% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O2 10.50% K.sub.1 [pN, 20° C.]: 14.4 CCY-4-O2 5.50% K.sub.3 [pN, 20° C.]: 15.6 CLY-3-O2 1.00% V.sub.0 [pN, 20° C.]: 2.27 CPY-3-O2 9.50% γ.sub.1 [mPa s, 20° C.]: 101 CY-3-O2 5.50% PCH-301 8.50% PY-1-O2 8.00% PY-2-O2 8.00%

Example M146

[0475] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M145 is mixed with 0.35% of the polymerisable compound of the formula

##STR00422##

Example M147

[0476] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M1 is mixed with 0.25% of the polymerisable compound of the formula

##STR00423##

Example M148

[0477] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M2 is mixed with 0.2% of the polymerisable compound of the formula

##STR00424##

Example M149

[0478] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M5 is mixed with 0.25% of the polymerisable compound of the formula

##STR00425##

Example M150

[0479] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M11 is mixed with 0.25% of the polymerisable compound of the formula

##STR00426##

Example M151

[0480] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M17 is mixed with 0.25% of the polymerisable compound of the formula

##STR00427##

Example M152

[0481] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M18 is mixed with 0.2% of the polymerisable compound of the formula

##STR00428##

Example M153

[0482] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M19 is mixed with 0.2% of the polymerisable compound of the formula

##STR00429##

Example M154

[0483] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M20 is mixed with 0.25% of the polymerisable compound of the formula

##STR00430##

Example M155

[0484] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M21 is mixed with 0.3% of the polymerisable compound of the formula

##STR00431##

Example M156

[0485] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M21 is mixed with 0.3% of the polymerisable compound of the formula

##STR00432##

Example M157

[0486] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M22 is mixed with 0.25% of the polymerisable compound of the formula

##STR00433##

Example M158

[0487] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M22 is mixed with 0.3% of the polymerisable compound of the formula

##STR00434##

Example M159

[0488] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M22 is mixed with 0.3% of the polymerisable compound of the formula

##STR00435##

Example M160

[0489] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M23 is mixed with 0.25% of the polymerisable compound of the formula

##STR00436##

Example M161

[0490] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M25 is mixed with 0.3% of the polymerisable compound of the formula

##STR00437##

Example M162

[0491] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M30 is mixed with 0.25% of the polymerisable compound of the formula

##STR00438##

Example M163

[0492] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M31 is mixed with 0.2% of the polymerisable compound of the formula

##STR00439##

Example M164

[0493] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M32 is mixed with 0.3% of the polymerisable compound of the formula

##STR00440##

Example M165

[0494] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M36 is mixed with 0.3% of the polymerisable compound of the formula

##STR00441##

Example M166

[0495] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M37 is mixed with 0.3% of the polymerisable compound of the formula

##STR00442##

Example M167

[0496] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M37 is mixed with 0.3% of the polymerisable compound of the formula

##STR00443##

Example M168

[0497] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M40 is mixed with 0.3% of the polymerisable compound of the formula

##STR00444##

Example M169

[0498] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M41 is mixed with 0.25% of the polymerisable compound of the formula

##STR00445##

Example M170

[0499] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M44 is mixed with 0.25% of the polymerisable compound of the formula

##STR00446##

Example M171

[0500] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M44 is mixed with 0.3% of the polymerisable compound of the formula

##STR00447##

Example M172

[0501] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M52 is mixed with 0.3% of the polymerisable compound of the formula

##STR00448##

Example M173

[0502] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M52 is mixed with 0.3% of the polymerisable compound of the formula

##STR00449##

Example M174

[0503] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M52 is mixed with 0.3% of the polymerisable compound of the formula

##STR00450##

Example M175

[0504] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M52 is mixed with 0.3% of the polymerisable compound of the formula

##STR00451##

Example M176

[0505] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M52 is mixed with 0.3% of the polymerisable compound of the formula

##STR00452##

Example M177

[0506] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M52 is mixed with 0.3% of the polymerisable compound of the formula

##STR00453##

Example M178

[0507] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M55 is mixed with 0.25% of the polymerisable compound of the formula

##STR00454##

Example M179

[0508] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M58 is mixed with 0.2% of the polymerisable compound of the formula

##STR00455##

Example M180

[0509] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M89 is mixed with 0.25% of the polymerisable compound of the formula

##STR00456##

Example M181

[0510] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M90 is mixed with 0.25% of the polymerisable compound of the formula

##STR00457##

Example M182

[0511] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M91 is mixed with 0.25% of the polymerisable compound of the formula

##STR00458##

Example M183

[0512] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M92 is mixed with 0.25% of the polymerisable compound of the formula

##STR00459##

Example M184

[0513] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M92 is mixed with 0.3% of the polymerisable compound of the formula

##STR00460##

Example M185

[0514] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M95 is mixed with 0.25% of the polymerisable compound of the formula

##STR00461##

Example M186

[0515] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M96 is mixed with 0.3% of the polymerisable compound of the formula

##STR00462##

Example M187

[0516] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M97 is mixed with 0.25% of the polymerisable compound of the formula

##STR00463##

Example M188

[0517] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M98 is mixed with 0.3% of the polymerisable compound of the formula

##STR00464##

Example M189

[0518] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M99 is mixed with 0.25% of the polymerisable compound of the formula

##STR00465##

Example M190

[0519] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M99 is mixed with 0.25% of the polymerisable compound of the formula

##STR00466##

Example M191

[0520] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M100 is mixed with 0.25% of the polymerisable compound of the formula

##STR00467##

Example M192

[0521] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M100 is mixed with 0.25% of the polymerisable compound of the formula

##STR00468##

Example M193

[0522] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M101 is mixed with 0.25% of the polymerisable compound of the formula

##STR00469##

Example M194

[0523] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M102 is mixed with 0.25% of the polymerisable compound of the formula

##STR00470##

Example M195

[0524] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M103 is mixed with 0.3% of the polymerisable compound of the formula

##STR00471##

Example M196

[0525] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M104 is mixed with 0.3% of the polymerisable compound of the formula

##STR00472##

Example M197

[0526] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M105 is mixed with 0.3% of the polymerisable compound of the formula

##STR00473##

Example M198

[0527] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M105 is mixed with 0.3% of the polymerisable compound of the formula

##STR00474##

Example M199

[0528] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M106 is mixed with 0.3% of the polymerisable compound of the formula

##STR00475##

Example M200

[0529] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M107 is mixed with 0.25% of the polymerisable compound of the formula

##STR00476##

Example M201

[0530] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M108 is mixed with 0.25% of the polymerisable compound of the formula

##STR00477##

Example M202

[0531] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M109 is mixed with 0.25% of the polymerisable compound of the formula

##STR00478##

[0532] Examples M1-M202 may additionally also comprise one of the two stabilisers selected from Table C.

[0533] The PS-VA mixtures according to the invention comprising a polymerisable compound (reactive mesogen) exhibit higher polymerisation rates, a stable tilt angle and very short response times.

Example M203

[0534]

TABLE-US-00153 CC-3-V1 7.00% Clearing point [° C.]: 75 CC-4-V1 21.00% Δn [589 nm, 20° C.]: 0.0991 CCH-34 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-35 4.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.9 CCP-3-1 12.50% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O2 8.00% K.sub.1 [pN, 20° C.]: 14.9 CY-3-O2 12.50% K.sub.3 [pN, 20° C.]: 15.2 B(S)-2O-O5 4.00% V.sub.0 [pN, 20° C.]: 2.26 B(S)-2O-O4 3.00% γ.sub.1 [mPa s, 20° C.]: 91 PP-1-3 4.00% LTS bulk [−20° C.]: >1000 h Y-4O-O4 5.00% PY-V2-O2 4.00% CCY-V-O2 8.00% CPY-V-O2 3.00% CPY-V-O4 4.00%

Example M204

[0535]

TABLE-US-00154 CC-4-V1 25.00% Clearing point [° C.]: 80.5 PY-V2-O2 10.00% Δn [589 nm, 20° C.]: 0.1087 CCY-V-O2 8.00% Δε [1 kHz, 20° C.]: −6.3 CPY-V-O2 4.00% K.sub.1 [pN, 20° C.]: 12.4 CPY-V-O4 8.00% K.sub.3 [pN, 20° C.]: 16.7 CY-V-O2 16.00% V.sub.0 [pN, 20° C.]: 1.66 COY-3-O2 2.50% γ.sub.1 [mPa s, 20° C.]: 166 CCOY-2-O2 4.00% CCOY-3-O2 4.50% CCOY-V-O2 7.00% CCOY-V-O3 11.00%

Example M205

[0536]

TABLE-US-00155 CC-4-V1 25.00% Clearing point [° C.]: 87 CC-3-V1 9.00% Δn [589 nm, 20° C.]: 0.1034 PY-3-O2 7.00% Δε [1 kHz, 20° C.]: −4.5 CEY-3-O2 15.00% K.sub.1 [pN, 20° C.]: 17.4 CCP-3-1 2.00% K.sub.3 [pN, 20° C.]: 19.2 CAIY-3-O2 7.00% V.sub.0 [pN, 20° C.]: 2.21 APY-3-O2 8.00% γ.sub.1 [mPa s, 20° C.]: 178 CCOY-2-O2 8.00% CCOY-3-O2 14.00% PGP-2-5 5.00%

Example M206

[0537]

TABLE-US-00156 B(S)-2O-O4 4.00% Clearing point [° C.]: 74.5 B(S)-2O-O5 5.00% Δn [589 nm, 20° C.]: 0.1341 B(S)-2O-O6 2.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-3-V1 6.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CC-4-V1 22.00% Δε [1 kHz, 20° C.]: −3.0 CCH-35 4.00% K.sub.1 [pN, 20° C.]: 16.5 PP-1-2V1 2.50% K.sub.3 [pN, 20° C.]: 16.1 PP-1-3 7.00% V.sub.0 [pN, 20° C.]: 2.43 PY-1-O2 9.00% γ.sub.1 [mPa s, 20° C.]: 99 PY-2-O2 8.50% LTS bulk [−20° C.]: >1000 h BCH-32 5.00% LTS bulk [−25° C.]: >1000 h CCP-3-1 11.00% CPY-3-O2 10.50% PGIY-2-O4 3.00%

Example M207

[0538]

TABLE-US-00157 B(S)-2O-O4 4.00% Clearing point [° C.]: 74.5 B(S)-2O-O5 5.00% Δn [589 nm, 20° C.]: 0.1032 B(S)-2O-O6 2.50% Δε [1 kHz, 20° C.]: −3.2 CC-3-V1 8.00% K.sub.1 [pN, 20° C.]: 16.7 CC-4-V1 22.00% K.sub.3 [pN, 20° C.]: 15.8 CCH-35 5.00% V.sub.0 [pN, 20° C.]: 2.33 PP-1-2V1 7.50% γ.sub.1 [mPa s, 20° C.]: 99 PY-1-O2 8.00% PY-2-O2 6.00% BCH-32 5.00% CCP-3-1 7.00% PGIY-2-O4 4.00% PY-V2-O2 5.00% CCY-V-O2 4.00% CPY-V-O2 3.00% CPY-V-O4 4.00%

Example M208

[0539]

TABLE-US-00158 CC-3-V1 7.00% Clearing point [° C.]: 75 CCH-34 3.00% Δn [589 nm, 20° C.]: 0.0998 CCH-35 7.00% Δε [1 kHz, 20° C.]: −3.6 CC-4-V1 20.00% K.sub.1 [pN, 20° C.]: 15.2 CCP-3-1 4.50% K.sub.3 [pN, 20° C.]: 17 CCY-3-O2 12.50% V.sub.0 [V, 20° C.]: 2.3 CPY-3-O2 12.50% γ.sub.1 [mPa s, 20° C.]: 113 CY-3-O2 15.50% CY-3-O4 4.50% PY-3-O2 13.50%

Example M209

[0540]

TABLE-US-00159 CC-3-V1 7.00% Clearing point [° C.]: 76 CCH-34 3.00% Δn [589 nm, 20° C.]: 0.1002 CCH-35 7.00% Δε [1 kHz, 20° C.]: −3.6 CC-4-V1 20.00% K.sub.1 [pN, 20° C.]: 15.6 CCP-3-1 4.50% K.sub.3 [pN, 20° C.]: 17.1 CCY-3-O2 12.50% V.sub.0 [V, 20° C.]: 2.32 CPY-3-O2 12.50% γ.sub.1 [mPa s, 20° C.]: 111 CY-3-O2 15.50% CY-3-O4 4.50% PY-3-O2 5.50% PY-V2-O2 8.00%

Example M210

[0541]

TABLE-US-00160 CC-3-V1 7.00% Clearing point [° C.]: 73 CCH-34 3.00% Δn [589 nm, 20° C.]: 0.0987 CCH-35 7.00% Δε [1 kHz, 20° C.]: −3.6 CC-4-V1 20.00% K.sub.1 [pN, 20° C.]: 14.9 CCP-3-1 4.50% K.sub.3 [pN, 20° C.]: 16.2 CCY-3-O2 3.50% V.sub.0 [V, 20° C.]: 2.28 CPY-3-O2 12.50% γ.sub.1 [mPa s, 20° C.]: 110 CY-3-O2 15.50% CY-3-O4 4.50% PY-3-O2 13.50% CCY-V-O2 9.00%

Example M211

[0542]

TABLE-US-00161 CC-3-V1 7.00% Clearing point [° C.]: 72.5 CCH-34 3.00% Δn [589 nm, 20° C.]: 0.0999 CCH-35 7.00% Δε [1 kHz, 20° C.]: −3.6 CC-4-V1 20.00% K.sub.1 [pN, 20° C.]: 14.4 CCP-3-1 4.50% K.sub.3 [pN, 20° C.]: 15.7 CCY-3-O2 12.50% V.sub.0 [V, 20° C.]: 2.23 CY-3-O2 15.50% γ.sub.1 [mPa s, 20° C.]: 108 CY-3-O4 4.50% PY-3-O2 13.50% CPY-V-O2 8.00% CPY-V-O4 4.50%

Example M212

[0543]

TABLE-US-00162 CC-3-V1 7.00% Clearing point [° C.]: 72 CCH-34 3.00% Δn [589 nm, 20° C.]: 0.0998 CCH-35 7.00% Δε [1 kHz, 20° C.]: −3.6 CC-4-V1 20.00% K.sub.1 [pN, 20° C.]: 14.4 CCP-3-1 4.50% K.sub.3 [pN, 20° C.]: 16 CPY-3-O2 6.00% V.sub.0 [V, 20° C.]: 2.18 CY-3-O2 15.50% γ.sub.1 [mPa s, 20° C.]: 115 CY-3-O4 4.50% PY-3-O2 5.50% PY-V2-O2 8.00% CCY-V-O2 9.00% CAIY-3-O2 5.00% APY-3-O2 5.00%

Example M213

[0544]

TABLE-US-00163 CC-3-V1 7.00% Clearing point [° C.]: 73.5 CCH-34 3.00% Δn [589 nm, 20° C.]: 0.1009 CCH-35 7.00% Δε [1 kHz, 20° C.]: −3.6 CC-4-V1 20.00% K.sub.1 [pN, 20° C.]: 14.7 CCP-3-1 4.50% K.sub.3 [pN, 20° C.]: 16.6 CCY-3-O2 9.00% V.sub.0 [V, 20° C.]: 2.21 CPY-3-O2 6.00% γ.sub.1 [mPa s, 20° C.]: 118 CY-3-O2 15.50% CY-3-O4 4.50% PY-3-O2 5.50% PY-V2-O2 8.00% CAIY-3-O2 5.00% APY-3-O2 5.00%

Example M214

[0545]

TABLE-US-00164 CC-3-V1 7.00% Clearing point [° C.]: 70.5 CCH-34 3.00% Δn [589 nm, 20° C.]: 0.0991 CCH-35 7.00% Δε [1 kHz, 20° C.]: −3.6 CC-4-V1 20.00% K.sub.1 [pN, 20° C.]: 14 CCP-3-1 4.50% K.sub.3 [pN, 20° C.]: 15.9 CPY-3-O2 6.00% V.sub.0 [V, 20° C.]: 2.17 CY-3-O2 15.50% γ.sub.1 [mPa s, 20° C.]: 117 CY-3-O4 4.50% PY-3-O2 13.50% CCY-V-O2 9.00% CAIY-3-O2 5.00% APY-3-O2 5.00%

Example M215

[0546]

TABLE-US-00165 CCP-3-1 5.00% Clearing point [° C.]: 84.5 CCP-V-1 3.00% Δn [589 nm, 20° C.]: 0.1008 CCP-V2-1 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCY-3-O2 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.6 CLY-3-O2 7.00% Δε [1 kHz, 20° C.]: −3.9 CLY-4-O2 4.50% K.sub.1 [pN, 20° C.]: 18.3 CLY-5-O2 4.00% K.sub.3 [pN, 20° C.]: 16.7 B(S)-2O-O4 4.50% V.sub.0 [V, 20° C.]: 2.18 B(S)-2O-O5 5.00% γ.sub.1 [mPa s, 20° C.]: 117 B-2O-O5 2.00% CC-4-V1 20.00% CCH-23 9.20% CCH-35 4.00% CY-3-O2 10.50% PP-1-3 4.00% Y-4O-O4 4.00% CCQU-3-F 0.30%

Example M216

[0547]

TABLE-US-00166 CCP-3-1 5.50% Clearing point [° C.]: 89 CCP-V-1 11.00% Δn [589 nm, 20° C.]: 0.1030 CLY-2-O4 2.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CLY-3-O2 6.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.6 CLY-3-O3 4.00% Δε [1 kHz, 20° C.]: −4.0 CLY-4-O2 5.00% K.sub.1 [pN, 20° C.]: 18.5 CLY-5-O2 3.00% K.sub.3 [pN, 20° C.]: 16.5 CPY-3-O2 6.00% V.sub.0 [V, 20° C.]: 2.17 B(S)-2O-O4 4.00% γ.sub.1 [mPa s, 20° C.]: 110 B(S)-2O-O5 5.00% B(S)-2O-O6 3.00% CC-3-V1 9.00% CC-4-V1 19.00% CCH-23 7.50% Y-4O-O4 10.00%

Example M217

[0548]

TABLE-US-00167 CCP-3-1 9.50% Clearing point [° C.]: 101 CCP-V-1 12.00% Δn [589 nm, 20° C.]: 0.1109 CLY-3-O2 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CLY-4-O2 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.0 CLY-5-O2 6.00% Δε [1 kHz, 20° C.]: −4.3 CPY-3-O2 6.50% K.sub.1 [pN, 20° C.]: 21.0 B(S)-2O-O4 4.00% K.sub.3 [pN, 20° C.]: 19.4 B(S)-2O-O5 5.00% V.sub.0 [V, 20° C.]: 2.23 B(S)-2O-O6 3.00% γ.sub.1 [mPa s, 20° C.]: 142 CC-3-V1 8.00% CC-4-V1 20.00% Y-4O-O4 10.00%

Example M218

[0549]

TABLE-US-00168 CLP-V-1 5.00% Clearing point [° C.]: 86.5 CCP-V-1 5.00% Δn [589 nm, 20° C.]: 0.1045 CLY-3-O2 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.8 CLY-4-O2 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.9 CLY-5-O2 6.50% Δε [1 kHz, 20° C.]: −4.2 CPY-3-O2 6.00% K.sub.1 [pN, 20° C.]: 18.1 B(S)-2O-O4 4.00% K.sub.3 [pN, 20° C.]: 16.5 B(S)-2O-O5 5.00% V.sub.0 [V, 20° C.]: 2.10 B(S)-2O-O6 3.00% γ.sub.1 [mPa s, 20° C.]: 108 CC-3-V1 8.00% CC-4-V1 20.00% CC-3-V 11.50% Y-4O-O4 10.00%

Example M219

[0550]

TABLE-US-00169 CLP-1V-1 4.00% Clearing point [° C.]: 88 CCP-V-1 5.00% Δn [589 nm, 20° C.]: 0.1055 CLY-3-O2 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CLY-4-O2 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.0 CLY-5-O2 7.00% Δε [1 kHz, 20° C.]: −4.2 CPY-3-O2 6.50% K.sub.1 [pN, 20° C.]: 18.3 B(S)-2O-O4 4.00% K.sub.3 [pN, 20° C.]: 17.3 B(S)-2O-O5 5.00% V.sub.0 [V, 20° C.]: 2.13 B(S)-2O-O6 3.00% γ.sub.1 [mPa s, 20° C.]: 112 CC-3-V1 8.00% CC-4-V1 20.00% CC-3-V 11.50% Y-4O-O4 10.00%

Example M220

[0551]

TABLE-US-00170 CVCP-V-O1 4.00% Clearing point [° C.]: 87.5 CCP-V-1 5.00% Δn [589 nm, 20° C.]: 0.1033 CLY-3-O2 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.8 CLY-4-O2 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.0 CLY-5-O2 7.00% Δε [1 kHz, 20° C.]: −4.2 CPY-3-O2 6.50% K.sub.1 [pN, 20° C.]: 17.3 B(S)-2O-O4 4.00% K.sub.3 [pN, 20° C.]: 16.5 B(S)-2O-O5 5.00% V.sub.0 [V, 20° C.]: 2.08 B(S)-2O-O6 3.00% γ.sub.1 [mPa s, 20° C.]: 110 CC-3-V1 8.00% CC-4-V1 20.00% CC-3-V 11.50% Y-4O-O4 10.00%

Example M221

[0552]

TABLE-US-00171 B(S)-2O-O5 4.00% Clearing point [° C.]: 74.3 CC-3-V1 6.00% Δn [589 nm, 20° C.]: 0.1021 CC-4-V1 14.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-34 9.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCP-3-1 8.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O2 9.00% K.sub.1 [pN, 20° C.]: 13.2 CCY-4-O2 2.50% K.sub.3 [pN, 20° C.]: 16.5 CLY-3-O2 1.00% V.sub.0 [V, 20° C.]: 2.41 CPY-3-O2 10.50% γ.sub.1 [mPa s, 20° C.]: 104 CY-3-O2 11.50% PCH-301 15.00% PY-1-O2 8.50% PY-2-O2 1.00%

Example M222

[0553] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M221 is mixed with 0.35% of the polymerisable compound of the formula

##STR00479##

Example M223

[0554] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M221 is mixed with 0.3% of the polymerisable compound of the formula

##STR00480##

Example M224

[0555] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M221 is mixed with 0.3% of the polymerisable compound of the formula

##STR00481##

Example M225

[0556] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M221 is mixed with 0.3% of the polymerisable compound of the formula

##STR00482##

Example M226

[0557]

TABLE-US-00172 B(S)-2O-O5 4.00% Clearing point [° C.]: 74.3 CC-3-V1 6.00% Δn [589 nm, 20° C.]: 0.1019 CC-4-V1 14.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-34 9.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCP-3-1 8.00% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O1 2.50% K.sub.1 [pN, 20° C.]: 13.4 CCY-3-O2 10.00% K.sub.3 [pN, 20° C.]: 16.7 CPY-3-O2 10.50% V.sub.0 [V, 20° C.]: 2.35 CY-3-O2 11.50% γ.sub.1 [mPa s, 20° C.]: 105 PCH-301 15.00% PY-1-O2 9.50%

Example M227

[0558] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M226 is mixed with 0.35% of the polymerisable compound of the formula

##STR00483##

Example M228

[0559] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M226 is mixed with 0.3% of the polymerisable compound of the formula

##STR00484##

Example M229

[0560] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M226 is mixed with 0.3% of the polymerisable compound of the formula

##STR00485##

Example M230

[0561] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M226 is mixed with 0.3% of the polymerisable compound of the formula

##STR00486##

Example M231

[0562]

TABLE-US-00173 BCH-32 8.00% Clearing point [° C.]: 74.7 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1120 CC-4-V1 16.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-34 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCH-35 5.50% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O2 6.00% K.sub.1 [pN, 20° C.]: 15.1 CPY-2-O2 9.00% K.sub.3 [pN, 20° C.]: 15.3 CPY-3-O2 9.00% V.sub.0 [V, 20° C.]: 2.31 CY-3-O2 12.00% γ.sub.1 [mPa s, 20° C.]: 108 PY-1-O2 3.50% LTS bulk [h, −20° C.]: >1000 h PY-3-O2 15.00%

Example M232

[0563]

TABLE-US-00174 BCH-32 2.50% Clearing point [° C.]: 74.1 CC-3-V1 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-4-V1 12.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCH-34 8.00% Δε [1 kHz, 20° C.]: −3.2 CCH-35 5.00% K.sub.1 [pN, 20° C.]: 15.0 CCY-3-O2 11.50% K.sub.3 [pN, 20° C.]: 15.3 CPY-2-O2 11.00% V.sub.0 [V, 20° C.]: 2.31 CPY-3-O2 10.50% γ.sub.1 [mPa s, 20° C.]: 114 CY-3-O2 12.00% LTS bulk [h, −20° C.]: >1000 h PP-1-4 8.50% PY-3-O2 11.00%

Example M233

[0564]

TABLE-US-00175 BCH-32 5.50% Clearing point [° C.]: 74.1 CC-3-V1 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CC-4-V1 16.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.6 CCH-34 8.50% Δε [1 kHz, 20° C.]: −3.9 CCY-3-O2 12.00% K.sub.1 [pN, 20° C.]: 14.9 CPY-2-O2 6.00% K.sub.3 [pN, 20° C.]: 16.1 CPY-3-O2 10.00% V.sub.0 [V, 20° C.]: 2.15 CY-3-O2 15.50% γ.sub.1 [mPa s, 20° C.]: 120 PY-1-O2 4.00% LTS bulk [h, −20° C.]: >1000 h PY-3-O2 14.50%

Example M234

[0565]

TABLE-US-00176 BCH-32 5.00% Clearing point [° C.]: 74.1 CC-3-V1 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.8 CC-4-V1 16.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.0 CCH-34 4.50% Δε [1 kHz, 20° C.]: −4.2 CCY-3-O2 12.00% K.sub.1 [pN, 20° C.]: 14.2 CPY-2-O2 10.00% K.sub.3 [pN, 20° C.]: 15.7 CPY-3-O2 9.00% V.sub.0 [V, 20° C.]: 2.03 CY-3-O2 15.50% γ.sub.1 [mPa s, 20° C.]: 133 CY-3-O4 6.50% LTS bulk [h, −20° C.]: >1000 h PY-3-O2 13.50%

Example M235

[0566] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M234 is mixed with 0.3% of the polymerisable compound of the formula

##STR00487##

Example M236

[0567] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M234 is mixed with 0.3% of the polymerisable compound of the formula

##STR00488##

Example M237

[0568]

TABLE-US-00177 BCH-32 6.00% Clearing point [° C.]: 73.6 CC-3-V1 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.8 CC-4-V1 16.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.0 CCH-34 9.00% Δε [1 kHz, 20° C.]: −4.1 CCY-3-O1 5.00% K.sub.1 [pN, 20° C.]: 14.3 CCY-3-O2 11.00% K.sub.3 [pN, 20° C.]: 15.5 CPY-3-O2 10.00% V.sub.0 [V, 20° C.]: 2.04 CY-3-O2 14.00% γ.sub.1 [mPa s, 20° C.]: 121 PY-1-O2 5.00% LTS bulk [h, −20° C.]: >1000 h PY-3-O2 12.00% PCH-301 4.00% B(S)-2O-O5 4.00%

Example M238

[0569]

TABLE-US-00178 BCH-32 4.50% Clearing point [° C.]: 74.1 CCP-3-1 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.8 CCY-3-O1 9.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.7 CCY-3-O2 5.00% Δε [1 kHz, 20° C.]: −3.9 CPY-3-O2 11.00% K.sub.1 [pN, 20° C.]: 14.0 B(S)-2O-O4 4.00% K.sub.3 [pN, 20° C.]: 15.8 CC-3-V1 3.00% V.sub.0 [V, 20° C.]: 2.11 CC-4-V1 17.00% γ.sub.1 [mPa s, 20° C.]: 121 CCH-34 6.00% LTS bulk [h, −20° C.]: >1000 h CY-3-O2 13.50% PCH-301 7.50% PY-1-O2 5.50% PY-3-O2 10.00%

Example M239

[0570] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M238 is mixed with 0.3% of the polymerisable compound of the formula

##STR00489##

Example M240

[0571]

TABLE-US-00179 CCY-3-O2 11.00% Clearing point [° C.]: 75 CPY-2-O2 11.00% Δn [589 nm, 20° C.]: 0.1108 CPY-3-O2 8.50% ε.sub.∥ [1 kHz, 20° C.]: 3.8 B-2O-O5 4.00% ε.sub.⊥[1 kHz, 20° C.]: 7.9 CC-3-V1 8.00% Δε [1 kHz, 20° C.]: −4.1 CC-4-V1 17.00% K.sub.1 [pN, 20° C.]: 15.4 CCH-34 8.00% K.sub.3 [pN, 20° C.]: 15.9 CCH-35 6.00% V.sub.0 [V, 20° C.]: 2.05 CY-3-O2 8.50% γ.sub.1 [mPa s, 20° C.]: 119 PY-1-O2 6.00% PY-3-O2 12.00%

Example M241

[0572] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M240 is mixed with 0.3% of the polymerisable compound of the formula

##STR00490##

Example M242

[0573]

TABLE-US-00180 CC-3-V1 12.00% Clearing point [° C.]: 75.2 CC-4-V1 5.50% Δn [589 nm, 20° C.]: 0.0810 CCH-301 9.50% ε.sub.∥ [1 kHz, 20° C.]: 3.4 CCH-303 6.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.2 CCH-34 5.00% Δε [1 kHz, 20° C.]: −2.9 CCH-35 6.50% K.sub.1 [pN, 20° C.]: 14.3 CCY-3-1 3.00% K.sub.3 [pN, 20° C.]: 15.7 CCY-3-O1 7.50% V.sub.0 [V, 20° C.]: 2.47 CCY-3-O2 12.00% γ.sub.1 [mPa s, 20° C.]: 105 CPY-2-O2 4.50% CPY-3-O2 4.50% CY-3-O2 9.50% CY-3-O4 8.50% PCH-302 5.00% PY-3-O2 1.00%

Example 243

[0574]

TABLE-US-00181 CC-3-V1 8.00% Clearing point [° C.]: 75 CC-4-V1 20.00% ε.sub.∥ [1 kHz, 20° C.]: 0.1028 CCH-34 7.00% ε.sub.⊥ [1 kHz, 20° C.]: 3.5 CCH-35 7.00% Δε [1 kHz, 20° C.]: 7.0 CCY-3-O2 10.00% K.sub.1 [pN, 20° C.]: −3.5 CPY-2-O2 8.00% K.sub.3 [pN, 20° C.]: 14.9 CPY-3-O2 11.00% V.sub.0 [V, 20° C.]: 16.1 CY-3-O2 14.00% γ.sub.1 [mPa s, 20° C.]: 2.28 PY-3-O2 15.00% ε.sub.∥ [1 kHz, 20° C.]: 112 LTS bulk [h, −20° C.]: >1000 h

Example M244

[0575]

TABLE-US-00182 B(S)-2O-O4 2.00% Clearing point [° C.]: 75.2 CC-3-V1 9.00% Δn [589 nm, 20° C.]: 0.1025 CC-4-V1 20.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-34 7.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CCH-35 5.00% Δε [1 kHz, 20° C.]: −3.4 CCP-V2-1 3.50% K.sub.1 [pN, 20° C.]: 14.8 CCY-3-O2 4.00% K.sub.3 [pN, 20° C.]: 15.6 CPY-2-O2 10.00% V.sub.0 [V, 20° C.]: 2.26 CPY-3-O2 11.00% γ.sub.1 [mPa s, 20° C.]: 108 CY-3-O2 15.00% LTS bulk [h, −20° C.]: >1000 h CY-5-O2 3.50% PY-3-O2 10.00%

Example 245

[0576]

TABLE-US-00183 CY-3-O2 20.00% Clearing point [° C.]: 75 CY-5-O2 9.00% Δn [589 nm, 20° C.]: 0.0827 CCY-3-O2 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCY-3-O3 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.3 CCY-4-O2 10.00% Δε [1 kHz, 20° C.]: −3.7 CPY-2-O2 10.00% K.sub.1 [pN, 20° C.]: 13.8 CC-5-V 20.00% K.sub.3 [pN, 20° C.]: 14.2 CC-3-V1 5.00% V.sub.0 [V, 20° C.]: 2.08 CCH-35 5.00% γ.sub.1 [mPa s, 20° C.]: 110 CC-4-V1 8.00%

Example M246

[0577]

TABLE-US-00184 CLP-V-1 5.00% Clearing point [° C.]: 87 CCP-V-1 6.00% Δn [589 nm, 20° C.]: 0.1045 CLY-2-O4 2.00% ε.sub.∥ [1 kHz, 20° C.]: 3.8 CLY-3-O2 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.1 CLY-3-O3 5.00% Δε [1 kHz, 20° C.]: −4.3 CLY-4-O2 5.00% K.sub.1 [pN, 20° C.]: 18.9 CLY-5-O2 3.00% K.sub.3 [pN, 20° C.]: 16.1 CPY-3-O2 6.50% V.sub.0 [V, 20° C.]: 2.04 B(S)-2O-O4 4.00% γ.sub.1 [mPa s, 20° C.]: 116 B(S)-2O-O5 5.00% B(S)-2O-O6 3.00% CC-3-V1 8.00% CC-4-V1 20.00% CCH-23 9.50% Y-4O-O4 10.00%

Example M247

[0578]

TABLE-US-00185 CLP-1V-1 5.00% Clearing point [° C.]: 88.5 CCP-V-1 6.00% Δn [589 nm, 20° C.]: 0.1049 CLY-2-O4 2.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CLY-3-O2 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.1 CLY-3-O3 5.00% Δε [1 kHz, 20° C.]: −4.3 CLY-4-O2 5.00% K.sub.1 [pN, 20° C.]: 19.2 CLY-5-O2 3.00% K.sub.3 [pN, 20° C.]: 17.0 CPY-3-O2 6.50% V.sub.0 [V, 20° C.]: 2.09 B(S)-2O-O4 4.00% γ.sub.1 [mPa s, 20° C.]: 121 B(S)-2O-O5 5.00% B(S)-2O-O6 3.00% CC-3-V1 8.00% CC-4-V1 20.00% CCH-23 9.50% Y-4O-O4 10.00%

Example M248

[0579]

TABLE-US-00186 B(S)-2O-O4 4.00% Clearing point [° C.]: 74.5 B(S)-2O-O5 5.00% Δn [589 nm, 20° C.]: 0.1358 CC-3-V 20.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-3-V1 7.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CC-4-V1 8.50% Δε [1 kHz, 20° C.]: −3.1 PP-1-2V1 4.50% K.sub.1 [pN, 20° C.]: 15.5 PY-1-O2 10.00% K.sub.3 [pN, 20° C.]: 16.0 PY-3-O2 6.50% V.sub.0 [V, 20° C.]: 2.38 CCP-3-1 10.00% γ.sub.1 [mPa s, 20° C.]: 94 CPY-3-O2 11.50% LTS bulk [h, −20° C.]: >1000 h PGIY-2-O4 5.00% LTS bulk [h, −25° C.]: >1000 h PYP-2-3 8.00%

Example M249

[0580]

TABLE-US-00187 B(S)-2O-O4 4.00% Clearing point [° C.]: 74 B(S)-2O-O5 5.00% Δn [589 nm, 20° C.]: 0.1368 CC-3-V 25.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CC-3-V1 7.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CC-4-V1 1.50% Δε [1 kHz, 20° C.]: −3.2 PP-1-2V1 7.00% K.sub.1 [pN, 20° C.]: 15.6 PY-1-O2 10.00% K.sub.3 [pN, 20° C.]: 16.0 PY-3-O2 4.50% V.sub.0 [V, 20° C.]: 2.38 CCP-3-1 10.50% γ.sub.1 [mPa s, 20° C.]: 93 CPY-2-O2 4.50% LTS bulk [h, −20° C.]: >1000 h CPY-3-O2 10.00% LTS bulk [h, −25° C.]: >1000 h PGIY-2-O4 6.00% PYP-2-3 5.00%

Example M250

[0581]

TABLE-US-00188 B(S)-2O-O4 4.00% Clearing point [° C.]: 74 B(S)-2O-O5 5.00% Δn [589 nm, 20° C.]: 0.1347 CC-3-V 21.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-4-V1 10.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCP-3-1 13.00% Δε [1 kHz, 20° C.]: −3.1 CPY-3-O2 10.50% K.sub.1 [pN, 20° C.]: 15.4 CPY-2-O2 4.00% K.sub.3 [pN, 20° C.]: 15.7 PP-1-2V1 6.00% V.sub.0 [V, 20° C.]: 2.38 PY-1-O2 8.00% γ.sub.1 [mPa s, 20° C.]: 93 PY-3-O2 10.00% LTS bulk [h, −20° C.]: >1000 h PYP-2-3 8.00%

Example M251

[0582]

TABLE-US-00189 B(S)-2O-O4 4.00% Clearing point [° C.]: 73.5 B(S)-2O-O5 5.00% Δn [589 nm, 20° C.]: 0.1334 CC-4-V1 30.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-35 4.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCP-3-1 13.00% Δε [1 kHz, 20° C.]: −3.0 CPY-3-O2 7.00% K.sub.1 [pN, 20° C.]: 15.5 PP-1-2V1 3.00% K.sub.3 [pN, 20° C.]: 14.9 PY-1-O2 8.00% V.sub.0 [V, 20° C.]: 2.34 PY-2-O2 7.00% γ.sub.1 [mPa s, 20° C.]: 99 PY-3-O2 8.00% LTS bulk [h, −20° C.]: >1000 h PYP-2-3 7.00% PYP-2-4 4.00%

Example M252

[0583]

TABLE-US-00190 CC-3-V1 8.00% Clearing point [° C.]: 72 CC-4-V1 21.00% Δn [589 nm, 20° C.]: 0.1329 CCH-35 6.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCP-3-1 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.5 CCY-3-O2 8.00% Δε [1 kHz, 20° C.]: −2.9 B(S)-2O-O5 5.00% K.sub.1 [pN, 20° C.]: 15.3 B(S)-2O-O4 4.00% K.sub.3 [pN, 20° C.]: 14.5 PP-1-3 5.00% V.sub.0 [V, 20° C.]: 2.37 PY-1-O2 10.00% γ.sub.1 [mPa s, 20° C.]: 95 PY-2-O2 8.00% PYP-2-3 11.00% PYP-2-4 6.00%

Example M253

[0584]

TABLE-US-00191 BCH-32 8.00% Clearing point [° C.]: 73 CCH-23 15.00% Δn [589 nm, 20° C.]: 0.1342 CC-4-V1 12.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCP-3-1 12.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.5 CPY-3-O2 9.50% Δε [1 kHz, 20° C.]: −2.9 PCH-301 2.50% K.sub.1 [pN, 20° C.]: 15.0 PY-1-O2 10.00% K.sub.3 [pN, 20° C.]: 15.0 PY-2-O2 8.00% V.sub.0 [V, 20° C.]: 2.41 PP-1-2V1 7.50% γ.sub.1 [mPa s, 20° C.]: 97 PGIY-2-O4 6.00% LTS bulk [h, −25° C.]: >1000 h B(S)-2O-O5 5.00% B(S)-2O-O4 4.00%

Example M254

[0585]

TABLE-US-00192 B(S)-2O-O4 4.00% Clearing point [° C.]: 74 B(S)-2O-O5 5.00% Δn [589 nm, 20° C.]: 0.1278 B(S)-2O-O6 2.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-4-V1 18.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCH-35 6.00% Δε [1 kHz, 20° C.]: −3.1 PP-1-3 8.00% K.sub.1 [pN, 20° C.]: 16.5 PP-1-4 4.50% K.sub.3 [pN, 20° C.]: 15.8 PY-1-O2 10.00% V.sub.0 [V, 20° C.]: 2.38 PY-2-O2 8.00% γ.sub.1 [mPa s, 20° C.]: 105 CCP-3-1 13.00% LTS bulk [h, −20° C.]: >1000 h CCP-3-3 7.50% CCY-3-O2 10.00% PGIY-2-O4 4.00%

Example M255

[0586]

TABLE-US-00193 B(S)-2O-O4 4.00% Clearing point [° C.]: 73 B(S)-2O-O5 5.00% Δn [589 nm, 20° C.]: 0.1348 B(S)-2O-O6 2.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-4-V1 18.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CCH-35 6.00% Δε [1 kHz, 20° C.]: −3.0 PP-1-3 8.00% K.sub.1 [pN, 20° C.]: 16.2 PP-1-4 4.50% K.sub.3 [pN, 20° C.]: 15.5 PY-1-O2 10.00% V.sub.0 [V, 20° C.]: 2.38 PY-2-O2 8.00% γ.sub.1 [mPa s, 20° C.]: 105 CCP-3-1 13.00% LTS bulk [h, −25° C.]: >1000 h CCP-3-3 7.50% CPY-3-O2 10.00% PGIY-2-O4 4.00%

Example M256

[0587] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M255 is mixed with 0.3% of the polymerisable compound of the formula

##STR00491##

Example M257

[0588] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M255 is mixed with 0.3% of the polymerisable compound of the formula

##STR00492##

Example M258

[0589] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M255 is mixed with 0.3% of the polymerisable compound of the formula

##STR00493##

Example M259

[0590]

TABLE-US-00194 B(S)-2O-O4 4.00% Clearing point [° C.]: 72.5 B(S)-2O-O5 4.50% Δn [589 nm, 20° C.]: 0.1340 B(S)-2O-O6 2.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CC-4-V1 20.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CCH-35 5.50% Δε [1 kHz, 20° C.]: −3.1 PP-1-3 8.00% K.sub.1 [pN, 20° C.]: 15.7 PY-1-O2 10.00% K.sub.3 [pN, 20° C.]: 15.0 PY-2-O2 11.00% V.sub.0 [V, 20° C.]: 2.33 CCP-3-1 11.00% γ.sub.1 [mPa s, 20° C.]: 104 CCP-3-3 10.00% CPY-3-O2 5.50% PGIY-2-O4 4.50% PYP-2-3 4.00%

Example M260

[0591]

TABLE-US-00195 B(S)-2O-O4 4.00% Clearing point [° C.]: 75 B(S)-2O-O5 5.00% Δn [589 nm, 20° C.]: 0.1340 B(S)-2O-O6 2.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-3-V 10.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CC-3-V1 7.00% Δε [1 kHz, 20° C.]: −3.0 CC-4-V1 18.00% K.sub.1 [pN, 20° C.]: 15.8 PP-1-2V1 6.00% K.sub.3 [pN, 20° C.]: 15.8 PY-1-O2 9.00% V.sub.0 [V, 20° C.]: 2.42 PY-2-O2 9.00% γ.sub.1 [mPa s, 20° C.]: 91 BCH-32 7.00% CCP-3-1 7.50% CPY-3-O2 11.00% PYP-2-3 4.00%

Example M261

[0592]

TABLE-US-00196 B(S)-2O-O4 4.00% Clearing point [° C.]: 74.5 B(S)-2O-O5 5.00% Δn [589 nm, 20° C.]: 0.1343 B(S)-2O-O6 2.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-3-V1 7.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CC-4-V1 7.50% Δε [1 kHz, 20° C.]: −3.1 CCH-23 16.50% K.sub.1 [pN, 20° C.]: 15.9 PP-1-2V1 7.00% K.sub.3 [pN, 20° C.]: 15.7 PY-1-O2 9.00% V.sub.0 [V, 20° C.]: 2.38 PY-2-O2 8.00% γ.sub.1 [mPa s, 20° C.]: 98 BCH-32 7.00% CCP-3-1 10.50% CPY-3-O2 11.00% PGIY-2-O4 3.00% PYP-2-3 2.00%

Example M262

[0593]

TABLE-US-00197 B(S)-2O-O4 4.00% Clearing point [° C.]: 73.5 B(S)-2O-O5 4.00% Δn [589 nm, 20° C.]: 0.1338 B(S)-2O-O6 2.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-3-V 12.50% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CC-4-V1 19.00% Δε [1 kHz, 20° C.]: −3.2 CCP-3-1 13.50% K.sub.1 [pN, 20° C.]: 16.1 CPY-2-O2 5.00% K.sub.3 [pN, 20° C.]: 16.1 CPY-3-O2 8.50% V.sub.0 [V, 20° C.]: 2.38 PP-1-2V1 8.00% γ.sub.1 [mPa s, 20° C.]: 96 PY-1-O2 9.00% PY-3-O2 10.00% PYP-2-3 4.00%

Example M263

[0594]

TABLE-US-00198 B(S)-2O-O4 3.50% Clearing point [° C.]: 74 B(S)-2O-O5 4.00% Δn [589 nm, 20° C.]: 0.1356 B(S)-2O-O6 3.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 BCH-32 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CC-4-V1 12.00% Δε [1 kHz, 20° C.]: −3.0 CCH-23 14.00% K.sub.1 [pN, 20° C.]: 15.3 CCP-3-1 14.00% K.sub.3 [pN, 20° C.]: 15.0 CPY-3-O2 7.50% V.sub.0 [V, 20° C.]: 2.38 PCH-301 3.00% γ.sub.1 [mPa s, 20° C.]: 99 PGIY-2-O4 6.00% LTS bulk [h, −20° C.]: >1000 h PP-1-2V1 7.00% PY-1-O2 9.50% PY-2-O2 8.50%

Example M264

[0595]

TABLE-US-00199 B(S)-2O-O4 3.00% Clearing point [° C.]: 74.5 B(S)-2O-O5 3.00% Δn [589 nm, 20° C.]: 0.1341 CC-3-V 13.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-3-V1 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CC-4-V1 18.00% Δε [1 kHz, 20° C.]: −3.1 PP-1-2V1 8.00% K.sub.1 [pN, 20° C.]: 15.6 PY-1-O2 10.00% K.sub.3 [pN, 20° C.]: 16.0 PY-3-O2 5.00% V.sub.0 [V, 20° C.]: 2.39 CCP-3-1 3.00% γ.sub.1 [mPa s, 20° C.]: 99 CPY-2-O2 9.00% CPY-3-O2 12.00% PGIY-2-O4 6.50% PYP-2-3 1.50%

Example M265

[0596]

TABLE-US-00200 B(S)-2O-O4 3.00% Clearing point [° C.]: 74.5 B(S)-2O-O5 4.00% Δn [589 nm, 20° C.]: 0.1331 CC-3-V 10.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-3-V1 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CC-4-V1 22.00% Δε [1 kHz, 20° C.]: −3.1 PP-1-2V1 8.00% K.sub.1 [pN, 20° C.]: 15.8 PY-1-O2 10.00% K.sub.3 [pN, 20° C.]: 16.0 PY-3-O2 5.00% V.sub.0 [V, 20° C.]: 2.40 CCP-3-1 3.00% γ.sub.1 [mPa s, 20° C.]: 98 CPY-2-O2 6.00% CPY-3-O2 12.00% PGIY-2-O4 7.00% PYP-2-3 2.00%

Example M266

[0597]

TABLE-US-00201 CC-3-V1 7.00% Clearing point [° C.]: 74 CCH-35 4.00% Δn [589 nm, 20° C.]: 0.1334 CC-4-V1 19.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCP-3-1 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCY-3-O1 6.50% Δε [1 kHz, 20° C.]: −3.0 CCY-3-O2 11.00% K.sub.1 [pN, 20° C.]: 16.1 CY-3-O2 1.00% K.sub.3 [pN, 20° C.]: 16.1 PP-1-2V1 10.00% V.sub.0 [V, 20° C.]: 2.47 PY-1-O2 8.00% γ.sub.1 [mPa s, 20° C.]: 112 PY-3-O2 7.00% LTS bulk [h, −20° C.]: >1000 h PY-2-O2 7.00% PYP-2-3 6.00% PGIY-2-O4 8.50%

Example M267

[0598]

TABLE-US-00202 CC-4-V1 14.00% Clearing point [° C.]: 73.5 CC-3-V 10.00% Δn [589 nm, 20° C.]: 0.1337 CCP-3-1 12.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCY-3-O1 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.5 CCY-3-O2 11.00% Δε [1 kHz, 20° C.]: −2.9 CY-3-O2 2.50% K.sub.1 [pN, 20° C.]: 15.1 PP-1-2V1 10.00% K.sub.3 [pN, 20° C.]: 16.3 PY-1-O2 7.50% V.sub.0 [V, 20° C.]: 2.50 PY-3-O2 7.00% γ.sub.1 [mPa s, 20° C.]: 107 PY-2-O2 7.00% LTS bulk [h, −20° C.]: >1000 h PYP-2-3 8.00% PGIY-2-O4 6.00%

Example M268

[0599]

TABLE-US-00203 CC-3-V1 7.00% Clearing point [° C.]: 73 CC-4-V1 22.00% Δn [589 nm, 20° C.]: 0.1342 CCP-3-1 14.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCY-3-O2 4.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CY-3-O2 8.50% Δε [1 kHz, 20° C.]: −3.1 PP-1-2V1 8.00% K.sub.1 [pN, 20° C.]: 15.8 PY-1-O2 8.00% K.sub.3 [pN, 20° C.]: 16.5 PY-3-O2 7.00% V.sub.0 [V, 20° C.]: 2.46 PYP-2-3 8.00% γ.sub.1 [mPa s, 20° C.]: 102 PGIY-2-O4 6.50% LTS bulk [h, −20° C.]: >1000 h B(S)-2O-O4 3.00% B(S)-2O-O5 4.00%

Example M269

[0600]

TABLE-US-00204 CY-3-O4 17.50% Clearing point [° C.]: 86.5 CLY-2-O4 4.00% Δn [589 nm, 20° C.]: 0.1087 CLY-3-O2 6.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CLY-3-O3 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.7 CLY-4-O2 4.00% Δε [1 kHz, 20° C.]: −4.2 CLY-5-O2 4.00% K.sub.1 [pN, 20° C.]: 17.2 CPY-3-O2 8.00% K.sub.3 [pN, 20° C.]: 16.1 PYP-2-3 6.50% V.sub.0 [V, 20° C.]: 2.07 B(S)-2O-O5 4.00% γ.sub.1 [mPa s, 20° C.]: 136 B(S)-2O-O4 4.00% LTS bulk [h, −20° C.]: >1000 h CC-4-V1 19.00% LTS bulk [h, −25° C.]: >1000 h CC-3-V1 8.00% LTS bulk [h, −30° C.]: >1000 h CCH-23 10.00%

Example M270

[0601] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M269 is mixed with 0.3% of the polymerisable compound of the formula

##STR00494##

Example M271

[0602] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M269 is mixed with 0.3% of the polymerisable compound of the formula

##STR00495##

Example M272

[0603] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M269 is mixed with 0.3% of the polymerisable compound of the formula

##STR00496##

Example M273

[0604]

TABLE-US-00205 CCH-23 16.50% Clearing point [° C.]: 76 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1026 CC-4-V1 22.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CLY-2-O4 4.00% ε.sub.⊥[1 kHz, 20° C.]: 7.3 CLY-3-O2 6.00% Δε [1 kHz, 20° C.]: −3.7 CLY-3-O3 5.00% K.sub.1 [pN, 20° C.]: 16.3 CLY-4-O2 4.00% K.sub.3 [pN, 20° C.]: 15.1 CLY-5-O2 4.00% V.sub.0 [V, 20° C.]: 2.12 CPY-3-O2 3.00% γ.sub.1 [mPa s, 20° C.]: 95 CY-3-O2 4.50% LTS bulk [h, −20° C.]: >1000 h PY-3-O2 6.00% PY-1-O2 9.00% B(S)-2O-O5 4.00% B(S)-2O-O4 4.00%

Example M274

[0605] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M273 is mixed with 0.3% of the polymerisable compound of the formula

##STR00497##

Example M395

[0606] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M273 is mixed with 0.25% of the polymerisable compound of the formula

##STR00498##

Example M276

[0607]

TABLE-US-00206 CVCP-V-O1 4.00% Clearing point [° C.]: 89 CCP-V-1 6.50% Δn [589 nm, 20° C.]: 0.1043 CLY-3-O2 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.8 CLY-4-O2 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.0 CLY-5-O2 7.00% Δε [1 kHz, 20° C.]: −4.3 CPY-3-O2 6.50% K.sub.1 [pN, 20° C.]: 17.5 B(S)-2O-O4 4.00% K.sub.3 [pN, 20° C.]: 16.8 B(S)-2O-O5 5.00% V.sub.0 [V, 20° C.]: 2.10 B(S)-2O-O6 3.00% γ.sub.1 [mPa s, 20° C.]: 112 CC-3-V1 8.00% CC-4-V1 20.00% CC-3-V 10.00% Y-4O-O4 10.00%

Example M277

[0608]

TABLE-US-00207 CCP-3-1 3.00% Clearing point [° C.]: 88.5 CCP-V-1 2.50% Δn [589 nm, 20° C.]: 0.1061 CLY-3-O2 8.00% ε.sub.∥ [1 kHz, 20° C.]: 4.3 CLY-4-O2 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 8.4 CLY-5-O2 7.00% Δε [1 kHz, 20° C.]: −4.1 CPY-3-O2 6.50% K.sub.1 [pN, 20° C.]: 17.4 B(S)-2O-O4 4.00% K.sub.3 [pN, 20° C.]: 15.9 B(S)-2O-O5 6.00% V.sub.0 [V, 20° C.]: 2.08 B(S)-2O-O6 3.00% γ.sub.1 [mPa s, 20° C.]: 115 CC-3-V1 8.00% CC-4-V1 20.00% CC-3-V 6.00% Y-4O-O4 10.00% CCG-V-F 8.00%

Example M278

[0609]

TABLE-US-00208 CCH-23 9.50% Clearing point [° C.]: 75 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1029 CC-4-V1 20.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCP-V-1 3.50% ε.sub.⊥ [1 kHz, 20° C.]: 7.2 CLY-2-O4 4.00% Δε [1 kHz, 20° C.]: −3.7 CLY-3-O2 6.00% K.sub.1 [pN, 20° C.]: 15.2 CLY-3-O3 5.00% K.sub.3 [pN, 20° C.]: 15.8 CLY-4-O2 4.00% V.sub.0 [V, 20° C.]: 2.20 CLY-5-O2 4.00% γ.sub.1 [mPa s, 20° C.]: 107 CPY-3-O2 6.50% LTS bulk [h, −20° C.]: >1000 h CY-3-O2 12.50% LTS bulk [h, −25° C.]: >1000 h PY-3-O2 8.00% LTS bulk [h, −30° C.]: >1000 h PY-1-O2 9.00%

Example M279

[0610]

TABLE-US-00209 CLP-1V-1 5.50% Clearing point [° C.]: 87 CCP-V-1 7.50% Δn [589 nm, 20° C.]: 0.1085 CLY-3-O2 7.00% ε.sub.∥ [1 kHz, 20° C.]: 3.8 CLY-4-O2 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.9 CLY-5-O2 4.00% Δε [1 kHz, 20° C.]: −4.1 CPY-3-O2 6.00% K.sub.1 [pN, 20° C.]: 18.0 B(S)-2O-O4 4.50% K.sub.3 [pN, 20° C.]: 17.7 B(S)-2O-O5 5.00% V.sub.0 [V, 20° C.]: 2.20 B(S)-2O-O6 3.00% γ.sub.1 [mPa s, 20° C.]: 110 CC-3-V1 8.50% LTS bulk [h, −20° C.]: >1000 h CC-4-V1 20.00% CC-V-V1 10.00% Y-4O-O4 11.00%

Example M280

[0611]

TABLE-US-00210 CCP-3-1 3.50% Clearing point [° C.]: 89.5 CCP-V-1 8.50% Δn [589 nm, 20° C.]: 0.1061 CLY-3-O2 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CLY-4-O2 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.9 CLY-5-O2 6.00% Δε [1 kHz, 20° C.]: −4.2 CPY-3-O2 6.50% K.sub.1 [pN, 20° C.]: 18.2 B(S)-2O-O4 4.00% K.sub.3 [pN, 20° C.]: 17.8 B(S)-2O-O5 5.00% V.sub.0 [V, 20° C.]: 2.18 B(S)-2O-O6 3.00% γ.sub.1 [mPa s, 20° C.]: 114 CC-1V-V1 8.00% LTS bulk [h, −20° C.]: >1000 h CC-4-V1 20.00% CC-3-V 9.50% Y-4O-O4 10.00%

Example M281

[0612]

TABLE-US-00211 B(S)-2O-O5 4.00% Clearing point [° C.]: 73 B(S)-2O-O4 4.00% Δn [589 nm, 20° C.]: 0.1086 CC-3-V1 7.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-4-V1 22.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.5 CCH-34 4.50% Δε [1 kHz, 20° C.]: −3.0 CCH-35 4.00% K.sub.1 [pN, 20° C.]: 16.0 PP-1-2V1 5.00% K.sub.3 [pN, 20° C.]: 16.4 CY-3-O2 7.50% V.sub.0 [V, 20° C.]: 2.47 PY-1-O2 8.00% γ.sub.1 [mPa s, 20° C.]: 89 PY-2-O2 8.00% PY-3-O2 2.00% CCP-31 14.00% CCY-3-O2 10.00%

Example M282

[0613]

TABLE-US-00212 CLP-1V-1 3.50% Clearing point [° C.]: 91.5 CCP-V-1 8.50% Δn [589 nm, 20° C.]: 0.1084 CLY-3-O2 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CLY-4-O2 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.7 CLY-5-O2 6.00% Δε [1 kHz, 20° C.]: −4.0 CPY-3-O2 6.00% K.sub.1 [pN, 20° C.]: 18.2 B(S)-2O-O4 3.50% K.sub.3 [pN, 20° C.]: 18.9 B(S)-2O-O5 4.50% V.sub.0 [V, 20° C.]: 2.30 B(S)-2O-O6 3.00% γ.sub.1 [mPa s, 20° C.]: 115 CC-1V-V1 8.00% LTS bulk [h, −20° C.]: >1000 h CC-4-V1 20.00% CC-V-V1 11.00% Y-4O-O4 10.00

Example M283

[0614]

TABLE-US-00213 CC-3-V1 7.00% Clearing point [° C.]: 74 CC-4-V1 22.00% Δn [589 nm, 20° C.]: 0.1351 CCP-3-1 14.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCY-3-O2 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CY-3-O2 6.00% Δε [1 kHz, 20° C.]: −3.1 PP-1-2V1 10.00% K.sub.1 [pN, 20° C.]: 16.4 PY-1-O2 9.00% K.sub.3 [pN, 20° C.]: 16.9 PY-3-O2 8.00% V.sub.0 [V, 20° C.]: 2.47 PGIY-2-O4 14.00% γ.sub.1 [mPa s, 20° C.]: 107 B(S)-2O-O4 2.00% LTS bulk [h, −20° C.]: >1000 h B(S)-2O-O5 3.00%

Example M284

[0615]

TABLE-US-00214 CCH-34 6.00% Clearing point [° C.]: 74.5 CCH-35 4.50% Δn [589 nm, 20° C.]: 0.1126 CC-4-V1 17.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCY-3-O1 3.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CCY-3-O2 8.00% Δε [1 kHz, 20° C.]: −3.3 CPY-2-O2 10.00% K.sub.1 [pN, 20° C.]: 14.8 CPY-3-O2 11.00% K.sub.3 [pN, 20° C.]: 15.8 CY-3-O2 15.50% V.sub.0 [V, 20° C.]: 2.30 CY-3-O4 4.50% γ.sub.1 [mPa s, 20° C.]: 119 PCH-301 8.00% LTS bulk [h, −20° C.]: >1000 h PGIY-2-O4 4.00% LTS bulk [h, −25° C.]: >1000 h PP-1-2V1 8.50%

Example M285

[0616]

TABLE-US-00215 BCH-32 2.50% Clearing point [° C.]: 73.5 CCP-V2-1 4.00% Δn [589 nm, 20° C.]: 0.1035 CCY-3-O2 11.50% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CLY-3-O2 1.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CPY-3-O2 5.00% Δε [1 kHz, 20° C.]: −3.3 CC-3-V1 11.00% K.sub.1 [pN, 20° C.]: 15.4 CCH-24 8.00% K.sub.3 [pN, 20° C.]: 15.2 CCH-35 4.00% V.sub.0 [V, 20° C.]: 2.28 CY-3-O2 6.50% γ.sub.1 [mPa s, 20° C.]: 90 PY-3-O2 6.00% PY-1-O2 7.50% PY-2-O2 4.00% CC-4-V1 22.00% B(S)-2O-O4 3.00% B(S)-2O-O5 4.00%

Example M286

[0617]

TABLE-US-00216 CCH-301 3.50% Clearing point [° C.]: 74 CCH-34 6.00% Δn [589 nm, 20° C.]: 0.1119 CCH-35 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-4-V1 17.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CCY-3-O1 6.00% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O2 4.50% K.sub.1 [pN, 20° C.]: 14.3 CPY-2-O2 10.00% K.sub.3 [pN, 20° C.]: 15.3 CPY-3-O2 12.00% V.sub.0 [V, 20° C.]: 2.28 CY-3-O2 15.00% γ.sub.1 [mPa s, 20° C.]: 118 CY-3-O4 7.00% LTS bulk [h, −20° C.]: >1000 h PCH-301 2.00% PP-1-2V1 9.00% PYP-2-3 4.00%

Example M287

[0618]

TABLE-US-00217 CCH-34 7.00% Clearing point [° C.]: 74.5 CCH-35 6.00% Δn [589 nm, 20° C.]: 0.1124 CC-4-V1 17.50% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCY-3-O1 7.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CCY-3-O2 2.50% Δε [1 kHz, 20° C.]: −3.3 CPY-2-O2 10.00% K.sub.1 [pN, 20° C.]: 14.7 CPY-3-O2 11.50% K.sub.3 [pN, 20° C.]: 15.4 CY-3-O2 15.50% V.sub.0 [V, 20° C.]: 2.27 CY-3-O4 7.00% γ.sub.1 [mPa s, 20° C.]: 118 PCH-301 2.00% LTS bulk [h, −20° C.]: >1000 h PGIY-2-O4 4.00% PP-1-2V1 10.00%

Example M288

[0619]

TABLE-US-00218 CLY-3-O2 9.00% Clearing point [° C.]: 74.5 CLY-3-O3 12.00% Δn [589 nm, 20° C.]: 0.0939 B(S)-2O-O4 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 B(S)-2O-O5 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CC-3-V 19.00% Δε [1 kHz, 20° C.]: −3.4 CC-3-V1 15.00% K.sub.1 [pN, 20° C.]: 15.3 CY-3-O2 12.00% K.sub.3 [pN, 20° C.]: 15.7 PY-3-O2 7.00% V.sub.0 [V, 20° C.]: 2.27 CC-4-V1 17.00% γ.sub.1 [mPa s, 20° C.]: 82

Example M289

[0620]

TABLE-US-00219 B(S)-2O-O4 3.00% Clearing point [° C.]: 75 B(S)-2O-O5 3.00% Δn [589 nm, 20° C.]: 0.1088 CC-3-V1 7.50% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-4-V1 19.50% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCH-301 8.00% Δε [1 kHz, 20° C.]: −3.2 CCH-34 3.00% K.sub.1 [pN, 20° C.]: 15.0 CY-3-O2 13.00% K.sub.3 [pN, 20° C.]: 15.9 CY-3-O4 3.00% V.sub.0 [V, 20° C.]: 2.34 PCH-53 3.00% γ.sub.1 [mPa s, 20° C.]: 106 PP-1-2V1 6.00% LTS bulk [h, −20° C.]: >1000 h BCH-32 2.00% LTS bulk [h, −25° C.]: >1000 h CCY-3-O2 10.50% CPY-2-O2 5.50% CPY-3-O2 10.00% PYP-2-3 3.00%

Example M290

[0621]

TABLE-US-00220 B(S)-2O-O4 4.00% Clearing point [° C.]: 75 B(S)-2O-O5 4.00% Δn [589 nm, 20° C.]: 0.1086 CC-3-V1 9.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-4-V1 22.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCH-301 10.00% Δε [1 kHz, 20° C.]: −3.2 CCH-34 2.00% K.sub.1 [pN, 20° C.]: 15.5 CY-3-O2 15.00% K.sub.3 [pN, 20° C.]: 16.8 PP-1-2V1 8.00% V.sub.0 [V, 20° C.]: 2.42 CCP-3-1 1.00% γ.sub.1 [mPa s, 20° C.]: 98 CCY-3-O2 10.00% LTS bulk [h, −20° C.]: >1000 h CPY-3-O2 12.00% PYP-2-3 3.00%

Example M291

[0622]

TABLE-US-00221 B(S)-2O-O4 4.00% Clearing point [° C.]: 74.5 B(S)-2O-O5 4.00% Δn [589 nm, 20° C.]: 0.1086 B(S)-2O-O6 3.00% ε.sub.∥ [1 kHz, 20° C.]: 3.4 CC-3-V1 9.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CC-4-V1 22.00% Δε [1 kHz, 20° C.]: −3.2 CCH-301 6.00% K.sub.1 [pN, 20° C.]: 16.0 CCH-34 7.00% K.sub.3 [pN, 20° C.]: 16.5 CY-3-O2 15.00% V.sub.0 [V, 20° C.]: 2.40 PP-1-2V1 8.00% γ.sub.1 [mPa s, 20° C.]: 93 CCP-3-1 2.50% CCY-3-O2 6.00% CPY-3-O2 12.00% PYP-2-3 1.50%

Example M292

[0623]

TABLE-US-00222 CCP-3-1 6.50% Clearing point [° C.]: 101 CCP-V-1 16.00% Δn [589 nm, 20° C.]: 0.1026 CCY-3-O2 6.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CLY-3-O2 6.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.6 CLY-4-O2 7.00% Δε [1 kHz, 20° C.]: −4.0 CLY-5-O2 6.00% K.sub.1 [pN, 20° C.]: 20.4 B(S)-2O-O4 3.70% K.sub.3 [pN, 20° C.]: 19.3 B(S)-2O-O5 4.00% V.sub.0 [V, 20° C.]: 2.32 B(S)-2O-O6 3.00% γ.sub.1 [mPa s, 20° C.]: 146 CC-3-V1 2.00% CC-4-V1 14.00% CCH-23 3.00% CCH-35 8.00% CY-3-O2 9.00% Y-4O-O4 5.00% CCQU-3-F 0.30%

Example M293

[0624]

TABLE-US-00223 CCP-3-1 4.00% Clearing point [° C.]: 92.5 CCP-V-1 13.50% Δn [589 nm, 20° C.]: 0.1049 CLY-2-O4 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CLY-3-O2 6.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.7 CLY-3-O3 4.00% Δε [1 kHz, 20° C.]: −4.1 CLY-4-O2 5.00% K.sub.1 [pN, 20° C.]: 19.1 CLY-5-O2 4.50% K.sub.3 [pN, 20° C.]: 17.0 CPY-3-O2 5.00% V.sub.0 [V, 20° C.]: 2.16 B(S)-2O-O4 4.00% γ.sub.1 [mPa s, 20° C.]: 123 B(S)-2O-O5 5.00% B(S)-2O-O6 3.00% CC-3-V1 8.00% CC-4-V1 15.00% CCH-23 9.70% Y-4O-O4 9.00% CCQU-3-F 0.30%

Example M294

[0625]

TABLE-US-00224 CC-3-V1 9.00% Clearing point [° C.]: 76.5 CC-4-V1 2.00% Δn [589 nm, 20° C.]: 0.1047 CCH-34 7.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CP-V2-1 19.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.5 CY-3-O2 6.00% Δε [1 kHz, 20° C.]: −3.1 PY-3-O2 11.50% K.sub.1 [pN, 20° C.]: 14.0 CCP-V2-1 9.00% K.sub.3 [pN, 20° C.]: 17.0 CCY-3-O1 11.00% V.sub.0 [V, 20° C.]: 2.48 CCY-3-O2 11.00% γ.sub.1 [mPa s, 20° C.]: 107 CCY-3-O3 2.50% LTS bulk [h, −20° C.]: >1000 h CPY-3-O2 12.00%

Example M295

[0626]

TABLE-US-00225 CC-3-V1 9.00% Clearing point [° C.]: 73.5 CC-4-V1 10.50% Δn [589 nm, 20° C.]: 0.1091 CCH-301 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CY-3-O2 15.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 PY-2-O2 11.00% Δε [1 kHz, 20° C.]: −3.1 PY-3-O2 8.00% K.sub.1 [pN, 20° C.]: 13.9 CCP-3-1 9.50% K.sub.3 [pN, 20° C.]: 16.4 CCP-V2-1 12.00% V.sub.0 [V, 20° C.]: 2.43 CCY-3-O2 3.50% γ.sub.1 [mPa s, 20° C.]: 104 CPY-3-O2 12.00% PYP-2-3 1.50%

Example M296

[0627]

TABLE-US-00226 BCH-32 4.00% Clearing point [° C.]: 74.5 CCP-V2-1 4.00% Δn [589 nm, 20° C.]: 0.1032 CCY-3-O2 11.50% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CLY-3-O2 1.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.5 CPY-3-O2 8.00% Δε [1 kHz, 20° C.]: −3.0 CC-3-V1 11.00% K.sub.1 [pN, 20° C.]: 15.2 CCH-24 8.00% K.sub.3 [pN, 20° C.]: 15.2 CCH-35 5.00% V.sub.0 [V, 20° C.]: 2.37 CY-3-O2 6.00% γ.sub.1 [mPa s, 20° C.]: 90 PY-3-O2 5.00% PY-1-O2 4.50% PY-2-O2 8.00% CC-4-V1 20.00% B-2O-O5 4.00%

Example M297

[0628]

TABLE-US-00227 B-2O-O5 4.00% Clearing point [° C.]: 75 BCH-32 7.00% Δn [589 nm, 20° C.]: 0.1019 CC-3-V1 9.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-301 6.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.5 CCH-34 6.00% Δε [1 kHz, 20° C.]: −2.9 CCP-V2-1 3.00% K.sub.1 [pN, 20° C.]: 14.9 CCY-3-O2 11.00% K.sub.3 [pN, 20° C.]: 14.8 CLY-3-O2 6.00% V.sub.0 [V, 20° C.]: 2.37 CPY-3-O2 4.00% γ.sub.1 [mPa s, 20° C.]: 91 CY-3-O2 4.00% LTS bulk [h, −20° C.]: >1000 h PY-1-O2 9.00% PY-2-O2 8.00% CC-4-V1 17.00% CCH-24 6.00%

Example M298

[0629]

TABLE-US-00228 B(S)-2O-O4 2.00% Clearing point [° C.]: 75 B(S)-2O-O5 2.00% Δn [589 nm, 20° C.]: 0.1024 CC-3-V1 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-4-V1 18.50% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCH-301 12.50% Δε [1 kHz, 20° C.]: −3.2 CY-3-O2 15.00% K.sub.1 [pN, 20° C.]: 14.3 PCH-302 8.00% K.sub.3 [pN, 20° C.]: 16.2 PP-1-2V1 2.50% V.sub.0 [V, 20° C.]: 2.39 BCH-32 2.50% γ.sub.1 [mPa s, 20° C.]: 105 CCY-3-O2 7.50% LTS bulk [h, −25° C.]: >1000 h CLY-3-O2 1.00% CPY-2-O2 8.50% CPY-3-O2 12.00%

Example M299

[0630]

TABLE-US-00229 B(S)-2O-O4 2.00% Clearing point [° C.]: 75 B(S)-2O-O5 2.00% Δn [589 nm, 20° C.]: 0.1018 CC-3-V1 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.4 CC-4-V1 22.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.4 CCH-301 9.00% Δε [1 kHz, 20° C.]: −3.0 CY-3-O2 15.00% K.sub.1 [pN, 20° C.]: 13.9 PCH-302 10.50% K.sub.3 [pN, 20° C.]: 15.7 PP-1-2V1 1.50% V.sub.0 [V, 20° C.]: 2.40 CCP-31 1.00% γ.sub.1 [mPa s, 20° C.]: 104 CCY-3-O2 5.00% CLY-3-O2 1.00% CPY-2-O2 11.00% CPY-3-O2 12.00%

Example M300

[0631] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M299 is mixed with 0.3% of the polymerisable compound of the formula

##STR00499##

Example M301

[0632] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M299 is mixed with 0.25% of the polymerisable compound of the formula

##STR00500##

Example M302

[0633]

TABLE-US-00230 CC-3-V1 8.00% Clearing point [° C.]: 72.5 B(S)-2O-O4 0.75% Δn [589 nm, 20° C.]: 0.1026 CC-4-V1 18.00% ε.sub.∥ [1 kHz, 20° C.]: 3.4 CCH-24 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.5 CCH-301 4.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O2 11.50% K.sub.1 [pN, 20° C.]: 14.3 CPY-3-O2 8.75% K.sub.3 [pN, 20° C.]: 15.1 CPY-2-O4 6.00% V.sub.0 [V, 20° C.]: 2.34 CPY-2-O2 7.00% γ.sub.1 [mPa s, 20° C.]: 104 CY-3-O2 15.00% LTS bulk [h, −20° C.]: >1000 h CY-3-O4 4.50% PP-1-2V1 8.50%

Example M303

[0634]

TABLE-US-00231 B(S)-2O-O5 0.25% Clearing point [° C.]: 74 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1039 CC-4-V1 26.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-24 2.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.5 CCH-301 4.00% Δε [1 kHz, 20° C.]: −3.0 CCY-3-O1 7.50% K.sub.1 [pN, 20° C.]: 14.0 CPY-3-O2 12.50% K.sub.3 [pN, 20° C.]: 15.1 CPY-2-O2 9.50% V.sub.0 [V, 20° C.]: 2.36 CY-3-O2 15.00% γ.sub.1 [mPa s, 20° C.]: 103 CY-3-O4 7.00% PYP-2-3 3.00% PP-1-2V1 5.25%

Example M304

[0635]

TABLE-US-00232 B(S)-2O-O5 0.25% Clearing point [° C.]: 73.5 CCP-3-1 13.00% Δn [589 nm, 20° C.]: 0.1023 CC-3-V1 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.8 CC-4-V1 9.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCY-3-O1 6.00% Δε [1 kHz, 20° C.]: −2.9 CCY-3-O2 7.00% K.sub.1 [pN, 20° C.]: 13.6 CPY-3-O2 12.00% K.sub.3 [pN, 20° C.]: 15.5 CPY-2-O2 2.00% V.sub.0 [V, 20° C.]: 2.42 PCH-302 6.50% γ.sub.1 [mPa s, 20° C.]: 100 PY-1-O2 6.00% LTS bulk [h, −20° C.]: >1000 h CCH-301 15.00% LTS bulk [h, −25° C.]: >1000 h PYP-2-3 6.25% Y-4O-O4 9.00%

Example M305

[0636]

TABLE-US-00233 B(S)-2O-O5 0.25% Clearing point [° C.]: 72.5 CCP-3-1 16.00% Δn [589 nm, 20° C.]: 0.1036 CC-3-V 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.8 CC-3-V1 7.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CC-4-V1 9.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O1 4.00% K.sub.1 [pN, 20° C.]: 13.5 CCY-3-O2 6.00% K.sub.3 [pN, 20° C.]: 15.1 CLY-3-O2 4.50% V.sub.0 [V, 20° C.]: 2.33 CPY-3-O2 5.00% γ.sub.1 [mPa s, 20° C.]: 96 CPY-2-O2 2.00% LTS bulk [h, −20° C.]: >1000 h CY-3-O2 7.50% PY-1-O2 4.75% PYP-2-3 10.00% CCH-301 10.00% Y-4O-O4 9.00%

Example M306

[0637] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M305 is mixed with 0.25% of the polymerisable compound of the formula

##STR00501##

Example M307

[0638] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M305 is mixed with 0.25% of the polymerisable compound of the formula

##STR00502##

Example M308

[0639]

TABLE-US-00234 Y-3-O1 6.00% Clearing point [° C.]: 75 B(S)-2O-O5 4.00% Δn [589 nm, 20° C.]: 0.0890 CC-3-V1 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.8 CC-4-V1 22.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CCH-35 6.00% Δε [1 kHz, 20° C.]: −3.1 CCP-3-1 14.00% K.sub.1 [pN, 20° C.]: 14.6 CCY-3-O2 11.00% K.sub.3 [pN, 20° C.]: 15.8 CCY-5-O2 9.00% V.sub.0 [V, 20° C.]: 2.40 CY-3-O2 12.00% γ.sub.1 [mPa s, 20° C.]: 92 PY-1-O2 8.00%

Example M309

[0640]

TABLE-US-00235 B(S)-2O-O5 4.00% Clearing point [° C.]: 75 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.0893 CC-4-V1 22.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-301 1.50% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCH-34 6.00% Δε [1 kHz, 20° C.]: −3.1 CCH-35 6.00% K.sub.1 [pN, 20° C.]: 15.1 PCH-301 4.00% K.sub.3 [pN, 20° C.]: 16.4 CCP-3-1 2.50% V.sub.0 [V, 20° C.]: 2.39 CCY-3-O2 11.00% γ.sub.1 [mPa s, 20° C.]: 91 CCY-5-O2 10.00% CY-3-O2 15.00% PY-1-O2 10.00%

Example M310

[0641]

TABLE-US-00236 Y-3-O1 7.00% Clearing point [° C.]: 74 B-2O-O5 3.50% Δn [589 nm, 20° C.]: 0.1055 CC-3-V1 8.00% ε.sub.∥ [1 kHz, 20° C.]: 4.0 CC-4-V1 22.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCP-3-1 16.00% Δε [1 kHz, 20° C.]: −3.0 CCP-V2-1 5.00% K.sub.1 [pN, 20° C.]: 13.8 CCY-3-O2 8.50% K.sub.3 [pN, 20° C.]: 15.2 CLY-3-O2 1.00% V.sub.0 [V, 20° C.]: 2.38 CPY-3-O2 12.00% γ.sub.1 [mPa s, 20° C.]: 91 PY-1-O2 7.00% PY-2-O2 10.00%

Example M311

[0642]

TABLE-US-00237 CCP-3-1 5.00% Clearing point [° C.]: 92 CCP-V-1 6.50% Δn [589 nm, 20° C.]: 0.1028 CCP-V2-1 2.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCY-3-O2 6.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.7 CLY-2-O4 5.00% Δε [1 kHz, 20° C.]: −4.1 CLY-3-O2 5.00% K.sub.1 [pN, 20° C.]: 19.1 CLY-4-O2 5.00% K.sub.3 [pN, 20° C.]: 17.2 CLY-5-O2 4.50% V.sub.0 [V, 20° C.]: 2.18 PGIY-2-O4 3.00% γ.sub.1 [mPa s, 20° C.]: 124 B(S)-2O-O4 4.00% B(S)-2O-O5 4.00% B(S)-2O-O6 4.00% CC-4-V1 15.20% CC-3-V1 8.00% CCH-23 12.00% CY-3-O2 4.00% Y-4O-O4 6.00% CCQU-3-F 0.30%

Example M312

[0643]

TABLE-US-00238 Y-3-O1 7.50% Clearing point [° C.]: 74.5 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1078 CC-4-V1 21.50% ε.sub.∥ [1 kHz, 20° C.]: 4.0 PP-1-2V1 2.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CCP-3-1 14.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O1 2.50% K.sub.1 [pN, 20° C.]: 13.9 CCY-3-O2 11.00% K.sub.3 [pN, 20° C.]: 15.6 CLY-3-O2 1.00% V.sub.0 [V, 20° C.]: 2.36 CPY-2-O2 4.00% γ.sub.1 [mPa s, 20° C.]: 98 CPY-3-O2 12.00% LTS bulk [h, −20° C.]: >1000 h PY-1-O2 10.00% PY-2-O2 6.50%

Example M313

[0644] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M312 is mixed with 0.3% of the polymerisable compound of the formula

##STR00503##

Example M314

[0645] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M312 is mixed with 0.25% of the polymerisable compound of the formula

##STR00504##

Example M315

[0646]

TABLE-US-00239 CCP-3-1 5.00% Clearing point [° C.]: 91 CCP-V-1 4.00% Δn [589 nm, 20° C.]: 0.1028 CCP-V2-1 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.8 CCY-3-O2 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.7 CLY-2-O4 4.00% Δε [1 kHz, 20° C.]: −3.9 CLY-3-O2 5.00% K.sub.1 [pN, 20° C.]: 19.4 CLY-4-O2 5.00% K.sub.3 [pN, 20° C.]: 16.9 CLY-5-O2 4.50% V.sub.0 [V, 20° C.]: 2.18 PGIY-2-O4 2.00% γ.sub.1 [mPa s, 20° C.]: 114 B(S)-2O-O4 3.50% B(S)-2O-O5 4.00% B(S)-2O-O6 4.00% CC-2V-V2 15.20% CC-3-V1 8.00% CC-4-V1 14.00% CY-3-O2 4.50% Y-4O-O4 8.00% CCQU-3-F 0.30%

Example M316

[0647]

TABLE-US-00240 CC-3-V1  5.00% Clearing point [° C.]: 72 CC-4-V1 15.50% Δn [589 nm, 20° C.]: 0.996 CCY-3-O1 11.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCY-3-O2  9.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.4 CLY-3-O2 1.00% Δε [1 kHz, 20° C.]: −3.0 CPY-2-O2 12.00% K.sub.1 [pN, 20° C.]: 13.5 CPY-3-O2  7.00% K.sub.3 [pN, 20° C.]: 15.2 CY-3-O2  1.50% V.sub.0 [V, 20° C.]: 2.39 PY-1-O2  3.00% γ.sub.1 [mPa s, 20° C.]: 89 PY-2-O2 10.00% [00505] 25.00%

Example M317

[0648]

TABLE-US-00241 Y-3-O1 6.50% Clearing point [° C.]: 74.5 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.0895 CC-4-V1 22.00% ε.sub.∥ [1 kHz, 20° C.]: 3.8 CCH-35 5.50% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCP-3-1 9.00% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O2 11.00% K.sub.1 [pN, 20° C.]: 14.1 CCY-5-O2 11.00% K.sub.3 [pN, 20° C.]: 15.8 CPY-3-O2 6.00% V.sub.0 [V, 20° C.]: 2.37 CY-3-O2 13.00% γ.sub.1 [mPa s, 20° C.]: 97 PY-1-O2 8.00% LTS bulk [h, −20° C.]: >1000 h

Example M318

[0649]

TABLE-US-00242 BCH-32 5.00% Clearing point [° C.]: 74.5 CCP-V2-1 7.00% Δn [589 nm, 20° C.]: 0.1068 CCY-3-O2 9.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CLY-3-O2 1.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CPY-3-O2 2.50% Δε [1 kHz, 20° C.]: −3.2 CC-3-V1 11.00% K.sub.1 [pN, 20° C.]: 15.8 CCH-34 6.00% K.sub.3 [pN, 20° C.]: 15.6 CCH-35 5.00% V.sub.0 [V, 20° C.]: 2.34 CY-3-O2 8.00% γ.sub.1 [mPa s, 20° C.]: 89 PY-3-O2 3.00% LTS bulk [h, −20° C.]: >1000 h PY-1-O2 9.00% PY-2-O2 7.00% CC-4-V1 19.50% B(S)-2O-O4 3.00% B(S)-2O-O5 4.00%

Example M319

[0650]

TABLE-US-00243 Y-4O-O4 6.50% Clearing point [° C.]: 74 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.0906 CC-4-V1 22.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCH-301 7.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CCP-3-1 13.00% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O1 6.50% K.sub.1 [pN, 20° C.]: 14.2 CCY-3-O2 11.00% K.sub.3 [pN, 20° C.]: 16.3 CPY-3-O2 6.50% V.sub.0 [V, 20° C.]: 2.39 CY-3-O2 11.50% γ.sub.1 [mPa s, 20° C.]: 97 PY-1-O2 8.00% LTS bulk [h, −20° C.]: >1000 h

Example M320

[0651]

TABLE-US-00244 Y-1-O2 7.00% Clearing point [° C.]: 72.5 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.0911 CC-4-V1 20.00% ε.sub.∥ [1 kHz, 20° C.]: 4.0 CCH-34 4.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.2 CCH-35 4.00% Δε [1 kHz, 20° C.]: −3.2 CY-3-O2 6.50% K.sub.1 [pN, 20° C.]: 14.4 PY-1-O2 8.00% K.sub.3 [pN, 20° C.]: 15.6 PY-3-O2 6.00% V.sub.0 [V, 20° C.]: 2.33 CCP-3-1 8.00% γ.sub.1 [mPa s, 20° C.]: 91 CCY-3-O1 4.50% CCY-3-O2 11.00% CCY-5-O2 11.00% CPY-3-O2 2.00%

Example M321

[0652]

TABLE-US-00245 Y-3-O1 6.00% Clearing point [° C.]: 74.5 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1018 CC-4-V1 22.00% ε.sub.∥ [1 kHz, 20° C.]: 3.9 CCH-34 4.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCH-35 4.00% Δε [1 kHz, 20° C.]: −3.1 CY-3-O2 1.50% K.sub.1 [pN, 20° C.]: 13.9 PY-1-O2 8.00% K.sub.3 [pN, 20° C.]: 14.7 PY-2-O2 8.00% V.sub.0 [V, 20° C.]: 2.30 CCP-3-1 7.00% Y.sub.1 [mPa s, 20° C.]: 94 CCY-3-O2 11.00% CCY-3-O3 2.50% CLY-3-O2 1.00% CPY-2-O2 5.00% CPY-3-O2 12.00%

Example M322

[0653]

TABLE-US-00246 Y-3-O5 6.00% Clearing point [° C.]: 75.5 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1022 CC-4-V1 22.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCH-34 4.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CCH-35 4.00% Δε [1 kHz, 20° C.]: −3.1 CY-3-O2 1.50% K.sub.1 [pN, 20° C.]: 14.5 PY-1-O2 8.00% K.sub.3 [pN, 20° C.]: 15.3 PY-2-O2 8.00% V.sub.0 [V, 20° C.]: 2.33 CCP-3-1 7.00% γ.sub.1 [mPa s, 20° C.]: 101 CCY-3-O2 11.00% CCY-3-O3 2.50% CLY-3-O2 1.00% CPY-2-O2 5.00% CPY-3-O2 12.00%

Example M323

[0654]

TABLE-US-00247 Y-4-O4 6.00% Clearing point [° C.]: 75.5 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1025 CC-4-V1 22.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-34 4.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CCH-35 4.00% Δε [1 kHz, 20° C.]: −3.1 CY-3-O2 1.50% K.sub.1 [pN, 20° C.]: 14.5 PY-1-O2 8.00% K.sub.3 [pN, 20° C.]: 15.3 PY-2-O2 8.00% V.sub.0 [V, 20° C.]: 2.33 CCP-3-1 7.00% γ.sub.1 [mPa s, 20° C.]: 101 CCY-3-O2 11.00% CCY-3-O3 2.50% CLY-3-O2 1.00% CPY-2-O2 5.00% CPY-3-O2 12.00%

Example M324

[0655]

TABLE-US-00248 Y-5-O3 6.00% Clearing point [° C.]: 76 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1026 CC-4-V1 22.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-34 4.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CCH-35 4.00% Δε [1 kHz, 20° C.]: −3.1 CY-3-O2 1.50% K.sub.1 [pN, 20° C.]: 14.7 PY-1-O2 8.00% K.sub.3 [pN, 20° C.]: 15.5 PY-2-O2 8.00% V.sub.0 [V, 20° C.]: 2.35 CCP-3-1 7.00% γ.sub.1 [mPa s, 20° C.]: 102 CCY-3-O2 11.00% CCY-3-O3 2.50% CLY-3-O2 1.00% CPY-2-O2 5.00% CPY-3-O2 12.00%

Example M325

[0656]

TABLE-US-00249 Y-3-O5 5.00% Clearing point [° C.]: 75 CC-3-V1 8.50% Δn [589 nm, 20° C.]: 0.0900 CC-4-V1 22.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-301 2.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CCH-34 5.00% Δε [1 kHz, 20° C.]: −3.2 CCH-35 5.00% K.sub.1 [pN, 20° C.]: 14.3 CY-3-O2 13.00% K.sub.3 [pN, 20° C.]: 15.4 PY-1-O2 5.00% V.sub.0 [V, 20° C.]: 2.33 CCP-3-1 2.00% γ.sub.1 [mPa s, 20° C.]: 100 CCY-3-O1 8.00% CCY-3-O2 10.00% CPY-2-O2 2.50% CPY-3-O2 12.00%

Example M326

[0657]

TABLE-US-00250 Y-3-O5 4.00% Clearing point [° C.]: 74 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1000 CC-4-V1 21.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-24 10.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CCY-3-O1 2.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O2 10.00% K.sub.1 [pN, 20° C.]: 13.9 CPY-2-O2 12.00% K.sub.3 [pN, 20° C.]: 14.3 CPY-3-O2 12.00% V.sub.0 [V, 20° C.]: 2.27 CY-3-O2 14.50% γ.sub.1 [mPa s, 20° C.]: 102 PP-1-2V1 4.00% PYP-2-3 2.50%

Example M327

[0658]

TABLE-US-00251 CC-4-V1 22.00% Clearing point [° C.]: 74.5 CC-3-V1 9.00% Δn [589 nm, 20° C.]: 0.1088 CCH-34 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CY-3-O2 15.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.5 CY-5-O2 13.00% Δε [1 kHz, 20° C.]: −3.0 CCY-3-O2 4.00% K.sub.1 [pN, 20° C.]: 14.1 CPY-2-O2 5.00% K.sub.3 [pN, 20° C.]: 14.8 CPY-3-O2 11.00% V.sub.0 [V, 20° C.]: 2.35 PYP-2-3 12.50% γ.sub.1 [mPa s, 20° C.]: 109 PPGU-3-F 0.50% LTS bulk [h, −20° C.]: >1000 h

Example M328

[0659]

TABLE-US-00252 CC-3-V1 9.00% Clearing point [° C.]: 74.5 CC-4-V1 22.00% Δn [589 nm, 20° C.]: 0.1087 CCH-34 6.50% ε.sub.∥ [1 kHz, 20° C.]: 3.4 CY-3-O2 15.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.4 CY-5-O2 9.00% Δε [1 kHz, 20° C.]: −3.0 PP-1-2V1 8.00% K.sub.1 [pN, 20° C.]: 15.0 CCY-3-O2 4.50% K.sub.3 [pN, 20° C.]: 16.0 CPY-2-O2 12.00% V.sub.0 [V, 20° C.]: 2.44 CPY-3-O2 12.00% γ.sub.1 [mPa s, 20° C.]: 106 PYP-2-3 2.00%

Example M329

[0660]

TABLE-US-00253 BCH-32  8.00% Clearing point [° C.]: 74 CC-3-V1  9.00% Δn [589 nm, 20° C.]: 0.1082 CC-4-V1 20.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCP-3-1  7.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCP-V2-1  5.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O2  9.00% K.sub.1 [pN, 20° C.]: 14.1 CLY-3-O2  1.00% K.sub.3 [pN, 20° C.]: 15.8 CPY-3-O2  2.50% V.sub.0 [V, 20° C.]: 2.38 CY-3-O2 14.00% γ.sub.1 [mPa s, 20° C.]: 100 PCH-301  3.50% LTS bulk [h, −20° C.]: >1000 h PY-1-O2  8.50% LTS bulk [h, −25° C.]: >1000 h PY-2-O2  8.50% [00506]  4.00%

Example M330

[0661]

TABLE-US-00254 B(S)-2O-O4 3.00% Clearing point [° C.]: 74.5 B(S)-2O-O5 4.00% Δn [589 nm, 20° C.]: 0.1040 BCH-32 4.50% ε.sub.∥ [1 kHz, 20° C.]: 3.4 CC-3-V1 10.50% ε.sub.⊥ [1 kHz, 20° C.]: 6.1 CC-4-V1 19.00% Δε [1 kHz, 20° C.]: −2.7 CCH-34 5.50% K.sub.1 [pN, 20° C.]: 13.9 CCH-35 3.00% K.sub.3 [pN, 20° C.]: 15.3 CCY-3-O2 4.50% V.sub.0 [V, 20° C.]: 2.51 CPY-3-O2 12.00% γ.sub.1 [mPa s, 20° C.]: 91 CY-3-O2 13.50% LTS bulk [h, −20° C.]: >1000 h PCH-301 13.50% PYP-2-3 1.50% PGIY-2-O4 3.50% CCH-301 2.00%

Example M331

[0662]

TABLE-US-00255 CC-3-V1 9.00% Clearing point [° C.]: 74 CC-4-V1 22.00% Δn [589 nm, 20° C.]: 0.1085 CCH-34 6.00% ε.sub.∥ [1 kHz, 20° C.]: 3.4 CCH-35 4.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.4 CY-3-O2 15.00% Δε [1 kHz, 20° C.]: −3.0 CY-5-O2 8.50% K.sub.1 [pN, 20° C.]: 14.9 PP-1-2V1 5.50% K.sub.3 [pN, 20° C.]: 15.1 CPY-2-O2 12.00% V.sub.0 [V, 20° C.]: 2.37 CPY-3-O2 12.00% γ.sub.1 [mPa s, 20° C.]: 104 PGIY-2-O4 6.00%

Example M332

[0663]

TABLE-US-00256 CC-3-V1 9.00% Clearing point [° C.]: 74 CC-4-V1 22.00% Δn [589 nm, 20° C.]: 0.1085 CCH-24 10.00% ε.sub.∥ [1 kHz, 20° C.]: 3.4 CY-3-O2 15.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.4 CY-5-O2 5.50% Δε [1 kHz, 20° C.]: −3.0 PP-1-2V1 5.00% K.sub.1 [pN, 20° C.]: 14.1 CCY-3-O2 2.50% K.sub.3 [pN, 20° C.]: 14.3 CPY-2-O2 12.00% V.sub.0 [V, 20° C.]: 2.32 CPY-3-O2 12.00% γ.sub.1 [mPa s, 20° C.]: 103 PGIY-2-O4 6.00% PYP-2-3 1.00%

Example M333

[0664]

TABLE-US-00257 CC-3-V1  9.00% Clearing point [° C.]: 74.5 CC-4-V1 22.00% Δn [589 nm, 20° C.]: 0.1091 CCH-301  7.50% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CY-3-O2 14.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CY-3-O4  4.00% Δε [1 kHz, 20° C.]: −3.2 PP-1-2V1  8.00% K.sub.1 [pN, 20° C.]: 15.6 CCP-3-1  5.00% K.sub.3 [pN, 20° C.]: 16.7 CCY-3-O2  7.50% V.sub.0 [V, 20° C.]: 2.43 CPY-3-O2 12.00% γ.sub.1 [mPa s, 20° C.]: 107 PYP-2-3  3.00% LTS bulk [h, −20 C.]: >1000 h [00507]  8.00%

Example M334

[0665] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M333 is mixed with 0.3% of the polymerisable compound of the formula

##STR00508##

Example M335

[0666]

TABLE-US-00258 CC-3-V1 9.00% Clearing point [° C.]: 75 CC-4-V1 20.50% Δn [589 nm, 20° C.]: 0.1094 CP-2V-1 7.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CY-3-O2 13.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 PY-2-O2 10.00% Δε [1 kHz, 20° C.]: −3.1 PY-3-O2 3.50% K.sub.1 [pN, 20° C.]: 14.2 CCP-3-1 8.50% K.sub.3 [pN, 20° C.]: 16.5 CCY-3-O2 11.00% V.sub.0 [V, 20° C.]: 2.43 CPY-2-O2 2.50% γ.sub.1 [mPa s, 20° C.]: 107 CPY-3-O2 12.00% LTS bulk [h, −25° C.]: >1000 h PYP-2-3 3.00%

Example M336

[0667]

TABLE-US-00259 BCH-32 2.00% Clearing point [° C.]: 75 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1032 CC-4-V1 27.00% ε.sub.∥ [1 kHz, 20° C.]: 3.4 CCH-24 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.0 CCY-3-O2 6.50% Δε [1 kHz, 20° C.]: −2.7 CPY-3-O2 11.00% K.sub.1 [pN, 20° C.]: 13.9 CY-3-O2 15.50% K.sub.3 [pN, 20° C.]: 14.1 CY-3-O4 4.50% V.sub.0 [V, 20° C.]: 2.44 PYP-2-3 6.00% γ.sub.1 [mPa s, 20° C.]: 96 PGIY-2-O4 8.00% LTS bulk [h, −20° C.]: >1000 h CCH-301 3.50% LTS bulk [h, −25° C.]: >1000 h

Example M337

[0668] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M336 is mixed with 0.3% of the polymerisable compound of the formula

##STR00509##

Example M338

[0669]

TABLE-US-00260 CC-3-V1 9.00% Clearing point [° C.]: 74 CC-4-V1 22.00% Δn [589 nm, 20° C.]: 0.1096 CCH-301 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 PP-1-2V1 4.50% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CY-3-O2 15.00% Δε [1 kHz, 20° C.]: −3.2 PY-2-O2 10.00% K.sub.1 [pN, 20° C.]: 14.5 PY-3-O2 3.00% K.sub.3 [pN, 20° C.]: 16.6 BCH-32 3.50% V.sub.0 [V, 20° C.]: 2.42 CCP-3-1 4.00% γ.sub.1 [mPa s, 20° C.]: 104 CCY-3-O2 11.00% LTS bulk [h, −25° C.]: >1000 h CPY-2-O2 2.00% CPY-3-O2 12.00%

Example M339

[0670]

TABLE-US-00261 CC-3-V1 8.00% Clearing point [° C.]: 75.5 CC-4-V1 22.00% Δn [589 nm, 20° C.]: 0.1344 CCP-3-1 15.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCY-3-O2 4.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CY-3-O2 6.00% Δε [1 kHz, 20° C.]: −3.2 PP-1-2V1 7.00% K.sub.1 [pN, 20° C.]: 16.9 PY-1-O2 9.00% K.sub.3 [pN, 20° C.]: 18.0 PY-3-O2 10.00% V.sub.0 [V, 20° C.]: 2.51 PGIY-3-O4 14.00% γ.sub.1 [mPa s, 20° C.]: 116 B(S)-2O-O4 2.00% LTS bulk [h, −25° C.]: >1000 h B(S)-2O-O5 3.00%

Example M340

[0671] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M339 is mixed with 0.25% of the polymerisable compound of the formula

##STR00510##

Example M341

[0672] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M339 is mixed with 0.25% of the polymerisable compound of the formula

##STR00511##

Example M342

[0673] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M339 is mixed with 0.3% of the polymerisable compound of the formula

##STR00512##

Example M343

[0674]

TABLE-US-00262 CC-3-V1 9.00% Clearing point [° C.]: 74.5 CC-4-V1 22.00% Δn [589 nm, 20° C.]: 0.1022 CCH-301 5.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCP-3-1 13.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCY-3-O2 6.50% Δε [1 kHz, 20° C.]: −3.1 CLY-3-O2 1.00% K.sub.1 [pN, 20° C.]: 14.2 CPY-2-O2 6.00% K.sub.3 [pN, 20° C.]: 16.2 CPY-3-O2 7.00% V.sub.0 [V, 20° C.]: 2.41 CY-3-O2 15.00% γ.sub.1 [mPa s, 20° C.]: 98 PY-1-O2 5.50% LTS bulk [h, −20° C.]: >1000 h PY-2-O2 10.00%

Example M344

[0675]

TABLE-US-00263 B(S)-2O-O5 1.50% Clearing point [° C.]: 74.5 CC-3-V1 9.00% Δn [589 nm, 20° C.]: 0.1025 CC-4-V1 20.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-301 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCP-3-1 3.50% Δε [1 kHz, 20° C.]: −3.1 CCP-V2-1 10.00% K.sub.1 [pN, 20° C.]: 14.0 CCY-3-O2 4.50% K.sub.3 [pN, 20° C.]: 16.0 CLY-3-O2 1.00% V.sub.0 [V, 20° C.]: 2.40 CPY-2-O2 2.00% γ.sub.1 [mPa s, 20° C.]: 97 CPY-3-O2 12.00% LTS bulk [h, −20° C.]: >1000 h CY-3-O2 15.00% PY-1-O2 3.50% PY-2-O2 10.00%

Example M345

[0676] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M344 is mixed with 0.3% of the polymerisable compound of the formula

##STR00513##

Example M346

[0677] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M344 is mixed with 0.3% of the polymerisable compound of the formula

##STR00514##

Example M347

[0678]

TABLE-US-00264 B(S)-2O-O5 1.00% Clearing point [° C.]: 73.5 CC-3-V1 9.00% Δn [589 nm, 20° C.]: 0.1024 CC-4-V1 22.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCP-3-1 1.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CCP-V2-1 10.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O2 9.50% K.sub.1 [pN, 20° C.]: 13.8 CLY-3-O2 1.00% K.sub.3 [pN, 20° C.]: 15.9 CPY-2-O2 11.00% V.sub.0 [V, 20° C.]: 2.39 CY-3-O2 15.00% γ.sub.1 [mPa s, 20° C.]: 99 PCH-302 8.00% LTS bulk [h, −20° C.]: >1000 h PY-1-O2 2.50% PY-2-O2 10.00%

Example M348

[0679]

TABLE-US-00265 CC-3-V1 7.50% Clearing point [° C.]: 75 CC-4-V1 15.00% Δn [589 nm, 20° C.]: 0.1086 CC-2V-V2 15.00% ε.sub.∥ [1 kHz, 20° C.]: 3.4 CY-3-O2 15.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.5 CY-5-O2 10.00% Δε [1 kHz, 20° C.]: −3.0 PP-1-2V1 7.00% K.sub.1 [pN, 20° C.]: 14.7 CCY-3-O2 7.50% K.sub.3 [pN, 20° C.]: 15.6 CPY-2-O2 10.00% V.sub.0 [V, 20° C.]: 2.40 CPY-3-O2 10.00% γ.sub.1 [mPa s, 20° C.]: 104 PYP-2-3 3.00%

Example M349

[0680]

TABLE-US-00266 CC-3-V1 8.00% Clearing point [° C.]: 75 CC-4-V1 20.00% Δn [589 nm, 20° C.]: 0.0811 CCH-301 10.00% ε.sub.∥ [1 kHz, 20° C.]: 3.4 CCH-34 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.4 CCP-3-1 1.50% Δε [1 kHz, 20° C.]: −3.0 CCY-3-O1 9.00% K.sub.1 [pN, 20° C.]: 13.9 CCY-3-O2 11.00% K.sub.3 [pN, 20° C.]: 15.8 CCY-4-O2 3.00% V.sub.0 [V, 20° C.]: 2.43 CPY-2-O2 1.50% γ.sub.1 [mPa s, 20° C.]: 96 CPY-3-O2 4.00% LTS bulk [h, −20° C.]: >1000 h CY-3-O2 15.00% CY-3-O4 6.00% PCH-302 5.00% PY-3-O2 1.00%

Example M350

[0681]

TABLE-US-00267 B-2O-O5 4.00% Clearing point [° C.]: 74.5 CGS-3-2 8.00% Δn [589 nm, 20° C.]: 0.1086 CC-3-V1 9.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CC-4-V1 20.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CCP-3-1 9.50% Δε [1 kHz, 20° C.]: −3.2 CCP-V2-1 5.00% K.sub.1 [pN, 20° C.]: 14.6 CCY-3-O2 9.00% K.sub.3 [pN, 20° C.]: 16.6 CLY-3-O2 1.00% V.sub.0 [V, 20° C.]: 2.40 CPY-3-O2 3.00% γ.sub.1 [mPa s, 20° C.]: 104 CY-3-O2 15.00% LTS bulk [h, −20° C.]: >1000 h PCH-301 2.00% LTS bulk [h, −25° C.]: >1000 h PY-1-O2 8.00% PY-2-O2 6.50%

Example M351

[0682]

TABLE-US-00268 B(S)-2O-O5 4.00% Clearing point [° C.]: 74 CC-3-V1 6.00% Δn [589 nm, 20° C.]: 0.0900 CC-4-V1 10.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-301 15.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CCP-3-1 13.00% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O2 11.00% K.sub.1 [pN, 20° C.]: 14.1 CCY-5-O2 9.00% K.sub.3 [pN, 20° C.]: 16.5 CY-3-O2 15.00% V.sub.0 [V, 20° C.]: 2.40 PCH-302 7.00% γ.sub.1 [mPa s, 20° C.]: 104 PY-2-O2 8.00% LTS bulk [h, −20° C.]: >1000 h CCH-35 2.00%

Example M352

[0683]

TABLE-US-00269 CC-3-V1 8.00% Clearing point [° C.]: 74 CC-4-V1 13.00% Δn [589 nm, 20° C.]: 0.0904 CCH-301 15.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCP-3-1 13.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CCY-3-O1 3.00% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O2 11.00% K.sub.1 [pN, 20° C.]: 14.0 CCY-5-O2 8.00% K.sub.3 [pN, 20° C.]: 16.7 CY-3-O2 15.00% V.sub.0 [V, 20° C.]: 2.41 PY-1-O2 8.00% γ.sub.1 [mPa s, 20° C.]: 103 PY-2-O2 6.00% LTS bulk [h, −20° C.]: >1000 h

Example M353

[0684]

TABLE-US-00270 B(S)-2O-O5 1.50% Clearing point [° C.]: 75 CC-3-V1 9.00% Δn [589 nm, 20° C.]: 0.1019 CC-4-V1 20.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-301 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCP-3-1 11.50% Δε [1 kHz, 20° C.]: −3.1 CCP-3-3 2.00% K.sub.1 [pN, 20° C.]: 14.3 CCY-3-O2 4.50% K.sub.3 [pN, 20° C.]: 16.2 CLY-3-O2 1.00% V.sub.0 [V, 20° C.]: 2.41 CPY-2-O2 2.00% γ.sub.1 [mPa s, 20° C.]: 97 CPY-3-O2 12.00% LTS bulk [h, −20° C.]: >1000 h CY-3-O2 15.00% LTS bulk [h, −25° C.]: >1000 h PY-1-O2 3.50% PY-2-O2 10.00%

Example M354

[0685]

TABLE-US-00271 B(S)-2O-O5 4.00% Clearing point [° C.]: 74 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1019 CC-4-V1 16.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-301 9.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CCP-3-1 13.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O2 11.00% K.sub.1 [pN, 20° C.]: 14.2 CLY-3-O2 1.00% K.sub.3 [pN, 20° C.]: 15.9 CPY-2-O2 8.00% V.sub.0 [V, 20° C.]: 2.40 CY-3-O2 8.50% γ.sub.1 [mPa s, 20° C.]: 99 PCH-302 8.00% LTS bulk [h, −20° C.]: >1000 h PY-1-O2 3.50% LTS bulk [h, −25° C.]: >1000 h PY-2-O2 10.00%

Example M355

[0686]

TABLE-US-00272 B(S)-2O-O5 4.00% Clearing point [° C.]: 74 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1028 CC-4-V1 17.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-301 15.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCP-3-1 13.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O2 4.00% K.sub.1 [pN, 20° C.]: 14.2 CLY-3-O2 1.00% K.sub.3 [pN, 20° C.]: 15.6 CPY-2-O2 2.50% V.sub.0 [V, 20° C.]: 2.37 CPY-3-O2 12.00% γ.sub.1 [mPa s, 20° C.]: 96 CY-3-O2 9.00% LTS bulk [h, −20° C.]: >1000 h PY-1-O2 4.00% LTS bulk [h, −25° C.]: >1000 h PY-2-O2 10.00%

Example M356

[0687]

TABLE-US-00273 B(S)-2O-O5 1.50% Clearing point [° C.]: 74.5 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.0901 CC-4-V1 20.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-301 7.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCH-24 3.50% Δε [1 kHz, 20° C.]: −3.2 CCP-3-1 5.50% K.sub.1 [pN, 20° C.]: 14.2 CCY-3-O1 8.00% K.sub.3 [pN, 20° C.]: 16.3 CCY-3-O2 11.00% V.sub.0 [V, 20° C.]: 2.38 CCY-5-O2 4.50% γ.sub.1 [mPa s, 20° C.]: 100 CPY-2-O2 1.50% LTS bulk [h, −20° C.]: >1000 h CY-3-O2 14.50% LTS bulk [h, −30° C.]: >1000 h PCH-302 5.00% PY-1-O2 10.00%

Example M357

[0688]

TABLE-US-00274 B(S)-2O-O5 1.00% Clearing point [° C.]: 75 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.0909 CC-4-V1 19.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCH-301 7.50% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CCP-3-1 16.00% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O1 6.00% K.sub.1 [pN, 20° C.]: 14.1 CCY-3-O2 5.00% K.sub.3 [pN, 20° C.]: 15.9 CCY-5-O2 4.00% V.sub.0 [V, 20° C.]: 2.36 CPY-2-O2 7.00% γ.sub.1 [mPa s, 20° C.]: 98 CY-3-O2 15.50% LTS bulk [h, −20° C.]: >1000 h Y-4O-O4 5.00% PY-1-O2 6.00%

Example M358

[0689]

TABLE-US-00275 B(S)-2O-O5 5.00% Clearing point [° C.]: 74.5 BCH-32 1.50% Δn [589 nm, 20° C.]: 0.1044 CC-3-V1 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-4-V1 19.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CCY-3-O2 11.00% Δε [1 kHz, 20° C.]: −3.1 CPY-3-O2 11.00% K.sub.1 [pN, 20° C.]: 13.8 CY-3-O2 15.50% K.sub.3 [pN, 20° C.]: 15.6 PCH-302 6.50% V.sub.0 [V, 20° C.]: 2.37 PYP-2-3 8.50% γ.sub.1 [mPa s, 20° C.]: 103 CCH-301 14.00% LTS bulk [h, −20° C.]: >1000 h

Example M359

[0690]

TABLE-US-00276 B(S)-2O-O4 3.00% Clearing point [° C.]: 73.5 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1031 CC-4-V1 20.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-301 14.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CCY-3-O2 11.00% Δε [1 kHz, 20° C.]: −3.1 CCP-3-1 2.00% K.sub.1 [pN, 20° C.]: 14.0 CPY-3-O2 11.50% K.sub.3 [pN, 20° C.]: 15.7 CY-3-O2 15.00% V.sub.0 [V, 20° C.]: 2.38 CY-3-O4 4.50% γ.sub.1 [mPa s, 20° C.]: 102 PP-1-2V1 3.00% LTS bulk [h, −20° C.]: >1000 h PYP-2-3 8.00% LTS bulk [h, −30° C.]: >1000 h

Example M360

[0691]

TABLE-US-00277 B(S)-2O-O5 4.00% Clearing point [° C.]: 74 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1039 CC-4-V1 22.00% ε.sub.∥ [1 kHz, 20° C.]: 3.4 CCH-24 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.5 CCH-25 5.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O2 8.50% K.sub.1 [pN, 20° C.]: 14.2 CPY-3-O2 12.00% K.sub.3 [pN, 20° C.]: 14.2 CY-3-O2 15.00% V.sub.0 [V, 20° C.]: 2.26 CY-3-O4 6.50% γ.sub.1 [mPa s, 20° C.]: 98 PYP-2-3 11.00% LTS bulk [h, −20° C.]: >1000 h

Example M361

[0692]

TABLE-US-00278 B(S)-2O-O4 5.00% Clearing point [° C.]: 74 B(S)-2O-O5 5.00% Δn [589 nm, 20° C.]: 0.1348 CC-3-V1 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CC-4-V1 22.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CCP-3-1 7.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O2 8.00% K.sub.1 [pN, 20° C.]: 17.1 CCY-5-O2 4.00% K.sub.3 [pN, 20° C.]: 17.9 CY-3-O2 7.50% V.sub.0 [V, 20° C.]: 2.55 PP-1-2V1 14.00% γ.sub.1 [mPa s, 20° C.]: 104 PY-1-O2 9.50% LTS bulk [h, −20° C.]: >1000 h PYP-2-3 10.00%

Example M362

[0693]

TABLE-US-00279 CC-3-V1 9.00% Clearing point [° C.]: 74.5 CC-4-V1 6.00% Δn [589 nm, 20° C.]: 0.0805 CCH-301 10.00% ε.sub.∥ [1 kHz, 20° C.]: 3.4 CCH-303 7.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.4 CCH-34 5.00% Δε [1 kHz, 20° C.]: −3.0 CCH-35 5.5% K.sub.1 [pN, 20° C.]: 14.0 CCY-3-1 4.00% K.sub.3 [pN, 20° C.]: 15.8 CCY-3-O1 7.00% V.sub.0 [V, 20° C.]: 2.43 CCY-3-O2 15.00% γ.sub.1 [mPa s, 20° C.]: 99 CPY-2-O2 4.50% LTS bulk [h, −20° C.]: >1000 h CPY-3-O2 2.50% CY-3-O2 15.50% CY-3-O4 1.50% PCH-301 6.50% PY-3-O2 1.00%

Example M363

[0694] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M362 is mixed with 0.3% of the polymerisable compound of the formula

##STR00515##

and 0.001% of Irganox 1076.

Example M364

[0695] Zur Herstellung einer SA-VA (self-alignment-VA)-Mischung, the mixture according to Example M362 is mixed with 0.3% of the polymerisable compound of the formula

##STR00516##

0.001% of Irganox 1076 and

[0696] 0.6% of the compound of the formula

##STR00517##

Example M365

[0697]

TABLE-US-00280 B(S)-2O-O5 4.00% Clearing point [° C.]: 74.5 CC-3-V1 4.00% Δn [589 nm, 20° C.]: 0.0905 CC-4-V1 12.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-301 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCH-34 9.00% Δε [1 kHz, 20° C.]: −3.2 CCH-35 8.00% K.sub.1 [pN, 20° C.]: 14.9 CCP-3-1 8.00% K.sub.3 [pN, 20° C.]: 16.2 CCY-3-O2 11.00% V.sub.0 [V, 20° C.]: 2.37 CCY-5-O2 8.50% γ.sub.1 [mPa s, 20° C.]: 96 CY-3-O2 15.00% LTS bulk [h, −20° C.]: >1000 h PCH-301 5.00% LTS bulk [h, −25° C.]: >1000 h PY-1-O2 10.50%

Example M366

[0698] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M365 is mixed with 0.25% of the polymerisable compound of the formula

##STR00518##

Example M367

[0699] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M365 is mixed with 0.25% of the polymerisable compound of the formula

##STR00519##

Example M368

[0700]

TABLE-US-00281 B(S)-2O-O4 2.00% Clearing point [° C.]: 75.1 B(S)-2O-O5 3.00% Δn [589 nm, 20° C.]: 0.1037 BCH-32 4.50% ε.sub.∥ [1 kHz, 20° C.]: 3.4 CC-3-V1 7.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.3 CC-4-V1 16.00% Δε [1 kHz, 20° C.]: −3.0 CCH-301 0.50% K.sub.1 [pN, 20° C.]: 15.4 CCH-303 2.00% K.sub.3 [pN, 20° C.]: 15.9 CCH-34 5.00% V.sub.0 [V, 20° C.]: 2.44 CCH-35 7.00% CCY-3-O2 6.50% CPY-2-O2 6.00% CPY-3-O2 10.00% CY-3-O2 15.00% CY-3-O4 4.50% PCH-302 6.50% PP-1-2V1 4.50%

Example M369

[0701] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M368 is mixed with 0.3% of the polymerisable compound of the formula

##STR00520##

and 0.001% of Irganox 1076.

Example M370

[0702]

TABLE-US-00282 B(S)-2O-O4 5.00% Clearing point [° C.]: 74 B(S)-2O-O5 5.00% Δn [589 nm, 20° C.]: 0.1353 CC-3-V1 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-4-V1 22.50% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCP-3-1 7.50% Δε [1 kHz, 20° C.]: −3.4 CCY-3-O2 8.00% K.sub.1 [pN, 20° C.]: 16.9 CCY-5-O2 4.00% K.sub.3 [pN, 20° C.]: 17.7 CY-3-O2 4.50% V.sub.0 [V, 20° C.]: 2.42 PP-1-2V1 10.50% γ.sub.1 [mPa s, 20° C.]: 110 PY-1-O2 15.00% PYP-2-3 10.00%

Example M371

[0703] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M370 is mixed with 0.3% of the polymerisable compound of the formula

##STR00521##

Example M372

[0704]

TABLE-US-00283 B(S)-2O-O4 3.50% Clearing point [° C.]: 74.5 B(S)-2O-O5 4.50% Δn [589 nm, 20° C.]: 0.1031 BCH-32 4.00% ε.sub.∥ [1 kHz, 20° C.]: 3.4 CC-3-V1 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.4 CC-4-V1 16.50% Δε [1 kHz, 20° C.]: −3.0 CCH-301 12.50% K.sub.1 [pN, 20° C.]: 15.4 CCH-303 1.50% K.sub.3 [pN, 20° C.]: 15.8 CCH-34 4.00% V.sub.0 [V, 20° C.]: 2.45 CCH-35 5.00% γ.sub.1 [mPa s, 20° C.]: 97 CCY-3-O2 10.00% CPY-3-O2 11.50% CY-3-O2 14.00% PP-1-2V1 8.00%

Example M373

[0705] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M372 is mixed with 0.3% of the polymerisable compound of the formula

##STR00522##

and 0.001% of Irganox 1076.

Example M374

[0706]

TABLE-US-00284 CC-3-V1 8.50% Clearing point [° C.]: 74 CC-4-V1 14.00% Δn [589 nm, 20° C.]: 0.1088 CCH-23 9.50% ε.sub.∥ [1 kHz, 20° C.]: 3.4 CCP-3-1 9.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.2 CCY-3-O1 6.00% Δε [1 kHz, 20° C.]: −2.8 CCY-3-O2 8.00% K.sub.1 [pN, 20° C.]: 15.5 CCY-5-O2 8.00% K.sub.3 [pN, 20° C.]: 17.6 CY-3-O2 10.00% V.sub.0 [V, 20° C.]: 2.67 PP-1-2V1 9.00% γ.sub.1 [mPa s, 20° C.]: 104 PY-1-O2 15.00% PYP-2-3 3.00%

Example M375

[0707] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M372 is mixed with 0.3% of the polymerisable compound of the formula

##STR00523##

Example M376

[0708] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M362 is mixed with 0.3% of the polymerisable compound of the formula

##STR00524##

and 0.001% of Irganox 1076.

Example M377

[0709] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M242 is mixed with 0.3% of the polymerisable compound of the formula

##STR00525##

and 0.001% of Irganox 1076.

Example M378

[0710] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M361 is mixed with 0.3% of the polymerisable compound of the formula

##STR00526##

Example M379

[0711]

TABLE-US-00285 CCP-3-1 10.00% Clearing point [° C.]: 78.8 CCY-2-1 1.50% Δn [589 nm, 20° C.]: 0.1017 CCY-3-O2 8.50% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCY-4-O2 9.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CPY-3-O2 9.50% Δε [1 kHz, 20° C.]: −3.4 PYP-2-3 10.00% K.sub.1 [pN, 20° C.]: 15.0 B(S)-2O-O5 4.00% K.sub.3 [pN, 20° C.]: 14.9 CC-3-V1 6.00% V.sub.0 [V, 20° C.]: 2.20 CC-4-V1 5.00% γ.sub.1 [mPa s, 20° C.]: 110 CCH-23 18.00% CCH-35 4.00% CY-3-O2 5.00% Y-4O-O4 9.50%

Example M380

[0712] The mixture according to Example M379 is stabilised with 0.04% of the compound of the formula

##STR00527##

Example M381

[0713] The mixture according to Example M379 is stabilised with 0.04% of the compound of the formula

##STR00528##

and
0.03% of the compound of the formula

##STR00529##

Example M382

[0714]

TABLE-US-00286 B(S)-2O-O5 4.00% Clearing point [° C.]: 79.9 CCP-V-1 6.50% Δn [589 nm, 20° C.]: 0.1019 CCY-3-O2 10.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCY-3-O3 9.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.1 CLY-2-O4 2.00% Δε [1 kHz, 20° C.]: −3.4 CPY-3-O2 10.00% K.sub.1 [pN, 20° C.]: 15.1 PYP-2-3 9.50% K.sub.3 [pN, 20° C.]: 14.7 CC-3-V1 8.00% V.sub.0 [V, 20° C.]: 2.18 CC-4-V1 5.00% γ.sub.1 [mPa s, 20° C.]: 109 CCH-23 18.00% CCH-35 5.00% CY-3-O2 5.00% Y-4O-O4 8.00%

Example M383

[0715] The mixture according to Example M379 is stabilised with 0.04% of the compound of the formula

##STR00530##

and
0.03% of the compound of the formula

##STR00531##

Example M384

[0716]

TABLE-US-00287 BCH-32 5.00% Clearing point [° C.]: 74.5 CC-3-V1 6.00% Δn [589 nm, 20° C.]: 0.1024 CC-4-V1 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.7 CCH-301 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.0 CCH-34 6.50% Δε [1 kHz, 20° C.]: −3.3 CCP-3-1 8.00% K.sub.1 [pN, 20° C.]: 13.5 CCY-3-O1 8.00% K.sub.3 [pN, 20° C.]: 16.5 CCY-3-O2 11.50% V.sub.0 [V, 20° C.]: 2.33 CPY-3-O2 5.50% γ.sub.1 [mPa s, 20° C.]: 114 CY-3-O2 15.00% PCH-302 7.50% PY-1-O2 3.00% PY-2-O2 11.00%

Example M385

[0717] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M384 is mixed with 0.25% of the polymerisable compound of the formula

##STR00532##

and 0.01% of the compound of the formula

##STR00533##

Example M386

[0718] The mixture according to Example M384 is stabilised with 0.01% of the compound of the formula

##STR00534##

Example M387

[0719]

TABLE-US-00288 CCP-V-1 5.00% Clearing point [° C.]: 94.7 CCP-V2-1 5.00% Δn [589 nm, 20° C.]: 0.1017 CCY-3-O2 10.00% Δε [1 kHz, 20° C.]: −3.8 CCY-3-O3 3.00% K.sub.1 [pN, 20° C.]: 19.5 CCY-4-O2 8.00% K.sub.3 [pN, 20° C.]: 16.8 CLY-3-O3 7.00% V.sub.0 [V, 20° C.]: 2.22 PYP-2-3 4.50% γ.sub.1 [mPa s, 20° C.]: 123 B(S)-2O-O4 3.50% B(S)-2O-O5 6.00% B(S)-2O-O6 4.00% CC-3-V1 8.00% CC-4-V1 16.00% CCH-23 15.00% Y-4O-O4 5.00%

Example M388

[0720]

TABLE-US-00289 CCP-3-1 10.00% Clearing point [° C.]: 91.7 CCP-3-3 3.50% Δn [589 nm, 20° C.]: 0.1023 CCY-3-O2 11.00% Δε [1 kHz, 20° C.]: −3.8 CCY-3-O3 4.50% K.sub.1 [pN, 20° C.]: 19.2 CCY-4-O2 4.00% K.sub.3 [pN, 20° C.]: 17.0 CLY-2-O4 1.50% V.sub.0 [V, 20° C.]: 2.22 CLY-3-O3 4.50% γ.sub.1 [mPa s, 20° C.]: 125 PYP-2-3 5.00% B(S)-2O-O4 4.00% B(S)-2O-O5 5.00% B(S)-2O-O6 4.00% CC-3-V1 8.00% CC-4-V1 14.00% CCH-23 14.00% Y-4O-O4 7.00%

Example M389

[0721]

TABLE-US-00290 B(S)-2O-O5 0.25% Clearing point [° C.]: 75.1 BCH-32 1.50% Δn [589 nm, 20° C.]: 0.1038 CC-3-V1 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.4 CC-4-V1 20.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.5 CCH-303 1.50% Δε [1 kHz, 20° C.]: −3.0 CCH-34 6.00% K.sub.1 [pN, 20° C.]: 15.6 CCH-35 8.00% K.sub.3 [pN, 20° C.]: 16.0 CCY-3-O2 9.50% V.sub.0 [V, 20° C.]: 2.44 CPY-2-O2 6.00% γ.sub.1 [mPa s, 20° C.]: 99 CPY-3-O2 11.00% CY-3-O2 12.50% PP-1-2V1 2.75% PY-1-O2 5.50% PY-2-O2 4.50% PY-3-O2 3.00%

Example M390

[0722] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M389 is mixed with 0.3% of the polymerisable compound of the formula

##STR00535##

and 0.001% of Irganox 1076.

Example M391

[0723] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M389 is mixed with 0.35% of the polymerisable compound of the formula

##STR00536##

Example M392

[0724] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M389 is mixed with 0.3% of the polymerisable compound of the formula

##STR00537##

Example M393

[0725]

TABLE-US-00291 CC-3-V1 4.00% Clearing point [° C.]: 74.7 CC-4-V1 7.00% Δn [589 nm, 20° C.]: 0.0808 CCH-3O3 5.50% ε.sub.∥ [1 kHz, 20° C.]: 3.4 CCH-34 8.50% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CCH-35 9.00% Δε [1 kHz, 20° C.]: −3.2 CCP-3-1 3.50% K.sub.1 [pN, 20° C.]: 14.3 CCY-3-1 8.00% K.sub.3 [pN, 20° C.]: 16.4 CCY-3-O2 11.00% V.sub.0 [V, 20° C.]: 2.38 CCY-5-O2 9.00% γ.sub.1 [mPa s, 20° C.]: 116 CY-3-O2 15.00% CY-3-O4 2.00% CY-5-O2 9.00% PCH-301 5.00% PY-1-O2 3.50%

Example M394

[0726] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M393 is mixed with 0.25% of the polymerisable compound of the formula

##STR00538##

Example M395

[0727]

TABLE-US-00292 B(S)-2O-O5 2.00% Clearing point [° C.]: 74.3 CC-3-V1 4.00% Δn [589 nm, 20° C.]: 0.0850 CC-4-V1 13.50% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-301 2.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCH-303 4.50% Δε [1 kHz, 20° C.]: −3.2 CCH-34 5.50% K.sub.1 [pN, 20° C.]: 14.3 CCH-35 9.00% K.sub.3 [pN, 20° C.]: 16.3 CCP-3-1 5.00% V.sub.0 [V, 20° C.]: 2.37 CCY-3-O1 2.50% γ.sub.1 [mPa s, 20° C.]: 107 CCY-3-O2 11.00% CCY-5-O2 9.00% CY-3-O2 15.00% CY-5-O2 5.00% PCH-301 5.00% PY-1-O2 7.00%

Example M396

[0728] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M395 is mixed with 0.25% of the polymerisable compound of the formula

##STR00539##

Example M397

[0729] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M395 is mixed with 0.25% of the polymerisable compound of the formula

##STR00540##

Example M398

[0730] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M395 is mixed with 0.25% of the polymerisable compound of the formula

##STR00541##

Example M399

[0731]

TABLE-US-00293 CC-3-V1 4.00% Clearing point [° C.]: 74.6 CC-4-V1 11.00% Δn [589 nm, 20° C.]: 0.0895 CCH-303 3.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-34 9.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCH-35 8.50% Δε [1 kHz, 20° C.]: −3.2 CCP-3-1 6.00% K.sub.1 [pN, 20° C.]: 14.3 CCY-3-O1 4.00% K.sub.3 [pN, 20° C.]: 16.4 CCY-3-O2 11.00% V.sub.0 [V, 20° C.]: 2.37 CCY-5-O2 9.50% γ.sub.1 [mPa s, 20° C.]: 108 CY-3-O2 15.00% PCH-301 5.00% PY-1-O2 10.00% PY-2-O2 4.00%

Example M400

[0732] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M399 is mixed with 0.25% of the polymerisable compound of the formula

##STR00542##

Example M401

[0733] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M399 is mixed with 0.25% of the polymerisable compound of the formula

##STR00543##

Example M402

[0734] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M399 is mixed with 0.25% of the polymerisable compound of the formula

##STR00544##

Example M403

[0735] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M399 is mixed with 0.3% of the polymerisable compound of the formula

##STR00545##

Example M404

[0736] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M399 is mixed with 0.3% of the polymerisable compound of the formula

##STR00546##

Example M405

[0737]

TABLE-US-00294 CCP-V-1 12.00% Clearing point [° C.]: 94.7 CCP-V2-1 7.00% Δn [589 nm, 20° C.]: 0.1024 CCY-3-O2 6.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CLY-2-O4 7.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.3 CLY-3-O3 6.50% Δε [1 kHz, 20° C.]: −3.8 CLY-4-O2 5.00% K.sub.1 [pN, 20° C.]: 18.5 PGIY-2-O4 1.50% K.sub.3 [pN, 20° C.]: 17.0 B(S)-2O-O4 4.00% V.sub.0 [V, 20° C.]: 2.21 B(S)-2O-O5 4.00% γ.sub.1 [mPa s, 20° C.]: 125 B(S)-2O-O6 4.00% CC-3-V1 7.00% CC-4-V1 12.00% CCH-23 13.00% CY-3-O2 8.00% Y-4O-O4 3.00%

Example M406

[0738]

TABLE-US-00295 B(S)-2O-O5 4.00% Clearing point [° C.]: 74.5 CC-3-V1 6.00% Δn [589 nm, 20° C.]: 0.0981 CC-4-V1 14.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-34 8.50% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CCP-3-1 7.50% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O1 8.00% K.sub.1 [pN, 20° C.]: 13.4 CCY-3-O2 10.50% K.sub.3 [pN, 20° C.]: 16.5 CLY-3-O2 1.00% V.sub.0 [V, 20° C.]: 2.38 CPY-3-O2 4.50% γ.sub.1 [mPa s, 20° C.]: 103 CY-3-O2 11.50% PCH-301 15.00% PY-1-O2 8.00% PY-2-O2 1.50%

Example M407

[0739] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M406 is mixed with 0.3% of the polymerisable compound of the formula

##STR00547##

Example M408

[0740] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M406 is mixed with 0.35% of the polymerisable compound of the formula

##STR00548##

Example M409

[0741] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M406 is mixed with 0.35% of the polymerisable compound of the formula

##STR00549##

Example M410

[0742] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M406 is mixed with 0.35% of the polymerisable compound of the formula

##STR00550##

Example M411

[0743] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M406 is mixed with 0.35% of the polymerisable compound of the formula

##STR00551##

Example M412

[0744]

TABLE-US-00296 B(S)-2O-O5 4.00% Clearing point [° C.]: 74.3 CC-3-V1 6.00% Δn [589 nm, 20° C.]: 0.0984 CC-4-V1 14.00% ε.sub.∥ [1 kHz, 20° C.]: 3.5 CCH-34 8.50% ε.sub.⊥ [1 kHz, 20° C.]: 6.6 CCH-35 2.00% Δε [1 kHz, 20° C.]: −3.1 CCP-3-1 7.00% K.sub.1 [pN, 20° C.]: 13.4 CCY-3-O2 8.00% K.sub.3 [pN, 20° C.]: 16.3 CCY-4-O2 6.00% V.sub.0 [V, 20° C.]: 2.41 CLY-3-O2 1.00% γ.sub.1 [mPa s, 20° C.]: 102 CPY-3-O2 8.00% CY-3-O2 12.50% PCH-301 14.50% PY-1-O2 8.50%

Example M413

[0745] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M412 is mixed with 0.35% of the polymerisable compound of the formula

##STR00552##

Example M414

[0746] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M412 is mixed with 0.35% of the polymerisable compound of the formula

##STR00553##

Example M415

[0747] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M412 is mixed with 0.35% of the polymerisable compound of the formula

##STR00554##

Example M416

[0748] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M412 is mixed with 0.35% of the polymerisable compound of the formula

##STR00555##

Example M417

[0749] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M412 is mixed with 0.35% of the polymerisable compound of the formula

##STR00556##

Example M418

[0750] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M231 is mixed with 0.3% of the polymerisable compound of the formula

##STR00557##

Example M419

[0751] For the preparation of an SA-VA mixture, the mixture according to Example M418 is mixed with 0.4% of the compound of the formula

##STR00558##

Example M420

[0752] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M232 is mixed with 0.3% of the polymerisable compound of the formula

##STR00559##

Example M421

[0753]

TABLE-US-00297 CCY-3-O2 9.50% Clearing point [° C.]: 74.9 CPY-2-O2 11.00% Δn [589 nm, 20° C.]: 0.1081 CPY-3-O2 10.50% ε.sub.∥ [1 kHz, 20° C.]: 3.7 B-2O-O5 1.50% ε.sub.⊥ [1 kHz, 20° C.]: 7.5 CC-3-V1 8.00% Δε [1 kHz, 20° C.]: −3.8 CC-4-V1 17.00% K.sub.1 [pN, 20° C.]: 14.4 CCH-34 5.50% K.sub.3 [pN, 20° C.]: 15.2 CCH-35 8.00% V.sub.0 [V, 20° C.]: 2.11 CY-3-O2 11.00% γ.sub.1 [mPa s, 20° C.]: 92 PY-1-O2 6.00% PY-3-O2 12.00%

Example M422

[0754] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M421 is mixed with 0.3% of the polymerisable compound of the formula

##STR00560##

Example M423

[0755] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M237 is mixed with 0.3% of the polymerisable compound of the formula

##STR00561##

Example M424

[0756] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M237 is mixed with 0.3% of the polymerisable compound of the formula

##STR00562##

Example M425

[0757] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M233 is mixed with 0.3% of the polymerisable compound of the formula

##STR00563##

Example M426

[0758] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M240 is mixed with 0.3% of the polymerisable compound of the formula

##STR00564##

Example M427

[0759]

TABLE-US-00298 B-2O-O5 4.00% Clearing point [° C.]: 75.1 CC-3-V1 8.00% Δn [589 nm, 20° C.]: 0.1117 CC-4-V1 16.00% Δε [1 kHz, 20° C.]: −4.1 CCH-34 8.00% K.sub.1 [pN, 20° C.]: 15.3 CCH-35 6.00% K.sub.3 [pN, 20° C.]: 15.9 CCY-3-O2 11.00% V.sub.0 [V, 20° C.]: 2.05 CPY-2-O2 9.00% γ.sub.1 [mPa s, 20° C.]: 120 CPY-3-O2 10.00% CY-3-O2 11.00% PPGU-3-F 0.50% PY-1-O2 6.00% PY-3-O2 10.50%

Example M428

[0760] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M427 is mixed with 0.3% of the polymerisable compound of the formula

##STR00565##

Example M429

[0761] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M427 is mixed with 0.3% of the polymerisable compound of the formula

##STR00566##

Example M430

[0762] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M427 is mixed with 0.3% of the polymerisable compound of the formula

##STR00567##

Example M431

[0763] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M427 is mixed with 0.3% of the polymerisable compound of the formula

##STR00568##

Example M432

[0764] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M427 is mixed with 0.3% of the polymerisable compound of the formula

##STR00569##

Example M433

[0765]

TABLE-US-00299 B(S)-2O-O4 4.00% Clearing point [° C.]: 74.1 B(S)-2O-O5 5.00% Δn [589 nm, 20° C.]: 0.1191 BCH-32 7.50% ε.sub.∥ [1 kHz, 20° C.]: 3.8 CC-3-V1 8.00% ε.sub.⊥ [1 kHz, 20° C.]: 7.7 CC-4-V1 11.00% Δε [1 kHz, 20° C.]: −4.0 CCH-34 8.00% K.sub.1 [pN, 20° C.]: 14.5 CCH-35 6.00% K.sub.3 [pN, 20° C.]: 14.8 CCY-3-O2 11.00% V.sub.0 [V, 20° C.]: 2.11 CPY-2-O2 1.00% γ.sub.1 [mPa s, 20° C.]: 111 CPY-3-O2 8.00% CY-3-O2 5.00% PCH-302 5.00% PY-1-O2 6.50% PY-2-O2 7.00% PY-3-O2 7.00%

Example M434

[0766] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M433 is mixed with 0.3% of the polymerisable compound of the formula

##STR00570##

Example M435

[0767] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M433 is mixed with 0.3% of the polymerisable compound of the formula

##STR00571##

Example M436

[0768] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M421 is mixed with 0.3% of the polymerisable compound of the formula

##STR00572##

Example M437

[0769]

TABLE-US-00300 BCH-32 6.00% Clearing point [° C.]: 74.2 CCY-3-O1 5.00% Δn [589 nm, 20° C.]: 0.1188 CCY-3-O2 11.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CPY-3-O2 12.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CC-3-V1 7.50% Δε [1 kHz, 20° C.]: −3.3 CC-4-V1 17.00% K.sub.1 [pN, 20° C.]: 14.9 CCH-34 9.00% K.sub.3 [pN, 20° C.]: 15.6 CY-3-O2 2.00% V.sub.0 [V, 20° C.]: 2.29 PP-1-4 4.00% γ.sub.1 [mPa s, 20° C.]: 109 PY-1-O2 8.00% PY-2-O2 6.00% PY-3-O2 12.50%

Example M438

[0770] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M437 is mixed with 0.3% of the polymerisable compound of the formula

##STR00573##

Example M439

[0771] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M437 is mixed with 0.35% of the polymerisable compound of the formula

##STR00574##

Example M440

[0772] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M437 is mixed with 0.35% of the polymerisable compound of the formula

##STR00575##

Example M441

[0773] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M437 is mixed with 0.35% of the polymerisable compound of the formula

##STR00576##

Example M442

[0774] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M437 is mixed with 0.3% of the polymerisable compound of the formula

##STR00577##

Example M443

[0775] The following stabilisers are added to the mixture according to Example M437:

0.04% o

##STR00578##

0.01% of

##STR00579##

Example M444

[0776] The following stabilisers are added to the mixture according to Example M382:

0.03% of

##STR00580##

0.1% of

##STR00581##

Example M445

[0777] The following stabiliser is added to the mixture according to Example M382:

0.04% of

##STR00582##

Example M446

[0778] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M14 is mixed with 0.3% of the polymerisable compound of the formula

##STR00583##

and 0.001% of Irganox 1076.

Example M447

[0779] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M14 is mixed with 0.3% of the polymerisable compound of the formula

##STR00584##

and 0.001% of Irganox 1076.

Example M448

[0780] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M14 is mixed with 0.3% of the polymerisable compound of the formula

##STR00585##

Example M449

[0781] The following stabiliser is added to the mixture according to Example M14:

0.03% of

##STR00586##

Example M450

[0782]

TABLE-US-00301 CC-3-V 10.50% Clearing point [° C.]: 74.5 CC-3-V1 5.50% Δn [589 nm, 20° C.]: 0.1033 CC-4-V1 20.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-34 2.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 CCH-35 1.50% Δε [1 kHz, 20° C.]: −3.3 CCY-3-1 2.00% K.sub.1 [pN, 20° C.]: 14.4 CCY-3-O1 7.50% K.sub.3 [pN, 20° C.]: 15.1 CCY-3-O2 11.00% CCY-4-O2 8.50% CLY-2-O4 1.00% CLY-3-O2 2.00% PP-1-2V1 3.50% PY-1-O2 9.50% PY-2-O2 9.50% PY-3-O2 6.00%

Example M451

[0783] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M450 is mixed with 0.3% of the polymerisable compound of the formula

##STR00587##

0.001% Irganox 1076 and

[0784] ##STR00588##

0.015%

Example M452

[0785] For the preparation of an SA-VA (self-alignment VA) mixture, the mixture according to Example M451 is mixed with 0.6% of the compound of the formula

##STR00589##

Example M453

[0786]

TABLE-US-00302 CC-3-V1 7.50% Clearing point [° C.]: 74.5 CC-4-V1 20.00% Δn [589 nm, 20° C.]: 0.1030 CCH-34 5.00% Δε [1 kHz, 20° C.]: −3.3 CCH-35 7.50% K.sub.1 [pN, 20° C.]: 15.1 CCP-3-1 2.00% K.sub.3 [pN, 20° C.]: 15.4 CCY-3-O1 8.00% CCY-3-O2 12.00% CCY-4-O2 3.00% CLY-3-O2 4.00% CY-3-O2 1.50% PY-1-O2 9.50% PY-2-O2 9.50% PY-3-O2 10.50%

Example M454

[0787] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M453 is mixed with 0.3% of the polymerisable compound of the formula

##STR00590##

0.001% Irganox 1076 and

[0788] 0.015%

##STR00591##

Example M455

[0789] For the preparation of an SA-VA (self-alignment VA) mixture, the mixture according to Example M454 is mixed with 0.6% of the compound of the formula

##STR00592##

Example M456

[0790]

TABLE-US-00303 CC-3-V1 8.00% Clearing point [° C.]: 75.3 CC-4-V1 15.50% CCH-23 10.00% CCP-3-1 9.50% CCY-3-O1 7.00% CCY-3-O2 8.00% CCY-5-O2 7.00% CY-3-O2 10.00% PP-1-2V1 7.00% PY-1-O2 15.00% PYP-2-3 3.00%

Example M457

[0791] The following stabiliser is added to the mixture according to Example M456:

0.015%

##STR00593##

Example M458

[0792] The following stabiliser is added to the mixture according to Example M456:

0.015%

##STR00594##

Example M459

[0793] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M456 is mixed with 0.3% of the polymerisable compound of the formula

##STR00595##

and
0.015%

##STR00596##

Example M460

[0794]

TABLE-US-00304 CC-3-V1 2.50% Clearing point [° C.]: 105.3 CC-4-V1 10.00% CCH-301 3.00% CCH-34 4.00% CCH-35 4.00% CCP-3-1 6.00% CCP-3-3 6.00% CCY-3-O1 4.00% CCY-3-O2 4.00% CCY-3-O3 4.00% CCY-4-O2 4.00% CCY-5-O2 4.00% CPY-2-O2 10.00% CPY-3-O2 10.00% CY-3-O2 6.50% CY-3-O4 10.00% PYP-2-3 5.00% PYP-2-4 3.00%

Example M461

[0795] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M460 is mixed with 0.3% of the polymerisable compound of the formula

##STR00597##

and
0.02%

##STR00598##

Example M462

[0796] The following stabiliser is added to the mixture according to Example M460:

0.02%

##STR00599##

Example M463

[0797] For the preparation of an SA-VA (self-alignment VA) mixture, the mixture according to Example M389 is mixed with 0.3% of the polymerisable compound of the formula

##STR00600##

0.001% Irganox 1076 and

[0798] 0.6% of the compound of the formula

##STR00601##

Example M464

[0799]

TABLE-US-00305 BCH-52 9.00% Clearing point [° C.]: 105 CC-3-V1 2.00% Δn [589 nm, 25° C.]: 0.1122 CC-4-V1 12.50% ε.sub.∥ [1 kHz, 25° C.]: 3.4 CCH-301 2.00% ε.sub.⊥ [1 kHz, 25° C.]: 6.8 CCH-34 3.50% Δε [1 kHz, 25° C.]: −3.4 CCH-35 4.00% K.sub.1 [pN, 25° C.]: 19.9 CCP-3-1 7.50% K.sub.3 [pN, 25° C.]: 17.7 CCY-3-O1 4.00% V.sub.0 [V, 20° C.]: 2.41 CCY-3-O2 4.00% γ.sub.1 [mPa s, 25° C.]: 153 CCY-3-O3 4.00% CCY-4-O2 4.00% CCY-5-O2 4.00% CPY-2-O2 10.00% CPY-3-O2 10.00% CY-3-O4 12.50% PY-1-O2 7.00%

Example M465

[0800] The following stabiliser is added to the mixture according to Example M464:

0.02%

##STR00602##

Example M466

[0801] For the preparation of an SA-VA (self-alignment VA) mixture, the mixture according to Example M389 is mixed with

0.3% of the polymerisable compound of the formula

##STR00603##

0.001% Irganox 1076 and

[0802] 0.6% of the compound of the formula

##STR00604##

Example M467

[0803] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M464 is mixed with 0.3% of the polymerisable compound of the formula

##STR00605##

and
0.02%

##STR00606##

Example M468

[0804]

TABLE-US-00306 B(S)-2O-O4 4.00% Clearing point [° C.]: 74.5 B(S)-2O-O5 4.00% Δn [589 nm, 20° C.]: 0.1257 B(S)-2O-O6 1.00% Δε [1 kHz, 20° C.]: −3.1 BCH-32 8.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-3-V1 6.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CC-4-V1 14.00% K.sub.1 [pN, 20° C.]: 14.8 CCH-34 5.00% K.sub.3 [pN, 20° C.]: 16.8 CCP-3-1 7.00% CCP-3-3 1.50% CLY-3-O2 3.00% CPY-3-O2 10.50% PCH-302 16.00% PY-1-O2 10.00% PY-2-O2 10.00%

Example M469

[0805] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M468 is mixed with 0.35% of the polymerisable compound of the formula

##STR00607##

0.001% Irganox 1076 and

[0806] 0.01%

##STR00608##

Example M470

[0807] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M468 is mixed with 0.3% of the polymerisable compound of the formula

##STR00609##

0.001% Irganox 1076 and

[0808] 0.01%

##STR00610##

Example M471

[0809] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M468 is mixed with 0.3% of the polymerisable compound of the formula

##STR00611##

0.001% Irganox 1076 and

[0810] 0.01%

##STR00612##

Example M472

[0811]

TABLE-US-00307 B(S)-2O-O5 5.00% Clearing point [° C.]: 73.7 CCP-3-1 9.00% Δn [589 nm, 20° C.]: 0.1120 CCY-3-O2 6.00% Δε [1 kHz, 20° C.]: −3.4 CLY-3-O2 1.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CPY-3-O2 7.50% ε.sub.⊥ [1 kHz, 20° C.]: 6.9 B(S)-2O-O4 4.00% K.sub.1 [pN, 20° C.]: 16.3 CC-3-V1 8.00% K.sub.3 [pN, 20° C.]: 16.2 CC-4-V1 15.50% CCH-34 8.00% CCH-35 7.50% PCH-302 5.00% PY-1-O2 8.00% PY-2-O2 8.00% PY-3-O2 7.50%

Example M473

[0812] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M472 is mixed with 0.3% of the polymerisable compound of the formula

##STR00613##

and
0.02%

##STR00614##

Example M474

[0813]

TABLE-US-00308 CC-3-V1 7.50% Clearing point [° C.]: 75 CC-4-V1 19.50% Δn [589 nm, 20° C.]: 0.1041 CCH-301 5.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CCH-34 5.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CCP-3-1 11.00% Δε [1 kHz, 20° C.]: −3.1 CLY-3-O2 5.00% K.sub.1 [pN, 20° C.]: 14.0 CPY-2-O2 6.00% K.sub.3 [pN, 20° C.]: 15.7 CPY-3-O2 11.50% V.sub.0 [V, 20° C.]: 2.37 CY-3-O2 15.00% γ.sub.1 [mPa s, 20° C.]: 101 PY-1-O2 6.50% PY-2-O2 7.50%

Example M475

[0814] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M474 is mixed with 0.3% of the polymerisable compound of the formula

##STR00615##

0.001% Irganox 1076 and

[0815] 0.015%

##STR00616##

Example M476

[0816]

TABLE-US-00309 B(S)-2O-O6 0.25% Clearing point [° C.]: 74.5 BCH-32 5.50% Δn [589 nm, 20° C.]: 0.1028 CC-3-V 10.00% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-3-V1 7.50% ε.sub.⊥ [1 kHz, 20° C.]: 6.7 CC-4-V1 16.50% Δε [1 kHz, 20° C.]: −3.1 CCH-35 0.25% K.sub.1 [pN, 20° C.]: 13.8 CCP-3-1 7.50% K.sub.3 [pN, 20° C.]: 15.5 CCY-3-O2 11.00% V.sub.0 [V, 20° C.]: 2.37 CCY-3-O3 1.00% γ.sub.1 [mPa s, 20° C.]: 96 CCY-4-O2 7.00% CCY-5-O2 2.00% CY-3-O2 9.00% PY-1-O2 9.00% PY-2-O2 9.00% PY-3-O2 4.50%

Example M477

[0817] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M476 is mixed with 0.3% of the polymerisable compound of the formula

##STR00617##

0.001% Irganox 1076 and

[0818] 0.015%

##STR00618##

Example M478

[0819] For the preparation of an SA-VA (self-alignment VA) mixture, the mixture according to Example M477 is mixed with 0.6% of the compound of the formula

##STR00619##

Example M479

[0820]

TABLE-US-00310 BCH-32 4.50% Clearing point [° C.]: 74.8 CC-3-V 15.00% Δn [589 nm, 20° C.]: 0.1030 CC-3-V1 7.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 CC-4-V1 12.50% ε.sub.⊥ [1 kHz, 20° C.]: 6.8 CCP-3-1 7.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O1 7.00% K.sub.1 [pN, 20° C.]: 13.8 CCY-3-O2 10.50% K.sub.3 [pN, 20° C.]: 15.4 CCY-4-O2 6.50% V.sub.0 [V, 20° C.]: 2.35 CY-3-O2 4.50% γ.sub.1 [mPa s, 20° C.]: 94 PY-1-O2 9.50% PY-2-O2 9.00% PY-3-O2 6.50%

Example M480

[0821] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M479 is mixed with 0.3% of the polymerisable compound of the formula

##STR00620##

0.001% Irganox 1076 and

[0822] 0.015%

##STR00621##

Example M481

[0823] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M479 is mixed with 0.3% of the polymerisable compound of the formula

##STR00622##

0.001% Irganox 1076 and

[0824] 0.015%

##STR00623##

Example M482

[0825] For the preparation of an SA-VA (self-alignment VA) mixture, the mixture according to Example M480 is mixed with 0.6% of the compound of the formula

##STR00624##

Example M483

[0826]

TABLE-US-00311 B(S)-2O-O4 4.00% Clearing point [° C.]: 74 B(S)-2O-O5 5.00% Δn [589 nm, 20° C.]: 0.1089 BCH-32 7.50% ε.sub.∥ [1 kHz, 20° C.]: 3.6 BCH-52 2.00% ε.sub.⊥ [1 kHz, 20° C.]: 6.5 CC-3-V1 7.50% Δε [1 kHz, 20° C.]: −3.0 CC-4-V1 18.00% K.sub.1 [pN, 20° C.]: 15.3 CCH-34 8.00% K.sub.3 [pN, 20° C.]: 13.9 CCH-35 7.00% V.sub.0 [V, 20° C.]: 2.29 CCH-301 2.00% γ.sub.1 [mPa s, 20° C.]: 75 CCP-3-1 3.00% CCY-3-O2 8.00% CPY-3-O2 3.00% CY-3-O2 4.00% PY-1-O2 6.00% PY-2-O2 3.00% PY-3-O2 12.00%

Example M484

[0827] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M483 is mixed with 0.3% of the polymerisable compound of the formula

##STR00625##

Example M485

[0828] For the preparation of a PS (polymer stabilised) mixture, for example for PS-VA, PS-IPS or PS-FFS displays, the mixture according to Example M483 is mixed with 0.3% of the polymerisable compound of the formula

##STR00626##

Example M486

[0829]

TABLE-US-00312 CC-3-V1  7.00% Clearing point [° C.]: 74.5 CC-3-V2 17.00% Δn [589 nm, 20° C.]: 0.0992 CCH-34  4.00% Δε [1 kHz, 20° C.]: −3.6 CCH-35  7.00% γ.sub.1 [mPa s, 20° C.]: 108 CCP-3-1  6.50% CCY-3-O2  6.00% CPY-2-O2  3.00% CPY-3-O2 11.00% CY-3-O2 15.50% CY-3-O4  7.00% PY-3-O2 11.00% [00627]  5.00%

Example M48Z

[0830]

TABLE-US-00313 CC-3-V1  7.00% Clearing point [° C.]: 74.5 CC-3-V2 17.00% Δn [589 nm, 20° C.]: 0.0988 CCH-34  4.00% Δε [1 kHz, 20° C.]: −3.6 CCH-35  7.00% γ.sub.1 [mPa s, 20° C.]: 112 CCP-3-1  6.50% CCY-3-O2 11.00% CPY-2-O2  3.00% CPY-3-O2  6.00% CY-3-O2 15.50% CY-3-O4  7.00% PY-3-O2 11.00% [00628]  5.00%

Example M488

[0831]

TABLE-US-00314 CC-3-V1  7.00% Clearing point [° C.]: 74.5 CC-3-V2 17.00% Δn [589 nm, 20° C.]: 0.989 CCH-34  4.00% Δε [1 kHz, 20° C.]: −3.6 CCH-35  7.00% γ.sub.1 [mPa s, 20° C.]: 111 CCP-3-1  6.50% CCY-3-O2 11.00% CPY-2-O2  3.00% CPY-3-O2 11.00% CY-3-O2 10.50% CY-3-O4  7.00% PY-3-O2 11.00% [00629]  5.00%

Example M489

[0832]

TABLE-US-00315 CC-3-V1  7.00% Clearing point [° C.]: 75 CC-3-V2 17.00% Δn [589 nm, 20° C.]: 0.0987 CCH-34  4.00% Δε [1 kHz, 20° C.]: −3.6 CCH-35  7.00% γ.sub.1 [mPa s, 20° C.]: 113 CCP-3-1  6.50% CCY-3-O2 11.00% CPY-2-O2  3.00% CPY-3-O2 11.00% CY-3-O2 15.50% CY-3-O4  7.00% PY-3-O2  6.00% [00630]  5.00%

Example M490

[0833]

TABLE-US-00316 CC-3-V1  7.00% Clearing point [° C.]: 74.5 CC-4-V1 18.00% Δn [589 nm, 20° C.]: 0.0995 CCH-34  3.00% Δε [1 kHz, 20° C.]: −3.4 CCH-35  7.00% γ.sub.1 [mPa s, 20° C.]: 114 CCP-3-1  9.00% CCY-3-O2  5.00% CPY-3-O2  9.50% CY-3-O2 15.50% CY-3-O4  7.50% PY-3-O2 11.50% PGIY-2-O4  2.00% [00631]  5.00%

Example M491

[0834]

TABLE-US-00317 CC-3-V1  7.00% Clearing point [° C.]: 74.5 CC-4-V1 18.00% Δn [589 nm, 20° C.]: 0.0993 CCH-34  3.00% Δε [1 kHz, 20° C.]: −3.4 CCH-35  7.00% γ.sub.1 [mPa s, 20° C.]: 115 CCP-3-1  9.00% CCY-3-O2 10.00% CPY-3-O2  4.50% CY-3-O2 15.50% CY-3-O4  7.50% PY-3-O2 11.50% PGIY-2-O4  2.00% [00632]  5.00%

Example M492

[0835]

TABLE-US-00318 CC-3-V1  7.00% Clearing point [° C.]: 74 CC-4-V1 18.00% Δn [589 nm, 20° C.]: 0.0996 CCH-34  3.00% Δε [1 kHz, 20° C.]: −3.4 CCH-35  7.00% γ.sub.1 [mPa s, 20° C.]: 113 CCP-3-1  9.00% CCY-3-O2 10.00% CPY-3-O2  9.50% CY-3-O2 10.50% CY-3-O4  7.50% PY-3-O2 11.50% PGIY-2-O4  2.00% [00633]  5.00%

Example M493

[0836]

TABLE-US-00319 CC-3-V1  7.00% Clearing point [° C.]: 75 CC-4-V1 18.00% Δn [589 nm, 20° C.]: 0.0994 CCH-34  3.00% Δε [1 kHz, 20° C.]: −3.4 CCH-35  7.00% γ.sub.1 [mPa s, 20° C.]: 115 CCP-3-1  9.00% CCY-3-O2 10.00% CPY-3-O2  9.50% CY-3-O2 15.50% CY-3-O4  7.50% PY-3-O2  6.50% PGIY-2-O4  2.00% [00634]  5.00%

[0837] Without further elaboration, it is believed that one skilled in the art can, using the preceding description, utilize the present invention to its fullest extent. The preceding preferred specific embodiments are, therefore, to be construed as merely illustrative, and not limitative of the remainder of the disclosure in any way whatsoever.

[0838] The entire disclosure[s] of all applications, patents and publications, cited herein and of corresponding German application No: DE102017 010883.8, filed Nov. 24, 2017, and European application No: EP18197753.9, filed Sep. 28, 2018, are incorporated by reference herein.

[0839] The preceding examples can be repeated with similar success by substituting the generically or specifically described reactants and/or operating conditions of this invention for those used in the preceding examples.

[0840] From the foregoing description, one skilled in the art can ascertain the essential characteristics of this invention and, without departing from the spirit and scope thereof, can make various changes and modifications of the invention to adapt it to various usages and conditions.