Method for applying a structured coating to a component

Abstract

For producing a structured coating, or for carefully lifting off a coating over a sensitive region, it is proposed that a release film be applied and structured under the coating in the region which is not to be coated. In a release step, the release film is reduced in the adhesion in the region which is not to be coated and is subsequently lifted off together with the coating applied over it.

Claims

1. A method for applying a structured coating to a structural element with a surface having a coating region and an uncoated region, comprising: a. wherein a release film is applied to the coating region of the structural element and is at least partially fixed inside the uncoated region, b. wherein the release film is removed from the coating region, c. wherein a coating is applied over the entire area over the release film and the surface of the structural element, d. wherein the coating is severed circumferentially around the coating region along a second partition line, e. wherein the adhesion of the release film is reduced at least in the region enclosed by the second partition line, f. wherein the release film together with the coating applied over the release film is lifted off in the uncoated region.

2. The method according to claim 1, wherein a UV release tape or a thermal release tape is used as the release film and the adhesion of the release film is reduced in method step e) by means of UV light, laser, or by thermal action.

3. The method according to claim 1, wherein the structural element is part of an assembly having one or more MEMS or chip components that are arranged on a carrier, wherein the structural element represents one of MEMS or chip components, wherein the release film is applied over the entire area over the assembly as the coating so that the release film either seals off each of the MEMS or chip components or the components as a whole as an assembly from the carrier, wherein a media access to the MEMS component is provided in the uncoated region.

4. The method according to claim 3, wherein in method step a), the release film is applied to a MEMS wafer, in which a plurality of MEMS components are processed in parallel, wherein method step b) is then carried out, wherein the MEMS components are singulated, wherein subsequently the assembly is equipped with at least one of the MEMS components and at least one chip component, wherein subsequently method steps c) to f) are carried out.

5. The method according to claim 1, wherein in method step b), incisions are created in the release film along a first partition line around the uncoated region and the release film is removed in the coating region outside the region enclosed by the first partition line, wherein then the coating is applied, wherein the adhesion of the release film is first reduced thermally or by the action of UV radiation in the entire uncoated region in method step e) and then second incisions are created in the coating in method step d) along the second partition line.

6. The method according to claim 1, wherein the structural element is a MEMS microphone, which is mounted alone or in an assembly on a carrier, wherein, in method step f), a recess is exposed above a microphone membrane in the microphone in the uncoated region, wherein a cover is fastened on the carrier over the MEMS microphone or the assembly so that a cavity which accommodates the MEMS microphone or the assembly is enclosed and sealed off under the cover, wherein for this purpose either a flat carrier is used and a cap is applied thereon as a cover, or wherein a trough-shaped carrier is used and a flat cover is applied over it, wherein a sound opening is provided in the cover or the carrier.

7. The method according to claim 6, wherein a volume above the microphone membrane is sealed off from a volume below the membrane using the coating, wherein the volume over the membrane comprises the remaining cavity above the coating and under the cover, wherein the volume below the coating and below the microphone membrane comprises at least one intermediate space that is sealed by the coating to the carrier between MEMS and/or chip components.

8. The method according to claim 6, wherein, in method step c), a film which can be deep drawn is applied over the assembly as the coating.

9. The method according to claim 3, wherein, in method steps b) and f), the release film is not removed in a bridge region above the intermediate space between two components of the assembly, wherein, during and after method step c), the release film remaining in the bridge region supports the coating above the intermediate space.

10. The method according to claim 3, wherein a thermal release tape is used as the release film after the mounting of the components on the carrier, wherein, in method step e), the adhesion of the entire remaining release film is reduced by thermal action, wherein the lifting off of the release film together with coating applied over the release film in the uncoated region is achieved by blowing off, suctioning off, or by drawing off using an adhesive film.

11. The method according to claim 3, wherein, in method step c), a film which can be deep drawn and thermally cured is applied over the assembly as the coating.

12. The method according to claim 6, wherein the coating on the carrier is removed except for an edge region that is adjacent to the assembly and completely encloses the assembly, wherein the coating terminates closely with the carrier in the entire edge region, wherein the cap is placed on the region of the carrier free from the coating and is glued to the carrier.

13. The method according to claim 6, wherein the MEMS microphone is mounted according to flip-chip technology on the carrier, wherein the sound opening in the cap is provided above an intermediate space between two components, wherein, between the cap and the coating over the assembly, a seal is used to seal around the sound opening from the inside with the cap, wherein an opening is provided in the seal below the sound opening, wherein the opening is extended through the coating into the intermediate space, so that a continuous sound channel is opened through the sound opening, the seal, and the coating into the intermediate space down to below the MEMS component.

14. The method according to claim 13, wherein the seal is applied as a viscous compound through the sound opening after the placement of the cap and is subsequently cured.

15. The method according to claim 13, wherein the seal is arranged above the intermediate space before the placement of the cap on the coating.

16. The method according to claim 15, wherein a sealing ring made of elastic material is arranged on the coating above the intermediate space as the seal.

17. The method according to claim 13, wherein the seal is applied as a viscous compound that is elastic in the cured state, the seal being applied into the intermediate space between coating and the cap in the region of the sound opening so that the seal solidly closes the sound opening and seals the edges thereof from the coating, wherein the opening in the seal and in the coating is subsequently created by laser drilling.

18. A method of applying a coating to a structural element having a coating region and an uncoated region, comprising: applying a release film to the coating region and at least partially within the uncoated region; removing the release film from the coating region such that the release film remains in the uncoated region; applying the coating over the structural element in the coating region and the uncoated region; severing the coating circumferentially around the coating region along a partition line between the coating region and the uncoated region; reducing an adhesion of the release film within the uncoated region; and after the reducing, removing the release film together with the coating applied over the release film from the uncoated region.

19. The method according to claim 18, wherein the structural element is a MEMS component that is part of an assembly arranged on a carrier, and wherein the applying the release film includes sealing off a recess region of the MEMS component on the carrier with the release film, the recess region being the uncoated region.

20. The method according to claim 18, wherein the release film is a UV-release tape or a thermal-release tape and the reducing the adhesion of the release film is accomplished by exposing the release film to UV light, a laser, or thermal action.

Description

(1) The invention is explained in greater detail hereafter on the basis of exemplary embodiments and the associated figures. The figures are only schematic and are not shown to scale, so that neither absolute or relative dimension specifications can be inferred therefrom. Individual parts can be shown enlarged.

(2) FIGS. 1 to 8 show a simple exemplary embodiment of different method steps during the production of a structured coating.

(3) FIGS. 9a to 9k show various method steps during the production of the coating by means of a UV release tape.

(4) FIGS. 10 to 14 show various further embodiments of structured coated assemblies and structural elements provided with a structured coating.

(5) FIGS. 15a and 15b show structural elements having a metallically reinforced structured coating.

(6) FIGS. 16a to 16i show various method steps of a method for producing a coating by means of a thermal release tape.

(7) FIG. 17 shows a further variant of an encapsulated structural element having a cap-shaped cover.

(8) FIG. 18 shows a structural element having a structured coating and a flat cover over a trough-shaped carrier.

(9) FIGS. 19a to 19d show various method steps during the production of a sound channel in an encapsulated structural element having a MEMS microphone.

(10) FIG. 1 shows a schematic cross section of a structural element BE, on the surface of which a release film RT is applied. The release film adheres in the illustrated example to the entire surface of the structural element BE.

(11) A coating region CA and a region UCA which is not to be coated are now defined in the release film RT. Optionally, the adhesion of the release film RT to the surface of the structural element BE can be reduced in the coating region CA. Depending on the type of the release film, this can be performed by thermal action or by light/UV action. The release film in the region CA to be coated then has only slight adhesion or no adhesion at all on the surface of the structural element BE, but still has structural integrity, see FIG. 2A.

(12) Alternatively or subsequently to this step, first incisions are created along a first partition line TL1, in which the release film RT is substantially or completely severed and/or removed. The first partition lines are led so that they enclose the region UCA, which is not to be coated, in the form of a closed line. FIG. 2B shows the first partition lines TL1 around the region UCA which is not to be coated, without the adhesion of the release film RT being reduced in the coating region.

(13) It is also possible to first create the first incisions to define the coating region (see FIG. 2B) and only then reduce the adhesion in the coating region CA. FIG. 3 shows the arrangement at this method step.

(14) In the next step, the release film is removed in the coating region CA, so that a part of the release film RT.sub.s only remains on the surface of the structural element BE in the region UCA, which is not to be coated. The removal of the release film can be performed by drawing off. FIG. 4 shows the arrangement at this method step.

(15) FIG. 5 shows the arrangement after the application of a coating LF, which is applied over the entire surface of the structural element and over the remaining structure RT.sub.s of the release film RT. The coating preferably rests over the entire area and can comprise greatly varying materials. The coating can comprise a layer or a layer sequence applied in the thin-film method. The coating can comprise organic layers, for example, resin layers, films, and inorganic insulation layers which are vapor deposited, sputtered on, or deposited by means of CVD methods. Metal layers can also be applied as the coating or as a partial layer of the coating.

(16) For the structuring of the coating LF, the coating LF is now substantially or completely removed along second partition lines TL2, which are led essentially parallel to the first partition lines TL1 and are arranged in the edge region of the region UCA, which is not to be coated. The incisions are led so that the remaining release film structure RT.sub.s is exposed therein. FIG. 6 shows the arrangement at this method step. However, it is also possible that the release film RT.sub.s is also still removed along the second partition lines TL2 (not shown in the figure). The second partition line TL2 can also be led just outside the remainder of the release film RT.sub.s. A bead formation on the structuring edge of the coating can thus be avoided.

(17) In the next step, the remaining structure RTS of the release film is completely reduced in the adhesion thereof, which can again be performed thermally, by means of light, or UV, corresponding to the previously executed step. In FIG. 7, the remaining release film structure RT.sub.s, which is reduced in the adhesion, is indicated by shading.

(18) It is also possible to exchange the last two steps and firstly to reduce the adhesion of the release film structure RT.sub.s and subsequently to perform the severing along the second partition lines TL2.

(19) In the next step, the release film structure RT.sub.s which is reduced in the adhesion is lifted off together with the region of the coating LF.sub.s applied over it. Depending on the release film used and depending on the method for reducing the adhesion of the release film, forces of different strengths are required for this purpose. If the adhesion is completely canceled out, blowing or suctioning off can be sufficient. However, it is also possible to draw off coating and release film structure by means of an adhesive film, which has a stronger adhesion than the remaining adhesion of the release film on the surface of the structural element. FIG. 8 shows the arrangement at this method step, therefore a structural element which, in a coating region CA, has a coating LF, which is removed in the region UCA, which is not to be coated, and exposes the surface of the structural element BE therein. The proposed structuring method is particularly suitable for those structural elements which have a sensitive surface in the region which is not to be coated, for example, sensitive structural element structures arranged therein. Using the proposed method, coatings on such surfaces can be carefully removed and therefore structured.

(20) In a special application, the coating method is used on the surface of a structural element BE, which has recesses AN. Sensitive structures can be arranged on the bottom of the recesses. In particular, the structural element BE is a MEMS structural element, which has MEMS structures on the bottom of the recess, in particular a membrane, as is used in MEMS microphones or pressure sensors.

(21) The coating method is then advantageously carried out at the wafer level. In this case, a plurality of structural elements are processed in parallel on a MEMS wafer. FIG. 9a schematically shows an example of such a MEMS wafer having a plurality of recesses AN as a structural element BE having recesses AN or cavities.

(22) In the next step, a release film RT is applied to the surface of the MEMS wafer BE, which comprises a plurality of MEMS structural elements, so that the release film RT spans the recesses. The adhesion of the release film to the surface of the structural element BE or the MEMS wafer can be reinforced by pressure and/or temperature, in particular by a lamination method. FIG. 9b shows the arrangement at this method step.

(23) In the next step, the adhesion of the release film RT is reduced in the region CA to be coated, which is preferably performed in the present example by the action of UV radiation (indicated in FIG. 9C by corresponding arrows). The exposure can be carried out in a structuring manner via a mask MA, which is only light-transmissive at the regions to be exposed. Alternatively, the exposure can be carried out in a scanning manner using a laser beam. The exposure is performed so that the release film RT is reduced in the adhesion in a region around each recess, wherein an edge region of differing width remains between the exposed region and the edge of the recess, in which the release film adheres well to the surface of the structural element BE. Alternatively, an inverse principle can also be applied, in which the adhesion of the release film is increased by irradiation. The regions are then to be irradiated, in which an adhesion of the release film is to be maintained at least over sections of the entire method. Such regions can be located in the region of the partition lines, in which severing and therefore detachment from the surface takes place.

(24) In one step (not shown), the release film RT is severed between the coating region and the region which is not to be coated. Subsequently, the release film RT is removed in the region in which the adhesion thereof is reduced. FIG. 9D shows the arrangement at this method step. The remaining release film structures RTS cover the recesses AN and close them.

(25) In the next step, the structural elements BE can be isolated, in that cuts are led into and through the MEMS wafer between the individual structural element regions, for example, by sawing. The MEMS structures are protected in the interior of the recesses AN in relation to the severing processes by the remaining structure of the release film RTS. Thus, neither moisture, sawing dust, nor other liquids or particles, which arise during the severing, can contaminate the structural element BE. FIG. 9e shows MEMS structural elements BE isolated in this manner.

(26) FIG. 9f: The isolated MEMS structural elements BE, which are protected using the release film structure RTS, can now be further processed individually. For this purpose, they are placed on a carrier TR and connected electrically and mechanically thereto. Organic or inorganic multilayer laminates (for example, glass fiber/epoxy of the category FR4, HTCC, LTCC, or other materials) are suitable as the carrier. Further structural elements can be arranged on the carrier, which are required for a desired assembly. The carrier TR can also represent a composite substrate, on which a plurality of modules or assemblies can be processed in parallel.

(27) For this purpose, a further chip component CK is provided in an exemplary manner in the assembly or the module adjacent to the structural element (the MEMS component MK here), which together form an assembly, in FIG. 9f. Of course, the assembly can comprise still further components. FIG. 9g shows the arrangement with mounted components.

(28) In the next step, a coating LF is now applied over the assemblies and the exposed surface of the carrier TR in between so that it terminates flush with the surface of the carrier in an edge region around the assemblies. The coating preferably clings to the surfaces of all of the components and also encloses them laterally. Narrow intermediate spaces between installed components of an assembly can also be spanned by the coating.

(29) A coating method for producing such a clinging coating is, for example, a lamination method, wherein a lamination film is used as the coating. A lamination-capable film can be a thermoplastic film, but preferably a thermally deformable adhesive film, which may be cured in a later step. FIG. 9h shows the arrangement at this method step.

(30) In this method variant, the remaining release film structure RTS over the recesses is used so that the coating LF cannot penetrate into the recesses and come into contact with the MEMS structures arranged on the bottom of the recess or even damage them and obstruct them in the function. This is achieved by a release film which has a higher mechanical stability than the coating LF under the conditions of the coating method.

(31) For the function of the MEMS component MK, it is necessary here to remove the release film RT together with the coating LF arranged over it over the recess AN, to create free access to the MEMS structures on the bottom of the recess. For this purpose, the adhesion of the remaining release film structure is reduced in a first step. In FIG. 9I, this is indicated by the action of radiation. However, it is possible to also reduce the adhesion by thermal action.

(32) In the next step, the coating LF is removed along second partition lines TL2. A direct structuring method suggests itself for this purpose, for example, laser structuring. The second partition line TL2 is led so that it meets the edge of the MEMS component MK bordering the recess and at the same time leaves sufficient distance to the outer edge of the MEMS component and to the outer edge of the recess AN. The second partition line TL2 can be led congruently with the first partition line TL1 and defines the region UCA which is not to be coated, in which the release film is removed together with the coating RTS applied over it. However, it is also possible to preferably offset the second partition line inward, toward the recess AN, in relation to the first partition line, wherein the distance to the recess is always maintained, however. FIG. 9J shows the arrangement at this method step. The second partition line TL2 can also be led slightly further outward, however, as already explained above.

(33) In the next step, the part of the release film RTS which is reduced in the adhesion is removed in the region UCA, which is not to be coated. Depending on the strength of the remaining adhesion, different methods are usable for this purpose. If the release tape has little to no adhesion to the MEMS component, in the extreme case, it rests loosely and can be blown away, for example. Alternatively, it can be drawn off with the aid of an adhesive film. FIG. 9k shows the arrangement during the removal of the release film RTS in the region which is not to be coated. The recess AN is now freely accessible from above, while the coating in the remaining region rests fixedly on the assembly and seals it off from the carrier TR. In this case, a volume is enclosed under the coating LF, which comprises all intermediate spaces between chip component, MEMS component, and carrier. In the region of the recess, the microphone membrane, which forms the bottom of the recess, closes off the enclosed volume.

(34) The arrangement can now be additionally protected further, as shown in FIG. 10, in that a cap KA is placed on the carrier above the assembly covered with the coating, this cap leaving an intermediate space over the assembly, but terminating closely with the carrier TR. In this case, the interior under the cap KA encloses a further volume, which is delimited at the bottom by the coating LF and the membrane. The cap KA can be fastened using a connecting means, for example, an adhesive, to the carrier. A metallic cap can also be soldered on.

(35) If the MEMS component MK is designed as a MEMS microphone, the two volumes, which are separated from one another, under the cap and under the coating now define front volume and back volume, wherein the assignment can be performed differently.

(36) If the sound opening SO is provided in the carrier, the volume under the cap thus forms the back volume. FIG. 10 shows such an arrangement.

(37) However, it is also possible to provide the sound opening in the cap KA, so that then the volume enclosed by the coating LF in relation to the carrier TR forms the back volume. FIG. 14 shows such an arrangement.

(38) If the cap KA is applied over the assemblies on the carrier TR, an isolation of the assemblies can thus be performed in the next step. Mechanical methods, for example sawing, are suitable for severing the carrier between the individual caps or between the assemblies covered by the caps. However, other methods can also be used in dependence on the material of the carrier. FIG. 11 shows an isolated assembly.

(39) FIG. 12 shows an assembly in which the coating LF between two components is drawn down to the surface of the carrier and terminates there with it. The volume enclosed between coating and carrier can thus be reduced by the intermediate spaces between the components. This is advantageous if this volume is used as the front volume and the sound opening is provided in the carrier as in FIGS. 11-13.

(40) FIG. 13: In a method variant, a housing trough can be used as the carrier TR for the assembly, on the bottom of which MEMS and chip components can then be fastened so that the upper edges of the trough protrude above the upper edge of the components. The components are mounted on the inside on the bottom of the housing trough and provided as previously with a coating, which separates the assembly into a coating region and a non-coated region. The coating can be drawn in this case over the entire housing trough, so that it covers the lateral edges thereof.

(41) In the next step, instead of a cap, a flat cover CR can then be applied to the edges of the housing trough so that the edges terminate all around with the flat cover and a volume is thus enclosed in the housing trough. The coating F drawn over the edges of the housing trough can be used in this case as a connecting means, in particular if the coating LF can be thermally softened or even becomes sticky. This structural element can be manufactured using a single housing trough. However, it is also possible to use a composite substrate, on which a plurality of housing troughs are already preformed. The mounting of the components and the application of the flat cover CR is then possible as an area process or in multiple panels.

(42) FIGS. 15a and 15b show a further variant, in which the coating comprises at least two partial layers. A laminate film LF is applied as the first partial layer of the coating. A metal layer ML is deposited over the entire area over the laminate film LF as the second partial layer of the coating.

(43) The metal layer ML can consist of a thin adhesion layer, which comprises titanium, and a reinforcement layer, which is several micrometers thick, made of copper deposited in a currentless or galvanic manner or of a nickel layer deposited by means of PVD.

(44) In addition to laser ablation, wet chemical processes also suggest themselves for the severing and structuring of the metal layer, since in this case the structural element is protected by the coating from solvent, acid, or base attacks.

(45) The components can be mounted on a flat carrier, but as shown in FIG. 15a, can be mounted on the inside at the bottom of a housing trough.

(46) Both first partial layer (laminate film LF) and also second partial layer (metal layer ML) can be drawn over the side walls of the housing trough. Lifting off a coating comprising a metal layer ML can also be performed as shown on the basis of FIG. 9k, for example, by severing along second partition lines around the recess on the MEMS component.

(47) FIG. 15b shows the arrangement after the housing trough has been covered with a flat cover CR and fixedly connected by a bonding method, for example, gluing.

(48) FIGS. 16a to 16i show a further method variant, in which a thermal release film is used as the release film RT. A suitable release film is, for example, REVALPHA from Nitto Denko. Because of the thermal sensitivity of the release film, this method variant differs in that chip and MEMS components CK, MK are first mounted on the carrier TR, before the release film is applied. A premature release due to thermal processes during the mounting of the components is thus avoided. The carrier is preferably of large area and it enables the mounting of numerous components and therefore the parallel processing of multiple structural elements simultaneously. After the mounting, the thermal release film RT is applied over the two components. If the components have different heights, as shown in FIG. 16, the release film RT can thus only be applied to the component protruding farthest above the carrier, which is typically the MEMS component MK. The release film RT does not lay upon the chip component CK.

(49) As shown in FIG. 16c, the release film is now severed along first partition lines TL1 and drawn off beyond the partition lines in the region to be coated as a coherent film. FIG. 16d shows the arrangement during this step.

(50) In the next step, as heretofore (see also FIG. 9a and hereafter in this regard), a coating LF is applied over the entire area over chip and MEMS components so that it circumferentially seals off the assembly with the carrier TR, as shown in FIG. 16e.

(51) The coating LF is subsequently severed, as shown in FIG. 16f, along second partition lines TL2 corresponding to the structuring of the release film RT. After the severing, the release film, together with separated coating LF applied over it, is removed in the region not to be coated, as shown in FIG. 16g. To make it easier to draw off the release film in the region which is not to be coated, after creating the incisions along the second partition lines TL2, the adhesion of the release film is preferably reduced over the entire area, in that the entire arrangement is subjected to an elevated temperature, which is sufficient to reduce the adhesive forces of the release film on the MEMS component MK. A suitable temperature/time profile is set for this purpose, which can be carried out in a furnace and/or on a hot plate and/or under an infrared radiator. The release step can also be combined in this manner with the curing of the laminate film LF used for the coating.

(52) FIG. 16g: The lifting off of the release film RTS together with coating LF located over it is performed more simply using the thermal release film, since the adhesive forces thereof may be almost completely canceled out.

(53) FIG. 16h: As the finished structural element, chip and MEMS components remain on the carrier, which are covered with the coating LF from the carrier. The recess in the MEMS component above the membrane or the other functional layer on the bottom of the MEMS component is exposed by removal of release film and coating in this region which is not to be coated and therefore the access to the functional layer or to the membrane of the MEMS component MK is freely opened.

(54) Subsequently, a cap KA is placed over chip component and MEMS component and connected to the carrier TR so that a volume is enclosed under it. FIG. 16i shows such a finished structural element, in which the sound opening SO is provided below the MEMS component MK in the carrier TR.

(55) FIG. 17 shows a variant in which the sound opening SO is provided in the cap KA.

(56) FIG. 18 shows a variant in which, instead of a cap, a flat cover CR is placed on a carrier TR formed as a housing trough and the housing trough is thus closed.

(57) FIGS. 19a to 19d show various method steps in a method variant which enables the function of the two enclosed volumes to be exchanged. The starting point is a structural element in which a chip component CK and a MEMS component MK are mounted on a carrier TR and are covered by means of a coating LF from this carrier and as it was already illustrated and described in FIG. 14 or FIG. 17, for example. In this variant, the cap KA, which covers the components on the carrier, has a sound opening SO. In contrast to the preceding variants, however, the sound opening is not centered over the recess of the MEMS component, but rather above an intermediate space between two components, for example, over the intermediate space between chip component and MEMS component.

(58) In FIG. 19a, the volume between the coating LF and the cap KA represents the front volume FV. To convert the front volume into a back volume, the sound opening must be sealed off from the previous front volume. For this purpose, as shown in FIG. 19b, a sealing means DM is introduced between cap KA and coating LF and applied as a liquid sealing means LD, for example, as shown. This can be performed by means of jetting, dispensing, needle transfer, or similar methods. FIG. 19c shows the arrangement in this method step, in which the sound opening is closed from the inside using a plug DM made of the sealing means, which simultaneously also seals off toward the coating LF.

(59) An access to the previous back volume is now provided through the sound opening SO and the plug, or the sealing means DM. For this purpose, an opening is created through the sealing means DM and the coating LF located underneath. A drilling method, in particular a laser drilling method, is used for this purpose. As a result, a sound channel SK is created, which, as shown in FIG. 19d, opens an access through the sound opening SO to the volume between MEMS component and chip component and between the components and the carrier TR. Since the sound channel is sealed off from the volume RV between coating and cap, the sound channel opens the access to the front volume FV, while the other volume is used as the back volume.

(60) The sealing means can be applied in liquid form and subsequently cured. It is possible in this case to influence the adhesion and/or the profile of the liquid sealing means on the surface of the coating LF before the placement of the cap. This can be performed by changing the surface properties, by increasing the roughness, or by applying a channel pattern especially in this region. It is also possible to create a flow barrier around the provided plug, to prevent further flowing of the sealing means before the curing. In this manner, it can be ensured that the liquid sealing means only flows to the desired extent and excessively strong flowing is avoided.

(61) Alternatively, the arrangement shown in FIG. 19c can also be created in that, before the placement of the cap, the sealing means is applied to the coating above the intermediate space between chip and MEMS components in liquid form or as a rubber-elastic sealing means (ring or plug). A compressible foam can also be used. The cap KA is subsequently placed so that it presses with sufficient force against the sealing means and thus a good seal is produced between cap and coating over the intermediate space. It is also possible to create the arrangement shown in FIG. 19d in that a ring-shaped seal is placed or fastened, before the placement of the cap, in the region of the later sound channel. The cap preferably also presses sufficiently strongly against the sealing means formed as the sealing ring, so that the sound channel SK is also sealed off tightly from the later back volume RV here.

(62) In the two last-mentioned method variants, in which the sealing means is applied before the cap, the sound opening can also be created in the cap KA after the placement of the cap. However, the method is preferred in which the sealing means is applied through the existing sound opening, since it is self-adjusting.

(63) It is also possible in this method variant to use a trough-shaped carrier and then to arrange the sealing means between the coating and the flat cover.

(64) The method for producing and structuring a coating, which is described on the basis of several exemplary embodiments, is therefore not restricted thereto. Rather, using the method, coatings can be created and structured on arbitrary surfaces or structural elements, in which either a recess is temporarily spanned by a coating in the structural element or in which a coating has to be carefully removed in the region of sensitive structures.

LIST OF REFERENCE SIGNS

(65) BE structural element CA coating region UCA region which is not to be coated RT release film LF coating (for example, laminate film) TL first and second partition line (around CA) TR carrier MK, CK MEMS or chip components MW MEMS wafer MM microphone membrane (in MK) AN recess (above the microphone membrane) KA cap over assembly on carrier CR cover SO sound opening (in cover or carrier) ZR intermediate space (between two components) MA mask ML metal layer/metallization DM sealing means FV front volume RV back volume DR viscous compound which may be cured to form an elastic material SK sound channel (formed by SO, opening in DM and in LF, intermediate space between components and between MK and TR)