ELECTRONIC DEVICE, ELECTRONIC ELEMENT SOLDERING METHOD AND LIGHT-EMITTING DIODE DISPLAY MANUFACTURING METHOD
20230121505 · 2023-04-20
Inventors
Cpc classification
H01L33/62
ELECTRICITY
H01L33/0095
ELECTRICITY
H01L24/00
ELECTRICITY
H01L33/06
ELECTRICITY
H01L2933/0066
ELECTRICITY
International classification
H01L33/00
ELECTRICITY
Abstract
An electronic element soldering method includes providing a substrate, wherein the substrate has a to-be-soldered position, placing an electronic device including an electronic element, a heating element, and a parallel-connected circuit on the to-be-soldered position of the substrate, adding a solder between the electronic element of the electronic device and the to-be-soldered position of the substrate, applying a heating current into the parallel-connected circuit of the electronic device to allow the heating element of the parallel-connected circuit to generate a thermal energy for melting the solder, thereby securing the electronic element on the to-be-soldered position of the substrate via the solder that is melted, applying a breaking current that is larger than the heating current into the parallel-connected circuit to allow an open to occur in a parallel branch corresponding to the heating element of the parallel-connected circuit, and stopping the breaking current.
Claims
1. An electronic device, comprising: an electronic element; a heating element disposed at the electronic element; and a parallel-connected circuit connecting the electronic element and the heating element in parallel.
2. The electronic device of claim 1, wherein a material of the heating element is indium tin oxide, zinc oxide, tungsten, tantalum nitride, or tantalum oxide.
3. The electronic device of claim 1, wherein the electronic element is a light-emitting diode (LED).
4. An electronic element soldering method, comprising: providing a substrate, wherein the substrate has a to-be-soldered position; placing the electronic device of claim 1 on the to-be-soldered position of the substrate; adding a solder between the electronic element of the electronic device and the to-be-soldered position of the substrate; applying a heating current into the parallel-connected circuit of the electronic device to allow the heating element of the parallel-connected circuit to generate a thermal energy for melting the solder, thereby securing the electronic element on the to-be-soldered position of the substrate via the solder that is melted; applying a breaking current that is larger than the heating current into the parallel-connected circuit to allow an open to occur in a parallel branch corresponding to the heating element of the parallel-connected circuit; and stopping the breaking current.
5. The electronic element soldering method of claim 4, wherein the heating current is a forward current relative to the electronic element of the parallel-connected circuit.
6. The electronic element soldering method of claim 4, wherein the heating current is a reverse current relative to the electronic element of the parallel-connected circuit.
7. The electronic element soldering method of claim 4, wherein the breaking current is a forward current relative to the electronic element of the parallel-connected circuit.
8. The electronic element soldering method of claim 4, wherein the breaking current is a reverse current relative to the electronic element of the parallel-connected circuit.
9. The electronic element soldering method of claim 4, wherein the substrate is a thin-film transistor (TFT) substrate.
10. The electronic element soldering method of claim 4, wherein the electronic element is a light-emitting diode (LED).
11. The electronic element soldering method of claim 10, wherein the solder is added to a P electrode and an N electrode of the light-emitting diode (LED).
12. A light-emitting diode display manufacturing method, comprising the electronic element soldering method of claim 10 to solder light-emitting diodes (LEDs).
13. An electronic element soldering method, comprising: providing a substrate, wherein the substrate has a to-be-soldered position, a heating element is correspondingly disposed on the to-be-soldered position of the substrate; placing an electronic element on the to-be-soldered position of the substrate to allow the electronic element and the heating element to be connected in parallel to form a parallel-connected circuit; adding a solder between the electronic element and the to-be-soldered position of the substrate; applying a heating current into the parallel-connected circuit to allow the heating element of the parallel-connected circuit to generate a thermal energy for melting the solder, thereby securing the electronic element on the to-be-soldered position of the substrate via the solder that is melted; applying a breaking current that is larger than the heating current into the parallel-connected circuit to allow an open to occur in a parallel branch corresponding to the heating element of the parallel-connected circuit; and stopping the breaking current.
14. The electronic element soldering method of claim 13, wherein the heating current is a forward current relative to the electronic element of the parallel-connected circuit.
15. The electronic element soldering method of claim 13, wherein the heating current is a reverse current relative to the electronic element of the parallel-connected circuit.
16. The electronic element soldering method of claim 13, wherein the breaking current is a forward current relative to the electronic element of the parallel-connected circuit.
17. The electronic element soldering method of claim 13, wherein the breaking current is a reverse current relative to the electronic element of the parallel-connected circuit.
18. The electronic element soldering method of claim 13, wherein the substrate is a thin-film transistor (TFT) substrate.
19. The electronic element soldering method of claim 13, wherein the electronic element is a light-emitting diode (LED).
20. The electronic element soldering method of claim 19, wherein the solder is added to a P electrode and an N electrode of the light-emitting diode (LED).
21. A light-emitting diode display manufacturing method, comprising the electronic element soldering method of claim 19 to solder light-emitting diodes (LEDs).
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0011] The disclosure can be more fully understood by reading the following detailed description of the embodiments, with reference made to the accompanying drawings as follows:
[0012]
[0013]
[0014]
[0015]
[0016]
[0017]
[0018]
[0019]
[0020]
[0021]
[0022]
[0023]
[0024]
DETAILED DESCRIPTION
[0025] It will be understood that when an element (or mechanism or module) is referred to as being “disposed on”, “connected to” or “coupled to” another element, it can be directly disposed on, connected or coupled to the other element, or intervening elements may also be present. In contrast, when an element is referred to as being “directly disposed on”, “directly connected to” or “directly coupled to” another element, there are no intervening elements present.
[0026] In addition, the terms first, second, third, etc. are used herein to describe various elements or components, these elements or components should not be limited by these terms. Consequently, a first element or component discussed below could be termed a second element or component.
[0027] Please refer to
[0028] To be more specific, the electronic element 110 can be an LED and includes an element substrate 111, a first-type semiconductor layer 112, an active layer 113, a second-type semiconductor layer 114, an indium tin oxide (ITO) layer 115, a P electrode 116, an N electrode 117, and a protection layer 118. The element substrate 111 may be for example made of sapphire. The first-type semiconductor layer 112 may be N-type nitride semiconductor stack layers made by adding N-type dopants to GaN, AlGaN, AlInGaN or InGaN. The active layer 113 can be made of quantum wells, such as multiple quantum wells. The second-type semiconductor layer 114 may be P-type nitride semiconductor stack layers made by adding P-type dopants to GaN, AlGaN, AlInGaN or InGaN. The present disclosure is not limited thereto.
[0029] The P electrode 116 may have a multi-layer structure and includes a first titanium layer 1161, an aluminum layer 1162 and a second titanium layer 1163 in order. The N electrode 117 may have a multi-layer structure (not shown in the drawings) and consists of the same components as the P electrode 116. In other embodiments, the P electrode and the N electrode may have a singular-layer structure, and may consist of one metal.
[0030] The heating element 120 can be disposed on the electronic element 110 and includes a first connecting section 121, a second connecting section 122 and a heating section 123. The first connecting section 121 can be disposed on the P electrode 116 and is electrically connected thereto, the second connecting section 122 can be disposed on the N electrode 117 and is electrically connected thereto, and the heating section 123 can be connected between the first connecting section 121 and the second connecting section 122. The first connecting section 121, the second connecting section 122 and the heating section 123 can be all made of ITO, and thus the first connecting section 121, the second connecting section 122 and the heating section 123 are connected to form a current passage configured for a current to pass therethrough. In other embodiments, the heating element can be, but not limited to, zinc oxide, tungsten, tantalum nitride, or tantalum oxide.
[0031] Since the first connecting section 121, the second connecting section 122 and the heating section 123 of the heating element 120 are connected to form a current passage, and the P electrode 116, the indium tin oxide layer 115, the second-type semiconductor layer 114, the active layer 113, the first-type semiconductor layer 112 and the N electrode 117 can form another current passage, the two current passages (parallel branches) using the same two terminals can be deemed as the parallel-connected circuit 130.
[0032] In the first embodiment, a first tin protrusion 141 and a second tin protrusion 142 can be formed as manufacturing the electronic element 110 and the heating element 120. In other words, the electronic element 110, the heating element 120, the first tin protrusion 141, and the second tin protrusion 142 can be made integrally.
[0033] As shown in
[0034] Please refer to
[0035] As shown in
[0036] Subsequently, the current is enlarged, that is, feeding a breaking current I2, which is about 200 mA and continues for 1 ms. Hence, the temperature of the heating section 123 rises to about 400° C., and a crack is generated thereon. As a result, no more current is allowed to pass through the current passage of the parallel-connected circuit 130 formed by the first connecting section 121, the heating section 123, and the second connecting section 122.
[0037] In other words, according to the first embodiment, the temperature is raised in two steps by adjusting the current. In the first step, the solders S2 can be melted by raising the temperature, and, in the second step, the current passage of the parallel-connected circuit 130 formed by the first connecting section 121, the heating section 123, and the second connecting section 122 is opened by further raising the temperature. Therefore, the original first substrate soldered point S11, the second substrate soldered point S12 and the driving circuit of the substrate S1 can be used directly to achieve soldering, no extra heating element is required.
[0038] Please refer to
[0039] Please refer to
[0040] Please refer to
[0041] Please refer to
[0042] Specifically, the electronic element 410 can be an LED and includes an element substrate, a first-type semiconductor layer, an active layer, a second semiconductor layer, an indium tin oxide layer, a P electrode, and an N electrode. A first tin protrusion 441 and a second tin protrusion 442 can be connected to the P electrode and the N electrode, respectively. The difference between the fourth embodiment and the first embodiment is that the heating element 420 is disposed on the substrate S1, but not on the electronic element 410 and being integrally formed with the electronic element 410. More specifically, the heating element 420 can include a first connecting section 421, a second connecting section 422 and a heating section 423. The first connecting section 421 is located between the surface of the substrate S1 and the first substrate soldered point S11, the second connecting section 422 is located between the surface of the substrate S1 and the second substrate soldered point S12, and the heating section 423 is located on the surface of the substrate S1 and connected to the first connecting section 421 and the second connecting section 422. The first connecting section 421, the second connecting section 422 and the heating section 423 can be all made of ITO, thereby allowing the first connecting section 421, the second connecting section 422 and the heating section 423 to be connected to form a current passage. Since the first substrate soldered point S11 corresponds to the P electrode, and the second substrate soldered point S12 corresponds to the N electrode, the aforementioned current passage and another current passage formed by the P electrode, the indium tin oxide layer, the second-type semiconductor layer, the active layer, the first-type semiconductor layer and the N electrode can be assembled to form a parallel-connected circuit 430.
[0043] As shown in
[0044] Please refer to
[0045] In the substrate providing step 510, a substrate is provided, and the substrate includes a first substrate soldered point and a second substrate soldered point.
[0046] In the electronic element providing step 520, an electronic element is provided, and the electronic element includes a first element soldered point and a second element soldered point. The first element soldered point can contact the first substrate soldered point via a solder, and the second element soldered point can contact the second substrate soldered point via another solder.
[0047] In the powering-for-soldering step 530, a first current can be fed to a conductive heating structure via the first substrate soldered point and the second substrate soldered point, and the conductive heating structure can be positioned on the electronic element to form a current passage between the first element soldered point and the second element soldered point, or be positioned on the substrate to form a current passage between the first substrate soldered point and the second substrate soldered point. The first current can pass the current passage to allow the conductive heating structure to generate a thermal energy to melt the aforementioned solder to connect the first substrate soldered point and the first element soldered point, and to melt the aforementioned another solder to connect the second substrate soldered point and the second element soldered point.
[0048] In the powering-for-breaking step 540, a second current can be fed to the conductive heating structure via the first substrate soldered point and the second substrate soldered point to open the current passage.
[0049] For the first embodiment of
[0050] Please refer to
[0051] Step 502 can be executed to place an electronic device on the to-be-soldered position of the substrate. As shown in
[0052] Step 503 can be executed to add solders between the electronic element of the electronic device and the to-be-soldered position of the substrate. As shown in
[0053] Step 504 is executed to apply a heating current into the parallel-connected circuit of the electronic device to allow the heating element of the parallel-connected circuit to generate a thermal energy for melting the solder, thereby securing the electronic element on the to-be-soldered position of the substrate via the solder that is melted. The heating current can be a forward current relative to the electronic element of the parallel-connected circuit. As shown in
[0054] Subsequently, step 505 can be executed to apply a breaking current that is larger than the heating current into the electronic device to allow an open to occur in a parallel branch corresponding to the heating element of the parallel-connected circuit, and the breaking current is a forward current relative to the electronic element of the parallel-connected circuit. As shown
[0055] Please refer to
[0056] Step S12 can be executed to place an electronic element on the to-be-soldered position of the substrate to allow the electronic element and the heating element to be connected in parallel to form a parallel-connected circuit. As shown in
[0057] Step 513 can be executed to add a solder between the electronic element and the to-be-soldered position of the substrate. As shown in
[0058] Step 514 is executed to apply a heating current into the parallel-connected circuit to allow the heating element of the parallel-connected circuit to generate a thermal energy for melting the solder, thereby securing the electronic element on the to-be-soldered position of the substrate via the solder that is melted. The heating current can be a forward current relative to the electronic element of the parallel-connected circuit. As shown in
[0059] Subsequently, step 515 can be executed to apply a breaking current that is larger than the heating current into the parallel-connected circuit to allow an open to occur in a parallel branch corresponding to the heating element of the parallel-connected circuit. As shown
[0060] The present disclosure can further include a light-emitting diode display manufacturing method, which includes the electronic element soldering method 500 shown in
[0061] Although the present disclosure has been described in considerable detail with reference to certain embodiments thereof, other embodiments are possible. Therefore, the spirit and scope of the appended claims should not be limited to the description of the embodiments contained herein.
[0062] It will be apparent to those skilled in the art that various modifications and variations can be made to the structure of the present disclosure without departing from the scope or spirit of the disclosure. In view of the foregoing, it is intended that the present disclosure covers modifications and variations of this disclosure provided they fall within the scope of the following claims.