High speed barrel polishing device
09550266 ยท 2017-01-24
Assignee
Inventors
Cpc classification
B24B31/0218
PERFORMING OPERATIONS; TRANSPORTING
International classification
B24B31/033
PERFORMING OPERATIONS; TRANSPORTING
Abstract
A high speed polishing device useful for polishing a large number of miniature components, such as multi-layer electronic components, is disclosed. In various embodiments of the present invention, a vertical planetary ball mill or other barrel polishing device is modified to rotate polishing containers having a modified interior cavity structure. This interior cavity provides a smooth, gradually curved interior sidewall that improves circulation within the container during high-speed vertical polishing rotation. The improved circulation results in polishing for a larger number of components placed within the container and in less time than existing polishing container structures. In further embodiments, the containers are rotated around a generally tilted axis positioned at an angle between entirely vertical and horizontal positions. Rotation about a tilted axis further reduces collisions and increases relative polishing movement within the container.
Claims
1. A high speed polishing device, comprising: a revolution plate structured for rotation in a first direction around a revolution plate axis, wherein the revolution plate axis is perpendicular to a first side of the revolution plate; a plurality of polishing containers structured to receive components; and a plurality of polishing container holders coupled to the first side of the revolution plate, wherein each polishing container is secured inside a respective holder, wherein the coupling of the holders to the first side of the revolution plates rotates each respective polishing container in a second direction around a corresponding container axis, each of the corresponding container axes being parallel to the revolution plate axis, and each of the plurality of polishing containers comprising: an interior cavity having a first end proximate to the revolution plate and a second end distal to the revolution plate, the interior cavity between the first end and the second end being defined by a smooth interior wall, and the interior cavity having an internal diameter that continuously varies with a gradual non-linear transition between the first end and the second end; wherein the first direction of rotation is opposite the second direction of rotation.
2. The high speed polishing device of claim 1, wherein the internal diameter of the interior cavity having a widest point between the first end and the second end, and wherein the interior cavity includes a first section defined between the first end and the point, and a second section defined between the point and the second end.
3. The high speed polishing device of claim 2, wherein the first and second sections have opposite incline directions.
4. The high speed polishing device of claim 1, wherein the first end of the interior cavity is defined by a substantially flat surface, and wherein the flat surface enables high speed rotation.
5. The high speed polishing device of claim 1, wherein the revolution plate and the one or more containers are rotated within a vertical planetary ball mill.
6. The high speed polishing device of claim 1, wherein one or more of the polishing containers are sealed with a watertight seal, and wherein a liquid is also contained within the interior cavity of the one or more sealed polishing containers.
7. The high speed polishing device of claim 1, wherein a dry polishing media is contained within the interior cavity of the polishing containers.
8. The high speed polishing device of claim 1, further comprising a support member coupled to the revolution plate proximate to the revolution plate axis, the support member having a support member axis extending therethrough that is not parallel to the revolution plate axis.
9. The high speed polishing device of claim 8, wherein an angle defined between the support member axis and the revolution plate axis is a substantially 45 degree angle.
10. A high speed polishing device, comprising a planetary ball mill adapted for polishing at a tilted angle, the planetary ball mill having: a revolution plate structured for rotation in a first direction around a revolution plate axis, wherein the revolution plate axis is perpendicular to a first side of the revolution plate; a plurality of polishing containers structured to receive components; and a plurality of polishing container holders coupled to the first side of the revolution plate, wherein each polishing container is secured inside a respective holder, wherein the coupling of the holders to the first side of the revolution plates rotates each respective polishing container in a second direction around a corresponding container axis, each of the corresponding container axes being parallel to the revolution plate axis, and each of the plurality of polishing containers comprising: an interior cavity having a first end proximate to the revolution plate and a second end, the interior cavity between the first end and the second end being defined by a smooth interior wall, and the interior cavity having an internal diameter that continuously varies with a non-linear gradual transition between the first end and the second end; wherein the first direction of rotation is opposite the second direction of rotation; and wherein the revolution plate is coupled to a support member proximate to the revolution plate axis and rotated by a rotation member within the planetary ball mill, the support member having a support member axis extending therethrough that is not parallel to the revolution plate axis, thereby enabling rotation of the polishing containers at a tilted angle defined between the support member axis and the revolution plate axis.
11. The high speed polishing device of claim 10, wherein the tilted angle is set at a substantially 45 degree angle.
12. The high speed polishing device of claim 10, wherein the first end of the interior cavity is defined by a substantially flat surface and enables high speed rotation.
13. The high speed polishing device of claim 10, wherein one or more of the polishing containers are sealed with a watertight seal, and wherein a liquid is also contained within the interior cavity of the one or more sealed polishing containers.
14. The high speed polishing device of claim 10, wherein a dry polishing media is contained within the interior cavity of the polishing containers.
15. A polishing container used within a high speed polishing device, comprising: an interior cavity having a first end and a second end, the interior cavity between the first end and the second end being defined by a smooth interior wall, and the interior cavity having an internal diameter that continuously varies with a non-linear gradual transition between the first end and the second end; wherein the polishing container is secured inside a polishing container holder, the holder being coupled to a rotating member within the high speed polishing device, wherein the rotating member rotates in a first direction of rotation, wherein the coupling of the holder to the rotating member causes the polishing container to be rotated by the high speed polishing device in a second direction around a container axis; and wherein the first direction of rotation is opposite the second direction of rotation.
16. The polishing container of claim 15, wherein the internal diameter of the interior cavity having a widest point between the first end and the second end, and wherein the interior cavity includes a first section defined between the first end and the point, and a second section defined between the point and the second end.
17. The polishing container of claim 15, wherein the first end of the interior cavity is defined by a substantially flat surface wherein the flat surface enables high speed rotation.
18. The polishing container of claim 15, wherein a dry polishing media is contained within the interior cavity of the polishing container.
19. The polishing container of claim 15, wherein one or more of the polishing containers is sealed with a watertight seal, and wherein a fluid is contained within the interior cavity of the sealed polishing container.
20. The polishing container of claim 15, wherein the rotating member and the container are rotated within a vertical planetary ball mill.
Description
BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS
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DETAILED DESCRIPTION
(14) The present invention provides improved polishing devices and techniques useful during a generally vertically-oriented barrel polishing process. The presently disclosed high speed barrel polishing apparatus and modified barrel polishing container is particularly useful for polishing a large number of components, such as hundreds or thousands of small electronic components, in a relatively rapid fashion.
(15) Some of the other advantages of the various embodiments of the present invention include providing uniform polishing, higher speed, and the use of low cost equipment. Existing vertical planetary ball mill machines may be adapted to provide vertical polishing capabilities in a relatively small space with a small number of modifications. Other advantages of the various embodiments of the present invention include providing a barrel polishing techniques which expose the polished components to less gravitational forces and collisions, thus resulting in reduced cracking and damage to the components. Additionally, use of sealed, airtight containers within a planetary ball mill enables both wet and dry type polishing.
(16) Multi-layer electronic components such as inductors, beads, capacitors, and oscillators often require a polishing step in their fabrication or manufacturing process. Specifically, such components must have rounded and not sharp edges to ensure proper plating. An unpolished, multi-layer electronic component 110 made from ceramic or a similar type of hardened material is illustrated in
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(18) As further described herein, the polishing jars such as container 240 attached to the revolution plate are each filled with the components to be polished. The jars are affixed to a container holder such as holder 230 which secures the container in place within the mill 200 and enables rotation of the container 240. The containers are sealed through use of beam 250, pressure screw 255, and locking screw 260, which prevents the contents of the containers from escaping during high-speed rotation.
(19) One of the advantages of adapting a vertical planetary ball mill as a polishing device in the presently described invention is that a planetary ball mill requires a simple mechanical transmission device to perform vertical rotation. Additionally, ball mills may be operated in a relatively small space, and provide polishing container units that are easily adapted and replaced for use with a variety of components and polishing media.
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(24) Thus, although vertical barrel polishing techniques are able to produce a number of polished components in faster time than with horizontal techniques, the shape of the vertical container typically results in incomplete polishing batches for multi-layer electronic components. These limitations are remedied by the various embodiments of the following modified polishing container structures.
(25) According to one embodiment of the present invention, the containers used within a vertical planetary ball mill or other machine rotating about a vertical axis are structured as follows.
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(27) Additionally, as is shown in
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(31) Returning to
(32) The hermetic (i.e., sealed) construction of the vertical planetary ball mill polishing containers provides the flexibility for both wet and dry type polishing. Particularly, one advantage of using a sealed polishing jar is that wet-barrel polishing methods with water may be carried out. Wet-barrel polishing methods with water or other suitable liquids may be placed within some or all of the vertical planetary ball mill containers. Such liquids may used as part of the barrel polishing process to assist with the polishing process, such as serving as shock-absorbing material to reduce impact force during rotations.
(33) The use of liquids within the containers will reduce or entirely prevent cracking of the components caused by collisions of components themselves and collisions of components and abrasives during the polishing process. However, water and similar liquids may not be applicable for all types of electronic components, because water tends to move in through the interfaces between the internal electrodes and ceramic or magnetic layers and cause delamination. Those skilled in the art would recognize which liquids are most appropriate for the particular component and polishing application.
(34) As suggested above, a vertical planetary ball mill is a relatively simple mechanical transmission device, but provides advantages for use with the presently described embodiments due to its lower center of gravity and more compact structure than other vertical polishing devices. Further, the polishing containers provided by the present invention may be used with existing vertical planetary ball mill structures, such as the structures shown in
(35) As a further explanation, although the internal wall of the polishing container 645 shown in
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(37) As shown, the revolution plate 635 and polishing containers such as 640 are coupled to a rotating shaft or member that is in turn connected to a base support further referred to as support member 760. The first end (i.e., the top) of the support member 760 is coupled to the revolution plate 635 at a different angle than the second end (i.e., the bottom) of the support member 760 that is coupled to the planetary ball mill assembly. Therefore, as shown, the tilted axis 730 extends through the first end of the support member 760 that is proximate to the revolution plate. The vertical axis 710 extends through the second end of the support member 760 that is distal to the revolution plate 635. Thus, as illustrated in
(38) The specific tilted angle 740 of operation for the revolution plate 635 and containers such as 640 therefore is the angle existing between the vertical axis 710 and the tilted axes 730 and 750. In one embodiment, the optimal angle 740 for operation of the polishing device is at an acute 45 degree angle between these axes. Those skilled in the art would recognize that other angles of operation between 0 and 90 degrees could be used in conjunction with the embodiments of the present invention described above to achieve the advantages of operating at a tilted angle.
(39) Rotation around a tilted axis helps reduce the accumulation of components at the bottom and increases relative movements, and therefore helps to obtain uniform polishing of components in a shorter amount of time. Additionally, rotation around a tilted axis instead of a horizontal axis reduces gravitational pull and overall collision forces that would otherwise be encountered during the barreling process. This reduces cracking and damage to sensitive components that would otherwise occur in entirely vertical or horizontal angles.
(40) Although the terms vertical and horizontal have been used to describe the orientation of various axes in the operation of the polishing device and containers, these orientations are presented merely for purposes of example and not limitation. Thus, the position and orientation of the polishing device and containers may be changed such that that the axes presented herein are no longer vertical or horizontal while not departing from the intended scope of the present invention.
(41) Moreover, although various representative embodiments of this invention have been described above with a certain degree of particularity, those skilled in the art could make numerous alterations to the disclosed embodiments without departing from the spirit or scope of the inventive subject matter set forth in the specification and claims.