Substrate structure and manufacturing method thereof

Abstract

A substrate structure is provided. The substrate structure includes a substrate and a carrier. The substrate includes a first through hole, a first surface and a second surface opposite to the first surface. The first through hole penetrates the substrate for connecting the first surface and the second surface. The carrier includes a second through hole, a release layer, an insulating paste layer and a metal layer. The insulating paste layer is disposed between the release layer and the metal layer. The carrier is attached to the second surface with the release layer thereof. The second through hole corresponds to the first through hole and penetrates the carrier for exposing the first through hole.

Claims

1. A substrate structure, comprising: a substrate, comprising a dielectric layer, a plurality of pads, a patterned solder mask, a first through hole, a first surface, and a second surface opposite to the first surface, the plurality of pads being respectively disposed on two opposite surfaces of the dielectric layer, the patterned solder mask covering the two opposite surfaces and exposing the plurality of pads, wherein the first through hole penetrates the substrate for connecting the first surface and the second surface and the first through hole penetrates the dielectric layer and the patterned solder mask; and a carrier, comprising a second through hole, a release layer, an insulating paste layer, and a metal layer, wherein the insulating paste layer is disposed between the release layer and the metal layer, the carrier is attached to the second surface by attaching the release layer to the second surface and contacting the release layer with the patterned solder mask, the second through hole corresponds to the first through hole and penetrates the carrier for exposing the first through hole, and a smallest diameter of the second through hole is greater than a largest diameter of the first through hole.

2. The substrate structure as claimed in claim 1, wherein a material of the release layer comprises polyethylene terephthalate (PET) or polyimide (PI) film.

3. The substrate structure as claimed in claim 1, wherein a material of the insulating paste layer comprises prepreg (PP).

4. The substrate structure as claimed in claim 1, wherein the metal layer comprises a copper foil layer.

5. The substrate structure as claimed in claim 1, wherein the substrate is a single-layer circuit board.

6. The substrate structure as claimed in claim 1, wherein the substrate is a multi-layer circuit board.

7. The substrate structure as claimed in claim 1, wherein the substrate further comprises a plurality of vias, each of the vias connecting the corresponding pads disposed on the two opposite surfaces.

8. The substrate structure as claimed in claim 1, further comprising: a surface finishing layer, covering the plurality of pads.

9. A manufacturing method of a substrate structure, comprising: providing a substrate comprising a dielectric layer, a plurality of pads, a patterned solder mask, a first surface and a second surface opposite to the first surface, the plurality of pads being respectively disposed on two opposite surfaces of the dielectric layer, the patterned solder mask covering the two opposite surfaces and exposing the plurality of pads; forming a first through hole on the substrate, wherein the first through hole penetrates the substrate for connecting the first surface and the second surface and the first through hole penetrates the dielectric layer and the patterned solder mask; providing a carrier comprising a release layer, an insulating paste layer, and a metal layer, wherein the insulating paste layer is disposed between the release layer and the metal layer; forming a second through hole on the carrier, wherein the second through hole penetrates the carrier, and a smallest diameter of the second through hole is greater than a largest diameter of the first through hole; and laminating the substrate on the release layer of the carrier, so that the release layer contacts the patterned solder mask, wherein a position of the second through hole corresponds to a position of the first through hole for exposing the first through hole.

10. The manufacturing method of the substrate structure as claimed in claim 9, wherein the method of forming the first through hole and the second through hole comprises mechanical drilling.

11. The manufacturing method of the substrate structure as claimed in claim 9, wherein a material of the release layer comprises polyethylene terephthalate (PET) or polyimide (PI) film.

12. The manufacturing method of the substrate structure as claimed in claim 9, wherein a material of the insulating paste layer comprises prepreg.

13. The manufacturing method of the substrate structure as claimed in claim 9, wherein the metal layer comprises a copper foil layer.

14. The manufacturing method of the substrate structure as claimed in claim 9, wherein the method of providing the carrier further comprises: forming the carrier by laminating the release layer, the insulating paste layer, and the metal layer.

15. The substrate structure as claimed in claim 1, wherein the first though hole is adjacent to the pads.

16. The manufacturing method of the substrate structure as claimed in claim 9, wherein the first through hole is adjacent to the pads.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) The accompanying drawings are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification. The drawings illustrate embodiments of the invention and, together with the description, serve to explain the principles of the invention.

(2) FIG. 1 to FIG. 6 are cross-sectional schematic views illustrating a manufacturing method of a substrate structure according to an embodiment of the invention.

DESCRIPTION OF THE EMBODIMENTS

(3) Reference will now be made in detail to the present preferred embodiments of the invention, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers are used in the drawings and the description to refer to the same or like parts.

(4) It is to be understood that both of the foregoing and other detailed descriptions, features, and advantages are intended to be described more comprehensively by providing embodiments accompanied with figures hereinafter. In the following embodiments, wordings used to indicate directions, such as up, down, front, back, left, and right, merely refer to directions in the accompanying drawings. Therefore, the directional wording is used to illustrate rather than limit the invention. In addition, like or similar elements will be referred to by using like or similar reference numeral.

(5) FIG. 1 to FIG. 6 are cross-sectional schematic views illustrating a manufacturing method of a substrate structure according to an embodiment of the invention. The manufacturing method of the substrate structure of this embodiment includes steps as follows. First, referring to FIG. 1, a substrate 110 is provided. The substrate 110 includes a first surface 110a and a second surface 110b opposite to the first surface 110a. Specifically, the substrate 110 may be a single-layer circuit board, as shown in FIG. 1, including a dielectric layer 114, a plurality of pads 115, a patterned solder mask 117, and a plurality of vias 116. The plurality of pads 115 are respectively disposed on two opposite surfaces of the dielectric layer 114. Each of the vias 116 connects to the corresponding pads 115 disposed on the two opposite surfaces of the dielectric layer 114. The patterned solder mask 117 covers the two opposite surfaces of the dielectric layer 114 and exposes the pads 115. Of course, in other embodiments, other stacked structures may be further stacked on the substrate 110. In other words, the substrate 110 may also be a multi-layer circuit board.

(6) In addition, the substrate 110 may further include a surface finishing layer 118 covering the pads 115 exposed by the solder mask 117. A material of the surface finishing layer 118 may include a copper-base alloy, a nickel-base alloy, a palladium-base alloy, platinum-base alloy, a silver-base alloy, a gold-base alloy, a titanium-base alloy, or any combination thereof.

(7) Referring to FIG. 2, a first through hole 112 is formed on the substrate 110. In addition, the first through hole 112 penetrates the substrate 110 to connect the first surface 110a and the second surface 110b. Furthermore, the first through hole 112 penetrates the dielectric layer 114 and the patterned solder mask 117 of the substrate 110, as shown in FIG. 2, to serve as a gas aperture for ventilation or a sound hole for resonance, for example. In this embodiment, a method for forming the first through hole 112 includes mechanical drilling or laser drilling. However, the invention is not limited thereto.

(8) Then, referring to FIG. 3, a carrier 120 is provided. The carrier 120 includes a release layer 122, an insulating paste layer 124, and a metal layer 126. In this embodiment, the carrier 120 may be formed by sequentially laminating the release layer 122, the insulating paste layer 124, and the metal layer 126 together, for example. In this way, the insulating paste layer 124 is located between the release layer 122 and the metal layer 126. In addition, a material of the release layer 122 may include polyethylene terephthalate (PET), polyimide (PI) film, or other suitable materials. A material of the insulating paste layer 124 may include insulating paste materials such as prepreg, and the metal layer 126 may be a copper foil layer, for example. In addition, the sequence described in this embodiment only serves for illustration, and there is no fixed order between providing or manufacturing the substrate 110 and providing or manufacturing the carrier 120. In other embodiments of the invention, the carrier 120 may be provided before the substrate 110 is provided, or the carrier 120 and the substrate 110 that are already manufactured may be provided at the same time. The invention is not limited thereto.

(9) Then, referring to FIG. 4, a second through hole 128 is formed on the carrier 120. In addition, the second through hole 120 may respectively penetrate the release layer 122, the insulating paste layer 124, and the metal layer 126, thereby penetrating the carrier 120. In this embodiment, a diameter D2 of the second through hole 128 may be greater than a diameter D1 of the first through hole 112 shown in FIG. 2. In addition, a method for forming the second through hole 128 may be the same as or similar to the method for forming the first through hole 112. Namely, the method for forming the second through hole 128 also includes mechanical drilling or laser drilling. However, the invention is not limited thereto.

(10) Then, referring to both FIG. 5 and FIG. 6, the substrate 110 and the carrier 120 are laminated together to form a substrate 110 shown in FIG. 6. Specifically, the substrate 110 is laminated on the carrier 120 by laminating the second surface 110b of the substrate 110 shown in FIG. 5 on the release layer 122. In addition, a position of the second through hole 128 may correspond to a position of the first through hole 112. In addition, the diameter D2 of the second through hole 128 may be substantially greater than the diameter D1 of the first through hole 112, thereby exposing the first through hole 112, as shown in FIG. 6. In this way, the manufacture of the substrate structure 110 may be completed.

(11) The substrate structure 100 shown in FIG. 6 and manufactured according to the manufacturing method includes the substrate 110 and the carrier 120. The substrate 110 includes the first through hole 112, the first surface 110a and the second surface 110b opposite to the first surface 110a. The first through hole 112 penetrates the substrate 110 for connecting the first surface 110a and the second surface 110b. The carrier 120 includes the second through hole 128, the release layer 122, the insulating paste layer 124, and the metal layer 126. The insulating paste layer 124 is located between the release layer 122 and the metal layer 126. The carrier 120 is attached to the substrate 110 by attaching the release layer 122 of the carrier 120 to the second surface 110b of the substrate 110. The second through hole 128 corresponds to the first through hole 112 and penetrates the carrier 120, thereby exposing the first through hole 112. In addition, the diameter D2 of the second through hole 128 may be substantially greater than the diameter D1 of the first through hole 112.

(12) In view of the foregoing, the thickness of the substrate according to the embodiments of the invention is rather thin, therefore, to prevent the substrate from cracking during the packaging process, the substrate is laminated on the carrier having the release layer, so as to increase an overall rigidity of the substrate structure. In addition, the substrate may be easily separated from the carrier after the manufacturing process is finished by taking advantage of the characteristic of the release layer being easily stripped from the substrate.

(13) Moreover, the substrate according to the embodiments of the invention further includes the first through hole that may serve as a gas aperture for ventilation or a sound hole for resonance. Meanwhile, the second through hole corresponding to the first through hole is formed on the carrier. In this way, the first through hole of the substrate may be exposed by the carrier through the second through hole after the substrate is disposed on the carrier. Accordingly, in a subsequent thermal compression process or other high temperature processes, gas in the first through hole may be easily discharged from the second through hole without being accumulated between the substrate and carrier or pushing the carrier away due to thermal expansion, which may weaken the bonding strength between the substrate and the carrier and make the substrate separated from the carrier. Therefore, the substrate structure according to the embodiments of the invention not only meets special requirements for a substrate having special functions but also increases a yield rate of the substrate structure.

(14) It will be apparent to those skilled in the art that various modifications and variations can be made to the structure of the present invention without departing from the scope or spirit of the invention. In view of the foregoing, it is intended that the present invention cover modifications and variations of this invention provided they fall within the scope of the following claims and their equivalents.