ELECTROLYSIS DEVICE, STIRRING DEPOSITION EQUIPMENT, CIRCULATING DEPOSITION SYSTEM AND ELECTROLYSIS METHOD

Abstract

An electrolysis device, a stirring deposition equipment, a circulating deposition system, and an electrolysis method are provided. The electrolysis device is configured to electro-precipitate a magnetic deposition from a working fluid. The electrolysis device includes an anode plate, a cathode plate, and a magnetic component. The cathode plate and the anode plate are disposed correspondingly, and the magnetic component is disposed on a side of the cathode plate relatively away from the anode plate. The working fluid flows between the anode plate and the cathode plate, and an oxidation-reduction reaction occurs between the anode plate and the cathode plate. The magnetic component attaches the magnetic deposition resolved from the working fluid onto a surface of the cathode plate facing the anode plate. The magnetic deposition includes a product and a half-reactant.

Claims

1. An electrolysis device, configured to electro-precipitate a magnetic deposition from a working fluid, the electrolysis device comprising: an anode plate; a cathode plate, disposed corresponding to the anode plate; and a magnetic component, disposed on a side of the cathode plate relatively away from the anode plate, wherein the working fluid flows between the anode plate and the cathode plate, and an oxidation-reduction reaction occurs between the anode plate and the cathode plate, and the magnetic component attaches the magnetic deposition resolved from the working fluid onto a surface of the cathode plate facing the anode plate, wherein the magnetic deposition comprises a product and a half-reactant.

2. The electrolysis device according to claim 1, wherein the product is a metal and the half-reactant is a metal compound.

3. The electrolysis device according to claim 1, wherein an orthographic projection range of the magnetic component falls within an orthographic projection range of the cathode plate.

4. The electrolysis device according to claim 1, wherein in a flowing direction of the working fluid, a length of the magnetic component is less than a length of the cathode plate.

5. The electrolysis device according to claim 4, wherein a distance from a first edge of the magnetic component to a first edge of the cathode plate is greater than a thickness of the magnetic component.

6. The electrolysis device according to claim 1, wherein the magnetic component is set to multiple.

7. The electrolysis device according to claim 1, further comprising: an electrical insulation layer, disposed along an outer circumference of the magnetic component.

8. A stirring deposition equipment, comprising: a stirring tank, filled with a working fluid; an electrolysis device according to claim 1; and a stirring rod, tilted at an angle relative to a tank bottom of the stirring tank, extending into the stirring tank, and immersed in the working fluid, wherein the anode plate of the electrolysis device is disposed in the stirring tank, and the cathode plate and the magnetic component of the electrolysis device are disposed at an end of the stirring rod extending into the stirring tank; and a rotating electrode, connected to the stirring rod.

9. The stirring deposition equipment according to claim 8, wherein a range of the angle of the stirring rod tilted relative to the tank bottom of the stirring tank is between 0 and 60 degrees.

10. The stirring deposition equipment according to claim 8, further comprising: a heater, disposed on one side of the stirring tank, wherein the side where the heater is disposed is different from a side where the stirring rod extends into the stirring tank.

11. A circulating deposition system, wherein a working fluid circulates in the circulating deposition system, and in a flowing direction of the working fluid, the circulating deposition system comprises: a stirring tank, filled with the working fluid; a stirring rod, extending into the stirring tank and immersed in the working fluid; an electrolysis device, comprising: a plating tank, an anode plate, a cathode plate, and a magnetic component, wherein the cathode plate is disposed at a tank bottom of the plating tank, the anode plate is disposed corresponding to the cathode plate, and the magnetic component is disposed outside the tank bottom of the plating tank; a first pump; and a pipeline, connecting the stirring tank, the plating tank, and the first pump, wherein the working fluid that flows between the anode plate and the cathode plate undergoes an oxidation-reduction reaction between the anode plate and the cathode plate, and the magnetic component attaches a magnetic deposition resolved from the working fluid onto a surface of the cathode plate facing the anode plate, wherein the magnetic deposition comprises a product and a half-reactant.

12. The circulating deposition system according to claim 11, wherein a longitudinal direction of the anode plate is perpendicular to a vertical direction of the cathode plate.

13. The circulating deposition system according to claim 11, further comprising: a cleaning tank, connected to the plating tank and the first pump.

14. The circulating deposition system according to claim 13, further comprising: a second pump, disposed between the cleaning tank and the plating tank.

15. The circulating deposition system according to claim 13, further comprising: a valve, disposed between the cleaning tank and the plating tank.

16. The circulating deposition system according to claim 11, further comprising: a plurality of valves, wherein a first valve is disposed between the stirring tank and the plating tank, and a second valve is disposed between the first pump and the stirring tank.

17. The circulating deposition system according to claim 11, wherein the product is a metal and the half-reactant is a metal compound.

18. The circulating deposition system according to claim 11, further comprising: a heater, disposed in the stirring tank.

19. An electrolysis method for electro-precipitating a magnetic deposition, comprising: providing an electrolysis device, wherein the electrolysis device comprises an anode plate, a cathode plate disposed corresponding to the anode plate, and a magnetic component disposed on a side of the cathode plate relatively away from the anode plate, wherein an oxidation-reduction reaction occurs when a working fluid flows through the anode plate and the cathode plate, and the magnetic component attaches the magnetic deposition resolved from the working fluid onto a surface of the cathode plate facing the anode plate, wherein the magnetic deposition comprises a product and a half-reactant.

20. The electrolysis method according to claim 19, wherein in a flowing direction of the working fluid, a length of the magnetic component is made less than a length of the cathode plate.

21. The electrolysis method according to claim 19, wherein a distance from a first edge of the magnetic component to a first edge of the cathode plate is made greater than a thickness of the magnetic component.

22. The electrolysis method according to claim 19, wherein the magnetic component is set to multiple.

23. The electrolysis method according to claim 19, wherein the product is a metal and the half-reactant is a metal compound.

Description

BRIEF DESCRIPTION OF DRAWINGS

[0008] FIG. 1 is a schematic view of the electrolysis device according to the disclosure.

[0009] FIG. 2 is a schematic view of the electrolysis device in FIG. 1 which further includes the electrical insulation layer.

[0010] FIG. 3A is a schematic view where the magnetic component is set to multiple.

[0011] FIG. 3B is a schematic view of the electrolysis device in FIG. 3A which further includes the electrical insulation layer.

[0012] FIG. 3C to FIG. 3E are schematic views of multiple magnetic components 13 in FIG. 3A arranged in different arrays.

[0013] FIG. 4 is a schematic view of the stirring deposition equipment according to the second embodiment of the disclosure.

[0014] FIG. 5 is a schematic view of the circulating deposition system according to the third embodiment of the disclosure.

DETAILED DESCRIPTION

The First Embodiment

[0015] FIG. 1 is a schematic view of the electrolysis device according to the disclosure. Referring to FIG. 1, an electrolysis device 10 of the disclosure is adapted for being electrically connected to a power supply device 18 to electro-precipitate a magnetic deposition M in a working fluid F. The working fluid F is a mixture containing iron mineral (hematite . . . ), sodium hydroxide (NaOH), and water (H.sub.2O). This electrolysis device 10 includes an anode plate 11, a cathode plate 12, and a magnetic component 13. The cathode plate 12 and the anode plate 11 are disposed correspondingly, and the magnetic component 13 is disposed on a side of the cathode plate 12 relatively away from the anode plate 11. The working fluid F flows between the anode plate 11 and the cathode plate 12, and an oxidation-reduction reaction occurs between the anode plate 11 and the cathode plate 12. The magnetic component 13 attaches the magnetic deposition M resolved from the working fluid F onto a surface of the cathode plate 12 facing the anode plate 11. The magnetic deposition M includes a product P and a half-reactant H. The above-mentioned product P is a metal (e.g., iron (Fe)), and the half-reactant His a metal compound (e.g., iron(II,III) oxide (Fe.sub.3O.sub.4)). It should be noted that the half-reactant H is a physical substance, and in the drawings of the disclosure, the half-reactant H is represented by a dotted circle.

[0016] In this embodiment, the magnetic component 13 is a permanent magnet or an electromagnet, and when the magnetic component 13 is an electromagnet, the magnetic force of the electromagnet may be controlled by controlling the current flowing through the electromagnet.

[0017] The above-mentioned cathode plate 12 has a first edge 121 and a second edge 122, and the magnetic component 13 also has a first edge 131 and a second edge 132, the first edge 131 of the magnetic component 13 is disposed corresponding to the first edge 121 of cathode plate 12, and the second edge 132 of the magnetic component 13 is disposed corresponding to the second edge 122 of the cathode plate 12. In this embodiment, an orthographic projection range of the magnetic component 13 falls within an orthographic projection range of the cathode plate 12. That is, in a flowing direction of the working fluid F, a length of the magnetic component 13 is less than a length of the cathode plate 12.

[0018] Specifically, a distance g1 is provided from the first edge 131 of the magnetic component 13 to the first edge 121 of the cathode plate 12, and a distance g2 is provided from the second edge 132 of the magnetic component 13 to the second edge 122 of the cathode plate 12. By providing the distances g1 and g2, the magnetic deposition M may be prevented from being concentratedly deposited at the edges of the cathode plate 12.

[0019] In addition, the distance g1 from the first edge 131 of the magnetic component 13 to the first edge 121 of the cathode plate 12 may be the same as the distance g2 from the second edge 132 of the magnetic component 13 to the second edge 122 of the cathode plate 12. The distances g1 and g2 may be adjusted to be different according to actual needs.

[0020] Accordingly, in this embodiment, the distance g1 from the first edge 131 of the magnetic component 13 to the first edge 121 of the cathode plate 12 is greater than a thickness t of the magnetic component 13. In other words, the range of the magnetic field provided by the magnetic component 13 is smaller than the range of the electric field formed after the electrolysis device 10 is energized.

[0021] Continuing to refer to FIG. 1, when using the above-mentioned electrolysis device 10 for electrolysis, the electrolysis device 10 is energized and the working fluid F flows between the anode plate 11 and the cathode plate 12. This working fluid F is a mud mixture (hereinafter referred to as mud) containing iron oxide, sodium hydroxide (NaOH), and water (H.sub.2O). The oxidation-reduction reaction occurs when the mud flows through the anode plate 11 and the cathode plate 12, and the magnetic component 13 attaches the magnetic deposition M resolved from the working fluid F onto a surface of the cathode plate 12 facing the anode plate 11. This magnetic deposition M includes the half-reactant H, which is the iron(II,III) oxide (Fe.sub.3O.sub.4), and the product P, which is iron.

[0022] It may be seen from FIG. 1 that by disposing of the magnetic component 13 on the side of the cathode plate 12 relatively away from the anode plate 11, the magnetic deposition M resolved through the oxidation-reduction reaction is attracted by the magnetic force of the magnetic component 13 and deposited on the surface of the cathode plate 12 facing the anode plate 11. Other by-products produced by the oxidation-reduction reaction, such as oxygen and electrolyzed water hydrogen, are taken away by the flowing working fluid F.

[0023] Compared to the electrolysis device 10 without the magnetic component 13, since the working fluid F continuously flows into the area between the anode plate 11 and the cathode plate 12, the working fluid F washes away a part of the magnetic deposition M deposited on the surface of the cathode plate 12. In contrast, in the electrolysis device 10 of this embodiment, by disposing of the magnetic component 13, the magnetic deposition M (including the iron product P and the half-reactant H) resolved by the oxidation-reduction reaction is attracted by the magnetic force of the magnetic component 13 and may resist being washed away by the working fluid F to be deposited on the surface of the cathode plate 12 facing the anode plate 11.

[0024] However, it should be noted that since the electromagnetism may influence or convert each other, in order to prevent the magnetic force of the magnetic component 13 from affecting the electric field, the electrolysis device 10 further includes an electrical insulation layer 14.

[0025] FIG. 2 is a schematic view of the electrolysis device 10 in FIG. 1 which further includes the electrical insulation layer 14. Referring to FIG. 2, the electrolysis device 10 further includes an electrical insulation layer 14 wrapped around the outer circumference of the magnetic component 13. The configuration of the electrical insulation layer 14 may isolate the influence of the electric field on the magnetic force, thereby avoiding the instability of the current affecting the magnetic force and making the efficiency of the electrolysis output unstable.

[0026] FIG. 3A is a schematic view where the magnetic component 13 is set to multiple, and FIG. 3B is a schematic view of the electrolysis device 10 in FIG. 3A which further includes the electrical insulation layer 14. Referring to FIG. 3A and FIG. 3B at the same time, the amount of the magnetic component 13a set in this embodiment is not limited to one as shown in the embodiment of FIG. 1, but may be set to multiple. These magnetic components 13a are arranged in an array, and the outer circumference of each of the magnetic components 13a may also be wrapped with an electrical insulation layer 14a.

[0027] FIG. 3C to FIG. 3E are schematic views of multiple magnetic components 13 in FIG. 3A arranged in different arrays. The above-mentioned magnetic components 13a may be arranged in an array as shown in FIG. 3C, in a staggered array as shown in FIG. 3D, or in a ring-shaped array as shown in FIG. 3E. Those skilled in the art may know from the foregoing that the arrangement of the magnetic components 13a may be varied in accordance with actual needs. It should be noted that the magnetic components 13a in FIG. 3C to FIG. 3E are shown as lines schematically and are not the actual shapes of the real magnetic components 13a.

The Second Embodiment

[0028] FIG. 4 is a schematic view of the stirring deposition equipment according to the second embodiment of the disclosure. Referring to FIG. 4, the stirring deposition equipment 20 of this embodiment includes a stirring tank 21, an electrolysis device 10b, a stirring rod 22, and a rotating electrode 23.

[0029] Specifically, the working fluid F is filled in the stirring tank 21, and the anode plate 11 of the electrolysis device 10b is fixed in the stirring tank 21. The stirring rod 22 is tilted at an angle relative to a tank bottom of the stirring tank 21, extends into the stirring tank 21, and is immersed in the working fluid F. A range of the angle of the stirring rod 22 tilted relative to the tank bottom of the stirring tank 21 is between 0 and 60 degrees. The cathode plate 12 and the magnetic component 13 of the electrolysis device 10b are disposed at an end of the stirring rod 22 extending into the stirring tank 21.

[0030] When the stirring deposition equipment 20 starts to operate, the electrolysis device 10b and the rotating electrode 23 are energized. The rotating electrode 23 drives the stirring rod 22 to rotate and stir the working fluid F in the stirring tank 21. The electrolysis device 10b causes the working fluid F to undergo an oxidation-reduction reaction in the stirring tank 21 to resolve the magnetic deposition M, such as the half-reactant H, which is the iron(II,III) oxide (Fe.sub.3O.sub.4), and the product P, which is iron. These magnetic deposition M are deposited on the cathode plate 12.

[0031] In particular, the magnetic component 13 is disposed on the side of the cathode plate 12 opposite to the side to which the stirring bar 22 is connected. Thus, the magnetic component 13 may effectively attract and arrange the product P and a small amount of the half-reactant H electro-precipitated from the oxidation-reduction reaction on the cathode plate 12 in a relatively dense structure.

[0032] In this embodiment, the rotating electrode 23 and the electrolysis device 10b may be electrically connected to the same power supply device 18 to be driven simultaneously. However, in other embodiments, the rotating electrode 23 and the electrolysis device 10b may be electrically connected to different power supply devices 18 to be driven separately, or electrically connected to the same power supply device 18 but individually driven by different control switches.

[0033] In addition, a heater 24 is provided on the bottom side of the stirring tank 21 of this embodiment, where the heater 24 is configured to heat the working fluid F to improve the fluidity of the working fluid F. Although this embodiment takes the heater 24 provided on the bottom side of the stirring tank 21 as an example, it is not limited thereto. The heater 24 may also be provided at any of the four side walls of the heater 24 connected to the bottom. Certainly, the amount of the heater 24 is not limited to one, as in the example in this embodiment, and the amount of heater 24 may also be more than one.

The Third Embodiment

[0034] FIG. 5 is a schematic view of the circulating deposition system according to the third embodiment of the disclosure. Referring to FIG. 5, a circulating deposition system 30 of this embodiment is adapted for circulating the working fluid F therein. In the flowing direction of the working fluid F, the circulating deposition system 30 includes a stirring tank 31, a stirring rod 32, an electrolysis device 10c, a first pump P1, and a pipeline 35.

[0035] Accordingly, the stirring tank 31 is filled with the working fluid F. The working fluid F is a mixture containing iron mineral (hematite . . . ), sodium hydroxide (NaOH), and water (H.sub.2O). The stirring rod 32 extends into the stirring tank 31 and is immersed in the working fluid F. The electrolysis device 10c includes a plating tank 15, an anode plate 11, a cathode plate 12, and a magnetic component 13. The cathode plate 12 is disposed at a tank bottom of the plating tank 15, the anode plate 11 is disposed corresponding to the cathode plate 12, and the magnetic component 13 is disposed outside the tank bottom of the plating tank 15. The pipeline 35 is connected to the stirring tank 31, the plating tank 15, and the first pump P1. The working fluid F that flows between the anode plate 11 and the cathode plate 12 undergoes an oxidation-reduction reaction between the anode plate 11 and the cathode plate 12. The magnetic component 13 attaches the magnetic deposition M (as shown in FIG. 1) resolved from the working fluid F onto a surface of the cathode plate 12 facing the anode plate 11. The resolved magnetic deposition M includes the half-reactant H, which is the iron(II,III) oxide (Fe.sub.3O.sub.4), and the product P, which is iron.

[0036] In this embodiment, the longitudinal direction L1 of the anode plate 11 is perpendicular to the longitudinal direction L2 of the cathode plate 12. In other words, multiple anode plates 11 are arranged along the longitudinal direction L2 of the cathode plate 12.

[0037] In addition, the circulating deposition system 30 further includes multiple valves V1, V2, V3, and V4, of which the first valve V1 is disposed between the stirring tank 31 and the plating tank 15, and the second valve V2 is disposed between the first pump P1 and the stirring tank 31. The configuration of the first valve VI and the second valve V2 may not only control the flow rate of the working fluid F in the pipeline 35, but also prevent the backflow of the working fluid F.

[0038] Incidentally, the circulating deposition system 30 may further include a heater 36, which is disposed at the stirring tank 31. The heater 36 is disposed in the stirring tank 31, but is not limited thereto. The position and amount of the heater 36 may also be the same as the position and amount of the heater 24 in the second embodiment.

[0039] Referring to FIG. 1 and FIG. 5 together, when the circulating deposition system 30 is operating, the first valve V1 of the stirring tank 31 is opened so that the working fluid F may flow from the stirring tank 31 into the plating tank 15 for oxidation-reduction reaction to electro-precipitate the magnetic deposition M, then the working fluid F flows out from the plating tank 15 and flows through the pipeline 35 to the first pump P1, and then passes through the second valve V2 and returns to the stirring tank 31.

[0040] It may be seen from the above that since the working fluid F flows out from the plating tank 15 and then flows back into the stirring tank 31 through the first pump P1, the working fluid F may be continuously reused, which is environmentally friendly.

[0041] In addition, when the working fluid F flows into the plating tank 15 and flows between the cathode and the anode, an oxidation-reduction reaction occurs and the magnetic deposition M, such as the product P of iron and the half-reactant H of the iron(II,III) oxide (Fe.sub.3O.sub.4), is electro-precipitated. In the electro-precipitated magnetic deposition M, most of the product P and a small amount of the half-reactant H are deposited on the surface of the cathode plate 12 facing the anode plate 11.

[0042] Through the arrangement of the magnetic component 13, the magnetic deposition M electro-precipitated from the oxidation-reduction reaction may be deposited on the surface of the cathode plate 12 in a relatively dense structure. In addition, the magnetic force of the magnetic component 13 may attract the magnetic deposition M present in the working fluid F, reducing the amount of the magnetic deposition M carried away by the working fluid F due to the flow.

[0043] In addition, the circulating deposition system 30 may further include a cleaning tank 37 connected to the plating tank 15 and the first pump P1, a second pump P2 disposed between the cleaning tank 37 and the plating tank 15, a third valve V3 disposed between the cleaning tank 37 and the plating tank 15, and a fourth valve V4 disposed between the first pump P1 and the cleaning tank 37.

[0044] The cleaning tank 37 provides a second working fluid F2. The second working fluid F2 flows out from the cleaning tank 37, passes through the second pump P2 and the third valve V3, and then enters the plating tank 15 to wash the cathode plate 12 on which the magnetic deposition M is deposited. Afterwards, the second working fluid F2 flows out from the plating tank 15 and flows back to the cleaning tank 37 through the first pump P1 and the fourth valve V4.

[0045] To sum up, the electrolysis device and the electrolysis method in the disclosure may use the magnetic force to attract the magnetic deposition (including the product and the half-reactant) electro-precipitated from the working fluid through the configuration of the magnetic component, thereby effectively improving the efficiency of magnetic deposition on the cathode plate. In addition, the influence of the magnetic force allows the magnetic deposition to be deposited on the cathode plate with a denser structure, thereby improving the deposition effect. Thus, the stirring deposition equipment and the circulating deposition system using this electrolysis device and electrolysis method may effectively increase the output efficiency.