MULTIPOLE LENS AND CHARGED PARTICLE BEAM DEVICE
20250232944 ยท 2025-07-17
Inventors
- Shun KIZAWA (Tokyo, JP)
- Kohei SUZUKI (Tokyo, JP)
- Daisuke BIZEN (Tokyo, JP)
- Yuzuru MIZUHARA (Tokyo, JP)
- Shunsuke Mizutani (Tokyo, JP)
- Takafumi MIWA (Tokyo, JP)
Cpc classification
H01J37/147
ELECTRICITY
H01J37/153
ELECTRICITY
International classification
Abstract
A multipole lens includes a hollow cylindrical non-magnetic bobbin provided with a plurality of slits, and a metal wire. The plurality of slits are disposed such that a central angle between adjacent slits is (360/12N), N being a natural number. Winding numbers of the metal wire in the plurality of slits are equal. When a cross section of the non-magnetic bobbin orthogonal to a longitudinal direction of the slits is divided into an even number of regions having an equal central angle and including two or more of the slits, directions in which the metal wire passes through the slits provided in the region are same, and a direction in which the metal wire passes through the slits provided in the adjacent region is reversed.
Claims
1. A multipole lens comprising: a hollow cylindrical non-magnetic bobbin provided with a plurality of slits; and a metal wire, wherein the non-magnetic bobbin includes a slit portion provided with the plurality of slits and first and second circumferential portions provided to sandwich the slit portion, the plurality of slits are disposed such that a central angle between adjacent slits is (360/12N), N being a natural number, the metal wire is wound around the non-magnetic bobbin so as to repeat passing through a certain slit among the plurality of slits from the first circumferential portion toward the second circumferential portion, moving from the certain slit along the second circumferential portion to another slit among the plurality of slits, passing through the other slit from the second circumferential portion toward the first circumferential portion, and moving from the other slit along the first circumferential portion to still another slit among the plurality of slits, winding numbers of the metal wire in the plurality of slits are equal, and when a cross section of the non-magnetic bobbin orthogonal to a longitudinal direction of the slits is divided into an even number of regions having an equal central angle and including two or more of the slits, directions in which the metal wire passes through the slits provided in the region are same, and a direction in which the metal wire passes through the slits provided in the adjacent region is reversed.
2. The multipole lens according to claim 1, wherein among the slits provided in the region, a central angle between the metal wire in two slits closest to a boundary between the adjacent regions is in a range of 603, and the metal wire is wound n.sub.1 times per slit, n.sub.1 being a natural number.
3. The multipole lens according to claim 1, wherein among the slits provided in the region, a central angle between the metal wire in two slits closest to a boundary between the adjacent regions is in a range of 903, and the metal wire is wound n.sub.2 times per slit, n.sub.2 being a natural number.
4. The multipole lens according to claim 1, wherein a first metal wire and a second metal wire are superimposed on each other as the metal wire wound around the non-magnetic bobbin, and a central angle of the region defining a passing direction of the first metal wire through the slit is different from a central angle of the region defining a passing direction of the second metal wire through the slit.
5. The multipole lens according to claim 4, wherein the central angle of the region for the first metal wire divides the cross section of the non-magnetic bobbin into six or four sections, and the central angle of the region for the second metal wire divides the cross section of the non-magnetic bobbin into two sections.
6. The multipole lens according to claim 4, wherein the central angle of the region for the first metal wire divides the cross section of the non-magnetic bobbin into six sections, and the central angle of the region for the second metal wire divides the cross section of the non-magnetic bobbin into four sections.
7. The multipole lens according to claim 6, wherein a third metal wire is further superimposed as the metal wire wound around the non-magnetic bobbin, and a central angle of the region for the third metal wire divides the cross section of the non-magnetic bobbin into two sections.
8. The multipole lens according to claim 5, further comprising: a deflection electrode disposed in the non-magnetic bobbin.
9. A charged particle beam device comprising: a sample stage on which a sample is to be mounted; a charged particle beam optical system including an image shift deflector that moves an irradiation point of a charged particle beam on the sample, and the multipole lens according to claim 1; an image shift deflector controller configured to control the image shift deflector; and a multipole lens controller connected to the metal wire of the multipole lens and configured to control generation of a multipole field in the multipole lens.
10. The charged particle beam device according to claim 9, wherein a central angle of the region for the metal wire divides the cross section of the non-magnetic bobbin into six sections, and the multipole lens controller is configured to control the multipole lens in conjunction with the image shift deflector controller such that a deflection coma aberration generated by the image shift deflector is cancelled by a deflection coma aberration generated by the multipole lens.
11. The charged particle beam device according to claim 9, further comprising: a retarding voltage source configured to apply a retarding voltage to the sample; and a sample stage controller configured to control the sample stage, wherein the central angle of the region for the metal wire divides the cross section of the non-magnetic bobbin into six sections, and the multipole lens controller is configured to control the multipole lens based on stage coordinates managed by the sample stage controller such that a deflection coma aberration generated when an end portion of the sample is observed is cancelled by a deflection coma aberration generated by the multipole lens.
12. The charged particle beam device according to claim 9, further comprising: a deflection coil controller; and a deflection electrode controller, wherein the charged particle beam optical system includes an ExB filter including a deflection coil and a deflection electrode, the deflection coil controller is configured to control the deflection coil, and the deflection electrode controller is configured to control the deflection electrode, the deflection coil controller and the deflection electrode controller are configured to control the ExB filter such that a Wien condition is satisfied and a deflection color aberration generated by the image shift deflector is cancelled by a deflection color aberration generated by the ExB filter, the central angle of the region for the metal wire divides the cross section of the non-magnetic bobbin into six sections, and the multipole lens controller is configured to control the multipole lens in conjunction with the image shift deflector controller, the deflection coil controller, and the deflection electrode controller such that a deflection coma aberration generated by the image shift deflector and the ExB filter is cancelled by a deflection coma aberration generated by the multipole lens.
13. The charged particle beam device according to claim 9, further comprising: a deflection coil controller; and a deflection electrode controller, wherein a first metal wire and a second metal wire are superimposed on each other as the metal wire wound around the non-magnetic bobbin, a central angle of the region for the first metal wire divides the cross section of the non-magnetic bobbin into six sections, a central angle of the region for the second metal wire divides the cross section of the non-magnetic bobbin into two sections, a deflection electrode is disposed in the non-magnetic bobbin, and the multipole lens is an ExB filter-mounted hexapole lens, the deflection coil controller is connected to the second metal wire and is configured to control generation of a deflection field in the ExB filter-mounted hexapole lens, and the deflection electrode controller is configured to control the deflection electrode, the multipole lens controller is connected to the first metal wire, the deflection coil controller and the deflection electrode controller are configured to control the ExB filter such that a Wien condition is satisfied and a deflection color aberration generated by the image shift deflector is cancelled by a deflection color aberration generated by the ExB filter, and the multipole lens controller is configured to control generation of a hexapole field in conjunction with the image shift deflector controller, the deflection coil controller, and the deflection electrode controller such that a deflection coma aberration generated by the image shift deflector and the ExB filter is cancelled by a deflection coma aberration generated by the ExB filter-mounted hexapole lens.
14. The charged particle beam device according to claim 9, wherein a central angle of the region for the metal wire divides the cross section of the non-magnetic bobbin into four sections, and the multipole lens controller is configured to control the multipole lens in conjunction with the image shift deflector controller such that a deflection astigmatism caused by image shift deflection of the charged particle beam is cancelled by a deflection astigmatism generated by the multipole lens.
15. A multipole lens comprising: a hollow cylindrical non-magnetic bobbin provided with a plurality of slits; and a metal wire, wherein the non-magnetic bobbin includes a slit portion provided with the plurality of slits and first and second circumferential portions provided to sandwich the slit portion, the plurality of slits are disposed such that a central angle between adjacent slits is (360/12N), N being a natural number, the metal wire is wound around the non-magnetic bobbin so as to repeat passing through a certain slit among the plurality of slits from the first circumferential portion toward the second circumferential portion, moving from the certain slit along the second circumferential portion to another slit among the plurality of slits, passing through the other slit from the second circumferential portion toward the first circumferential portion, and moving from the other slit along the first circumferential portion to still another slit among the plurality of slits, a first metal wire, a second metal wire, and a third metal wire are superimposed as the metal wire wound around the non-magnetic bobbin, when a cross section of the non-magnetic bobbin orthogonal to a longitudinal direction of the slits is divided into 12 regions having an equal central angle and including one or more of the slits, the 12 regions are defined as first to twelfth regions in order along a circumferential direction of the non-magnetic bobbin, a direction from the first circumferential portion toward the second circumferential portion along the slit is defined as a first direction, and a direction from the second circumferential portion toward the first circumferential portion along the slit is defined as a second direction, and n.sub.3 is a natural number, the first metal wire is wound 3n.sub.3 times in the first direction in the slits provided in the first region, is wound 3n.sub.3 times in the first direction in the slits provided in the fourth region, is wound 3n.sub.3 times in the second direction in the slits provided in the seventh region, and is wound 3n.sub.3 times in the second direction in the slits provided in the tenth region, the second metal wire is wound 2n.sub.3 times in the first direction in the slits provided in the second region, is wound n.sub.3 times in the first direction in the slits provided in the third region, is wound 2n.sub.3 times in the second direction in the slits provided in the fifth region, is wound n.sub.3 times in the first direction in the slits provided in the sixth region, is wound 2n.sub.3 times in the second direction in the slits provided in the eighth region, is wound n.sub.3 times in the second direction in the slits provided in the ninth region, is wound 2n.sub.3 times in the first direction in the slits provided in the eleventh region, and is wound n.sub.3 times in the second direction in the slits provided in the twelfth region, and the third metal wire is wound n.sub.3 times in the first direction in the slits provided in the second region, and is wound 2n.sub.3 times in the first direction in the slits provided in the third region, is wound n.sub.3 times in the second direction in the slits provided in the fifth region, is wound 2n.sub.3 times in the first direction in the slits provided in the sixth region, is wound n.sub.3 times in the second direction in the slits provided in the eighth region, is wound 2n.sub.3 times in the second direction in the slits provided in the ninth region, is wound n.sub.3 times in the first direction in the slits provided in the eleventh region, and is wound 2n.sub.3 times in the second direction in the slits provided in the twelfth region.
16. The multipole lens according to claim 15, further comprising: a deflection electrode disposed in the non-magnetic bobbin.
17. A charged particle beam device comprising: a sample stage on which a sample is to be mounted; a charged particle beam optical system including an image shift deflector configured to move an irradiation point of a charged particle beam on the sample, and the multipole lens according to claim 15; an image shift deflector controller configured to control the image shift deflector; a first controller connected to the first metal wire of the multipole lens; a second controller connected to the second metal wire of the multipole lens; and a third controller connected to the third metal wire of the multipole lens, wherein in a hexapole field generation mode in which a hexapole field is generated in the multipole lens, the first controller is configured to apply a first direct current to the first metal wire, and the second controller and the third controller are configured to respectively apply a second direct current to the second metal wire and the third metal wire, the second direct current having a current amount same as the first direct current and having a reverse direction with respect to the first direct current, and in a dipole field generation mode in which a dipole field is generated in the multipole lens, the first controller and the second controller are configured to respectively apply a third direct current to the first metal wire and the second metal wire in a same direction with a same current amount, and the third controller does not apply a direct current to the third metal wire.
Description
BRIEF DESCRIPTION OF DRAWINGS
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DESCRIPTION OF EMBODIMENTS
[0050] The present disclosure proposes a saddle-coil type multipole lens having a simple configuration and capable of operating at a high speed by winding a metal wire around a hollow cylindrical non-magnetic bobbin provided with a plurality of slits at equal angles while reversing a direction at every predetermined angle, and a charged particle beam device using the multipole lens.
Embodiment 1
[0051]
[0052] In the embodiment, in order to generate both a quadrupole field and a hexapole field at least, the number of slits provided in the bobbin 101 is a multiple of 12, which is a least common multiple of 4 and 6.
[0053] The bobbin 101 is made of a non-magnetic material and has no core. Accordingly, it is possible to avoid a response delay specific to a magnetic material. In addition, the metal wire is insulation-coated so as not to be electrically conducted by contact between the metal wires or between the metal wire and the bobbin 101.
[0054]
[0055]
[0056] According to the table of
[0057]
[0058]
[0059] According to the table of
[0060] As described above, the multipole lens that generates the hexapole field and the multipole lens that generates the quadrupole field can be implemented by changing the winding number distribution of the coil.
[0061] The winding method of the metal wire (coil) in the multipole lens according to the embodiment will be described.
Modification 1
[0062]
[0063] In the multipole lens (quadrupole lens-superimposed hexapole lens) 401, both the quadrupole field and the hexapole field can be generated simultaneously and independently. Although
Modification 2
[0064]
[0065] The multipole lens according to Modification 2 can virtually shift a lens center of the multipole field by superimposing a deflection field. When the multipole lens has an assembly error or a processing error, the lens center may deviate from an optical axis. This problem can be solved by superimposing the deflection fields as in Modification 2.
Modification 3
[0066]
[0067] The multipole lens 601a functions as a hexapole field lens and an ExB filter, the multipole lens 601b functions as a quadrupole field lens and an ExB filter, and the multipole lens 601c functions as a hexapole field lens, a quadrupole field lens, and an ExB filter.
Embodiment 2
[0068] A charged particle beam device in which the multipole lens described in Embodiment 1 is mounted will be described as Embodiment 2.
First Example
[0069] A first example is a charged particle beam device on which a hexapole lens for correcting a deflection coma aberration during image shift deflection is mounted. Each of the charged particle beam devices in
[0070] A charged particle beam 702 generated by a charged particle source 701 passes through the hexapole lens 201 (
[0071] The hexapole lens metal wire 202 forming the hexapole lens 201 or the deflection coil-superimposed hexapole lens 501a is connected to a hexapole lens controller 709, the image shift deflector 703 is connected to an image shift deflector controller 710, and the deflection coil 502 forming the deflection coil-superimposed hexapole lens 501a is connected to a deflection coil controller 711.
[0072] With respect to the deflection coma aberration caused by the image shift deflection, a reversed deflection coma aberration is generated by the hexapole lens, and the deflection coma aberrations are cancelled out. In order to perform this process in conjunction with image shift deflection, an output of the hexapole lens controller 709 is controlled in conjunction with an output of the image shift deflector controller 710.
[0073] This control condition is expressed by the following (Formula 1), where C.sub.co_IS is a deflection coma coefficient of the objective lens associated with the image shift deflection (objective lens image plane equivalent value), ai is an opening angle of a primary beam on an objective lens image plane, IS=(ISX+iISY) is an image shift deflection amount, C.sub.co_ML is a deflection coma aberration coefficient by the multipole lens (objective lens object plane equivalent value), S.sub.ML is a sensitivity of the multipole lens, I.sub.ML=(I.sub.MLX+iI.sub.MLY) is a use current of the multipole lens, and M is an image magnification of the objective lens.
[0074] In (Formula 1), the first term means a deflection coma aberration generated by the image shift deflector, and the second term means a deflection coma aberration generated by the multipole lens. In an ideal multipole lens, a dipole field is zero, but since a slit division number N of a bobbin is finite, a minute dipole field is actually generated. Therefore, the sensitivity S.sub.ML of the multipole lens does not become 0, and a relationship between the image shift deflection amount IS and the hexapole lens current I.sub.ML that satisfies (Formula 1) is uniquely determined. Accordingly, by controlling the output of the hexapole lens controller 709 that determines the hexapole lens current I.sub.ML in accordance with the output of the image shift deflector controller 710 that determines the image shift deflection amount IS so as to satisfy this relationship, wide region image shift deflection without a deflection coma aberration can be implemented.
[0075] The deflection coil controller 711 is used to control a current flowing through a deflection coil such that a lens field center of a hexapole lens coincides with an optical axis.
Second Example
[0076] A second example is a charged particle beam device on which a hexapole lens for correcting a deflection coma aberration generated during observation of a wafer end portion is mounted. Each of the charged particle beam devices in
[0077] The charged particle beam 702 generated by the charged particle source 701 passes through the hexapole lens 201 (
[0078] The hexapole lens metal wire 202 forming the hexapole lens 201 or the deflection coil-superimposed hexapole lens 501a is connected to the hexapole lens controller 709, and the deflection coil 502 forming the deflection coil-superimposed hexapole lens 501a is connected to the deflection coil controller 711.
[0079] When a visual field is moved to a wafer end portion of a semi-conductor by movement of the stage, a retarding electric field on the sample 706 is disturbed, and a deflection field or a multipole field is generated. With respect to the deflection coma aberration associated therewith, a reversed deflection coma aberration is generated by the hexapole lens, and the deflection coma aberrations are cancelled out. Since this process is performed in conjunction with the movement of the stage, the output of the hexapole lens controller 709 is controlled in conjunction with the output of the stage controller 801.
[0080] This control condition is expressed by (Formula 2), where P=(PX+iPY) is stage coordinates, and d.sub.co_stage(P) is a deflection coma aberration that is non-linearly generated with respect to the stage coordinates.
[0081] In (Formula 2), the first term means a deflection coma aberration generated according to the stage coordinates, and the second term means a deflection coma aberration generated by the multipole lens. As described above, since the slit division number N of the bobbin is finite, the sensitivity S.sub.ML of the multipole lens does not become 0, and a relationship between stage coordinates P and the hexapole lens current I.sub.ML that satisfies (Formula 2) is uniquely determined. Accordingly, by controlling the output of the hexapole lens controller 709 that determines the hexapole lens current I.sub.ML in accordance with the output of the stage controller 801 that determines the stage coordinates P so as to satisfy this relationship, observation of a wafer end without a deflection coma aberration can be implemented.
Third Example
[0082] A third example is a charged particle beam device on which a hexapole lens for simultaneously correcting both a deflection coma aberration during image shift deflection and a deflection coma aberration generated during observation of a wafer end portion is mounted. Accordingly, the third example has a configuration (
[0083] In order to simultaneously correct both the deflection coma aberration during the image shift deflection and the deflection coma aberration generated during the observation of the wafer end portion, the output of the hexapole lens controller 709 that determines the hexapole lens current I.sub.ML may be controlled in accordance with the output of the image shift deflector controller 710 that determines the image shift deflection amount IS and the output of the stage controller 801 that determines the stage coordinates P such that a relationship (Formula 3) is satisfied.
Fourth Example
[0084] A fourth example is a charged particle beam device on which a hexapole lens and an ExB filter for simultaneously correcting both a deflection coma aberration and a deflection color aberration during image shift deflection is mounted. A configuration in which an ExB filter 1001 and the hexapole lens 201 are disposed in multiple stages (
[0085] In the charged particle beam device in
[0086] In the charged particle beam device in
[0087] Here, the deflection electrode controller 1004 and the deflection coil controller 1005 control a voltage of the deflection electrode 602 and a current of the deflection coil 502 under a condition that the Wien condition is satisfied.
[0088] In order to simultaneously correct both the deflection coma aberration and the deflection color aberration during the image shift deflection, the output of the hexapole lens controller 709 that determines the hexapole lens current I.sub.ML, an output of the deflection electrode controller 1004 that determines a voltage V.sub.ExB of the ExB filter, and an output of the deflection coil controller 1005 that determines a current I.sub.ExB of the ExB filter are controlled according to the output of the image shift deflector controller 710 that determines the image shift deflection amount IS so as to satisfy the following relationships (Formula 4) and (Formula 5). In (Formula 4) and (Formula 5), the following variables are newly defined. [0089] c.sub.Cc_IS: deflection color aberration coefficient of objective lens associated with image shift deflection (objective lens image plane equivalent value) [0090] V.sub.acc: acceleration voltage of primary beam [0091] dV: energy dispersion of primary beam [0092] C.sub.E_: deflection coma aberration coefficient of ExB deflection electrode (objective lens object plane equivalent value) [0093] C.sub.co_B: deflection coma aberration coefficient of ExB deflection coil (objective lens object plane equivalent value) [0094] C.sub.Cc_E: deflection color aberration coefficient of ExB deflection electrode (objective lens object plane equivalent value) [0095] C.sub.Cc_B: deflection color aberration coefficient of ExB deflection coil (objective lens object plane equivalent value) [0096] S.sub.E: deflection sensitivity of ExB deflection electrode [0097] S.sub.B: deflection sensitivity of ExB deflection coil
[0098] In (Formula 4), the first term and the second term on the left side respectively mean the deflection coma aberration and the deflection color aberration caused by the image shift deflection. In addition, the third term on the left side means the deflection coma aberration by the hexapole lens, and the fourth term and the fifth term on the left side respectively mean the deflection coma aberration and the deflection color aberration by the ExB filter. When the relationship (Formula 4) is satisfied, the deflection coma aberration and the deflection color aberration caused by the image shift deflection are simultaneously corrected by the hexapole lens and the ExB filter. In addition, (Formula 5) means the Wien condition. Accordingly, by performing control so as to simultaneously satisfy (Formula 4) and (Formula 5), the deflection coma aberration and the deflection color aberration caused by the image shift deflection can be simultaneously corrected.
Fifth Example
[0099] In a fifth example, the charged particle beam device in the fourth example is functionally extended, and a quadrupole lens is superimposed on a hexapole lens. By mounting the quadrupole lens, it is possible to correct a parasitic deflection astigmatism caused by the hexapole lens or an ExB filter and a deflection astigmatism caused by image shift deflection. A configuration in which the ExB filter 1001 and the quadrupole lens-superimposed hexapole lens 401 are disposed in multiple stages (
[0100] In the charged particle beam device shown in
[0101] In the charged particle beam device shown in
[0102] In order to correct the parasitic deflection astigmatism caused by the hexapole lens and the ExB filter and the deflection astigmatism caused by the image shift deflection, the output of the hexapole lens controller 709 that determines the hexapole lens current I.sub.ML, an output of the quadrupole lens controller 1101 that determines a quadrupole lens current I.sub.ML2, the output of the deflection electrode controller 1004 that determines the voltage V.sub.ExB of the ExB filter, and the output of the deflection coil controller 1005 that determines the current I.sub.ExB of the ExB filter are controlled according to the output of the image shift deflector controller 710 that determines the image shift deflection amount IS so as to simultaneously satisfy (Formula 5) meaning the Wien condition and the following (Formula 6). In (Formula 6), the following variables are newly defined. [0103] C.sub.As: sum of parasitic deflection astigmatism coefficient and deflection astigmatism coefficient in objective lens caused by image shift deflection (objective lens image plane equivalent value) [0104] C.sub.As_ML2: deflection astigmatism coefficient by multipole lens for generating quadrupole field (objective lens object plane equivalent value) [0105] S.sub.ML: sensitivity of multipole lens for generating quadrupole field
[0106] In (Formula 6), the first to fifth terms on the left side mean the same content as the left side of (Formula 5). The sixth term on the left side means the sum of the parasitic deflection astigmatism and the deflection astigmatism caused by the image shift deflection, and the seventh term on the left side means the deflection astigmatism caused by the multipole lens for generating the quadrupole field. When (Formula 6) is satisfied, the deflection coma aberration, deflection color aberration, and deflection astigmatism caused by the image shift deflection and the deflection astigmatism caused by the parasitic aberration are simultaneously corrected by the hexapole lens, the ExB filter, and the quadrupole lens.
Embodiment 3
[0107]
[0108]
[0109] Regarding this, when the dipole field is generated (dipole field generation mode), as shown in the table of
[0110] By providing a deflection electrode inside the bobbin forming the multipole lens according to Embodiment 3, an ExB filter can be formed when the dipole field is generated. With such a configuration, the ExB filter for correcting a deflection color aberration and the hexapole lens for correcting a deflection coma aberration can be switched by switching the control shown in the table of
[0111]
[0112] A metal wire A 1202, a metal wire B 1203, and a metal wire C 1204 forming the dipole field and hexapole field-switched multipole lens 1201 are controlled by different controllers 1205, 1206, and 1207, respectively. When dipole field and hexapole field-switched multipole lens 1201 is operated in the dipole field generation mode, the deflection electrode 602 is controlled by the controller 1004 such that Wien conditions with the dipole field are satisfied.
[0113] According to the charged particle beam device shown in
[0114] Such switching functions of the ExB filter and the hexapole lens can be performed by independently superimposing a coil for generating the dipole field and the hexapole lens, but a total of the winding numbers of the wires can be saved by the embodiment. The saving of the winding numbers is useful for reducing assembly errors due to the superimposing and winding of the coil.
[0115] The invention is not limited to the above-described embodiments, and includes various modifications. The embodiments and the modifications described above are described in detail in order to facilitate understanding of the invention, and the invention is not necessarily limited to those including all the configurations described above. A part of the configurations of one embodiment and one modification may be replaced with configurations of other embodiments and modifications. The configurations of one embodiment and one modification can be added to configurations of other embodiments and modifications. Other configurations may be added to, deleted from, or replaced with a part of the configurations of the embodiments and the modifications.
REFERENCE SIGNS LIST
[0116] 101: bobbin [0117] 201: hexapole lens [0118] 202: hexapole lens metal wire [0119] 301: quadrupole lens [0120] 302: quadrupole lens metal wire [0121] 401: quadrupole lens-superimposed hexapole lens [0122] 501: deflection coil-superimposed multipole lens [0123] 502: deflection coil [0124] 601: ExB filter-mounted multipole lens [0125] 602: deflection electrode [0126] 701: charged particle source [0127] 702: charged particle beam [0128] 703: image shift deflector [0129] 704: imaging deflector [0130] 705: objective lens [0131] 706: sample [0132] 707: sample stage [0133] 708: retarding voltage source [0134] 709: hexapole lens controller [0135] 710: image shift deflector controller [0136] 711: deflection coil controller [0137] 801: stage controller [0138] 1001: ExB filter [0139] 1002: deflection electrode [0140] 1003: deflection coil [0141] 1004: deflection electrode controller [0142] 1005: deflection coil controller [0143] 1101: quadrupole lens controller [0144] 1201: dipole field and hexapole field-switched multipole lens [0145] 1202: metal wire A [0146] 1203: metal wire B [0147] 1204: metal wire C [0148] 1205: controller for metal wire A [0149] 1206: controller for metal wire B [0150] 1207: controller for metal wire C