PACKAGED POWER ELECTRONIC DEVICE, IN PARTICULAR BRIDGE CIRCUIT COMPRISING POWER TRANSISTORS, AND ASSEMBLING PROCESS THEREOF

Abstract

The device has a first support element forming a first thermal dissipation surface and carrying a first power component; a second support element forming a second thermal dissipation surface and carrying a second power component, a first contacting element superimposed to the first power component; a second contacting element superimposed to the second power component; a plurality of leads electrically coupled with the power components through the first and/or the second support elements; and a thermally conductive body arranged between the first and the second contacting elements. The first and the second support elements and the first and the second contacting elements are formed by electrically insulating and thermally conductive multilayers.

Claims

1. A device, comprising: a first contacting element including: a first conductive layer having a plurality of first projections; a first intermediate insulating layer coupled to the first conductive layer; and a second conductive layer coupled to the first intermediate insulating layer; a second contacting element including: a third conductive layer having a plurality of second projections; a second intermediate insulating layer coupled to the third conductive layer; and a fourth conductive layer coupled to the second intermediate insulating layer; a conductive structure between the second conductive layer and the third conductive layer, the conductive structure separates the first contacting element from the second contacting element; a first MOSFET transistor coupled to the first conductive layer, the first MOSFET transistor including a plurality of first windows, and the plurality of first windows receives the plurality of first projections; a second MOSFET transistor coupled to the third conductive layer, the second MOSFET transistor including a plurality of second windows, and the plurality of second windows receives at least some of the plurality of second projections, the second MOSFET transistor separated from the first MOSFET transistor by the first contacting element, the second contacting element, and the conductive structure; and a packaging mass enclosing the first contacting element, the second contacting element, the conductive structure, the first MOSFET transistor, and the second MOSFET transistor.

2. The device of claim 1, wherein the conductive structure is a conductive block.

3. The device of claim 1, wherein the conductive structure is an adhesive mass including a solder material.

4. The device of claim 1, further comprising: a third contacting element coupled to the conductive structure and spaced apart from the first contacting element, the third contacting element spaced apart from the second contacting element by the conductive structure, the third contacting element including: a fifth conductive layer having a plurality of third projections; a third intermediate insulating layer coupled to the fifth conductive layer; and a sixth conductive layer coupled to the third intermediate insulating layer.

5. The device of claim 4, further comprising a third MOSFET transistor coupled to the fifth conductive layer, the third MOSFET transistor including a plurality of third windows, and the plurality of third windows receives the plurality of third projections.

6. The device of claim 5, further comprising a fourth MOSFET transistor coupled to the third conductive layer, the fourth MOSFET transistor including a plurality of fourth windows, and the plurality of fourth windows receives at least some of the plurality of second projections.

7. The device of claim 1, wherein: the first conductive layer of the first contacting element further includes a first bulge spaced apart from the plurality of first projections; and the third conductive layer of the second contacting element further includes a second bulge spaced apart from the plurality of second projections.

8. The device of claim 7, further comprising a support element coupled to first MOSFET transistor and coupled to the first bulge of the first conductive layer of the first contacting element.

9. The device of claim 8, further comprising a supporting region coupled to the second bulge of the third conductive layer.

10. The device of claim 9, further comprising a connection pillar coupled to the supporting region and the support element, and the connection pillar extending form the supporting region to the supporting element.

11. A method, comprising: forming a first assembly including: coupling a first contacting element to a first MOSFET transistor including inserting a plurality of first projections of a first conductive layer of the first contacting element into a plurality of first windows of the first MOSFET transistor; forming a second assembly including: coupling a second contacting element to a second MOSFET transistor including inserting a plurality of second of a second conductive layer of the second contacting element into at least some of the second windows of the second MOSFET transistor; coupling the first assembly to the second assembly including coupling a third conductive layer of the first contacting element opposite to the first conductive layer of the first contacting element to a fourth conductive layer of the second contacting element opposite to the second conductive layer of the second contacting element with a conductive structure.

12. The method of claim 11, wherein forming the first assembly further includes: coupling a supporting element to first MOSFET transistor and coupling the supporting element to a first bulge of the first conductive layer of the first contacting element; and coupling a connection pillar to the supporting element.

13. The method of claim 12, wherein forming the second assembly further includes coupling a supporting region to a second bulge of the second conductive layer of second contacting element.

14. The method of claim 13, wherein coupling the first assembly to the second assembly further includes coupling an end of the connection pillar spaced apart from the supporting element to the supporting region.

15. The method of claim 13, wherein the conductive structure is a conductive block.

16. The method of claim 13, wherein the conductive structure is an adhesive mass of a solder material.

17. A method, comprising: forming a first assembly including: coupling a first MOSFET transistor to a first support element; coupling a second MOSFET transistor to the first support element; arranging a first contacting element to overlap the first MOSFET transistor and the second MOSFET transistor, the first contacting element straddling the first MOSFET transistor and the second MOSFET transistor; and forming a second assembly including: coupling a third MOSFET transistor to a second support element; coupling a fourth MOSFET transistor to the second support element; arranging a first clip element on the third MOSFET transistor; arranging a second clip element on the fourth MOSFET transistor; arranging a second contacting element on the first clip element; and arranging a third contacting element on the second clip element, coupling the first assembly to the second assembly includes coupling the first contacting element to the second contacting element by an adhesive mass of a solder material.

18. The device of claim 17, further comprising, before coupling the first assembly to the second assembly, forming the adhesive mass of the solder material on a side of the first contacting element facing away from the first MOSFET transistor and the second MOSFET transistor.

19. The device of claim 17, further comprising, before coupling the first assembly to the second assembly, forming the adhesive mass of the solder material on a side of the second contacting element facing away from the third MOSFET transistor and the fourth MOSFET transistor.

20. The device of claim 17, wherein forming the second assembly further incudes coupling at least one carrier pillar to the second support element.

Description

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS

[0016] For a better understanding of the present disclosure, embodiments thereof are now described, purely by way of non-limiting example, with reference to the accompanying drawings, wherein:

[0017] FIG. 1 is a perspective top views, with ghost parts, of a known packaged electronic device;

[0018] FIGS. 2A and 2B are perspective top views and, respectively, from below of the packaged electronic device of FIG. 1;

[0019] FIGS. 3A-3I show electric circuit topologies implementable as the packaged electronic device of FIG. 1;

[0020] FIG. 4 shows a full bridge circuit of a known type;

[0021] FIG. 5 is a top view of a possible implementation of the full bridge circuit of FIG. 4, formed similarly to the packaged electronic device of FIG. 1;

[0022] FIG. 6 shows a cross-section of the possible implementation of FIG. 5;

[0023] FIG. 7 shows a full bridge circuit of the type obtainable with the present device;

[0024] FIG. 8 shows a simplified cross-section of a portion of a die integrating a known power MOSFET device usable in the bridge circuit of FIG. 7;

[0025] FIG. 9 is a cross-section of a possible implementation of the present packaged electronic device, taken along line IX-IX of FIG. 10A;

[0026] FIGS. 10A and 10B are plan views of two parts of the device of FIG. 9, in an intermediate manufacturing step;

[0027] FIGS. 11 and 12 are respectively a plan view and a perspective view of a different embodiment of the reciprocal arrangement of some parts of the packaged device of FIG. 9;

[0028] FIG. 13 is an exploded view of the packaged device of FIG. 9;

[0029] FIGS. 14A and 14B are perspective bottom and, respectively, top views of the packaged device of FIG. 9;

[0030] FIGS. 15A-15D are simplified perspective representations of parts of the device of FIG. 9;

[0031] FIGS. 16-19 are cross-sections of different embodiments of a detail of the device of FIG. 9; and

[0032] FIGS. 20A-20D are simplified perspective representations of parts of a different packaged electronic device, similar to FIGS. 15A-15D.

DETAILED DESCRIPTION

[0033] To use an upwardly cooling package similar to that of FIGS. 1, 2A and 2B, arranging the MOSFET transistors 16-19 in the manner shown in FIG. 5 is conceivable, wherein the MOSFET transistors 16-19 are carried by a leadframe 35 provided with leads. FIG. 5 also shows possible electric connections between the terminals/nodes 21-28 and 30-33 of the bridge circuit 15 and the leads. In FIG. 5, for sake of clarity, the leads are identified with the same reference numbers as the respective terminals/nodes of the bridge circuit 15 and are identified with a prime (leads 23-28 and 30-33), except for the supply nodes 21, 22, each of which is coupled to two different leads 21, 21 respectively 22, 22

[0034] In FIG. 5, the leadframe 35, formed as a DBC multilayer, comprises first, second, and third conductive regions 36, 37, and 38, arranged side by side but electrically insulated from each other, carrying the MOSFET transistors 16-19. In particular, the first conductive region 36 carries the first and the third MOSFET transistors 16, 18 arranged side by side and so that the respective drain terminals D are in contact with the first conductive region 36; the second conductive region 37 carries the second MOSFET transistor 17 so that its drain terminal D is in contact with the second conductive region 37; and the third conductive region 38 carries the fourth MOSFET transistor 19 so that its drain terminal D is in contact with the third conductive region 38.

[0035] The driver source pads 30-33 and gate pads 25-28 are arranged on upper surfaces of the MOSFET transistors 16-19, exposed through corresponding openings (not numbered) in respective passivation layers (also not numbered). Bonding wires 40 connect the driver source pads 30-33 and gate pads 25-28 to the respective leads 30-33 and 25-28.

[0036] A first and a second clip 41, 42, L-shaped in a top view, couple source terminals S of the first and, respectively, the third MOSFET transistors 16, 18 to the second and, respectively, the third conductive regions 37, 38, coupled in turn to the leads 23 and, respectively, 24 and thus form the first and the second intermediate nodes 23, 24. Since, with the configuration shown, the MOSFET transistors 16-19 have source terminals S arranged on a different level with respect to the conductive regions 36-38, the first and the second clips 41, 42 have a non-planar shape, shown in the section of FIG. 6 with regards to the first clip 41. However, the same considerations also apply to the second clip 42.

[0037] In detail, the first clip 41 has a first horizontal portion 41A in contact with the source pad of the first MOSFET transistor 16. Additionally, the first clip 41 has a vertical portion 41B, which extends laterally to the first MOSFET transistor 16, insulated therefrom by an insulating layer, not shown, or by the passivation of the die integrating the MOSFET transistor 16; and a second horizontal portion 41C, which extends on the leadframe 35, bonded to the third conductive region 37 and to the lead 23.

[0038] Similarly, the third clip 43 couples the source terminals S of the second and the fourth MOSFET transistors 17, 19 (electrically connected to each other, FIG. 4) to the leads 22, 22 connected to the second supply node 22 of FIG. 5. To this end, see also FIG. 6, the third clip 43 has a first horizontal portion 43A extending over the upper surface of the second and the fourth MOSFET transistors 17, 19, in contact with the source pad thereof; a vertical portion 43B and a horizontal portion 43C bonded to the coupling regions 47, respectively 47 of conductive material, extending between the horizontal portion 43C and a respective lead 22, 22

[0039] However, such a solution, while allowing for cooling from the top, would not be optimal.

[0040] In fact, as the size of the MOSFET transistors 16-19 increases, the packaged device (having the external shape shown in FIGS. 2A and 2B) would occupy a lot of space, and reach unacceptable overall size in some applications. Additionally, in case of high voltages and rapidly switchable currents, the thermal dissipation might not be sufficient.

[0041] FIGS. 7-15D show a device 50 implementing a full bridge circuit 100, similar to the full bridge circuit 15 of FIG. 4 and represented again in FIG. 7 for sake of descriptive simplicity.

[0042] In detail, the device 50 comprises four integrated components, here four MOSFET transistors 51-54 and indicated below as first, second, third and fourth MOSFET transistors 51-54. Each MOSFET transistor 51-54 is integrated in an own die and may be made as shown in FIG. 8.

[0043] In particular, FIG. 8 shows the structure of a charge-balancing (also called superjunction) MOSFET device, briefly described herein below for a better understanding.

[0044] With reference to FIG. 8 (wherein the various regions are not to scale, for clarity), the MOSFET transistor, here the first MOSFET transistor 51 (as well as the other MOSFET devices 52-54) is integrated in a die 220 comprising a body 202 of semiconductor material (typically silicon) having an upper surface 202A, a rear surface 202B and a first conductivity type, for example N. The body 202 defines an active zone 203 and an edge zone 204 and houses a plurality of pillars 206 of a second type of conductivity, here of P-type, among which N-type epitaxial layer zones extend. Body regions 207, here of P-type, extend from the upper surface 202A of the body 202 to the upper end of the pillars 206 arranged in the active zone 203 and accommodate source regions 208, of N-type.

[0045] Gate regions 211 extend above the upper surface 202A of the body 202, between pairs of adjacent pillars 206, that is in a laterally offset manner with respect to the source regions 208, electrically insulated from the body 202 and surrounded by an insulating region 212. A source metallization 213 extends above the active zone 203 of the body 202, over the gate regions 211 (but electrically insulated therefrom), and has contact portions extending towards the upper surface of the body 202, between pairs of adjacent gate regions 211, in direct electric contact with the source regions 208. Portions of the source metallization 213 (one visible in FIG. 8) are accessible from the outside through windows 214 and form source pads 213A for the external electric connection.

[0046] A gate metallization 216, electrically connected to the gate regions 211, extends on the dielectric layers 215 and forms a gate pad 216A for the external electric connection. An upper passivation layer 217 covers the dielectric layers 215, exposing the source pads 213A and the gate pads 216A. A drain metallization 218 extends on the rear surface 202B of the body 202, in direct electric contact with the body 202, covers the entire rear surface 202B and forms a drain terminal D of the MOSFET transistor 51.

[0047] Referring again to FIG. 7, the first and the second MOSFET transistors 51, 52 are reciprocally connected in series between a first and a second supply terminal 101, 102 of the bridge circuit 100; the third and the fourth MOSFET transistors 53, 54 are reciprocally connected in series between the same supply terminals 101, 102. A first intermediate node 103 between the first and the second MOSFET transistors 51, 52 forms a first output terminal and a second intermediate node 104 between the third and the fourth MOSFET transistors 53, 54 forms a second output terminal 104 of the bridge circuit 100.

[0048] In FIG. 7 the gate terminals of the MOSFET transistors 51-54 are further indicated with 105-108 and the driver source terminals of the MOSFET transistors 51-54 with 110-113.

[0049] FIGS. 9, 10A and 10B, 15A-15D show a possible implementation of the device 50. It should be noted that FIGS. 10A and 10B show two parts of the device 50 and the complete device 50 is obtained by flipping one over the other (for example, of the structure of FIG. 10B around a vertical axis of the drawing sheet, extending between the two FIGS. 10A, 10B). Hereinafter, additionally, the device 50 will be described with reference to the spatial position shown in FIG. 9, that is with a first greater surface 50A of the device 50 (generally of a parallelepiped shape) arranged facing downwards (and thus also defined below as the lower surface 50A) and with a second greater surface 50B arranged facing upwards (and thus also defined below as the upper surface 50B). The indications upper, lower, high, low and the like therefore only refer to the spatial position of FIG. 9. The embodiment of FIGS. 9-15D, in particular, refers to a solution wherein the external connection leads project beyond the housing of the device 50 in the lower zone thereof, substantially aligned with the lower surface 50A.

[0050] With reference to FIGS. 9, 10A and 10B, the MOSFET transistors 51-54 are arranged, two by two, on two overlapping levels. In the example considered, the first and third MOSFET transistors 51 and 53 (forming top transistors of the bridge circuit 100) are arranged reciprocally side by side, on an upper level, with the respective drain metallizations 218 facing upwardly. The second and fourth MOSFET transistors 52, 54 are arranged on a lower level, with the respective drain metallizations 218 arranged facing downwardly. The second and fourth MOSFET transistors 52, 54 are carried by a first support element 56; the first and the third MOSFET transistors 51 and 53 are carried by a second support element 57. In the cross-section of FIG. 9 only the first and the second MOSFET transistors 51, 52 are visible.

[0051] First and second alignment and spacing structures 89 and third and fourth alignment and spacing structures 90 extend between the first and the second support elements 56, 57, in proximity to opposite longitudinal ends thereof.

[0052] As shown in FIG. 13, the first support element 56 has a first face 56 coplanar with the first greater surface 50A of the device 50 and a second face 56; the second support element 57 has a first face 57 coplanar with the second greater surface 50B of the device 50 and a second face 57.

[0053] As visible in FIG. 9, the first support element 56 is formed by a DBC (Direct Bonded Copper) multilayer comprising a stack formed by a first conductive layer 56A, typically of copper, a ceramic insulating layer 56B, typically of alumina, and a second conductive layer 56C, typically of copper. Similarly, the second support element 57 is formed by a DBC multilayer comprising a stack formed by a first conductive layer 57B, typically of copper, a ceramic insulating layer 57B, typically of alumina, and a second conductive layer 57C, typically of copper.

[0054] In FIG. 9, the first conductive layer 56A of the first support element 56 is arranged on the bottom and the second conductive layer 56C of the first support element 56 is arranged on the top, while the first conductive layer 57A of the second support element 57 is arranged on the top and the second conductive layer 57C of the second support element 57 is arranged on the bottom.

[0055] The MOSFET transistors 51, 53 are bonded to the second conductive layer 57C of the support element 57 through electrically conductive adhesive regions 61C, 61D and the MOSFET transistors 52, 54 are bonded to the second conductive layer 56C of the support element 56 through electrically conductive adhesive regions 61A, 61B (see also FIG. 13).

[0056] As visible in FIG. 10A, the second conductive layer 56C of the first support element 56 is shaped and forms ten separate conductive regions 58A-58J, forming two first drain conductive regions 58A, 58B, two first gate conductive regions 58C, 58D, two first driver source conductive regions 58E, 58F, two first source regions 58G, 58H and two insulated conductive regions 581, 58J, as discussed in detail below. Respective output leads 59A-59H are bonded to the conductive regions 58A-58H, as explained in detail below.

[0057] In particular, the drain metallizations 218 of the second and fourth MOSFET transistors 52, 54 are bonded respectively to the two first drain conductive regions 58A, 58B. Similarly, the drain leads 59A, 59B, respectively forming the first and second output terminals 103, 104 of the bridge circuit 100, are also bonded respectively to the two first drain conductive regions 58A, 58B. Furthermore, a first and a second connection pillar 67, 68, of conductive material, for example of copper, extend from the first drain conductive regions 58A, 58B towards the second support element 57.

[0058] A first contacting element 60 extends above the second and the fourth MOSFET transistors 52, 54 and electrically connects the source pads 213A (FIG. 8) thereof to each other. The first contacting element 60, arranged straddling the second and the fourth MOSFET transistors 52, 54 and of a size such as to cover only part (for example, here about two thirds) of area thereof, FIG. 10A, is here also a DBC multilayer (also visible in FIG. 12) and comprises a stack formed by a first conductive layer 60A, typically of copper, an intermediate insulating layer 60B, for example, of ceramic, typically of alumina, and a second conductive layer 60C, typically of copper.

[0059] The first conductive layer 60A of the first contacting element 60 is arranged on the bottom and the second conductive layer 60C of the first contacting element 60 is arranged on the top. The first conductive layer 60A of the first contacting element 60 is in direct electric contact with the source pads 213A (FIG. 8) of the second and the fourth MOSFET transistors 52, 54, as shown in FIGS. 16-19 and described hereinafter.

[0060] The first contacting element 60 has a length (in a direction parallel to a first Cartesian axis X) greater than the second and the fourth MOSFET transistors 52, 54 and projects on a side (to the left in FIGS. 9 and 10A) thereto. The portion of the first conductive layer 60A projecting beyond the first and the third transistors 51, 53 is in direct electric contact with coupling regions 64G, 64H, dashed in FIG. 10A, each extending from a respective first source conductive region 58G, 58H and thus electrically coupled to first source leads 59G, 59H. In this manner, through the first conductive layer 60A of the first contacting element 60, the source regions 207 (FIG. 8) of the second and the fourth MOSFET transistors 52, 54 are electrically coupled to each other and to the first source leads 59G, 59H, and these form the second supply terminal 102 of the bridge circuit 100 (FIG. 7).

[0061] A further source pad 213E, not covered by the first contacting element 60 and visible in FIG. 10A, is connected, through a first driver source wire 62E to the first driver source conductive region 58E. Likewise, another further source pad 213F, also not covered by the first contacting element 60 and visible in FIG. 10A, is connected, through another first driver source wire 62F to the other first driver source conductive region 58F. First driver source leads 59E, 59F are bonded to the first driver source conductive regions 58E, 58F and form the driver source terminals 111, 113 of the bridge circuit 100 (FIG. 7).

[0062] The gate pads 216A of the second and the fourth MOSFET transistors 52, 54 also face the upper faces of transistors 52, 54, laterally to the first contacting element 60, and are connected through first gate wires 65C, 65D to the first gate conductive regions 58C, 58D. First gate leads 59C, 59D are bonded to the first gate conductive regions 58C, 58D and form the gate terminals 106, 108 of the bridge circuit 100 (FIG. 7).

[0063] As indicated above, the second support element 57 carries the first and the third MOSFET transistors 51, 53 (FIGS. 9 and 10B).

[0064] With particular reference to FIG. 10B, the first conductive layer 57A of the second support element 57 forms here five conductive regions 76A, 76C-76F (see also FIG. 13), including a single second drain conductive region 76A, two second gate conductive regions 76C, 76D and two second driver source conductive regions 76E, 76F. Output leads 77A-77F are bonded to the conductive regions 76A, 76C-76F, as explained in detail below.

[0065] Here, the drain metallizations 218 (FIG. 8) of both the first and the third MOSFET transistors 51, 53 are bonded directly to the second drain conductive region 76A and are then electrically coupled. Furthermore, second drain leads 77A, 77B are bonded to the second drain conductive region 76A and thus are electrically coupled to each other and form the first supply terminal 101 of the bridge circuit 100 (FIG. 7).

[0066] A second and a third contacting element 80, 81 are coupled to the first and the third MOSFET transistors 51, 53, respectively, and, in FIG. 9, extend below them. The second and the third contacting elements 80, 81 are arranged at the same level, side by side but electrically insulated, as explained below. In the embodiment of FIGS. 9, 10A, 10B, the second and the third contacting elements 80, 81, also of generally parallelepiped shape, elongated in the direction of the first Cartesian axis X, are offset in the width direction (parallel to a second Cartesian axis Y) with respect to the first contacting element 60, but are exactly superimposed in the length direction (parallel to the first Cartesian axis X), as visible in FIG. 9.

[0067] According to a different embodiment, shown in FIGS. 11 and 12, the second and the third contacting elements 80, 81 are offset with respect to the first contacting element 60 also in the length direction, symmetrically thereto.

[0068] The second and the third contacting elements 80, 81 are also formed here by DBC multilayers. In particular, the second and the third contacting elements 80, 81 comprise each a stack formed by a first conductive layer 80A, resp. 81A, typically of copper, an intermediate insulating layer 80B, resp. 81B, for example of ceramic, typically of alumina, and a second conductive layer 80C, resp. 81C, typically of copper. In FIG. 9, the first and the second conductive layers 80A, 81A, 80C, 81C have a smaller thickness than the corresponding conductive layers 60A, 60C of the first contacting element 60, since they do not have an electric conduction function but a thermal conduction function.

[0069] The first conductive layers 80A, 81A of the second and the third contacting elements 80, 81 are arranged on the top and the second conductive layers 80C, 81C of the second and third contacting elements 80, 81 are arranged on the bottom. The first conductive layer 80A of the second contacting element 80 is in direct electric contact with the source pads 213A (FIG. 8) of the first MOSFET transistor 51 through a first clip element 82. Likewise, the first conductive layer 81A of the third contacting element 81 is in direct electric contact with the source pads 213A (FIG. 8) of the third MOSFET transistor 53 through a second clip element 83.

[0070] In detail, FIG. 10B, the clip elements 82, 83 are formed by elongated regions (in a direction parallel to the first Cartesian axis X) of conductive material, such as copper. The first clip element 82 is arranged between the second contacting element 80 and the first MOSFET transistor 51. The first clip element 82 is longer than the first MOSFET transistor 51 so that a part 82 thereof (to the left in FIG. 10B and to the right in FIG. 9) projects laterally with respect to the MOSFET transistor 51. Likewise, the second clip element 83 is arranged between the third contacting element 81 and the third MOSFET transistor 53. The second clip element 83 is longer than the second MOSFET transistor 51 so that a part 83 thereof (to the left in FIG. 10B) projects laterally with respect to the MOSFET transistor 53.

[0071] The projecting portions 82, 83 of the clip elements 82, 83 extend as far as respective first and second connection pillars 67, 68, and are bonded and electrically connected thereto, respectively.

[0072] In this manner, the source terminals 213A of the first MOSFET transistor 51 are coupled, through the first clip element 82 and the first connection pillar 67, to the first drain conductive region 58A, to the drain lead 59A and thus to the first output terminal 103 of the bridge circuit 100 (FIG. 7) and the source terminals 213A of the third MOSFET transistor 53 are coupled, through the second clip element 83 and the second connection pillar 68, to the second drain conductive region 58B and to the drain lead 59B, and thus to the second output terminal 104 of the bridge circuit 100.

[0073] In the embodiment of FIG. 9, first supporting regions 85, formed by DBC substrates, are arranged between each clip element 82, 83 and the first, respectively the second support element 57.

[0074] The connection pillar 67 (shown dashed in FIG. 10B for clarity), projecting portion 82, and one of the first supporting regions 85 form the third alignment and spacing structure 89; and the connection pillar 68 (shown dashed in FIG. 10B), projecting portion 83, and the other one of the first supporting regions 85 form the fourth alignment and spacing structure 89.

[0075] Referring again to FIG. 10B, a further source pad 213E of the first MOSFET transistor 51, not covered by the second contacting element 80, is connected through a second driver source wire 87E to one of the second driver source conductive regions 76E. Similarly, another further source pad 213F of the first MOSFET transistor 53 not covered by the third contacting element 81, is connected through another second driver source wire 87F to the other one of the second driver source conductive regions 76F. Second driver source leads 77E, 77F are bonded to the second driver source conductive regions 76E, 76F and form the driver source terminals 110, 112 of the bridge circuit 100.

[0076] The gate pads 216A of the first and the third MOSFET transistors 51, 53 also face the upper faces of these transistors 51, 53, laterally to the second and, respectively, the third contacting element 80, 81 and are connected through second gate wires 87C, 87D to the second gate conductive regions 76C, 76D, respectively. Second gate leads 77C, 77D are bonded to the second gate conductive regions 76C, 76D and form the gate terminals 105, 107 of the bridge circuit 100.

[0077] The third and fourth alignment and spacing structures 90 extend between the first and the second support elements 56, 57 on sides opposite to those of the connection pillars 67, 68 with respect to the MOSFET transistors 51-54. For example, as shown in FIGS. 9, 10A and 10B, the third and fourth alignment and spacing structures 90 comprise each a carrier pillar 91 extending from the second drain conductive region 76A (FIG. 10B) on the second support element 57 towards the first support element 56 (downwardly in FIG. 9) and a second supporting region 92, formed on a respective insulated conductive region 58I, 58J. In the illustrated example, each second supporting region 92 is formed by a DBC multilayer.

[0078] A block 94 of thermally conductive material, for example of copper, extends between the second conductive layer 60C of the first contacting element 60 and the second conductive layers 80C, 81C of the second and third contacting elements 80, 81 (see also FIG. 13). The second conductive layers 60C, 80C, 81C are thus electrically and thermally connected to each other, but electrically insulated from the rest of the structure, due to the insulating intermediate layers 60B, 80B, 81B. In this manner, the assembly formed by the contacting elements 60, 80, 81 and the block 94 forms a thermal distribution structure 95 inside the device 50, capable of providing a smooth thermal distribution, without discontinuities, and avoiding localized heating zones.

[0079] A package mass 96 (FIG. 9) surrounds and incorporates the structure formed by the first support element 56, the second support element 57 and the alignment and spacing structures 89 and 90, level with the first conductive layers 56A and 57A of the support elements 56 and 57, thus forming the device 50.

[0080] In the device 50, since the first conductive layers 56A and 57A of the support elements 56 and 57 (in thermal contact with the drain metallizations 218 of the MOSFET transistors 51-54 through DBC multilayers, conducting heat well) are both exposed, the device 50 has dissipation surfaces on both sides and thus a high thermal dissipation capacity.

[0081] The alignment and spacing structures 89 and 90 provide in turn optimum thermal conduction paths, facilitating the heat transfer from the MOSFET transistors 51-54 inside the device 50 to the outside.

[0082] The structure is particularly compact, due to the two-level arrangement of the integrated electronic components, here the MOSFET transistors 51-54, as noted in particular in the views of FIGS. 14A, 14B.

[0083] The device 50 is assembled as described below. Initially the first and the second support elements 56, 57 are formed and the components thereof are bonded thereon.

[0084] In particular, and not necessarily in the order indicated, the first support element 56 is shaped to form, in the second conductive layer 56C, the conductive regions 58A-58J of FIG. 10A; the second and the third MOSFET transistors 52, 54 are bonded through the adhesive regions 61A, 61B; the leads 59A-59H are soldered; the wires 65C-65F are soldered; the second supporting regions 92 are attached and the carrier pillars 91 are grown.

[0085] Furthermore, and not necessarily in the order indicated, the second support element 57 is shaped to form, in the second conductive layer 57C, the conductive regions 76A-76F of FIG. 10B; the first and the second MOSFET transistors 51, 53 are bonded through the adhesive regions 61C, 61D; the leads 77A-77F are soldered; the wires 87C-87F are soldered; the first supporting regions 85 are bonded; the clip elements 82, 83 are attached; and the connection pillars 67, 68 are grown.

[0086] Simultaneously, earlier or later, the thermal distribution structure 95 (FIG. 9) is separately formed, by bonding the block 94 to the contacting elements 60, 80, 81. Alternatively to what indicated, the clip elements 82, 83 and the connection pillars 67, 68 may be formed as part of the thermal distribution structure 95, instead of being previously bonded to the first and the second MOSFET transistors 51, 53 and to the first supporting regions 85.

[0087] Then, in the considered assembling example, the first support element 56 (and the relative structures attached thereto), the second support element 57 (and the relative structures attached thereto) and the thermal distribution structure 95 are reciprocally attached, by bonding the carrier pillars 91 to the second supporting regions 92 and the connection pillars 67, 68 to the clip elements 82, 83.

[0088] Finally, the package mass 96 is formed, for example molded, in a per se known manner, so that the leads 59A-59H and 77A-77F project beyond the package mass 96.

[0089] A heat sinker (not shown) may be attached to the device 50 thus finished, on the side of the first and the third MOSFET transistors 51, 53 and the device 50 may be mounted on a carrier board (not shown), with the second and the fourth transistors 52, 54 arranged in proximity to the carrier board.

[0090] FIGS. 16-19 show details of the electric connection between the contact pads 213A.

[0091] In FIG. 16, the source windows 214 on the source passivation 213 exposing the source pads 213A (FIG. 8) are represented with a dashed line. The windows 214 accommodate filling regions 70, of conductive material, which fill the source windows 214 and, before attaching the clip elements 82, 83 (only the first clip element 82 thereof being visible in FIG. 16), may slightly project beyond the source windows 214. In particular, the attachment of the clip elements 82, 83 is obtained through a soldering process, for example, by dispensing solder paste on the upper portion of the filling regions 70, (portion which is formed in a concave manner to avoid solder paste leakage), or by dispensing solder paste on the face of the clip elements 82 and 83 facing the first and the second MOSFET transistors 51, 53, in case the clip elements 82, 83 are previously bonded to the contacting elements 80, 81 to form the thermal distribution structure 95. In this case, the metal material of the clip elements 82, 83 and the first source regions 58G, 58H is in direct contact with the filling regions 70, forming the electric connection of the source regions 213.

[0092] FIG. 17 shows the connection detail of the source pads 213A of the MOSFET transistors 51-54 using a contacting element also for the first and the third MOSFET transistors 51, 53. In this embodiment, therefore, there are no clip elements 82, 83, the first supporting regions 85 are formed wider, so as to extend beyond the second and the third contacting elements 80, 81, and the connection pillars 67, 68 (only the pillar 67 visible in FIG. 17) extend between the first support element 56 and the first supporting regions 85, whereto they are previously bonded during the manufacturing.

[0093] Additionally, in this embodiment, the first conductive layer 60A, 80A, 81A of the contacting elements 60, 80, 81 is shaped so as to form a plurality of projections 71, electrically connected, which enter the source windows 214 of the MOSFET transistors 51-54 (as visible in FIG. 17 for the first and the second MOSFET transistors 51, 52) and are bonded with the source pads 213A (FIG. 8), in direct electric contact.

[0094] In this solution, the first conductive layer 60A, 80A, 81A of the contacting elements 60, 80, 81 has a bulge 72 at the projecting portion thereof, where the first contacting element 60 is in electric contact with the coupling regions 64G, 64H and the second and the third contacting elements 80, 81 are bonded to the first supporting regions 85.

[0095] Additionally, here, the first and the second conductive layers 80A, 81A, 80C, 81C of the second and the third contacting elements 80, 81 have the same thickness as the first and the second conductive layers 60A, 61A of the first contacting element 60.

[0096] In this manner, in FIG. 17, the connection pillars 67, 68 form the electric contact above the intermediate insulating layer 80B, 81B, creating an electric continuity between the source metallizations 213 (FIG. 8) of the first and the third MOSFET transistors 51 and 53, through the source windows 214, the bulge 72, the connection pillars 67, 68, the first drain conductive regions 58A, 58B of the first support element 56, and the drain leads 59A, 59B.

[0097] FIG. 18 shows a connection structure of the source pads 213A of the MOSFET transistors 51-54 similar to that of FIG. 17, wherein the first conductive layer 60A, 80A, 81A of all the contacting elements 60, 80, 81 is shaped to form the projections 71, but the block 94 is replaced by an adhesive mass 93, for example of solder.

[0098] FIG. 19 shows a connection structure of the source pads 213A of the MOSFET transistors 51-54 without clip elements, the connections with the source metallizations 213 are formed directly by the contacting elements 60, 80, 81 (as in FIG. 18), but the first conductive layer 60A, 80A, 81A of none of the contacting elements 60, 80, 81 is shaped and is in contact with filling regions 70 formed in the source windows 214, as in FIG. 16.

[0099] FIGS. 20A-20D show a different packaged electronic device, indicated with 150. The device 150 has a structure and components similar to those of the device 50 of FIGS. 9, 10A, 10B, and thus identified by the same reference numbers, except with regards to the leads 59A-59H and 77A-77F, which here project beyond the housing of the device 150 to the upper zone thereof, substantially aligned with the upper surface 150B (FIG. 20D). In this case, therefore, when the device 150 is mounted on a carrier board (not shown), the first and the third MOSFET transistors 51, 53 (upper transistors of the bridge circuit 100) will be arranged in proximity to the carrier board, while the second and the fourth transistors 52, 54 (lower transistors of the bridge circuit 100) will be arranged at a higher level with respect to the carrier board plane and may be in more direct thermal contact with any heat sinker possibly arranged on the device 150.

[0100] Finally, it is clear that modifications and variations may be made to the packaged electronic device and assembling process thereof described and illustrated herein without thereby departing from the scope of the present disclosure. For example, the different embodiments described may be combined so as to provide further solutions.

[0101] For example, what described above also applies to so-called leadless implementations, wherein the leads do not project to the outside, and only a minor portion thereof is not covered by the package mass 96 and is level with the housing, to allow the device 50 to be mounted with the surface mounting technique.

[0102] Additionally, a clip element might be provided in addition or alternatively between the source terminals of the second and the third transistors 52, 54 and the first contacting element.

[0103] The various embodiments described above can be combined to provide further embodiments. These and other changes can be made to the embodiments in light of the above-detailed description. In general, in the following claims, the terms used should not be construed to limit the claims to the specific embodiments disclosed in the specification and the claims, but should be construed to include all possible embodiments along with the full scope of equivalents to which such claims are entitled. Accordingly, the claims are not limited by the disclosure.