MACHINE FOR SEWING, EMBROIDERY OR QUILTING

Abstract

A machine (M) for sewing, embroidering or quilting, in which a flat section (T1) of a textile structure (T) in a stretched state can be pressed against a textile structure support area (TA) adjacent to a stitch plate (SP) and/or against the stitch plate (SP) and moved in a plane parallel to the stitch plate (SP) at a speed (v) relative to the stitch plate (SP) so that the flat section (T1) lies flat against the stitch plate (SP). The machine (M) contains a detector module (DM) with which a property and/or a state of the moved flat section (T1) of the textile structure (T) can be detected, and a control unit (SE) with which an operating mode of the machine (M) can be adjusted depending on the detected property or the detected state of the moved flat section (T1) of the textile structure (T).

Claims

1. A machine (M) for sewing, embroidering or quilting, comprising: a needle bar (NS) arranged above a stitch plate (SP) and movable up and down and to which needle bar a needle (N) is attached, which has an eye for receiving an upper thread; a rotatable or reciprocating gripper system (GS) arranged below the stitch plate (SP) and to which gripper system a gripper is attached, the gripper has a gripper tip for picking up the upper thread; wherein the stitch plate (SP) contains an opening or recess (A0) for the needle (N) and the eye to pass through the stitch plate (SP) from top to bottom and back, and wherein a flat section (T1) of a textile structure (T) in a stretched state is adapted to be pressed against a textile structure support area (TA) adjacent to the stitch plate (SP) and/or against the stitch plate (SP) and moved in a plane parallel to the stitch plate (SP) at a speed (v) relative to the stitch plate (SP), so that the flat section (T1) lies flat against the stitch plate (SP); a detector module (DM) configured to detect a property and/or a state of the moved flat section (T1) of the textile structure (T); and a control unit (SE) configured to adjust an operating mode of the machine (M) depending on the detected property and/or the detected state of the moved flat section (T1) of the textile structure (T).

2. The machine according to claim 1, wherein the detector module (DM) is arranged in an area below the stitch plate and/or flush with the upper surface of the stitch plate (SP).

3. The machine according to claim 2, wherein the detector module (DM) is arranged next to the gripper system (GS).

4. The machine according to claim 1, wherein the detector module (DM) is configured to detect a fabric property and a speed or deformation of the moved flat section (T1) of the textile structure (T).

5. The machine according to claim 4, wherein the fabric property is a fabric structure or a color structure, an end or an edge, a bulge, a fabric defect or fabric damage.

6. The machine according to claim 4, wherein the control unit (SE) or detector module control unit (SE1) is adapted to effect at least a machine stop and/or an adjustment of a stitch frequency (f) of the needle (N) in dependence on the fabric property and/or the speed of the moved flat section (T1) of the textile structure (T).

7. The machine according to claim 6, wherein the machine stop is with the needle (N) at a top location or with the needle (N) in the textile structure (T).

8. The machine according to claim 1, wherein the detector module (DM) comprises: an E/M source (EMQ) which is adapted to emit an electromagnetic signal (S1) which can pass through the textile structure support area (TA) and/or the stitch plate (SP) at a first passage area (DB1) of the textile structure support area (TA) and/or the stitch plate (SP) to a lower side of the flat section (T1) of the textile structure (T) facing the textile structure support area (TA) and/or the stitch plate (SP) and is adapted to be irradiated onto a lower side of the flat section (T1) of the textile structure (T) in order to generate an electromagnetic return signal (S2) reflected or scattered by an underside of the moved flat section (T1); and an E/M sensor (EMS) which is adapted to absorb the electromagnetic return signal (S2) reflected back or scattered from the underside of the moved flat section (T1) and scattered by the underside of the moved flat section (T1) and which is adapted to pass through the textile structure support area (TA) and/or the stitch plate (SP) at the first passage area (DB1) or at a second passage area of the textile structure support area (TA) and/or the stitch plate (SP) to the E/M sensor (EMS).

9. The machine according to claim 8, further comprising at least one first beam deflecting means (SA1) arranged as a component of the detector module (DM) in a forward propagation path (PF1) of the forward signal (S1) extending from the E/M source (EMQ) to the underside of the flat sub-area (T1); and/or at least one second beam deflecting means arranged as a component of the detector module (DM) in a return propagation path (PF2) of the return signal (S2) extending from the underside of the flat section (T1) to the E/M sensor (EMS).

10. The machine according to claim 9, wherein the forward propagation path (PF1) and/or the return propagation path (PF2) has at least one baffle or diaphragm with an aperture.

11. The machine according to claim 10, wherein the forward propagation path (PF1) and the return propagation path (PF2) are identical or congruent at least along a common section along the forward propagation path (PF1) and along the return propagation path, and the forward signal (S1) is adapted to pass through a partial region in a first direction and the return signal (S2) is adapted to pass through a partial region (TPF) in a second direction.

12. The machine according to claim 8, wherein at least one of: a) a distance measured along an upper surface of the textile structure support area (TA) and/or the stitch plate (SP) between the opening/recess (A0) for the passage of the needle (N) and the first passage area (DB1) is less than 30 mm; or b) the passage area (DB1 and/or DB2) is located between two adjacent rows of feeders/conveyors or feed dogs (TR1, TR2, TR3) of the stitch plate (SP).

13. The machine according to claim 8, wherein at least one of: a) the first passage area (DB1) and/or a second passage area are formed by an opening in the textile structure support area (TA) adjacent to the stitch plate (SP) and/or in the stitch plate (SP) which opening is permeable/transmissible to the first signal (S1) and to the second signal (S2); b) the first passage area (DB1) and/or the second passage area are formed by a window in the textile structure support area (TA) adjacent to the stitch plate (SP) and/or in the stitch plate (SP) which window is permeable/transmissible to the first signal (S1) and to the second signal (S2); or c) the textile structure support area (TA) adjacent to the stitch plate (SP) and/or the stitch plate (SP) is formed from a material that is permeable/transmissible to the first signal (S1) and to the second signal (S2).

14. The machine according to claim 8, wherein the detector module (DM) has a housing (G) in which components of the detector module (DM) are arranged.

15. The machine according to claim 8, wherein the forward propagation path (PF1) and the backward propagation path (PF2) pass through an optical capsule (OK) or an optical block, respectively, and the optical capsule (OK) or the optical block has at least one lens (L1, L2) and at least one beam deflecting means (SA1).

16. The machine according to claim 15, wherein the optical block is formed from a monoblock made of light-transmissive material, and the at least one beam deflecting means (SA1) is preferably a totally reflective boundary surface or interface between a light-transmitting material of the monoblock and the atmospheric air, and the at least one lens (L1, L2) is a curved surface of the monoblock made of the light-transmitting material.

17. A method for sewing, embroidering or quilting using a machine (M), the method comprising: a) moving up and down a needle bar (NS) arranged above a stitch plate (SP), to which a needle (N) is attached, which has an eye with an upper thread received therein, wherein the needle (N) and the eye with the upper thread are repeatedly moved up and down from above to below and back through an opening or recess (A0) of the stitch plate (SP); b) simultaneously and synchronized with the upward and downward movement of the needle bar (NS), rotating or reciprocating a gripper system (GS) arranged below the stitch plate (SP), to which a gripper is attached which has a gripper tip, the gripper system providing a lower thread and the gripper picking up the upper thread with the gripper tip and brings the upper thread together with the lower thread; c) simultaneously moving a flat section (T1) of a textile structure (T) in a stretched state and pressed against a textile structure support area (TA) adjacent to the stitch plate (SP) and/or against the stitch plate (SP) in a plane parallel to the stitch plate (SP) at a speed (v) relative to the stitch plate (SP), so that the flat section (T1) lies flat against the stitch plate (SP), forming stitches joining the upper thread and the lower thread on the textile structure (T); d) detecting a property and/or a state of the moved flat section (T1) of the textile structure (T) by a detector module (DM); and e) adapting an operating mode of the machine (M), depending on the detected property and/or the detected state of the moved flat section (T1) of the textile structure (T) by a control unit (SE).

18. The method according to claim 17, wherein the property of the moved flat textile structure (T) has at least one of the following aspects: a texture, a fabric structure, a color structure, an end or an edge, a bulge, a fabric defect or damage to the textile structure (T).

19. The method according to claim 17, wherein the state of the moved flat textile structure (T) has at least one of the following aspects: a speed, a deformation, or an elongation.

20. The method according to claim 17, further comprising the control unit (SE) or a detector module control unit (SE1) causing at least one of a machine stop or an adjustment of a stitch frequency (f) of the needle (N) depending on the property and/or the condition of the moved flat section (T1) of the textile structure (T).

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0110] Further advantages, features, and possible applications of the invention are apparent from the following description of a non-limiting embodiment with reference to the drawing, wherein:

[0111] FIG. 1 shows a perspective view of a section of a sewing machine according to the invention with an upper part and a lower part in a first state (view from the front left);

[0112] FIG. 2 shows a perspective view of the section of the sewing machine according to the invention in a second state, in which the lower part is open (view also from the front left);

[0113] FIG. 3 shows a further perspective view of the lower open part of the sewing machine according to the invention, cut along a vertical xy plane (see FIG. 2) (view from the front right);

[0114] FIG. 4 shows a perspective view of two assemblies of the sewing machine according to the invention in their relative positions (without other parts of the sewing machine);

[0115] FIG. 5 shows a perspective view of the two assemblies of the sewing machine according to the invention in their relative positions (without other parts of the sewing machine), cut along a further vertical xy plane (see FIG. 4);

[0116] FIG. 6 shows another perspective view of the second, lower of the two assemblies of FIG. 4 from a different viewing direction;

[0117] FIG. 7 shows a perspective view of the second, lower of the two assemblies of FIG. 4 in a partially disassembled state (exploded view);

[0118] FIG. 8 shows a perspective view of the second, lower of the two assemblies of FIG. 4 in a further disassembled state (exploded view);

[0119] FIG. 9 shows a perspective view of the two assemblies of FIG. 4 and a further, third assembly in their relative positions;

[0120] FIG. 10 shows an enlarged sectional view of part of the two cut assemblies of FIG. 5 with a view orthogonal to the vertical xy sectional plane of FIG. 4 and a textile structure in its intended use; and

[0121] FIG. 11 shows an overall perspective view of a sewing machine according to the invention, in which the part framed by the dashed lines corresponds to the view in FIG. 1.

DETAILED DESCRIPTION

[0122] FIG. 1 shows a perspective view (viewed from the front left) of a section of a sewing machine M according to the invention with an upper part and a lower part in a first state.

[0123] In the upper part of the machine, a needle bar NS can be seen above a stitch plate SP, which can be moved up and down and to which a needle N is attached, which has an eye for receiving an upper thread. The needle plate SP has an opening or recess A0 (see FIG. 4) for the needle N and the eye to pass through the needle plate SP from top to bottom and back from bottom to top.

[0124] The machine M also contains, in the lower part of the machine behind a closure flap VK and concealed by this, a rotatable or reciprocating gripper system GS (see FIG. 2, FIG. 3, FIG. 9) arranged below the stitch plate SP, to which gripper system a gripper (not shown) is attached, which has a gripper tip for picking up the upper thread.

[0125] A flat section T1 of a textile structure T (see FIG. 10) can be pressed in a stretched state against a textile structure support area TA adjacent to the stitch plate SP and/or against the stitch plate SP and thereby moved in a plane parallel to the stitch plate SP at a speed v (see FIG. 10) relative to the stitch plate SP. The flat section T1 lies flat against the stitch plate SP.

[0126] The machine M also contains a detector module DM (see FIGS. 3, 4, 5, 8, 10) with which a property and/or a state of the moved flat section T1 of the textile structure T (see FIG. 10) can be detected.

[0127] The machine M also contains a control unit SE or detector module control unit SE1 (see FIG. 8) with which an operating mode of the machine M can be adjusted depending on the detected property or the detected state of the moved flat section T1 of the textile structure T.

[0128] The detector module DM (see FIGS. 3, 4, 10) is arranged in an area below the stitch plate SP and next to the gripper system GS (see FIG. 3).

[0129] A double arrow next to the needle bar NS indicates the upward and downward movement of the needle bar NS and the needle N attached to it, in particular a cyclic movement with a frequency f.

[0130] A first row of feed dogs TR1, a second row of feed dogs TR2, and a third row of feed dogs TR3 can also be seen in the stitch plate SP.

[0131] A passage area DB1 can also be seen, through which an electromagnetic signal can pass from bottom to top and from top to bottom through the needle plate SP.

[0132] FIG. 2 shows a perspective view (viewed from the front left) of a subassembly of the sewing machine M according to the invention in a second state, in which the lower part is opened by folding down the closure flap VK.

[0133] FIG. 2 differs from FIG. 1 only in that elements of the lower part that were concealed by the raised closure flap VK in FIG. 1 are now visible.

[0134] All elements of FIG. 1 shown by the reference symbols in FIG. 1 correspond to the elements of FIG. 2 shown by the same reference symbols in FIG. 2.

[0135] FIG. 2 also shows a housing G containing the detector module DM (see FIGS. 6, 7, and 8). A gripper system GS partially concealed by the housing G is also visible.

[0136] The housing G also contains a common circuit board GP or a common circuit board GP that forms part of the housing G. The detector module control unit SE1 and a lower thread monitoring unit SE2 are arranged side by side on the common circuit board GP (see FIG. 8).

[0137] FIG. 3 shows another perspective view (this time from the front right) of the lower open part of the sewing machine M according to the invention, cut along a vertical xy plane (see FIG. 2).

[0138] All elements of FIG. 1 and FIG. 2 shown by the reference symbols in FIG. 1 and FIG. 2 correspond to the elements of FIG. 3 shown by the same reference symbols in FIG. 3.

[0139] FIG. 3 also shows a beam path within the detector module DM, schematically represented by dark lines.

[0140] The beam path represents, on the one hand, an electromagnetic signal S1 (see FIG. 10) emitted by an E/M source EMQ (e.g. light-emitting diode or laser diode, see FIG. 8), which can pass through the passage area DB1 of the stitch plate SP to a lower side of the textile structure T facing the stitch plate SP.

[0141] The beam path also represents an electromagnetic return signal S2 (see FIG. 10) reflected or scattered from the underside of the textile structure T, which is absorbed by an E/M sensor EMS (e.g. CCD sensor, CMOS sensor, FIG. 8).

[0142] FIG. 4 shows a perspective view of two assemblies of the sewing machine M according to the invention in their relative positions (without other parts of the sewing machine).

[0143] The first, upper assembly is the stitch plate SP. It contains the opening or recess A0 for the needle N to pass through the stitch plate SP. It also contains the passage area DB1 for the passage of the forward signal S1 and the reverse signal S2.

[0144] The second, lower assembly is the housing G with the common circuit board GP, on which the E/M source EMQ (e.g. light-emitting diode or laser diode) and the E/M sensor EMS (e.g. CCD sensor, CMOS sensor) as well as the detector module control unit SE1 and the lower thread monitoring unit SE2 are arranged side by side (see FIG. 8).

[0145] FIG. 5 shows a perspective view of the two assemblies of the sewing machine M according to the invention, cut along a further vertical xy plane (see FIG. 4), in their relative positions (without other parts of the sewing machine).

[0146] The forward signal S1 of the beam path can be seen between the E/M source EMQ (e.g. light-emitting diode or laser diode, see FIG. 8) and the passage area DB1, and the return signal S2 of the beam path can be seen between the passage area DB1 and the E/M sensor EMS (e.g. CCD sensor, CMOS sensor, FIG. 8).

[0147] The beam path passes through a first lens L1, a deflection area (mirror) AB, and a second lens L2.

[0148] The beam path also contains a field stop or diaphragm with an aperture (not shown), in particular a field of view stop and/or light field stop, and a stray light stop or diaphragm with an aperture (not shown).

[0149] FIG. 6 shows another perspective view of the second, lower assembly or housing G from FIG. 4 from a different viewing angle.

[0150] An optical capsule OK or an optical block integrated in the upper part of the housing G can be seen, in which the optical elements that are traversed by the beam path are contained. The optical capsule OK or the optical block is fixed to the housing G by means of a locking element VE in a defined position relative to the common circuit board GP.

[0151] The optics contained in the optical capsule OK or the optical block, together with the E/M source EMQ, the E/M sensor EMS and the detector module control unit SE1 on the common circuit board GP (see FIG. 8), form the detector module DM.

[0152] The housing G also contains formations F1, F2, F3, which, together with complementary formations (not shown) of the sewing machine M, enable the housing G to be fitted into the sewing machine M.

[0153] FIG. 7 shows a perspective view of the second, lower of the two assemblies from FIG. 4 in a partially disassembled state (exploded view).

[0154] The optical capsule OK or the optical block and the locking element VE can be seen separately from the housing G. The locking element VE has formations F4, F5, F6, which, together with complementary formations (not shown) of the housing G, enable the optical capsule OK or the optical block to be fitted into the housing G.

[0155] FIG. 8 shows a perspective view of the second, lower of the two assemblies from FIG. 4 in an even more disassembled state (exploded view).

[0156] All elements of FIGS. 6 and 7 shown by the reference symbols in FIGS. 6 and 7 correspond to the elements of FIG. 8 shown by the same reference symbols in FIG. 8.

[0157] FIG. 8 also shows, separate from the housing G, the common circuit board GP, on which the E/M source EMQ (e.g. light-emitting diode or laser diode) and the E/M sensor EMS (e.g. CCD sensor, CMOS sensor) as well as the detector module control unit SE1 and the lower thread monitoring unit SE2 are arranged next to each other.

[0158] FIG. 9 shows a perspective view of the two assemblies from FIG. 4 and a third assembly in their relative positions.

[0159] The first assembly is the stitch plate SP with its opening or recess A0 for the passage of the needle N and with its passage area DB1 for the passage of the forward signal S1 and the return signal S2.

[0160] The second assembly is the housing G with its common circuit board GP, of which only the rear side facing away from the assembled side is visible.

[0161] Finally, the third assembly is a gripper system GS (without gripper/not shown). Similar to FIG. 2, the gripper system GS in FIG. 9 is partially concealed by the housing G.

[0162] FIG. 10 shows an enlarged sectional view of part of the two cut assemblies from FIG. 5, viewed orthogonally to the vertical xy sectional plane of FIG. 4, as well as a textile structure T in normal operation.

[0163] The sectional view shows the stitch plate SP with its passage area DB1 and the textile structure T1 on the stitch plate SP.

[0164] A flat section T1 of the textile structure T is pressed against the stitch plate SP in a more or less stretched state and moved in a plane parallel to the stitch plate SP at a speed v relative to the stitch plate SP.

[0165] In the beam path, a forward propagation path PF1 corresponding to the forward signal S1 and a backward propagation path PF2 corresponding to the backward signal S2 can be seen.

[0166] In addition, the optical capsule OK or the optical block, which is arranged to fit precisely in a defined position in the housing G, can be seen in sectional view, as can the locking element VE, which locks the optical capsule OK or the optical block in its position in the housing G.

[0167] The optical capsule OK or the optical block contains a first lens L1, a beam deflecting means SA1 (mirror) and a second lens L2. In the optical block variant, the optical block consists of a light-transmissive material, in particular glass or a polymer. The optical block thus forms a monoblock made of glass or polymer. The beam deflecting means SA1 is formed by a totally reflective boundary surface between the light-transmitting material and the atmospheric air.

[0168] The optics contained in the optical capsule OK enable, on the one hand, the illumination of the flat section T1 of the underside of the textile structure T by the E/M source EMQ via the forward propagation path PF1 and, on the other hand, the optical imaging of object points of the flat section T1 of the underside of the textile structure T via the backward propagation path PF2 onto image points on the E/M sensor EMS.

[0169] FIG. 11 shows an overall perspective view of a sewing machine M according to the invention, in which the part framed by the dashed lines corresponds to the view in FIG. 1.

[0170] The sewing machine M essentially comprises a base plate BP, a vertical column VS extending upward from the base plate BP, a lower arm UA extending horizontally from a lower region of the vertical column VS, and an upper arm OA extending from an upper region of the vertical column VS.

[0171] A stitch plate SP and a shutter flap/closure cap VK can be seen at the free end of the lower arm UA. A sewing head NK is located at the free end of the upper arm OA.

[0172] At the lower end of the sewing head NK in the upper part of the machine M, the needle bar NS can be seen which can be moved up and down and to which the needle N is attached which has an eye for receiving an upper thread (see FIG. 2). A presser foot NF can also be seen.

[0173] Behind the shutter flap/closure cap VK in the lower part of the sewing machine M and below the stitch plate SP, the rotatable or reciprocating gripper system GS (see FIG. 2) is located.

[0174] A loudspeaker LS is located in the upper part of the vertical column VS, and a screen/display BS is located in the center of the upper arm OA. A mechanical interface MS can also be seen in the base plate BP, to which a knee lever (not shown) can be connected to operate the machine M.

[0175] A first type of control element BE1 in the form of a first and a second rotary knob is arranged on the upper part of the vertical column VS. A second type of control element BE2 in the form of a first and a second push button is also arranged on the upper part of the vertical column VS below the first type of control element BE1.

[0176] A third type of control element BE3 in the form of five push buttons, a fourth type of control element BE4 in the form of four push buttons, and a fifth type of control element BE5 in the form of a slide are arranged on the upper arm OA to the right of the sewing head NK.

List of Reference Symbols

[0177] M machine for sewing, embroidery or quilting [0178] NK sewing head [0179] VS vertical column [0180] OA upper arm [0181] UA lower arm [0182] VK shutter flap/closure cap [0183] NF presser foot [0184] BP base plate [0185] BS screen/display [0186] MS mechanical interface [0187] BE1 first type of control element/rotary knob [0188] BE2 second type of control element/push button [0189] BE3 third type of control element/push button [0190] BE4 fourth type of control element/push button [0191] BE5 fifth type of control element/slide [0192] LS loudspeaker [0193] SP stitch plate (or: needle plate) [0194] TA fabric structure support area (adjacent to the stitch plate) [0195] NS needle bar [0196] GS gripper system (or: hook system [0197] A0 opening/recess in the stitch plate (needle passage and/or DM signal passage) [0198] DB1 passage area of the stitch plate (DM signal passage) [0199] DB2 passage area of the stitch plate (DM signal passage) [0200] N needle with eye [0201] G housing [0202] F1 first formation [0203] F2 second formation [0204] F3 third formation [0205] VK shutter flap [0206] T textile structure [0207] T1 flat section of the textile structure [0208] DM detector module (EMQ, EMS and optics) [0209] SE control unit [0210] EMQ E/M source (light source, LED, laser) [0211] EMS E/M sensor (CCD sensor, CMOS sensor) [0212] S1 forward signal (from EMQ to the moved textile structure) [0213] S2 return/backward signal (from the moved textile structure back to EMS) [0214] PF1 forward propagation path [0215] PF2 return/backward propagation path [0216] V (amount of) speed of the textile structure relative to the stitch plate [0217] f stitch frequency of the needle [0218] SE1 detector module control unit [0219] SE2 additional control unit/lower thread monitoring unit [0220] GP common circuit board [0221] TR1 first conveyor row/first feed dog row [0222] TR2 second conveyor row/second feed dog row [0223] TR3 third conveyor row/third feed dog row [0224] OK optical capsule or optical block [0225] SA1 (first) beam deflecting means [0226] L1 first lens [0227] L2 second lens [0228] VE locking element [0229] F4 fourth formation [0230] F5 fifth formation [0231] F6 sixth formation