MID-INFRARED SEMICONDUCTOR SATURABLE ABSORBER MIRROR BASED ON INAS/GASB SUPERLATTICE AND PREPARATION METHOD THEREOF
20230105777 · 2023-04-06
Inventors
- Guoqiang XIE (Shanghai, CN)
- Zhipeng QIN (Shanghai, CN)
- Yi Zhou (Shanghai, CN)
- Jianxin CHEN (Shanghai, CN)
Cpc classification
H01S3/0401
ELECTRICITY
H01S3/1118
ELECTRICITY
H01S3/173
ELECTRICITY
G02F1/00
PHYSICS
International classification
H01S3/1118
ELECTRICITY
Abstract
A mid-infrared semiconductor saturable absorber mirror based on InAs/GaSb superlattice comprises a GaSb substrate with an anti-reflection film coated on the lower surface of the GaSb substrate; InAs/GaSb superlattice which has a specific structure and thickness and is arranged on the GaSb substrate; and Bragg reflection film which is arranged on the InAs/GaSb superlattice, wherein Bragg reflection film is composed of multiple pairs of ZnS and YbF.sub.3 film layers with a thickness of ¼ wavelength, and the YbF.sub.3 film layer is connected with the InAs/GaSb superlattice. The device not only has a mid-infrared working range with a broadband operation bandwidth, but also has the advantages of designable parameters, outstanding robustness, high damage threshold and the like, and sets a foundation for the development of mid-infrared ultrafast mode-locked lasers.
Claims
1. An InAs/GaSb superlattice-based mid-infrared semiconductor saturable absorber mirror, comprising: a GaSb substrate having a lower surface, the GaSb substrate being coated with an anti-reflection film on the lower surface; an InAs/GaSb superlattice arranged on the GaSb substrate; Bragg reflection film arranged on the InAs/GaSb superlattice and having an upper surface; wherein Bragg reflection film is composed of multiple pairs of ZnS and YbF.sub.3 film layers, and the YbF.sub.3 film layer is connected with the InAs/GaSb superlattice.
2. The InAs/GaSb superlattice-based mid-infrared semiconductor saturable absorber mirror according to claim 1, wherein the upper surface of Bragg reflection film is bonded with a heat sink.
3. The InAs/GaSb superlattice-based mid-infrared semiconductor saturable absorber mirror according to claim 1, wherein the InAs/GaSb superlattice comprises a GaSb layer and an InAs layer growing alternately; an InSb transitional layer is contained between the GaSb layer and the InAs layer to reduce the lattice mismatch; the InAs/GaSb superlattice has 20-100 periods; the thickness of InAs and GaSb in each period is 5-30 atomic layers to cover the mid-IR spectral region; and a specific thickness is determined according to a laser wavelength and a material absorption coefficient of the superlattice.
4. The InAs/GaSb superlattice-based mid-infrared semiconductor saturable absorber mirror according to claim 1, wherein the InAs/GaSb superlattice is located at a wave peak position of a standing wave light field.
5. The InAs/GaSb superlattice-based mid-infrared semiconductor saturable absorber mirror according to claim 1, wherein Bragg reflection film is formed by stacking periodic YbF.sub.3/ZnS films, and a thickness of the YbF.sub.3 or ZnS film is a quarter of a laser center wavelength.
6. A method for preparing the InAs/GaSb superlattice-based mid-infrared semiconductor saturable absorber mirror of claim 1, comprising: (1) polishing a GaSb semiconductor baseplate to obtain a GaSb substrate; (2) alternately growing an InAs nanolayer, an InSb transitional layer and a GaSb nanolayer with a short-period structure on the Gasb substrate by adopting a molecular beam epitaxy technology to form the InAs/GaSb superlattice; (3) coating a surface of the InAs/GaSb and a surface of the substrate respectively with Bragg reflection film and an anti-reflection film by using a vacuum ion beam sputtering technology; and (4) pasting a prepared sample on metal heat sink with high heat conductivity through heat conducting adhesive to prepare the mid-IR SESAM.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0028]
[0029]
[0030]
[0031]
[0032]
[0033]
DETAILED DESCRIPTION OF THE INVENTION
[0034] The present invention is further described below in conjunction with the drawings and embodiments, but the protection scope of the present invention shall not be limited thereby.
[0035] As shown in
[0036] Firstly, the InAs/GaSb superlattice 3 grows on the substrate 4. The substrate 4 is semiconductor GaSb with a thickness of 500 μm; and the left surface and right surface of the substrate 4 have been polished to deposit the anti-reflection film 5 and to grow the InAs/GaSb superlattice 3, respectively. The InAs/GaSb superlattice 3 is formed by alternately growing InAs (8 atmic layers) and GaSb (8 atomic layers) films by using a molecular beam epitaxy method; and a single atomic layer of InSb grows between the InAs film and the GaSb film as a transitional layer. The InAs/GaSb superlattice 3 contains 50 periods of InAs/GaSb with a total thickness about 250 nm. Numerical calculation shows that a bandgap of the InAs/GaSb superlattice is 0.244 eV, and the longest working wavelength is greater than 5 μm.
[0037] Secondly, the right surface of the substrate 4 is coated with the anti-reflection film 5, thereby reducing the saturation energy fluence; the surface of the InAs/GaSb superlattice 3 is coated with Bragg reflection film 2; the Bragg reflection film 2 is formed by stacking 20 periods of YbF.sub.3/ZnS films; a thickness of the YbF.sub.3 or ZnS film is a quarter of a laser central wavelength; and the closer film to superlattice is the YbF.sub.3 film, as shown in
[0038] Finally, a prepared sample is pasted to the surface of the heat sink of a copper plate through high heat conductivity adhesive.
[0039] The saturable absorption characteristics of the mid-IR SESAM based on the InAs/GaSb superlattice is proved by a Z-scan measurement, with a modulation depth of 11.5% and a saturation energy fluence of 74 μJ/cm.sup.2 at 3.5 μm, as shown in
[0040]
[0041] The mid-IR SESAM 17 based on the InAs/GaSb superlattice is a core element of the 3.5 μm mode-locked fluoride fiber laser. On the one hand, the mid-IR SESAM is used as an end mirror of the laser to form an entire mode-locked cavity, as shown in
[0042] Experimental results show that the present invention may realize the stable mode locking of the 3.5 μm fluoride fiber laser. When the output power is 64 mW, the energy fluence on the mid-IR SESAM is about 6 mJ/cm.sup.2, which is greater than a damage threshold (−2 mJ/cm.sup.2) of the conventional near-infrared SESAM. The high damage threshold can be attribtued to the the good lattice match of the InAs/GaSb superlattice. Generally, the mid-IR SESAM based on the InAs/GaSb superlattice not only extends the working wavelength range of the SESAM, but also has high damage threshold and ultrawide working bandwidth, thereby paving a way for the development of the mid-IR ultrafast mode-locked laser.
[0043] The embodiment is only used to illustrate the technical solution of the present invention, but not to limit the present invention. Modifications or equivalent substitutions made by those ordinary skilled in the art should be included in the claim scope of the present invention without deviating from the spirit and scope of the technical solution of the present invention.