ELECTRODE HAVING COLUMNAR STRUCTURE PROVIDED WITH MULTILAYER PART
20220320527 · 2022-10-06
Assignee
Inventors
- Tomohiro Ishiyama (Tsukuba-shi, JP)
- Develos Katherine Bagarinao (Tsukuba-shi, JP)
- Haruo Kishimoto (Tsukuba-shi, JP)
- Katsuhiko Yamaji (Tsukuba-shi, JP)
Cpc classification
H01M4/9033
ELECTRICITY
H01M4/8803
ELECTRICITY
H01M4/8647
ELECTRICITY
Y02E60/50
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
H01M4/905
ELECTRICITY
H01M8/1213
ELECTRICITY
International classification
Abstract
This electrode comprises: an electrode component containing a columnar structure; and a porous collector layer that is prepared on the electrode component. The columnar structure comprises a multiple columnar sections, the lateral surfaces of which are at least partially in contact with each other. Each columnar part section is provided with a multilayer part wherein different inorganic compound layers are stacked. In addition, the columnar structure comprises two or more adjacent columnar sections, which are different from each other in the stacking direction of the multilayer part. For example, each columnar section has a width of 10 nm to 100 nm, and each inorganic compound layer has a thickness of 1 nm to 10 nm.
Claims
1. A columnar structure comprising: multiple columnar sections with lateral surfaces at least partially contacting each other, wherein each columnar section includes a multilayer part in which different inorganic compound layers are stacked on each other.
2. The columnar structure according to claim 1, wherein the inorganic compound layers are one or more types of layers including a metal oxide layer, a metal nitride layer, and a metal carbide layer.
3. The columnar structure according to claim 1, wherein the columnar sections include two or more adjacent columnar sections different from each other in a layer stacking direction of the multilayer part.
4. The columnar structure according to claim 1, wherein a width of each columnar section is 10 nm to 100 nm.
5. The columnar structure according to claim 1, wherein a thickness of each inorganic compound layer is 1 nm to 10 nm.
6. The columnar structure according to claim 1, wherein the layer stacking direction of the multilayer part is different from the height direction of each columnar section.
7. The columnar structure according to claim 1, wherein the multilayer part includes two or more types of metal oxide layers.
8. The columnar structure according to claim 7, wherein one of the two or more types of metal oxide layers is a (Ce,Gd)O.sub.2 layer, a (La,Sr)CoO.sub.3 layer, or a (La,Sr)(Co,Fe)O.sub.3 layer.
9. The columnar structure according to claim 7, wherein one of two types of metal oxide layers among the two or more types of metal oxide layers is a (Ce,Gd)O.sub.2 layer, and the other one of the two types of metal oxide layers among the two or more types of metal oxide layers is a (La,Sr)CoO.sub.3 layer or a (La,Sr)(Co,Fe)O.sub.3 layer.
10. A composite structure comprising: a polycrystalline base material; and the columnar structure according to claim 1, the columnar structure being provided on the polycrystalline base material.
11. An electrode comprising: an electrode component including the columnar structure according to claim 1; and a porous current collector layer provided on the electrode component.
12. The electrode according to claim 11, wherein the current collector layer includes multiple columnar bodies prepared on some of the columnar sections of the columnar structure and voids formed in-between the columnar bodies.
13. A method for manufacturing the composite structure according to claim 10, comprising: a step of simultaneously forming the different metal oxide layers on the polycrystalline base material by a pulsed laser deposition method.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0009]
[0010]
[0011]
[0012]
[0013]
[0014]
[0015]
[0016]
PREFERRED MODE FOR CARRYING OUT THE INVENTION
[0017]
[0018] The columnar section includes a multilayer part in which different inorganic compound layers are stacked on each other. The inorganic compound layers are preferably one or more types of layers including a metal oxide layer, a metal nitride layer, and a metal carbide layer. Since metal oxide is used for, e.g., an electrode of an SOFC, a case where the inorganic compound layer is the metal oxide layer will be hereinafter described as an example.
[0019] The columnar structure of the present embodiment includes the multilayer parts in which different metal oxide layers are stacked on each other and has a large area of dissimilar material interfaces. Normally, in a case where two types of metal oxides form the electrode of the SOFC, an oxide ion conductor is used for one metal oxide, and an electron conductor or a mixed electron-oxide ion conductor is used for the other metal oxide. It is known that electrode activity is high at such dissimilar metal oxide interfaces. The same also applies not only to metal oxide, but also to other inorganic compounds. Thus, in a case where the columnar structure of the present embodiment is used as an electrode catalyst for, e.g., the SOFC, dissimilar material interfaces are present in high densities, and therefore, catalytic activity is high.
[0020] An electrode of the present embodiment includes an electrode component having the columnar structure of the present embodiment and a porous current collector layer provided on the electrode component. The current collector layer preferably includes multiple columnar bodies prepared on some columnar sections of the columnar structure and voids formed in-between the columnar bodies. Corresponding to the current collector layer having this structure, an effective electron supply to the electrode component can be achieved, and diffusion of oxygen or fuel essential to electrode reaction is not inhibited.
[0021] The interfaces between the dissimilar metal oxide layers exhibit a low mechanical strength along their planar direction, i.e., a low mechanical strength at the interface between the stacked layers. Thus, if the direction of such an interface is different between adjacent ones of the columnar sections, the direction in which the mechanical strength is low varies according to the columnar sections. In the columnar structure of the present embodiment, one columnar section compensates for the low mechanical strength of the other columnar section, and accordingly, the mechanical strength of the columnar structure increases. Thus, even if a thin columnar structure with reduced electrical resistance is used as an electrode catalyst for improving the performance of, e.g., the SOFC the necessary mechanical strength is obtained.
[0022] Note that in a case where an electrode catalyst having small metal oxide particles of the same type and having a large surface area is used for, e.g., the SOFC, the surface energy, i.e., the surface area, of the electrode catalyst decreases, and therefore, the metal oxide particles are easily sintered. When the metal oxide particles are sintered, the surface area further decreases, and therefore, the performance of the electrode catalyst is degraded. However, the columnar structure of the present embodiment includes the columnar sections, each of which is configured such that the different metal oxide layers are stacked on each other. Moreover, in the columnar structure of the present embodiment, a layer stacking direction is different between adjacent ones of the columnar sections. That is, the columnar structure of the present embodiment includes two or more adjacent columnar sections different from each other in the layer stacking direction.
[0023] The columnar structure of the present embodiment includes the columnar sections, each of which is configured such that the different metal oxide layers are stacked on each other. Moreover, the layer stacking direction is different between adjacent ones of the columnar sections. Thus, mass transfer at the contact interface between the columnar sections is inhibited, and the regions where the metal oxide particles of the same type exist together is small. Thus, even if the columnar structure of the present embodiment is used as the electrode catalyst of, e.g., the SOFC, sintering of the metal oxide is reduced. That is, if the columnar structure of the present embodiment is used as the electrode catalyst, the performance of the catalyst is sustained for a long period.
[0024] For improvement of the electrode catalytic activity and improvement of the material strength, the width of the columnar section is preferably 10 nm to 100 nm, and the thickness of the metal oxide layer is preferably 1 nm to 10 nm. This is because the substance forming each metal oxide layer retains such a size that it exhibits its physical properties as a crystal (substance) while a sufficient multilayer structure is formed in the columnar structure. Furthermore, this is because adjacent parts of the columnar sections, which contribute to relieving stress and catalytic activity improvement, can be sufficiently formed.
[0025] In the columnar structure of the present embodiment, the layer stacking direction of the multilayer part is different from the height direction of the columnar section. That is, the planar direction of the multilayer part and the height direction of the columnar section are not perpendicular to each other. Thus, when fuel or oxygen moves along the height direction of the columnar sections, inhibition of the movement of fuel or oxygen by layer interfaces in the multilayer structure is limited. Assuming that the planar direction of the multilayer part and the height direction of the columnar section is defined as 90° when the planar direction of the multilayer part and the height direction of the columnar section are orthogonal, the angle between the planar direction of the multilayer part and the height direction of the columnar section should preferably be between 5° and 85°.
[0026] The multilayer part may include two types of metal oxide layers as in the columnar structure of the present embodiment, or may include three or more different types of metal oxide layers as stacked layers. One of two or more types of metal oxide layers is preferably a (Ce,Gd)O.sub.2 layer, a (La,Sr)CoO.sub.3 layer, or a (La,Sr)(Co,Fe)O.sub.3 layer. Note that (Ce,Gd)O.sub.2 indicates a compound in which part of Ce of CeO.sub.2 is substituted with Gd, (La,Sr)CoO.sub.3 indicates a compound in which part of La of LaCoO.sub.3 is substituted with Sr, and (La,Sr)(Co,Fe)O.sub.3 indicates a compound in which part of La of LaCoO.sub.3 is substituted with Sr and part of Co of LaCoO.sub.3 is substituted with Fe.
[0027] For example, in a case where the multilayer part includes two types of metal oxide layers as in the columnar structure of the present embodiment, one metal oxide layer is the (Ce,Gd)O.sub.2 layer, and the other metal oxide layer is the (La,Sr)CoO.sub.3 layer or the (La,Sr)(Co,Fe)O.sub.3 layer. It is assumed that the columnar structure of the present embodiment can be used not only for the electrode catalyst but also for, e.g., a catalyst for chemical synthesis.
[0028] The columnar structure of the present embodiment including the multilayer parts, each of which is configured such that the different metal oxide layers are stacked on each other, and configured such that at least a part of the lateral surfaces of the columnar sections are in contact with each other is obtained in such a manner that the films of the different types of metal oxides are simultaneously formed on the polycrystalline base material by a PLD method. That is, the method for fabricating the composite structure of the embodiment of the present application has the step of simultaneously forming the different metal oxide layers on the polycrystalline base material by the pulsed laser deposition method.
EXAMPLES
Example 1
[0029] Using a PLD apparatus (PVD Products Inc., NanoPLD), films of (Ce,Gd)O.sub.2 (hereinafter “(Ce,Gd)O.sub.2” will be sometimes referred to as “GDC”) and (La,Sr)(Co,Fe)O.sub.3 (hereinafter, “(La,Sr)(Co,Fe)O.sub.3” will be sometimes referred to as “LSCF”) were simultaneously formed on a polycrystalline (Ce,Gd)O.sub.2 substrate. In this manner, a composite structure was produced. Note that the films were formed under such conditions in which an oxygen partial pressure is 35 mTorr, a substrate temperature is 750° C., film deposition time is 100 minutes, a distance between a target and the substrate is 75 mm, a substrate rotation speed is 10 rpm, the incident angle of laser light (Coherent Inc., Compex Pro 102F, KrF, a wavelength of 248 nm) is 60°, a laser energy is 200 mJ, and a laser repetition rate is 10 Hz. A TEM image and an HAADF-STEM image of the composite structure of the present example are shown in
[0030]
[0031] In the present example, the films of the different types of metal oxides were simultaneously formed on the polycrystalline substrate by the PLD method. Accordingly, the different metal oxide layers simultaneously nucleated in a several-nm region and were epitaxially grown, thereby forming the columnar section. In addition, the crystal orientation of the substrate material is not constant. Thus, the growth direction was different for each metal oxide particle, resulting in a stripe-like multilayer structure with different inclinations in adjacent columnar sections.
[0032] An HAADF-STEM image of this composite structure is shown in (a) of
Example 2
[0033] As in Example 1, films of GDC and LSCF were simultaneously formed on a polycrystalline (Ce,Gd)O.sub.2 substrate, and a columnar structure was produced on the substrate. Under such conditions in which an oxygen partial pressure is 100 mTorr, film deposition time is 90 minutes, a laser energy is 275 mJ, and a laser repetition rate is 20 Hz, a current collector layer of a porous layer of LSCF was, without heating the substrate, formed on the columnar structure by a PLD method, and an electrode was fabricated on a polycrystalline GDC substrate. A cross-sectional SEM image of the electrode of the present example is shown in
[0034] As shown in
Example 3
[0035] As in Example 1, films of GDC and (La,Sr)CoO.sub.3 (hereinafter “(La,Sr)CoO.sub.3” will be sometimes referred to as “LSC”) were simultaneously formed on a polycrystalline GDC substrate, and a columnar structure was produced on the substrate. Under such conditions in which an oxygen partial pressure is 100 mTorr, film deposition time is 45 minutes, a laser energy is 275 mJ, and a laser repetition rate is 20 Hz, a current collector layer of a porous layer of LSC was, without heating the substrate, formed on the columnar structure by a PLD method, and an electrode component was manufactured. Similarly, a columnar structure and a current collector layer were also formed on the back surface of the substrate, forming a symmetric cell for electrode performance test.
[0036] Using the cell of Example 3, the electrode reaction resistance (ASR) of the electrode and the ohmic resistance of the cell were calculated by the following method. First, LSC paste was applied to the current collector layer of the cell of Example 3, and a metal mesh was pressed against such paste. Next, using an electrochemical measurement apparatus (Princeton Applied Research, VersaSTAT4) including a frequency response analyzer (FRA), the impedance spectrum of the cell was measured in every predetermined time under such conditions in which a swept frequency range is 1 MHz to 0.1 Hz and an applied voltage amplitude is 10 mV.
[0037] From the obtained spectrum, the reaction resistance component and ohmic resistance component of the cell were calculated. A value obtained in such a manner in which the half value of the reaction resistance component is multiplied by the surface area of the current collector layer was taken as the ASR of the electrode component. The intersection of the obtained spectrum with the real axis of a high-frequency resistance component in a Nyquist plot was read as the ohmic resistance (R). From the thickness (L) of the polycrystalline substrate and the surface area (S) of the current collector layer, an electrical conductivity (σ) was calculated according to σ=L/R.Math.S.
[0038]
[0039] According to the present example, no great change in the electrode component structure, the electrode reaction resistance, and the ohmic resistance component was shown. As described above, the electrode of the present application includes the dense multilayer structure of the different types of metal oxides, and therefore, the catalytic activity is improved. Moreover, the electrode of the present application includes the dense multilayer structure of the different types of metal oxides, and therefore, the area of direct contact among the nanosized metal oxide particles of the same type can be decreased and sintering upon use for, e.g., the SOFC can be reduced. By suppressing sintering, the electrode of the present application can extend the performance lifetime, i.e., its performance as catalyst can be sustained for a long period.