Abstract
Disclosed herein is an x-ray interferometer for x-ray phase contrast imaging including an x-ray source, an x-ray source grating, two x-ray phase gratings, an x-ray analyzer grating and an x-ray detector. An alternative interferometer includes a periodically structured x-ray source, two x-ray phase gratings, an x-ray analyzer grating and an x-ray detector. The phase gratings are placed much closer to the x-ray detector than to the x-ray source and the image object is positioned upstream and close to the phase gratings to achieve high sensitivity and large field-of-view simultaneously.
Claims
1. An x-ray interferometer for x-ray phase contrast imaging, comprising: a) An x-ray source; b) A source grating with period p.sub.s placed downstream and close to the x-ray source; c) Two x-ray phase gratings with period p.sub.1 and p.sub.2 and an inter-grating distance D positioned downstream the source grating; d) An analyzer grating with period p.sub.a, placed in front of the x-ray detector; e) An x-ray detector.
2. The x-ray interferometer according to claim 1, wherein the source grating is an x-ray absorption grating made by deposition of high-density material(s) into trenches of a grating structure made of low-density material(s).
3. The x-ray source grating according to claim 2, wherein the high-density materials are, for examples, Au, Pt, W, Ir, Pb.
4. The x-ray source grating according to claim 2, wherein the low-density materials are, for examples, Si, Polymers.
5. The x-ray source grating according to claim 2, wherein the duty cycle (the ratio of the low absorption grating teeth width to the grating pitch) of the absorption grating is preferably below 50%.
6. The x-ray interferometer according to claim 1, wherein an optional filter is placed downstream (or upstream) the source grating to tailor the x-ray spectrum.
7. The x-ray interferometer according to claim 1, wherein the periods p.sub.1 and p.sub.2 of the two phase gratings are selected the same.
8. The x-ray interferometer according to claim 1, wherein the periods p.sub.1 and p.sub.2 of the two phase gratings are selected to be different.
9. The x-ray interferometer according to claim 1, wherein one or both of the phase gratings consist of a single element.
10. The x-ray interferometer according to claim 1, wherein one or both of the phase gratings consist of alternative high-density material and low-density material.
11. The x-ray phase grating according to claim 9, wherein the single element phase grating is made by deep reactive ion etch of Si.
12. The x-ray phase gratings according to claim 10, wherein the phase grating is made by deposition of high-density materials into trenches of low-density grating structures.
13. The x-ray phase gratings according to claim 12, wherein the high-density materials are, for examples, Ni, Au, Pt, W, Ir, Pb.
14. The x-ray phase gratings according to claim 12, wherein the low-density materials are, for examples, Si, Polymers.
15. The x-ray interferometer according to claim 1, wherein the analyzer grating is an x-ray absorption grating made by deposition of high-density material(s) into trenches of a grating structure made of low-density material(s).
16. The x-ray analyzer grating according to claim 15, wherein the high-density materials are, for examples, Au, Pt, W, Ir, Pb.
17. The x-ray analyzer grating according to claim 15, wherein the low-density materials are, for examples, Si, Polymers, Al.
18. The analyzer grating according to claim 15, wherein the duty cycle (the ratio of the low absorption grating teeth width to the grating pitch) of the absorption grating is preferably around 50%.
19. The x-ray interferometer according to claim 1, wherein the period of the source grating (p.sub.s) is given by where p.sub.1 and p.sub.2 are the period of the two phase gratings, D is the distance between the two phase gratings, L.sub.2 is the distance between the second phase grating and the analyzer grating, L is the distance between the source grating and the analyzer grating.
20. The x-ray interferometer according to claim 1, wherein the analyzer grating period is given by,
21. The x-ray interferometer according to claim 1, wherein grating parameters of the two x-ray phase gratings and the geometric parameters (D, L.sub.2, and L) are initially selected to meet the source-to-detector distance restriction, satisfy the minimum interferometer sensitivity requirement and achieve a fringe visibility of the universal moiré pattern formed by the two phase gratings preferably ≥10%.
22. The phase grating parameters according to claim 21, wherein the phase shifts of the two phase gratings are optimized between a fraction of π to multiple π to maximize the fringe visibility.
23. The phase grating parameters according to claim 21, wherein the duty cycles of the two phase gratings are optimized between 20% to 80% to maximize the fringe visibility.
24. The phase grating parameters according to claim 21, wherein the phase rising (or falling) width of the two phase gratings are optimized between 0 to 50% the grating period to maximize the fringe visibility.
25. The x-ray interferometer according to claim 1, wherein iterations are taken to optimize the grating parameters and geometric parameters to improve the interferometer fringe visibility to preferably ≥15%.
26. The x-ray interferometer according to claim 1, wherein the x-ray source and the source grating is replaced by a periodically structured x-ray source, whose period is given by where p.sub.1 and p.sub.2 are the period of the two phase gratings, D is the distance between the two phase gratings, L.sub.2 is the distance between the second phase grating and the analyzer grating, L is the distance between the structured source and the analyzer grating.
27. The x-ray interferometer according to claim 26, wherein the analyzer grating period is given by,
28. The x-ray interferometer according to claim 26, wherein the periodically structured x-ray source is generated by creating an equally spaced array of electron lines or dots on an anode of the x-ray source.
29. The x-ray interferometer according to claim 26, wherein the periodically structured x-ray source is generated by using a periodically structured anode.
30. The structured x-ray source according to claim 26, wherein the duty cycle (the ratio of each individual x-ray emission element width to the pitch of the source) of the structured x-ray source is preferably ≤50%.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0022] The embodiments of the present invention will become better understood with reference to the following drawings. It is noted that, for purpose of illustrative clarity, certain elements in various drawings may not be drawn to scale. These drawings depict exemplary embodiments of the disclosure, but should not be considered to limit its scope. Preferred examples and embodiments are described hereinafter with reference to the accompanying drawings, wherein:
[0023] FIG. 1 is a schematic illustration of an x-ray interferometer consisting of a polychromatic, low spatial coherence medical x-ray tube, a source grating, an optional filter, two phase gratings, an analyzer grating, and a medical x-ray detector, according to an embodiment of the present invention.
[0024] FIG. 2 is a schematic illustration of an x-ray interferometer, consisting of a structured x-ray source, an optional filter, two phase gratings, an analyzer grating and a medical x-ray detector, according to an embodiment of the present invention.
[0025] FIG. 3 is a cross-sectional illustration of the source grating consisting of low absorption and high absorption materials.
[0026] FIG. 4 is a cross-sectional illustration of a single element phase grating with trapezoid shaped grating teeth.
[0027] FIG. 5 is a cross-sectional illustration of a trapezoid shaped phase grating consisting of weak phase shift and strong phase shift materials.
[0028] FIG. 6 is a cross-sectional illustration of the analyzer grating consisting of low absorption and high absorption materials.
DETAILED DESCRIPTION
[0029] Various embodiments of the disclosure are discussed in details below. While specific implementations are discussed, it should be understood that this is done for illustration purposes only. A person skilled in the relevant art will recognize that other components and configurations may be used without parting from the spirit and scope of the disclosure. Thus, the following description, drawings and examples are illustrative and are not to be construed as limiting.
[0030] In a first embodiment of the present invention, the x-ray interferometer is constituted by a medical x-ray source 100, an x-ray absorption grating called a source grating 200, a first x-ray phase grating 211, a second x-ray phase grating 212, an x-ray absorption grating called an analyzer grating 220, and an x-ray detector 300 (refer to FIG. 1). The size of the source grating 200 is selected to be large enough to cover the cone-beam projection of the detector at the source grating plane, typically a few cm by a few cm. An optional filter 500 is placed downstream or upstream the source grating 200 to tailor the x-ray spectrum if preferred. The image object 400 is typically positioned upstream and close to the first phase grating 211. The combination of a medical x-ray source and a source grating represents an array of line sources, where the width of each individual line meets the spatial coherence requirement.
[0031] In a second embodiment, the conventional medical x-ray source and the source grating is replaced by a structures x-ray source 100-SS (Refer to FIG. 2), while all the other components are the same as in the first embodiment illustrated in FIG. 1.
[0032] The x-ray source 100 (Refer to FIG. 1) is a typical medical x-ray source for a specific application, for example, a rotating anode x-ray source. The source grating 200 (Refer to FIG. 1) is an x-ray absorption grating, consisting of a low x-ray absorption substrate 201, a group of low absorption grating teeth 202 and a group of high absorption grating teeth 203 (Refer to FIG. 3). The substrate 201 is, for example, Si or other low-density materials. The low absorption grating teeth 202 are for example, Si, polymer or other low-density materials. When grating teeth 202 are Si, they can be fabricated on the Si substrate 201 via wet or dry deep Si etch. The high absorption grating teeth 203 are for example, Au, Pt or other high-density material. The shape of the grating teeth is preferred to be rectangle. Perfectly rectangular grating teeth are not practical during the fabrication process. Deviations from rectangular shape, such as curved rectangle, trapezoid, curved trapezoid, etc., and roughness on the sidewall surfaces are all acceptable, provided that periodical x-ray transmission and absorption pattern is clearly defined. The duty cycle, defined as the ratio of the low absorption grating teeth width to the grating pitch, of grating 200 is typically selected between 25% to 50%, preferably below 50%. A smaller duty cycle improves the interferometer fringe visibility at the cost of the transmitted x-ray flux. When an x-ray structured source is used (Refer to FIG. 2), the duty cycle of the source 100-SS, defined as the ratio of each individual x-ray emission element width to the pitch of the source, is typically selected between 25% to 50%, preferable below 50%.
[0033] The x-ray phase gratings 211 and 212 (Refer to FIG. 1 and FIG. 2) are typically selected to have an approximately isosceles trapezoid grating teeth. Fabrication process introduced slightly deviations from isosceles trapezoid are acceptable. A phase grating can consist of a single element (for example, a Si grating) 211-212-S(Refer to FIG. 4). A phase grating can consist of multiple materials, 211-212-M (Refer to FIG. 5), including a low x-ray absorption substrate 211-212-M1, a group of weak phase shift (phase shift refer to relative phase shift compared to air throughout the disclosure) grating teeth 211-212-M2 and a group of strong phase shift grating teeth 211-212-M3 (Refer to FIG. 5). The aspect ratio (defined as two times the ratio of the grating depth to the grating pitch) of a multiple-material phase grating is much smaller than that of a single material phase grating at the same x-ray phase shift level. The substrate 211-212-M1 is, for example, Si or other low-density materials. The week phase shift grating teeth 211-212-M2 are for example, Si, polymer or other low-density materials. The strong phase shift grating teeth 211-212-M3 are for example, nickel, gold or other high-density materials. The grating phase shift can be optimized typically in the range of a fraction of π to a few π at the central x-ray energy to maximize the interferometer fringe visibility. The intensity modulations introduced by the phase gratings, particularly when multiple-material phase gratings are used, play a role in the interferometer, typically slightly improve the fringe visibility. The multiple-material phase gratings, particularly when the phase shifts are above π, are sometimes called hybrid (phase and absorption) gratings. In this disclosure, we call such gratings as phase gratings. The average duty cycle, defined as the ratio of the average weak phase shift grating teeth width to the grating pitch (e. g. ratio of the Si teeth width to the grating pitch in a Si/Au phase grating), can be optimized in the range of 25% to 80% to maximize the interferometer fringe visibility. The width for the phase rising w.sub.r or phase falling w.sub.f (Refer to FIG. 4 and FIG. 5) can be optimized in the range of 0 to 50% the grating pitch to maximize the interferometer fringe visibility.
[0034] The analyzer grating 220 is an x-ray absorption grating, consisting of a low x-ray absorption substrate 221, a group of low absorption grating teeth 222 and a group of high absorption grating teeth 223 (Refer to FIG. 6). The substrate 221 is, for example, Si or other low-density materials. The low absorption grating teeth 222 are for example, Si, polymer or other low-density materials. When grating teeth 222 are Si, they can be fabricated on the Si substrate 221 via wet or dry deep Si etch. The high absorption grating teeth 223 are for example, Au, Pt or other high-density materials. The shape of the grating teeth is preferred to be rectangle. Perfectly rectangular grating teeth are not practical during the fabrication process. Deviations from rectangular shape, such as curved rectangle, trapezoid, curved trapezoid, etc., and roughness on the sidewall surfaces are all acceptable, provided that periodical x-ray transmission and absorption pattern is clearly defined. The duty cycle grating 220 is typically selected to be approximately 50%.
[0035] The period of the source grating 200 (Refer to FIG. 1) or the period of the structured x-ray source 100-SS (Refer to FIG. 2) is selected as:
[00001]
Where L, L.sub.2 and D are the distance from the source grating 200 or the structured source 100-SS to the analyzer grating 220, the distance from the phase grating 212 to the analyzer grating 220, and the distance between the two phase gratings 211 and 212, respectively, as illustrated in FIG. 1 and FIG. 2. p.sub.1 and p.sub.2 are the periods of the phase gratings 211 and 212, respectively. The source grating period can be slightly different from p.sub.s as long as the fringe visibility of the interferometer is not obviously degraded.
[0036] The period of the analyzer grating 220 (Refer to FIG. 1 and FIG. 2) is selected as:
[00002]
Where L.sub.1 is the distance from the source grating 200 or the structured source 100-SS to the phase grating 211, as illustrated in FIG. 1 and FIG. 2. The period of the analyzer grating 220 can be slightly different from p.sub.a as long as the fringe period at the detector is resolvable by the detector.
[0037] The image object 400 is designed to be upstream and close to the phase grating 211. The interferometer sensitivity at the object is η=L.sub.O/p.sub.s, where L.sub.O is the distance from the source grating 200 or the structured source 100-SS to the image object 400, as illustrated in FIG. 1 and FIG. 2. When the projections of the gratings cover the entire x-ray detector, the field-of-view is proportional to the distance between the x-ray source and the image object (L.sub.S-O) and inversely proportional to the source-to-detector distance (L.sub.S-D). When a structured x-ray source is used, the source-to-object distance and the source-to-detector distance are L.sub.O and L, respectively, as illustrated in FIG. 2. When a medical x-ray source and a source grating are used, L.sub.S-O and L.sub.S-D are not marked in FIG. 1 for simplicity, which should not cause any confusion.
[0038] For a specific application, given the source-to-detector distance restriction, the period and position of the phase gratings 211 and 212 (Refer to FIG. 1 and FIG. 2) are selected to satisfy the interferometer sensitivity and field-of-view requirements and, at the same time, to provide a high contrast universal moiré pattern at the plane of the analyzer grating. Since the field-of-view and the interferometer sensitivity both increase with the increase of the distance between the source and the image object, the phase gratings are designed to be placed closer to the detector than the x-ray source. The distance between the phase grating 211 and the source grating 200 (Refer to FIG. 1) or the structured source 100-SS (Refer to FIG. 2) is limited by the source-to-detector distance restriction and by the fringe visibility of the universal moiré pattern, which requires certain distance between the phase grating 212 and the analyzer grating 220. Using the fringe visibility of the universal moiré pattern, generated by phase gratings 211 and 212, as the figure of merit, the parameters of phase gratings 211 and 212 (periods, phase shifts and cross-sectional profiles), and their positions are globally optimized.
[0039] The embodiments of the invention are best described by application examples as described below.
EXAMPLES
Example 1: An X-Ray Interferometer for Multi-Contrast Chest X-Ray Radiography
[0040] The interferometer (Refer to FIG. 1) consists of a tungsten targeted rotating anode x-ray source 100; a 6 cm×6 cm area, 30.1 μm period, 25% duty cycle, 300 μm height Si/Au source grating 200; a 38 cm×31.5 cm area (twelve 9.5 cm×10.5 cm gratings stitched together), 900 nm period, 9 μm height Si/Au phase grating 211; a 38 cm×31.5 cm area (twelve 9.5 cm×10.5 cm gratings stitched together), 900 nm period, 12.5 μm height Si/Au phase grating 212; a 44 cm×36 cm area (sixteen 11 cm×9 cm gratings stitch together), 30.1 μm period, 50% duty cycle, 300 μm height Si/Au analyzer grating 220; and a 43 cm×35 cm direct deposit CsI x-ray flat panel detector 300. The source grating 200 is placed approximately 0.1 m downstream the focal spot of the x-ray source 100 and the analyzer grating 220 is placed approximately 0.01 m upstream the detector 300. The distances from the source grating 200 to the analyzer grating 220, from the phase grating 211 to the phase grating 212, and from the phase grating 212 to the analyzer grating 220 are L=1.907 m, D=0.057 m and L.sub.2=0.25 m, respectively. The duty cycle and the phase rising (or falling) width (Refer to FIG. 4 and FIG. 5, w.sub.r or w.sub.f) of grating 211 are 65% and 225 nm. The duty cycle and the phase rising (or falling) width of grating 212 are 65% and 225 nm. At 90 kVp x-ray tube operation voltage, the fringe visibility is estimated to be 20%. The maximally achievable interferometer sensitivity is η=5.3×10.sup.4. The image object position is designed to be upstream and close to the phase grating 211. Assuming the image object thickness is 40 cm, the average effective interferometer sensitivity at the object is approximately 4.7×10.sup.4. The field-of-view at the central plane of the image object is approximately 32 cm×26 cm. The field-of-view can be further increased by using a combination of two x-ray flat panel detectors and larger area gratings, or by scanning the interferometer across the image object.
[0041] Variations of the grating parameters from the designed values are well tolerated. A 2% fringe visibility degradation allows at least, for the source grating 200 or the analyzer grating 220, +5% variation of the duty cycle; or for the phase gratings 211 or 212, +10% variation of the grating height, or +5% variation of the duty cycle, or +20% variation of the phase rising (or falling) width.
[0042] The grating parameters can be easily controlled within the acceptable range during the grating fabrication process. In one embodiment of the grating fabrication, the source grating 200 of 30.1 μm period is fabricated by deep reactive ion etching (DRIE) of Si to 300 μm in depth. The Si grating teeth width is controlled to around 7.5 μm by controlling the grating teeth width during the lithography process and the DRIE process. The trenches are then filled with Au via electrodeposition. The phase gratings 211 and 212 of 900 nm period are patterned by i-line stepper and deep etched by DRIE of Si. By controlling the DRIE process, the grating 211 height is controlled to 9±0.9 μm, the average Si teeth width is controlled to 585±45 nm, and the phase rising (or falling) width is controlled to 225±45 nm. The grating 212 height is controlled to 12.5±1.25 μm, the average Si teeth width is controlled to 585±45 nm, and the phase rising (or falling) width is controlled to 225±45 nm. Au is deposited via electroplating to fill the trenches to complete the fabrication of phase gratings 211 and 212. The analyzer grating 220 of 30.1 μm period is fabricated by DRIE of Si to 300 μm in depth. The Si grating teeth width is controlled to around 15 μm by controlling the grating teeth width during the lithography process and the DRIE process. The trenches are then filled with Au via electrodeposition.
Example 2: An X-Ray Interferometer for Multi-Contrast Chest X-Ray Radiography Using a Lead X-Ray Grid as the Analyzer Grating
[0043] Large area x-ray absorption gratings made of Au are costly. In this example, the analyzer grating period is enlarged by using two phase gratings with different period, so that a lead x-ray grid can be used as the analyzer grating. The interferometer (Refer to FIG. 1) consists of a tungsten targeted rotating anode x-ray source 100; a 6 cm×6 cm area, 33 μm period, 25% duty cycle, 300 μm height Si/Au source grating 200; a 36 cm×30 cm area (twelve 9 cm×10 cm gratings stitched together), 811 nm period, 9 μm height Si/Au phase grating 211; a 36 cm×30 cm area (twelve 9 cm×10 cm gratings stitched together), 825 nm period, 18 μm height Si/Au phase grating 212; a 43 cm×35 cm size, 230 lines per inch (or 90 lines per cm), 50% duty cycle, 2 m focal distance aluminum interspaced lead grid as the analyzer grating 220; and a 43 cm×35 cm direct deposit CsI x-ray flat panel detector 300. The source grating 200 is placed approximately 0.1 m downstream the focal spot of the x-ray source 100 and the analyzer grating 220 (lead grid) is attached to the detector 300. The distances from the source grating 200 to the analyzer grating 220, from the phase grating 211 to the phase grating 212, and from the phase grating 212 to the analyzer grating 220 are L=1.993 m, D=0.043 m and L.sub.2=0.35 m, respectively. The duty cycle and the phase rising (or falling) width of grating 211 are 55% and 203 nm. The duty cycle and the phase rising (or falling) width of grating 212 are 70% and 206 nm. At 90 kVp x-ray tube operation voltage, the fringe visibility is estimated to be 19%. The maximally achievable interferometer sensitivity is η=4.8×10.sup.4. The image object position is designed to be upstream and close to the phase grating 211. Assuming the image object thickness of 40 cm, the average effective interferometer sensitivity at the object is approximately 4.2×10.sup.4. The field-of-view at the central plane of the image object is approximately 31 cm×25 cm. The field-of-view can be further increased by using a combination of two x-ray flat panel detectors and larger area gratings, or by scanning the interferometer across the image object.
[0044] A 2% fringe visibility degradation allows at least, for the source grating 200 or the analyzer grating 220, ±5% variation of the duty cycle; or for the phase gratings 211 or 212, ±10% variation of the grating height, or ±5% variation of the duty cycle, or ±20% variation of the phase rising (or falling) width. The grating parameters can easily be controlled to the tolerant range during the fabrication process.
Example 3: An x-Ray Interferometer for Multi-Contrast Breast Imaging
[0045] The interferometer (Refer to FIG. 1) consists of a tungsten target rotating anode x-ray source 100; a 6 cm×6 cm area, 5.7 μm period, 25% duty cycle, 60 μm height Si/Au source grating 200; a 24 cm×20 cm area (six 8 cm×10 cm gratings stitched together), 1.25 μm period, 4.4 μm height Si/Au phase grating 211; a 30 cm×24 cm area (nine 8 cm×10 cm gratings stitched together), 1.25 μm period, 8.8 μm height Si/Au phase grating 212; a 30 cm×24 cm area (nine 8 cm×10 cm gratings stitched together), 5.7 μm period, 50% duty cycle, 60 μm height Si/Au source grating 220; and a 29 cm×24 cm amorphous selenium x-ray flat panel detector. The source grating 200 is placed approximately 0.13 m downstream the focal spot of the x-ray source 100 and the analyzer grating 220 is placed approximately 0.01 m upstream the detector 300. The distances from the source grating 200 to the analyzer grating 220, from the phase grating 211 to the phase grating 212, and from the phase grating 212 to the analyzer grating 220 are L=0.56 m, D=0.123 m and L.sub.2=0.027 m, respectively. The duty cycle and the phase rising (or falling) width of the phase grating 211 are 50% and 0.375 μm. The duty cycle and the phase rising (or falling) width of the phase grating 212 are 70% and 0.375 μm. At 36 kVp tube operation voltage, the fringe visibility is estimated to be 17%. The maximally achievable interferometer sensitivity is η=7.2×10.sup.4. The image object position is designed to be upstream and close to the phase grating 211. Assuming the image object thickness is 8 cm, the average effective interferometer sensitivity at the object is approximately 6.5×10.sup.4. The field-of-view at the central plane of the image object is approximately 21 cm×17 cm.
[0046] A 2% fringe visibility degradation allows at least, for the source grating 200 or the analyzer grating 220, ±5% variation of the duty cycle; or for the phase gratings 211 or 212, ±10% variation of the grating height, or ±5% variation of the duty cycle, or ±20% variation of the phase rising (or falling) width. The grating parameters can easily be controlled to the tolerant range during the fabrication process.
