SUPPORT APPARATUS AND SUBSTRATE POLISHING APPARATUS INCLUDING THE SAME
20260070185 ยท 2026-03-12
Assignee
Inventors
Cpc classification
International classification
Abstract
A support apparatus including a support portion configured to support a polishing portion for polishing a substrate; a fastening portion configured to fasten the polishing portion and the support portion; and a tilt adjustment portion configured to adjust a tilt of the polishing portion, the fastening portion including a fastening body attached to a side surface of the polishing portion; protrusions protruding outwardly from the fastening body, and the protrusions defining internal spaces therein; the support portion surrounding the side surface of the polishing portion, and defining insertion holes on the inner surface of the support portion, configured to respectively receive the protrusions ; the tilt adjustment portion including tilt adjustment shafts penetrating the support portion to pass through respective ones of the internal spaces and respective ones of the insertion holes.
Claims
1. A support apparatus comprising: a support portion configured to support a polishing portion for polishing a substrate; a fastening portion configured to fasten the polishing portion and the support portion; and a tilt adjustment portion configured to adjust a tilt of the polishing portion, the fastening portion including a fastening body attached to a side surface of the polishing portion; protrusions protruding outwardly from the fastening body along a circumferential direction of the side surface of the polishing portion, and the protrusions defining internal spaces therein; the support portion surrounding the side surface of the polishing portion, and defining insertion holes on an inner surface of the support portion, the insertion holes configured to receive respective ones of the protrusions; the tilt adjustment portion including tilt adjustment shafts penetrating the support portion to pass through respective ones of the internal spaces and respective ones of the insertion holes, and the tilt adjustment shafts including catch fringes extended outwardly from parts of the tilt adjustment shafts corresponding to the internal spaces respectively and caught on ceiling walls and floor walls of the protrusions; and fixing portions configured to fix each of the tilt adjustment shafts to a position set with respect to the support portion, the tilt adjustment shafts and the support portion screw-connected to each other.
2. The support apparatus of claim 1, wherein respective ends of each of the tilt adjustment shafts are exposed to an outside of the support portion, each of the fixing portions is screw-connected to each of the respective ends.
3. The support apparatus of claim 2, wherein at least some of the fixing portions include: a first nut screw-connected to a respective one of the tilt adjustment shafts; a second nut screw-connected to an outer part of the respective tilt adjustment shaft compared to the first nut; and an elastic connection portion connected to a part of the respective tilt adjustment shaft between the first nut and the second nut and having elasticity.
4. The support apparatus of claim 2, wherein at least some of the fixing portions include: an inner body screw-connected to the tilt adjustment shaft; an outer body surrounding an outer surface of the inner body; a locking pin having an end connected to the inner body configured to be rotatable around the end between an outer position where the other end thereof protrudes from the outer surface of the inner body and an inner position where the other end does not protrude from the outer surface of the inner body; and an elastic portion configured to apply elastic force to the locking pin in a direction in which the other end of the locking pin is positioned at the outer position, an inner surface of the outer body includes a plurality of teeth along an inner circumferential direction of, each of the teeth includes: a side inclined surface having a tilt at which the other end of the locking pin positioned at the outer position is configured to be caught by the side inclined surface based on a rotational force being applied to the outer body in a direction in which the inner body moves toward the support portion along the tilt adjustment shaft; and an other-side inclined surface having a tilt at which the other end of the locking pin positioned at the outer position is configured to be guided to the inner position by the other-side inclined surface based on a rotational force being applied to the outer body in a direction in which the inner body moves away from the support portion along the tilt adjustment shaft.
5. The support apparatus of claim 1, wherein at least some of the tilt adjustment portions further include an upper reinforcement plate between the ceiling wall of the internal space and the catch fringe, and penetrated by the tilt adjustment shaft, and wider outwardly than the catch fringe.
6. The support apparatus of claim 1, wherein at least some of the tilt adjustment portions further include a lower reinforcement plate between the floor wall of the internal space and the catch fringe, and penetrated by the tilt adjustment shaft, and wider outwardly than the catch fringe.
7. The support apparatus of claim 1, further comprising a plurality of the fastening portions in a vertical direction.
8. The support apparatus of claim 1, wherein the fastening portion includes: an upper fastening portion configured to be fastened to an upper part of a housing of the polishing portion; and a lower fastening portion configured to be fastened to the lower part of the housing, the protrusions of the upper fastening portion and the protrusions of the lower fastening portion are at same positions as each other when viewed from above.
9. A substrate polishing apparatus comprising: a polishing portion configured to polish a substrate; and a support apparatus configured to support the polishing portion and adjust a tilt of the polishing portion, the polishing portion includes: a rotation shaft configured to be rotatable about a vertical direction as an axial direction; a housing defining a space inside to accommodate an upper part of the rotation shaft; and a polishing head having an upper surface connected to a lower end of the rotation shaft, the support apparatus includes: a support portion configured to support the polishing portion; a fastening portion configured to fasten the polishing portion and the support portion; and a tilt adjustment portion configured to adjust the tilt of the polishing portion, the fastening portion includes: a fastening body attached to a side surface of the housing; protrusions protruding outwardly from the fastening body along a circumferential direction of the side surface of the housing, and the protrusions defining internal spaces therein; the support portion surrounding the side surface of the housing, and defining insertion holes on an inner surface of the support portion, the insertion holes configured to receive respective ones of the protrusions; the tilt adjustment portion including: tilt adjustment shafts penetrating the support portion to pass through respective ones of the internal spaces and respective ones of the insertion holes, and the tilt adjustment shafts including catch fringes extended outwardly from parts of the tilt adjustment shafts corresponding to the internal spaces respectively and caught on ceiling walls and floor walls of the protrusions; and fixing portions configured to fix each of the tilt adjustment shafts to a position set with respect to the support portion, the tilt adjustment shafts and the support portion screw-connected to each other.
10. The substrate polishing apparatus of claim 9, wherein respective ends of each of the tilt adjustment shafts are exposed to an outside of the support portion, each of the fixing portions is screw-connected to each of the respective ends.
11. The substrate polishing apparatus of claim 10, wherein at least some of the fixing portions include: a first nut screw-connected to a respective one of the tilt adjustment shafts; a second nut screw-connected to an outer part of the respective tilt adjustment shaft compared to the first nut; and an elastic connection portion connected to a part of the respective tilt adjustment shaft between the first nut and the second nut and having elasticity.
12. The substrate polishing apparatus of claim 10, wherein at least some of the fixing portions include: an inner body screw-connected to the a respective one of tilt adjustment shafts; an outer body surrounding an outer surface of the inner body; a locking pin having an end connected to the inner body configured to be rotatable around the end between an outer position where another end of the locking pin protrudes from the outer surface of the inner body and an inner position where the other end does not protrude from the outer surface of the inner body; and an elastic portion configured to apply elastic force to the locking pin in a direction in which the other end of the locking pin is positioned at the outer position, an inner surface of the outer body including a plurality of teeth along an inner circumferential direction of the inner surface of the outer body, each of the teeth includes: a side inclined surface configured to have a tilt at which the other end of the locking pin positioned at the outer position is configured to be caught by the side inclined surface based on a rotational force being applied to the outer body in a direction in which the inner body moves toward the support portion along the respective tilt adjustment shaft; and an other-side inclined surface having a tilt at which the other end of the locking pin positioned at the outer position is configured to be guided to the inner position by the other-side inclined surface based on a rotational force being applied to the outer body in a direction in which the inner body moves away from the support portion along the tilt adjustment shaft.
13. The substrate polishing apparatus of claim 9, wherein at least some of the tilt adjustment portions further include an upper reinforcement plate between the ceiling wall of the internal space and the catch fringe, and penetrated by the tilt adjustment shaft, and wider outwardly than the catch fringe.
14. The substrate polishing apparatus of claim 9, wherein at least some of the tilt adjustment portions further include a lower reinforcement plate between the floor wall of the internal space and the catch fringe, and penetrated by the tilt adjustment shaft, and wider outwardly than the catch fringe.
15. A substrate polishing apparatus comprising: a polishing portion configured to polish a substrate; and a support apparatus configured to support the polishing portion and adjust a tilt of the polishing portion, the polishing portion including a rotation shaft configured to rotate about a vertical direction as an axial direction; a housing defining a space inside to accommodate an upper part of the rotation shaft; and a polishing head having an upper surface connected to a lower end of the rotation shaft, the support apparatus including a support portion configured to support the polishing portion; a fastening portion configured to fasten the polishing portion and the support portion; and a tilt adjustment portion configured to adjust the tilt of the polishing portion, the fastening portion including a fastening body attached to a side surface of the housing; protrusions protruding outwardly from the fastening body along a circumferential direction of the side surface of the housing, and the protrusions defining internal spaces therein; the support portion surrounding the side surface of the housing, and defining insertion holes on an inner surface of the support portion, the insertion holes configured to receive respective ones of the protrusions; the tilt adjustment portion including tilt adjustment shafts penetrating the support portion to pass through respective ones of the internal spaces and respective ones of the insertion holes, and the tilt adjustment shafts including catch fringes extended outwardly from parts of the tilt adjustment shafts corresponding to the internal spaces respectively and caught on ceiling walls and floor walls of the protrusions; and fixing portions configured to fix each of the tilt adjustment shafts to a position set with respect to the support portion, the tilt adjustment shafts and the support portion screw-connected to each other, the fastening portion including an upper fastening portion configured to be fastened to an upper part of the housing; and a lower fastening portion configured to be fastened to the lower part of the housing.
16. The substrate polishing apparatus of claim 15, wherein the protrusions of the upper fastening portion and the protrusions of the lower fastening portion are at same positions as each other when viewed from above.
17. The substrate polishing apparatus of claim 15, wherein respective ends of each of the tilt adjustment shafts are exposed to an outside of the support portion, each of the fixing portions is screw-connected to each of the respective ends.
18. The substrate polishing apparatus of claim 17, wherein at least some of the fixing portions include: a first nut screw-connected to a respective one the tilt adjustment shaft; a second nut screw-connected to an outer part of the respective tilt adjustment shaft compared to the first nut; and an elastic connection portion connected to a part of the respective tilt adjustment shaft between the first nut and the second nut and having elasticity.
19. The substrate polishing apparatus of claim 17, wherein at least some of the fixing portions include: an inner body screw-connected to the tilt adjustment shaft; an outer body surrounding an outer surface of the inner body; a locking pin having an end connected to the inner body configured to be rotatable around the end between an outer position where the other end thereof protrudes from the outer surface of the inner body and an inner position where the other end does not protrude from the outer surface of the inner body; and an elastic portion configured to apply elastic force to the locking pin in a direction in which the other end of the locking pin is at the outer position, an inner surface of the outer body including a plurality of teeth along an inner circumferential direction of the inner surface of the outer body, each of the teeth includes: a side inclined surface having a tilt at which the other end of the locking pin positioned at the outer position is configured to be caught by the side inclined surface based on a rotational force being applied to the outer body in a direction in which the inner body moves toward the support portion along the tilt adjustment shaft; and an other-side inclined surface having a tilt at which the other end of the locking pin positioned at the outer position is configured to be guided to the inner position by the other-side inclined surface based on a rotational force being applied to the outer body in a direction in which the inner body moves away from the support portion along the tilt adjustment shaft.
20. The substrate polishing apparatus of claim 15, wherein at least some of the tilt adjustment portions further include an upper reinforcement plate between the ceiling wall of the internal space and the catch fringe, and penetrated by the tilt adjustment shaft, and wider outwardly than the catch fringe.
Description
BRIEF DESCRIPTION OF DRAWINGS
[0011] The above and other features of the present disclosure will be more clearly understood from the following detailed description, taken in conjunction with the accompanying drawings.
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DETAILED DESCRIPTION OF THE EMBODIMENTS
[0031] Hereinafter, embodiments of the present disclosure will be described in detail and with sufficient clarity for those skilled in the art to easily implement the invention.
[0032]
[0033] Referring to
[0034] The polishing portion 1000 polishes the substrate while pressurizing the substrate. According to some example embodiments, the polishing portion 1000 may include a rotation shaft 1100, a housing 1200 and a polishing head 1300.
[0035] The rotation shaft 1100 is rotatable in the vertical direction as the axial direction. According to some example embodiments, the rotation shaft 1100 may be rotated by a rotation driver (not illustrated). For example, the rotation driver may be provided in various configurations such as an electric motor that may apply a rotational driving force to the rotation shaft. The rotation shaft 1100 may be a cylindrical structure having a longitudinal direction in the vertical direction.
[0036] The housing 1200 has a space inside which the upper part of the rotation shaft 1100 is accommodated. According to some example embodiments, a part of the rotation shaft 1100 including the upper end may be accommodated in the space of the housing 1200. The rotation shaft 1100 may be connected to a rotation driver within the space of the housing 1200. In addition, the lower end of the rotation shaft 1100 may be exposed below the housing 1200. The housing 1200 may be provided as a cylindrical structure having a longitudinal direction generally parallel to the axial direction of the rotation shaft 1100 and a diameter larger than that of the rotation shaft 1100.
[0037] The polishing head 1300 polishes the substrate by rotating while keeping the lower surface in close contact with the substrate. An upper surface of the polishing head 1300 may be connected the lower end of the rotation shaft 1100 to make the axial direction of the polishing head 1300 align with the axial direction of the rotation shaft 1100. The polishing head 1300 may rotate according to the rotation of the rotation shaft 1100. The polishing head 1300 may be provided as a disk structure having a diameter larger than the diameter of the rotation shaft 1100.
[0038] The support apparatus 2000 supports the polishing portion 1000. In addition, the support apparatus 2000 adjusts the tilt of the polishing portion 1000. According to some example embodiment, the support apparatus 2000 may include a support portion 2100, a fastening portion 2200 and a tilt adjustment portion 2300.
[0039] The support portion 2100 supports the polishing portion 1000 to make the polishing portion 1000 position on the substrate that is the polishing target. The support portion 2100 is provided as a structure that surrounds the side surface of the polishing portion 1000. According to some example embodiments, the support portion 2100 may be provided as a ring structure surrounding the side surface of the housing 1200.
[0040] A plurality of insertion holes 2110 may be formed on the inner surface of the support portion 2100. Protrusions 2220 may be inserted into the insertion holes 2110 respectively. Therefore, the insertion holes 2110 may be arranged in response to the arrangement structure of the protrusions 2220. According to some example embodiments, the insertion holes 2110 may be arranged to be spaced apart from each other at a certain interval along the inner circumferential direction of the support portion 2100. For example, the insertion holes 2110 may be provided in three numbers, and may be arranged at about or exactly a 120 interval from each other along the inner circumferential direction of the support portion 2100 with the center of the housing 1200 as the vertex when viewed from above.
[0041]
[0042] Referring to
[0043] The fastening body 2210 may be attached to the side surface of the polishing portion 1000. According to some example embodiments, the fastening body 2210 may be attached to the side surface of the housing 1200. For example, the fastening body 2210 may be provided as a ring structure that surrounds the side surface of the housing 1200. The fastening body 2210 may be attached to the side surface of the housing 1200 in various ways. For example, the fastening body 2210 may be fastened to the housing 1200 by a bolt that penetrates the fastening body 2210 and is fastened to the side surface of the housing 1200.
[0044] The outer surface of the fastening body 2210 may be spaced apart from the inner surface of the support portion 2100 while the protrusions 2220 are positioned at about the same or the same height within the internal spaces 2221. According to some example embodiments, the diameter of the outer surface of the fastening body 2210 may be smaller than the diameter of the inner surface of the support portion 2100 when viewed from above. Therefore, the protrusions 2220 are positioned at different heights, thereby securing a space in which the fastening body 2210 may be tilted. Accordingly, even if the protrusions 2220 are positioned at different heights and the fastening body 2210 is tilted, the fastening body 2210 and the housing 1200 may be prevented from being damaged by contact with each other within a certain range.
[0045] The protrusion 2220 may protrude outward from the side surface of the fastening body 2210. The protrusion 2220 may be inserted into the insertion hole 2110. The protrusion 2220 has an internal space 2221 formed inside, that is, the protrusion 2220 may define an internal space 2221. A plurality of protrusions 2220 are arranged along the circumferential direction of the side surface of the polishing portion 1000. According to some example embodiments, the protrusions 2220 may be arranged along the circumferential direction of the side surface of the housing 1200. For example, the protrusions 2220 may be provided in three pieces, and arranged at about or exactly 120 intervals from each other along the outer circumference direction of the housing 1200 with the center of the housing 1200 as the vertex when viewed from above.
[0046] The thickness of the protrusions 2220 in the vertical direction may be provided to be smaller than the gap between the ceiling surfaces and the floor surfaces of the insertion holes 2110. Therefore, the protrusions 2220 may move vertically between the ceiling surfaces and the floor surfaces of the insertion holes 2110. In addition, when the protrusions 2220 are positioned at about the same or the same height as each other within the insertion holes 2110, the outer surfaces of the protrusions 2220 and the inner surfaces of the insertion holes 2110 may be spaced apart from each other. Accordingly, the protrusions 2220 may be tilted relative to a state where the protrusions 2220 are positioned at about the same or the same height as each other within a range spaced from the inner surfaces of the insertion holes 2110, accordingly, the protrusions 2220 may be positioned at different heights from each other within a range spaced from the inner surfaces of the insertion holes 2110.
[0047] The tilt adjustment portion 2300 adjusts the tilt of the polishing portion 1000. According to some example embodiments, the tilt adjustment portion 2300 may include a tilt adjustment shaft 2310 and a fixing portion 2320.
[0048]
[0049] Referring to
[0050] Catch fringes 2311 may be provided in parts of the tilt adjustment shafts 2310 corresponding to the internal spaces 2221 respectively. Each of the catch fringes 2311 extends outward from the side surface of the tilt adjustment shafts 2310. The catch fringes 2311 are caught by the ceiling walls and floor walls of the corresponding protrusions 2220. The catch fringes 2311 are fixedly connected to the tilt adjustment shafts 2310. Therefore, the fastening portion 2200 connected to the polishing portion 1000 may be supported by the catch fringes 2311 and move vertically together with the vertical movement of the catch fringes 2311.
[0051] The catch fringes 2311 may be in a size that does not interfere with the inner walls of the internal spaces 2221 when rotated around the rotation axis of the tilt adjustment shafts 2310. Therefore, the catch fringes 2311 may be rotated together when the tilt adjustment shafts 2310 are rotated. According to some example embodiments, each of the catch fringes 2311 may be in a ring shape that surrounds the outer surface of the tilt adjustment shafts 2310 and has a diameter that does not contact the inner walls of the internal spaces 2221.
[0052] The thickness of the catch fringes 2311 in the vertical direction may be smaller than the gap between the ceiling surfaces and the floor surfaces of the internal spaces 2221. Accordingly, when the heights of the protrusions 2220 are set differently from each other, spaces in which the catch fringes 2311 may be tilted within the internal spaces 2221 may be secured.
[0053] The tilt adjustment shafts 2310 and the support portion 2100 may be screw-connected to each other. According to some example embodiments, the side surfaces of the tilt adjustment shafts 2310 and the inner surfaces of the holes of the support portion 2100 through which the tilt adjustment shafts 2310 pass may have screw faces formed to engage with each other in corresponding areas. The screw faces are formed on the side surfaces of the tilt adjustment shafts 2310 and the inner surfaces of the holes of the support portion 2100 through which the tilt adjustment shafts 2310 pass in a range that may sufficiently correspond to the range of movement of the protrusions 2220. According to some example embodiments, the tilt adjustment shafts 2310 may be provided as a cylindrical bar structure having the screw faces formed on the entire side surfaces of the tilt adjustment shafts 2310. In addition, the screw faces may be formed on the entire range of the inner surfaces of the holes of the support portion 2100 through which the tilt adjustment shafts 2310 pass. Accordingly, each of the tilt adjustment shafts 2310 may be moved vertically relative to the support portion 2100 by rotating about the longitudinal direction as an axis.
[0054] The fixing portions 2320 fix each of the tilt adjustment shafts 2310 to a set position relative to the support portion 2100. According to some example embodiments, an end and the other end of each of the tilt adjustment shafts 2310 may be exposed to the outside of the support portion 2100. And, at least a some of the fixing portions 2320 may be provided as a nut that is screw-connected with the screw surface of the tilt adjustment shafts 2310.
[0055] The substrate polishing apparatus 10 has the configuration and structure as described above, to make each of the protrusions 2220 be supported by the catch fringes 2311 and move up and down together with the tilt adjustment shafts 2310 when each of the tilt adjustment shafts 2310 is rotated to move vertically with respect to the support portion 2100. Therefore, the height of the each of the protrusions 2220 may be adjusted, thereby adjusting the tilt of the polishing portion 1000. In addition, the adjusted position of the protrusions 2220 may be maintained by fastening the fixing portions 2320 to the ends and the other ends of the tilt adjustment shafts 2310 in the state that the height of each of the protrusions 2220 is adjusted.
[0056]
[0057] Referring to
[0058] The first nut 2321 is screw-connected to the tilt adjustment shaft 2310. The second nut 2322 is screw-connected to an outer part of the tilt adjustment shaft 2310 than the first nut 2321.
[0059] The elastic connection portion 2323 may be connected between the first nut 2321 and the second nut 2322. The elastic connection portion 2323 may be provided with a material having elasticity. For example, the elastic connection portion 2323 may be provided with a material such as silicone or rubber. According to some example embodiments, the elastic connection portion 2323 may be provided with a structure in which a plurality of rings are connected to the side surfaces of each other. Due to this ring structure, a void is created inside the elastic connection portion 2323, increasing the elasticity of the elastic connection portion 2323. In addition, since the structure in which multiple ring structures are connected to each other, the elastic connection portion 2323 may be prevented or reduced from being excessively expanded outward.
[0060] According to some example embodiments, the elastic connection portion 2323 between the first nut 2321 and the second nut 2322 may reduce the rate at which the vibration of the polishing portion 1000 generated during the substrate polishing operation by the polishing portion 1000 is transmitted from the first nut 2321 to the second nut 2322. Therefore, the second nut 2322 may be prevented or have a reduction from being loosened by the vibration, thereby more firmly maintaining the set position of the tilt adjustment shaft 2310.
[0061]
[0062] Referring to
[0063] The inner body 2324 is screw-connected to the tilt adjustment shaft 2310 of
[0064] The outer body 2325 surrounds the outer surface of the inner body 2324. According to some example embodiments, the outer body 2325 may be provided in a ring shape in which the inner surface thereof surrounds the outer surface of the inner body 2324 and the outer surface thereof has a nut structure.
[0065] The locking pin 2326 may have an end connected to the inner body 2324 to be rotatable around the end of the locking pin 2326 between an outer position and an inner position. Here, the outer position may be a position where the other end of the locking pin 2326 protrudes from the outer surface of the inner body 2324. And the inner position may be a position where the other end does not protrude from the outer surface of the inner body2324. According to some example embodiments, a plurality of the locking pins 2326 may be arranged spaced apart from each other at a predetermined (or, alternatively, desired or determined) interval along the outer circumferential direction of the inner body 2324.
[0066] A plurality of teeth 250 are formed along the inner circumferential direction of the inner surface of the outer body 2325 on the inner surface of the outer body 2325. According to some example embodiments, each of the teeth 250 may include a side inclined surface 251 and an other-side inclined surface 252.
[0067] The side inclined surface 251 may have a tilt at which the other end of the locking pin 2326 positioned at the outer position is caught by the side inclined surface 251when a rotational force is applied to the outer body 2325 in a direction in which the inner body moves toward the support portion 2100 of
[0068] The other-side inclined surface 252 may have a tilt at which the other end of the locking pin 2326 positioned at the outer position is guided to the inner position by the other-side inclined surface 252 when a rotational force is applied to the outer body in a direction in which the inner body 2324 moves away from the support portion 2100 of
[0069] The elastic portion 2327 applies an elastic force to the locking pin 2326 in a direction in which the other end of the locking pin 2326 is positioned at an outer position. According to some example embodiments, the elastic portion 2327 may be provided as a torsion spring. Alternatively, the elastic portion 2327 may be provided as various types of springs or other various configurations and structures that may apply an elastic force to the locking pin 2326. The elastic portion 2327 may be provided in a number corresponding to the locking pins 2326.
[0070] Since the fixing portion 2320b is provided with the configuration and structure as described above, when force is applied to the outer body 2325 in a direction in which the inner body 2324 moves toward the support portion 2100 of
[0071]
[0072] Referring to
[0073] The upper reinforcement plate 2330 may be between the ceiling wall of the internal space 2221a and the catch fringe 2311, and penetrated by the tilt adjustment shaft 2310. The upper reinforcement plate 2330 may be wider outwardly than the catch fringe 2311. According to some example embodiments, the upper reinforcement plate 2330 may be provided as a plate structure having a shape that is engaged with the internal space 2221a when viewed from above.
[0074] The tilt adjustment shaft 2310 penetrates the upper reinforcement plate 2330 to be movable along the longitudinal direction of the tilt adjustment shaft 2310. According to some example embodiments, the hole of the upper reinforcement plate 2330 through which the tilt adjustment shaft 2310 penetrates may be provided as a circular structure having a diameter larger than the diameter of the tilt adjustment shaft 2310. Accordingly, even when the heights of the protrusions 2220a are different from each other due to the tilt adjustment of the polishing portion 1000, the tilt adjustment shaft 2310 may be prevented or have a reduction from being damaged by the force applied by the upper reinforcement plate 2330 by the tilt of the protrusions 2220a within a certain range.
[0075] As described above, by the upper reinforcement plate 2330, the force applied from the catch fringe 2311 to the ceiling wall of the protrusion 2220a may be more widely distributed. The catch fringe 2311 cannot have a larger width because the catch fringe 2311 must be rotatable. And the upper reinforcement plate 2330 may prevent or reduce direct friction between the catch fringe 2311 and the ceiling wall of the protrusion 2220a, thereby reducing the possibility of damage to the protrusion 2220a. In particular, when the heights of the protrusions 2220a are different from each other and only a part of the upper surface of the catch fringe 2311 contact with the ceiling wall of the protrusion 2220a, damage to the ceiling wall of the protrusion 2220a due to contact with the catch fringe 2311 may be prevented or reduced.
[0076] The lower reinforcement plate 2340 may be between the floor wall of the internal space 2221a and the catch fringe 2311, and penetrated by the tilt adjustment shaft 2310. The lower reinforcement plate 2340 may be wider outwardly than the catch fringe 2311. According to some example embodiments, the lower reinforcement plate 2340 may be provided as a plate structure having a shape that is engaged with the internal space 2221a when viewed from above. For example, depending on the shape of the internal space 2221a, the lower reinforcement plate 2340 may be provided with about the same or the same shape as the upper reinforcement plate 2330.
[0077] The tilt adjustment shaft 2310 penetrates the lower reinforcement plate 2340 to be movable along the longitudinal direction of the tilt adjustment shaft 2310. According to some example embodiments, the hole of the lower reinforcement plate 2340 through which the tilt adjustment shaft 2310 penetrates may be provided as a circular structure having a diameter larger than the diameter of the tilt adjustment shaft 2310. Therefore, even when the heights of the protrusions 2220a are different from each other due to the tilt adjustment of the polishing portion 1000, the tilt adjustment shaft 2310 may be prevented or have a reduction from being damaged by the force applied by the lower reinforcement plate 2340 by the tilting of the protrusions 2220a within a certain range.
[0078] As described above, by the lower reinforcement plate 2340, when the heights of the protrusions 2220a are different from each other and only a part of the bottom surface of the catch fringe 2311 contact with the floor wall of the protrusion 2220a, damage to the floor wall of the protrusion 2220a due to contact with the catch fringe 2311 may be prevented or reduced.
[0079] When only the upper reinforcement plate 2330 or the lower reinforcement plate 2340 is provided, the sum of the thickness of the catch fringe 2311 in the vertical direction, and the thickness of the provided upper reinforcement plate 2330 or lower reinforcement plate 2340 in the vertical direction may be smaller than the gap between the ceiling surface and the bottom surface of the internal space 2221a. In addition, when both the upper reinforcement plate 2330 and the lower reinforcement plate 2340 are provided, the sum of the thickness of the catch fringe 2311 in the vertical direction, the thickness of the upper reinforcement plate 2330 in the vertical direction and the thickness of the lower reinforcement plate 2340 in the vertical direction may be smaller than the gap between the ceiling surface and the floor surface of the internal space 2221. Therefore, when the heights of the protrusions 2220a are set to be different from each other, a space in which the catch fringe 2311 may be tilted may be secured within the internal space 2221a.
[0080] Other features of the substrate polishing apparatus 10a of
[0081]
[0082] Referring to
[0083] Other features of the substrate polishing apparatus 10b of
[0084]
[0085] Referring to
[0086] The upper fastening portion 2201 may be fastened to an upper part of the housing 1200 of the polishing portion 1000. The lower fastening portion 2202 may be positioned lower than the upper fastening portion 2201. According to some example embodiments, the lower fastening portion 2202 may be fastened to a lower part of the housing 1200. The upper part of the housing 1200 may be a part more adjacent to an upper end than a lower end of the side surface of the housing 1200. And the lower part may be a part more adjacent to a lower end than an upper end of the side surface of the housing 1200.
[0087] Each of the upper fastening portion 2201 and the lower fastening portion 2202 may include a fastening body 2210c and protrusions 2220. According to some example embodiments, the fastening bodies 2210c of the upper fastening portion 2201 and the lower fastening portion 2202 may have a smaller thickness in the vertical direction than the fastening body 2210 of
[0088] In some example embodiments, the protrusions 2220 of the fastening portions 2200c are positioned at about the same or the same positions as each other when viewed from above. According to some example embodiments, the protrusions 2220 of the upper fastening portion 2201 and the protrusions 2220 of the lower fastening portion 2202 are positioned at about the same or the same positions as each other when viewed from above.
[0089] In some example embodiments, each of the tilt adjustment shafts 2310c may sequentially penetrate the protrusions 2220 whose positions are about the same or the same as each other when viewed from above. In addition, the catch fringes 2311c may be at parts of the tilt adjustment shafts 2310c corresponding to protrusions 2220 positioned at about the same or the same position as each other when viewed from above respectively. In addition, the insertion holes 2110c may be provided corresponding to each of the protrusions 2220.
[0090] As described above, the substrate polishing apparatus 10c of
[0091] Other features of the substrate polishing apparatus 10c of
[0092]
[0093] Referring to
[0094] Other features of the substrate polishing apparatus 10d of
[0095]
[0096]
[0097] The simulation was performed using the mechanical APDL solver tool of Ansys Simulation software. It is assumed that the vibration magnitude is measured according to the frequency of the center of the upper end of the polishing portion 1000 when the polishing portion 1000 polishes the substrate. The X direction is a direction parallel to the horizontal direction. The Y direction is a direction parallel to the horizontal direction and perpendicular to the X direction. The Z direction represents the vertical direction. In
[0098] Referring to
[0099] As described above, the substrate polishing apparatuses 10, 10a, 10b, 10c, 10d according to some example embodiments of the present disclosure may adjust the tilt of the polishing portion 1000 by the tilt adjustment portion 2300, 2300a, 2300c, 2300d. In addition, the substrate polishing apparatuses 10, 10a, 10b, 10c, 10d according to some example embodiments of the present disclosure may fix the polishing portion 1000 to the support portion 2100, 2100a, 2100c, 2100d by the fastening portion 2200, 2200a, 2200b, 2200c, 2200d and the tilt adjustment portion 2300, 2300a, 2300c, 2300d. Therefore, the substrate polishing apparatuses 10, 10a, 10b, 10c, 10d according to some example embodiments of the present disclosure may reduce the vibration of the polishing portion 1000 and firmly maintain the set tilt of the polishing portion 1000.
[0100] When the terms about or substantially are used in this specification in connection with a numerical value, it is intended that the associated numerical value includes a manufacturing or operational tolerance (e.g., 10 %) around the stated numerical value. Moreover, when the words generally and substantially are used in connection with geometric shapes, it is intended that precision of the geometric shape is not required but that latitude for the shape is within the scope of the disclosure. Further, regardless of whether numerical values or shapes are modified as about or substantially, it will be understood that these values and shapes should be construed as including a manufacturing or operational tolerance (e.g., 10 %) around the stated numerical values or shapes.
[0101] While the present disclosure has been described with reference to example embodiments thereof, it will be apparent to those of ordinary skill in the art that various changes and modifications can be made thereto without departing from the spirit and scope of the present disclosure as set forth in the following claims.