BIASED TOTAL THICKNESS VARIATIONS IN WAVEGUIDE DISPLAY SUBSTRATES
20260093069 ยท 2026-04-02
Inventors
- Samarth Bhargava (Saratoga, CA, US)
- Christophe Peroz (Tokyo, JP)
- Victor Kai Liu (Mountain View, CA, US)
Cpc classification
G02B6/13
PHYSICS
International classification
G02B6/13
PHYSICS
Abstract
A plurality of waveguide display substrates, each waveguide display substrate having a cylindrical portion having a diameter and a planar surface, a curved portion opposite the planar surface defining a nonlinear change in thickness across the substrate and having a maximum height D with respect to the cylindrical portion, and a wedge portion between the cylindrical portion and the curved portion defining a linear change in thickness across the substrate and having a maximum height W with respect to the cylindrical portion. A target maximum height D.sub.t of the curved portion is 10.sup.7 to 10.sup.6 times the diameter, D is between about 70% and about 130% of D.sub.t, and W is less than about 30% of D.sub.t.
Claims
1-18. (canceled)
19. A waveguide comprising: a first portion with parallel first and second surfaces; and a second portion with a third surface contacting the second surface of the first portion and a fourth, curved surface, the second portion being stacked on the first portion along a first direction, wherein a distance, as measured along the first direction, between the third and fourth surfaces varies between 0 nm and a nonzero value.
20. The waveguide of claim 19, wherein the fourth, curved surface is convex.
21. The waveguide of claim 19, wherein the fourth, curved surface is concave.
22. The waveguide of claim 19, wherein the nonzero value is 1300 nm.
23. The waveguide of claim 19, wherein the nonzero value is 700 nm.
24. The waveguide of claim 19, wherein the distance changes according to a quadratic function along a second direction perpendicular to the first direction.
25. The waveguide of claim 19, wherein an average distance between the first and fourth surfaces, as measured along the first direction, is between about 200 m and 2000 m.
26. The waveguide of claim 19, wherein the waveguide comprises polished glass.
27. The waveguide of claim 26 wherein the first portion comprises the polished glass, and the second portion comprises a coating on the polished glass.
28. The waveguide of claim 19, wherein the waveguide comprises silicon.
29. The waveguide of claim 19, wherein the waveguide comprises metal.
30. The waveguide of claim 19, wherein the waveguide is configured to propagate one of red, green, or blue light.
31. The waveguide of claim 19, wherein a maximum distance between the first and second surfaces, as measured along the first direction, is less than a maximum distance between the third and fourth surfaces.
32. The waveguide of claim 19, wherein the second portion comprises a polymer material.
33. The waveguide of claim 19, wherein D.sub.mean is an average of the distance, as measured along a second direction perpendicular to the first direction, of the waveguide, D.sub.min is a minimum distance as measured along the second direction of the waveguide, and wherein (D.sub.meanD.sub.min)/D.sub.mean<Y, and 0Y10.
34. The waveguide of claim 33, wherein 0Y0.3.
35. The waveguide of claim 19, wherein D.sub.mean is an average of the distance, as measured along a second direction perpendicular to the first direction, of the waveguide, D.sub.max is a maximum distance as measured along the second direction of the waveguide, and wherein (D.sub.maxD.sub.mean)/D.sub.mean<Z, and 0Z10.
36. The waveguide of claim 35, wherein 0Z0.3.
Description
BRIEF DESCRIPTION OF DRAWINGS
[0016]
[0017]
[0018]
[0019]
[0020]
[0021]
[0022]
DETAILED DESCRIPTION
[0023] Total thickness variation (TTV) is one metric for improving performance of an optical waveguide. As used herein, TTV generally refers to the difference between the maximum and minimum values of the thickness of the waveguide or the waveguide display substrate on which the waveguide is formed. As light travels through an optical waveguide, typically by total internal reflection, variations in the thickness alter the light propagation path(s). Angular differences in the light propagation path(s) can affect image quality with field distortions, image blurring, and sharpness loss.
[0024] Waveguide preparation and processing typically occurs by arranging a number of waveguides to designated areas onto a waveguide display substrate (e.g., a wafer).
[0025] Since completely flat polishing or molding, such as that depicted in
[0026] Referring to
[0027] In optical products, image quality and uniformity can be sensitive to a particular shape or profile of a polished waveguide display substrate as TTV approaches zero. In one example, the comparative difference of image quality (as measured by uniformity) of waveguides produced on a 20 nm TTV and a 40 nm TTV waveguide display substrate can be much higher than the comparative quality of waveguides produced on a 100 nm TTV substrate and a 120 nm waveguide display substrate, despite both pairs being only 20 nm different. Stated differently, a 100 nm TTV waveguide and a 120 nm waveguide can yield a more similarly uniform image than a 20 nm TTV waveguide and a 40 nm TTV waveguide (the former pair being more dome shaped as compared to the latter pair). The 100 nm TTV waveguide and 120 nm TTV waveguide can thus produce lower image variation and more consistent image uniformity across a product line.
[0028] Path length differences in the light propagation path(s) within a waveguide produced on a non-flat waveguide display substrate can also affect image quality with luminance pattern non-uniformities and color non-uniformities. The source of the luminance pattern non-uniformities includes electromagnetic interference patterns produced by numerous pathways through a pupil-replicating waveguide display substrate. A unit-cell of a typical pupil-replicating waveguide resembles a M ach-Zender interferometer, where there exist two pathways per unit-cell from the input to an output replicated pupil location. Pathlength differences between the two pathways are influenced by the pathlength through the thickness of the waveguide display substrate, which is defined by the TTV metric and thickness profile (whether the thickness changes linearly or quadratically and at an angle with respect to the light in total-internal-reflection within the waveguide display). If the pathlengths have equal or opposite phase, there may be constructive or destructive interference, respectively. Hence, the thickness shape may affect the magnitude within pupil-replicated copies and ultimately the output image outcoupled by the waveguide display.
[0029] Thus, it can be advantageous to minimize thickness shape variation as well as TTV. Since perfect replication may not be achieved in polishing or molding processes, certain manufacturing distributions can result. In a hypothetical distribution model, with a circular substrate shape defined by Zernike polynomials, a standard set of shape basis functions can be defined. There are even and odd Zernike polynomials. The even ones are defined as
and the odd ones are defined as
where m and n are nonnegative integers with nm, is the azimuthal angle, is the radial distance, and R.sup.m.sub.n, are the radial polynomials defined below. Zernike polynomials have the property of being limited to a range of 1 to +1, i.e., The radial polynomials R.sup.m.sub.n are defined as
for nm even, and are identically 0 for nm odd.
[0030] Image quality, in particular luminance uniformity, is nonlinearly sensitive to thickness shape as TTV approaches zero. In other words, as TTV decreases below certain thresholds, image quality becomes increasingly varied among waveguides exhibiting even minor changes in thickness shape. To compensate for this anomaly, a biased TTV with a consistent thickness shape can be incorporated into substrate processing. As used herein, a biased TTV generally refers to a TTV having a nonzero target. More specifically, a biased TTV generally refers to a substrate thickness shape having one or more coefficients of Zernike fit polynomials with nonzero targets and all remaining coefficients of Zernike fit polynomials having zero targets. Consistency of thickness shape within a plurality of waveguide display substrates generally refers to a plurality of waveguide display substrates having a low variation of coefficients of Zernike fit polynomials. In the case of biased TTV, consistency of thickness shape refers to a set of waveguide display substrates having (i) all nonzero-targeted Zernike coefficients having minimal variation from their target magnitudes, for example the nonzero-targeted coefficients of all waveguide display substrates being about 70% to about 130% of their target magnitude, and (ii) all zero-targeted Zernike coefficients having an absolute magnitude substantially less than the nonzero-targeted Zernike coefficients, for example the zero-targeted coefficients being 0 to about 30% of the nonzero-targeted coefficients.
[0031] An example of biased TTV and consistent substrate thickness shape is a substrate that is substantially polished (or molded) to a spherical shape with a TTV many times larger than the typical minimum TTV range of a substrate polishing (or molding) process. This substrate shape can be described as having wedge (linear change in thickness) and dome (quadratic change in thickness) components.
[0032] The biased TTV with consistent shape can be applied to the waveguide display substrate in numerous methods. For glass or crystalline substrates, it may be applied by polishing to a biased shape or by applying a coating with non-uniform thickness (of consistent shape and magnitude) to an ultra-low TTV waveguide display substrate with small but random thickness shape variation. For moldable polymer materials, the biased thickness profile can be designed into the mold that produces the waveguide display substrate.
[0033]
With these relationships, X, Y, and Z typically range from 0 to 10 among different substrate polishing or molding processes.
[0034]
[0035] Although this disclosure contains many specific embodiment details, these should not be construed as limitations on the scope of the subject matter or on the scope of what may be claimed, but rather as descriptions of features that may be specific to particular embodiments. Certain features that are described in this disclosure in the context of separate embodiments can also be implemented, in combination, in a single embodiment. Conversely, various features that are described in the context of a single embodiment can also be implemented in multiple embodiments, separately, or in any suitable sub-combination. Moreover, although previously described features may be described as acting in certain combinations and even initially claimed as such, one or more features from a claimed combination can, in some cases, be excised from the combination, and the claimed combination may be directed to a sub-combination or variation of a sub-combination.
[0036] Particular embodiments of the subject matter have been described. Other embodiments, alterations, and permutations of the described embodiments are within the scope of the following claims as will be apparent to those skilled in the art. While operations are depicted in the drawings or claims in a particular order, this should not be understood as requiring that such operations be performed in the particular order shown or in sequential order, or that all illustrated operations be performed (some operations may be considered optional), to achieve desirable results.
[0037] Accordingly, the previously described example embodiments do not define or constrain this disclosure. Other changes, substitutions, and alterations are also possible without departing from the spirit and scope of this disclosure.