Method for achieving scalable two-phase cooling plates
12604436 ยท 2026-04-14
Assignee
Inventors
- Chen Li (Chapin, SC, US)
- Wei Chang (Columbia, SC, US)
- Enrico Santi (Columbia, SC, US)
- BO TIAN (COLUMBIA, SC, US)
Cpc classification
F28D15/046
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
F28D2015/0225
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
H05K7/20327
ELECTRICITY
International classification
H05K7/20
ELECTRICITY
F28D15/02
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
Abstract
Effective two-phase cooling is provided to large devices even with a length of 10 cm due to a channel configuration to achieve formed minichannels comprising porous wall structures. Baseplate features comprise a substrate defining the minichannels, with each minichannel formed between a pair of side walls and a bottom surface thereof. The side walls of the plurality of minichannels respectively form terminal walls for each of the respective minichannels. A microgap configuration is formed between the terminal wall of at least one of the plurality of minichannels and an adjacent layer.
Claims
1. Method for achieving effective two-phase cooling on electronic devices having an area of one cm by one cm or larger, comprising integrating at least one minichannel structure directly associated with baseplate features of the electronic devices, wherein the baseplate features comprise a substrate defining at least one minichannel formed between a pair of side walls and a bottom surface thereof, the formed minichannel comprises porous wall structures, and the formed minichannel and substrate are made from copper sintering.
2. The method according to claim 1, wherein the minichannel is substantially rectangular in cross-section, such that each of the side walls is substantially perpendicular to the bottom surface.
3. The method according to claim 1, wherein the minichannel has width and depth measurements of at least 1 mm by at least 1 mm.
4. The method according to claim 1, wherein the substrate comprises one of brass, copper, a copper alloy, nickel, a nickel alloy, or a combination thereof.
5. The method according to claim 3, wherein each minichannel has a length of at least 60 mm.
6. The method according to claim 1, wherein the electronic devices have an area of up to ten cm by five cm or larger, and the electronic devices comprise commercial electronics or power electronic modules.
7. The method according to claim 1, wherein the side walls of the minichannel form at least one terminal wall for the minichannel, and the method further comprises fabricating a microgap configuration between the terminal wall of the minichannel and a layer adjacent thereto.
8. Th method according to claim 7, wherein capillary flow is induced by said microgap configuration during associated cooling fluid flow, and wherein the microgap configuration has a thickness of up to 460 um.
9. The method according to claim 7, wherein the microgap configuration is at least 60 m thick.
10. The method according to claim 1, wherein the electronic device is operated for dissipating up to 750 Watts, and associated two-phase cooling uses a cooling water flowrate of between 12.5 and 50 ml/min.
11. The method according to claim 1, wherein the side walls form reservoir channels.
12. The method according to claim 11, wherein the porous wall structures have a porosity of at least 60%, and the reservoir channels are at least 100 um width.
13. The method according to claim 11, wherein the porous wall structures have a porosity of at least 65%, and width of each of the reservoir channels is at least 140 m, and associated two-phase cooling uses a cooling water flowrate of at least 25 ml/min.
14. Method for achieving effective two-phase cooling on electronic devices having an area of one cm by one cm or larger, comprising defining a plurality of minichannels integrated into a substrate and directly associated with baseplate features of the electronic devices, wherein each minichannel is formed between a pair of side walls and a bottom surface thereof, the side walls of the plurality of minichannels respectively form terminal walls for each of the respective minichannels, the method further comprises fabricating a microgap configuration between the terminal wall of at least one of said plurality of minichannels and a layer adjacent thereto, capillary flow is induced by said microgap configuration during associated cooling fluid flow, and wherein the microgap configuration has a thickness of up to 460 um.
15. Method according to claim 14, wherein each minichannel is substantially rectangular in cross-section.
16. The method according to claim 15, wherein each minichannel has width and depth measurements of at least 1 mm by 1 mm.
17. Method according to claim 14, wherein the substrate comprises one of brass, copper, a copper alloy, nickel, a nickel alloy, or a combination thereof.
18. Method according to claim 14, wherein the substrate and formed minichannel are fabricated through 3-D printing or through copper sintering.
19. Method according to claim 18, wherein the formed minichannel comprises porous wall structures, and the formed minichannel and substrate are made from copper sintering.
20. The method according to claim 14, wherein each minichannel has a length of at least 60 mm.
21. Method according to claim 14, wherein the electronic devices have an area of up to ten cm by five cm or larger, and the electronic devices comprise commercial electronics or power electronic modules.
22. Method according to claim 14, wherein the electronic device is operated for dissipating up to 750 Watts, and associated two-phase cooling uses a cooling water flowrate of between 12.5 and 50 ml/min.
23. The method according to claim 14, wherein the formed minichannels comprise porous wall structures with side walls which form reservoir channels.
24. The method according to claim 23, wherein the porous wall structures have a porosity of at least 60%, and the reservoir channels are at least 100 pm width.
25. The method according to claim 24, wherein the porous wall structures have a porosity of at least 65%, and width of each of the reservoir channels is at least 140 pm, and associated two-phase cooling uses a cooling water flowrate of at least 25 ml/min.
Description
BRIEF DESCRIPTION OF THE FIGURES
(1) A full and enabling disclosure of the presently disclosed subject matter, including the best mode thereof, directed to one of ordinary skill in the art, is set forth in the specification, which makes reference to the appended figures, in which:
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(25) Repeat use of reference characters in the present specification and figures is intended to represent the same or analogous features or elements or steps of the presently disclosed subject matter.
DETAILED DESCRIPTION OF THE PRESENTLY DISCLOSED SUBJECT MATTER
(26) It is to be understood by one of ordinary skill in the art that the present disclosure is a description of exemplary embodiments only and is not intended as limiting the broader aspects of the disclosed subject matter. Each example is provided by way of explanation of the presently disclosed subject matter, not limitation of the presently disclosed subject matter. In fact, it will be apparent to those skilled in the art that various modifications and variations can be made in the presently disclosed subject matter without departing from the scope or spirit of the presently disclosed subject matter. For instance, features illustrated or described as part of one embodiment can be used with another embodiment to yield a still further embodiment. Thus, it is intended that the presently disclosed subject matter covers such modifications and variations as come within the scope of the appended claims and their equivalents.
(27) The present disclosure is generally directed to improved two-phase cooling plates. Further, in particular, the presently disclosed subject matter relates to improved two-phase cooling plates which are scalable (meaning capable of implementation with relatively larger sizes).
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(30) Generally speaking, advantages of two-phase cooling as presently disclosed provides relatively increased module power density. With both the baseplate and thermal interface material (TIM) eliminated, the thermal power is increased.
(31) Another resulting advantage is increased lifetime. For example, two-phase cooling can reduce junction temperature excursion TJ during thermal cycling, increasing the number of allowable thermal cycles by more than 400.
(32) Yet another resulting advantage is improved thermal uniformity. In other words, there is a reduction of temperature difference between chips, which enhances reliability of power module.
(33) Still further, the presently disclosed configuration advantageously reduces required cooling fluid flow rate. The required two-phase cooling flow rate of 25 ml/min is reduced by 300 compared to a conventional cold plate, requiring 8 L/min.
(34) Also, system size and weight can be advantageously reduced. The 300 reduction in cooling flow rate brings a huge reduction in sizes of the pump, heat exchangers, and coolant piping.
(35) Presently disclosed subject matter addresses challenges in implementing minichannel flow boiling cooling. For example, one issue relates to scaling effect, which involves created difficulties when trying to go from sizes of about a centimeter to about ten centimeters, which can be problematic due to poor liquid supplies at both global and local level. Microchannel up to 1000 W/cm.sup.2 and minichannels to about 50-1000 W/cm.sup.2 and may be referenced.
(36) Other issues may relate to two-phase instabilities, such as local dryout and oscillations of both temperature and pressure drops.
(37) Presently disclosed subject matter considers and investigates solutions such as micro-gap structure being provided an auxiliary liquid supply. Another approach relates to use of a porous minichannel structure with reservoir channel to mitigate dry out and improve local liquid spreading.
(38) Further, yet another approach relates to a minichannel structure realized directly on the module baseplate in order to eliminate thermal interfacial resistance associated with conventional cold plates, and to reduce weight.
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(55) Thermal resistance of coldplate R.sub.th(cp) is a key parameter to quantify thermal performance directly. The definition is given by the following equation:
R.sub.th(cp)=[Average(T.sub.C)(T.sub.inlet+T.sub.outlet)/2]/P.sub.diss
(56) R.sub.th(cp) for the two-phase cooling (TPC) case (presently disclosed technology) decreases remarkably compared with R.sub.th(cp) for single-phase cooling (SPC) case (conventional technology). The minimum of R.sub.th(cp) for TPC case is 2.41 times, 2.37 times, and 1.91 times smaller than that for SPC case.
(57) This written description uses examples to disclose the presently disclosed subject matter, including the best mode, and also to enable any person skilled in the art to practice the presently disclosed subject matter, including making and using any devices or systems and performing any incorporated methods. The patentable scope of the presently disclosed subject matter is defined by the claims, and may include other examples that occur to those skilled in the art. While certain embodiments of the disclosed subject matter have been described using specific terms, such description is for illustrative purposes only, and it is to be understood that changes and variations may be made without departing from the spirit or scope of the subject matter.