MEMS microphone
12610198 ยท 2026-04-21
Assignee
Inventors
Cpc classification
B81B7/0016
PERFORMING OPERATIONS; TRANSPORTING
B81B2201/0257
PERFORMING OPERATIONS; TRANSPORTING
B81B2203/0127
PERFORMING OPERATIONS; TRANSPORTING
International classification
B81B7/00
PERFORMING OPERATIONS; TRANSPORTING
Abstract
Provided is a MEMS microphone including: a substrate having a cavity penetrating thereon; a diaphragm supported by the substrate and covering the cavity; a back plate provided above the diaphragm, wherein a first preset gap is formed between the back plate and the diaphragm; and a first support member received in the cavity includes a support portion, a connection portion, and a convex portion. The connection portion extends from the support portion towards the substrate until being fixed to the substrate. The convex portion extends from an end of the support portion approaching the diaphragm towards the diaphragm until supporting the diaphragm. The diaphragm and the connection portion form a second preset gap along a vibration direction of the diaphragm. The diaphragm of the MEMS microphone has higher robustness and higher anti-dropping capability.
Claims
1. A micro electro mechanical system (MEMS) microphone comprising: a substrate having a cavity penetrating thereon; a diaphragm supported by the substrate and covering the cavity; a back plate provided above the diaphragm, wherein a first preset gap is formed between the back plate and the diaphragm; and a first support member received in the cavity, comprising: a support portion arranged with the substrate at intervals; a connection portion extending from the support portion towards the substrate and fixed to the substrate; and a convex portion extending from an end of the support portion approaching the diaphragm towards the diaphragm for supporting the diaphragm, wherein a second preset gap is formed between the diaphragm and the connection portion along a vibration direction of the diaphragm.
2. The MEMS microphone as described in claim 1, wherein a width of the second preset gap along the vibration direction is greater than or equal to 10 m.
3. The MEMS microphone as described in claim 1, wherein the convex portion supports the diaphragm at a geometric center of the diaphragm.
4. The MEMS microphone as described in claim 1, wherein a second support member is provided between the back plate and the diaphragm, and two opposite ends of the second support member along the vibration direction of the diaphragm are connected to geometric centers of the back plate and the diaphragm, respectively.
5. The MEMS microphone as described in claim 1, wherein the support portion comprises a support portion bottom end away from the diaphragm and a support portion top end approaching the diaphragm along the vibration direction, and wherein, from the support portion bottom end to the support portion top end, a width of a section of the support portion along a normal direction of the vibration direction of the diaphragm decreases.
6. The MEMS microphone as described in claim 5, wherein the connection portion comprises a connection portion bottom end away from the diaphragm and a connection portion top end approaching the diaphragm along the vibration direction, wherein, from the connection portion bottom end to the connection portion top end, a width of a section of the connection portion along the normal direction of the vibration direction of the diaphragm decreases.
7. The MEMS microphone as described in claim 6, wherein the width of the section of the support portion satisfies: d.sub.1>2d.sub.0, where d.sub.1 represents a width value of the section of the support portion bottom end, and d.sub.0 represents half of the difference between the width value of the section of the support portion bottom end and a width value of the section of the support portion top end.
8. The MEMS microphone as described in claim 6, wherein the width of the section of the connection portion satisfies d.sub.2<2d.sub.0, where d.sub.2 represents a width value of the section of the support portion bottom end, and d.sub.0 represents half of the difference between the width value of the section of the support portion bottom end and a width value of the section of the support portion top end.
9. The MEMS microphone as described in claim 1, wherein a plurality of connection portions are provided, and the plurality of connection portions are provided at intervals annularly with an axis along the vibration direction of the diaphragm as a center line.
10. The MEMS microphone as described in claim 9, wherein four connection portions are provided, and two adjacent connection portions form an angle of 90.
Description
BRIEF DESCRIPTION OF DRAWINGS
(1)
(2)
(3)
(4)
(5)
REFERENCE SIGNS
(6) 10substrate, 20cavity, 30diaphragm, 40back plate, 50first preset gap, 60first support member, 601support portion, 6011support portion bottom end, 6012support portion top end, 602connection portion, 6021connection portion bottom end, 6022connection portion top end, 603convex portion, 70second preset gap, 80second support member, 90first isolation layer, 100second isolation layer.
DESCRIPTION OF EMBODIMENTS
(7) The embodiments described accompanied with reference drawings are exemplary, and are just for the purpose of illustrating the present disclosure, but not intended to limit the present disclosure.
(8) As shown in
(9) The substrate 10 may adopt silicon substrate, and a cavity 20 is provided penetrating the substrate 10. In an embodiment, the inner outline of the cavity 20 is a circular groove structure.
(10) The diaphragm 30 may be made of polysilicon. The diaphragm 30 is supported on the substrate 10 and covers the cavity 20. In an embodiment, a first isolation layer 90 is provided between the diaphragm 30 and the substrate 10. The material of first isolation layer 90 may be phosphosilicate glass (PSG) or borosilicate glass (BPSG), etc., which is formed by plasma-enhanced chemical vapor deposition to support the diaphragm 30.
(11) The back plate 40 can be formed by polysilicon, the back plate 40 is supported on the diaphragm. A first preset gap 50 is formed between the back plate 40 and the diaphragm 30. In an embodiment, a second isolation layer 100 is provided between the diaphragm 30 and the back plate 40. The material of the second isolation layer 100 may be phosphosilicate glass (PSG) or borosilicate glass (BPSG), which is formed by plasma-enhanced chemical vapor deposition to support the back plate 40.
(12) The electrodes arranged opposite to each other on the back plate 40 and the diaphragm 30 form a capacitor that changes the distance between the diaphragm 30 and the back plate 40 in response to the pressure applied to the diaphragm 30. As a result, the capacitance is changed, so that acoustic signals can be converted into electrical signals, so as to realize detecting the acoustic signals.
(13) The first support member 60 is received in the cavity 20, and includes a support portion 601 and a connection portion 602. The connection portion 602 and the substrate 10 are arranged at intervals. The support portion 601 and the connection portion 602 are preferably integrated as a whole, or may also be formed independently, which is not limited herein. The connection portion 602 extends from the support portion 601 towards the substrate 10 until being fixed to the substrate 10. The two opposite ends of the connection portion 602 are connected to the support portion 601 and the inner wall of the cavity 20, respectively. The support portion 601 is fixed in the cavity 20 via the connection portion 602.
(14) The first support member 60 also includes a convex portion 603 extending from the end of the support portion 601 approaching the diaphragm 30 towards the diaphragm 30 until supporting the diaphragm 30. The convex portion 603 and the support portion 601 are preferably integrated as a whole, and may also be formed independently, which is not limited herein. The convex portion 603 supports the diaphragm 30 on the side of the diaphragm 30 facing the cavity 20, so that the structural deformation of the diaphragm 30 can be effectively prevented, the robustness of the diaphragm 30 can be improved, and the diaphragm 30 can withstand large sound pressure. In this case, when the pressure applied to the diaphragm 30 is too large, the diaphragm 30 is prohibited from deviating too much in the direction towards the cavity 20, thereby preventing the diaphragm 30 from being damaged.
(15) Further, as shown in
(16) In an embodiment of the present disclosure, the convex portion 603 supports the diaphragm 30 at the geometric center of the diaphragm 30. The central axis of the diaphragm 30 coincides with the central axis of the convex portion 603. The diaphragm 30 is connected to the first isolation layer 90 and the second isolation layer 100 in the circumferential direction. Thus, the deflection thereof is parabolic, reaches the maximum at the center of the diaphragm 30, declines to zero at the edge. Since the sensitivity of MEMS microphone depends on the ratio of capacitance changing with pressure, the convex portion 603 is arranged at the position where the movement of the diaphragm 30 is the most intense, that is, the center of the diaphragm 30, while the second preset gap 70 is retained between the connection portion 602 and the diaphragm 30, so as to reduce the stiffness of the diaphragm 30 and improve the sensitivity of the MEMS microphone.
(17) Further, referring to
(18) In an embodiment of the present disclosure, along the direction from the cavity 20 to the back plate 40, the support portion 601 is of a structure with a gradually shrinking width. In a feasible implementation, referring to
(19) Owing to the size design of the shrinking width, the first support member 60 can not only support the diaphragm 30, but also avoid excessive influence on the flexibility of the diaphragm 30. When the pressure applied to the diaphragm 30 is too large, the first support member 60 can play a stopper role for the movement of the diaphragm 30. The diaphragm 30 moves centered with the convex portion 603. The outer circumferential surface of the support portion 601 is an inclined plane, so as to reduce the chance of contact collision between the diaphragm 30 and the outer surface of the support portion 601, and provide better protection for the diaphragm 30.
(20) Further, as shown in
(21) In an embodiment of the present disclosure, along the direction from the cavity 20 to the back plate 40, the connection portion 602 is of a structure with a gradually shrinking width. As shown in
(22) Further, as shown in
(23) In an embodiment of the present disclosure, as shown in
(24) In an embodiment, there are four connection portions 602. Two adjacent connection portions 602 form angle of 90, and thus form a cross-like shape structure. The support portion 601 is located in the center of the cross-like shape structure. One skilled in the art can know that the number of the connection portions 602 may also be set as other numbers, and the combination shape of the connection portions 602 may also be determined according to actual needs, such as line shape, parallel lines shapes, sharp shape, and Y shape, etc., which is not limited herein.
(25) As shown in
(26) Based on the MEMS microphone according to the above embodiments, the present disclosure also provides a manufacturing method including the following steps:
(27) Step 1, the first isolation layer 90 was deposited on the substrate 10, and then the diaphragm 30 was formed on the first isolation layer 90.
(28) Step 2, the second isolation layer 100 was deposited on the diaphragm 30.
(29) Step 3, the back plate 40 was formed on the second isolation layer 100, and in Step 3, the second support member 80 could be formed in the second isolation layer 100.
(30) Step 4, the cavity 20 and the first support member 60 were formed integratedly in the substrate 10 below the diaphragm 30. For example, the cavity 20 and the first support member 60 could be formed simultaneously in the substrate 10 by ion etching or chemical etching.
(31) Step 5, the first isolation layer 90 between the diaphragm 30 and the first support member 60 were removed by chemical etching, while the second isolation layer 100 between the diaphragm 30 and the back plate 40 were removed, so as to form the first preset gap 50 between the back plate 40 and the diaphragm 30, and to form the second preset gap 70 between the diaphragm 30 and the connection portion 602.
(32) Moreover, by setting d.sub.1 as d.sub.1>2d.sub.0, it can be guaranteed that the second preset gap between the connection portion 605 of the first support member 60 and the diaphragm 30 have sufficient distance, so as to reduce the noise generated during the vibration of the diaphragm 30 and increase the signal-to-noise ratio of the MEMS microphone.
(33) As above, the MEMS microphone according to the embodiments of the present disclosure is formed. By providing the first support member 60 to support the diaphragm 30, the MEMS microphone can effectively prevent the structural deformation of the diaphragm 30, improve the stiffness of the diaphragm 30. When the impact force of the sound waves is too large, the diaphragm 30 shall be prohibited from significant movement owing to being supported by the first support member 60, thereby preventing the diaphragm 30 from being damaged.
(34) The various embodiments described above with reference to the drawings used to illustrate the construction, characteristics and functional effects in detail. The above are just better embodiments of the present disclosure, however, the present disclosure does not define the scope of implementation as shown in the drawings. Any change made under the ideas of the present disclosure, or equivalent embodiments modified as identical variations without departing from the spirit of the specification and drawings shall all fall within the scope of the present disclosure.