MODULAR DEFLECTION UNITS IN MIRROR SYMMETRICAL ARRANGEMENT
20230146283 · 2023-05-11
Inventors
Cpc classification
B23K26/082
PERFORMING OPERATIONS; TRANSPORTING
B33Y30/00
PERFORMING OPERATIONS; TRANSPORTING
B22F2999/00
PERFORMING OPERATIONS; TRANSPORTING
B22F10/368
PERFORMING OPERATIONS; TRANSPORTING
G02B26/101
PHYSICS
B22F10/364
PERFORMING OPERATIONS; TRANSPORTING
B22F12/44
PERFORMING OPERATIONS; TRANSPORTING
B23K26/142
PERFORMING OPERATIONS; TRANSPORTING
B22F2999/00
PERFORMING OPERATIONS; TRANSPORTING
Y02P10/25
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
International classification
B23K26/082
PERFORMING OPERATIONS; TRANSPORTING
B23K26/06
PERFORMING OPERATIONS; TRANSPORTING
B22F10/368
PERFORMING OPERATIONS; TRANSPORTING
Abstract
The invention refers to a deflection module comprising a first deflection unit (10a) comprising a first scanning device (12a) for scanning a first working beam (50a) over a first working field and (40a) and a second deflection unit (10b) comprising a second scanning device (12b) for scanning a second working beam (50b) over a second working field (40b). At least a movable mirror (12a-2) of the first scanning device (12a) and at least a movable mirror (12b-2) of the second scanning device (12b) are arranged mirror-symmetrically with respect to each other. The first working field (40a) and the second working field (40b) overlap in a common overlap area (42).
Claims
1-29. (canceled)
30. A deflection module comprising: a first deflection unit comprising a first scanning device configured for scanning a first working beam over a first working field, wherein the first scanning device comprises: a first movable mirror for scanning the first working beam in a first direction by tilting around a first axis; and a second movable mirror for scanning the first working beam in a second direction by tilting around a second axis; a second deflection unit comprising a second scanning device configured for scanning a second working beam over a second working field; wherein the second scanning device comprises: a first movable mirror for scanning the second working beam in the first direction by tilting around a third axis; and a second movable mirror for scanning the second working beam in the second direction by tilting around a fourth axis; wherein the second movable mirror of the first scanning device and the second movable mirror of the second scanning device are arranged mirror-symmetrically with respect to each other and to a common plane of mirror symmetry , wherein the second axis is aligned with the fourth axis; and wherein the first working field and the second working field overlap in a common overlap area.
31. The deflection module of claim 30, wherein the first working beam is incident on the first scanning device propagating in a first incidence direction perpendicular to the common plane of mirror symmetry, and wherein the second working beam is incident on the second scanning device propagating in a second incidence direction perpendicular to the common plane of mirror symmetry, wherein the first incidence direction is aligned with and opposed to the second incidence direction.
32. The deflection module of claim 30, wherein the first deflection unit and the second deflection unit are arranged mirror-symmetrically with respect to the common plane of mirror symmetry, such that a beam path of the first working beam before being scanned by the first scanning device and a beam path of the second working beam before being scanned by the second scanning device are mirror symmetric with respect to each other and to the common plane of mirror symmetry.
33. The deflection module of claim 30, wherein a beam path of the first working beam before being scanned by the first scanning device is aligned with a beam path of the second working beam before being scanned by the first scanning device in a direction perpendicular to the common plane of mirror symmetry.
34. The deflection module of claim 30, wherein a separation between the second movable mirror of the first scanning device and the second movable mirror of the second scanning device corresponds to not more than ⅓ of a diameter of the second movable mirror of the first scanning device.
35. The deflection module of claim 30, wherein a distance between an optical centre of the second movable mirror of the first scanning device and an optical centre of the second movable mirror of the second scanning device corresponds to not more than 4 times an aperture of the first movable mirror of the first scanning device or of the first movable mirror of the second scanning device.
36. The deflection module of claim 35, wherein the first working beam is incident on the first scanning device having a first 1/e.sup.2 beam diameter, and wherein the second working beam is incident on the second scanning device having a second 1/e.sup.2 beam diameter, wherein the aperture of the first movable mirror of the first scanning device or of the first movable mirror of the second scanning device corresponds to at least 1.3 times the first 1/e.sup.2 beam diameter or the second 1/e.sup.2 beam diameter, respectively.
37. The deflection module of claim 30, wherein a distance between an optical centre of the second movable mirror of the first scanning device and an optical centre of the second movable mirror of the second scanning device is not more than 120 mm.
38. The deflection module of claim 30, wherein the first working field and the second working field are aligned with each other in a direction parallel to the common plane of mirror symmetry, and wherein the common overlap area has an extension in an overlap direction perpendicular to the common plane of mirror symmetry corresponding to at least 75% the extension covered by the first or second working field in the overlap direction.
39. The deflection module of claim 30, wherein the second movable mirror of the first scanning device is arranged along a beam path of the first working beam towards the first working field after the first movable mirror of the first scanning device, wherein the second movable mirror of the second scanning device is arranged along a beam path of the second working beam towards the second working field after the first movable mirror of the second scanning device, and wherein a height of the second movable mirror of the first scanning device over the first working field or a height of the second movable mirror of the second scanning device over the second working field is not more than 800 mm.
40. The deflection module of claim 30, further comprising a housing, wherein the first deflection unit and the second deflection unit are enclosed within the housing wherein the housing comprises a first transparent window configured for letting through the first working beam propagating from the first scanning device to the first working field and a second transparent window configured for letting through the second working beam propagating from the second scanning device to the second working field.
41. The deflection module of claim 40, wherein the first transparent window and the second transparent window are adjacent to each other or to the same lateral wall of the housing.
42. A modular deflection system comprising a first deflection module and a second deflection module, wherein each of the first deflection module and the second deflection module comprises: a first deflection unit comprising a first scanning device configured for scanning a first working beam over a first working field, wherein the first scanning device comprises: a first movable mirror for scanning the first working beam in a first direction by tilting around a first axis; and a second movable mirror for scanning the first working beam in a second direction by tilting around a second axis; a second deflection unit comprising a second scanning device configured for scanning a second working beam over a second working field; wherein the second scanning device comprises: a first movable mirror for scanning the second working beam in the first direction by tilting around a third axis; and a second movable mirror for scanning the second working beam in the second direction by tilting around a fourth axis; wherein the second movable mirror of the first scanning device and the second movable mirror of the second scanning device are arranged mirror-symmetrically with respect to each other and to a common plane of mirror symmetry, wherein the second axis is aligned with the fourth axis; and wherein the first working field and the second working field overlap in a common overlap area; wherein the first deflection module and the second deflection module are mutually attachable; wherein, when the first deflection module and the second deflection module are attached to each other, the common overlap area of the first deflection module and the common overlap area of the second deflection module overlap, thereby forming a common overlap field.
43. The modular deflection system of claim 42, wherein the first deflection module and the second deflection module are mirror symmetrical with respect to each other, when the first deflection module and the second deflection module are mutually attached.
44. The modular deflection system of claim 42, wherein a distance between an optical centre of the second movable mirror of the first scanning device of the first deflection module and an optical centre of the second movable mirror of the first or second scanning device of the second deflection module corresponds to not more than 4 times an aperture of the first movable mirror of the first scanning device of the first deflection module.
45. The modular deflection system of claim 42, wherein a distance between an optical centre of the second movable mirror of the first scanning device of the first deflection module and an optical centre of the second movable mirror of the first or second scanning device of the second deflection module is not more than 120 mm.
46. The modular deflection system of claim 43, wherein the first deflection module comprises a first housing, wherein the first deflection unit and the second deflection unit of the first deflection module are enclosed within the first housing; and wherein the second deflection module comprises a second housing, wherein the first deflection unit and the second deflection unit of the second deflection module are enclosed within the second housing; wherein the first housing and the second housing are mutually attachable in such a manner that the first housing and the second housing are arranged adjacent to each other, when the first deflection module and the second deflection module are attached to each other.
47. A deflection module comprising: a first deflection unit comprising a first scanning device configured for scanning a first working beam over a first working field, wherein the first scanning device comprises: a first movable mirror for scanning the first working beam in a first direction by tilting around a first axis; and a second movable mirror for scanning the first working beam in a second direction by tilting around a second axis; a second deflection unit comprising a second scanning device configured for scanning a second working beam over a second working field; wherein the second scanning device comprises: a first movable mirror for scanning the second working beam in the first direction by tilting around a third axis; and a second movable mirror for scanning the second working beam in the second direction by tilting around a fourth axis; wherein the second movable mirror of the first scanning device and the second movable mirror of the second scanning device are arranged mirror-symmetrically with respect to each other and to a common plane of mirror symmetry, wherein the second axis is aligned with the fourth axis; and wherein the first working field and the second working field overlap in a common overlap area; wherein the first scanning device further comprises a first galvanometer motor for tilting the second movable mirror of the first scanning device; wherein the second scanning device further comprises a second galvanometer motor for tilting the second movable mirror of the second scanning device; and wherein the first galvanometer motor and the second galvanometer motor are arranged on opposite sides of the respective second movable mirror with respect to the common plane of mirror symmetry, such that the first galvanometer motor and the second galvanometer motor are arranged mirror-symmetrically with respect to each other and to the common plane of mirror symmetry.
48. The deflection module of claim 47, wherein the second movable mirror of the first scanning device is arranged in a direction perpendicular to the common plane of mirror symmetry between the first galvanometer motor and the common plane of mirror symmetry, and wherein the second movable mirror of the second scanning device is arranged in a direction perpendicular to the common plane of mirror symmetry between the second galvanometer motor and the common plane of mirror symmetry.
49. The deflection module of claim 41, wherein the first transparent window and the second transparent window are integral with each other.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS
[0096] For the purposes of promoting an understanding of the principles of the invention, reference will now be made to a preferred embodiment illustrated in the drawings, and specific language will be used to describe the same. It will nevertheless be understood that no limitation of the scope of the invention is thereby intended, such alterations and further modifications in the illustrated apparatus and such further applications of the principles of the invention as illustrated therein being contemplated as would normally occur now or in the future to one skilled in the art to which the invention relates.
[0097]
[0098] The first movable mirror 12a-1 is configured for scanning a first working beam 50a in a first direction, which in the embodiment shown in
[0099] The second movable mirror 12a-2 is configured for scanning the first working beam 50a, after the first working beam 50a is reflected by the first movable mirror 12a-1, in a second direction, which in the embodiment shown in
[0100] The first movable mirror 12a-1 and the second movable mirror 12a-2 thus form an XY-scanning device configured for scanning the first working beam 50a in the x- and y-directions over a two-dimensional working field 40a. One or more workpieces or start materials located within the working field 40a can hence be laser-processed by the first working beam 50a deflected by the first deflection unit 10a.
[0101] The first working beam 50a is generated by a first laser source 28a that is optically connected to the first deflection unit 10a and/or, in some embodiments, integrated in the first deflection unit 10a. In the embodiment under consideration, the first laser source 28a is configured for generating laser light with a wavelength of 1070 nm forming the first working beam 50a.
[0102] After being generated by the first laser source 28a, the working beam 50a propagates through a first focusing device 20a that is configured for focusing, zooming and collimating the working beam 50a. The focusing device 20a comprises a first movable lens 22a, a second movable lens 24a and a fixed lens 26a, wherein the movable lenses 22a and 24a can be shifted in the z-direction for adjusting a variable focal length of the first focusing device 20a and for zooming and collimating the first working beam 50a, thereby adjusting, for example, a beam diameter of the first working beam 50a. The first lens 22a may be a fixed lens in other embodiments. The first focusing device 20a operates as a focusing and zooming unit setting the focal length of the entire optical system of the first deflection unit 10a such that the first working beam 50a is focused on the first working field 40a, at a distance SR from the second movable mirror 12a-2 (cf.
[0103] After propagating through the first focusing device 20a, the first working beam 50a is reflected by a first optical element 16a, which in the embodiment shown in
[0104] In the embodiments shown in
[0105] The deflection module further comprises a second deflection unit 10b having a structure, arrangement and optical components corresponding, possibly identical, to the components of the first deflection unit 10a. For example, the lenses 22b, 24b and 26b of the second focusing device 20b can be identical to the corresponding lenses 22a, 24a and 26a, respectively, of the first focusing device 20a. Likewise, the second optical element 16b of the second deflection unit 10b can be identical to the corresponding first optical element 16a of the first deflection unit 10a and be arranged accordingly to as to fulfil the same function. The second focusing device 20b operates as a focusing and zooming unit setting the focal length of the entire optical system of the second deflection unit 10b such that the second working beam 50b is focused on the second working field 40b, at a distance SR from the second movable mirror 12b-2 (cf.
[0106] The second deflection unit 10a comprises a second scanning device 12b, which comprises a first movable mirror 12b-1 and a second movable mirror 12b-2, which respectively correspond in terms of function and structure to the first movable mirror 12a-1 and the second movable mirror 12a-2 of the first deflection unit 10a. The first movable mirror 12b-1 is configured for scanning a second working beam 50b, which is generated by a second laser source 28b that is functionally identical to the first laser source 28a, in the first direction (x-direction), by tilting around a third axis A.sub.3, which in the embodiment shown in
[0107] The second movable mirror 12b-2 is configured for scanning the second working beam 50b, after the second working beam 50b is reflected by the second optical element 16b and the first movable mirror 12b-1, for scanning the second working beam 50b in the second direction (y-direction), by tilting around a fourth axis A.sub.4, which is aligned with the second axis A.sub.2 in the x-direction (cf.
[0108] The first movable mirror 12b-1 and the second movable mirror 12b-2 form an XY-scanning device configured for scanning the second working beam 50b in the x- and y-directions over a two-dimensional working field 40b. One or more workpieces or start materials located within the working field 40b can hence be laser-processed by the second working beam 50b deflected by the second deflection unit 10b.
[0109] The first deflection unit 10a and the second deflection unit 10b are arranged mirror-symmetrically with respect to each other and with respect to a common plane of mirror symmetry M, which in
[0110] The portion of the first working beam 50a propagating in the z-direction from the first laser source 28a to the first optical element 16a propagates parallel to the portion of the second working beam 50b that propagates also in the z-direction from the second laser source 28b to the second optical element 16b. The portion of the first working beam 50a that propagates from the first optical element 16a to the first movable mirror 12a-1 and the portion of the second working beam 50b that propagates from the second optical element 16b to the first movable mirror 12b-1 propagate aligned with each other in the x-direction and directed towards each other, i.e. towards the common plane of mirror symmetry M.
[0111] The mirror symmetry between the first deflection unit 10a and the second deflection unit 10b with respect to the common plane of mirror symmetry M may be broken along the beam path followed, respectively, by the first working beam 50a and the second working beam 50b, from the corresponding scanning device 12a or 12b on, inasmuch as the movable mirrors 12a-1 and 12a-2 of the first scanning device 12a might be tilted at a given time differently than or without corresponding to a mirror-symmetric tilting state of the movable mirrors 12b-1 and 12b-2 of the second scanning device 12b, i.e. without corresponding to a specular image thereof with respect to the common plane of mirror symmetry M. However, the first movable mirror 12a-1 and the second movable mirror 12b-1 of the first scanning device 12a are, in their o-tilt positions, arranged, respectively, mirror-symmetrically with respect to the first movable mirror 12b-1 and the second movable mirror 12b-2 of the second scanning device 12b in their o-tilt positions.
[0112] Such mirror-symmetric arrangement of the first and second deflection units 10a and 10b allows for an arrangement of the first scanning device 12a and the second scanning device 12b, and in particular of the respective second movable mirrors 12a-2 and 12b-2, in which a distance d.sub.oc between the optical centre of the second movable mirror 12a-2 and the optical centre of the second movable mirror 12b-2 is reduced to a minimum. The second movable mirrors 12a-2 and 12b-2 are positioned very close to each other and are mutually separated in the x-direction by a small distance d. Consequently, the first working field 40a of the first deflection unit 10a and the second working field 40b of the second deflection unit 10b overlap with each other in at least a respective subregion thereof forming a common overlap area 42. The common overlap area 42 belongs both to the first working field 40a and to the second working field 40b.
[0113] In the embodiments illustrated in
[0114] As seen in
[0115] The mirror-symmetric and aligned arrangement of the second movable mirrors 12a-2 and 12b-2 allows minimising the distance doz between the optical centres of the second movable mirrors 12a-2 and 12b-b, thereby increasing the size of the common overlap area 42 without having to increase a distance between each of the second movable mirrors 12a-2 and 12b-2 and the plane on which the first working field 40a and the second working field 40b (and hence the common overlap area 42) lie, i.e. without having to increase the scan radius..
[0116] As shown in
[0117] Such large overlap of the first and second working fields 40a and 40b is compatible, thanks to the mirror-symmetric and aligned arrangement of the first and second deflection units 10a and 10b, and in particular of the second movable mirrors 12a-2 and 12b-2, with a rather small scan radius SR (cf.
[0118] The galvanometer motors 14a-2 and 14b-2 for tilting the second movable mirrors 12a-2 and 12b-2 respectively, are arranged on opposite sides of the corresponding second movable mirror 12a-2, 12b-2: as seen in
[0119] The schematic view of
[0120] As shown in
[0121]
[0122] In the method 200, the first deflection unit 10a of the deflection module is used for scanning the working beam 50a, which is generated as a laser beam with a first power density of 4 MW/cm.sup.2, and the second deflection unit 10b of the deflection module is used for scanning the working beam 50b, which is generated as a laser beam with a second power density of 40 MW/cm.sup.2. The first working beam 50a and the second working beam 50b may be generated by identical laser sources having the same beam power. The higher power density of the second working beam is implemented by configuring the second working beam 50b having a smaller spot size than the first working beam 50a.
[0123] The first working beam 50a is used for warming up the basis material and the second working beam 50b is subsequently used for laser-processing the basis material at points at which the basis material has previously been warmed up by the first working beam 50a. The first and second working beams 50a and 50b can operate simultaneously, such that the first working beam 50a goes on to warm up other points of the basis material while the second working beam 50b is laser-processing points of the basis material already warmed-up by the first working beam 50a.
[0124] For each layer of basis material to be laser-processed, at given points of the basis material, the first working beam 50a is first used, at 202, for warming up the basis material. Then, at 204, the second working beam 50b is used at the same points of the basis material for laser-processing the warmed-up basis material.
[0125] In other embodiments (not shown), the first working beam 50a can further be employed for slowing down the cooling-off of points of the basis material that have previously been laser-processed by the second working beam 50b.
[0126] If more than one deflection modules are combined for cooperative operation (see description of
[0127]
[0128] The housing 60 is waterproof and dustproof and implements IP64 sealing protection according to the International Protection Rating, such that the interior thereof is isolated from the outside environment of the housing 60 due to the sealing effect provided by the housing 60.
[0129] The housing 60 comprises a first transparent window 62a and a second transparent window 62b, which are respectively formed by glass plates arranged at the bottom of the housing 60, as shown in
[0130] The first transparent window 62a and the second transparent window 62b are arranged adjacent to each other, such that they share a common edge 65. In the embodiment shown in
[0131] As seen in
[0132] As seen in
[0133]
[0134] Due to the symmetric arrangement of each of the first and second deflection modules 102 and 104, wherein the first deflection module 102 defines a first common plane of mirror symmetry M1 corresponding to the plane M in
[0135] Further, the separation d′ between the second movable mirror 12a-2 of the first scanning device 12a of the first deflection module 102 and the second movable mirror 12C-2 of the first scanning device 12C of the second deflection module 104 and between the second movable mirror 12b-2 of the second scanning device 12b of the first deflection module 102 and the second movable mirror 12d-2 of the second scanning device 12d of the second deflection module 104 is of about 10 mm. The distance d′.sub.oc between the optical centre of the second movable mirror 12a-2 of the first scanning device 12a of the first deflection module 102 and the optical centre of the second movable mirror 12C-2 of the first scanning device 12C of the second deflection module 104 and between the optical centre of the second movable mirror 12b-2 of the second scanning device 12b of the first deflection module 102 and the optical centre of the second movable mirror 12d-2 of the second scanning device 12d of the second deflection module 104 is of about 65 mm.
[0136] As a consequence, the size of a common overlap field 44, in which the working field 40a of the first deflection unit 10a of the first deflection module 102, the working field 40b of the second deflection unit 10b of the first deflection module 102, the working field 40c of the first deflection unit 10c of the second deflection module 104, and the working field 40d of the second deflection unit 10d of the second deflection module 104 overlap as shown in
[0137] In the embodiment illustrated in
[0138] Although preferred exemplary embodiments are shown and specified in detail in the drawings and the preceding specification, these should be viewed as purely exemplary and not as limiting the invention. It is noted in this regard that only the preferred exemplary embodiments are shown and specified, and all variations and modifications should be protected that presently or in the future lie within the scope of protection of the invention as defined in the claims.