ELECTROMAGNETIC RADIATION PERMEABLE GLAZING
20230144425 · 2023-05-11
Assignee
Inventors
Cpc classification
C03C2217/94
CHEMISTRY; METALLURGY
B32B2255/28
PERFORMING OPERATIONS; TRANSPORTING
C03C17/3668
CHEMISTRY; METALLURGY
B32B17/10036
PERFORMING OPERATIONS; TRANSPORTING
B32B2305/30
PERFORMING OPERATIONS; TRANSPORTING
C03C17/3657
CHEMISTRY; METALLURGY
C03C17/3655
CHEMISTRY; METALLURGY
C03C17/009
CHEMISTRY; METALLURGY
C03C2218/365
CHEMISTRY; METALLURGY
B32B33/00
PERFORMING OPERATIONS; TRANSPORTING
B32B17/10183
PERFORMING OPERATIONS; TRANSPORTING
C03C17/3626
CHEMISTRY; METALLURGY
C03C17/3681
CHEMISTRY; METALLURGY
International classification
B32B17/06
PERFORMING OPERATIONS; TRANSPORTING
Abstract
A glazing includes at least one transparent substrate comprising a first major surface and an opposing second major surface, wherein said first major surface is coated with an electrically conductive layer and the electrically conductive layer is absent in one or more regions of the first major surface. At least a portion of the one or more regions of the first major surface, and/or corresponding regions of the opposing second major surface, bears a low-emissivity material, and the one or more regions permit the passage of electromagnetic radiation through the glazing.
Claims
1-25. (canceled)
26. A glazing comprising: at least one transparent substrate comprising a first major surface and an opposing second major surface, wherein said first major surface is coated with an electrically conductive layer, wherein the electrically conductive layer is absent in one or more regions of the first major surface, wherein at least a portion of i) said one or more regions of the first major surface, and/or ii) corresponding regions of the opposing second major surface, bears a low-emissivity material, and wherein said one or more regions permit the passage of electromagnetic radiation through the glazing.
27. The glazing according to claim 26, wherein at least a portion of each of said one or more regions of the first major surface where the electrically conductive layer is absent bears a low-emissivity material.
28. The glazing according to claim 26, wherein the glazing exhibits an emissivity of less than 0.4, preferably less than 0.3, more preferably less than 0.2, most preferably less than 0.1.
29. The glazing according to claim 26, wherein the low-emissivity material comprises one or more of a coated glass, a coated microbead, a dielectric multilayer coating, a metal and/or a metal oxide, and optionally, wherein the coated glass and/or coated microbead are coated with a low-emissivity coating that comprises at least one layer based on an IR reflective metal such as silver, gold or aluminium, or IR reflective metal oxide such as titania or alumina or a transparent conductive oxide (TCO).
30. The glazing according to claim 29, wherein the metal is silver, gold or aluminium, and the metal oxide is titania or alumina or a TCO.
31. The glazing according to claim 29, wherein the low-emissivity material is in the form of flakes and/or particles of the coated glass, the coated microbead, the metal and/or the metal oxide.
32. The glazing according to claim 31, wherein the flakes of coated glass, metal and/or metal oxide have an average thickness of from 0.1-10 .Math.m, preferably from 1-8 .Math.m, more preferably from 4-6 .Math.m.
33. The glazing according to claim 31, wherein the flakes of coated glass, metal and/or metal oxide have an average diameter of from 5-4000 .Math.m, preferably from 10-1700 .Math.m, more preferably from 20-500 .Math.m, most preferably from 25-150 .Math.m, and/or wherein the flakes of coated glass, metal and/or metal oxide have an aspect ratio of average diameter divided by average thickness of greater than or equal to 10, preferably greater than or equal to 15, most preferably greater than or equal to 20.
34. The glazing according to claim 31, wherein the particles of coated glass, coated microbead, metal and/or metal oxide have an average diameter of 1-1000 .Math.m, preferably 10-500 .Math.m, more preferably 20-300 .Math.m.
35. The glazing according to claim 31, wherein the particles of coated glass comprise glass microspheres, wherein the glass microspheres may be solid or hollow.
36. The glazing according to claim 26, wherein the low-emissivity material forms at least part of a coating and/or a film that is attached to the first major surface and/or the opposing second major surface of the substrate, and optionally wherein the low-emissivity material is dispersed within the coating and/or the film.
37. The glazing according to claim 36, wherein the low-emissivity material forms at least part of a layer either located in contact with the glazing, located within the coating and/or the film, or located on an exposed surface of the coating and/or the film.
38. The glazing according to claim 26, wherein the density of the low-emissivity material is less than 5 g/cm.sup.3, preferably less than 3 g/cm.sup.3, more preferably less than 2 g/cm.sup.3, but preferably more than 0.1 g/cm.sup.3, more preferably more than 0.5 g/cm.sup.3, even more preferably more than 1 g/cm.sup.3.
39. The glazing according to claim 36, wherein the coating and/or film comprises at least 0.5 wt% of the low-emissivity material, preferably at least 1 wt%, more preferably at least2 wt%, but preferably at most 15 wt%, more preferably at most 10 wt%, even more preferably at most 5 wt%.
40. The glazing according to claim 26, wherein the one or more regions of the first major surface where the electrically conductive layer is absent are arranged to allow the passage of electromagnetic radiation that corresponds to very high frequencies (30-300 MHz, 10 m-1 m), ultra high frequencies (300-3000 MHz, 1 m-100 mm), and/or super high frequencies (3-30 GHz, 100 mm-10 mm).
41. The glazing according to claim 26, wherein the one or more regions of the first major surface where the electrically conductive layer is absent and/or that bear the low-emissivity material are located within 100 mm of the periphery of the first major surface, preferably within 75 mm of the periphery, more preferably within 50 mm of the periphery, even more preferably within 30 mm of the periphery, but preferably at least 5 mm from the periphery, more preferably at least 15 mm from the periphery, even more preferably at least 20 mm from the periphery.
42. The glazing according to claim 26, wherein the one or more regions of the first major surface where the electrically conductive layer is absent and/or that bear the low-emissivity material are shaped as strips, and optionally wherein each strip is located substantially parallel, preferably parallel, to a nearest peripheral edge of the first major surface.
43. A multiple glazing unit comprising: at least two transparent substrates that each comprise a first major surface and an opposing second major surface, wherein at least one of the transparent substrates is coated on the first major surface with an electrically conductive layer, wherein the electrically conductive layer is absent in one or more regions of the first major surface, wherein at least a portion of i) said one or more regions of the first major surface, and/or ii) corresponding regions of a different major surface of the at least two transparent substrates, bears a low-emissivity material, and wherein said one or more regions permit the passage of electromagnetic radiation through the glazing.
44. The multiple glazing unit according to claim 43, wherein neighbouring transparent substrates of the at least two transparent substrates are separated by a gap and/or at least one ply of an interlayer material is laminated between the substrates, and optionally wherein the electrically conductive layer and/or the low-emissivity material are located between two transparent substrates, preferably the electrically conductive layer and the low-emissivity material are both located between the same two transparent substrates.
45. A method of preparing a glazing according to the present invention comprising: coating at least one transparent substrate with an electrically conductive layer, wherein either the electrically conductive layer is deposited through a mask and/or is partially removed after deposition of the electrically conductive layer, applying a low-emissivity material to at least a portion of i) said one or more regions of the first major surface, and/or ii) corresponding regions of the opposing second major surface.
Description
[0084] The invention will now be further described by way of the following specific embodiments, which are given by way of illustration and not of limitation, with reference to the accompanying drawings in which:
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[0095] The invention is not restricted to the details of the foregoing embodiments. The invention extends to any novel one, or any novel combination, of the features disclosed in this specification (including any accompanying claims, abstract and drawings), or to any novel one, or any novel combination, of the steps of any method or process so disclosed.