METHOD AND SYSTEM FOR FORMING A MULTILAYERED ZINC ALLOY COATING AND METALLIC ARTICLE
20230203698 · 2023-06-29
Inventors
- Philipp WAGENER (Hameln, DE)
- Manuela OVERKEMPING (Schloss Holte-Stukenbrock, DE)
- Jan HUSTERT (Steinhagen, DE)
- Yindong GE (Hilliard, OH, US)
Cpc classification
C23C28/44
CHEMISTRY; METALLURGY
C25D5/18
CHEMISTRY; METALLURGY
C23F11/00
CHEMISTRY; METALLURGY
C23C28/42
CHEMISTRY; METALLURGY
C25D5/10
CHEMISTRY; METALLURGY
C23C28/40
CHEMISTRY; METALLURGY
C25D5/625
CHEMISTRY; METALLURGY
C25D17/08
CHEMISTRY; METALLURGY
International classification
C25D5/10
CHEMISTRY; METALLURGY
C23F11/00
CHEMISTRY; METALLURGY
Abstract
A method of forming a multilayered zinc alloy coating comprises steps of providing a bath of an aqueous electrolyte including zinc and a second electrodepositable component in an electrolytic cell having an anode and a cathode; applying a current or voltage between the anode and the cathode; modulating the applied current or voltage over time between at least two current or voltage values to thereby modulate the current density over multiple cycles between at least two current density values, wherein a first current density value is in a range of 0.3 to less than 2 A/dm.sup.2 and a second current density value is higher than the first current density value and is in a range of 0.6 to less than 5 A/dm.sup.2; and controlling the modulation of the applied current or voltage to obtain a multilayered structure having multiple layers of one or more of alternating proportions of the second component, alternating corrosion potential, alternating grain size, and alternating grain orientation, wherein one or more of the multiple layers has a thickness in the range of 1 to 10 μm.
Claims
1. Method of forming a multilayered zinc alloy coating, the method comprising: providing a bath of an aqueous electrolyte including zinc and a second electrodepositable component in an electrolytic cell having an anode and a cathode; applying a current or voltage between the anode and the cathode; modulating the applied current or voltage over time between at least two current or voltage values to thereby modulate the current density over multiple cycles between at least two current density values, wherein a first current density value is in a range of 0.3 to less than 2 A/dm.sup.2 and a second current density value is higher than the first current density value and is in a range of 0.6 to less than 5 A/dm.sup.2; and controlling the modulation of the applied current or voltage to obtain a multilayered structure having multiple layers of one or more of alternating proportions of the second component, alternating corrosion potential, alternating grain size, and alternating grain orientation, wherein one or more of the multiple layers has a thickness in the range of 1 to 10 μm.
2. Method as claimed in claim 1, wherein the modulation of the applied current or voltage is controlled to form the multilayered structure having 2 to 20 layers, in particular 4 to 12 layers.
3. Method as claimed in claim 1, wherein the modulation of the applied current or voltage is controlled to form the multilayered structure having multiple layers, each having a thickness in the range of 1 to 10 μm, in particular in the range of 1 to 5 μm.
4. Method as claimed in claim 1, wherein the second electrodepositable component is one of nickel, iron, cobalt, copper, gold, silver, platinum, chromium, lead, tin or a combination thereof.
5. Method as claimed in claim 1, wherein the modulation of the applied current or voltage is controlled to form the multilayered structure having a total thickness in the range of 5 to 25 μm, in particular in the range of 8 to 16 μm, and/or wherein the modulation of the applied current or voltage is controlled to alternate the current density over multiple cycles between at least two different current density values, wherein each of the current density values is applied in a cycle for a duration in the range of 30 seconds to 60 minutes, in particular in the range of 1 to 15 minutes.
6. Method as claimed in claim 1, further comprising a step of forming a passivation layer on top of the multilayered structure, in particular by mutual corrosion protection reinforcement of plating and passivation layer properties, and optionally forming a sealing layer on top of the passivation layer.
7. Method as claimed in claim 6, wherein the current or voltage applied for forming the final layer of the multilayered structure is controlled to form the final layer having a lower or higher proportion of the second component than the penultimate layer.
8. Method as claimed in claim 6, wherein one or more parameters for forming the final layer of the multilayered structure and for forming the passivation layer are controlled so that in the forming of the passivation layer the top part of the final layer of the multilayered structure is converted to form at least part of the passivation layer.
9. Method as claimed in claim 6, wherein the passivation layer is formed from one or more of chromium oxide, zirconium oxide, zinc oxide, titanium oxides, vanadium oxides, organofunctional silanes, and organic polymers.
10. Method as claimed in claim 1, wherein one or more chemical or physical parameters, in particular one or more of alloying metal content, crystal structure and micro cracks, are controlled for forming the final layer of the multilayered structure.
11. Method as claimed in claim 1, herein the multilayered zinc alloy coating is formed by use of a rack, wherein the first current density value is in a range of 0.5 to less than 2 A/dm.sup.2 and the second current density value is in a range of 2 to less than 5 A/dm.sup.2.
12. Method as claimed in claim 11, wherein the second current density value is higher than the first current density value by a value difference in the range of 0.5 to 4 A/dm.sup.2.
13. Method as claimed in claim 1, wherein the multilayered zinc alloy coating is formed by use of a barrel, and wherein the first current density value is in a range of 0.3 to 1 A/dm.sup.2 and the second current density value is in a range of 0.6 to 2 A/dm.sup.2.
14. Method as claimed in claim 13, wherein the second current density value is higher than the first current density value by a value difference in the range of 0.2 to 1 A/dm.sup.2.
15. System for forming a multilayered zinc alloy coating, the system comprising: a bath of an aqueous electrolyte including zinc and a second electrodepositable component in an electrolytic cell having an anode and a cathode; a current or voltage source configured to apply a current or voltage between the anode and the cathode; a controller configured to modulate the applied current or voltage over time between at least two current or voltage values to thereby modulate the current density over multiple cycles between at least two current density values, wherein a first current density value is in a range of 0.3 to less than 2 A/dm.sup.2 and a second current density value is higher than the first current density value and is in a range of 0.6 to less than 5 A/dm.sup.2, and to control the modulation of the applied current or voltage to obtain a multilayered structure having multiple layers of one or more of alternating proportions of the second component, alternating corrosion potential, alternating grain size, and alternating grain orientation, wherein one or more of the multiple layers has a thickness in the range of 1 to 10 μm.
16. Metallic article having a metallic substrate and a multilayered zinc alloy coating formed on the metallic substrate, the multilayered zinc alloy coating including a multilayered structure having multiple layers of one or more of alternating proportions of the second component, alternating corrosion potential, alternating grain size, and alternating grain orientation, wherein one or more of the multiple layers has a thickness in the range of 1 to 10 μm.
17. Metallic article as claimed in claim 16, wherein the multilayered zinc alloy coating is formed by a method defined claim 1.
18. Metallic article as claimed in claim 16, further comprising a passivation layer formed on top of the multilayered structure, wherein the top part of the final layer of the multilayered structure is converted and forms at least part of the passivation layer.
Description
BRIEF DESCRIPTION OF THE DRAWING
[0041] A more complete appreciation of the disclosure and many of the attendant advantages thereof will be readily obtained as the same becomes better understood by reference to the following detailed description when considered in connection with the accompanying drawings, wherein:
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DETAILED DESCRIPTION OF THE EMBODIMENTS
[0055] Plating parameters and subsequent coating properties are usually a compromise between a manifold of requirements like corrosion protection, coating adhesion or tribology. Most of the influencing variables cannot be changed during the process and need to be defined before the plating process when using a single plating tank (single bath electrodeposition). This limitation to a fixed set of plating parameters could be avoided by use of multiple plating tanks (multiple bath electrodeposition). In this approach, the substrate or part is plated in one tank after each other to give multiple layers with different properties. However, this method is not easy to implement in industrial use since process time and complexity is much higher.
[0056] In the more common single bath approach, the only parameter (besides time) that can generally be altered in a practicable way during a plating process is current density. However, a variation in current density has an impact on several physical and chemical properties: [0057] Affecting corrosion protection: Alloying metal content, crystal structure, micro cracks [0058] Affecting coating adhesion and throwing power: Nucleation, grain size [0059] Affecting tribology: grain size, roughness
Thus, current density is generally chosen as a comprise between all requirements of the electro-deposited coating and subsequent post-treatments, such as forming a passivation layer and a sealer.
[0060]
[0061] The electrolytic solution 12 contains ions of the metals which are to be plated onto the cathode 13, in particular zinc and at least a second metal (e.g. nickel). The plating current (or voltage), and thus the current density between the anode 13 and the cathode 14, is controlled by the controller 16 to plate and form the multilayered zinc alloy coating on the cathode 14. The controller 16 particularly modulates the applied current or voltage over time between at least two current or voltage values to thereby modulate the current density over multiple cycles between at least two current density values, particularly a lower (also called “first”) and a higher (also called “second”) current density value which may be applied in any sequence, i.e., the lower current density value being applied first and the higher current density value being applied second, or in the opposite order of the higher current density value being applied first and the lower current density value being applied second. In this way, metal ions from the electrolytic solution 12 are deposited upon the cathode 14 in alternating layers thereof to define the multilayered zinc alloy coating, wherein the composition and properties of the individual layers is controlled through the control of the current density.
[0062] The system 1 is able to at least partly use standard plating line equipment, e.g. a DC rectifier as part of the supply unit 15 that rectifies an external AC current provided by a public power supply. The system 1 thus provides an economically advantageous process that can be use in an industrial manufacturing process with limited investment and changes of standard plating line equipment and thus has a high application potential.
[0063]
[0064] The metallic article 2 comprises a metallic substrate 20 (used as cathode 14 in the system 1) and the multilayered zinc alloy coating formed on the metallic substrate 20. The multilayered zinc alloy coating is, in this embodiment, formed by a multilayered structure 21, which represents the coating and has multiple (in this exemplary embodiment four) layers 22-25 of alternating proportions of a second component in addition to zinc. The multilayered structure 21 may be formed by use of the system 1 and a method of controlling the current density in a way as described in more detail below.
[0065] Generally, the multilayered structure 21 may have 2 to 20 layers. Preferably, the number of layers is in the range of 4 to 12. The thickness of each of the layers 22-25 of the multilayered structure 21 is generally in the range of 1 to 10 μm, preferably in the range of 1 to 5 μm. The total thickness of the multilayered structure 21 is generally in the range of 5 to 25 μm, preferably in the range of 8 to 16 μm.
[0066] The second electrodepositable component of the layers, in addition to zinc as first component, is one of nickel, iron, cobalt, copper, gold, silver, platinum, chromium, lead, tin or a combination thereof.
[0067] In this embodiment, the thickness of each of the layers 22-25 is substantially equal, but the proportion of the second component (e.g. nickel) is different. In this embodiment the first and third layers 22 and 24 have substantially the same first proportion of the second component, and the second and fourth layer 23 and 25 have substantially the same second proportion of the second component, wherein the first proportion is lower than the second proportion.
[0068]
[0069] As shown in
[0070] The length of the time intervals T1-T4 may be identical, but they may also be controlled individually to individually control the thickness of each layer. In a preferred embodiment, as shown in
[0071] The first and third current density values C1 and C3 are preferably equal and the second and fourth current density values C2 and C4 are preferably equal, wherein C1 and C3 are higher than C2 and C4. In another embodiment the current density values C1-C4 may be controlled individually to individually control the growth rate of each layer and proportion of the second component in each layer.
[0072] The multilayered structure may be formed by use of a rack using rack plating, in which method the parts on which the multilayered structure shall be formed are mounted to a rack, which is then placed into the bath of electrolytic solution. In this case the first and third current density values C1 and C3 are preferably in a range of 0.5 to less than 2 A/dm.sup.2, in examples up to 3 A/dm.sup.2, and the second and fourth current density values C2 and C4 are preferably in a range above 3 A/dm.sup.2 (preferably in a range of 3 to less than 5 A/dm.sup.2, in examples up to 6 A/dm.sup.2). Rack plating generally has the advantages of being usable with larger/heavier parts and showing less carryover of the electrolytic solution. Values in the range of 1 to less than 2 A/dm.sup.2 for C1 and C3 and values in the range of 3 to 4 A/dm.sup.2 for C2 and C4 have shown good results under different conditions of the rack plating process. Generally, C2 and C4 have higher values than C1 and C3, preferably by a value difference in the range of 0.5 to 4 A/dm.sup.2.
[0073] In another embodiment the multilayered structure may be formed by use of a barrel using barrel plating, in which method the parts on which the multilayered structure shall be formed are placed into a barrel containing the bath of electrolytic solution. In this case the first and third current density values C1 and C3 are preferably in a range of 0.3 to 1 A/dm.sup.2 and the second and fourth current density values C2 and C4 are preferably in a range of 0.6 to 2 A/dm.sup.2, preferably above 1 A/dm.sup.2 or even above 1.2 A/dm.sup.2. Since too high current densities have unwanted side effects (like burnings, amorphous plating, decreasing plating efficiency, forming of hydrogen) they should be avoided. In practical embodiments, the second and fourth current density values C2 and C4 are not higher than 2 A/dm.sup.2, in examples not higher than 4 to 5 A/dm.sup.2. Barrel plating generally has the advantages of being usable with many smaller/lighter parts, requiring less efforts and having a more homogeneous current density. Values in the range of 0.4 to 0.7 A/dm.sup.2 for C1 and C3 and values in the range of 0.6 to 1.2 A/dm.sup.2 for C2 and C4 have shown good results under different conditions of the barrel plating process. Generally, C2 and C4 have higher values than C1 and C3, preferably by a value difference in the range of 0.2 to 1 A/dm.sup.2.
[0074] In an exemplary embodiment, e.g. using nickel as second component, the proportion of nickel in the first and third layers 22 and 24 may be in the range from 12 to 16, e.g. 13%, and the proportion of nickel in the second and fourth layers 23 and 25 may be in the range from 8 to 12, e.g. 11%. The thickness of the first and third layers 22 and 24 may be 3.9 μm and the thickness of the second and fourth layers 23 and 25 may be 4.3 μm. The multilayered structure 21 preferably has corrosion current I.sub.corr of approximately 5 μA/dm.sup.2 and a coating impedance Z.sub.Nyquist of approximately 1Ω.
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[0077] The passivation layer 30 is formed from one or more of chromium oxide, zirconium oxide, zinc oxide, titanium oxides, vanadium oxides, organofunctional silanes, and organic polymers. The thickness of the passivation layer 30 is preferably in the range of 0.1-0.5 μm, e.g. approximately 0.5 μm. The passivation layer 30 preferably has corrosion current I.sub.corr<0.2 μA/dm.sup.2 and a coating impedance Z.sub.Nyquist>50 kΩ.
[0078] The sealing layer 31 is formed from an aqueous polymer solution. The thickness of the sealing layer 31 is preferably in the range of 0.5-3 μm, e.g. approximately 2 μm. The sealing layer 31 preferably has corrosion current I.sub.corr<0.3-0.6 μA/dm.sup.2 and a coating impedance Z.sub.Nyquist>5-8 kΩ.
[0079]
[0080] Similar to the embodiment shown in
[0081] Like in the embodiment shown in
[0082] In this embodiment, as shown in
[0083] The current density value C17 for forming the final layer 29 of the multilayered structure 21′ generally depends on the passivation chemistry and may be lower or higher than the other current density values, but is applied for a longer time T17. This controls the forming of the final layer 29 such that it has a lower proportion of the second component or a different crystal structure than the penultimate layer 28. This provides a low roughness of the final layer 29 and further has the advantage that the final layer 29 has a better ability to interact with the passivation layer 30. In particular, when forming the passivation layer 30, e.g. by placing the metallic substrate 20 carrying the multilayered structure 21′ into a solution e.g. including chromium, the passivation solution dissolves the outer surface, e.g. up to a micrometer, of the final layer and forms a new passivation layer (conversion layer). The chromium interacts with the zinc alloy of the final layer 29 and converts its uppermost surface area, at least partly, into the final passivation layer 30 of e.g. chromium dioxide.
[0084]
[0085] Plot A shows the EIS for a final layer 29 having a low proportion of Ni (plot A1) and for a final layer 25 having a high proportion of Ni (plot A2), both for a multilayered structure 21′ between 4 and 12 layers in total. It can be recognized that the number of layers does not have a large influence on the EIS, which is valid for both types of final layers.
[0086] Plot B shows the EIS for a passivation layer 30 of 128CF (a cobalt-free trivalent chromium passivate for zinc and zinc-nickel deposits (12-15% Ni) of Coventya) (plot B1) and a passivation layer of IZ 264 CF (a conventional passivation chemistry of Dipsol Chemicals) (plot B2), both for a multilayered structure 21′ between 4 and 12 layers in total. It can be recognized that the type of passivation totally changes the behavior of EIS depending on the number of layers. This plot shows, for instance, that the mutual corrosion protection reinforcement of plating and passivation layer properties is best with 12 layers for 128CF and with 4 layers for IZ 264 CF. It shall be noted that other materials of other manufacturers may be applied as well.
[0087] Plot C shows the EIS for a passivation layer 30 of 128CF (plot C1) and a passivation layer of 264 (plot C2), both for a final layer 29 between a low and high proportion of Ni. It can be recognized that the type of passivation again has a strong impact on the behavior of EIS depending on the proportion of Ni in the final layer. Further, the affinity of passivation may be controlled by the final layer properties.
[0088] According to known methods, the current density is chosen as a compromise between all requirements of the electro-deposed coating and subsequent post-treatments such as passivation and sealer. By the method according to the present disclosure, however, it is possible to tailor the coating properties to all the different needs. In particular, the first layer 22 of the multilayered structure 21′ may be optimized for adhesion by use of a current density that optimizes nucleation and grain size. The subsequently formed intermediate layers 23-28 may be optimized for corrosion performance, nickel release and micro cracks. The final layer 29 may be optimized for ability to passivation and tribology (roughness).
[0089] In a practical embodiment a corrosion-protective coating of a steel-made hydraulic connector may be manufactured using rack plating in an acidic process as follows. A commercial zinc nickel plating bath is prepared according to the chemical supplier's specification and filled in an electro plating tank with solvable Nickel and Zinc anodes. Hydraulic connector steel parts are placed on a plating rack and cleaned by soak, electro cleaner and pickling (rinsing between each process step). The plating rack including the parts is put into the plating bath which is agitated by air injection and movement of the plating rack using a cathode rocker. First, a low current density (e.g. 0.5 A/dm.sup.2) is applied for 12 minutes followed by an alternating current density of 1 A/dm.sup.2 and 3 (or up to, but preferably less than 5) A/dm.sup.2 for 6 minutes and 1.5 minutes, respectively, until a total number of 6 layers is plated. The final zinc nickel layer is plated by a current density of 0.8 A/dm.sup.2 for 9 minutes. After-treatment of the parts is done by acid pre-dip using diluted hydrochloric acid and followed by chromium(III)-based passivation. After rinsing a final layer of a mineral-organic sealer is applied by dip-coating and drying with hot air (e.g. at 80° C.).
[0090] The embodiments described above control the current density to provide a metallic article having an alternating proportion of a second component (e.g. Ni) in addition to Zn. In other embodiments, the control of the current density may be used to provide a metallic article having an alternating corrosion potential and/or an alternating grain size and/or an alternating grain orientation, in addition to or instead of the alternating proportion of the second component, in the layers of the multilayered structure. For instance, in a barrel plating approach using the same electrolyte as mentioned above a lower current density difference between high (1.2 A/dm.sup.2) and low (0.8 A/dm.sup.2) current density may be used in an acidic process. In this case, the difference in Nickel incorporation between the layers is not significant. However, the corrosion potential or nobility of the layers differ. This can be easily visualized by cross-sectioning and staining using mild oxidizing agents (e.g. diluted nitric acid in ethanol solution (1-2%)). The intensity of colorization depends on corrosion potential and results in distinguishable layers of different color.
[0091] In another embodiment of an acidic process using barrel plating, e.g. by use of a single anode, the current density may be alternated between approximately 0.4 A/dm.sup.2 and 0.6 A/dm.sup.2. In another embodiment of an alkaline process using rack plating, e.g. by use of an insoluble steel anode, the current density may be alternated between approximately (preferably slightly less than) 2 A/dm.sup.2 and 4 A/dm.sup.2. In still another embodiment of an alkaline process using barrel plating, e.g. by use of an insoluble steel anode, the current density may be alternated between approximately 0.4 A/dm.sup.2 and 1.1 A/dm.sup.2.
[0092] Generally, different aqueous electrolytes may be used in the bath to influence the sensitivity to the incorporation of the second component into the layers. The different aqueous electrolytes further influences the formation of the grain size and/or grain orientation.
[0093]
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[0095] In summary, the present disclosure presents an electrochemical process for forming a structured layer of zinc alloy layers. During the plating process, low to medium current densities are alternated with high current densities. The change intervals take place in the minute range and lead to a structured zinc alloy layer comprising individual layers in the micrometer range. The individual layers differ, among other things, in their chemical composition. By proper selection of the process parameters, the structured layer exhibits a corrosion performance that is equal to or better than that of an unstructured layer.
[0096] The disclosed process provides an enhanced corrosion performance, even after deformation (including crimping, bending, pressing, etc.) of the metallic article. The corrosion resistance of the (micro-) lamellar layer after deformation is significantly better than that of the monolithic layers commonly used today.
[0097] Further, the modulated direct current deposition of zinc alloy layers can be done in an economically advantageous and less complex process, optionally including post-treatment with passivation and sealing. Other advantageous effects of the laminar microstructure on layer properties such as assembly behavior, alloy element ion release or tribology. Even a process acceleration may be achieved.
[0098] Thus, the foregoing discussion discloses and describes merely exemplary embodiments of the present disclosure. As will be understood by those skilled in the art, the present disclosure may be embodied in other specific forms without departing from the spirit or essential characteristics thereof. Accordingly, the disclosure of the present disclosure is intended to be illustrative, but not limiting of the scope of the disclosure, as well as other claims. The disclosure, including any readily discernible variants of the teachings herein, defines, in part, the scope of the foregoing claim terminology such that no inventive subject matter is dedicated to the public.
[0099] In the claims, the word “comprising” does not exclude other elements or steps, and the indefinite article “a” or “an” does not exclude a plurality. A single element or other unit may fulfill the functions of several items recited in the claims. The mere fact that certain measures are recited in mutually different dependent claims does not indicate that a combination of these measures cannot be used to advantage.