METHOD FOR PRODUCING A SENSOR ELEMENT BY MEANS OF LASER STRUCTURING

Abstract

In order to produce accurate sensor element in a simple way, the invention provides a method for producing a sensor element (10) for a pressure or force sensor, comprising the steps:

a) providing a component (13) to be deformed,

c) applying to the component (13) a sensor function and contact layer (24) consisting of a material with a k-factor between 2 and 10,

d) planar ablation of the material of the sensor function and contact layer (24) by means of a laser, in such a manner that strain gauges (44) with a resistance structure with a meandering shape and contact pads (46.1, 46.2, 46.3, 46.4) remain standing,

wherein, for ablating the material, laser pulses from the group of laser pulses comprising:

laser pulses in the sub-ps range,

laser pulses from a broadband laser source (28) with a wavelength bandwidth of 10 nm to 70 nm

laser pulses from a broadband laser source (28) with a fundamental wavelength and a wavelength bandwidth of at least 1%, preferably at least 2%, most preferably at least 3% of the fundamental wavelength,

laser pulses compressed by a pulse compression process, and

laser pulses conducted through a hollow-core fiber.

are used.

Claims

1. A method for producing a sensor element (10) for a pressure or force sensor, comprising the steps: a) providing a component (13) to be deformed, c) applying to the component (13) a sensor function and contact layer (24) consisting of a material with a k-factor between 2 and 10, d) planar ablation of the material of the sensor function and contact layer (24) by means of a laser, in such a manner that strain gauges (44) with a resistance structure with a meandering shape and contact pads (46.1, 46.2, 46.3, 46.4) remain standing, wherein, for ablating the material, laser pulses from the group of laser pulses comprising: laser pulses in the sub-ps range, laser pulses from a broadband laser source (28) with a wavelength bandwidth of 10 nm to 70 nm laser pulses from a broadband laser source (28) with a fundamental wavelength and a wavelength bandwidth of at least 1%, preferably at least 2%, most preferably at least 3% of the fundamental wavelength, laser pulses compressed by a pulse compression process, and laser pulses conducted through a hollow-core fiber. are used.

2. The method according to claim 1, characterized in that step d) includes: ablation of the material in such a manner that the surface area occupied by the contact pads (46.1, 46.2, 46.3, 46.4) is equal to or smaller than the resistance structure surface area situated within an outer peripheral line around the resistance structure.

3. The method according to claim 1 or 2, characterized in that step d) includes: ablation of the material in such a manner that conductive paths (40) with a meandering shape, which form resistances (R1-R4) of the resistance structure with a meandering shape, have a width of less than 100 μm.

4. The method according to any one of the preceding claims, characterized in that step d) includes: ablation of material for producing a provisional resistance of the resistance structure, measuring the electrical resistance of the provisional resistance and further ablation of material from the provisional resistance if the measured electrical resistance is lower than a target resistance, and stopping the ablation of material if the measured electrical resistance is equal to or greater than the target resistance.

5. The method according to any one of the preceding claims, characterized in that step a) includes: providing a metallic substrate (16) or a steel substrate and producing the component (13) from the metallic substrate (16) or the steel substrate.

6. The method according to any one of the preceding claims, characterized by the step to be carried out between step a) and step c): b) applying an electrically insulating insulation layer (22) to the component (13), wherein step c) includes: applying the sensor function and contact layer (24) to the electrically insulating insulation layer (22) covering the component (13).

7. The method according to claim 6, characterized in that step d) includes: use of laser pulses with a pulse length τ.sub.p, wherein ${\tau }_p\le \frac{2.Math..Math.\mathrm{hn}}{c_0}$ wherein τ.sub.p the pulse duration h the layer thickness of the insulator layer c.sub.0 the speed of light in vacuum n the refractive index.

8. The method according to any one of the preceding claims, characterized in that step d) includes: ablation of the material between the edge of the component (13) and the material structure that remains standing and contains the resistance structure and the contact pads (46.1, 46.2, 46.3, 46.4), in such a manner that an electrical high-voltage dielectric strength of at least 50 VAC, preferably at least 100 VAC, more particularly at least 500 to 1000 VAC, is provided between the material structure that remains standing and the edge.

9. The method according to any one of the preceding claims, characterized in that step d) includes: use of an fs laser source (28) with a power of 100-300 nJ, a wavelength of 480 nm to 1500 nm, in particular 800 nm, pulse widths of 5 fs to 300 fs, in particular 10 to 100 fs, more particularly 30 fs, and a bandwidth between 10 nm and 70 nm.

10. The method according to any one of the preceding claims, characterized in that step c) includes: applying NiCr or NiCr and Ni or TiON as a material for forming the sensor function and contact layer (24).

11. The method according to any one of the preceding claims, characterized in that step d) includes: scanning the surface to be ablated with such a speed that step d) is carried out in less than 1 second.

12. The method according to any one of the preceding claims, characterized in that step a) includes: providing a membrane (14) as a component (13).

13. A sensor element (10), which can be obtained by means of a method according to any one of the preceding claims.

14. A sensor for measuring pressure or force, comprising a sensor element (10) according to claim 13.

Description

[0079] An exemplary embodiment will be explained in more detail below with reference to the attached drawings. In the drawings:

[0080] FIG. 1 shows a cross-section through a blank for a sensor element formed from a substrate with applied layers, in order to illustrate steps of a production method for the sensor element,

[0081] FIG. 2 shows an assembly for laser-structuring the blank from FIG. 1, for ablating material at the uppermost layer in a planar manner, in order thus to obtain a layout for a measuring bridge;

[0082] FIG. 3 shows a photograph of a target layout to be produced, for example, by laser structuring;

[0083] FIG. 4 is a block diagram for a controlled measuring system for producing the desired structure of FIG. 3 with the assembly of FIG. 2, without a separate adjusting step;

[0084] FIG. 5 shows the target layout of FIG. 3 with the designation of the resistances;

[0085] FIG. 6 shows a graph for determining the control parameters for the measuring system of FIG. 4;

[0086] FIG. 7 shows a conductor path with defects due to interference effects, obtained by laser ablation;

[0087] FIG. 8 shows a conductor path without defects (desired result), obtained by laser ablation;

[0088] FIG. 9 shows a graph for illustrating the interference effect that may result in the defects in the structure as shown in FIG. 7;

[0089] FIG. 10 shows a depiction for illustrating how the interference effect can be avoided.

[0090] As shown in FIG. 1, a blank 12 is first provided for producing a sensor element 10 for an embodiment of the method of interest herein. The blank has a component 13 to be deformed, in this case a membrane 14, which is formed from a substrate 16.

[0091] In principle, all components 13 and membranes 14 to be deformed, as they are also used in the prior art mentioned in the introduction, can be used for the method of interest herein. For example, the substrate 16 is made from a high-strength steel alloy (for example DIN material 1.452 or Inconel). For example, the membrane 14 is produced in such a way that material is ablated from one side of a solid body in order thus to obtain a blind opening 18 that is sealed on the other end of the opening by the membrane 14, wherein the blind opening 18 is surrounded by a ring wall 20. In other examples, cantilever beams (not shown) are provided as components (13) for force sensors. For example, a plurality of cantilever beams can be jointly processed on a wafer in a single step.

[0092] In the example of a membrane 14 presented in the Figures, an insulation layer 22 consisting of an electrically insulating material (e.g. SiO.sub.2) is applied by common processes, such as PVD or CVD, to the side of the membrane 14 opposite from the blind opening 18.

[0093] A sensor function and contact layer 24 is applied to the insulation layer 22, also by means of the aforementioned processes. A material with a k-factor between 2 and 10 is used for this purpose. NiCr or TiON are examples for such materials.

[0094] Reference is made below to FIG. 2.

[0095] The blank 10 is now processed by laser structuring, see FIG. 2.

[0096] For this purpose, a pulsed laser beam 26 from a laser source 28 is moved across the top surface of the membrane 14 by means of sufficiently well-known scanning devices 30, controlled by means of a control system 32, in such a way that the material of the sensor function and contact layer 24 is ablated in a planar manner in selected areas, wherein the material remains standing in other areas in order thus to produce from the sensor function and contact layer 24 a sensor function and contact structure 36 in accordance with a predefined target layout.

[0097] An example for the target layout of the sensor function and contact structure 36 is presented in FIG. 3.

[0098] In particular, a measuring bridge 38 with four resistances R1, R2, R3, R4 is produced. Each resistance R1-R4 is formed by conductor paths 40 from the material of the sensor function and contact layer 24, wherein the conductor paths 40 in the area of the resistances R1-R4 have a meandering shape 42. A part of the resistances R2, R4 serves as a strain gauge 44 for detecting a deformation of the component 13, for example that of the membrane 14.

[0099] Further, the sensor function and contact structure 36 has first to fourth contact pads 46.1, 46.2, 46.3, 46.4.

[0100] At a given thickness, the electrical resistance of the resistances R1-R4 is determined, in particular, by the width of the conductor path 40 that were left standing.

[0101] FIG. 4 presents an electronic measuring system 50 with which the material ablation by the laser structuring assembly 48 shown in FIG. 4 is controlled in such a way that resistances R1, R2, R3, R4 with a desired electrical resistance are produced.

[0102] This is based on, as target values, the resistance of the measuring bridge 38 R.sub.bridge (e.g. 6 kOhm) and as low an offset resistance as possible R.sub.offset=0 Ohm. Now, a broader conductor path 40 is first produced as a provisional resistance by laser structuring, and then, or simultaneously, the bridge resistance R.sub.bridge is measured. If the target values are not yet obtained in this way, more material is ablated.

[0103] FIG. 5 shows the designation of the individual resistances R1-R4; in FIG. 6, the definition of the control parameters is illustrated in a graph.

[0104] A pulsed laser source is used as a laser source 28.

[0105] FIG. 7 shows a problem that was discovered during the production of conductor paths 40 by means of laser ablation with pulsed laser sources 28.

[0106] The conductor path 40 according to FIG. 7, which corresponds to the ideal conductor path 40 of FIG. 8 with respect to its size, has been produced with a laser source 28 with a pulse duration in the picosecond range with a very small bandwidth at a wavelength of 1030 nm. As indicated in FIG. 9, in connection with an absorption of the laser radiation 26 in the sensor function and contact layer 24, there are conditions, depending on the thickness layer, under which destructive interferences may occur. Strips 52, where the conductor paths 40 are interrupted, are produced by destructive interference.

[0107] If, however, the pulse duration is reduced and/or the bandwidth increased, these interference conditions can be avoided, as is indicated in FIG. 8. This conductor path 40 of FIG. 8 has been produced with a pulse duration of 30 to 50 fs and a bandwidth of 55 nm at a wavelength of 800 nm by planar ablation of the adjacent material.

[0108] The conditions under which destructive interference can be avoided are explained in more detail below with reference to the illustration in FIG. 10. It shows the substrate 16, for example steel, the insulation layer 22, for example SiO.sub.2, and the sensor function and contact layer 24 together with the incident laser beam 26.

[0109] Interference can be avoided by means of a short pulse duration.

[0110] In this case, the pulse length in space should be shorter than the distance covered in the insulation layer 22.

[0111] Accordingly, the following applies for the pulse duration

[00007]${\tau }_p\le \frac{2.Math..Math.\mathrm{hm}}{c_0}$

[0112] wherein

[0113] τ.sub.p the pulse duration

[0114] h the layer thickness of the insulator layer

[0115] c.sub.0 the speed of light in vacuum

[0116] n the refractive index.

[0117] If, for example h=6 μm, n≈1.45 (SiO.sub.2), then

[00008]${\tau }_p\le \frac{2.Math.6.Math.{10}^{-6}.Math..Math.m.Math.1.45}{3.Math.{10}^{8.Math.}.Math.m.Math.\text{/}.Math.s}=58.Math..Math.\mathrm{fs}.$

[0118] Depending on the layer thickness, destructive interference effects can be avoided with laser pulses in the sub-picosecond range.

[0119] Another way of avoiding the interference effects is the use of a more broadband laser source. Alternatively or additionally, a pulse compression process may be carried out, or a hollow-core fiber can be used for conducting the laser beam 26.

[0120] Accordingly, the material of the sensor function and contact layer 24 is ablated in such a planar manner that only the sensor function and contact structure 36 with the target layout structure shown in FIGS. 3 and 5 remains standing. In this case, enough room is left towards the edge of the component 13, e.g. the membrane 14, so that a desired dielectric strength is provided with respect to the mostly metallic bordering.

[0121] For this purpose, the contact pads 46.1-46.4, in particular, are configured with a correspondingly small size. Their size corresponds at most to the surface area covered in total by the resistances R1-R4.

LIST OF REFERENCE NUMERALS

[0122] 10 Sensor element

[0123] 12 Blank

[0124] 13 Component

[0125] 14 Membrane

[0126] 16 Substrate

[0127] 18 Blind opening

[0128] 20 Ring wall

[0129] 22 Insulation layer

[0130] 24 Sensor function and contact layer

[0131] 26 Laser beam

[0132] 28 Laser source

[0133] 30 Scanning device

[0134] 32 Control system

[0135] 34 Top surface

[0136] 36 Sensor function and contact structure

[0137] 38 Measuring bridge

[0138] 40 Conductor path

[0139] 42 Meandering shape

[0140] 44 Strain gauge

[0141] 46.1 First contact pad

[0142] 46.2 Second contact pad

[0143] 46.3 Third contact pad

[0144] 46.4 Fourth contact pad

[0145] 48 Laser structuring assembly

[0146] 50 Electronic measuring system

[0147] 52 Strip with break

[0148] R1 First resistance

[0149] R2 Second resistance

[0150] R3 Third resistance

[0151] R4 Fourth resistance