Method and device for drying a fluid film applied to a substrate
09851144 · 2017-12-26
Assignee
Inventors
Cpc classification
F26B3/18
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
F26B13/10
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
International classification
F26B3/20
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
F26B13/10
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
Abstract
A method for drying a fluid film, which is applied to a surface of a substrate and includes a vaporizable liquid, includes following steps: transporting the substrate on a transport surface of a transport device along a transport direction through a drying device; vaporizing the liquid by way of a heat source having a heating surface, wherein the heating surface is disposed at a distance of 0.1 mm to 5.0 mm opposite to a surface of the substrate; and removing a vaporized liquid in a direction of the heat source.
Claims
1. A method for drying a fluid film, which is applied to a surface of a substrate and includes a vaporizable liquid, comprising following steps: transporting the substrate on a transport surface of a transport device along a transport direction through a drying device; vaporizing the liquid by way of a heat source having a heating surface, wherein the heating surface is disposed at a distance of 0.1 mm to 15.0 mm opposite the surface of the substrate, wherein a heat is essentially transmitted from the heating surface to the fluid film by way of direct heat conduction; removing a vaporized liquid in a direction of the heat source; and heating the transport surface by way of an additional heat source, wherein in the step of vaporizing the liquid by way of the heat source, the heating surface has a first temperature T.sub.G, and the first temperature T.sub.G of the heating surface is controlled as a function of an interface temperature T.sub.I of the fluid film, wherein the interface temperature T.sub.I of the fluid film is detected by an infrared measuring device, and wherein in the step of heating the transport surface, the transport surface has a second temperature T.sub.H, and the second temperature T.sub.H of the transport surface generated by the additional heat source is controlled as the function of the interface temperature T.sub.I of the fluid film.
2. A method according to claim 1, wherein the first temperature T.sub.G of the heating surface is controlled in a range of 80° C. to 200° C.
3. A method according to claim 1, wherein the second temperature T.sub.H of the transport surface is controlled so that a following relationship is met:
T.sub.H=T.sub.I+ΔT, where T.sub.I ranges from 5° C. to 40° C. and ΔT ranges from 5 to 10° C.
4. A method according to claim 1, wherein in the step of vaporizing the liquid, the liquid is carried out in a nitrogen or carbon dioxide atmosphere.
5. A method according to claim 1, wherein in the step of vaporizing the liquid, the heating surface facing the substrate is disposed at a distance of 0.2 mm to 5.0 mm opposite the surface of the substrate.
6. A method according to claim 1, wherein the second temperature T.sub.H of the transport surface is controlled so as to always be lower than the first temperature T.sub.G of the heating surface.
7. A method according to claim 1, wherein a temperature difference between the first temperature T.sub.G of the heating surface and the second temperature T.sub.H of the transport surface is controlled so that the temperature difference between the first temperature T.sub.G of the heating surface and the second temperature T.sub.H of the transport surface changes along the transport direction.
8. A method according to claim 1, wherein one heat source through which a flow is possible is used as the heat source, and in the step of removing the vaporized liquid, the vaporized liquid is removed through the one heat source.
9. A method according to claim 1, wherein in the step of vaporizing the liquid, an electrical heating source is used as the heat source.
10. A method according to claim 1, wherein in the step of vaporizing the liquid, a heat exchanger is used as the heat source.
11. A method according to claim 1, wherein in the step of transporting the substrate, the transport device including at least one rotatable roller, a lateral face of which forms the transport surface, is used.
12. A device for drying a fluid film, which is applied to a surface of a substrate and includes a vaporizable liquid, comprising: a transport device for transporting the substrate on a transport surface along a transport direction; a heat source that is provided opposite to the substrate and has a heating surface, which is disposed at a distance of 0.1 to 15.0 mm opposite the surface of the substrate so that a heat is essentially transmitted from the heating surface to the fluid film by way of direct heat conduction; and a device for removing a vaporized liquid in a direction of the heat source, wherein a first controlling device is provided for controlling a first temperature T.sub.G generated by the heating surface as a function of an interface temperature T.sub.I of the fluid film, wherein the interface temperature T.sub.I of the fluid film is detected by an infrared measuring device, and wherein a second controlling device is provided for controlling a second temperature T.sub.H of the transport surface as the function of the interface temperature T.sub.I of the fluid film.
13. The device according to claim 12, wherein an additional heat source is provided for heating the transport surface.
14. A device according to claim 12, wherein a temperature difference between the first temperature T.sub.G of the heating surface and the second temperature T.sub.H of the transport surface is controlled by way of the first controlling device and/or the second controlling device so that the temperature difference between the first temperature T.sub.G of the heating surface and the second temperature T.sub.H of the transport surface changes along the transport direction.
15. A device according claim 12, wherein a device for rinsing a housing surrounding the transport device with a nitrogen or carbon dioxide atmosphere, is provided.
16. A device according to claim 12, wherein the heating surface facing the substrate is disposed at a distance of 0.2 mm to 5.0 mm opposite the substrate surface.
17. A device according to claim 12, wherein one heat source through which a flow is possible is used as the heat source so that the vaporized liquid can be removed through the one heat source.
18. A device according to claim 12, wherein the heat source is an electrical heating source.
19. A device according to claim 12, wherein the heat source is a heat exchanger.
20. A device according to claim 12, wherein the transport device comprises a rotatable roller, a lateral face of which forms the transport surface.
Description
(1) The invention will be described in more detail hereafter based on the drawings: In the drawings:
(2)
(3)
(4)
(5)
(6)
(7)
(8)
(9)
(10)
(11)
(12) The theoretical principles of the method according to the invention will be briefly described hereafter based on one-dimensional equations for the diffuse mass transport as a function of the temperature.
(13) The variables used in the following equations are essentially apparent from
(14) The temperature gradient in the air gap above the interface of the fluid film fulfills the energy equation, which can be stated as follows for the gas phase:
(15)
(16) Upon solving this diffusion equation, the following general solution is obtained:
(17)
where c.sub.1 and c.sub.2 represent two constants of integration still to be defined. These can be determined via suitable boundary values. These boundary values are as follows:
(18)
If the above equations are solved by inserting the boundary values according to c.sub.1 and c.sub.2, values are obtained for these variables which allow the temperature profile in the gas phase to be indicated as follows:
(19)
(20) For y=0, T=T.sub.1 is obtained. This allows the interface temperature T.sub.1, which is to say the temperature on the free surface of the fluid film, to be calculated as follows:
(21)
(22) The mass diffusion rate per unit area can be calculated as follows based on the temperature gradient that is present on the free surface:
(23)
(24) The drying time for the material to be coated can be calculated as follows:
(25)
(26) Using the above set of equations, the one-dimensional diffusion heat transfer problem and the problem of the associated release of mass and of the mass transport can be solved analytically.
(27) Using the boundary values described below, the mass diffusion rate of the vaporized liquid and the drying time were calculated. The calculation was made under the following assumptions:
H=300 μm, h=10 μm, δ.sub.G=300 μm
f=0.2, T.sub.G=350 K, T.sub.H=295 K
(28) The following material properties were assumed to be constant, despite the temperature changes:
μ.sub.G=1.8×10.sup.−5 kg/(ms), λ=0.024 W/(mK), C.sub.P=1.012 KJ/(KgK)
λ.sub.L=0.6 W/(mK), ρ.sub.L=1000 kg/m.sup.3, Δh.sub.LH=2260 KJ/Kg λ.sub.S=0.12 W/(mK)
(29) The drying of the fluid film according to the invention is essentially determined by controlling the second temperature T.sub.H on the transport surface and by the first temperature T.sub.G of the heat source. The heat source is provided at a distance δ.sub.G from the interface of the fluid film facing the gas phase.
(30)
(31) As is apparent in particular from
(32) As is apparent in particular from
(33)
(34) The drying device 7 comprises an additional housing 12. The additional housing 12 is provided with suction devices 14, which are used to suction off a liquid vapor escaping from the fluid film F.
(35) As can be seen in particular in combination with
(36) The device according to the invention shown in
(37)
(38) The additional drying device 15 includes heating elements 17 in the transport direction T, which can be plate-shaped resistance heating elements disposed behind one another in the transport direction T. In this embodiment, the heating elements 17 form an essentially closed heating surface H and are disposed at a distance δ.sub.G of 2 to 10 mm from a substrate surface. The additional drying device 15 thus includes a rectangular channel K having the height δ.sub.G, through which the substrate 3 is guided in the transport direction T.
(39) At the upstream end of the additional drying device 15, air L is suctioned into the channel K by way of the suction device 14 and moved counter to the transport direction T in the direction of the suction device 14 in a counter flow. A flow velocity is 30 cm/s to 3 m/s, for example.
(40) An additional transport surface 18 of the additional drying device 15 is also designed to be planar here. It can likewise be designed to be heatable (not shown here).
LIST OF REFERENCE NUMERALS
(41) 1 housing 2 supply roller 3 substrate 4a, 4b tension pulley 5 transport roller 6 transport surface 7 drying device 8 slotted nozzle tool 9 additional tension pulley 10 roller 11 roller cleaning device 12 additional housing 13 heat source 14 suction device 15 additional drying device 16 driven roller 17 heating element 18 additional transport surface δ.sub.G distance F fluid film G heating surface I interface L air T transport device