GAS DIFFUSION LAYER, METHOD FOR MAKING THE SAME AND PHOTOELECTRODE

Abstract

Method for making a gas diffusion layer for an electrode, the method including processing quartz wool with water in a blender to form a suspension, filtering the suspension to remove water and contaminants, to form a cake of entangled quartz fibres, annealing the cake of entangled quartz fibres without complete melting of the fibres to obtain a porous quartz felt having pore size greater than 1 μm and coating the porous quartz felt with a conductive material. Gas diffusion layer for an electrode and photoelectrode including the gas diffusion layer.

Claims

1. Method for making a gas diffusion layer for an electrode, the method comprising: processing quartz wool with water in a blender to form a suspension; filtering the suspension to remove water and contaminants, to form a cake of entangled quartz fibres; annealing the cake of the entangled quartz fibres without complete melting of the entangled quartz fibres to obtain a porous quartz felt having pore size greater than 1 μm; coating the porous quartz felt with a conductive material.

2. The method according to claim 1, wherein the porous quartz felt has a transmittance equal to or greater than 30%, at wavelength between 400 and 800 nm, and the conductive material is a transparent conductive material.

3. The method according to claim 1, wherein the cake of entangled quartz fibres is pressed before annealing.

4. The method according to claim 1, wherein the porous quartz felt has a reflectance equal to or greater than 20%, at wavelength between 400 and 800 nm and for a resistivity equal to or less than 100Ω/sq.

5. The method according to claim 1, wherein the quartz wool has a fibre diameter equal to or greater than 1 μm and equal to or smaller than 15 μm.

6. The method according to claim 1, wherein an annealing plateau is between 1250° C. and 1350° C. and an annealing plateau time is between 5 minutes and 3 hours.

7. The method according to claim 1, wherein the entangled quartz fibres have an average length equal to or greater than 50 microns and equal to or smaller than 5 millimetres.

8. The method according to claim 1, wherein a porosity of the porous quartz felt is equal to or greater than 10% and equal to or smaller than 90%.

9. Gas diffusion layer for an electrode comprising partially melted entangled quartz fibres having pore size greater than 1 μm coated with a conductive material.

10. The gas diffusion layer according to claim 9, wherein the gas diffusion layer has a transmittance equal to or greater than 15% at wavelength between 400 nm and 800 nm.

11. The gas diffusion layer according to claim 9, wherein the gas diffusion layer has a sheet resistance equal to or smaller than 40 Ω/sq.

12. The gas diffusion layer according to claim 9, wherein a porosity of the gas diffusion layer is equal to or greater than 10% and equal to or smaller than 90%.

13. The gas diffusion layer according to claim 9, wherein the conductive material is fluorine doped tin oxide.

14. Photoelectrode comprising the gas diffusion layer according to claim 9.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0043] Features, advantages, and technical and industrial significance of exemplary embodiments of the disclosure will be described below with reference to the accompanying drawings, in which like signs denote like elements, and wherein:

[0044] FIG. 1 shows a flow chart of the method according to embodiments of the present disclosure.

[0045] FIG. 2 shows the evolution of thickness of the cake as function of the quartz fibre content and the blending time.

[0046] FIGS. 3 and 4 respectively show the transmittance and the reflectance of porous quartz felts as a function of fibre content for a blending time of 30 s and a given annealing step.

[0047] FIG. 5 shows the transmittance and the reflectance of porous quartz felts as a function of fibre content for various blending time and a given annealing step.

[0048] FIG. 6 shows the sheet resistance of the porous quartz felt obtained after annealing the samples for various blending time and given annealing step.

[0049] FIG. 7 shows a comparison of the transmittance before and after coating.

[0050] FIG. 8 shows a set-up for depositing WSe.sub.2 on the gas diffusion layer.

[0051] FIG. 9 shows a scanning electron microscope image of photo-absorber and Pt coated on the transparent gas diffusion layer.

[0052] FIG. 10 shows the photochemical performance of the photo-absorber and Pt coated transparent gas diffusion layer.

[0053] FIG. 11 shows the density of current as a function of time for different gas diffusion layers.

[0054] FIG. 12 shows scanning electron microscope images of a porous quartz felt coated with silver nanowires.

[0055] FIG. 13 shows a EDX scanning electron microscope image of the porous quartz felt showing the repartition of silver on the porous quartz felt.

[0056] FIGS. 14 and 15 respectively show the transmittance and the reflectance of porous quartz felts coated with silver nanowires.

DETAILED DESCRIPTION OF EMBODIMENTS

[0057] FIG. 1 shows a flow chart of a method 100 for making a gas diffusion layer for an electrode.

[0058] The method 100 includes a step of processing 102 quartz wool with water in a blender to form a suspension.

[0059] As non-limiting example, quartz wool with a fibre diameter between 1 to 15 μm (micrometre) is suitable. Fibre diameter between 1 to 5 μm is also suitable.

[0060] For example, the blender may be a PHILIPS Viva Collection HR3556/02 (900 W).

[0061] Sample 1: 10 mg of quartz wool have been dispersed in 20 mL (millilitre) of distilled water and blended for 30 s (second).

[0062] Sample 2: 10 mg of quartz wool have been dispersed in 20 mL of distilled water and blended for 600 s.

[0063] Sample 1 and Sample 2 were then drop-casted onto a glass slide. The fibres length has been measured using a Nikon Eclipse LV100ND optical microscope, objective ×5, and are as follow:

[0064] Sample 1: fibre length=256±176 μm.

[0065] Sample 2: fibre length=122±94 μm.

[0066] The method 100 includes a step of filtering 104 the suspension to remove water and contaminants, to form a cake of entangled quartz fibres. The filtering step 104 also allows compacting of the fibres and forming an entangled fibres cake.

[0067] The filtering step 104 the suspension is made by passing the suspension through a porous filter made of cellulose (0.45 μm), contaminants and particles smaller than 0.45 μm are removed,

[0068] FIG. 2 shows the influence of the content of quartz wool on the density of the cake. FIG. 2 shows samples at 15, 30 and 50 mg of quartz wool dispersed in 35 mL of distilled water and blended for 10 seconds (A) and 30 seconds (B). The Y axis corresponds to thickness (in μm) of the porous quartz felt obtained after filtering.

[0069] The method 100 includes a step of annealing 108 the cake of entangled quartz fibres without complete melting of the fibres to obtain a porous quartz felt having pore size greater than 1 μm.

[0070] Measurement of transmittance and reflectance have been carried out on the porous quartz felt obtained after annealing the samples blended for 30 s and are reported in FIGS. 3 and 4, wherein the X axis is the wavelength (in is nm) and the Y axis is the transmittance (in %) and the reflectance (in %), respectively,

[0071] FIG. 5 gives values of both transmittance (hatched) and reflectance (black) for 10 s (A), 30 s (B), 60 s (C) and 600 s (D) for annealing plateau temperature at 1350° C. (Celsius) for 2 h (hour).

[0072] Transmittance and reflectance are measure with UV-vis with integrating sphere.

[0073] Transmittance and reflectance are both beneficial, transmittance being favoured over reflectance.

[0074] FIG. 6 gives values of the sheet resistance of the porous quartz felt (in Ω/sq Y axis) obtained after annealing the samples blended for 10 s (A), 30 s (B), 60 s (C) and 600 s (D) and annealed at 1350° C. for 2 h. The sheet resistance is measure with a four point probe. Commercial fluorine-doped tin oxide exhibits values around 13 Ω/sq.

[0075] The method 100 includes a step of coating 110 the porous quartz felt with a conductive material so as to obtain a gas diffusion layer.

[0076] FIG. 7 shows the change in transmittance (in %-Y axis) as a function of wavelength (in nm) after coating the samples of FIG. 3 with a fluorine doped tin oxide deposited by Chemical Vapor Deposition so as to obtain a transparent gas diffusion layer. The coating is homogeneous and has a thickness of 100 nm.

[0077] The transparent gas diffusion layer is suitable as a support for photo-absorbing materials.

[0078] The transparent gas diffusion layer of Sample 1 was coated in the device 10 as shown on FIG. 8 with tungsten selenide nanoflakes under the following conditions:

[0079] Working electrode 14 (cathode): transparent gas diffusion layer.

[0080] Counter electrode 10 (anode): fluorine tin oxide-coated monolithic glass (no deposition observed).

[0081] Electrolyte: WSe.sub.2 exfoliated flakes in N-Methyl-2-pyrrolidone is (NMP).

[0082] Potential: 10 V applied for 1 hr.

[0083] The set-up is illustrated in FIG. 8 where both electrodes are immersed in a vessel 16 containing the electrolyte.

[0084] FIG. 9 shows a scanning electron microscope image of the nanoflakes of WSe.sub.2 photo-absorber on the transparent gas diffusion layer.

[0085] Pt catalyst has been deposited by photoelectrodeposition.

[0086] Working electrode: transparent gas diffusion layer coated with WSe.sub.2 and Pt coating.

[0087] Counter electrode: Pt wire

[0088] Reference electrode: Ag/AgCl

[0089] Electrolyte: 1 mM H.sub.2PtC1.sub.6 at pH 0.5

[0090] Charge: 14mC

[0091] The photochemical properties of the transparent gas diffusion layer coated with WSe.sub.2 and Pt were measured under the following conditions: 1M H.sub.2SO.sub.4; 1 Sun, Peek cell, reference electrode: Pt. The results are shown in FIG. 10, Y axis being the current density expressed in mA.cm.sup.−2 and X axis being the potential expressed in V vs Ag/AgCl. By scanning the voltage, a current can be measured, which confirms the conductivity of the electrode. Moreover, a periodic light illumination (2 seconds light on/1 second light off) leads to a periodic change of current: the current increases when the sample is illuminated. This confirms that the gas diffusion layer with the photoabsorber and the platinum catalyst responds to a light illumination and may be used as a photoelectrode.

[0092] FIG. 11 shows a measure of the current density (in mA/cm.sup.2) as a function of time (in seconds) for different gas diffusion layer. As can been seen, when a voltage of 1.8 V (Volt) is applied, the gas diffusion layer shows 0 current density, whereas a titanium mesh shows a current density up to 0.01 mA/cm.sup.2 (milliampere per square centimetre). Although small, the current density shows a potential degradation due to oxidation of the titanium mesh. As can be seen, the gas diffusion layer does not exhibit such current density and is therefore stable in regard to the oxidation.

[0093] Silver nanowires coated quartz felt have also been tested.

[0094] The porous quartz felt is the same as Sample 1. The porous quartz felt was suspended 1 cm over a hotplate heated to 80° C. 100 μL of a 120-150 nm silver nanowire solution (0.5 mg/mL, Sigma Aldrich) was deposited onto the felt in 10 μL aliquots by drop-casting and allowed to dry.

[0095] FIGS. 12 and 13 show pictures taken of the porous quartz felt coated with silver nanowires with a scanning electron microscope, the FIG. 13 showing the distribution of the silver nanowires on the porous quartz felt.

[0096] The sheet resistance was measured to be 20-50 Ω/sq.

[0097] FIG. 13 (X axis being wavelength in nm and Y axis being the transmittance in %) and 14 (X axis being wavelength in nm and Y axis being the reflectance in %) show respectively that the average transmittance of the coated porous quartz felt is around 43.3% and the average reflectance is around 32.6%.

[0098] Throughout the description, including the claims, the term “comprising a” should be understood as being synonymous with “comprising at least one” unless otherwise stated. In addition, any range set forth in the description, including the claims should be understood as including its end value(s) unless otherwise stated. Specific values for described elements should be understood to be within accepted manufacturing or industry tolerances known to one of skill in the art, and any use of the terms “substantially” and/or “approximately” and/or “generally” should be understood to mean falling within such accepted tolerances.

[0099] Where any standards of national, international, or other standards body are referenced (e.g., ISO, etc.), such references are intended to refer to the standard as defined by the national or international standards body as of the priority date of the present specification. Any subsequent substantive changes to such standards are not intended to modify the scope and/or definitions of the present disclosure and/or claims.

[0100] Although the present disclosure herein has been described with reference to particular embodiments, it is to be understood that these embodiments are merely illustrative of the principles and applications of the is present disclosure.

[0101] It is intended that the specification and examples be considered as exemplary only, with a true scope of the disclosure being indicated by the following claims.