SEMICONDUCTOR INSPECTION APPARATUS AND SEMICONDUCTOR INSPECTION METHOD USING THE SAME

Abstract

Disclosed are semiconductor inspection apparatuses and methods. The semiconductor inspection apparatus comprises a stage that supports a semiconductor device, a first column that irradiates a first electron beam toward the semiconductor device on the stage, a second column that irradiates a second electron beam toward the semiconductor device, and a detector that detects a secondary electron generated by the second electron beam. The first column is disposed to make a first angle with a top surface of the semiconductor device. The second column is disposed to make a second angle with the top surface of the semiconductor device. The first angle and the second angle are different from each other.

Claims

1. A semiconductor inspection apparatus, comprising: a stage configured to support a semiconductor device; a first column configured to irradiate a first electron beam toward the semiconductor device on the stage; a second column configured to irradiate a second electron beam toward the semiconductor device; and a detector configured to detect a secondary electron generated by the second electron beam, wherein the first column is disposed to cause the first electron beam to form a first angle with a top surface of the semiconductor device, wherein the second column is disposed to cause the second electron beam to form a second angle with the top surface of the semiconductor device, and wherein the first angle and the second angle are different from each other.

2. The semiconductor inspection apparatus of claim 1, wherein resolution of the second column is greater than resolution of the first column.

3. The semiconductor inspection apparatus of claim 1, wherein an axis of the first electron beam and an axis of the second electron beam intersect each other on the top surface of the semiconductor device or beneath the top surface of the semiconductor device.

4. The semiconductor inspection apparatus of claim 1, wherein the second angle is about 90°, and wherein the first angle is an acute angle.

5. The semiconductor inspection apparatus of claim 1, wherein the second column includes a deflector that controls an irradiation direction of the second electron beam.

6. A semiconductor inspection apparatus, comprising: a scanning electron microscope (SEM) assembly configured to irradiate an electron beam toward a semiconductor device; and a stage beneath the SEM assembly and configured to be movable in a horizontal direction relative to the SEM assembly, wherein the SEM assembly includes: a first column configured to obliquely irradiate a first electron beam on a top surface of the semiconductor device; and a second column configured to vertically irradiate a second electron beam on the top surface of the semiconductor device.

7. The semiconductor inspection apparatus of claim 6, further comprising a stage drive mechanism configured to drive the stage to move in a horizontal direction or a vertical direction.

8. The semiconductor inspection apparatus of claim 6, wherein the SEM assembly further includes a detector configured to detect a secondary electron generated by the second electron beam.

9. The semiconductor inspection apparatus of claim 8, wherein the SEM assembly further includes: a first column controller configured to control irradiation of the first electron beam from the first column; and a second column controller configured to control irradiation of the second electron beam from the second column.

10. The semiconductor inspection apparatus of claim 9, further comprising: an integrated controller configured to control the first column controller and the second column controller and use information about the detected secondary electron to form a contrast image; and a display configured to output the contrast image formed by the integrated controller.

11. The semiconductor inspection apparatus of claim 6, wherein the first column includes a deflector configured to control an irradiation direction of the first electron beam.

12. A semiconductor inspection method, comprising: placing a semiconductor device on a stage; irradiating a first electron beam on an electrode in a first inspection region of the semiconductor device; irradiating a second electron beam on the first inspection region of the semiconductor device; and detecting a secondary electron generated by the second electron beam and released from the first inspection region, wherein irradiating the first electron beam includes irradiating the first electron beam to make a first angle with a top surface of the semiconductor device, wherein irradiating the second electron beam includes irradiating the second electron beam to make a second angle with the top surface of the semiconductor device, and wherein the first angle and the second angle are different from each other.

13. The semiconductor inspection method of claim 12, wherein irradiating the first electron beam and irradiating the second electron beam are performed sequentially.

14. The semiconductor inspection method of claim 13, wherein, in irradiating the first electron beam, the stage that supports the semiconductor device is fixed to a first location, and wherein irradiating the second electron beam is performed in a state where the stage is fixed to the first location.

15. The semiconductor inspection method of claim 12, further comprising using the detected secondary electron to form a contrast image of the first inspection region.

16. The semiconductor inspection method of claim 12, further comprising: after detecting the secondary electron generated from the first inspection region, moving the stage; and after moving the stage, inspecting a second inspection region distinguished from the first inspection region.

17. The semiconductor inspection method of claim 12, wherein irradiating the first electron beam includes positively charging the electrode by allowing the first electron beam to have a secondary electron yield greater than 1.

18. The semiconductor inspection method of claim 12, wherein the electrode includes a gate contact, and wherein irradiating the first electron beam includes positively charging the gate contact to form a channel beneath a gate electrode.

19. The semiconductor inspection method of claim 12, wherein an axis of the first electron beam and an axis of the second electron beam intersect each other in the first inspection region.

20. The semiconductor inspection method of claim 12, wherein the second angle is about 90°, and wherein the first angle is an acute angle.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0014] FIG. 1 illustrates a simplified diagram showing a semiconductor inspection apparatus, according to some example embodiments of the present inventive concepts.

[0015] FIG. 2 illustrates a flow chart showing a semiconductor inspection method, according to some example embodiments of the present inventive concepts.

[0016] FIGS. 3 to 10 illustrate diagrams showing a semiconductor inspection method according to the flow chart of FIG. 2.

[0017] FIGS. 11 and 12 illustrate diagrams showing a semiconductor inspection method according to the flow chart of FIG. 2.

DETAIL DESCRIPTION

[0018] The following will now describe example embodiments of the present inventive concepts with reference to the accompanying drawings. Like reference numerals may indicate like components throughout the description.

[0019] FIG. 1 illustrates a simplified diagram showing a semiconductor inspection apparatus according to some example embodiments of the present inventive concepts.

[0020] Referring to FIG. 1, a semiconductor inspection apparatus A may be provided. The semiconductor inspection apparatus A may be a device to detect electrical defects of a semiconductor device. The semiconductor inspection apparatus A may include a vacuum chamber VC, a scanning electron microscope (SEM) assembly SEMA, a stage ST, a detector 5, a stage drive mechanism SA, a first column controller C1, a second column controller C2, a detector controller DC, an integrated controller TC, and a display D.

[0021] The vacuum chamber VC may provide an inspection space Vh. The inspection space Vh may maintain a vacuum state. There may be provided a vacuum pump (not shown) connected to the inspection space Vh. A semiconductor device may be disposed in the vacuum chamber VC. For example, the semiconductor device may be disposed on the stage ST in the vacuum chamber VC.

[0022] At least a portion of the SEM assembly SEMA may be positioned in the vacuum chamber VC. The SEM assembly SEMA may include a first column 1 and a second column 3.

[0023] The first column 1 may be a scanning electron microscope (SEM) column. The first column 1 may irradiate a first electron beam EB1 toward the semiconductor device on the stage ST. As the first column 1 irradiates the first electron beam EB1 toward the semiconductor device, the first column 1 may charge a conductor such as an electrode in the semiconductor device. For example, an electrode in the semiconductor device may be positively charged due to the irradiation of the first electron beam EB1 whose secondary electron yield is greater than 1. Alternatively, an electrode in the semiconductor device may be negatively charged due to the irradiation of the first electron beam EB1 whose secondary electron yield is less than 1. The first column 1 may include a condenser lens, an object lens, and a deflector. The first column 1 may make a first angle a with a top surface of the semiconductor device disposed on the stage ST. In FIG. 1, the top surface of the semiconductor device is represented by a dashed line. For example, the first column 1 may be disposed to allow the first electron beam EB1 irradiated therefrom to make the first angle a with the top surface of the semiconductor device. The first column 1 may have resolution less than that of the second column 3.

[0024] The second column 3 may be disposed spaced apart from the first column 1. The second column 3 may irradiate a second electron beam EB2 toward the semiconductor device on the stage ST. The second column 3 may be a scanning electron microscope (SEM) column. For example, an electrode of the semiconductor device charged with the first electron beam EB1 may be scanned with the second electron beam EB2 irradiated from the second column 3. The second column 3 may include a first condenser lens CL1, a second condenser lens CL2, an object lens OL, and a deflector DF. The deflector DF may control an irradiation angle of the second electron beam EB2. The second column 3 may make a second angle β with the top surface of the semiconductor device disposed on the stage ST. For example, the second column 3 may be disposed to allow the second electron beam EB2 irradiated therefrom to make the second angle β with the top surface of the semiconductor device. The second angle β may be different from the first angle α. For example, the second angle β may be about 90°, and the first angle α may be an acute angle. When the second angle β is a right angle, scanning may increase in accuracy. The first electron beam EB1 and the second electron beam EB2 may intersect each other on or beneath the top surface of the semiconductor device. A detailed description thereof will be further discussed below. The resolution of the second column 3 may be greater than that of the first column 1.

[0025] The stage ST may be positioned beneath the SEM assembly SEMA. The stage ST may support the semiconductor device. The semiconductor device may be disposed on a top surface of the stage ST. The stage ST may include a chuck for fixing the semiconductor device. For example, the stage ST may include either an electrostatic chuck (ESC) that uses an electrostatic force to fix the semiconductor device or a vacuum chuck that uses a vacuum pressure to fix the semiconductor device. The stage ST may move in a horizontal direction and/or a vertical direction relative to the SEM assembly SEMA. Therefore, the semiconductor device on the stage ST may also move in the horizontal direction and/or the vertical direction.

[0026] The detector 5 may detect one or more of secondary electrons SE and backscatter electrons generated from an electron beam. For example, the detector 5 may detect secondary electrons SE released out from the semiconductor device on which the second electron beam EB2 is irradiated. The integrated controller TC may receive information about the secondary electrons SE detected by the detector 5.

[0027] The stage drive mechanism SA may drive the stage ST to move. For example, the stage drive mechanism SA may horizontally move the stage ST on which the semiconductor device is disposed. For example, the stage drive mechanism SA may move the stage ST in a direction parallel to the top surface of the substrate W. A detailed description thereof will be further discussed below.

[0028] The first column controller C1 may control the first column 1. For example, the first column controller C1 may control an irradiation angle, a secondary electron yield, and an irradiation time of the first electron beam EB1 irradiated from the first column 1.

[0029] The second column controller C2 may control the second column 3. For example, the second column controller C2 may control an irradiation angle, a secondary electron yield, and an irradiation time of the second electron beam EB2 irradiated from the second column 3. For example, the second column controller C2 may control the deflector DF to control the irradiation angle of the second electron beam EB2.

[0030] The detector controller DC may control the detector 5. The detector controller DC may provide the integrated controller TC with information detected by the detector 5. The integrated controller TC may control the first column controller C1, the second column controller C2, the detector controller DC, and the stage drive mechanism SA. The integrated controller TC may form a contrast image by using the information about the secondary electrons SE that is delivered from the detector 5. The display D may be connected to the integrated controller TC. The display D may output the contrast image formed by the integrated controller TC. The presence of defects in the semiconductor device may be ascertained by the control image output on the display D. A detailed description thereof will be further discussed below.

[0031] FIG. 2 illustrates a flow chart showing a semiconductor inspection method according to some example embodiments of the present inventive concepts.

[0032] Referring to FIG. 2, a semiconductor inspection method S may be provided. The semiconductor inspection method S may detect electrical defects of a semiconductor device by using the semiconductor inspection apparatus A discussed with reference to FIG. 1. The semiconductor inspection method S may include a step S1 of placing a semiconductor device on a stage, a step S2 of inspecting a first inspection region, a step S3 of moving the stage, and a step S4 of inspecting a second inspection region.

[0033] The first inspection step S2 may include a step S211 of irradiating a first electron beam, a step S212 of irradiating a second electron beam, a step S22 of detecting a secondary electron, and a step S23 of forming a contrast image of the first inspection region.

[0034] With reference to FIGS. 3 to 10, the following will describe in detail the semiconductor inspection method S of FIG. 2.

[0035] FIGS. 3 to 10 illustrate diagrams showing a semiconductor inspection method according to the flow chart of FIG. 2.

[0036] Referring to FIGS. 2 and 3, the placement step 51 may include placing a semiconductor device W on the stage ST. For example, the placement step S1 may include allowing the stage ST to rest thereon a semiconductor device W which is to be inspected. The semiconductor device W may be a wafer-shaped substrate on which wiring lines and transistors are formed. The present inventive concepts, however, are not limited thereto, and a chip-shaped semiconductor device W may be loaded on the stage ST. The semiconductor device W may be fixed onto the stage ST. After the placement of the semiconductor device W, the vacuum chamber VC may maintain a vacuum state therein.

[0037] Referring to FIGS. 2, 4, and 5, the first irradiation step S211 may include allowing the first column 1 to irradiate the first electron beam EB1. The first column controller C1 may control the first column 1 to adjust one or more of a secondary electron yield and an irradiation time of the first electron beam EB1. Referring to FIG. 5, the first electron beam EB1 may be irradiated on the semiconductor device W such that the first electron beam EB1 may make the first angle α with a top surface Wu of the semiconductor device W. When the first angle α is an acute angle, the first electron beam EB1 may be obliquely irradiated on the top surface Wu of the semiconductor device W.

[0038] Referring to FIG. 6, the semiconductor device W may include an internal line. For example, a first internal line L1 and a second internal line L2 may be positioned on a first inspection region TR1 of the semiconductor device W. The first internal line L1 and the second internal line L2 may be disconnected to each other on a defective site DT. For example, the first internal line L1 and the second internal line L2 may not be electrically connected to each other due to defects during the formation process. The first electron beam EB1 may be irradiated on the first internal line L1. For example, the first electron beam EB1 may be irradiated on one side P1 on a first electrode E1. When the first electron beam EB1 is irradiated on the first electrode E1, the first internal line L1 may be charged. For example, when the first electron beam EB1 has a secondary electron yield greater than 1, the first internal line L1 may be positively charged. For more detail, when the first electron beam EB1, electrons of the first electron beam EB1 may encourage electrons to be released from the first internal line L1. For another example, when the first electron beam EB1 has a secondary electron yield less than 1, the first internal line L1 may be negatively charged. The following will describe an example in which the first internal line L1 is positively charged because the first electron beam EB1 has a secondary electron yield greater than 1. An entirety of the first internal line L1 may be positively charged due to the first electron beam EB1 irradiated on the one side P1 of the first internal line L1. In contrast, the defective site DT disconnects the second internal line L2 from the first internal line L1, and thus the second internal line L2 may not be charged.

[0039] Referring to FIGS. 2 and 7, the second irradiation step S212 may include allowing the second column 3 to irradiate the second electron beam EB2. The first and second electron beams EB1 and EB2 may have their tracks intersect each other on the first inspection region TR1. For example, the tracks of the first and second electron beams EB1 and EB2 may intersect each other on the top surface Wu of the semiconductor device W. For another example, the tracks of the first and second electron beams EB1 and EB2 may intersect each other beneath the top surface Wu of the semiconductor device W. During the inspection of the first inspection region TR1, the stage ST may be fixed to a certain position. For example, a position of the stage ST at the first irradiation step 211 may be the same as that of the stage ST at the second irradiation step S212. When a first location is defined to indicate a position of the stage ST at the first irradiation step S211, a position of the stage ST at the second irradiation step S212 may also be the first location. In this sense, the semiconductor device W may be fixed to a certain position until completion of the inspection on the first inspection region TR1. The second column controller C2 may control the second column 3 to adjust one or more of a secondary electron yield and an irradiation time of the second electron beam EB2. For example, the second column controller C2 may control the deflector DF to control the irradiation angle of the second electron beam EB2. Therefore, in a state where the semiconductor W is fixed to a certain position, it may be possible to irradiate the second electron beam EB2 on an entirety of the first inspection region TR1. The second electron beam EB2 may be irradiated on the semiconductor device W such that the second electron beam EB2 may make the second angle β with the top surface Wu of the semiconductor device W.

[0040] Referring to FIGS. 2 and 8, the detection step S22 may include allowing the detector (see, e.g., detector 5 of FIG. 3) to detect secondary electrons SE.

[0041] There may be a relatively large release of a secondary electron SEb from the second internal line L2 on which a second electron beam EB2b is irradiated. Alternatively, the secondary electron SEb may move a large distance from the second internal line L2 on which the second electron beam EB2b is irradiated. Thus, the detector (see, e.g., detector 5 of FIG. 3) may detect the secondary electron SEb released from the second internal line L2.

[0042] Because the first internal line L1 is positively charged, there may be a relatively small release of a secondary electron SEa from the first internal line L1 on which a second electron beam EB2a is irradiated. Alternatively, the secondary electron SEa may not move a large distance from the first internal line L1 on which the second electron beam EB2a is irradiated. Therefore, the detector (see, e.g., detector 5 of FIG. 3) may not detect the secondary electron SEa released from the first internal line L1. The detection step S22 may be performed substantially simultaneously with the second irradiation step S212.

[0043] It is shown and described that the first irradiation step S211 and the second irradiation step S212 may be sequentially performed, but the present inventive concepts are not limited thereto. For example, the first irradiation step S211 and the second irradiation step S212 may be performed at substantially the same time.

[0044] Referring to FIGS. 2 and 9, the contrast image formation step S23 may allow the integrated controller (see, e.g., integrated controller TC of FIG. 3) to form a contrast image CI by receiving information about secondary electrons SE detected from the detector (see, e.g., detector 5 of FIG. 3). The integrated controller TC may form the contrast image CI based on the information about the secondary electrons SE detected in the first inspection region (see, e.g., first inspection region TR1 of FIG. 6). The contrast image CI may be output to the display (see, e.g., display D of FIG. 3). No or scarce secondary electrons SE may be detected from the first internal line (see, e.g., first internal line L1 of FIG. 8), and thus there may be a dark section SE3 that corresponds to the first internal line L1. A relatively large amount of secondary electrons SE may be detected from the second internal line L2, and thus there may a bright section SE1 that corresponds to the second internal line L2. Through that discussed above, it may be possible to recognize the defective site (see, e.g., defective site DT of FIG. 8). For example, referring to FIG. 9, a boundary section SE2 between the bright section SE1 and the dark section SE3 may correspond to the defective site DT. Accordingly, it may be possible to determine the presence and position of the defective site DT in the first inspection region TR1.

[0045] Referring to FIGS. 2 and 10, the movement step S3 may include allowing the stage drive mechanism SA to move in a horizontal direction and/or a vertical direction. Therefore, the semiconductor device W on the stage ST may also move in the horizontal direction and/or the vertical direction. After completion of the inspection on the first inspection region (see, e.g., first inspection region TR1 of FIG. 6), the semiconductor device W may move under the SEM assembly SEMA so as to inspect a second inspection region.

[0046] The second inspection step S4 may be performed by irradiation of electron beams from the first column 1 and the second column 3. For example, when the stage ST is used to move the semiconductor device W after completion of the inspection on the first inspection region (see, e.g., first inspection region TR1 of FIG. 6), an inspection may be performed on the second inspection region of the semiconductor device W.

[0047] According to a semiconductor inspection apparatus and a semiconductor inspection method using the same in accordance with example embodiments of the present inventive concepts, an electrode may be charged without directly contacting a semiconductor device. For example, electrical failure of the semiconductor device may be detected in a non-contact manner. Accordingly, the semiconductor device may be prevented from being damaged or contaminated due to contact during inspection.

[0048] According to a semiconductor inspection apparatus and a semiconductor inspection method using the same in accordance with example embodiments of the present inventive concepts, electrical defects of a semiconductor device may be detected without use of probes whose tips are in contact with the semiconductor device. Therefore, a facility may be configured with minimum mechanical configuration. Thus, there may be a reduction in requirements of maintenance for the facility. As there are no parts which are needed to be replaced regularly, it may be possible to automate the entirety of the semiconductor inspection method. Accordingly, it may be possible to perform in-line detection of electrical defects of the semiconductor device.

[0049] According to a semiconductor inspection apparatus and a semiconductor inspection method using the same in accordance with example embodiments of the present inventive concepts, a displacement angle of a first column 1 may be different from that of a second column 3. For example, the first column 1 and the second column 3 may be disposed non-parallel to each other. Thus, a first electron beam and a second electron beam may be irradiated onto the same point. In this case, a semiconductor device may be fixed to a certain position without movement in performing the semiconductor inspection method. It may thus be possible to detect electrical defects on one inspection region while the semiconductor device is fixed. There may be an increase in detection accuracy of electrical defects on the semiconductor device. As there is no need to move the semiconductor device during inspection, it may be possible to achieve easy controllability.

[0050] FIGS. 11 and 12 illustrate diagrams showing an example semiconductor inspection method according to the flow chart of FIG. 2.

[0051] In the embodiments that follow, omission will be made to avoid description of features substantially identical to or the same as those discussed with reference to FIGS. 1 to 10.

[0052] Referring to FIG. 11, it may be possible to detect electrical defects of MOSFET. For example, the first column 1 may irradiate the first electron beam EB1 toward a gate contact GTC. When the first electron beam EB1 irradiated from the first column 1 has a secondary electron yield greater than 1, a gate electrode GTE in contact with the gate contact GTC may be positively charged. Therefore, a channel (see, e.g., channel CH of FIG. 12) may be formed under a dielectric body DE. A source region SOR and a drain region DRR may be electrically connected to each other. The source region SOR may have a source contact SOC formed thereon, and the drain region DRR may have a drain contact DRC formed thereon.

[0053] Referring to FIG. 12, the second column 3 may irradiate the second electron beam EB2 toward the semiconductor device W′. The second electron beam EB2 may encourage secondary electrons SE to be released from the source contact SOC and the drain contact DRC. The detector (see, e.g., detector 5 of FIG. 1) may detect the released secondary electrons SE. The integrated controller (see, e.g., integrated controller TC of FIG. 1) may form a contrast image by using information about the secondary electrons SE delivered from the detector 5. Through that mentioned above, it may be possible to detect electrical defects of MOSFET.

[0054] According to a semiconductor inspection apparatus and a semiconductor inspection method using the same, it may be possible to prevent a semiconductor device from being damaged.

[0055] According to a semiconductor inspection apparatus and a semiconductor inspection method using the same, it may be possible to achieve process automation and in-line use.

[0056] According to a semiconductor inspection apparatus and a semiconductor inspection method using the same, it may be possible to accomplish accurate control and easy controllability.

[0057] According to a semiconductor inspection apparatus and a semiconductor inspection method using the same, it may be possible to detect internal electrical defects.

[0058] Effects of the present inventive concepts are not limited to the mentioned above, other effects which have not been mentioned above will be clearly understood to those skilled in the art from the following description.

[0059] Although the present inventive concepts have been described in connection with the embodiments of the present inventive concepts illustrated in the accompanying drawings, it will be understood to those skilled in the art that various changes and modifications may be made without departing from the technical spirit and essential feature of the present inventive concepts. It therefore will be understood that the embodiments described above are just illustrative but not limitative in all aspects.