Resin mold

Abstract

Described is a resinous structure derived from fluorine-containing polymers useful as a mold having excellent dimensional stability.

Claims

1. A resin mold comprising: a first surface where a plurality of first portions and a plurality of second portions are formed; and a second surface, wherein the resin mold is constituted of a first resin having a plurality of carbon-fluorine bonds, wherein the first resin is formed of a composition including a polymerizable constituent A1 having a unit represented by the following formula (a1) and a polymerizable constituent A2 having a unit represented by the ##STR00003##

2. The resin mold of claim 1, wherein a concentration of fluorine atom included in the first resin is greater than or equal to 20 wt %.

3. The resin mold of claim 1, wherein a concentration of fluorine atom in the first resin is less than or equal to 76 wt %.

4. The resin mold of claim 3, wherein the concentration of fluorine atom is greater than or equal to 24.8 wt %.

5. The resin mold of claim 1, wherein a concentration of fluorine atom in the first resin is less than or equal to 32.1 wt %.

6. A method of using the resin mold of claim 1 to manufacture a plurality of components having a concavo-convex pattern, the method comprising: providing the resin mold with a concavo-convex surface; and repeating transfer printings from the resin mold to manufacture the plurality of components having a concavo-convex pattern.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) In the drawings, which illustrate what is currently considered to be the best mode for carrying out the invention:

(2) FIG. 1 shows the experimental procedures for observing the surface of a resin mold.

(3) FIG. 2 illustrates the change in height (Δt) of the resin mold.

(4) FIG. 3 shows the manufacturing process of optical film (such as antireflection film) using a resin mold hereof.

DETAILED DESCRIPTION

(5) Experimental Procedures:

(6) FIG. 1 shows the experimental procedures for observation of surface of resin mold. The experimental procedure is as follows: (a) A composition for forming resin mold is disposed on a substrate. (b) A concavo-convex surface of a quartz mold is pressed to the composition against the substrate. Irradiation of the composition with a light transmitted through the quartz mold forms a resin mold of which the surface has a concavo-convex pattern transferred from the quartz mold. (c) The resin mold is released from the quartz mold. (d) The concavo-convex pattern of the resin mold is pressed to a composition for transfer printing disposed on a substrate against the substrate. (e) An irradiation of the composition for transfer printing with a light transmitted through the quartz mold forms a resin member of which surface has a concavo-convex pattern transferred from the resin mold. (f) The resin member is released from the resin mold and the surface having the concave-convex pattern of the resin mold is observed. Therefore, at least one of the resin mold and the resin member requires mold release capability.

(7) For a resin mold to be used for nanoimprinting, it is desired that there be little deterioration of the concavo-convex pattern of the resin mold by repeated transfer printings. Such a repeating process can be applied to component fabrication of components such as optical components, electronic components, and other devices due to the long working lifetime of the resin mold hereof.

(8) FIG. 2 shows an explanation for change in height (Δt) of resin mold. t.sub.0 and t.sub.N are the difference between the bottom and the top of the concavo-convex pattern in a cross-section view before performing transfer printings and that after performing transfer printings, respectively. Δt is a reflection of the degree of the deterioration and increases with the progression of the deterioration.

(9) A resin mold for which a small Δt is observed is a superior one useful, e.g., for nanoimprinting. The major reason for the increase of Δt is considered to be that the resin mold swells by penetration of components or a solvent included in composition for transfer printing during transfer printings. Therefore, materials suppressing penetration of such components should be used for resin molds. More concretely, liquid repellent capability and/or high crosslink density are required for the materials used for resin molds.

(10) The invention is further described with the aid of the following illustrative Examples.

EXAMPLES

Series A of Experiments

(11) Table 1 shows compositions of resin molds and changes in height of the resin molds. The compositions presented in Table 1 include the constituent A1 (average molecular weight: ca 1850; p: 8.7 (average); q: 5.1 (average)) and initiator I. In addition to the constituent A1 and initiator I, the constituent A2 (average molecular weight: ca 1000; n: 1.5 (average)) and/or constituent B are added to the compositions. Since the constituent A2 has fluorine atoms and a higher ratio of the number of polymerizable substituents to the molecular weight higher than that of the constituent A1, the constituent A2 is considered to make greater contribution to crosslink density than the constituent A1 while contributing to liquid repellent capability. Since the ratio of the number of polymerizable substituents to the molecular weight in the constituent B is greatest among the constituents A1, A2, and B, the constituent B is considered to make greatest contribution to crosslink density. Entries 2-6 are desirable compositions for forming resin molds used for nanoimprinting since dimension errors (Δt/t.sub.0) % for 400 times transfer printings of the resin molds formed by the compositions of the entries 2-6 are equal to smaller than 12%.

(12) ##STR00001##

(13) TABLE-US-00001 TABLE 1 Compositions of resins and changes in height of the resin mold (Series A) Composition for mold resin Entry 1 Entry 2 Entry 3 Entry 4 Entry 5 Entry 6 Constituent A1 76 66 46 36 26 51 Constituent A2 20 30 40 Constituent B 20 30 30 30 30 45 Initiator I 10 10 10 10 10 10 the estimated concentration of 36.9% 32.1% 31.0% 30.4% 29.9% 24.8% fluorine in the resin/% by weight Δt/nm (Change in height after 57 27 18 19 10 17 400 times transfer printings) Dimension error (Δt/t.sub.0) % 25 12 8 8 4 8

(14) The dimension error is desirable to be within 12% when 400 times of transfer printings are carried out.

(15) The resin formed from composition of Entry 1 shows a change in height after 500 transfer printings, 800 transfer printings, and 1000 transfer printings of less than 60 nm. Thus, the dimension errors are within 26% when 500 times, 800 times and 1000 time of transfer printings are carried out.

(16) The resin formed from composition of Entry 5 shows a change in height after 500 transfer printings, 800 transfer printings, and 1000 transfer printings of less than 10 nm. Thus, the dimension errors are within 10% when 500 times, 800 times and 1000 time of transfer printings are carried out.

Series B of Experiments

(17) Table 2 shows compositions of resins and changes in height of the resin molds. The compositions presented by Table 2 include constituents A1 (average molecular weight: ca 1850; p: 8.7 (average); q: 5.1 (average)), B, and initiator I. Since the ratio of the number of polymerizable substituents to the molecular weight in the constituent B is greater than the constituent A1, the constituent B is considered to make greatest contribution to crosslink density. Entries 2-4 are desirable compositions for forming resin molds used for nanoimprinting since dimension errors (Δt/t.sub.0) % for 50 times transfer printings of the resin molds formed by the compositions of the entries are less than or equal to 10%.

(18) ##STR00002##

(19) TABLE-US-00002 TABLE 2 Compositions of resins and changes in height of the resins (Series B) Composition for mold resin Entry 1 Entry 2 Entry 3 Entry 4 Constituent A1 91 76 71 66 Constituent B  5 20 25 30 Initiator I 10 10 10 10 the estimated concentration of 44.2% 36.9% 34.5% 32.1% fluorine in the resin/% by weight Δt/nm (Change in height +50 nm +10 nm +5 nm +5 nm after 50 times transfer printings) Dimension error (Δt/t.sub.0)/% 50 10  5  5

(20) The dimension error is desirable to be within 10% when 50 times of transfer printings are carried out.

(21) Initiators:

(22) Instead of the Initiator I, for example, acetophenone-based initiators, alkylphenone-based initiators, benzoin-based initiators, benzyl ketal-based initiators, anthraquinone-based initiators, acyloxime-based initiators, and acyl phosphine oxide-based initiators can be used for curing the precursors (constituents A1, A2, and B).

(23) FIG. 3 shows the manufacturing process of an optical film (such as an antireflection film) using the resin mold formed from one of the compositions disclosed herein.

(24) A resin mold and a substrate are prepared. The precursor for film is disposed between the resin mold and the substrate. An optical film is formed by irradiation of the precursor with a light transmitted through the resin mold. After the optical film is released from the resin mold and substrate, the optical film is attached to a liquid crystal display (LCD). The optical film can be used as an optical film for other electro-optical devices such as an electroluminescence device and/or electrophoretic device.

(25) Such resin mold can be used in repeating fashion for components or devices such as optical components and electronic devices due to the long working lifetime of the resin mold hereof.