MODULATION DEVICE COMPRISING A NANODIODE

20170352748 · 2017-12-07

    Inventors

    Cpc classification

    International classification

    Abstract

    The invention relates to a modulation device created on a substrate (1), comprising at least one nanodiode in the form of a T fitted into a U, the channel (31) of said nanodiode being the leg of the T that is inserted into the U. The device is characterised in that it comprises at least one electrically conductive line (37) that passes over at least part of said channel (31).

    Claims

    1. A modulation device made on a substrate including at least one nanodiode which appears as T fitted into a U, the channel of this nanodiode being the leg of the T which penetrates into the U, characterized in that it includes at least one electrically conductive line which passes over at least one portion of this channel.

    2. The device according to claim 1, characterized in that, including a plurality of juxtaposed nanodiodes, said line steps over the totality of the channels.

    3. The device according to claim 1 characterized in that a layer of dielectric material is interposed between the channel(s) and said line.

    4. The device according to claim 1, characterized in that said substrate is in silicon.

    5. The device according to claim 1, characterized in that the nanodiode(s) is(are) formed in a AlGaN/GaN hetero structure.

    6. The device according to claim 1 characterized in that said line is made with a mixture of gold and molybdenum.

    7. The device according to claim 1 characterized in that said line is made from a conductive multilayer.

    8. The device according to claim 7, characterized in that said conductive multilayer is made in titanium/platinum/gold.

    9. A method for controlling the device according to claim 1, characterized in that it comprises a step for powering said line.

    Description

    [0016] The present invention will now become apparent with more details within the scope of the description which follows of exemplary embodiments given as an illustration with reference to the appended figures which represent:

    [0017] FIG. 1, an elementary nano-diode according to the invention, more particularly:

    [0018] FIG. 1a, a perspective diagram,

    [0019] FIG. 1b, a top view;

    [0020] FIG. 2, a set of nano-diodes according to the invention.

    [0021] The elements present in several figures are affected with a single and same reference.

    [0022] With reference to FIG. 1, a nano-diode is etched in a bilayer heterostructure deposited on a substrate 1 which is in silicon in the present case.

    [0023] The heterostructure includes a lower layer 2 in contact with the substrate and an upper layer 3.

    [0024] As an example, the lower layer 2 is in GaN and the upper layer 3 is in Al.sub.0.3Ga.sub.0.7N.

    [0025] The nano-diode is etched in the upper layer 3.

    [0026] It appears like a T, on the left of the figure, fitted into a U, on the right of the figure. The leg 31 of the T which substantially is supported at the middle of the bar 32 of this T opens into the base 33 of the U. It forms the channel of the diode which therefore extends from the bar 32 as far as the base 33. On either side of the channel 31 appear two trenches 34, 35 which extends for forming a free space between the bar 32 of the T and the top of the U.

    [0027] A conductive line 37 is arranged on the channel 31, perpendicularly to the latter and it rests on both uprights of the U. As an example, in order to produce this line, one begins by depositing a thin layer of metal on the diode and then this layer will be etched.

    [0028] The line may be a mixture of gold and of molybdenum. It may also consist in a titanium-platinum-gold tri-layer. In any case, regardless of its constitution, the important point is that this line is electrically conductive.

    [0029] A Schottky contact is thereby made between the line 37 and the channel 31.

    [0030] Moreover depositing a layer of dielectric material may moreover be contemplated between the nano-diode and the line.

    [0031] A single nano-diode can only transmit a very limited current because of the section of its channel. Juxtaposition of a plurality of nano-diodes is thereby known.

    [0032] With reference to FIG. 2, a set of five nano-diodes is illustrated which therefore have five channels 41, 42, 43, 44, 45 opening into a left access area 48 and a right access area 49.

    [0033] Now, the conductive line 47 passes over the totality of the channels.

    [0034] The connections are not illustrated in the figures in order not to burden them. Further, they are well known to one skilled in the art who has no difficulty for making them.

    [0035] The function of the line is that of a switch for which the state depends on the applied voltage to this line.

    [0036] The switch is open when a negative voltage of the order of 5 volts is applied. It is closed when a zero or slightly positive voltage is applied.

    [0037] Thus advantageously, the “chopper” is thereby replaced for improving the signal-to-noise ratio by controlling the line in an all or nothing mode.

    [0038] Further, it is possible to adjust the voltage on the line in the conducting mode in order to have a much higher sensitivity than for a nano-diode without any line. It is possible to obtain a factor comprised between 10 and 100 for a positive voltage of the order of 0.6 volts.

    [0039] In fact, the function of the line may be assimilated with that of the gate of a transistor.

    [0040] The consequence thereof is that the line may be used not only in an all or nothing mode but also as a modulator of the current which flows in the channel.

    [0041] The present invention has been shown according to particularly relevant embodiments. However, many alternatives may be devised by one skilled in the art without leaving the scope of this invention. In particular, any described means may be replaced with an equivalent means.