SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR

Abstract

The present disclosure provides a semiconductor device and a manufacturing method therefor. The device may include: a semiconductor substrate; a fin projecting from the semiconductor substrate, where trenches are formed on sides of the fin; a first insulator layer partially filling the trenches, where the fin protrudes from the first insulator layer; a second insulator layer covering the fin; a plurality of pseudo gate structures on the second insulator layer, where each pseudo gate structure wraps a part of the fin, where each pseudo gate structure includes a pseudo gate located on the second insulator layer, the plurality of pseudo gate structures includes at least a first pseudo gate structure and a second pseudo gate structure that are spaced from each other, the second pseudo gate structure is located at an edge corner of the fin, and a part of the second pseudo gate structure is on the first insulator layer; spacers, on the first insulator layer and the second insulator layer, at two sides of each of the plurality of pseudo gate structures; and a source or a drain located among the plurality of pseudo gate structures. The present invention can improve reliability of the device.

Claims

1. A manufacturing method for a semiconductor device, comprising: providing a substrate structure, wherein the substrate structure comprises: a semiconductor substrate; a fin protruding from the semiconductor substrate, wherein trenches are formed on the sides of the fin; a first insulator layer partially filling the trenches, wherein the fin protrudes from the first insulator layer; and a second insulator layer covering the fin; forming a plurality of pseudo gate structures on the second insulator layer, where each pseudo gate structure wraps a part of the fin, wherein each pseudo gate structure comprises a pseudo gate located on the second insulator layer, wherein the plurality of pseudo gate structures comprises at least a first pseudo gate structure and a second pseudo gate structure that are spaced from each other, and wherein the second pseudo gate structure is located at an edge corner of the fin, and a part of the second pseudo gate structure is on the first insulator layer; forming, on the first insulator layer and the second insulator layer, spacers at two sides of each of the plurality of pseudo gate structures; etching the second insulator layer and at least a part of the fin that are not covered by the spacers and the pseudo gates, to form a recess in the fin; and forming a source or a drain in the recess.

2. The manufacturing method for a semiconductor device according to claim 1, wherein the plurality of pseudo gate structures further comprises a third pseudo gate structure spaced from the first pseudo gate structure, wherein the second pseudo gate structure and the third pseudo gate structure are located at two sides of the first pseudo gate structure, respectively; and wherein the third pseudo gate structure is located at an edge corner of the fin, and a part of the third pseudo gate structure is on the first insulator layer.

3. The manufacturing method for a semiconductor device according to claim 2, wherein the step of forming a recess comprises: forming, in the fin, a first recess located between the first pseudo gate structure and the second pseudo gate structure and forming a second recess located between the first pseudo gate structure and the third pseudo gate structure through the etching.

4. The manufacturing method for a semiconductor device according to claim 3, wherein the step of forming a source or a drain in the recess comprises: forming a source in the first recess and forming a drain in the second recess.

5. The manufacturing method for a semiconductor device according to claim 1, wherein the material of the pseudo gate comprises polysilicon.

6. The manufacturing method for a semiconductor device according to claim 1, wherein the pseudo gate structure further comprises a hard mask layer located on the pseudo gate.

7. The manufacturing method for a semiconductor device according to claim 6, wherein the material of the hard mask layer comprises silicon nitride.

8. The manufacturing method for a semiconductor device according to claim 1, wherein the second pseudo gate structure is spaced from the first pseudo gate structure for a first distance, wherein the first distance ranges from 60 nm to 100 nm.

9. The manufacturing method for a semiconductor device according to claim 2, wherein the third pseudo gate structure is spaced from the first pseudo gate structure for a second distance, wherein the second distance ranges from 60 nm to 100 nm.

10. The manufacturing method for a semiconductor device according to claim 6, further comprising: forming an interlayer dielectric layer to cover the substrate structure after the source or the drain is formed; etching back the interlayer dielectric layer, to expose an upper surface of the hard mask layer; removing the hard mask layer, the pseudo gate, and a part of the second insulator layer, so as to form an opening; and forming a gate structure in the opening.

11. The manufacturing method for a semiconductor device according to claim 10, wherein the gate structure comprises: a gate insulator layer that is on the fin and wraps a part of the fin, and a gate on the gate insulator layer.

12. The manufacturing method for a semiconductor device according to claim 1, wherein the fin is an N-well region, and the material of the source or the drain comprises silicon germanium; or the fin is a P-well region, and the material of the source or the drain comprises silicon carbide.

13. The manufacturing method for a semiconductor device according to claim 1, wherein the semiconductor substrate comprises two fins, with a first fin for forming a PMOS device and a second fin for forming an NMOS device, and wherein the material of the source or the drain on the first fin comprises silicon germanium; and the material of the source or the drain on the second fin comprises silicon carbide.

14. A semiconductor device, comprising: a semiconductor substrate; a fin protruding from the semiconductor substrate, wherein trenches are formed on the sides of the fin; a first insulator layer partially filling the trenches, wherein the fin protrudes from the first insulator layer; a second insulator layer covering the fin; a plurality of pseudo gate structures on the second insulator layer, where each pseudo gate structure wraps a part of the fin, wherein each pseudo gate structure comprises a pseudo gate located on the second insulator layer, wherein the plurality of pseudo gate structures comprises at least a first pseudo gate structure and a second pseudo gate structure that are spaced from each other, and wherein the second pseudo gate structure is located at an edge corner of the fin, and a part of the second pseudo gate structure is on the first insulator layer; spacers, on the first insulator layer and the second insulator layer, at two sides of each of the plurality of pseudo gate structures; and a source or a drain on the fin and located among the plurality of pseudo gate structures.

15. The semiconductor device according to claim 14, wherein the plurality of pseudo gate structures further comprises a third pseudo gate structure spaced from the first pseudo gate structure, and wherein the second pseudo gate structure and the third pseudo gate structure are located at two sides of the first pseudo gate structure, respectively; and wherein the third pseudo gate structure is located at an edge corner of the fin, and a part of the third pseudo gate structure is on the first insulator layer.

16. The semiconductor device according to claim 14, wherein the material of the pseudo gate comprises polysilicon.

17. The semiconductor device according to claim 14, wherein the pseudo gate structure further comprises a hard mask layer located on the pseudo gate.

18. The semiconductor device according to claim 17, wherein the material of the hard mask layer comprises silicon nitride.

19. The semiconductor device according to claim 14, wherein the second pseudo gate structure is spaced from the first pseudo gate structure for a first distance, wherein the first distance ranges from 60 nm to 100 nm.

20. The semiconductor device according to claim 15, wherein the third pseudo gate structure is spaced from the first pseudo gate structure for a second distance, wherein the second distance ranges from 60 nm to 100 nm.

21. The semiconductor device according to claim 15, wherein the source comprises a source located between the first pseudo gate structure and the second pseudo gate structure; and wherein the drain comprises a drain located between the first pseudo gate structure and the third pseudo gate structure.

22. The semiconductor device according to claim 14, wherein the fin is an N-well region, and the material of the source or the drain comprises silicon germanium; or the fin is a P-well region, and the material of the source or the drain comprises silicon carbide.

23. The semiconductor device according to claim 14, wherein the semiconductor device comprises two fins, with a first fin for forming a PMOS device and a second fin for forming an NMOS device, wherein the material of the source or the drain on the first fin comprises silicon germanium; and wherein the material of the source or the drain on the second fin comprises silicon carbide.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0036] The accompanying drawings that constitute a part of the specification describe forms of the present disclosure, and together with the specification, are used to interpret the present disclosure.

[0037] The present disclosure can be understood more clearly according to the detailed description below with reference to the accompanying drawings, where:

[0038] FIG. 1A schematically illustrates a structural schematic diagram of a cross section of a semiconductor device according to an embodiment of the prior art;

[0039] FIG. 1B schematically illustrates a structural schematic diagram of a cross section of a semiconductor device according to another embodiment of the prior art;

[0040] FIG. 2 is a flow chart of a manufacturing method for a semiconductor device;

[0041] FIG. 3 schematically illustrates a structural schematic diagram of a cross section in a phase of the manufacturing process for a semiconductor device;

[0042] FIG. 4 schematically illustrates a structural schematic diagram of a cross section in a phase of the manufacturing process for a semiconductor device;

[0043] FIG. 5 schematically illustrates a structural schematic diagram of a cross section in a phase of the manufacturing process for a semiconductor device;

[0044] FIG. 6 schematically illustrates a structural schematic diagram of a cross section in a phase of the manufacturing process for a semiconductor device;

[0045] FIG. 7 schematically illustrates a structural schematic diagram of a cross section in a phase of the manufacturing process for a semiconductor device;

[0046] FIG. 8 schematically illustrates a structural schematic diagram of a cross section in a phase of the manufacturing process for a semiconductor device;

[0047] FIG. 9 schematically illustrates a structural schematic diagram of a cross section in a phase of the manufacturing process for a semiconductor device;

[0048] FIG. 10 schematically illustrates a structural schematic diagram of a cross section in a phase of the manufacturing process for a semiconductor device;

[0049] FIG. 11 schematically illustrates a structural schematic diagram of a cross section in a phase of the manufacturing process for a semiconductor device;

[0050] FIG. 12 schematically illustrates a structural schematic diagram of a cross section in a phase of the manufacturing process for a semiconductor device;

[0051] FIG. 13A schematically illustrates a structural schematic diagram of a cross section in a phase of the manufacturing process for a substrate structure;

[0052] FIG. 13B schematically illustrates a structural schematic diagram of a cross section in a phase of the manufacturing process for a substrate structure;

[0053] FIG. 13C schematically illustrates a structural schematic diagram of a cross section in a phase of the manufacturing process for a substrate structure;

[0054] FIG. 13D schematically illustrates a structural schematic diagram of a cross section in a phase of the manufacturing process for a substrate structure;

[0055] FIG. 13E schematically illustrates a structural schematic diagram of a cross section in a phase of the manufacturing process for a substrate structure;

[0056] FIG. 13F schematically illustrates a structural schematic diagram of a cross section in a phase of the manufacturing process for a substrate structure;

[0057] FIG. 13G schematically illustrates a structural schematic diagram of a cross section in a phase of the manufacturing process for a substrate structure;

[0058] FIG. 13H schematically illustrates a structural schematic diagram of a cross section in a phase of the manufacturing process for a substrate structure; and

[0059] FIG. 13I schematically illustrates a structural schematic diagram of a cross section in a phase of the manufacturing process for a substrate structure.

DETAILED DESCRIPTION

[0060] The present disclosure is described in detail with reference to the accompanying drawings and various exemplary forms. It should be noted that: unless otherwise specified, the relative arrangements of the components and steps, numeral expressions, and values stated in these forms are not intended to limit the scope of the present disclosure.

[0061] Meanwhile, it should be understood that the sizes of the respective sections shown in the accompanying drawings are not drawn according to an actual proportion, so as to facilitate the description.

[0062] The description of at least one exemplary form below is illustrative only and should not be taken as any limitation to the present disclosure and application or use thereof.

[0063] The technology, methods, and devices that are known by a person of ordinary skill in the art are not discussed in detail, and in a proper situation, the technology, methods, and devices should be regarded as parts of the specification.

[0064] Any specific values in all the examples shown and discussed herein should be understood as examples only, instead of limitations. Therefore, the other examples of the exemplary forms may have different values.

[0065] It should be noted that: similar reference labels and letters in the following accompanying drawings indicate similar items. Therefore, once a certain item is defined in one accompanying drawing, the item needs not to be further discussed in the subsequent accompanying drawings.

[0066] FIG. 2 is a flow chart of a manufacturing method for a semiconductor device. FIG. 3 to FIG. 12 schematically illustrate structural schematic diagrams of cross sections in several phases of the manufacturing process for a semiconductor device. Some forms of a manufacturing process of a semiconductor device are described in detail below with reference to FIG. 2 and FIG. 3 to FIG. 12.

[0067] As shown in FIG. 2, in step S201, a substrate structure is provided.

[0068] FIG. 3 schematically illustrates a structural schematic diagram of a cross section of step S201. As shown in FIG. 3, a substrate structure 30 is provided. The substrate structure 30 may include a semiconductor substrate 31. The semiconductor substrate may be, for example, a silicon substrate. The substrate structure 30 may further include one or multiple fins (for example, a first fin 41 and a second fin 42 shown in FIG. 3) protruding from the semiconductor substrate 31. Trenches 43 are formed on sides of each fin. The fin is a semiconductor fin. For example, the material of the fin may include silicon. The substrate structure 30 may further include a first insulator layer 32 partially filling the trenches 43. The fin protrudes from the first insulator layer 32. The material of the first insulator layer may include silicon dioxide, for example. The substrate structure 30 may further include a second insulator layer 33 covering the fins. The material of the second insulator layer may include silicon dioxide, for example.

[0069] It should be noted that: although FIG. 3 shows two fins, a person skilled in the art should understand that fins with a quantity larger than or less than two may be formed on the semiconductor substrate 31, and therefore the scope of the present disclosure is not limited thereto.

[0070] In some forms, the fin may be an N-well region or a P-well region. For example, the first fin 41 and the second fin 42 may both be N-well regions or may both be P-well regions, or one of the first fin 41 and the second fin 42 is an N-well region and the other one is a P-well region.

[0071] Referring to FIG. 2, in step S202, a plurality of pseudo gate structures that is on the second insulator layer is formed, where each pseudo gate structure wraps a part of a fin.

[0072] FIG. 4 schematically illustrates a structural schematic diagram of a cross section of step S202. As shown in FIG. 4, a plurality of pseudo gate structures is formed on the second insulator layer 33, and each pseudo gate structure wraps a part of a fin. The pseudo gate structure may include a pseudo gate 35 located on the second insulator layer 33. The material of the pseudo gate may include polysilicon, for example. Optionally, the pseudo gate structure may further include a hard mask layer 36 located on the pseudo gate 35. The material of the hard mask layer may include silicon nitride, for example.

[0073] In some forms, the plurality of pseudo gate structures includes at least a first pseudo gate structure and a second pseudo gate structure that are spaced from each other. For example, as shown in FIG. 4, on the first fin 41, the plurality of pseudo gate structures includes at least a first pseudo gate structure 51 and a second pseudo gate structure 52 that are spaced from each other. For another example, as shown in FIG. 4, on the second fin 42, the plurality of pseudo gate structures includes at least a first pseudo gate structure 61 and a second pseudo gate structure 62 that are spaced from each other.

[0074] In some forms, the second pseudo gate structure is located at an edge corner of a fin and a part of the second pseudo gate structure is located on the first insulator layer. For example, as shown in FIG. 4, the second pseudo gate structure 52 is located at an edge corner of a fin (for example, the first fin 41) and a part of the second pseudo gate structure 52 is located on the first insulator layer 32.

[0075] In some forms, the plurality of pseudo gate structures may further include a third pseudo gate structure spaced from the first pseudo gate structure. For example, as shown in FIG. 4, on the first fin 41, the plurality of pseudo gate structures may further include a third pseudo gate structure 53 spaced from the first pseudo gate structure 51. For another example, as shown in FIG. 4, on the second fin 42, the plurality of pseudo gate structures may further include a third pseudo gate structure 63 spaced from the first pseudo gate structure 61. By using the plurality of pseudo gate structures on the first fin 41 as an example, the second pseudo gate structure 52 and the third pseudo gate structure 53 are located at two sides of the first pseudo gate structure 51, respectively, the third pseudo gate structure 53 is located at an edge corner of a fin (for example, the first fin 41), and a part of the third pseudo gate structure 53 is located on the first insulator layer 32.

[0076] It should be noted that the first pseudo gate structure 51, the second pseudo gate structure 52, and the third pseudo gate structure 53 on the first fin 41 are used as main objects to be described in the present invention. However, a person skilled in the art should understand that: descriptions of the second pseudo gate structure 52, and the third pseudo gate structure 53 on the first fin 41 (for example, descriptions associated with structures, appearances, and executed processing operations) may also be equally or similarly applicable to descriptions of the first pseudo gate structure 61, the second pseudo gate structure 62, and the third pseudo gate structure 63 on the second fin 42.

[0077] In some forms, the second pseudo gate structure (for example, the second pseudo gate structure 52) is spaced from the first pseudo gate structure (for example, the first pseudo gate structure 51) for a first distance. In some embodiments, the first distance may range from 60 nm to 100 nm, for example, 70 nm, 80 nm, or 90 nm.

[0078] In some forms, the third pseudo gate structure (for example, the third pseudo gate structure 53) is spaced from the first pseudo gate structure (for example, the first pseudo gate structure 51) for a second distance. In some forms, the second distance may range from 60 nm to 100 nm, for example, 70 nm, 80 nm, or 90 nm.

[0079] In some forms, the step of forming the plurality of pseudo gate structures may include: for example, as shown in FIG. 12, forming a pseudo gate material layer 35 on the substrate structure through a deposition process for example, forming a hard mask layer 36 on the pseudo gate material layer 35 through a deposition process for example, and forming a first patterned mask layer (for example, a photoresist) 44 on the hard mask layer 36 through a coating process for example. Optionally, the first mask layer 44 is used as an etching barrier layer to etch the hard mask layer 36 and the pseudo gate material layer 35, and then the first mask layer 44 is removed to form the structure shown in FIG. 4.

[0080] Referring to FIG. 2, in step S203, spacers are formed at two sides of each of the plurality of pseudo gate structures on the first insulator layer and the second insulator layer.

[0081] FIG. 5 schematically illustrates a structural schematic diagram of a cross section of step S203. As shown in FIG. 5, spacers 37 are formed on the first insulator layer 32 and the second insulator layer 33 at two sides of each of the plurality of pseudo gate structures. For example, the spacers 37 are formed at two sides of the first pseudo gate structure 51, the second pseudo gate structure 52, and the third pseudo gate structure 53 on the first fin 41. For another example, the spacers 37 are formed at two sides of the first pseudo gate structure 61, the second pseudo gate structure 62, and the third pseudo gate structure 63 on the second fin 42. In some embodiments, the material of the spacers may include, for example, a silicon oxide or a silicon nitride.

[0082] Referring to FIG. 2, in step S204, at least one part of the second insulator layer and the fin that are not covered by the spacers and the pseudo gates are etched to form a recess.

[0083] FIG. 6 schematically illustrates a structural schematic diagram of a cross section of step S204. For example, as shown in FIG. 6, at least one part of the second insulator layer 33 and the fin (for example, the first fin 41 or the second fin 42) that are not covered by the spacers 37 and the pseudo gates 35 is etched by using the spacers and the pseudo gates or the hard mask layer formed on the pseudo gates as an etching barrier layer through an anisotropic etching process for example, so as to form a recess (for example, a recess 38 or 39) in the fin.

[0084] In some forms, the step of forming a recess may include that: a first recess located between the first pseudo gate structure and the second pseudo gate structure and a second recess between the first pseudo gate structure and the third pseudo gate structure may be formed in the fin through the etching. For example, as shown in FIG. 6, a first recess 38 between the first pseudo gate structure 51 and the second pseudo gate structure 52 and a second recess 39 between the first pseudo gate structure 51 and the third pseudo gate structure 53 may be formed in the first fin 41 through the etching. For another example, as shown in FIG. 6, a first recess 38 between the first pseudo gate structure 61 and the second pseudo gate structure 62 and a second recess 39 between the first pseudo gate structure 61 and the third pseudo gate structure 63 may be formed in the second fin 42 through the etching.

[0085] Referring to FIG. 2, in step S205, a source or a drain is formed in the recess.

[0086] In some forms, the step may include: forming a source in the first recess and forming a drain in the second recess.

[0087] FIG. 7 schematically illustrates a structural schematic diagram of a cross section of step S205. For example, as shown in FIG. 7, a source 45 is formed in the first recess 38 of the first fin 41 and a drain 46 is formed in the second recess 39 of the first fin 41 through an epitaxial growth process for example. For another example, as shown in FIG. 7, a source 55 is formed in the first recess 38 of the second fin 42 and a drain 56 is formed in the second recess 39 of the second fin 42 through an epitaxial growth process for example.

[0088] In some forms of the present disclosure, the fin may be an N-well region. The material of the source or the drain may include silicon germanium (SiGe). In some forms, the one or multiple fins may all be an N-well region. Alternatively, one or some fins of the one or multiple fins are N-well regions. The respective material of the source and the drain formed on the fin of the N-well regions may include SiGe.

[0089] In some forms of the present disclosure, the fin may be a P-well region. The material of the source or the drain may include silicon carbide (SiC). In some forms, the one or multiple fins may all be a P-well region. Alternatively, one or some fins of the one or multiple fins are P-well regions. The respective material of the source and the drain formed on the fin of the P-well regions may include SiC.

[0090] In some forms of the present disclosure, the one or multiple fins may include a first fin (for example, the first fin 41) for forming a PMOS device and a second fin (for example, the second fin 42) for forming the NMOS device. The material of the source (for example, the source 45) or the drain (for example, the drain 46) on the first fin (for example, the first fin 41) may include silicon germanium. The material of the source (for example, the source 55) or the drain (for example, the drain 56) on the second fin (for example, the second fin 42) may include silicon carbide.

[0091] So far, a manufacturing method for a semiconductor device is provided. Forms of the manufacturing method of the present disclosure can prevent a source (or drain) on one fin from being undesirably connected to a source (or drain) on another fin, thereby being capable of improving reliability of the device. Forms of the manufacturing method of the present disclosure can also enable a formed source and drain to have a regular appearance, thereby being capable of improving performance of the device.

[0092] Optionally, the manufacturing method may further include that: as shown in FIG. 8, an interlayer dielectric layer 47 may be formed through a deposition process for example, so as to cover the substrate structure after the source or the drain is formed. For example, the material of the interlayer dielectric layer may include silicon dioxide.

[0093] Optionally, the manufacturing method may further include: as shown in FIG. 9, the interlayer dielectric layer 47 is etched back, so as to expose an upper surface of the hard mask layer 36. For example, the etching back may be implemented by using a planarization (for example chemical and mechanical planarization) process.

[0094] Optionally, the manufacturing method may further include: as shown in FIG. 10, removing the hard mask layer 36, the pseudo gate 35, and a part of the second insulator layer 33, so as to form an opening 57.

[0095] Optionally, the manufacturing method may further include: as shown in FIG. 11, forming a gate structure 71 in the opening 57.

[0096] In some forms, the gate structure 71 may include: a gate insulator layer 711 on the fin (for example, the first fin 41 or the second fin 42) and wrapping a part of the fin, and a gate 712 on the gate insulator layer 711. For example, the material of the gate insulator layer may include silicon dioxide or a k (dielectric constant) dielectric material. For example, the material of the gate may include metals such as tungsten or aluminum.

[0097] In some forms, the step of forming a gate structure may include: for example, forming a gate insulator layer 711 on a bottom part or a sidewall of the opening 57 through a deposition process and then depositing a gate material, so as to fill the opening 57. Optionally, planarization is performed on the gate material to form a gate 712.

[0098] So far, a manufacturing method for a semiconductor device according to some other forms of the present disclosure is provided.

[0099] FIG. 13A to FIG. 13I schematically illustrate structural schematic diagrams of cross sections in several phases of a manufacturing process for a substrate structure. The manufacturing process for a substrate structure is described below with reference to FIG. 13A to FIG. 13I.

[0100] First, as shown in FIG. 13A, a third insulator layer 81 is formed, as a buffering layer, on a semiconductor substrate (for example, a silicon substrate) 31 through a deposition or oxidation process for example. The material of the third insulator layer may include silicon dioxide, for example.

[0101] Subsequently, as shown in FIG. 13B, a fourth insulator layer 82 is formed on the third insulator layer 81 through a deposition process for example. The material of the fourth insulator layer may include silicon nitride, for example.

[0102] Subsequently, as shown in FIG. 13C, the structure shown in FIG. 13B is etched so as to form fins isolated by a trench, that is, semiconductor fins. For example, a second patterned mask layer (not shown in FIG. 13C) may be coated on the structure shown in FIG. 13B, then the fourth insulator layer 82, the third insulator layer 81, and the semiconductor substrate 31 are etched by using the second mask layer, so as to form fins, and then the second mask layer is removed.

[0103] Subsequently, as shown in FIG. 13D, a fifth insulator layer 83 is formed on a surface of the structure shown in FIG. 13C through a deposition process for example. The material of the fifth insulator layer may include silicon dioxide, for example.

[0104] Subsequently, as shown in FIG. 13E, a first insulator layer 32 is formed on the structure shown in FIG. 13D through a deposition process (for example, Flowable Chemical Vapor Deposition (FCVD)), so as to fill the trenches between the respective fins for example.

[0105] Subsequently, as shown in FIG. 13F, the first insulator layer 32 and the fifth insulator layer 83 are planarized, so as to expose an upper surface of the fourth insulator layer 82.

[0106] Subsequently, as shown in FIG. 13G, the first insulator layer 32 and the fifth insulator layer 83 are etched back, to enable the semiconductor fins to protrude from the first insulator layer 32.

[0107] Subsequently, as shown in FIG. 13H, the fourth insulator layer 82 and the third insulator layer 81 are removed.

[0108] Subsequently, as shown in FIG. 13I, a second insulator layer 33 is formed on a part of a surface of the fins through an oxidation process for example. In other forms, alternatively, the second insulator layer 33 may also be formed through a deposition process.

[0109] The schematic diagram of the substrate structure shown in FIG. 3 may be regarded as a structural schematic diagram of a cross section taken from FIG. 13I along A-A′. The fifth insulator layer 83 in FIG. 13I is omitted in FIG. 3. In some forms, the substrate structure may further include a fifth insulator layer 83 located between the first insulator layer 32 and the semiconductor substrate 31 and between the first insulator layer 32 and the fin (for example, the first fin 41 or the second fin 42). In some forms, the substrate structure also may not include the fifth insulator layer.

[0110] The present disclosure further provides a semiconductor device. For example, as shown in FIG. 7, the semiconductor device may include a semiconductor substrate 31. The semiconductor substrate may be, for example, a silicon substrate.

[0111] In some forms of the present disclosure, the semiconductor device may further include one or multiple fins protruding from the semiconductor substrate, for example, the first fin 41 and the second fin 42 shown in FIG. 7. Trench 43 are formed at sides of each fin. The fin is a semiconductor fin. For example, the material of the fin may include silicon.

[0112] In some forms of the present disclosure, the semiconductor device may further include a first insulator layer 32 partially filling the trenches 43. The fin (for example, the first fin 41 or the second fin 42) protrudes from the first insulator layer 32. The material of the first insulator layer may include silicon dioxide, for example.

[0113] In some forms of the present disclosure, the semiconductor device may further include a second insulator layer 33 covering the fin. The material of the second insulator layer may include silicon dioxide, for example.

[0114] In some forms of the present disclosure, the semiconductor device may further include a plurality of pseudo gate structures that is on the second insulator layer 33, each of which wraps a part of the fin. The pseudo gate structure may include a pseudo gate 35 located on the second insulator layer 33. The material of the pseudo gate may include polysilicon, for example. Optionally, the pseudo gate structure may further include a hard mask layer 36 located on the pseudo gate 35. The material of the hard mask layer may include silicon nitride, for example.

[0115] In some forms, the plurality of pseudo gate structures includes at least a first pseudo gate structure and a second pseudo gate structure that are spaced from each other. For example, as shown in FIG. 7, on the first fin 41, the plurality of pseudo gate structures includes at least a first pseudo gate structure 51 and a second pseudo gate structure 52 that are spaced from each other. For another example, as shown in FIG. 7, on the second fin 42, the plurality of pseudo gate structures includes at least a first pseudo gate structure 61 and a second pseudo gate structure 62 that are spaced from each other.

[0116] In some forms, the second pseudo gate structure is located at an edge corner of a fin and a part of the second pseudo gate structure is located on the first insulator layer. For example, as shown in FIG. 7, by using the pseudo gate structures on the first fin 41 as an example, the second pseudo gate structure 52 is located at an edge corner of the first fin 41 and a part of the second pseudo gate structure 52 is located on the first insulator layer 32.

[0117] In some forms, the plurality of pseudo gate structures may further include a third pseudo gate structure spaced from the first pseudo gate structure. For example, as shown in FIG. 7, on the first fin 41, the plurality of pseudo gate structures may further include a third pseudo gate structure 53 spaced from the first pseudo gate structure 51. For another example, as shown in FIG. 7, on the second fin 42, the plurality of pseudo gate structures may further include a third pseudo gate structure 63 spaced from the first pseudo gate structure 61. By using the plurality of pseudo gate structures on the first fin 41 as an example, as shown in FIG. 7, the second pseudo gate structure 52 and the third pseudo gate structure 53 are located at two sides of the first pseudo gate structure 51, respectively, the third pseudo gate structure 53 is located at an edge corner of a fin (for example, the first fin 41), and a part of the third pseudo gate structure 53 is located on the first insulator layer 32.

[0118] In some forms, the second pseudo gate structure (for example, the second pseudo gate structure 52) is spaced from the first pseudo gate structure (for example, the first pseudo gate structure 51) for a first distance. In some forms, the first distance may range from 60 nm to 100 nm, for example, 70 nm, 80 nm, or 90 nm.

[0119] In some forms, the third pseudo gate structure (for example, the third pseudo gate structure 53) is spaced from the first pseudo gate structure (for example, the first pseudo gate structure 51) for a second distance. In some forms, the second distance may range from 60 nm to 100 nm, for example, 70 nm, 80 nm, or 90 nm.

[0120] In some forms of the present disclosure, as shown in FIG. 7, the semiconductor device may further include a first insulator layer 32 and a second insulator layer 33, and spacers 37 respectively at two sides of the plurality of pseudo gate structures. For example, as shown in FIG. 7, the semiconductor device may further include spacers 37 at two sides of the respective first pseudo gate structure 51, the second pseudo gate structure 52, and the third pseudo gate structure 53 on the first fin 41. For example, as shown in FIG. 7, the semiconductor device may further include spacers 37 at two sides of the respective first pseudo gate structure 61, the second pseudo gate structure 62, and the third pseudo gate structure 63 on the second fin 42. In some forms, the material of the spacers may include, for example, a silicon oxide or a silicon nitride.

[0121] In some forms of the present disclosure, the semiconductor device may further include a source or a drain located among the plurality of pseudo gate structures located on the fin.

[0122] In some forms, the source may include a source between the first pseudo gate structure and the second pseudo gate structure. For example, as shown in FIG. 7, on the first fin 41, the source may include the source 45 located between the first pseudo gate structure 51 and the second pseudo gate structure 52. For another example, as shown in FIG. 7, on the second fin 42, the source may include the source 55 located between the first pseudo gate structure 61 and the second pseudo gate structure 62.

[0123] In some forms, the drain may include a drain between the first pseudo gate structure and the third pseudo gate structure. For example, as shown in FIG. 7, on the first fin 41, the drain may include the drain 46 located between the first pseudo gate structure 51 and the third pseudo gate structure 53. For another example, as shown in FIG. 7, on the second fin 42, the drain may include the drain 56 located between the first pseudo gate structure 61 and the third pseudo gate structure 63.

[0124] In some forms of the present disclosure, the fin may be an N-well region. The material of the source or the drain may include silicon germanium (SiGe). In some forms, the one or multiple fins may be an N-well region. Alternatively, one or some fins of the one or multiple fins are N-well regions. The respective material of the source and the drain formed on the fin of the N-well regions may include SiGe.

[0125] In some forms of the present disclosure, the fin may be a P-well region. The material of the source or the drain may include silicon carbide (SiC). In some forms, the one or multiple fins may all be a P-well region. Alternatively, one or some fins of the one or multiple fins are P-well regions. The respective material of the source and the drain on the fin of the P-well regions may include SiC.

[0126] In some forms of the present disclosure, the one or multiple fins may include a first fin (for example, the first fin 41) for forming a PMOS device and a second fin (for example, the second fin 42) for forming the NMOS device. The material of the source (for example, the source 45) or the drain (for example, the drain 46) on the first fin (for example, the first fin 41) may include silicon germanium. The material of the source (for example, the source 55) or the drain (for example, the drain 56) on the second fin (for example, the second fin 42) may include silicon carbide.

[0127] Forms of the semiconductor device of the present disclosure can prevent a source (or drain) on one fin from being undesirably connected to a source (or drain) on another fin, thereby being capable of improving reliability of the device. Forms of the semiconductor device of the present disclosure can also enable a formed source and drain to have a regular appearance, thereby being capable of improving performance of the device.

[0128] Forms of a method for manufacturing a semiconductor device of the present disclosure and a semiconductor device formed thereby have been described above in detail. To avoid shielding of concepts of the present disclosure, some well-known details in this field are not described. A person skilled in the art would fully understand how to implement the technical solution disclosed herein according to the above description.

[0129] Although some specific forms of the present disclosure are described in detail through examples, a person skilled in the art should understand that the above examples are used for illustration only, rather than be used for limiting the scope of protection of the present invention. A person skilled in the art should understand that amendments can be made to the forms without departing from the scope and the spirit of the present invention. The scope of the present invention is limited by the attached claims.