FORCE SENSOR WITH NOISE SHIELDING LAYER
20170350771 · 2017-12-07
Inventors
Cpc classification
G01L1/18
PHYSICS
B81B3/0086
PERFORMING OPERATIONS; TRANSPORTING
G01L1/14
PHYSICS
H10N30/883
ELECTRICITY
H02N1/08
ELECTRICITY
B81B7/0029
PERFORMING OPERATIONS; TRANSPORTING
B81B2201/0292
PERFORMING OPERATIONS; TRANSPORTING
International classification
G01L1/14
PHYSICS
G01L1/18
PHYSICS
H02N1/08
ELECTRICITY
Abstract
A force sensor having a noise shielding layer is disclosed. For a first embodiment, a top noise shielding layer is configured on a top surface of a force sensor to screen noise signals which are caused by human body's touch or approaching from top of the force sensor. For a second embodiment, a bottom noise shielding layer is configured on a bottom surface of the force sensor to screen noise signals which are caused by human body's touch or approaching from bottom of the force sensor.
Claims
1. A force sensor, comprises: a top substrate and a bottom substrate; a top electrode, configured on a bottom side of the top substrate; a bottom electrode, configured on a top side of the bottom substrate; and a first noise shielding layer, electrically coupled to ground, defining a first area for a user's press; configured on one of a top surface of the top substrate and a bottom surface of the bottom substrate.
2. A force sensor as claimed in claim 1, further comprises: a second noise shielding layer, electrically coupled to ground, defining a second area for a user's press; configured on the other one of the top surface of the top substrate and the bottom surface of the bottom substrate.
3. A force sensor as claimed in claim 1, further comprises: an intermediate layer, configured between the top electrode and the bottom electrode; wherein the intermediate layer is selected from a group consisting of an air space, piezo-capacitive material, compressive-restorable dielectric material, piezo-electric material, piezo-resistive material, and compressible-restorable semiconductor polymer.
4. A force sensor as claimed in claim 1, wherein the top substrate and the bottom substrate are formed from a single substrate.
5. A force sensor as claimed in claim 2, wherein the second noise shielding layer and the first noise shielding layer are electrically connected.
6. A force sensor, comprises: a top substrate and a bottom substrate; a pair of coplanar electrodes, configured on a top surface of the bottom substrate; and a first noise shielding layer, electrically coupled to ground, defining a first area for a user's press; configured on one of a top surface of the top substrate and a bottom surface of the bottom substrate.
7. A force sensor as claimed in claim 6, further comprises: a second noise shielding layer, electrically coupled to ground, defining a second area for a user's press; configured on the other one of the top surface of the top substrate and the bottom surface of the bottom substrate.
8. A force sensor as claimed in claim 6, further comprises: an intermediate layer, configured between the auxiliary metal and the pair of coplanar electrodes; wherein the intermediate layer is selected from a group consisting of piezo-capacitive material, compressive-restorable dielectric material, piezo-electric material, piezo-resistive material, and compressible-restorable semiconductor polymer.
9. A force sensor as claimed in claim 6, wherein the top substrate and the bottom substrate are formed from a single substrate.
10. A force sensor as claimed in claim 7, wherein the second noise shielding layer and the first noise shielding layer are electrically connected.
11. A force sensor as claimed in claim 6, further comprises: an auxiliary metal, configured on a bottom surface of the top substrate.
12. A force sensor, comprises: a top substrate and a bottom substrate; a top electrode, configured on a top side of the top substrate, defining a first area for a user's press; electrically couple to ground, and a bottom electrode, configured on a top side of the bottom substrate; wherein the top electrode functions as a first shielding layer and functions also as a counter electrode with respect to the bottom electrode.
13. A force sensor as claimed in claim 11, further comprises: one of an air space and an intermediate layer, configured between the top substrate and the bottom electrode.
14. A force sensor as claimed in claim 12, wherein a second noise shielding layer, defining a second area for a user's press; configured on a bottom surface of the bottom substrate.
15. A force sensor as claimed in claim 11, wherein the top substrate and the bottom substrate are formed from a single substrate.
16. A force sensor as claimed in claim 13, wherein the second noise shielding layer and the first noise shielding layer are electrically connected.
17. A force sensor as claimed in claim 12, wherein the intermediate layer is selected from a group consisting of an air space, piezo-capacitive material, compressive-restorable dielectric material, piezo-electric material, piezo-resistive material, and compressible-restorable semiconductor polymer.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0012]
[0013]
[0014]
[0015]
[0016]
[0017]
[0018]
[0019]
[0020]
[0021]
[0022]
[0023]
[0024]
[0025]
DETAILED DESCRIPTION OF THE INVENTION
[0026]
[0027]
[0028] A material for the shielding layer is an electrical conductive material such as metal, conductive polymer, or ito (Indium Tin Oxide). The shielding layer can be formed with network or grid to save the conductive material.
[0029]
[0030]
[0031]
[0032]
[0033] For a modified force sensor (not shown), single layer of force sensitive layer can be adopted and configured between the top electrode 111 and the bottom electrode 121.
[0034] The force sensitive layer can be used for the present invention is made of a material selected from a group consisting of piezo-electric material, dielectric material, semi-conductive material, piezo-resistive material and piezo-capacitive material.
[0035]
[0036]
[0037]
[0038]
[0039]
[0040]
[0041]
[0042]
[0043]
[0044]
[0045] A material for the intermediate layer 35 is selected from a group consisting of an air space, piezo-capacitive material, and compressive-restorable dielectric material, so that the force sensor functions as a variable capacitor with AC power. Alternatively, a material for the intermediate layer 35 is selected from a group consisting of piezo-electric material, piezo-resistive material, compressible-restorable semiconductor polymer, so that that the force sensor functions as a variable resistor with DC power.
[0046]
[0047] A material for the intermedia layer 45 is selected from a group consisting of piezo-capacitive material, and compressive-restorable dielectric material, so that the force sensor functions as a variable capacitor with AC power.
[0048] Alternatively, a material for the intermedia layer 45 is selected from a group consisting of piezo-electric material, piezo-resistive material, compressible-restorable semiconductor polymer, so that the force sensor functions as a variable resistor with DC power.
[0049]
[0050] The auxiliary metal 512 is an independent metal layer to enhance an even distribution for electric field, and without connecting to any electrode.
[0051] A material for the intermediate layer 55 is selected from a group consisting of an air space, piezo-capacitive material, and compressive-restorable dielectric material. So that the force sensor functions as a variable capacitor with AC power.
[0052] Alternatively, a material for the intermediate layer 55 is selected from a group consisting of piezo-electric material, piezo-resistive material, compressible-restorable semiconductor polymer. So that the force sensor functions as a variable resistor with DC power.
[0053] Table 1 shows Electrode Configuration v Intermediate Layer choices for the force sensor of
TABLE-US-00001 TABLE 1 Electrode configuration v Intermediate layer choices. Electrode Intermediate Force sensor Configuration Layer Choices equivalent to Power Top, bottom electrodes Air space; variable AC (FIG. 11A) piezo-capacitive material; capacitor dielectric material; Piezo-electric material; variable DC Piezo-resistive material; resistor Semiconductor polymer; Coplanar electrodes piezo-capacitive material; variable AC (FIG. 11B) dielectric material; capacitor Piezo-electric material; variable DC Piezo-resistive material; resistor Semiconductor polymer; Coplanar electrodes Air space; variable AC plus piezo-capacitive material; capacitor Enhancing metal layer dielectric material; (FIG. 11C) Piezo-electric material; variable DC Piezo-resistive material; resistor Semiconductor polymer;
[0054]
[0055]
[0056] The top electrode 61A is electrically coupled to ground, so that the top electrode 61A functions as a shielding layer and, in the meanwhile, functions as a counter electrode with respect to the bottom electrode 61B. i.e. the top electrode 61A and the bottom electrode 61B forms a variable capacitor force sensor. Capacitance exists between the top electrode 61A and the bottom electrode 61B as shown in heavy arrow in the
[0057] The variable resistor force sensor of
[0058] An air space or a compressible-restorable material can be used to replace the piezo capacitive material 62P.
[0059]
[0060]
[0061] While several embodiments have been described by way of examples, it will be apparent to those skilled in the art that various modifications may be configured without departs from the spirit of the present invention. Such modifications are all within the scope of the present invention, as defined by the appended claims.
TABLE-US-00002 Numerical system top substrate 11 top electrode 111 force sensitive layers 112, 122 Area 115 induced capacitor 11C bottom substrate 12 substrate 13 (11 + 12) noise shielding layer 21 noise shielding layer 22 electrode 31A, 31B substrate 32A, 32B noise shielding layer 33A, 33B intermediate layer 35, 45, 55 electrode 41A, 41B substrate 42A, 42B noise shielding layer 43A, 43B electrode 51A, 51B substrate 52A, 52B noise shielding layer 53A, 53B top electrode 61A (top shielding layer 61A) bottom electrode 61B top substrate 62A bottom substrate 62B piezo capacitive material 62P bottom shielding layer 63