Support device for a plurality of wafers for a vertical oven

Abstract

A support device that has a central axis and includes three uprights extending substantially parallel to the central axis, a plurality of series of support members spaced along the central axis, each series of support members comprising three support members adapted to support one wafer of the plurality of wafers and extending in different essentially longitudinal directions transverse to the central axis, each support member being mounted directly on a separate upright, this support device being remarkable in that the directions of the three support members of each series of support members are concurrent at a point on the central axis.

Claims

1. A support device for a plurality of wafers, the support device being adapted to be loaded into a heat treatment oven, the support device having a central axis, the support device including: three uprights extending substantially parallel to the central axis, and a plurality of series of support members spaced along the central axis, each series of support members comprising three support members delimiting a central area, the three support members of each series of support members being adapted to support one wafer of the plurality of wafers in the central area, the central areas of all the series of support members defining a cylinder, the axis of which is the central axis, the three support members of each series of support members extending in different essentially longitudinal directions transverse to the central axis, each support member within each series of support members being connected to a separate upright, each series of support members including at least two connecting arms between at least two respective support members and at least two respective uprights, each connecting arm extending in a first direction from the respective upright that is different from and at an angle to a second direction in which the support member to which the connecting arm is connected extends, each connecting arm being contained within a peripheral area of the cylinder, the directions of the three support members of each series of support members being concurrent at a point on the central axis.

2. The support device of claim 1, comprising a cylinder portion and a peripheral area portion, the cylinder portion being the volume of the cylinder contained between two successive central areas along the central axis and the peripheral area portion extending radially relative to the cylinder portion, the connecting arms being disposed in the peripheral area portion.

3. The support device of claim 2, wherein the support members of each series of support members are adapted to essentially form a point contact with the corresponding wafer.

4. The support device of claim 2, wherein the uprights are disposed, in cross section, in an angular space around the central axis less than 180°.

5. The support device of claim 1, wherein the support members of each series of support members are adapted to essentially form a point contact with the corresponding wafer.

6. The support device of claim 5, wherein the uprights are disposed, in cross section, in an angular space around the central axis less than 180°.

7. The support device of claim 5, wherein the support members of each series of support members are transversely distributed substantially uniformly along the central axis.

8. The support device of claim 5, wherein the connecting arms are straight.

9. The support device of claim 5, wherein the connecting arms are curved.

10. The support device of claim 1, wherein the uprights are disposed, in cross section, in an angular space around the central axis less than 180°.

11. The support device of claim 10, wherein the support members of each series of support members are transversely distributed substantially uniformly along the central axis.

12. The support device of claim 10, wherein the connecting arms are straight.

13. The support device of claim 10, wherein the connecting arms are curved.

14. The support device of claim 1, wherein the support members of each series of support members are transversely distributed substantially uniformly along the central axis.

15. The support device of claim 1, wherein the connecting arms are straight.

16. The support device of claim 1, wherein the connecting arms are curved.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) Other features, aims and advantages of the invention will emerge from the following description, which is purely illustrative and is not limiting in the invention, and which should be read in conjunction with the accompanying drawings in which, in addition to FIGS. 1A, 1B and 2 already discussed:

(2) FIGS. 3A to 3C are diagrams showing a support device in accordance with the invention; and

(3) FIGS. 4A to 4C are diagrams showing the support device in accordance with the invention.

DETAILED DESCRIPTION

(4) For the various embodiments, to simplify the description, the same references are used for elements that are identical or have the same function.

(5) A support device 110 shown in FIGS. 3A to 3C is a device for supporting a plurality of wafers, the support device 110 being adapted to be loaded into a heat treatment oven, the support device 110 having a central axis, the support device 110 including:

(6) three uprights 130, 131 and 132 extending substantially parallel to the central axis,

(7) a plurality of series of support members 135 spaced along the central axis, each series of support members 135 comprising three support members 140, 141 and 142 adapted to support one wafer W of the plurality of wafers and extending in different essentially longitudinal directions transverse to the central axis, each support member 140, 141 and 142 being mounted directly on a separate upright 130, 131, 132 and the directions of the three support members 140, 141 and 142 of each series of support members 135 are concurrent at a point on the central axis.

(8) The uprights 130, 131 and 132 are advantageously the same length and are parallel to the central axis of the support device 110.

(9) The uprights 131 and 132 have a lateral spacing at least equal to the diameter of the wafers that the support device 110 is adapted to support. This is to allow wafers W to pass between the uprights 131 and 132 in a horizontal position.

(10) In a particularly advantageous manner, the uprights 130, 131 and 132 are equidistant from the central axis.

(11) The series of support members 135 are spaced along the central axis. Each series of support members 135 is adapted to support one wafer W in a horizontal position when the support device 110 is being used.

(12) Each series of support members 135 comprises three support members 140, 141 and 142. The support members 140, 141 and 142 of each series of support members 135 are mounted directly on the uprights 130, 131 and 132, respectively.

(13) The support members 140, 141 and 142 of a series of support members 135 are disposed so as to support one wafer W essentially horizontally in a stable equilibrium position.

(14) The support members 140, 141, 142 extend in different directions, the directions being concurrent at a point on the central axis.

(15) In a particularly advantageous manner, as shown in FIG. 3C, the support members 140, 141 and 142 of each series of support members 135 are adapted to essentially make a point contact with the corresponding wafer W. The angle between a support member and a perpendicular to the upright on which it is mounted is preferably less than 5°.

(16) The support members 140, 141 and 142 are advantageously distributed substantially uniformly along the central axis.

(17) The present invention also relates to another support device.

(18) A support device 210 shown in FIGS. 4A-4C is a support device for a plurality of wafers, the support device 210 being adapted to be loaded into a heat treatment oven, the support device 210 having a central axis, the support device 210 including:

(19) three uprights 230, 231 and 232 extending substantially parallel to the central axis,

(20) a plurality of series of support members 235 spaced along the central axis, each series of support members 235 comprising three support members 240, 241 and 242 delimiting a central area ZC, the three support members 240, 241 and 242 of the series of support members 235 being adapted to support one wafer W from the plurality of wafers in the central area ZC, the central areas ZC of all the series of support members 235 defining a cylinder CC the axis of which is the central axis, the three support members 240, 241 and 242 of each series of support members 235 extending in different essentially longitudinal directions transverse to the central axis, each of the support members 240, 241 and 242 being connected to a separate upright, each series of support members 235 includes at least two connecting arms 250, each connecting arm 250 being adapted to connect a support member to an upright, each connecting arm 250 being contained within a peripheral area of the cylinder CC, and the directions of the three support members 240, 241 and 242 of each series of support members are concurrent at a point on the central axis.

(21) The uprights 230, 231 and 232 are advantageously the same length and are parallel to the central axis of the support device 210.

(22) In a particularly advantageous manner, the uprights 230, 231 and 232 are equidistant from the central axis.

(23) The series of support members 235 are spaced along the central axis. Each series of support members 235 is adapted to support one wafer W in a horizontal position when the support device 210 is being used.

(24) Each series of support members 235 comprises three support members 240, 241 and 242.

(25) The support members 240, 241 and 242 of a series of support members 235 are disposed so as to support one wafer W substantially horizontally in a stable equilibrium position in a central area ZC corresponding to the area occupied by a wafer W. The central area ZC defines a cylinder CC centered on the central axis. At least two of the support members 240, 241 and 242 of each series of support members 235 are connected to the uprights 230, 231 and 232, respectively, of the different connecting arms 250. The connecting arms 250 are disposed in a peripheral area ZP of the central cylinder CC.

(26) The support members 240, 241 and 242 extend in different directions, the directions being concurrent at a point on the central axis.

(27) In a particularly advantageous manner, the support device 210 comprises a cylinder portion PC and a peripheral area portion PP, the cylinder portion PC being the volume of the cylinder CC contained between two successive central areas ZC along the central axis and the peripheral area portion PP extending radially relative to the cylinder portion PC, the connecting arms 250 being disposed in the peripheral area portion PP.

(28) The support members 240, 241 and 242 of each series of support members 235 are advantageously adapted to essentially form a point contact with the corresponding wafer.

(29) The uprights 230, 231 and 232 are advantageously disposed, in cross section, in an angular space around the central axis less than 180°.

(30) The support members 240, 241 and 242 of each series of support members 235 are advantageously transversely distributed substantially uniformly along the central axis.

(31) The connecting arms are advantageously straight or curved.

(32) The execution of a step of heat treatment of wafers disposed in a support device in accordance with the invention, the device being inserted into a vertical oven, enables greater uniformity of the wafers to be obtained. This result is valid for a support device whether it is equipped with connecting arms or not.

(33) Thus, the invention makes it possible to limit blocking of any of the radiant flux by the support members, thus enabling the uniformity of the heat treatment of the wafers to be improved.