Coupled heterogeneous devices for pH sensing
09835634 · 2017-12-05
Assignee
- The Board Of Trustees Of The University Of Illinois (Urbana, IL)
- Purdue Research Foundation (West Lafayette, IN)
Inventors
- Rashid Bashir (Champaign, IL)
- Bobby Reddy (Savoy, IL, US)
- Muhammad A Alam (West Lafayette, IN, US)
- Pradeep R Nair (Kerali, IN)
- Jonghyun Go (Seongnam-si, KR)
Cpc classification
G01N33/94
PHYSICS
G01N27/414
PHYSICS
C12Q1/25
CHEMISTRY; METALLURGY
International classification
G01R19/00
PHYSICS
G01N33/94
PHYSICS
G01N33/50
PHYSICS
C12Q1/25
CHEMISTRY; METALLURGY
G01N27/414
PHYSICS
Abstract
Provided herein are methods and devices for measuring pH and for amplifying a pH signal to obtain ultrasensitive detection of changes in pH. This is achieved by providing a sensor and a transducer, wherein the sensor transconductance is sensitive to changes in pH and the transducer transconductance is not affected by pH change. The transducer instead compensates for changes in the sensor transconductance arising from pH change. The unique configuration of the sensor and transducer with respect to each other provides substantial increases in a pH amplification factor, thereby providing pH sensing devices with a giant Nernst response and, therefore, effectively increased pH sensitivity.
Claims
1. A method of amplifying a pH signal, the method comprising the steps of: providing a sensor comprising a source electrode, a drain electrode, a sensor channel provided between the source and drain electrodes, and a sensing surface over at least a portion of the sensor channel, wherein the sensor channel has a first transconductance; providing a transducer comprising a source electrode, a drain electrode, and a transducer channel provided between the source and drain electrodes, wherein the transducer channel has a second transconductance, and the second transconductance is greater than the first transconductance; applying a material to the sensing surface, wherein a change in pH generates a conductance modulation of the sensor channel; and adjusting a bias of the transducer to counterbalance the conductance modulation of the sensor channel; thereby amplifying the pH signal of the material; wherein the amplifying corresponds to an amplification factor defined by:
2. The method of claim 1, wherein the amplification factor is greater than or equal to 20.
3. The method of claim 2, wherein the selecting step comprises selecting a width and/or a length of: the transducer channel, the sensor channel, or both, so that (W/L).sub.1/(W/L).sub.2 is greater than or equal to 20.
4. The method of claim 3, wherein the sensor channel is a nanoplate and the transducer channel is a nanowire.
5. The method of claim 2, wherein the selecting step comprises mobility scaling so that the sensor channel has a higher mobility than a transducer channel mobility, and wherein the mobility scaling comprises: providing a first material for the sensor channel and a second material for the transducer channel, wherein the first material has a higher mobility than the second material; or providing the sensor as part of an n-channel metal-oxide-semiconductor field-effect transistor (nMOS) and the transducer as part of a p-channel metal-oxide-semiconductor field-effect transistor (pMOS).
6. The method of claim 2, wherein the selecting step comprises oxide thickness scaling so that C.sub.OX,1 is greater than C.sub.OX,2 by at least a factor of 20.
7. The method of claim 6, wherein the oxide thickness scaling comprises: a dual oxide process to provide an oxide layer thickness of the sensor that is greater than an oxide layer thickness of the transducer; or providing a sensor channel material having a higher k-dielectric than a transducer channel material k-dielectric; or providing an oxide layer thickness of the sensor that is greater than an oxide layer thickness of the transducer by a dual oxide process and providing a sensor channel material that is a higher k-dielectric than the transducer channel material.
8. The method of claim 2, wherein the selecting step comprises bias scaling so that V.sub.DS,1 is greater than or equal to V.sub.DS,2 by a factor of at least 20; and wherein the bias scaling provides real-time tunability of sensor performance.
9. The method of claim 1, wherein: the transducer channel is biased to a top gate or to a bottom gate; or the sensor channel is biased to a fluid gate that is at least partially immersed in the material.
10. The method of claim 1, wherein the transducer further comprises a transducer surface and the material is provided on the transducer surface, wherein the second transconductance is substantially independent of pH.
11. The method of claim 1, wherein the transducer is positioned outside of a well in which the material is confined.
12. The method of claim 1, used in an application selected from the group consisting of nucleotide sequencing, environmental toxic monitoring, pharmaceutical testing, food testing, cancer monitoring, and detection of enzyme activity.
13. The method of claim 1, wherein the material comprises a fluid electrolyte.
14. The method of claim 1, wherein the material comprises a biological cell and intracellular pH is measured, extracellular pH is measured, or both intracellular and extracellular pH is measured.
15. The method of claim 1, wherein the sensing surface comprises an oxide surface and wherein: the oxide surface interacts with a proton; or the oxide surface comprises OH surface groups that react with protons to provide a sensor channel transconductance modulation that is pH dependent.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1)
(2)
(3) ), and SiNW.sup.15 (⋄)-based ISFETs. Here a Si n-MOSFET serves as T.sub.2. The rest (black) symbols indicate the experimental data from several DGFET sensors in the literature..sup.6-8 The solid black line represents the theoretical limit of the DGFET sensors.
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DETAILED DESCRIPTION OF THE INVENTION
(13) In general, the terms and phrases used herein have their art-recognized meaning, which can be found by reference to standard texts, journal references and contexts known to those skilled in the art. The invention may be further understood by the following non-limiting examples. All references cited herein are hereby incorporated by reference to the extent not inconsistent with the disclosure herewith. Although the description herein contains many specificities, these should not be construed as limiting the scope of the invention but as merely providing illustrations of some of the presently preferred embodiments of the invention. For example, the scope of the invention should be determined by the appended claims and their equivalents, rather than by the examples given.
Example 1
Coupled Heterogeneous Nanowire-Nanoplate Planar Transistor Sensors for Giant Nernst Response
(14) Provided herein is a comprehensive theory of pH response of a coupled ISFET sensor to show that the maximum achievable response is given by: ΔV/ΔpH=59 mV/pH×α, where 59 mV/pH is the Nernst response and α is an amplification factor that depends on the geometrical and electrical properties of the sensor and transducer nodes. While the intrinsic Nernst response of an electrolyte/site-binding interface is fundamental and immutable, we show that by using channels of different materials, areas, and bias conditions, the extrinsic sensor response can be increased dramatically beyond the Nernst limit. We validate the theory by measuring pH response of Si nanowire-nanoplate transistor pair that achieves >10V/pH response and show the potential of the scheme to achieve (asymptotically) the theoretical lower-limit of signal-to-noise ratio (SNR) for a given configuration. Even larger pH response can be obtained based on recent trends in heterogeneous integration on the Si platform.
(15) The search for a miniaturized, highly integrated, and lower cost replacement of the Beckman pH meter.sup.1 dates back to 1970s when Bergveld proposed the CMOS-compatible concept of ion-sensitive field effect transistor.sup.2 (ISFETs,
(16) A recent trend for such amplification is based on double-gate silicon-on-insulator FET (DGFET) and a “super” Nernst response of ˜1V/pH has been demonstrated.sup.6-9. As discussed below, the need to use high fluid gate bias, the poorer quality of bottom oxide, the high cost of silicon-on-insulator (SOI) wafer suggest opportunities to develop alternative techniques. In this example, an alternative is presented based on a highly integrated Si nanoplate (NP)-nanowire (NW) transistor pair that is compatible with planar Si processing technology, see
(17) Operation of Single and Double-Gated ISFETs. A classical ISFET pH sensor involves a simple modification of the standard metal oxide field effect transistor (MOSFET) with the poly-Si gate (on top of the gate oxide) replaced by an electrolyte and a fluid gate, as shown in
(18) The pH sensitivity of an ISFET is understood as follows (see Ref. [10] for detailed analysis): The amphoteric OH groups at gate oxide/buffer undergo protonation/deprotonation of interface as a function of surface proton density, [H.sup.+].sub.S Assuming Boltzmann distribution for ions in buffer solution, we have
[H.sup.+].sub.S=[H.sup.+].sub.Be.sup.−q(ψ.sup.
where [H.sup.+].sub.S is the bulk proton density, pH=−log.sub.10[H.sup.+].sub.S, and ψ.sub.0 is the oxide/buffer interface potential, k.sub.B is the Boltzmann constant, and T is the temperature. Accordingly, any change in buffer pH manifests as an effective change in surface potential (or an effective change in applied bias for constant current operation) as ΔV.sub.G≈2.303(k.sub.BT/q)ΔpH. Hence the maximum pH sensitivity, known as the Nernst limit, is ΔV.sub.G/ΔpH=59 mV/pH in room temperature. In practice, the sensitivity is always less than the intrinsic Nernst limit (associated with electrolyte/oxide interface) due to the high electrolyte screening, protonation affinity of sensor surface, and most importantly, finite semiconductor capacitance of an ISFET.sup.10.
(19) Recently many recent experimental.sup.6-8 and theoretical works.sup.9 suggest this response can be ‘amplified’ through innovative device geometry, and in fact, a super-Nernst sensitivity ˜1V/pH can be achieved by using the double-gate SOI structures (DGFET). There are two gates (top and bottom one) in a DGFET sensor. And the key is to restore the change in I.sub.D due to pH change not by the fluid gate (as in ISFET), but rather through the bottom gate. The conductance change at the top surface of the channel (due to pH shift) is compensated by the change in conductance at the bottom surface to maintain constant current operation. The corresponding pH sensitivity of a DGFET sensor is
(20)
where C.sub.tox and C.sub.box are the top and bottom gate oxide capacitance, so that the amplification factor α=(C.sub.tox/C.sub.box)α.sub.SN>>1(α.sub.SN≦1). For DGFET sensors, the bias and geometry dependent factor α.sub.SN<1. Note that the intrinsic Nernst limit (59 mV/pH), associated with electrolyte and site-binding layer is fundamental and cannot be changed by new device configurations (ISFET or DGFET) or novel transducers. The amplified extrinsic Nernst response, however, simplifies detection and improves the practical signal-to-noise ratio (SNR), and is utilized herein to obtain high-sensitivity pH sensors.
(21) For maximum sensitivity, α.sub.SN.fwdarw.1, of a DGFET sensor (Eq. 2), the top channel of the device must be biased in inversion through the fluid gate. Biasing the fluid gate at high voltage is challenging because (i) large fluidic bias often leads to significant leakage current and reduced device lifetime.sup.11, and (ii) if the bias exceeds the formal potential of the electrode, a Butler-Volmer reaction.sup.12 at the fluidic electrode may make the fluid gate potential undefined. Moreover, a shared bottom gate electrode of the DGFET technology makes it difficult to integrate multiple, individually accessible sensors within a common platform, as required in applications such as Ref. [5]. Finally, applying too high a bias on the poorer-quality bottom oxide may lead to hysteresis and unstable device operation. Hence, a super-Nernst sensor that does not require high fluid bias, is not constrained by the geometric/material features of the DGFET, and can be integrated better with the traditional planar technology, is desirable.
(22) “Giant” Nernst (GN) scheme. Consider an accumulation-mode NP-NW transistor pair shown in
(23) For the accumulation-mode devices, the drain current modulation in T.sub.2 is given as
ΔI.sub.D,2=μ.sub.2C.sub.OX,2(W/L).sub.2V.sub.DS,2ΔV.sub.G,2, (3)
where μ.sub.2 is the channel mobility, C.sub.OX,2 is the gate oxide capacitance, W and L is the channel width and length, V.sub.DS,2 is the drain bias, and ΔV.sub.G,2 is the gate bias modulation. Since T.sub.1 and T.sub.2 are in accumulation regime, the band bending at the channel surface is very small. Hence the current modulation of T.sub.1 due to any pH-induced modulation of top-oxide/buffer interface potential is given by ΔI.sub.D,1=μ.sub.1C.sub.OX,1(W/L).sub.1V.sub.DS,1ΔV.sub.G,1 (note that ΔV.sub.G,1 is limited by the Nernst limit). The scheme requires adjustment of the bias of T.sub.2 to counterbalance the conductance modulation of T.sub.1, so that
(24)
(25) Equation (4) suggests that GN scheme achieves significant amplification over DGFET sensors (i.e., α.sub.GN>>α.sub.SN) by (i) Scaling of device dimension, so that W/L of T.sub.1 far exceeds that of T.sub.2 (and hence the use of NP and NW transistor couple). (ii) Mobility scaling so that T.sub.1 has higher mobility than T.sub.2. This can be achieved by using NMOS/PMOS pair for T.sub.1/T.sub.2 or by using different channel materials. (iii) Oxide thickness scaling—this option is similar to the DGFETs. For maximum amplification, C.sub.OX,1>>C.sub.OX,2. This is achieved through oxide thickness scaling in a dual oxide process or by using higher-k dielectrics for T.sub.1 compared to T.sub.2 or a combination thereof. And finally, (iv) Bias scaling so that V.sub.DS of T.sub.2 is smaller than that of T.sub.1. This option of bias scaling provides a post-process, point-of-care option to tune the sensor performance. Since the geometry of DGFET precludes the use of device, bias, and mobility scaling, the response is typically limited to ˜1V/pH.
(26)
(27) To understand the overall response of first configuration (bottom gate operation of T.sub.2) we first characterize the T.sub.1-T.sub.2 responses independently (
(28) Recalling the current change in T.sub.1 (ΔI.sub.D,1) needs to be compensated by T.sub.2 (ΔI.sub.D,2=ΔI.sub.D,1), we obtain the “combined” transfer characteristics (I.sub.D vs. V.sub.G,2 shown in
(29) To measure the pH sensitivity in the second configuration of NW biasing (top gate operation of T.sub.2, sensitivity shown as dots in the middle and bottom of the plot in
(30) Eq. (4) suggests that the sensor response could be further improved if the NP and NW sensors are made of different channel materials, so that their mobility asymmetry (μ.sub.1/μ.sub.2>>1) can be used for the amplified sensor response. To estimate the possible gain in sensitivity by combing transistors of different materials, we first measure the transfer characteristics of a set of Si n-MOSFET devices, which would serve as the transducer node, T.sub.2. Next, we extract the slopes of pH responses (ΔI.sub.DIΔpH) of devices with different channel materials.sup.13-15 reported in the literature, each of which may potentially serve as the sensor node, T.sub.1. Finally, we calculate the combined pH sensitivity of these heterogeneous T.sub.1-T.sub.2 pairs.
(31) Considerations of Dynamic Range, SNR, and minimum pH resolution In contrast to ISFET pH sensor showing wide dynamic range of pH sensing.sup.16, the high sensitivity of the GN scheme is realized at the expense of reduced dynamic range (analogous to the gain-bandwidth product of a traditional transistor). For many applications in healthcare, where the dynamic range of interest is small (7.35-7.45 for human blood pH; ΔpH˜0.02 for Ref. Error! Reference source not found.), the tradeoff of higher sensitivity for reduced dynamic range is fully justified. However, excessive gain requires repeated changing of DC bias to cover the pH-range of interest, which is cumbersome and counterproductive. In addition, practical concerns of applying high-bias on gate oxide (for the bottom-gated NW corresponding to top plot dots in
(32) Regarding the signal-to-noise ratio (SNR), another key parameter of pH sensor, it is important to realize that the theoretical lower limit of SNR and minimum pH-resolution (ΔpH.sub.min) of the GN scheme are still defined by those of its detector (T.sub.1). In practice, however, fundamental considerations of measurement noise and biasing configuration ensure that the GN-scheme achieves better ΔpH.sub.min far more easily than either NP or NW sensor could in isolation, as discussed below.
(33) The 1/f noise is the dominant source of noise at frequencies relevant for pH sensors.sup.17 and its power-spectrum is given by S.sub.V.sub.δV.sub.G
.sup.2∝1/A (A is a device area), or
(34)
is a preractor). For a typical single NW pH sensor this noise-floor makes the pH-resolution limited to
(35)
(36) Indeed, a key concern for typical NW pH sensor is that such low resolution due to small A.sub.NW might be unacceptable for many physiological applications.sup.18.
(37) On the other hand, if the larger area NP sensor (T.sub.1) is used in the ISFET configuration, the noise floor (solid line,
(38)
as defined by the vertical gap (in log plot) between the top dots and the bottom line in
(39) The additional SNR advantage of T.sub.1-T.sub.2 combination becomes apparent, however, when the noise of the measurement instrument, δV.sub.Ins, is taken into account. If δV.sub.NP<δV.sub.Ins—as can always be conveniently arranged by increasing the size of the NP (T.sub.1) transistor, we find that the pH resolution for the NP alone would have been limited by instrument noise, i.e.,
(40)
and therefore the signal from the NP alone will remain poorly resolved. However, the same signal can still be detected by the T.sub.1-T.sub.2 combination as
(41)
if δV.sub.ins is larger than δV.sub.NW and δV.sub.NP thus ΔpH.sub.min.sup.ins|.sub.NP>>ΔpH.sub.min.sup.ins|.sub.NP-NW (See Table S1). This is illustrated by the increasing gap between instrument noise (middle band) and sensitivity (top dots) in
(42) In this example, we establish a framework of a new class of ISFET-sensors that achieves high sensitivity by physically decoupling the sensor from the transducer node. This principle is used to design a nanoplate-nanowire transistor pair, which shows (consistent with theoretical prediction) sensitivity>10V/pH, which is significantly higher than previous reports based on DGFET pH sensors. Furthermore, we show that pH sensitivity close to 100V/pH may be achieved by incorporating high mobility materials as a sensor node coupled to a low-mobility traducer. The high sensitivity improves pH-resolution as well as signal-to-noise ratio, especially when sensor precision is limited by the noise of the measurement instrument. The improvement of sensitivity, however, must be counter-balanced against the requirement of dynamic range for pH sensing and practical requirements of device scaling. This generic nature of the concept, combined with its compatibility to conventional top-down CMOS processing technology, should make the concept relevant for applications in biomedical areas such as proton-based genome sequencers, environmental toxin monitoring, pharmaceutical testing, etc., in which precise pH monitoring is critical to its sequencing accuracy.
Example 2
Fabrication Methods of Nanowire and Nanoplate Devices
(43) The devices are fabricated using top down fabrication, starting with bonded SOI wafers. 8″ bonded SOI wafers (SOITECH) doped p-type at 10.sup.15/cm.sup.2 with BOX thickness of 145 nm and superficial silicon thickness of 55 nm were first laser cut into 4″ wafers by Ultrasil Corp. Wafers were then oxidized for 11 minutes at 1000° C. to grow 30 nm of oxide and placed into buffered oxide etch (BOE) to thin down the top silicon to around 350 Å. Wafers were doped with boron at 10 KeV at a dose of 10.sup.14 cm.sup.−2 and a tilt of 7°. Next, the gate dielectric was formed. For SiO.sub.2 devices, the wafers are dry oxidized for 1 minute at 1000° C. to form a gate oxide of around 50 Å, which was measured via ellipsometry on monitor wafers also present during the oxidation run. This also serves as a dopant activation step. For HfO.sub.2 devices, after a brief BOE dip and dopant activation in nitrogen for 3 minutes at 1000° C., the wafers were placed into an atomic layer deposition (ALD) machine for 150 cycles of HfO.sub.2 for a target thickness of 150 Å. Wafers were then subjected to a Rapid Thermal Anneal (RTA) for 1 min at 950° C., followed by a Forming Gas Anneal (FGA) for 30 minutes at 450° C. in 5% H.sub.2 in N.sub.2 to reduce interfacial trapped charge, mobile charge, and fixed charge. Next, vias were formed in the silicon mesas with optical lithography and subsequent BOE etch to make solid, crack-free connection between metal interconnects and the silicon layers. AFM was performed over these regions to determine the silicon thickness (≈300 Å) and the gate dielectric thickness (≈50 Å for SiO.sub.2, 150 Å for HfO.sub.2).
(44) Device Measurement in pH Environment. The pH measurements utilized two separate devices. The main sensing chip with the nanoplate device (2 μm wide) had a 150 Å thick HfO.sub.2 dielectric, while the device exhibiting the GN response (a 50 nm wide nanowire device) contained a 50 Å thick SiO.sub.2 dielectric. Both chips were fitted with open PDMS wells for containing the fluid. The values for the pH for each solution were measured separately with a commercial pH meter. The fluidic environments over the two separate chips were biased with two leak-free Ag/AgCl reference electrodes purchased from Warner Instruments. A 1× phosphate buffer saline (PBS) solution at pH 7.4 was used for the nanowire device for the entire experiment to enable normal transfer characteristics. Robinson buffers (0.04 M of phosphoric, boric, and acetic acid) with titrated HCl and NaOH, which have good buffering capacity over wide pH ranges, were manually pipetted and rinsed in the PDMS well over the nanoplate device, followed by a 5 minute settling time to allow the surface charge to equilibrate. Transfer characteristics were measured using a Keithley 4200 semiconductor characterization system. The source and drain nodes of the devices were shorted together to create the full GN response sensor, and current was measured at the shorted source nodes of the devices.
References
(45) [1] Arnold O. Beckman, Henry E. Fracker, Apparatus for Testing Acidity, U.S. Pat. No. 2,058,761 (1936). [2] Piet Bergveld, Sens. Actuators B: Chem. 88, pp. 1-20 (2003). [3] Fernando Patolsky, Gengfeng Zheng and Charles M. Lieber, Anal. Chem. 78, pp. 4260-4269 (2006). [4] Alexander Star, Jean-Christophe P. Gabriel, Keith Bradley, and George Grüner, Nano Lett. 3, pp. 459-463 (2003). [5] Jonathan M. Rothberg, Wolfgang Hinz, Todd M. Rearick, Jonathan Schultz, William Mileski, Mel Davey, John H. Leamon, Kim Johnson, Mark J. Milgrew, Matthew Edwards et al., Nature 475, pp. 348-352 (2011). [6] Mark-Jan Spijkman, Jakob J. Brondijk, Tom C. T. Geuns, Edsger C. P. Smits, Tobias Cramer, Francesco Zerbetto, Pablo Stoliar, Fabio Biscarini, Paul W. M. Blom, and Dago M. de Leeuw, Adv. Funct. Mater. 20, pp. 898-905 (2010). [7] M. Spijkman, E. C. P. Smits, J. F. M. Cillessen, F. Biscarini, P. W. M. Blom, and D. M. de Leeuw, Appl. Phys. Lett. 98, 043502 (2011). [8] O. Knopfmacher, A. Tarasov, Wangyang Fu, M. Wipf, B. Niesen, M. Calame, and C. Schonenberger, Nano Lett. 10, pp. 2268-2274 (2010). [9] Jonghyun Go, Pradeep R. Nair, Bobby Reddy, Brian Dorvel, Rashid Bashir, and Muhammad A. Alam, Electron Devices Meeting (IEDM), 2010 IEEE International (2010). [10] Luc Bousse, Nico F. De Rooij, and Piet Bergveld, Electron Devices, IEEE Transactions on, 30, pp. 1263-1270 (1983). [11] Eric Stern, James F. Klemic, David A. Routenberg, Pauline N. Wyrembak, Daniel B. Turner-Evans, Andrew D. Hamilton, David A. LaVan, Tarek M. Fahmy, and Mark A. Reed, Nature, 445, pp. 519-522 (2007). [12] A. J. Bard and L. R. Faulkner, Electrochemical Methods: Fundamentals and Applications, John Wiley, New York, 1980. [13] Takuya Kokawa, Taketomo Sato, Hideki Hasegawa, and Tamotsu Hashizume, J. Vac. Sci. Technol. B 24, pp. 1972-1976 (2006). [14] G. Steinhoff, M. Hermann, W. J. Schaff, L. F. Eastman, M. Stutzmann, and M. Eickhoff, Appl. Phys. Lett. 83, 177 (2003). [15] X. T. Vu, R. GhoshMoulick, J. F. Eschermann, R. Stockmann, A. Offenhäusser and S. lngebrandt, Sens. Actuators B:Chem. 144, pp. 354-360 (2010). [16] Songyue Chen, Johan G. Bomer, Edwin T. Carlen, and Albert van den Berg, Nano Lett. 11, pp. 2334-2341 (2011). [17] C. G. Jakobson and Y. Nemirovsky, Electron Devices, IEEE Transactions on, 46, pp. 259-261 (1999). [18] Xueji Zhang, Huangxian Ju, and Joseph Wang, Electrochemical Sensors, Biosensors and their Biomedical Applications, Academic Press, 2007.
(46) I. Theoretical Frameworks of Giant-Nernst (GN) Scheme
(47) To understand the Giant-Nernst pH response, let us first develop a general model to predict the pH response for decoupled T.sub.1-T.sub.2 platform and then compare the analytical results with numerical simulations and experimental results. Assume that T.sub.1-T.sub.2 is the accumulation-type device. Under such linear operating regimes, the drain current modulation in T.sub.2 is given as
ΔI.sub.DS,2=μ.sub.1C.sub.OX,2(W/L).sub.2V.sub.DS,2ΔV.sub.G,2 (S1)
(48) We now consider two operation regimes of GN scheme: If T.sub.1 is in accumulation regime, the band bending at the channel surface is very small. Hence the current modulation of T.sub.1 due to any pH induced modulation of top-oxide/buffer interface potential (ΔV.sub.G,1) is given by, ΔI.sub.DS,1=μ.sub.1C.sub.OX,1(W/L).sub.1V.sub.DS,1ΔV.sub.G,1. The proposed scheme (
(49)
(50) Appropriate design can achieve α.sub.GN>>1 while the maximum amplification of current DGFET schemes is limited by the condition α.sub.SN=1.
(51) On the other hand, if T.sub.1 is in the depletion regime, its conductance modulation is due to the changes in depletion charge. Semi-classical analysis 0 indicates that the depletion charge is given as Q.sub.1=Q.sub.0(1−√{square root over (1+V.sub.G,1/V.sub.0)}) where Q.sub.0 ≡∈.sub.SiqN.sub.A/C.sub.OX,1 and V.sub.0≡∈.sub.SiqN.sub.AN.sub.A/2C.sub.OX,1.sup.2, respectively. Correspondingly the pH induced current modulation of T.sub.1 is equal to
ΔI.sub.DS,1=μ.sub.1(W/L).sub.1V.sub.DS,1Q.sub.0(√{square root over (1+V.sub.G,1/V.sub.0)}−√{square root over (1+(V.sub.G,1+ΔV.sub.G,1)/V.sub.0)}). (S3)
(52) Thus the corresponding sensing signal from T.sub.2 can be expressed as
(53)
(54) Clearly, the pH response is a function of the gate bias in T.sub.1 in contrast to the accumulation regime. Equation (S4) can be simplified such that ΔV.sub.G,2≈α.sub.GN (Q.sub.0/2C.sub.OX,2√{square root over (V.sub.0)})ΔV.sub.G,1/√{square root over (V.sub.G,1)} if V.sub.G,1>>ΔV.sub.G,1,V.sub.0. This analytical expression implies the decrease of sensitivity as the bias (V.sub.G,1) increases. However, the GN scheme still offers significant amplification over DGFET sensors as α.sub.GN>>1.
(55) Although Eqs. (S2) and (S4) clearly indicate that significant amplification can be achieved through the GN scheme, the above analysis is not complete as the pH dependent modulation of top-oxide/buffer interface potential of T.sub.1 (ΔV.sub.G,1) is not an independent parameter. Hence, we numerically solve for the electrostatics of the sensor-buffer system, as described by the following equations:
−∇(∈.sub.w∇Ψ)=qn.sub.0(exp(−βΨ)−exp(βΨ)), (S5)
−∇(∈.sub.Si∇Ψ)=q(n.sub.i(exp(−βΨ)−exp(βΨ))−N.sub.A), (S6)
∈.sub.OX∇Ψ−∈.sub.w∇Ψ=ρ.sub.OH.sub.
(56) Here Ψ represent the electrostatic potential. Equation (S5) represents the electrostatics of the buffer (n.sub.0—ion concentration), while eq. (S6) describes the semiconductor (n.sub.i—intrinsic carrier concentration and N.sub.A is the p-type doping density). Eq. (S7) describes top oxide/buffer interface whose RHS denotes the pH dependent charge due to the protonation/de-protonation of surface OH groups. This charge is modeled as function of buffer H.sup.+ concentration through the well-known site binding model 0 and will not be discussed in detail here. We self-consistently solve the system of non-linear equations, (S5)-(S7), with appropriate boundary conditions to estimate the charge modulation (and hence the conductance modulation, assuming constant mobility) in the semiconductor due to changes in pH, bias conditions, etc.
(57)
(58) II. Noise Consideration of Giant-Nernst (GN) Scheme: We address the noise and its ratio to the signal (SNR) of our GN scheme, which consists of a nanoplate (NP, T.sub.1) and a nanowire (NW, T.sub.2). Although there are several sources of noises in ISFET-based pH sensor, we assume that the noise is dominated by the FET's 1/f noise, not by the electrolyte noise (I.sub.0˜10 mM), which was demonstrated in Ref [3] As we define the sensitivity in terms of the shift in gate voltage (V.sub.G) due pH changes, its corresponding noise in V.sub.G(√{square root over (<δV.sub.G.sup.2>)}) dictates SNR.
(59) If the sensor is operated in its linear regime, its noise in terms of the voltage fluctuation is given by the following equations [3]:
(60)
(61) For a given low (f.sub.1) and high frequency cutoff (f.sub.2) in the measurement bandwidth, the voltage noise √{square root over (<δV.sub.G.sup.2>)} is given by
(62)
where N.sub.t is the volume trap density in the gate oxide layer, λ is the tunneling parameter, C.sub.eff is the capacitance per area, and a is the coulomb scattering coefficient. Since the noise is given by √{square root over (<δV.sub.G.sup.2>)}˜1/√{square root over (W)}. And the spectral density of the current is S.sub.1=g.sub.m.sup.2S.sub.V.sub.
(63)
(64)
(65) The ratio of current and voltage noise between the nanoplate (T.sub.1) and nanowire (T.sub.2) can be expressed as
(66)
(67) Thus the voltage noise signal is inversely proportional to the square root of width ratio: a nanowire (T.sub.2) shows higher noise than that of a nanoplate (T.sub.1)
(68)
since W.sub.1>>W.sub.2. This implies that the signal measured at T.sub.2 is amplified from signal of T.sub.1 by factor of W.sub.1/W.sub.2 whereas the corresponding voltage noise ratio is √{square root over (W.sub.1/W.sub.2)} (as γ.sub.1/γ.sub.2≈1): Suppose
(69)
is 1 mV, then the noise ratio is 10 thus T.sub.2 noise is 10 mV, which is the dominant one in the GN scheme (T.sub.1-T.sub.2). However, even though the noise ratio (√{square root over (W.sub.1/W.sub.2)}) is smaller the signal amplification factor (W.sub.1/W.sub.2), the noise of GN sensor (T.sub.1-T.sub.2), denoted as δV.sub.noise.sup.NP-NW is fundamentally equal to that of a single nanoplate pH sensor since any signal buried under the noise of NP (T.sub.1) in GN scheme (T.sub.1-T.sub.2) would not be also detectable in T.sub.2.
(70) The noise and SNR of pH sensor is directly correlated to the minimum pH resolution, ΔpH.sub.min, such that ΔpH.sub.min=3×δV.sub.noise/(ΔV/ΔpH). For any pH sensor we have noise sources from device and measurement instrument as well: for instance, there are two noise sources (δV.sub.noise.sup.NP and δV.sub.noise.sup.Ins) in a single nanoplate sensor and its SNR is limited by a larger one between two competitors. Depending on the magnitude of δV.sub.noise.sup.NP and δV.sub.noise.sup.Ins we have two situations for the pH resolution of a single nanoplate sensor:
(71)
(72) On the other hand, for our GN scheme, we have three noise sources: δV.sub.noise.sup.NP, δV.sub.noise.sup.NW and δ.sub.noise.sup.Ins. Since δV.sub.noise.sup.NW>>δV.sub.noise.sup.NP, in principle there are three different cases depending on the magnitude of the measurement instrument noise δV.sub.noise.sup.Ins.
(73) (1) δV.sub.noise.sup.Ins≦δV.sub.noise.sup.NP<δV.sub.noise.sup.NW: Since the signal under the noise (δV.sub.noise.sup.NP) in NP (T.sub.1) cannot be detected in NW side, the SNR of NP-NW sensor is limited by the NP noise and thus the ideal pH resolution is ΔpH.sub.min.sup.NP-NW˜3δV.sub.noise.sup.NP/0.059 where the pH sensitivity=0.059V/pH.
(74) (2) δV.sub.noise.sup.NP<δV.sub.noise.sup.Ins<δV.sub.noise.sup.NW: First in a NP-alone sensor, its pH resolution is clearly equal to 3δV.sub.noise.sup.Ins/0.059. In a NP-NW sensor, the pH resolution of NP (T.sub.1) itself is ΔpH.sub.min.sup.NP˜3δV.sub.noise.sup.NP/0.059. On the other hand, NP-NW pair-wise, a voltage signal (from NP) larger than δV.sub.noise.sup.NP can be amplified by the factor α.sub.GN (where α.sub.GN=W.sub.1/W.sub.2>>1), thus the additional competing factor is ΔpH.sub.min.sup.NW˜3δV.sub.noise.sup.NW/(0.059×α.sub.GN). The ratio of pH resolution between two competing factors is given by ΔpH.sub.min.sup.NP/ΔpH.sub.min.sup.NW˜α.sub.GN (δV.sub.noise.sup.NP/δV.sub.noise.sup.NW). Since (δV.sub.noise.sup.NP/δV.sub.noise.sup.NW)˜1/√{square root over (W.sub.1/W.sub.2)}, ΔpH.sub.min.sup.NP/ΔpH.sub.min.sup.NW≈√{square root over (W.sub.1/W.sub.2)}>1. Since the overall pH resolution is limited by larger (i.e., worse) one among two competing factors, where ΔpH.sub.min.sup.NP>ΔpH.sub.min.sup.NW in this case, ΔpH.sub.min.sup.NP-NW=ΔpH.sub.min.sup.NP˜3δV.sub.noise.sup.NP/0.059.
(75) (3) δV.sub.noise.sup.NP<δV.sub.noise.sup.NW<δV.sub.noise.sup.Ins: This case is similar to Case (2), but here the competing resolution in NW side is ΔpH.sub.min.sup.NW˜3δV.sub.noise.sup.Ins/(0.059×α.sub.GN) since now δV.sub.noise.sup.Ins>δV.sub.noise.sup.NW. Again, the ratio of pH resolution between two competing factors is given by ΔpH.sub.min.sup.NP/ΔpH.sub.min.sup.NW˜α.sub.GN(δV.sub.noise.sup.NP/δV.sub.noise.sup.Ins). Since δV.sub.noise.sup.NW<δV.sub.noise.sup.Ins, ΔpH.sub.min.sup.NP/ΔpH.sub.min.sup.NW˜α.sub.GN(δV.sub.noise.sup.NP/δV.sub.noise.sup.Ins)=√{square root over (α.sub.GN)}(δV.sub.noise.sup.NW/δV.sub.noise.sup.Ins). Depending on the magnitude of δV.sub.noise.sup.Ins we have two different answers:
(76)
(77) The corresponding overall pH resolution has also two different answers:
(78)
(79) If we compare the ratio of ΔpH.sub.min.sup.NP-NW and ΔpH.sub.min.sup.NP,
(80)
(81) For the first case of eq. (S15) √{square root over (α.sub.GN)}δV.sub.noise.sup.NP<δV.sub.noise.sup.Ins<α.sub.GNδV.sub.noise.sup.NP, thus
(82)
So, in the Case (3), regardless of the magnitude of δV.sub.noise.sup.Ins we always achieve smaller (i.e., better) pH resolution in GN (NP-NW) scheme compared to a single NP sensor.
(83) We summarize pH resolution of a single NP sensor (ΔpH.sub.min.sup.NP) and GN scheme (ΔpH.sub.min.sup.NP-NW) for the three possible cases in the following table:
(84) TABLE-US-00001 TABLE S1 The comparison of pH resolution for NP sensor alone and proposed GN scheme. Comparison NP alone (T.sub.1) GN scheme (T.sub.1-T.sub.2) of ΔpH.sub.min δV.sub.noise.sup.Ins < 3δV.sub.noise.sup.NP/0.059 3δV.sub.noise.sup.NP/0.059 ΔpH.sub.min.sup.NP = δV.sub.noise.sup.NP < ΔpH.sub.min.sup.NP-NW δV.sub.noise.sup.NW δV.sub.noise.sup.NP < 3δV.sub.noise.sup.Ins/0.059 3δV.sub.noise.sup.NP/0.059 ΔpH.sub.min.sup.NP > δV .sub.noise.sup.Ins < ΔpH.sub.min.sup.NP-NW δV.sub.noise.sup.NW δV.sub.noise.sup.NP < 3δV.sub.noise.sup.Ins/0.059 3δV.sub.noise.sup.NP/(0.059 × ΔpH.sub.min.sup.NP >> δV.sub.noise.sup.NW < α.sub.GN) or 3δV.sub.noise.sup.NP/0.059 ΔpH.sub.min.sup.NP-NW δV.sub.noise.sup.Ins
(85) Among all the three possible cases, GN scheme has its advantage over NP-alone sensor in terms of pH resolution in Cases (2) and (3) in which the pH resolution of GN scheme is much smaller than that of a single NP sensor. Since Cases (2) and (3) are the dominant situation especially for the point-of-care devices whose measurement instrument is not sophisticated enough (δV.sub.noise.sup.NP˜1-10 μV in general), the GN scheme always enhance the minimum pH resolution by the factor of α.sub.GN for the sensors with relatively low-precision instruments.
(86) An example of one embodiment of a device 10 for measuring pH, including monitoring a change in pH over time, is schematically illustrated in
(87) The transducer 200 comprises a top or bottom gate 210 (see
References
(88) [1] Y. Taur and T. H. Ning, Fundamentals of Modern VLSI Devices, Cambridge University Press, Cambridge, UK, 1998. [2] S. L. David E. Yates and T. W. Healy, “Site-binding model of the electrical double layer at the oxide/water interface,” Journal of the Chemical Society, Faraday Transactions 1: Physical Chemistry in Condensed Phases, vol. 70, pp. 1807-1818, 1974. [3] M. J. Deen, M. W. Shinwari, J. C. Ranuárez, and D. Landheer, “Noise considerations in field-effect biosensors,” Journal of Applied Physics, vol. 100, p. 074703 (2006).
Example 3
Ultrasensitive pH Detection by Nanowire-Nanoplate Combination Sensor
(89) A schematic demonstrating the nanowire-nanoplate combination sensor is shown in
(90) The two transistors have separate fluid wells and separate reference electrodes, which can be used to control the separate fluid potentials separately. T1 is considered to be the sensing element, and is exposed to solutions of varying pH with a fixed gate bias, V.sub.FG2. T2 is the “transducer” element, and is exposed to only a reference solution throughout the experiments. Transfer characteristics of T2 are used as the output characteristic (by sweeping V.sub.FG1), while the pH of the solutions over T2 is the input characteristic. As the pH is changed over T1, large changes in the total current I will be induced due to the surface potential changes over T1. In order to counterbalance these large changes in current to preserve the same total current I, very large shifts in the I-V.sub.FG2 are required, as illustrated in
(91) Individual transfer characteristics of the nanowire device and the nanoplate device at five different pH values are shown in
(92) The two devices are then connected as shown in
(93)
(94) This sensitivity factor is approximately equal to:
S=α(0.059 V/pH) (2)
(95) Using this sensitivity factor and the extracted noise for each point, we can calculate the minimum detectable pH resolution, given by:
(96)
(97) These values are plotted in Table 2. For the four shifts noted, the highest ΔpH.sub.min observed is less than 0.002 pH units, around an order of magnitude better than any pH sensor currently available. A comparison of this minimum pH resolution to individual nanoplate, nanowire, and commercial devices is shown in
(98) TABLE-US-00002 TABLE 2 Summary of sensitivity and achievable minimum pH resolutions. Sensitivity: Noise: Signal to pH Resolution pH Shift S (V/pH) δV.sub.t (mV) Noise Ratio pH.sub.min 6.85 to 6.97 4.24 2.36 1798 0.00167 6.97 to 7.1 4.51 1.28 3525 0.00085 7.1 to 7.24 3.72 2.01 1848 0.00162 7.24 to 7.4 3.94 1.10 3582 0.00084
(99) In conclusion, we demonstrate the use of a nanowire-nanoplate combination sensor for the detection of pH units down to 0.002, which is an order of magnitude better than commercial sensors and is, to our knowledge, the most sensitive bioFET pH sensor reported to date. An increase in the observed signal is achieved by a huge difference in the source-drain currents of the two devices, which is used to induce a large threshold shift for the nanowire device due to pH changes on the nanoplate device. The measured noise is not enhanced in this process due to an environmental noise factor that is larger than the intrinsic nanoplate and nanowire noise. As long as the intrinsic nanoplate noise is kept to lower than the environmental noise divided by α, the amplification factor, the resulting pH sensitivity will be α(0.059 mV/pH). This method for ultrasensitive detection can be used for many applications.
(100) All references throughout this application, for example patent documents including issued or granted patents or equivalents; patent application publications; and non-patent literature documents or other source material; are hereby incorporated by reference herein in their entireties, as though individually incorporated by reference, to the extent each reference is at least partially not inconsistent with the disclosure in this application (for example, a reference that is partially inconsistent is incorporated by reference except for the partially inconsistent portion of the reference). Various patent documents are specifically referred to for the various electronic devices and processes related thereto, including FETs and related components for use in various applications, including: US 20110086352; WO 2012/078340; US 20080280776; WO 2010/037085; WO 2011/163058; WO 2013/016486.
(101) The terms and expressions which have been employed herein are used as terms of description and not of limitation, and there is no intention in the use of such terms and expressions of excluding any equivalents of the features shown and described or portions thereof, but it is recognized that various modifications are possible within the scope of the invention claimed. Thus, it should be understood that although the present invention has been specifically disclosed by preferred embodiments, exemplary embodiments and optional features, modification and variation of the concepts herein disclosed may be resorted to by those skilled in the art, and that such modifications and variations are considered to be within the scope of this invention as defined by the appended claims. The specific embodiments provided herein are examples of useful embodiments of the present invention and it will be apparent to one skilled in the art that the present invention may be carried out using a large number of variations of the devices, device components, methods steps set forth in the present description. As will be obvious to one of skill in the art, methods and devices useful for the present methods can include a large number of optional composition and processing elements and steps.
(102) When a group of substituents is disclosed herein, it is understood that all individual members of that group and all subgroups, are disclosed separately. When a Markush group or other grouping is used herein, all individual members of the group and all combinations and subcombinations possible of the group are intended to be individually included in the disclosure. Specific names of compounds are intended to be exemplary, as it is known that one of ordinary skill in the art can name the same compounds differently. Every formulation or combination of components described or exemplified herein can be used to practice the invention, unless otherwise stated.
(103) Whenever a range is given in the specification, for example, a ratio range, a size range, a pH range, a sensitivity range, a temperature range, a time range, or a composition or concentration range, all intermediate ranges and subranges, as well as all individual values included in the ranges given are intended to be included in the disclosure. It will be understood that any subranges or individual values in a range or subrange that are included in the description herein can be excluded from the claims herein.
(104) All patents and publications mentioned in the specification are indicative of the levels of skill of those skilled in the art to which the invention pertains. References cited herein are incorporated by reference herein in their entirety to indicate the state of the art as of their publication or filing date and it is intended that this information can be employed herein, if needed, to exclude specific embodiments that are in the prior art. For example, when composition of matter are claimed, it should be understood that compounds known and available in the art prior to Applicant's invention, including compounds for which an enabling disclosure is provided in the references cited herein, are not intended to be included in the composition of matter claims herein.
(105) As used herein, “comprising” is synonymous with “including,” “containing,” or “characterized by,” and is inclusive or open-ended and does not exclude additional, unrecited elements or method steps. As used herein, “consisting of” excludes any element, step, or ingredient not specified in the claim element. As used herein, “consisting essentially of” does not exclude materials or steps that do not materially affect the basic and novel characteristics of the claim. In each instance herein any of the terms “comprising”, “consisting essentially of” and “consisting of” may be replaced with either of the other two terms. The invention illustratively described herein suitably may be practiced in the absence of any element or elements, limitation or limitations which is not specifically disclosed herein.
(106) One of ordinary skill in the art will appreciate that starting materials, biological materials, reagents, synthetic methods, purification methods, analytical methods, assay methods, and biological methods other than those specifically exemplified can be employed in the practice of the invention without resort to undue experimentation. All art-known functional equivalents, of any such materials and methods are intended to be included in this invention. The terms and expressions which have been employed are used as terms of description and not of limitation, and there is no intention that in the use of such terms and expressions of excluding any equivalents of the features shown and described or portions thereof, but it is recognized that various modifications are possible within the scope of the invention claimed. Thus, it should be understood that although the present invention has been specifically disclosed by preferred embodiments and optional features, modification and variation of the concepts herein disclosed may be resorted to by those skilled in the art, and that such modifications and variations are considered to be within the scope of this invention as defined by the appended claims.