Apparatus for manufacturing polysilicon rod
11673809 · 2023-06-13
Assignee
Inventors
Cpc classification
C01B33/035
CHEMISTRY; METALLURGY
C23C16/46
CHEMISTRY; METALLURGY
International classification
C01B33/035
CHEMISTRY; METALLURGY
C23C16/458
CHEMISTRY; METALLURGY
Abstract
An apparatus for manufacturing polysilicon rod by a Siemens method has a base plate 20; and a holding body 100 provided on the base plate 20 so as to be movable in a horizontal direction and electrically connect between a core wire holder 1 and an electrode 4. The holding body 100 is configured to rotatably hold the core wire holder 1 with respect to the base plate 20.
Claims
1. An apparatus for manufacturing polysilicon rod by a Siemens method comprising: a base plate; and a holding body provided on the base plate electrically connecting a core wire holder and an electrode, wherein the holding body is configured to rotatably and slidably hold the core wire holder with respect to the base plate; wherein the holding body includes: a pedestal provided on the base plate, the pedestal has a curved surface part on an upper part thereof, and an electrode adapter body between the core wire holder and the pedestal, the electrode adapter body is connected to the adapter base via the curved surface part of the pedestal so as to be rotatable with respect to the base plate and electrically connect between the core wire holder and the electrode, an electrode adapter slider extending in the horizontal direction from the electrode adapter body and contacting the electrode, a pressing plate, the electrode is clamped between the electrode adapter slider and the pressing plate so as the electrode adapter body is movable in the horizontal direction.
2. The apparatus for manufacturing polysilicon rod according to claim 1, wherein each of the base plate, the electrode adapter and the electrode is formed only by a flat surface and a spherical surface or a curved surface having a radius of 5 mm or more.
3. The apparatus for manufacturing polysilicon rod according to claim 2, wherein each of the base plate, the electrode adapter and the electrode does not have an internal corner part having an angle of less than 90 degrees.
4. The apparatus for manufacturing polysilicon rod according to claim 1, wherein the pedestal provided on the base plate is an insulator.
Description
BRIEF DESCRIPTION OF DRAWINGS
(1)
(2)
(3)
(4)
DETAILED DESCRIPTION
(5) The embodiment provides an apparatus for manufacturing polysilicon rod by a Siemens method. As illustrated in
(6) The holding body 100 may include an adapter base (pedestal) 3 that is provided on the reactor base plate 20 so as to be movable in the horizontal direction, and an electrode adapter 2 that is provided so as to be rotatable (swingable) with respect to the adapter base 3 and electrically connects between the core wire holder 1 and the metal electrode 4.
(7) The adapter base 3 may have a curved surface part 3a on an upper part thereof. The electrode adapter 2 may be rotatable along the curved surface part 3a and slidable in the horizontal direction with respect to the metal electrode 4.
(8) The electrode adapter 2 may include an electrode adapter body part 2a rotatably provided on the curved surface part 3a of the pedestal 3, and an electrode adapter slide part 2b extending in the horizontal direction from the electrode adapter body part 2a and contacting the metal electrode 4. The electrode adapter body part 2a and the electrode adapter slide part 2b may be integrally formed.
(9) As illustrated in
(10) In the aspect illustrated in
(11) A refrigerant 30 is provided in the metal electrode 4 (refer to
(12) In the aspect illustrated in
(13) As an example, the metal electrode 4 may be attached so as to be rotatable (swingable) in the horizontal direction. In this case, the electrode adapter body part 2a is also rotatable in the horizontal direction with respect to the adapter base 3.
(14) The electrode adapter 2, the adapter base 3, the metal electrode 4, and the holding plate 10 that are continuously used between the batches may all be formed as a flat surface and a simple spherical surface or a curved surface, the simple spherical surface or the curved surface being gently curved to have a radius of 5 mm or more, and furthermore may have a shape that does not have an internal corner part having an angle of less than 90 degrees. In this case, for example, cleaning can be easily performed manually by using a general cloth-like cleaning tool such as BEMCOT. Since the bolt 9a and the nut 9b are small components, even when the bolt 9a and the nut 9b are replaced with new components in each batch, an economic burden is small. In addition, even when two sets of the bolt 9a and the nut 9b are prepared and one set is cleaned while the other set is in use, a temporal burden is small. It is advantageous to adopt an aspect that does not have an internal corner part having an angle of less than 90 degrees in that the shape does not have a part that is difficult to clean. There is a possibility that a film deposited at a corner part having an acute angle peels off at the time of deposition (since stress of the deposited film increases to thicken the film, and/or to deposit the film without maintaining sufficient adhesion to the internal corner part), flies up in a chamber, and become a contamination source. However, by adopting an aspect that does not have the internal corner part having an angle of less than 90 degrees, an occurrence of the event described above can be prevented. It is more preferable that the ease of cleaning can be improved and the possibility of being a contamination source can be reduced by adopting the aspect that does not have an internal corner part having an angle of less than 120 degrees. It is also possible to adopt an aspect that does not have an internal corner part having an angle of less than 60 degrees. In this case, although an effect is low compared with that of the aspect that does not have an internal corner part having an angle of less than 90 degrees, a certain level of an effect can be obtained in that the ease of cleaning can be improved and the possibility of being the contamination source can be reduced. “c1” in
(15) It is desirable that the adapter base 3 is an insulator for preventing the current from be applied to the reactor base plate 20. However, the present invention is not limited to this, and a conductive member may be used as the adapter base 3. In this case, the intended function is achieved by using a material having high slidability and placing a flat plate formed of an insulator between the adapter base 3 and the reactor base plate 20.
(16) A cover 40 functioning as a stopper may be provided at the top of the metal electrode 4 so that the electrode adapter slide part 2b is not unintentionally detached from the metal electrode 4 (refer to
(17) As illustrated in
(18) A cover for protecting the metal electrode 4 and a movable part of the electrode adapter slide part 2b may be provided, and a carbon sheet for assisting to apply the current and slide at a contact part may be provided therebetween.
Example
(19) By the Siemens method, a reaction to grow the polysilicon rod until the diameter of the polysilicon rod is about φ 160 mm was performed five batches each, and a crack generation rate was confirmed. In the most common fixed metal electrode and electrode adapter in the related art, which correspond to
REFERENCE SIGNS LIST
(20) 1 core wire holder 2 electrode adapter 2a electrode adapter body part 2b electrode adapter slide part 3 adapter base (pedestal) 4 metal electrode (electrode) 5 insulator 9a bolt 9b nut 10 holding plate 20 reactor base plate (base plate) 20 refrigerant 100 holding body S1, S2 slide direction R1, R2 rotation direction (swinging direction)