UNDULATOR MAGNET ARRAY AND UNDULATOR
20170339777 · 2017-11-23
Assignee
Inventors
Cpc classification
H01F7/0278
ELECTRICITY
G21K1/003
PHYSICS
International classification
H05H7/04
ELECTRICITY
G21K1/00
PHYSICS
Abstract
In an undulator magnet array, an upper magnet array is formed by coupling an upper shift magnet array and an upper reference magnet array, and a lower magnet array is formed by coupling a lower reference magnet array and lower shift magnet array arranged so as to face the magnet arrays. With reference to a state where the amplitudes of periodic magnetic fields that can be formed by the upper magnet array and the lower magnet array are maximized, the upper shift magnet array is shifted ¼ of a period to the left as seen from the lower reference magnet array and the lower shift magnet array is shifted ¼ of a period to the left as seen from the upper reference magnet array.
Claims
1. An undulator magnet array comprising: a first magnet array and a second magnet array disposed parallel to each other with an interval therebetween so as to lie opposite to each other, a magnetization direction of magnets contained in the first magnet array and a magnetization direction of magnets contained in the second magnet array changing, in a plane through the first and second magnet arrays, periodically along a magnet arrangement direction of the respective magnet arrays, wherein the first magnet array is formed by coupling together a first shifted magnet array and a first reference magnet array each containing a first plurality of magnets, and the second magnet array is formed by coupling together a second reference magnet array and a second shifted magnet array each containing a second plurality of magnets, the first shifted magnet array is disposed opposite the second reference magnet array, the first shifted magnet array being shifted relative to the second reference magnet array by a predetermined shift amount in a predetermined direction parallel to the magnet arrangement direction as compared with in a reference state where an amplitude of a periodic magnetic field produced by the first and second magnet arrays is maximized, and the second shifted magnet array is disposed opposite the first reference magnet array, the second shifted magnet array being shifted relative to the first reference magnet array by the predetermined shift amount in the predetermined direction as compared with in the reference state.
2. The undulator magnet array of claim 1, wherein the predetermined shift amount is less than one-half of a period of change of the magnetization direction, the period being common to the first and second magnet arrays.
3. The undulator magnet array of claim 2, wherein the predetermined shift amount is one-eighth or more but three-eighths or less of the period of change of the magnetization direction.
4. The undulator magnet array of claim 3, wherein the predetermined shift amount is one-fourth of the period of change of the magnetization direction.
5. The undulator magnet array of claim 1, wherein in the first shifted magnet array, in a region within a distance corresponding to the predetermined shift amount from the first reference magnet array, a magnet whose magnetization direction is determined based on the magnetization direction of the magnets in the first reference magnet array is disposed.
6. The undulator magnet array of claim 5, wherein in the region, a magnet having a same magnetization direction as a magnetization direction of a magnet in a predetermined region in the first reference magnet array is disposed, and the predetermined region is a region located between, of opposite ends of the first reference magnet array, an end closer to the first shifted magnet array and a position displaced from the end by the predetermined shift amount in a direction opposite to the predetermined direction.
7. The undulator magnet array of claim 1, wherein the first shifted magnet array comprises a plurality of first shifted magnet arrays, the first reference magnet array comprises a plurality of first reference magnet arrays, the second shifted magnet array comprises a plurality of second shifted magnet arrays, and the second reference magnet array comprises a plurality of second reference magnet arrays, and in the first magnet array, the first shifted magnet arrays and the first reference magnet arrays are coupled together alternately, and in the second magnet army, the second reference magnet arrays and the second shifted magnet arrays are coupled together alternately.
8. An undulator, comprising: the undulator magnet array of claim 1; and a holder for holding the undulator magnet array such that a gap between the first and second magnet arrays in the undulator magnet array is variable.
Description
BRIEF DESCRIPTION OF DRAWINGS
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DESCRIPTION OF EMBODIMENTS
[0035] Hereinafter, examples embodying the present invention will be described specifically with reference to the accompanying drawings. Among the diagrams referred to, the same parts are identified by the same reference numerals, and in principle no overlapping description of the same parts will be repeated. In the present description, for the sake of simple description, symbols and other designations referring to information, signals, physical quantities, components, and the like are occasionally used alone, while omitting or abbreviating the names of the information, signals, physical quantities, components, and the like that correspond to those symbols and other designations.
First Embodiment
[0036] A first embodiment of the present invention will be described.
[0037] In this embodiment, for the sake of concrete explanation, three mutually perpendicular axes are assumed, namely X-axis, Y-axis, and Z-axis. Z-axis is parallel to the arrangement direction of the magnets 30 in each magnet array. The arrangement direction of the magnets 30 is the same between the magnet arrays 10 and 20. Y-axis is parallel to the direction connecting between the magnet arrays 10 and 20. The plane parallel to both X-axis and Y-axis will be called XY-plane, the plane parallel to both Y-axis and Z-axis will be called YZ-plane, and the plane parallel to both Z-axis and X-axis will be called ZX-plane. YZ-plane is the plane through the magnet arrays 10 and 20. More precisely, the center of all the magnets 30 constituting the magnet arrays 10 and 20 lies on YZ-plane.
[0038] Moreover, what are meant by “up”, “down”, “left”, “right”, and similar terms are defined as follows. The left-right direction is parallel to Z-axis, the positive side along Z-axis being the “right” side, the negative side along Z-axis being the “left” side. The up-down direction is parallel to Y-axis, the positive side along Y-axis being the “up” side, the negative side along Y-axis being the “down” side. Furthermore, of two given magnet arrays, the one located relatively above the other will be called the upper magnet array, and the one located relatively below the other will be called the lower magnet array. Specifically, here, the magnet array 10 is considered to be located above the magnet array 20. Accordingly, in the following description, the magnet arrays 10 and 20 are occasionally called the upper magnet array 10 and the lower magnet array 20 respectively.
[0039] Of any given magnet such as the magnets 30, the direction pointing from the S pole to the N pole of the magnet will be called its magnetization direction (the direction in which it is magnetized). Though not clear from
[0040] The magnetic field produced by the magnet arrays 10 and 20 will be called the undulator magnetic field B. It should be noted that what is called the undulator magnetic field B here is, of the entire magnetic field produced by the magnet arrays 10 and 20, that component which is perpendicular to the electron beam axis on the electron beam axis. The electron beam axis is the axis of the electron beam that travels between the magnet arrays 10 and 20. The electron beam axis is parallel to Z-axis, and runs through the middle between the magnet arrays 10 and 20. The direction and magnitude of the undulator magnetic field B changes periodically along Z-axis, and in
Basic Configuration
[0041] In this embodiment, peculiar magnet arrangements in the undulator magnet array 1 will be described. First, with reference to
[0042] The undulator magnet array 1.sub.REF is a Halbach magnet array, and contains four magnets 30 per period λ.sub.u. In any diagram including
[0043] Referring to
[0044] In the undulator magnet array 1.sub.REF, the number M of magnets 30 present in one period λ.sub.u is four, and thus, in each of the magnet arrays 10.sub.REF and 20.sub.REF, the magnetization direction of the magnets 30 changes in YZ-plane by 90° (=360°/M) from one magnet to the next along the direction parallel to Z-axis. Here, the direction of the change is opposite between the upper and lower magnet arrays 10.sub.REF and 20.sub.REF. In the following description, as shown in
[0045] In the magnet array 10.sub.RFF, from left to right, 0°, 90°, 180°, and 270° magnets 30 are arranged in this order, in repeated cycles, four successive magnets 30 forming a magnet array corresponding to one period. Accordingly, with the center of the 0° magnet 30 in the magnet array 10.sub.REF taken as the origin of Z-axis, the centers of the 0°, 90°, 180°, and 270° magnets 30 in the magnet array 10.sub.REF are located at the positions away from the origin rightward in the Z-axis direction by distances of (i×4)×d, (i×4+1)×d, (i×4+2)×d, and (i×4+3)×d respectively (where i is an integer).
[0046] In the magnet array 20.sub.REF, from left to right, 0°, 270°, 180°, and 90° magnets 30 are arranged in this order, in repeated cycles, four successive magnets 30 forming a magnet array corresponding to one period. Accordingly, with the center of the 0° magnet 30 in the magnet array 20.sub.REF taken as the origin of Z-axis, the centers of the 0°, 270°, 180°, and 90° magnets 30 in the magnet array 20.sub.REF are located at the positions away from the origin rightward in the Z-axis direction by distances of (i×4)×d, (i×4+1)×d, (i×4+2)×d, and (i×4+3)×d respectively.
[0047] Here, at the positions opposite the 0°, 90°, 180°, and 270° magnets 30 in the magnet array 10.sub.REF, the 0°, 270°, 180°, and 90° magnets 30 in the magnet array 20.sub.REF are disposed respectively. More specifically, the straight line connecting between the center position of the i-th magnet in the magnet array 10.sub.REF and the center position of the i-th magnet in the magnet array 20.sub.REF is parallel to Y-axis, the first to fourth magnets in the magnet array 10.sub.REF being 0°, 90°, 180°, and 270° magnets 30 respectively, the first to fourth magnets in the magnet array 20.sub.REF being 0°, 270°, 180°, and 90° magnets 30 respectively.
[0048] In any diagram including
First Improved Configuration
[0049] A first improved configuration of the undulator magnet array will be described. An undulator magnet array 1.sub.A shown in
[0050] However, in the undulator magnet array 1.sub.A, as compared with the undulator magnet array 1.sub.REF, the upper magnet array is disposed, relative to the lower magnet array, with a leftward displacement corresponding one-fourth of the period λ.sub.u. In the following description, for the sake of convenient description, displacing by a distance corresponding to one w-th of the period λ.sub.u is occasionally described as shifting by one w-th of the period (where w is a real number). In the undulator magnet array 1.sub.A, as compared with the undulator magnet array 1.sub.REF, the upper magnet array is shifted leftward by one-fourth of the period relative to the lower magnet array.
[0051] Accordingly, at the positions opposite the 0°, 90°, 180°, and 270° magnets 30 in the magnet array 10.sub.A, the 90°, 0°, 270°, and 180° magnets 30 in the magnet array 20.sub.A are disposed respectively. More specifically, the straight line connecting between the center position of the i-th magnet in the magnet array 10.sub.A and the center position of the i-th magnet in the magnet array 20.sub.A is parallel to Y-axis, the first to fourth magnets in the magnet array 10.sub.A being 0°, 90°, 180°, and 270° magnets 30 respectively, the first to fourth magnets in the magnet array 20.sub.A being 90°, 0°, 270°, and 180° magnets 30 respectively.
[0052] In any diagram including
[0053] The magnetic circuit formed by the configuration of
[0054] In the magnetic circuit formed by the configuration of
[0055] In the magnetic circuit formed by the configuration of
Second Improved Configuration
[0056] Now, as a second improved configuration, an undulator magnet array 1.sub.B as shown in
[0057] However, in the undulator magnet array 1.sub.B, as compared with the undulator magnet array 1.sub.REF as the reference, the left half of the upper magnet array is shifted leftward by one-fourth of the period (that is, by the distance corresponding to one-fourth of the period λ.sub.u) relative to the lower magnet array, and in addition the right half of the lower magnet array is shifted leftward by one-fourth of the period (that is, by the distance corresponding to one-fourth of the period λ.sub.u) relative to the upper magnet array. As a result of not the upper magnet array but the lower magnet array being shifted in the right half, the periodicity of the undulator magnetic field B is preserved.
[0058] With reference to
[0059] First, as shown in
[0060] On the other hand, as shown in
[0061] By combining together the upper and lower magnet arrays 10.sub.B and 20.sub.B with the coupling planes BD1 and BD2 shown in
[0062] In the magnetic circuit formed by the undulator magnet array 1.sub.B in
[0063] Starting with the undulator magnet array 1.sub.REF, of the upper magnet array, the part that is shifted leftward relative to the lower magnet array will be called the upper shifted magnet array, and the unshifted part will be called the upper reference magnet array. Likewise, starting with the undulator magnet array 1.sub.REF, of the lower magnet array, the part that is shifted leftward relative to the upper magnet array will be called the lower shifted magnet array, and the unshifted part will be called the lower reference magnet array. In the example in
[0064] The upper magnet array 10.sub.B is formed by coupling together the upper shifted and reference magnet arrays 10S.sub.B and 10R.sub.B, and the lower magnet array 20.sub.B is formed by coupling together the lower reference and shifted magnet arrays 20R.sub.B and 20S.sub.B. In
[0065] The upper shifted magnet array is disposed opposite the lower reference magnet array (the same applies to any later-described undulator magnet array that includes an upper shifted magnet array and a lower reference magnet array). That is, in the undulator magnet array 1.sub.B, at the positions opposite the 0°, 90°, 180°, and 270° magnets 30 in the upper shifted magnet array 10S.sub.B, the 90°, 0°, 270°, and 180° magnets 30 in the lower reference magnet array 20R.sub.B are disposed respectively. More specifically, the straight line connecting between the center position of the i-th magnet in the upper shifted magnet array 10S.sub.B and the center position of the i-th magnet in the lower reference magnet array 2R.sub.B is parallel to Y-axis, the first to fourth magnets in the upper shifted magnet array 10S.sub.B being 0°, 90°, 180°, and 270° magnets 30 respectively, the first to fourth magnets in the lower reference magnet array 20R.sub.B being 90°, 0°, 270°, and 180° magnets 30 respectively.
[0066] The lower shifted magnet array is disposed opposite the upper reference magnet array (the same applies to any later-described undulator magnet array that includes a lower shifted magnet array and an upper reference magnet array). That is, in the undulator magnet array 1.sub.B, at the positions opposite the 0°, 270°, 180°, and 90° magnets 30 in the lower shifted magnet array 20S.sub.B, the 270°, 0°, 90°, and 180° magnets 30 in the upper reference magnet array 10R.sub.B are disposed respectively. More specifically, the straight line connecting between the center position of the i-th magnet in the lower shifted magnet array 20S.sub.B and the center position of the i-th magnet in the upper reference magnet array 10R.sub.B is parallel to Y-axis, the first to fourth magnets in the lower shifted magnet array 20S.sub.B being 0°, 270°, 180°, and 90° magnets 30 respectively, the first to fourth magnets in the upper reference magnet array 10R.sub.B being 270°, 0°, 90°, and 180° magnets 30 respectively.
Third Improved Configuration
[0067] A third improved configuration of the undulator magnet array will be described. An undulator magnet array 1.sub.C shown in
[0068] The configuration of the undulator magnet array 1.sub.C will now be described more specifically. The upper magnet array 10.sub.C is formed by coupling together a plurality of upper shifted magnet arrays 10S.sub.C and a plurality of upper reference magnet arrays 10R.sub.C, and the lower magnet array 20.sub.C is formed by coupling together a plurality of lower shifted magnet arrays 20S.sub.C and a plurality of lower reference magnet arrays 20R.sub.C.
[0069] In the upper magnet array 10.sub.C, the upper shifted and reference magnet arrays 10S.sub.C and 10R.sub.c are disposed alternately. That is, in the upper magnet array 10.sub.C, one upper shifted magnet array 10S.sub.C is disposed between one upper reference magnet array 10R.sub.C and another upper reference magnet array 10R.sub.C (assuming that the upper shifted magnet array 10S.sub.C of interest is not located at an end of the upper magnet array 10.sub.C), and one upper reference magnet array 10R.sub.C is disposed between one upper shifted magnet array 10S.sub.C and another upper shifted magnet array 10S.sub.C (assuming that the upper reference magnet array 10R.sub.C of interest is not located at an end of the upper magnet array 10.sub.C).
[0070] In the lower magnet array 20.sub.C, the lower shifted and reference magnet arrays 20S.sub.C and 20R.sub.C are disposed alternately. That is, in the lower magnet array 20.sub.C, one lower shifted magnet array 20S.sub.C is disposed between one lower reference magnet array 20R.sub.C and another lower reference magnet array 20R.sub.C (assuming that the lower shifted magnet array 20S.sub.C of interest is not located at an end of the lower magnet array 20.sub.C), and one lower reference magnet array 20R.sub.C is disposed between one lower shifted magnet array 20S.sub.C and another lower shifted magnet array 20S.sub.C (assuming that the lower reference magnet array 20R.sub.C of interest is not located at an end of the lower magnet array 20.sub.C).
[0071] Suppose the Z-axis coordinate (position on Z-axis) of the left end of the upper magnet array 10.sub.C and the Z-axis coordinate (position on Z-axis) of the left end of the lower magnet array 20.sub.C are equal. Then, the j-th upper shifted magnet array 10S.sub.C from the left end of the upper magnet array 10.sub.C is disposed opposite the j-th lower reference magnet array 20R.sub.c from the left end of the lower magnet array 20.sub.C (where j is an integer). That is, at the positions opposite the 0°, 90°, 180°, and 270° magnets 30 in the j-th upper shifted magnet array 10S.sub.C, the 90°, 0°, 270°, and 180° magnets 30 in the j-th lower reference magnet array 20R.sub.C are arranged respectively. More specifically, the straight line connecting between the center position of the i-th magnet in the j-th upper shifted magnet array 10S.sub.C and the center position of the i-th magnet in the j-th lower reference magnet array 20R.sub.C is parallel to Y-axis, the first to fourth magnets in the j-th upper shifted magnet array 10S.sub.C being 0°, 90°, 180°, and 270° magnets 30 respectively, the first to fourth magnets in the j-th lower reference magnet array 20R.sub.C being 90°, 0°, 270°, and 180° magnets 30 respectively.
[0072] The j-th lower shifted magnet array 20S.sub.C from the left end of the lower magnet array 20.sub.C is disposed opposite the j-th upper reference magnet array 10R.sub.C from the left end of the upper magnet array 10.sub.C. That is, at the positions opposite the 0°, 270°, 180°, and 90° magnets 30 in the j-th lower shifted magnet array 20S.sub.C, the 270°, 0°, 90°, and 180° magnets 30 in the j-th upper reference magnet array 10R.sub.C are arranged respectively. More specifically, the straight line connecting between the center position of the i-th magnet in the j-th lower shifted magnet array 20S.sub.C and the center position of the i-th magnet in the j-th upper reference magnet array 10R.sub.C is parallel to Y-axis, the first to fourth magnets in the j-th lower shifted magnet array 20S.sub.C being 0°, 270°, 180°, and 90° magnets 30 respectively, the first to fourth magnets in the j-th upper reference magnet array 10R.sub.C being 270°, 0°, 90°, and 180° magnets 30 respectively.
[0073] In the example in
[0074] Although in the example described above, one upper shifted magnet array, one upper reference magnet array, one lower shifted magnet array, and one lower reference magnet array are each composed of magnets 30 corresponding to one period, each of those magnet arrays may instead be composed of magnets 30 corresponding to a plurality of periods (for example, ten periods).
[0075] With the third improved configuration, not only is it possible to obtain the effects and benefits of the second improved configuration, but it is in addition possible to disperse the compressive and tensile forces that act on the structural components (such as the magnet array beams 110 and 120 in
Fourth Improved Configuration
[0076] A fourth improved configuration of the undulator magnet array will be described. Through the approaches described previously in connection with the first to third improved configurations, ideally, the attractive and repulsive forces between the upper and lower magnet arrays balance out completely. In reality, however, owing to the magnetic permeability of actual magnets 30 not being equal to one, and also owing to the upper and lower magnet arrays being divided into shifted and reference magnet arrays, the attractive and repulsive forces do not completely balance out, leaving either an attractive force or a repulsive force to appear depending on the gap (see
[0077] One possible solution is to fine-adjust the attractive and repulsive forces by shifting the upper or lower shifted magnet arrays, which are already shifted by one-fourth of the period, further leftward or rightward from its shifted position by a minute amount. In the fourth improved configuration, such shifting by a minute amount is approximated by rotating the magnetization direction.
[0078] An undulator magnet array I.sub.D shown in
[0079] By replacing the upper shifted and reference magnet arrays 10S.sub.C and 10R.sub.C in the upper magnet array 10.sub.C in
[0080] In the magnet arrays 10R.sub.C and 20S.sub.C in
[0081] The magnetization direction of the magnets 30 is designed to suit the range of the gap in actual use, and by forming the undulator magnet array I.sub.D based on the results of such designing, while the range of the gap is limited, it is possible to bring the attractive and repulsive forces sufficiently close to zero.
Simulations
[0082] Next, the details and results of simulations performed with some of the undulator magnet arrays described above will be presented. In these simulations, it was assumed that the period λ.sub.u was 18 mm (millimeters) and the total length of the undulator magnet array (its length in the Z-axis direction) was 4.5 m (meters). It was further assumed that the variable range of the gap was 3 to 9 mm, and that the residual flux density and the relative magnetic permeability of the permanent magnets constituting the magnets 30 were 1.2 T (tesla) and 1.06 respectively.
[0083]
[0084] With a gap of 3 mm, as compared with the undulator magnet array 1.sub.REF, which exhibited an attractive force of about 5.4 tf (tons-force), the undulator magnet array 1.sub.B exhibited an attractive force of about 220 kgf (kilograms-force), achieving reduction of the attractive force down to the order of the weight of the undulator magnet array itself. The undulator magnet array 1.sub.C, while exhibiting a repulsive force exceeding an attractive force in a region of larger gaps, exhibited a magnetic force as low as about 400 kgf in terms of absolute value. The undulator magnet arrays 1.sub.REF, 1.sub.B, and 1.sub.C, all exhibited so weak a force in the left-right direction as to be regarded as zero.
[0085]
[0086] It is seen that, while the intensity of the magnetic field produced by the undulator magnet array 1.sub.B (or 1.sub.C) is about 75% of that produced by the undulator magnet array REF, the undulator magnet array 1.sub.B (or 1.sub.C) produced a magnetic field with sufficient intensity and satisfactory periodicity. It is known that, in a Halbach magnet array, the magnetic attractive force is proportional to the square of the intensity of the undulator magnetic field B. With the undulator magnet array 1.sub.REF, even when the intensity of the undulator magnetic field B is reduced to about 75% of that in the state in
Second Embodiment
[0087] A second embodiment of the present invention will be described. The second embodiment, as well as the third to fifth embodiments described later, is based on the first embodiment, and to the features of the second to fifth embodiments that go unmentioned in the following description, the description of the corresponding features in the first embodiment applies unless inconsistent. Features from different ones of the first to fifth embodiments may be combined together unless inconsistent.
[0088] The amount of leftward shift Δz of the upper shifted magnet array relative to the lower reference magnet array will be defined in terms of the phase φz. The amount of leftward shift of the lower shifted magnet array relative to the upper reference magnet array also equals Δz. The phase φz corresponding to one period λ.sub.u, equals 2π in radian notation. Therefore, the phase φz is given by “φz=2π×Δz/λ.sub.u”. In the undulator magnet array 1.sub.REF, no shifting as described above is involved, and thus, in the undulator magnet array 1.sub.REF, “φz=0”. In the undulator magnet arrays 1.sub.A, 1.sub.B, 1.sub.C, and 1.sub.D described above, the shift amount Δz equals one-fourth of the period λ.sub.u, and thus “φz=π/2”. In the undulator magnet array in
[0089] In
[0090] In
[0091] The magnetic force Fy in the Y-axis direction and the magnitude By.sub.AMP of the amplitude of the Y-axis component of the undulator magnetic field B do not rely on the polarity of the phase φz but is determined only by the absolute value of the phase φz, and accordingly the following description focuses on the range of “0≦φz≦π”.
[0092] The first embodiment places emphasis on the cancelling-out of the attractive and repulsive forces, and proposes an undulator magnet array (1.sub.A, 1.sub.B, 1.sub.C, or 1.sub.D) such that “φz=π/2”. Instead, an undulator magnet array may be formed such that the phase φz equals neither zero nor π/2. Specifically, the undulator magnet array I may be formed by use of an arbitrary shift amount Δz that fulfills, for example, “0<φz<π”.
[0093] In generalized terms, an undulator magnet array 1.sub.GN (unillustrated) according to the second embodiment, which is an example of the undulator magnet array 1, includes an upper magnet array formed by coupling together an upper shifted magnet array and an upper reference magnet array each composed of a plurality of magnets 30 and a lower magnet array formed by coupling together a lower reference magnet array and a lower shifted magnet array each composed of a plurality of magnets 30, wherein the upper shifted magnet array is disposed opposite the lower reference magnet array, the upper shifted magnet array being shifted relative to the lower reference magnet array by a predetermined shift amount Δz in a predetermined direction (in the example in
[0094] The undulator magnet array 1.sub.A, 1.sub.B, 1.sub.C, or 1.sub.D according to the first embodiment is a type of undulator magnet array I.sub.GN, and undulator magnet arrays according to the third and fourth embodiments described later also belong to the undulator magnet array 1.sub.GN.
[0095] In the undulator magnet array I.sub.GN, the shift amount Δz is determined so as to fulfill “0<φz<π”. That is, the shift amount Δz is less than one-half of the period λ.sub.u of the change of the magnetization direction of the magnets 30. Thus, as compared with the undulator magnet array 1.sub.REF where “φz=0”, it is possible to reduce the magnitude of the magnetic force (attractive or repulsive force) that occurs between the upper and lower magnet arrays, and it is thus possible to obtain effects and benefits as mentioned in the description of, among others, the first and second improved configurations of the first embodiment.
[0096] However, with the phase φz close to 0 or close to π, it is difficult to obtain substantial benefits. Accordingly, for example, in the undulator magnet array 1.sub.GN, it is preferable that the shift amount Δz be determined so as to fulfill “π/4≦φz≦3π/4”. That is, it is preferable that the shift amount Δz be one-eighth or more but three-eighths or less of the period λ.sub.u.
[0097] Typically, for example, as in the undulator magnet array 1.sub.A, 1.sub.B, 1.sub.C, or .sup.1.sub.D according to the first embodiment, in the undulator magnet array 1.sub.GN, it is preferable that the shift amount Δz be determined so as to fulfill “φz=π/2”. That is, it is preferable that the shift amount Δz be one-fourth of the period λ.sub.u. This maximizes the effect of reducing the magnitude of the magnetic force that occurs between the upper and lower magnet arrays. Here, defining the shift amount Δz to be one-fourth of the period λ.sub.u should be understood not to preclude allowing for a slight margin to accommodate an error. As mentioned in the description of the fourth improved configuration of the first embodiment, the gap-dependence of the attractive force and the gap-dependence of the repulsive force, even if the difference between them is slight, do differ from each other. To cope with that, the shift amount Δz may be deviated slightly from one-fourth of the period λ.sub.u. Even with this deviation, it is possible to consider the shift amount Δz substantially equal to one-fourth of the period λ.sub.u, and it is possible to consider that the deviation permits the shift amount Δz to be in the range of one-eighth or more but three-eighths or less of the period λ.sub.u.
[0098] As described previously with reference to
[0099] Like the undulator magnet array 1.sub.C or 1.sub.D of the first embodiment, the undulator magnet array 1.sub.GN may include a plurality of upper shifted magnet arrays, a plurality of upper reference magnet arrays, a plurality of lower shifted magnet arrays, and a plurality of lower reference magnet arrays. In this way, it is possible to distribute the compressive and tensile forces that act on the structural components (such as the magnet array beams 110 and 120 in
Third Embodiment
[0100] A third embodiment of the present invention will be described. Although the first embodiment assumes that the number M of magnets 30 present in one period λ.sub.u is four, it is also possible to form an undulator magnet array 1 where M is other than four. As examples, undulator magnet arrays 1 where M=2 or M=8 will be described below, with no intention of excluding undulator magnet arrays 1 where M is other than 2, 4, and 8.
[0101]
[0102]
[0103] In the undulator magnet array I.sub.PA in
[0104] In the undulator magnet array 1.sub.PA in
[0105]
[0106]
[0107] In the undulator magnet array 1.sub.QA in
[0108] In the undulator magnet array 1.sub.QA in
Fourth Embodiment
[0109] A fourth embodiment of the present invention will be described.
[0110] The undulator 100 includes the following components: an undulator magnet array 1 including an upper magnet array 10 and a lower magnet array 20; a magnet array beam 110 which holds the upper magnet array 10 integrally; a magnet array beam 120 which holds the lower magnet array 20 integrally; a vacuum chamber 130 which keeps in a vacuum state the space that encloses the undulator magnet array 1 and the magnet array beams 110 and 120; a high-rigidity beam 140U which is disposed over the vacuum chamber 130 and which supports the upper magnet array 10 and the magnet array beam 110 from above; a high-rigidity beam 140L which is disposed under the vacuum chamber 130 and which supports the lower magnet array 20 and the magnet array beam 120 from below; a vacuum introduction coupler 150U which couples together the high-rigidity beam 140U and the magnet array beam 110 by use of shafts 151U while keeping the vacuum state in the vacuum chamber 130; a vacuum introduction coupler 150L which couples together the high-rigidity beam 140L and the magnet array beam 120 by use of shafts 151L while keeping the vacuum state in the vacuum chamber 130; a ball screw driving mechanism 160 which is a driving mechanism coupled to the high-rigidity beams 140U and 140L and which enables, by use of a ball screw, the high-rigidity beams 140U and 140L to move in the up-down direction; and a base 170 to which the ball screw driving mechanism 160 is fitted and which has a substantially L-shaped sectional shape. A vacuum state in the vacuum chamber 130 denotes a state close to a vacuum, and may be any state with a barometric pressure at least lower than the atmospheric pressure.
[0111]
[0112] According to control signals from an unillustrated controller, the ball screw driving mechanism 160 can, by moving both the high-rigidity beams 140U and 140L individually in the up-down direction, or by moving one of the high-rigidity beams 140U and 140L in the up-down direction, vary the gap between the upper and lower magnet arrays 10 and 20. More specifically, for example, the ball screw driving mechanism 160 can, by moving the high-rigidity beam 140U upward and the high-rigidity beam 140L downward by the same amount, increase the gap between the upper and lower magnet arrays 10 and 20, and can, by moving the high-rigidity beam 140U downward and the high-rigidity beam 140L upward by the same amount, decrease the gap between the upper and lower magnet arrays 10 and 20. Thus, it can be said that the undulator 100 is provided with a holder which holds the undulator magnet array 1 such that the gap (interval) between the upper and lower magnet arrays 10 and 20 is variable. The holder can be considered to include the magnet array beams 110 and 120, the high-rigidity beams 140U and 140L, the vacuum introduction couplers 1500 and 150L, the ball screw driving mechanism 160, and the base 170.
[0113]
[0114] Electrons e are emitted from the electron gun 201, are accelerated to a speed corresponding to an energy of about 1 GeV (gigaelectronvolts) by the linear accelerator 202, are then further accelerated to a speed corresponding to an energy of about 8 GeV by the synchrotron 203 using radio-frequency waves, and then enter the storage ring 204 at a speed close to that of light.
[0115] The electrons e circulate inside the storage ring 204 while maintaining their energy, and are undulated by the periodic magnetic field produced by the undulator magnet array 1 disposed inside the storage ring 204 to emit synchrotron radiation R. The synchrotron radiation R enters a beam line 205, and is, inside the beam line 205, used for various research and practical purposes.
[0116] As described above, with the technology according to the first to fourth embodiments, it is possible to greatly reduce the magnetic attractive force between the upper and lower magnet arrays. It is thus possible to reduce the rigidity required in the structural components that support the upper and lower magnet arrays, and also to simplify the structure (including a driving mechanism) of an undulator and to greatly reduce the weight of the undulator as a whole. Consequently, it is possible to greatly save cost and time related to the manufacture and installation of the undulator.
Modifications
[0117] The embodiments of the present invention allow for many modifications made as necessary within the scope of the technical concept set forth in the appended claims. The embodiments described above are merely examples of how the present invention can be implemented, and the senses of the terms used to define the present invention and its features are not limited to those in which they are used in the description of the embodiments given above. All specific values mentioned in the above description are merely examples, and can naturally be altered to different values.
[0118] Although the above description deals with cases where the present invention is applied to a pair of magnet arrays (upper and lower magnet arrays) disposed opposite each other, similar configurations may be applied to various types of undulator magnet arrays and undulators (undulating equipment). For example, a Figure-8 undulator or a Spring-8 helical undulator includes three sets of magnet arrays (upper and lower magnet arrays), each set comprising a pair of magnet arrays disposed opposite each other, and the present invention can be applied to each of those sets. For another example, an Apple II undulator includes two sets of magnet arrays (upper and lower magnet arrays), each set comprising a pair of magnet arrays disposed opposite each other, and the present invention can be applied to each of those sets.
[0119] Although in the above embodiments, the magnet arrays 10 and 20 are assumed to be disposed side by side in the up-down direction, they may instead be disposed side by side in any direction (for example, in the left-right direction) other than the up-down direction.
LIST OF REFERENCE SIGNS
[0120] 1, 1.sub.REF, 1.sub.A to 1.sub.D, 1.sub.PA, 1.sub.PB, 1.sub.QA, 1.sub.QB undulator magnet array
[0121] 10, 10.sub.REF, 10.sub.A to 10.sub.D, 10.sub.PA, 10.sub.PB, 10.sub.QA, 10.sub.QB upper magnet array
[0122] 10S.sub.B to 10S.sub.D, 10S.sub.PA, 10S.sub.PB, 10S.sub.QA, 10S.sub.QB upper shifted magnet array
[0123] 10R.sub.B to 10R.sub.D, 10R.sub.PA, 10R.sub.PB, 10R.sub.QA, 10R.sub.QB upper reference magnet array
[0124] 20, 20.sub.REF, 20.sub.A to 20.sub.D, 20.sub.PA, 20.sub.PB, 20.sub.QA, 20.sub.QB lower magnet array
[0125] 20S.sub.B to 20S.sub.D 20S.sub.PA, 20S.sub.PB, 20S.sub.QA, 20S.sub.QB lower shifted magnet array
[0126] 20R.sub.B to 20R.sub.D, 20R.sub.PA, 20R.sub.PB, 20R.sub.QA, 20R.sub.QB lower reference magnet array
[0127] 30, 30a magnet
[0128] 100 undulator