SILOXANE MITIGATION FOR LASER SYSTEMS
20220352689 · 2022-11-03
Inventors
- Bryan Lochman (Nashville, TN, US)
- Wang-Long Zhou (Andover, MA, US)
- Francisco Villarreal-Saucedo (Middleton, MA, US)
- Bien Chann (Merrimack, NH, US)
Cpc classification
H01S5/4068
ELECTRICITY
H01S5/4012
ELECTRICITY
H01S5/143
ELECTRICITY
H01S5/4025
ELECTRICITY
H01S5/4062
ELECTRICITY
B23K26/00
PERFORMING OPERATIONS; TRANSPORTING
International classification
Abstract
In various embodiments, the concentration and deposition of siloxane materials within components of laser systems, such as laser resonators, is reduced or minimized utilizing mitigation systems that may also supply gas having low siloxane levels into multiple different components in series or in parallel.
Claims
1.-161. (canceled)
162. A laser apparatus comprising: a laser system comprising a plurality of enclosed components, at least one of the components comprising one or more beam emitters therewithin; a plurality of gas inlets, each gas inlet being configured to permit ingress of gas into a different component; an inlet manifold fluidly coupled to the plurality of gas inlets; a pump for supplying gas to the inlet manifold; and a siloxane-mitigation system configured to remove siloxanes from gas supplied to the inlet manifold by the pump.
163. The apparatus of claim 162, wherein at least one of the components is configured to allow leakage of the supplied gas therefrom into a surrounding ambient without a dedicated gas outlet.
164. The apparatus of claim 162, further comprising a plurality of gas outlets, each gas outlet being configured to permit egress of gas from a different component.
165. The apparatus of claim 164, further comprising an outlet manifold fluidly coupled to the plurality of gas outlets.
166. The apparatus of claim 165, wherein at least one of the components lacks a gas outlet fluidly coupled to the outlet manifold.
167. The apparatus of claim 165, wherein the pump is fluidly connected to the outlet manifold.
168. The apparatus of claim 165, wherein the outlet manifold is configured to release gas into a surrounding ambient.
169. The apparatus of claim 164, wherein at least one of the gas outlets is configured to release gas into a surrounding ambient.
170. The apparatus of claim 162, wherein at least one of the components does not comprise a beam emitter therewithin.
171. The apparatus of claim 162, further comprising one or more sensors configured to detect siloxanes within at least one component and/or within one or more conduits fluidly connected to at least one of the pump, at least one component, the inlet manifold, or the siloxane-mitigation system.
172. The apparatus of claim 162, further comprising a computer-based controller configured to introduce gas into the inlet manifold via operation of the pump.
173. The apparatus of claim 172, further comprising one or more sensors configured to detect siloxanes within at least one component and/or within one or more conduits fluidly connected to at least one of the pump, at least one component, the inlet manifold, or the siloxane-mitigation system, wherein the controller is responsive to signals received from the one or more sensors.
174. The apparatus of claim 173, wherein the controller is configured to introduce gas into the inlet manifold only when a siloxane concentration detected by at least one of the sensors exceeds a threshold.
175. The apparatus of claim 172, wherein the controller is configured to introduce gas into the inlet manifold continuously, at least during operation of the one or more beam emitters.
176. The apparatus of claim 172, wherein the controller is configured to introduce gas into the inlet manifold at regular intervals, irrespective of a siloxane concentration within one or more of the components.
177. The apparatus of claim 172, wherein the controller is configured to power down or power off the one or more beam emitters when a siloxane concentration detected by at least one of the sensors exceeds a threshold.
178. The apparatus of claim 162, wherein one of the components comprises a laser resonator having an enclosed laser cavity, the laser cavity comprising therewithin: a plurality of beam emitters each emitting a beam having a different wavelength; a dispersive element configured to receive beams emitted by the plurality of emitters and combine the beams into a multi-wavelength beam; and disposed optically downstream of the dispersive element, a partially reflective output coupler configured to (i) receive the multi-wavelength beam, (ii) transmit a first portion of the multi-wavelength beam as an output beam, and (iii) reflect a second portion of the multi-wavelength beam back toward the dispersive element.
179. The apparatus of claim 178, wherein: the laser cavity comprises a platform having first and second opposed sides and defining an opening therethrough; the plurality of beam emitters is disposed over the first side of the platform, the beams emitted thereby being directed through the opening in the platform; and the dispersive element is disposed over the second side of the platform and positioned to receive the beams directed through the opening.
180. The apparatus of claim 179, wherein the partially reflective output coupler is disposed over the second side of the platform.
181. The apparatus of claim 178, wherein the laser cavity comprises therewithin: a plurality of slow-axis collimation lenses disposed optically downstream of the plurality of beam emitters, each slow-axis collimation lens configured to receive one or more beams from one of the beam emitters; and a plurality of folding mirrors disposed optically downstream of the slow-axis collimation lenses and optically upstream of the dispersive element.
182. The apparatus of claim 181, wherein: the laser cavity comprises a platform having first and second opposed sides; the plurality of beam emitters is disposed over the first side of the platform; the plurality of slow-axis collimation lenses and the plurality of folding mirrors are disposed over the first side of the platform; the dispersive element is disposed over the second side of the platform; the platform defines an opening therethrough, and the beams emitted by the plurality of beam emitters are directed to the dispersive element through the opening; and the partially reflective output coupler is disposed over the second side of the platform.
183. The apparatus of claim 162, wherein the plurality of components comprises a plurality of laser resonators, each laser resonator comprising a plurality of beam emitters therewithin and being configured to combine beams emitted by the beam emitters into a combined beam.
184. The apparatus of claim 183, further comprising: a beam-combining module configured to receive the combined beams from the laser resonators and combine the combined beams into an output beam; and a fiber optic module configured to receive the output beam from the beam-combining module and supply the output beam to an optical fiber.
185. The apparatus of claim 162, further comprising a desiccant positioned to remove moisture from gas supplied to the inlet manifold by the pump.
186. The apparatus of claim 162, wherein the siloxane-mitigation system comprises a siloxane-adsorbing material and/or a siloxane-absorbing material.
187. The apparatus of claim 162, wherein the siloxane-mitigation system comprises a remediation system configured to remove siloxanes from the gas via at least one of condensation or reaction.
188. The apparatus of claim 162, wherein the siloxane-mitigation system comprises a liquid over and/or through which gas supplied to the inlet manifold is flowed.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0054] In the drawings, like reference characters generally refer to the same parts throughout the different views. Also, the drawings are not necessarily to scale, emphasis instead generally being placed upon illustrating the principles of the invention. In the following description, various embodiments of the present invention are described with reference to the following drawings, in which:
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DETAILED DESCRIPTION
[0062]
[0063] In various embodiments, the use of desiccant 140 alone (and/or systems and techniques designed for moisture removal) is insufficient to reduce siloxane concentration within resonator 100 to levels adequately low to ensure high-reliability operation. While the removal of moisture from gas within and/or supplied to resonator 100 may have additional beneficial effects, such removal is generally insufficient to adequately address siloxane-induced issues detailed herein.
[0064] The operation of all or a portion of system 115 (e.g., pump 125 and/or siloxane-mitigation system 120) may be controlled by a controller 145. For example, the controller 145 may operate the pump 125 at intervals, which may be irregularly or regularly scheduled, or the controller 145 may operate the pump 125 on demand (e.g., when initiated by an operator). In other embodiments, the controller 145 operates the pump 125 continuously (e.g., during operation of the resonator 100 and/or the beam emitters 110 therewithin, and/or when the resonator 100 and/or the beam emitters 110 are not powered or being operated). In various embodiments, the controller 145 may be responsive to one or more monitors or sensors for sensing siloxane concentration, and may therefore operate pump 125 when the siloxane concentration reaches a threshold level. In various embodiments, the controller 145 may even power down or power off resonator 100 (and/or one or more beam emitters 110) when sensed siloxane concentration within the resonator 100 reaches a threshold level. Such monitors or sensors may be positioned at various locations within system 115, e.g., within the laser cavity 105, and/or within one or more conduits constituting the gas-flow path indicated in
[0065] The controller 145 may be provided as either software, hardware, or some combination thereof. For example, the system may be implemented on one or more conventional server-class computers, such as a PC having a CPU board containing one or more processors such as the Pentium or Celeron family of processors manufactured by Intel Corporation of Santa Clara, Calif., the 680x0 and POWER PC family of processors manufactured by Motorola Corporation of Schaumburg, Ill., and/or the ATHLON line of processors manufactured by Advanced Micro Devices, Inc., of Sunnyvale, Calif. The processor may also include a main memory unit for storing programs and/or data relating to the methods described herein. The memory may include random access memory (RAM), read only memory (ROM), and/or FLASH memory residing on commonly available hardware such as one or more application specific integrated circuits (ASIC), field programmable gate arrays (FPGA), electrically erasable programmable read-only memories (EEPROM), programmable read-only memories (PROM), programmable logic devices (PLD), or read-only memory devices (ROM). In some embodiments, the programs may be provided using external RAM and/or ROM such as optical disks, magnetic disks, as well as other commonly used storage devices. For embodiments in which the functions are provided as one or more software programs, the programs may be written in any of a number of high level languages such as FORTRAN, PASCAL, JAVA, C, C++, C#, BASIC, various scripting languages, and/or HTML. Additionally, the software may be implemented in an assembly language directed to the microprocessor resident on a target computer; for example, the software may be implemented in Intel 80x86 assembly language if it is configured to run on an IBM PC or PC clone. The software may be embodied on an article of manufacture including, but not limited to, a floppy disk, a jump drive, a hard disk, an optical disk, a magnetic tape, a PROM, an EPROM, EEPROM, field-programmable gate array, or CD-ROM.
[0066] In various embodiments, the siloxane-mitigation system 120 may include, consist essentially of, or consist of a material for adsorption of the siloxane from the gas stream, such as activated carbon, silica gel, polymer beads, or one or more molecular sieves. In addition or instead, the siloxane-mitigation system 120 may include, consist essentially of, or consist of a material (e.g., a liquid) for absorption of the siloxane from the gas stream, such as one or more organic solvents, mineral oil, or even water. In the siloxane-mitigation system 120, the gas to be pumped into the laser cavity 105 may flow over and/or through (e.g., bubbled through) one or more such materials for adsorption and/or absorption of siloxanes from the gas.
[0067] In some embodiments, the siloxane-mitigation system 120 may alternatively, or in addition, include, consist essentially of, or consist of a remediation system that removes siloxane from the gas stream via condensation (e.g., one or more cooling systems) and/or reaction (such as catalysis). For example, for condensation, the siloxane-mitigation system 120 may include, consist essentially of, or consist of a device or material producing sufficiently low temperature and/or pressure to condense at least a portion of the siloxanes from the gas. For example, the siloxane-mitigation system 120 may include, consist essentially of, or consist of a refrigeration system and/or heat exchanger to cool the gas to a temperature below approximately 5° C. (for, e.g., removal of about 15%-50% of the siloxanes), or even below approximately −25° C. or −30° C. (for, e.g., removal of about 95% or more of the siloxanes). Catalytic systems in accordance with embodiments of the invention may include, consist essentially of, or consist of a material such as activated alumina (and/or one or more other porous and/or ceramic materials) for reaction (and thus removal) of the siloxanes from the gas; such catalyst materials may be replenished one or more times during and/or after operation of the laser system.
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[0070] In various embodiments of the invention, system 200 may be applied to multiple components within a single resonator 100 or to multiple different resonators 100 (and/or components thereof). For example, as shown in
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[0072] Although only one siloxane-mitigation system 120 is depicted in
[0073] Laser systems in accordance with embodiments of the present invention may utilize WBC technology and may therefore include WBC laser systems and related components.
[0074] In various embodiments, each of the diode bars 405 is associated with (e.g., attached or otherwise optically coupled to) a fast-axis collimator (FAC)/optical twister microlens assembly that collimates the fast axis of the emitted beams while rotating the fast and slow axes of the beams by 90°, such that the slow axis of each emitted beam is perpendicular to the WBC dimension downstream of the microlens assembly. The microlens assembly also converges the chief rays of the emitters from each diode bar 405 toward a dispersive element 410. Suitable microlens assemblies are described in U.S. Pat. No. 8,553,327, filed on Mar. 7, 2011, and U.S. Pat. No. 9,746,679, filed on Jun. 8, 2015, the entire disclosure of each of which is hereby incorporated by reference herein.
[0075] As shown in
[0076] Also depicted in
[0077] As shown in
[0078] Various embodiments of the invention implement an external cavity laser system and reduce the required size of the resonator using a laser cavity that extends along opposing sides of the resonator.
[0079] In various embodiments, the gas inlet and outlet for flow of gas into and out of the laser cavity of resonator 500 may be disposed on one or both of the cover plates sealed to the resonator 500 along the sealing paths 505. Reflectors such as mirrors may be utilized to direct the beams from one or more beam emitters within the laser cavity, and, since the laser cavity extends along both sides, the overall size of the resonator 500 may be correspondingly reduced for the same cavity size (e.g., compared to a resonator having an optical cavity on only one side).
[0080] In the exemplary embodiment shown in
[0081] As shown in
[0082] In various embodiments of the invention, a laser system incorporates multiple resonators 100, as shown in
[0083] As mentioned herein, in various embodiments of the present invention, the output beams of the laser systems or laser resonators may be propagated, e.g., via a fiber optic module, to a delivery optical fiber (which may be coupled to a laser delivery head) and/or utilized to process a workpiece. In various embodiments, a laser head contains one or more optical elements utilized to focus the output beam onto a workpiece for processing thereof. For example, laser heads in accordance with embodiments of the invention may include one or more collimators (i.e., collimating lenses) and/or focusing optics (e.g., one or more focusing lenses). A laser head may not include a collimator if the beam(s) entering the laser head are already collimated. Laser heads in accordance with various embodiments may also include one or more protective window, a focus-adjustment mechanism (manual or automatic, e.g., one or more dials and/or switches and/or selection buttons). Laser heads may also include one or more monitoring systems for, e.g., laser power, target material temperature and/or reflectivity, plasma spectrum, etc. A laser head may also include optical elements for beam shaping and/or adjustment of beam quality (e.g., variable BPP) and may also include control systems for polarization of the beam and/or the trajectory of the focusing spot. In various embodiments, the laser head may include one or more optical elements (e.g., lenses) and a lens manipulation system for selection and/or positioning thereof for, e.g., alteration of beam shape and/or BPP of the output beam, as detailed in U.S. patent application Ser. No. 15/188,076, filed on Jun. 21, 2016, the entire disclosure of which is incorporated by reference herein. Exemplary processes include cutting, piercing, welding, brazing, annealing, etc. The output beam may be translated relative to the workpiece (e.g., via translation of the beam and/or the workpiece) to traverse a processing path on or across at least a portion of the workpiece.
[0084] In embodiments utilizing an optical delivery fiber, the optical fiber may have many different internal configurations and geometries. For example, the optical fiber may include, consist essentially of, or consist of a central core region and an annular core region separated by an inner cladding layer. One or more outer cladding layers may be disposed around the annular core region. Embodiments of the invention may incorporate optical fibers having configurations described in U.S. patent application Ser. No. 15/479,745, filed on Apr. 5, 2017, and U.S. patent application Ser. No. 16/675,655, filed on Nov. 6, 2019, the entire disclosure of each of which is incorporated by reference herein.
[0085] In various embodiments, the controller may control the motion of the laser head or output beam relative to the workpiece via control of, e.g., one or more actuators. The controller may also operate a conventional positioning system configured to cause relative movement between the output laser beam and the workpiece being processed. For example, the positioning system may be any controllable optical, mechanical or opto-mechanical system for directing the beam through a processing path along a two- or three-dimensional workpiece. During processing, the controller may operate the positioning system and the laser system so that the laser beam traverses a processing path along the workpiece. The processing path may be provided by a user and stored in an onboard or remote memory, which may also store parameters relating to the type of processing (cutting, welding, etc.) and the beam parameters necessary to carry out that processing. The stored values may include, for example, beam wavelengths, beam shapes, beam polarizations, etc., suitable for various processes of the material (e.g., piercing, cutting, welding, etc.), the type of processing, and/or the geometry of the processing path.
[0086] As is well understood in the plotting and scanning art, the requisite relative motion between the output beam and the workpiece may be produced by optical deflection of the beam using a movable mirror, physical movement of the laser using a gantry, lead-screw or other arrangement, and/or a mechanical arrangement for moving the workpiece rather than (or in addition to) the beam. The controller may, in some embodiments, receive feedback regarding the position and/or processing efficacy of the beam relative to the workpiece from a feedback unit, which will be connected to suitable monitoring sensors.
[0087] In addition, the laser system may incorporate one or more systems for detecting the thickness of the workpiece and/or heights of features thereon. For example, the laser system may incorporate systems (or components thereof) for interferometric depth measurement of the workpiece, as detailed in U.S. patent application Ser. No. 14/676,070, filed on Apr. 1, 2015, the entire disclosure of which is incorporated by reference herein. Such depth or thickness information may be utilized by the controller to control the output beam to optimize the processing (e.g., cutting, piercing, or welding) of the workpiece, e.g., in accordance with records in the database corresponding to the type of material being processed.
[0088] The terms and expressions employed herein are used as terms of description and not of limitation, and there is no intention, in the use of such terms and expressions, of excluding any equivalents of the features shown and described or portions thereof, but it is recognized that various modifications are possible within the scope of the invention claimed.