Generating neutron
09805830 · 2017-10-31
Assignee
Inventors
Cpc classification
International classification
Abstract
The present invention provides a neutron generating device for generating a high neutron flux by forming plasma in the vicinity of a target and by accelerating electrons and charged particles in the plasma toward the target. Magnetic field is formed in the vicinity of the target and a microwave generator irradiates microwaves into the space where the magnetic field is generated to thereby generate plasma in the space. The accelerated electrons and charged particles collide with the target to generate neutron flux. Also, to prevent the target surface from being excessively heated, the plasma is generated in a pulsed mode and target voltage is applied in a pulsed mode. To secure a continuous process, the level of target bias voltage for the target is adjusted so that the target re-adsorbs elements when the elements adsorbed on the target are depleted.
Claims
1. A neutron generating device, comprising: a plasma generating chamber; a target disposed in the chamber, neutron generating elements being adsorbed onto the target; a magnet structure disposed around the target generating a magnetic field around the target; a microwave generator for emitting microwaves into a space where the magnetic field is generated; and a power supply for applying a bias voltage to the target, wherein the target has a shape of a cylinder and wherein the magnet structure is formed as coupled cylinders or rings that surround a portion of the target from an outside of the target and produces bridge-type magnetic field lines around the target, and wherein plasma is generated by the microwaves from the microwave generator and wherein electrons and charged particles in the plasma are accelerated toward the target by the bias voltage applied by the power supply and collide with the neutron generating elements on the target to generate a neutron flux.
2. The neutron generating device of claim 1, wherein the microwave generator irradiates pulsed microwaves into the plasma generating chamber to generate plasma in a pulsed mode.
3. The neutron generating device of claim 1, wherein the bias voltage is applied to the target in a pulsed mode.
4. The neutron generating device of claim 2, wherein the bias voltage is applied to the target in a pulsed mode.
5. The neutron generating device of claim 1, wherein the magnet structure is formed as coupled cylinders or rings and wherein the target is aligned as a line or plate along a central axis of the magnet structure to produce bridge-type magnetic field lines that surround the target.
6. The neutron generating device of claim 2, wherein the magnet structure is formed as coupled cylinders or rings and wherein the target is aligned as a line or plate along a central axis of the magnet structure to produce bridge-type magnetic field lines that surround the target.
7. The neutron generating device of claim 5, wherein the bias voltage is applied to the target in a pulsed mode.
8. The neutron generating device of claim 6, wherein the bias voltage is applied to the target in a pulsed mode.
9. The neutron generating device of claim 5, wherein the magnet structure is formed as multiple couples of cylinders or rings and wherein the target is aligned as a line or plate along a central axis of the magnet structure to produce multi-mode bridge-type magnetic field lines that surround the target.
10. The neutron generating device of claim 6, wherein the magnet structure is formed as multiple couples of cylinders or rings and wherein the target is aligned as a line or plate along a central axis of the magnet structure to produce multi-mode bridge-type magnetic field lines that surround the target.
11. The neutron generating device of claim 10, wherein the bias voltage is applied to the target in a pulsed mode.
12. The neutron generating device of claim 1, wherein the target includes an internal space, and gases containing nuclear fusion reactant elements that include at least one of deuterium or tritium are filled in the internal space.
13. The neutron generating device of claim 2, wherein the target includes an internal space, and gases containing nuclear fusion reactant elements that include at least one of deuterium or tritium are filled in the internal space.
14. A gamma ray generating source, comprising: a plasma generating chamber; a target mounted inside the chamber, gamma ray generating elements being adsorbed onto the target; a magnet structure installed around the target and generating a magnetic field around the target; a microwave generator that irradiates microwaves into a space in which the magnetic field is generated; and a power supply that applies a bias voltage to the target, wherein the target has a shape of a plate and wherein the magnet structure includes an array of multiple magnets mounted on an upper side of the target and produces bridge-type magnetic field lines surrounding the target, and wherein plasma is generated by microwaves from the microwave generator and wherein electrons and charged particles in the plasma are accelerated toward the target by the bias voltage applied by the power supply and collide with the gamma ray generating elements on the target to generate a gamma ray flux.
15. The gamma ray generating source of claim 14, wherein the bias voltage to the target is applied in a pulsed mode.
16. A neutron generating source, comprising: a plasma generating chamber; a target mounted inside the chamber, neutron generating elements being adsorbed onto the target; a magnet structure installed around the target and generating a magnetic field around the target; a microwave generator that irradiates microwaves into a space in which the magnetic field is generated; and a power supply that applies a bias voltage to the target, wherein the target has a shape of a cylinder and wherein the magnet structure is formed as coupled cylinders or rings that surround the target from an outside of the target and produces bridge type magnetic field lines around the target, and wherein plasma is generated by microwaves from the microwave generator and wherein electrons and charged particles in the plasma are accelerated toward the target by the bias voltage applied by the power supply and collide with the neutron generating elements on the target to generate a neutron flux.
17. The neutron generating device of claim 16, wherein the bias voltage is applied to the target in a pulsed mode.
Description
BRIEF DESCRIPTION OF DRAWINGS
(1)
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DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS
(6) Preferred embodiments of the present invention will be described with reference to the accompanying drawings.
(7)
(8) The target 200 onto which deuterium (D) or tritium (T) is adsorbed is attached on an internal surface of a side of a housing 150 that constitutes a plasma chamber while a magnetic structure 300 is mounted on an upper side of the target 200, that is, on an outside surface of the side of the housing 150 so as to generate a bridge-style magnetic field (magnetic field lines) with the target 200 as its center. Meanwhile, a microwave generator 500 as a plasma generating source is installed in the plasma chamber, gases containing D or T are flowed in, and a power supply 400, which applies bias voltage to the target 200 to direct the plasma produced by microwave irradiation to the target 200, is connected to the target 200.
(9) The configuration as described above may have characteristics as follows.
(10) Bridge-type magnetic field lines 350 that are generated as surrounding the target 200 confine the electrons and charged particles forming the plasma generated by the incident microwaves for producing the plasma inside the magnetic lines of force 350. Consequently, plasma in a high density exists in the vicinity of a surface of the target 200 and, when bias voltage is applied to the target, a high plasma ion flux accelerated via plasma sheath present between the plasma and the target collides with the target 200 to generate a high neutron flux. It is crucial to cause a plasma producing area by electron cyclotron resonance (ECR) heating to be formed in a magnetic field adjacent to the target in order for generating plasma in a high density in the vicinity of a target. This contrasts with a fact in the conventional neutron generating source that the neutron generating source forms a magnetic field adjacent to a target just in order to return secondary electrons generated on the target surface to the target surface while no plasma is generated in the magnetic field in the vicinity of the target so that the magnetic field surrounding the target prohibits the plasma formed on the opposite side to the target relative to the magnetic field, that is, outside the magnetic field from moving, by diffusion, to the target surface, thereby resulting in a lower density of the plasma in the vicinity of the target, which consequently produces a small amount of neutrons.
(11) In addition, the configuration of this embodiment is also advantageous in that it prevents the target 200 from being excessively heated because, by using microwaves as a plasma source, it generates pulsed mode ECR plasma in the vicinity of (just over) the target and applies pulsed voltage to the target 200, which sufficiently reduces the average power applied to the target 200. If the target is excessively heated, the elements for generating radiation particles, such as D or T, adsorbed onto the target may evaporate, which lowers the generation density of such radiation particles. The present invention may avoid excessive heating of the target surface by generating pulse mode plasma and at the same time applying pulsed voltage to the target, which contrasts with the fact in the conventional techniques, that the plasma continues to persist thereby inevitably heating the target surface even with the help of cooling the target.
(12) In addition, the configuration illustrated in
(13) The cylindrical neutron generating source illustrated in
(14) The embodiment illustrated in
(15) Also in the embodiment illustrated in
(16) Although
(17) The configuration illustrated in
(18) The configuration illustrated in
(19) The frequency of the microwaves employed in the above-described embodiments and the intensity of the magnetic field were 2.45 GHz and 875 gauss, respectively, but are not limited to the values. Any microwave of which frequency is higher than the ionic frequency of the plasma and any resonance magnetic field corresponding to such a microwave frequency may be used. Here, the ionic frequency of plasma Ω.sub.i and the resonance magnetic field B are expressed by the following formulas:
Ω.sub.i=√{square root over (4πn.sub.iZ.sup.2e.sup.2/m.sub.i)}
(20) where, n.sub.i: density of the ion Z: atomic number e: electronic charge m.sub.i: mass of the ion
(21)
(22) where, f: frequency of the microwave e: electronic charge m.sub.e: mass of electron
(23) A neutron generating source capable of producing a high neutron flux may be manufactured in this way.
(24) Meanwhile, it is necessary to replace all the targets irrespective of their shapes because, as a nuclear fusion reaction proceeds, the nuclear fusion reactant elements adsorbed onto the target become depleted. However, to eliminate any inefficiency of ceasing the reaction and breaking vacuum for, the embodiments according to the present invention employ a following method to adsorb nuclear fusion elements onto a target.
(25) If the bias voltage applied to the target is significantly lowered than the bias voltage to trigger a nuclear fusion reaction, the nuclear fusion reaction is ceased and the plasma ions collide with the target with an impact less than that at the time of the nuclear fusion reaction, thereby adsorbing the ions derived from the nuclear fusion elements contained in the plasma onto the target. In this manner, the reaction is continuously processed without target replacement.
(26) This method, which accounts for a target recycling method, according to the present invention may counter all the drawbacks of the conventional technique including process cessation due to target replacement and additional expenses and environmental impacts due to the entire disposal, without any recycling, of targets that have depleted all the elements adsorbed thereto.
(27) In the case of the bias voltage, although the peak pulse for a nuclear fusion reaction is about a few hundreds kV, a DC voltage less than a few hundreds V is high enough to adsorb nuclear fusion elements onto a target, inter alia, a few decades of voltage region is efficient.
(28) The present invention configures a hot target that is differentiated from the conventional technique.
(29) In other words, in the conventional target, when causing a nuclear fusion reaction using plasma, a continuous cooling of the target is required because the nuclear fusion reactant elements adsorbed in the target are depleted out of the target as the target is heated as the process proceeds. Such a cold target has a very short life, which consequently hinders the persistence of the nuclear fusion reaction process.
(30) To overcome the problem aforementioned, the embodiments according to the present invention provide an improved shape of a target that has a hollow space therein. Gases containing nuclear fusion reactant elements are flowed into and maintained in the space, thereby not cooling the target. In such a hot target configuration, the heat generated from the target activates the diffusion via which the gas that is confined in the internal space of the target and contains the nuclear fusion reactant elements is adsorbed to the target body, thereby persistently facilitating neutron or gamma ray generation by plasma ions that act on the target surface. That is, the reaction persists and the target life extends because the adsorption of the nuclear fusion element-containing gas starts from the internal space of the target and diffuses towards the surface of the target while the neutron or gamma ray generation via collision of plasma ions with the target occurs on the outer surface of the target. This configuration that involves a hollow target is also advantageous in the above-described embodiments in which the target is not excessively heated.
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(32) When considering the fact that the target is manufactured out of metallic materials such as Ti (but not limited thereto), since its melting point is over 1,000° C., a reaction may persist even the process temperature is at a few hundreds ° C. without any necessity of cooling the target.
(33) The description thus far is nothing more than an exemplification of the technical thoughts of this invention and a person skilled in the art to which this invention belongs may, not deviating from the scope of the essential features of this invention, amend and modify this example. In this perspective, the preferred embodiments demonstrated in this invention are not to restrict but to expound the technical thoughts of this invention while the scope of the technical thoughts of this invention shall not restricted within such examples. The scope of the protection for this invention should be interpreted based on the claims as follows and all the technical thoughts in the scope equivalent to that of those Claims should be comprehended to be included in the scope of the rights of this invention.
INDUSTRIAL APPLICABILITY
(34) Neutron or gamma ray generating techniques according to the present invention may be widely utilized in nuclear material detection, oil layer exploration, material structure research, medicine study, or the like.