Current sense ratio compensation
09804205 · 2017-10-31
Assignee
Inventors
Cpc classification
G01R35/005
PHYSICS
International classification
Abstract
A method for sensing the current in a high-electron-mobility transistor (HEMT) that compensates for changes in a drain-to-source resistance of the HEMT. The method includes receiving a sense voltage representative of the current in the HEMT, receiving a compensation signal representative of a drain-to-source voltage of the HEMT, and outputting as a compensated sense voltage a linear combination of the sense voltage and the compensation signal.
Claims
1. A device comprising: a power high-electron-mobility transistor (HEMT) comprising: a first main terminal; a second main terminal; and a first gate disposed to regulate conductivity between the first main terminal and the second main terminal of the power HEMT; a current sense HEMT comprising: a third main terminal coupled to the first main terminal of the power HEMT; a fourth main terminal; and a second gate disposed to regulate conductivity between third main terminal and the fourth main terminal of the current sense HEMT, wherein the second gate is coupled to the first gate of the power HEMT; a voltage sense HEMT comprising: a fifth main terminal coupled to the first main terminal of the power HEMT; a sixth main terminal; and a third gate disposed to regulate conductivity between fifth main terminal and the sixth main terminal, wherein the third gate is coupled to the first gate of the power HEMT; a current sense resistance coupled between the second main terminal of the power HEMT and the fourth main terminal of the current sense HEMT; a voltage sense resistance coupled between the second main terminal of the power HEMT and the sixth main terminal of the voltage sense HEMT; a first normally-off transistor coupled in a cascode arrangement with the power HEMT; a second normally-off transistor coupled in a cascode arrangement with the current sense HEMT; and a third normally-off transistor coupled in a cascode arrangement with the voltage sense HEMT.
2. The device of claim 1, wherein: the current sense resistance has a resistance that is less than a resistance between the third main terminal and the fourth main terminal when the current sense HEMT is in a saturated conductive state; and the voltage sense resistance has a resistance that is greater than a resistance between the fifth main terminal and the sixth main terminal when the voltage sense HEMT is in a saturated conductive state.
3. The device of claim 2, wherein: the current sense resistance has a resistance that is less than 0.1 times the resistance between the third main terminal and the fourth main terminal when the current sense HEMT is in a saturated conductive state; and the voltage sense resistance has a resistance that is greater than 10 times the resistance between the fifth main terminal and the sixth main terminal when the voltage sense HEMT is in a saturated conductive state.
4. The device of claim 1, wherein the power HEMT, the current sense HEMT, and the voltage sense HEMT are formed on a single die.
5. The device of claim 1, wherein the power HEMT, the current sense HEMT, and the voltage sense HEMT are Group III compound semiconductor HEMTs.
6. The device of claim 1, wherein the power HEMT in a saturated conductive state conducts a current that is greater than ten times a current conducted by the current sense HEMT in a saturated conductive state.
7. The device of claim 1, further comprising a compensation circuit coupled to receive: from the current sense HEMT, a current sense signal representative of the current through the power HEMT; and from the voltage sense HEMT, a voltage sense signal representative of the voltage across the power HEMT.
8. The device of claim 7, wherein the compensation circuit is coupled to output a compensated sense current signal representative of a difference between a scaled version of the current sense signal and a scaled version of the voltage sense signal.
9. The device of claim 7, wherein the compensation circuit comprises one or more amplifiers coupled to output a compensated sense current signal of:
A.sub.i(A.sub.iiV.sub.SEN−A.sub.iiiV.sub.DS), wherein: A.sub.ii, A.sub.ii, and A.sub.iii are scaling values, at least two of which are related to a resistance between the first main terminal of the power HEMT and the second main terminal of the power HEMT when the power HEMT is in a saturated conductive state; V.sub.SEN is the current sense signal; and V.sub.DS is the voltage sense signal.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1) Non-limiting and non-exhaustive embodiments of the present invention are described with reference to the following figures, wherein like reference numerals refer to like parts throughout the various views unless otherwise specified.
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DETAILED DESCRIPTION
(13) Among the challenges that arise in the design of a sense transistor for use in a power integrated circuit (IC) with a GaN-based power transistor is the variation of the drain to source resistance of the power transistor with respect to its drain to source voltage. As a result, for a fixed drain current of the power transistor, the current sampled by the sense transistor varies as the drain to source voltage of the power transistor varies. This causes the current sense ratio to deviate from the desired constant value.
(14)
(15) In the illustrated implementation, source electrode 140 and drain electrode 160 both rest directly on an upper surface of second semiconductor layer 130 to make electrical contact therewith. This is not necessarily the case. For example, in some implementations, source electrode 140 and/or drain electrode 160 penetrate into second semiconductor layer 130. In some implementations, this penetration is deep enough that source electrode 140 and/or drain electrode 160 contact or even pass through the heterojunction. As another example, in some implementations, one or more interstitial glue, metal, or other conductive materials are disposed between source electrode 140 and/or drain electrode 160 and one or both of semiconductor layers 120, 130.
(16) In the illustrated implementation, gate electrode 150 is electrically insulated from second semiconductor layer 130 by a single electrically-insulating layer 170 having a uniform thickness. This is not necessarily the case. For example, in other implementations, a multi-layer can be used to insulate gate electrode 150 from second semiconductor layer 130. As another example, a single or multi-layer having a non-uniform thickness can be used to insulate gate electrode 150 from second semiconductor layer 130.
(17) The various features of lateral-channel HEMT 100 can be made from a variety of different materials, including Group III compound semiconductors. For example, first semiconductor layer 120 can be one of gallium nitride (GaN), indium nitride (InN), aluminum nitride (AlN), aluminum gallium nitride, (AlGaN), indium gallium nitride (InGaN), and indium gallium aluminum nitride (InGaAlN). In some implementations, first semiconductor layer 120 can also include compound semiconductors containing arsenic such as one or more of, e.g., gallium arsenide (GaAs), indium arsenide (InAs), aluminum arsenide (AlAs), indium gallium arsenide (InGaAs), aluminum gallium arsenide (AlGaAs), and indium aluminum gallium arsenide (InAlGaAs). Second semiconductor layer 130 can be, e.g., AlGaN, GaN, InN, InGaN, or AlInGaN. Second semiconductor layer 130 can also include compound semiconductors containing arsenic such as one or more of GaAs, InAs, AlAs, InGaAs, AlGaAs, or InAlGaAs. The compositions of first and second semiconductor layers 120, 130—which also can be referred to as active layers—are tailored such that a two-dimensional electron gas forms at the heterojunction. For example, in some implementations, the compositions of first and second semiconductor layers 120, 130 can be tailored such that a sheet carrier density of between 10.sup.11 to 10.sup.14 cm.sup.−2 arises at the heterojunction. In some implementations, a sheet carrier density of between 5×10.sup.12 to 5×10.sup.13 cm.sup.−2 or between 8×10.sup.12 to 1.2×10.sup.13 cm.sup.−2 arises at the heterojunction. First and second semiconductor layers 120, 130 can be formed above substrate layer 110 which can be, e.g., GaN, GaAs, silicon carbide (SiC), sapphire (Al.sub.2O.sub.3), or silicon. First semiconductor layer 120 can be in direct contact with such a substrate layer, or one or more intervening layers can be present.
(18) Source electrode 140, drain electrode 160, and gate electrode 150 can be made from various electrical conductors including, e.g., metals such as aluminum (Al), nickel (Ni), titanium (Ti), titanium tungsten (TiW), titanium nitride (TiN), titanium gold (TiAu), titanium aluminum molybdenum gold (TiAlMoAu), titanium aluminum nickel gold (TiAlNiAu), titanium aluminum platinum gold (TiAlPtAu), or the like. Insulating layer 170 can be made from various dielectrics suitable for forming a gate insulator including, e.g., (Al.sub.2O.sub.3), zirconium dioxide (ZrO.sub.2), aluminum nitride (AlN), hafnium oxide (HfO.sub.2), silicon dioxide (SiO.sub.2), silicon nitride (Si.sub.3N.sub.4), aluminum silicon nitride (AlSiN), or other suitable gate dielectric materials. Insulating layer 170 can also be referred to as a passivation layer in that layer 170 hinders or prevents the formation and/or charging of surface states in the underlying second semiconductor layer 130.
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(21) The HEMT device includes a HEMT sense transistor Q.sub.SEN 204 for sensing the drain current of the main transistor. Sense transistor 204 shares drain and control terminals with those of main transistor 202. Source terminal of sense transistor 204 is coupled to ground reference 210 with a sense resistor R.sub.SEN 206. Sense transistor 204 is also a depletion mode transistor; hence, sense transistor 204 is in a conducting state when the voltage at its gate terminal is less than a threshold voltage above its source terminal.
(22) Current source 200 is coupled to provide a current I.sub.D to the node A. The current I.sub.D is approximately equal to the drain current of main transistor 202. A relatively small fraction (e.g., one hundredth or less) of this current is drawn by sense transistor 204 as a sense current I.sub.SEN 208. Therefore, sense current I.sub.SEN 208 is representative of the drain current of main transistor 202. Since sense resistor R.sub.SEN 206 conducts the same current as sense transistor 204, the voltage that develops across sense resistor R.sub.SEN 206, which is referred to as a sense voltage V.sub.SEN 212, is representative of sense current I.sub.SEN 208. Hence, V.sub.SEN 212 sense voltage is also representative of the drain current of main transistor 202. In operation, sense voltage V.sub.SEN 212 is less than the threshold voltage of sense transistor 204 so that sense transistor 204 is in the conducting state when main transistor 202 is conducting current.
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(24) It can be shown that sense voltage V.sub.SEN 212 is given by:
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where K represents the ratio of the resistance of resistor 224 to the resistance of resistor R.sub.FET 222. As can be seen from equation (1), sense voltage V.sub.SEN 212 (and hence, sense current I.sub.SEN 208) is dependent on the drain to source resistance of main transistor 202 (resistance of resistor R.sub.FET 222). Therefore, the ratio of the drain current of main transistor 202 to sense current I.sub.SEN 208 is also dependent on the drain to source resistance of main transistor 202. Assuming that sense current I.sub.SEN 208 is several orders of magnitude (e.g., at least 100 times) lower than the drain current of main transistor 202 (I.sub.SEN<<I.sub.D), the drain to source resistance of main transistor 202 can be approximated as:
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where V.sub.DS corresponds to the voltage between the drain and the source terminals (i.e., the drain to source voltage) of main transistor 202. Substituting this expression for resistor R.sub.FET 222 in equation (1), an alternative expression for sense voltage V.sub.SEN 212 can be obtained as follows:
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This equation implies that sense current I.sub.SEN 208, which can be obtained by dividing sense voltage V.sub.SEN 212 by the resistance of sense resistor R.sub.SEN 206, deviates from I.sub.D/(1+K) due to the influence of the drain to source voltage of main transistor 202. In other words, the drain to source voltage of main transistor 202 causes sense current I.sub.SEN 208 to deviate from a fixed fraction of the drain current of main transistor 202. The amount that sense current I.sub.SEN 208 deviates from I.sub.D/(1+K) decreases with increasing drain to source voltage of main transistor 202. To compensate for this deviation, both sense voltage V.sub.SEN 212 and the drain to source voltage of main transistor 202 may need to be measured.
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(30) After adding the compensation signal U.sub.CMP to sense voltage V.sub.SEN 212 given by equation (1) and manipulating the resulting expression such that the compensated sense voltage V.sub.SENCMP has the same value for a lower limit V.sub.DSL and a higher limit V.sub.DSH, the following expression for the compensated sense voltage V.sub.SENCMP can be obtained:
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where the lower limit V.sub.DSL and the higher limit V.sub.DSH represent the lower and the higher limits, respectively, of a range of values of the voltage V.sub.DS over which the influence of the voltage V.sub.DS on sense voltage V.sub.SEN 212 is aimed to be reduced. In equation (4), a nominal voltage V.sub.NOM represents a value of the compensated sense voltage V.sub.SENCMP that results in a desired ratio (e.g., 1/(1+K)) between a compensated sense current (which can be found by dividing the compensated sense voltage V.sub.SENCMP by the resistance of sense resistor R.sub.SEN 206) and the drain current of main transistor 202 for the lower limit V.sub.DSL and the higher limit V.sub.DSH. In one example, nominal voltage V.sub.NOM is equal to V.sub.LIM which is I.sub.DR.sub.SEN/(1+K). As further illustrated by curve 316, the compensated voltage V.sub.SENCMP reaches a maximum value V.sub.MAX when the voltage V.sub.DS equals V.sub.DSM between the lower limit V.sub.DSL and the higher limit V.sub.DSH. The maximum value V.sub.MAX can be expressed as follows:
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In the illustrated example, the compensated sense voltage V.sub.SENCMP may vary less with respect to the voltage V.sub.DS when the voltage V.sub.DS is between the lower limit V.sub.DSL and higher limit V.sub.DSH. This means that the resulting compensated sense current may deviate less from I.sub.D/(1+K) when the drain to source resistance of main transistor 202 is between a low value of R.sub.DSL (i.e., V.sub.DSL/I.sub.D) and a high value of R.sub.DSH (i.e., V.sub.DSH/I.sub.D). In this manner, the influence of the drain to source resistance of main transistor 202 on sense current I.sub.SEN 208 can be reduced such that the ratio of the drain current of main transistor 202 to sense current I.sub.SEN 208 deviates less from the desired value of (1+K).
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(34) It can be shown that if the values of A.sub.1, A.sub.2, and A.sub.3 are chosen as follows:
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then the signal at the output of differential amplifier 430 corresponds to compensated sense voltage V.sub.SENCMP given by equation (4). As previously explained, this signal will be equal to I.sub.DR.sub.SEN/(1+K) when the drain to source resistance of main transistor 202 is equal to the low value of R.sub.DSL or the high value of R.sub.DSH. Accordingly, if this signal is applied to sense resistor R.sub.SEN 406 such as, for example, by coupling sense resistor R.sub.SEN 406 between the output of differential amplifier 430 and ground reference 210, the resulting current in sense resistor R.sub.SEN 406 (which has the same value as resistor R.sub.SEN 206) becomes representative of the compensated sense current and equal to I.sub.D/(1+K) when the drain to source resistance of main transistor 202 is equal to the low value of R.sub.DSL or the high value of R.sub.DSH. In addition, when the drain to source resistance of main transistor 202 varies between the low value of R.sub.DSL and the high value of R.sub.DSH, the deviation of the compensated sense current from I.sub.D/(1+K) is less than the deviation of sense current I.sub.SEN 208 from I.sub.D/(1+K). Consequently, when the drain to source resistance of main transistor 202 varies between the low value of R.sub.DSL and the high value of R.sub.DSH, the ratio of the drain current of main transistor 202 to the compensated sense current varies less than the ratio of the drain current of main transistor 202 to sense current I.sub.SEN 208. In this manner, change in the ratio of the drain current of main transistor 202 to sense current I.sub.SEN 208 due to the variation in the drain to source resistance of main transistor 202 can be compensated for over a range of values of the drain to source resistance of main transistor 202.
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the resulting compensated sense voltage V.sub.SENCMP 416 and compensated sense current are the same as those that are described for
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(40) As further shown, under these conditions, curve 510 increases as the drain to source resistance of main transistor 202 decreases from the high value R.sub.DSH of 0.22 ohms and becomes approximately equal to 110% (e.g., 111%) of the desired ratio when the drain to source resistance of main transistor 202 is equal to the low value R.sub.DSL of 0.12 ohms. In other words, curve 510 deviates up to 11% from the desired ratio as the drain to source resistance of main transistor 202 varies between the low value R.sub.DSL of 0.12 ohms and the high value R.sub.DSH of 0.22 ohms. On the other hand, curve 520 has the same desired ratio when the drain to source resistance of main transistor 202 is equal to the low value R.sub.DSL of 0.12 ohms and deviates less than 2% from the desired ratio as the drain to source resistance of main transistor 202 varies between the low value R.sub.DSL of 0.12 ohms and the high value R.sub.DSH of 0.22 ohms. Therefore, compensation circuit 400 in one of
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(42) Similar to main transistor 202 in