BUBBLE JETTING CHIP, LOCAL ABLATION DEVICE AND LOCAL ABLATION METHOD, AND INJECTION DEVICE AND INJECTION METHOD

Abstract

The present invention enables fabrication and mass production of a bubble-jetting chip that includes a desired number of bubble jetting portions of the same size having bubble-jetting outlets of the same size.

Mass production is enabled by fabricating a bubble-jetting chip comprising a substrate and a bubble-jetting portion formed on the substrate, the bubble-jetting portion comprising: an electrode that is formed of a conductive material; an insulating portion that is formed of an insulating photosensitive resin, is provided so as to sandwich the electrode, and includes an extended section that extends beyond the tip of the electrode; and a space that is formed between the extended section of the insulating portion and the tip of the electrode.

Claims

1. A bubble-jetting chip, comprising: a substrate and a bubble jetting portion formed on the substrate; the bubble-jetting portion comprising: an electrode that is formed of a conductive material; an insulating portion that is formed of an insulating photosensitive resin, is provided so as to sandwich the electrode, and includes an extended section that extends beyond the tip of the electrode; and a space that is formed between the extended section of the insulating portion and the tip of the electrode.

2. The bubble-jetting chip according to claim 1, wherein the extended section is tapered.

3. The bubble-jetting chip according to claim 1, wherein the photosensitive resin is a negative photoresist.

4. The bubble jetting chip according to claim 1, wherein two or more of the bubble-jetting portions are formed.

5. The bubble-jetting chip according to claim 1, wherein an assist channel is formed in the insulating portion.

6. The bubble-jetting chip according to claim 1, further comprising an energizing portion that is connected to the electrode.

7. The bubble-jetting chip according to claim 1, wherein a counter electrode that constitutes an electrode pair with the electrode of the bubble-jetting portion is formed on the substrate.

8. The bubble jetting chip according to claim 1, wherein a channel for delivering a solution containing an injection material is formed on the space side of the bubble-jetting portion.

9. A localized ablation device, comprising the bubble-jetting chip according to claim 1.

10. An injection device, comprising the bubble-jetting chip according to claim 1.

11. A localized ablation method, comprising: injecting a solution so that a counter electrode has continuity with the electrode of the localized ablation device according to claim 9; applying high-frequency pulses to an electrode pair configured with the electrode of the localized ablation device and the counter electrode to cause bubbles to be ejected from the tip of the bubble-jetting portion; and processing a process target with the bubbles.

12. An injection method, comprising: injecting a solution so that a counter electrode has continuity with the electrode of the injection device according to claim 10; delivering a solution containing an injection material to the front of the bubble-jetting portion; applying high-frequency pulses to an electrode pair configured with the electrode of the injection device and the counter electrode to cause the ejection of bubbles onto which the solution containing the injection material is adsorbed; and introducing the injection material into a process target while localized ablation is performed on the process target with the bubbles.

13. The bubble-jetting chip according to claim 2, wherein the photosensitive resin is a negative photoresist.

14. The bubble-jetting chip according to claim 3, wherein two or more of the bubble-jetting portions are formed.

15. The bubble-jetting chip according to claim 3, wherein an assist channel is formed in the insulating portion.

16. The bubble-jetting chip according to claim 14, wherein an assist channel is formed in the insulating portion.

17. The bubble-jetting chip according to claim 3, wherein a channel for delivering a solution containing an injection material is formed on the space side of the bubble-jetting portion.

18. The bubble-jetting chip according to claim 14, wherein a channel for delivering a solution containing an injection material is formed on the space side of the bubble-jetting portion.

19. A localized ablation device, comprising the bubble-jetting chip according to claim 3.

20. An injection device, comprising the bubble-jetting chip according to claim 3.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0046] FIG. 1 illustrates a scheme of the bubble-jetting chip 1 of the present invention;

[0047] FIG. 2 illustrates another embodiment of the bubble-jetting chip 1;

[0048] FIG. 3 illustrates one example of the manufacturing steps in a first embodiment of the bubble-jetting chip 1 of the present invention;

[0049] FIG. 4 illustrates another embodiment of the bubble-jetting chip 1 of the present invention; FIG. 4(1) is the entirety of the bubble-jetting chip 1, and FIG. 4(2) is an enlargement of the vicinity of the bubble-jetting portion 3;

[0050] FIG. 5 illustrates the overall configuration of a localized ablation device 6 using the bubble-jetting chip 1 of the present invention;

[0051] FIG. 6 illustrates a scheme of the bubble-jetting chip 1 applied to an injection device;

[0052] FIG. 7(1-1) is a cross-sectional view of one example of the bubble-jetting chip 1 for injection, FIG. 7(1-2) is a top view of the same, FIG. 7(2-1) is a cross-sectional view of another example of the bubble-jetting chip 1 for injection, and FIG. 7(2-2) is a top view of the same;

[0053] FIG. 8 illustrates one example of a step for manufacturing the bubble-jetting chips 1 for injection illustrated in FIGS. 7(2-1) and (2-2);

[0054] FIGS. 9(1) and (2) illustrate other embodiments of the bubble-jetting chip 1 for injection;

[0055] FIG. 10 is a photograph substituting for a drawing; FIG. 10(1) is a photograph of the bubble-jetting chip 1 produced in example 1, and FIG. 10(2) is a photograph showing the vicinity of the bubble-jetting portion enlarged;

[0056] FIG. 11 is a photograph substituting for a drawing; FIG. 11(1) is a photograph of the bubble-jetting chip 1 produced in example 2, and FIG. 11(2) is a photograph showing the vicinity of the bubble-jetting portion enlarged;

[0057] FIG. 12 is a photograph substituting for a drawing, and is a photograph of the generation of bubbles 36 captured with a high-speed camera in example 3;

[0058] FIG. 13 is a photograph substituting for a drawing; FIG. 13(1) is a photograph of the bubble-jetting chip 1 produced in example 4, and FIG. 13(2) is a photograph showing the vicinity of the bubble-jetting portion enlarged; and

[0059] FIG. 14 is a photograph substituting for a drawing, and is a photograph of the generation of bubbles 36 captured by a high-speed camera in example 5.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0060] The bubble-jetting chip, localized ablation device and localized ablation method, and injection device and injection method of the present invention are described in detail below with reference to the accompanying drawings.

[0061] FIG. 1 illustrates a scheme of the bubble-jetting chip 1 of the present invention. The bubble-jetting chip 1 of the present invention has a bubble-jetting portion 3 formed on a substrate 2. The bubble-jetting portion 3 has an electrode 31 that is formed of a conductive material, an insulating portion 33 that is provided so as to sandwich the electrode and includes an extended section 32 that extends beyond the tip of the electrode 31, and a space 34 that is formed between the tip of the electrode 31 and the extended section 32. Also, in the example illustrated in FIG. 1, there is formed an energizing portion 4 that connects to the electrode 31, but the energizing portion 4 may be formed integrally when producing the bubble-jetting chip 1, or may be produced separately from the bubble-jetting chip 1 and be connected upon energizing. Also, a counter electrode 5 is formed on the substrate 2, but the counter electrode 5 may be formed integrally when producing the bubble-jetting chip 1, or may be produced separately from the bubble-jetting chip 1 and be immersed in a solution when energizing. Bubbles 36 can be continuously jetted from a bubble-jetting outlet 35 formed by adjacent extended sections 32, by applying voltage to the electrode 31 and the counter electrode 5.

[0062] The material for forming the substrate 2 is not particularly limited provided that the electrode 31 and insulating portion 33 can be deposited thereon. Examples include glass, quartz, PMMA, and silicon.

[0063] The material for forming the electrode 31 is not particularly limited provided that the material can be energized and can be layered on the substrate 2 by electroplating, electroless plating, or other methods. Examples include nickel, gold, platinum, silver, copper, tin, magnesium, chromium, tungsten, and other metals, or alloys thereof.

[0064] In the present invention, the insulating portion 33 including the extended section 32 is made by using photolithography. Accordingly, the material for forming the insulating portion 33 including the extended section 32 is not particularly limited provided that the material is an insulating photosensitive resin. Examples include commercial TSMR V50, PMER, and other positive photoresists, and SU-8, KMPR, and other negative photoresists. In the present invention, because bubbles 36 are jetted by energizing the electrode 31 and the counter electrode 5, a load is easily applied to the bubble-jetting outlet 35, which is a very small portion, particularly when high voltage is applied thereto. Because SU-8, KMPR, and other negative photoresists have higher hardness than positive photoresists, a negative photoresist is preferably used as the photosensitive resin when high voltage is applied to the bubble-jetting portion 3.

[0065] The material of the energizing portion 4 and the counter electrode 5 is not particularly limited provided that electricity can be delivered from an external power supply to the electrode 31, and the same material as that of the abovementioned electrode 31 can be used. When the energizing portion 4 is produced separately from the bubble-jetting chip 1, the end of the electrode 31 should extend from the insulating portion 33, and the energizing portion 4 should be produced so as to be easily connected. Also, when the counter electrode 5 is produced separately, the counter electrode 5 should be capable of being energized with the electrode 31 and therefore is not particularly limited to being in the form of a rod, sheet, or other shape.

[0066] Because bubbles formed in the space 34 are jetted from the bubble-jetting outlet 35 so as to be torn off when electricity is outputted to the electrode 31 and the counter electrode 5, there is no need to supply air from the outside to the bubble-jetting portion 3. Also, the space 34 preferably becomes smaller nearer to the bubble-jetting outlet 35 in order to provide the jetted bubbles 36 with directionality, and in the manufacturing steps to be discussed below, a photomask that is shaped so that the extended section 32 is tapered should be used.

[0067] Also, when bubbles are formed inside the space 34, bubbles having a size near the inner diameter (indicated as “diameter D” or “D” below) of the bubble-jetting outlet 35 are produced. Accordingly, the depth (length from the tip of the electrode 31 to the bubble-jetting outlet 35; indicated as “L” below) of the space 34 must be large enough for bubbles to be produced inside the space 34, and the L/D ratio is preferably at least 1. Meanwhile, the upper limit of the L/D ratio is not particularly limited provided that the size is sufficient for bubbles to be continuously jetted. Because the bubble-jetting member described in Patent Document 1is produced by heating and pulling apart, etc., the tip of the bubble-jetting member is very sharp and easily damaged, but in the case of the present invention, the bubble-jetting outlet is formed of a photosensitive resin on a substrate, which eliminates the risk of damage. The L/D ratio can be adjusted according to the shape of the photomask. The size of the jetted bubbles 36 can be adjusted by changing the diameter D of the bubble-jetting outlet 35, and should be adjusted by the shape of the photomask during production.

[0068] FIG. 2 illustrates another embodiment of the bubble-jetting chip 1. When the counter electrode 5 is produced separately, the size of the substrate 2 should be the same size as that of the bubble-jetting portion 3 (insulating portion 33). In the case of the embodiment illustrated in FIG. 1, the bubble-jetting chip 1 must be immersed in a solution through which electricity can be passed, or the solution must be poured on the substrate 2 so that the counter electrode has continuity with the electrode, and the process target must be arranged on the substrate 2, but with the bubble-jetting chip 1 illustrated in FIG. 2, at least the bubble-jetting outlet 35 should be immersed in the solution. Regardless of the form, the solution should be poured so that the counter electrode has continuity with the electrode during use.

[0069] Although not illustrated in FIG. 1 and FIG. 2, it is desirable to form an insulating layer on the top surface when using the bubble-jetting chip 1 in order to prevent leakage of electricity when the bubble-jetting chip 1 is immersed in the solution. The material used for forming the insulating material should be polydimethylsiloxane (PDMS), parylene, epoxy resin, polyimide, polyethylene, glass, quartz, PMMA, silicon, or other well-known insulating material. The insulating layer may be affixed to the bubble-jetting chip 1 before use, or may be formed in advance during manufacture of the bubble-jetting chip 1.

[0070] FIG. 3 illustrates one example of the manufacturing steps in a first embodiment of the bubble-jetting chip 1 of the present invention. In FIG. 3, an example in which there is one bubble-jetting portion 3 is shown in regard to the depicted relationship, but the shape of the photomask may be changed when a plurality of bubble-jetting portions 3 is formed.

[0071] (1) The substrate 2 is cleaned with acetone, ethanol, ultrapure water, etc.

[0072] (2) The material for forming the energizing portion 4 is layered on the substrate 2 by sputtering.

[0073] (3) A photoresist 8 is applied, and photoexposure and development are performed using a mask so that the photoresist 8 remains in the portion where the energizing portion 4 is ultimately to be formed.

[0074] (4) The material other than the portion where the energizing portion 4 is to be formed is removed by wet etching or another method.

[0075] (5) The photoresist 8 is removed, whereby the energizing portion 4 is formed. As for the manufacturing steps below, the portion where the electrode 31 is formed is illustrated as cross-section A-A′, and the portion where the insulating portion 33 including the extended section 32 (only the reference symbol 33 is indicated on the drawing) is formed is illustrated as cross-section B-B′. The positions of cross-section A-A′ and cross-section B-B′ are illustrated in the drawing for (5) above (left side of FIG. 3-2 and FIG. 3-3).

[0076] (6) The material for forming the insulating portion 33 including the extended section 32 is layered by spin coating.

[0077] (7) Photoexposure is performed using a photomask designed to a shape such that the insulating portion 33 including the extended section 32 remains. In order to facilitate connection to an external power supply, it is desirable to use a photomask having a shape such that the insulating portion 33 on the end portion of the substrate 2 is removed and the energizing portion 4 is exposed.

[0078] (8) After development, the material other than the portion where the insulating portion 33 including the extended section 32 is formed is removed.

[0079] (9) An electrode 31 is grown by electroplating on the energizing portion 4. (10) An insulating layer 37 is formed.

[0080] The resists, etchants, sputtering devices, etc., used in the abovementioned steps may be publicly known reagents and devices used in the field of micromachining technology.

[0081] In the abovementioned manufacturing steps, the electrode 31 was grown by electroplating on the energizing portion 4, but an energizing portion 4 need not be provided. Specifically, an insulating portion 33 should be formed on a substrate 2 by omitting steps (2) to (4), and next a material for forming a thin-plate-form electrode 31 should be cut to the shape of the electrode 31 and be sandwiched inside the insulating portion 33. In that case, the electrode 31 is preferably formed so as to be exposed on the end of the substrate 2, and is preferably arranged to be capable of being energized directly by an external power supply. Also, in the abovementioned manufacturing steps, an example was illustrated in which the bubble-jetting portion 3 was arranged two-dimensionally on the substrate 2, but the bubble-jetting portion 3 can be formed three-dimensionally on the substrate 2 by repeating steps (2) to (10) after completing step (10).

[0082] FIG. 4 is an illustration of another embodiment of the bubble-jetting chip 1 of the present invention; FIG. 4(1) is the entirety of the bubble-jetting chip 1, and FIG. 4(2) is an enlarged view in the vicinity of the bubble-jetting portion 3. As mentioned above, the bubble-jetting chip 1 of the present invention may have an insulating layer 37 formed on the top surface of the bubble-jetting chip 1 in order to prevent leakage of electricity. In this case, if the distance between the bubble-jetting outlet 35 and the process target is long, the bubbles 36 jetted from the bubble-jetting outlet 35 may move forward through the solution, but the bubbles 36 might also move to the side of the insulating layer 37 due to buoyancy and attach to the insulating layer 37. Therefore, an assist channel 38 may be formed on the insulating portion 33 to form an assist flow (arrow in FIG. 4(2)) to push the jetted bubbles 36 out forward.

[0083] The assist channel 38 is not particularly limited provided that an assist flow to push the bubbles 36 out forward can be formed as mentioned above. For example, the assist flow should be formed so as to flow along the bubble-jetting portion 3. In the example illustrated in FIG. 4(2), assist channels 38 are provided on both ends of a plurality of bubble-jetting portions 3 and between respective bubble-jetting portions 3, but an assist channel 38 may be formed for each of a plurality of bubble-jetting portions 3. Also, in the example illustrated in FIG. 4(2), the bubble-jetting portions 3 project from the insulating portion 33, but an assist channel 38 may be formed on a bubble-jetting chip 1 having a shape in which the bubble-jetting portions 3 do not project from the insulating portion 33 illustrated in FIG. 1 and FIG. 2. The assist channel 38 should be formed on the insulating portion 33 by changing the shape of the photomask in manufacturing step (7). Also, when forming the assist channels 38, pump connection parts 39 for connecting a pump to send liquid into the assist channels 38 may be formed on the ends of the assist channels 38 as illustrated in FIG. 4(1). The pump connection parts 39 also should be formed on the insulating portion 33 by changing the shape of the photomask in manufacturing step (7). When forming the pump connection parts 39, a hole should be formed in the insulating layer 37 on the top surface of the bubble-jetting chip 1, and a silicon tube, etc., should be connected to the hole.

[0084] FIG. 5 illustrates the overall configuration of a localized ablation device 6 using the bubble-jetting chip 1 of the present invention. The localized ablation device 6 includes electricity output device. The electricity output device includes at least a generic commercial AC power supply device 61, and an electric wire 62 for forming a circuit between the electrode 31 of the bubble-jetting chip 1 and the counter electrode 5, and may also have a non-dielectric resistor 63, a voltage amplification circuit 64, a digital input/output (DIO; not shown) port, etc., as needed. The electricity output device can be fabricated merely by incorporating a non-dielectric resistor 63, DIO port, etc. in a conventional electrical circuit for an electric scalpel, and setting to an output configuration for use on microscopic objects.

[0085] The current, voltage, and frequency of output to the electrode 31 and the counter electrode 5 are not particularly limited provided that the ranges are such that bubbles can be jetted and the bubble-jetting portion 3 is not damaged. For example, the current is preferably 10 mA to 80 mA, and more preferably 25 mA to 75 mA. It is undesirable for the current to be less than 10 mA, since it may not be possible to properly produce bubbles 36, or for the current to be greater than 80 mA, since wear of the electrode may occur. The voltage is preferably 100 V to 800 V, and more preferably 200 V to 600 V. It is undesirable for the voltage to be smaller than 100 V, since generation of bubbles 36 may be difficult, or for the voltage to be greater than 800 V, since wear of the electrode 31 or damage to the extended section 32 might occur. The frequency is preferably 1 kHz to 1 GHz, more preferably 5 kHz to 1 MHz, and particularly preferably 10 kHz to 60 kHz. It is undesirable for the frequency to be less than 1 kHz, since the extended section 32 might be damaged, or for the frequency to be greater than 1 GHz, since it might not be possible to produce bubbles 36.

[0086] In the localized ablation method of the present invention, first, the bubble-jetting chip 1 of the localized ablation device 6 of the present invention and the counter electrode 5 are immersed in a conductive solution, or the solution is poured on the substrate 2 so that the counter electrode 5 conducts with the electrode 31. A process target is arranged between the bubble-jetting portion 3 of the bubble-jetting chip 1 and the counter electrode 5, bubbles 36 jetted from the bubble-jetting portion 3 are cause to collide with the process target, whereby localized ablation of the process target can be performed.

[0087] The process target is not particularly limited provided that ablation can be performed thereon using bubbles. Examples include cells and proteins. Examples of cells include stem cells isolated from human or non-human animal tissues, skin cells, mucous cells, liver cells, islet cells, nerve cells, cartilage cells, endothelial cells, epithelial cells, bone cells, muscle cells, egg cells, and other animal cells, and plant cells, insect cells, E. coli, yeast, molds, and other microbial cells, and other cells. “Processing” in the present invention signifies jetting bubbles on a process target to open holes in the target or cut a portion of the target.

[0088] In Patent Document 1, the present inventors demonstrated that bubbles jetted from the bubble-jetting member could adsorb an injection material. Presumably, the bubbles produced by energizing the core are charged with electricity, and the injection material is adsorbed onto the bubbles due to the electricity. Accordingly, when performing localized ablation using the bubble-jetting chip 1 illustrated in FIG. 1 or FIG. 2, if an injection material is caused to be contained in the conductive solution in which the bubble-jetting chip 1 is immersed, bubbles 36 around which the injection material is adsorbed can be jetted. Therefore, the injection material can be introduced while performing localized ablation on the process target. The height from the substrate 2 to the insulating layer 37 of the bubble-jetting chip 1 of the present invention is on the micron order. Accordingly, in terms of fluid mechanics, a laminar flow of a solution containing an injection material can be formed by using a pump, etc., to push out a solution containing the injection material into a conductive solution.

[0089] FIG. 6 illustrates a scheme of the bubble jetting chip 1 (referred to below as “bubble-jetting chip for injection”) applied to an injection device. The bubble-jetting chip 1 for injection illustrated in FIG. 6 has a channel 7 for delivering a solution containing an injection material (referred to below as “injection solution channel”) formed on the space 34 side of the bubble-jetting portion 3. Although, in terms of fluid mechanics, the solution containing the injection material can be rendered into a laminar flow as mentioned above even without forming an injection solution channel 7 in particular, forming an injection solution channel 7 facilitates the solution containing the injection material forming a laminar flow. FIG. 7(1-1) is a cross-sectional view of one example of the bubble-jetting chip 1 for injection, and FIG. 7(1-2) is a top view of the same. In the example illustrated in FIGS. 7(1-1) and (1-2), by not forming the energizing portion 4 in the portion corresponding to the injection solution channel 7, a channel 7 is formed by making that portion relatively lower than the remaining portion.

[0090] FIG. 7(2-1) is a cross-sectional view of another example of the bubble-jetting chip 1 for injection, and FIG. 7(2-2) is a top view of the same. In the example illustrated in FIGS. 7(2-1) and (2-2), by forming an insulating wall 71 on the opposite side from the bubble-jetting portion 3, a channel 7 is formed by the extended section 32 of the bubble-jetting portion 3 and the insulating wall 71. In the case of the bubble-jetting chip 1 for injection illustrated in FIGS. 7(2-1) and (2-2), the bubbles 36 pass through the channel 7, whereby bubbles 36 around which the injection material is adsorbed can be formed. Therefore, because the process target must be away from the channel 7, it is desirable to form a process-target-placement channel 72 for placement of the process target on the insulating wall 71 facing the bubble-jetting portion 3. The same material as that for the insulating portion 32 should be used for the insulating wall 71. In the example illustrated in FIGS. 7(2-1) and (2-2), if the channel 7 is very narrow and only the solution containing the injection material is to be delivered, then the process-target-placement channel 72 must be formed and the conductive solution must be filled inside the process-target-placement channel 72. Meanwhile, if the channel 7 is wide and a laminar flow of the solution containing the injection material can be formed inside the conductive solution inside the channel 7, then the process target can be arranged inside the channel 7 and there is no need for a process-target-placement channel 72.

[0091] Although not illustrated in FIG. 7, an injection port for delivering an injection material into the channel 7 is formed on the bubble-jetting chip 1 for injection. By injecting from the injection port a solution containing an injection material that is adjusted so that the degree of hydrophilicity differs from that of the conductive solution, a solution flow containing the injection material can be formed in the conductive solution in which the bubble-jetting chip 1 is immersed. Also, the injection port is not limited to one; a plurality thereof may be formed. By injecting from the respective injection ports injection materials that are adjusted to have different degrees of hydrophilicity, a multilayer solution flow containing the injection materials can be formed. When forming the injection port, a discharge port should be formed on the opposite side from the channel 7. The injection port and the discharge port should be formed as holes in the insulating layer 37 on the top surface of the bubble-jetting chip 1, and silicon tubes, etc., should be connected to the holes.

[0092] FIG. 8 illustrates one example of the process for production of the bubble-jetting chips 1 for injection illustrated in FIGS. 7(2-1) and (2-2). The manufacturing steps are the same as those illustrated in FIG. 3, except that in step (7) of the steps illustrated in FIG. 3, the photomask is formed as a shape that can produce an insulating layer 71 and an process-target-placement channel 72. FIG. 9 illustrates another embodiment of the bubble-jetting chip 1 for injection. In the bubble-jetting chip 1 for injection illustrated in FIGS. 6 and 7, the bubble-jetting outlet 35 faces the injection solution channel 7, but in the bubble-jetting chip 1 for injection illustrated in FIG. 9(1), a first injection solution channel 8 containing a first injection material is formed around the bubble-jetting portion 3, and the first injection solution channel 8 is connected to the injection solution channel 7 illustrated in FIG. 6 and FIG. 7. In the embodiment illustrated in FIG. 9(1), an injection flow a containing injection material from a pump a is formed in the first injection solution channel 8, an injection b containing injection material from pump b is formed in the injection solution channel 7, and the injection flows a and b assume a laminar flow. In this case, the injection flow a serves the function of the assist flow previously discussed. The first injection material contained in the solution flowing in the first injection solution channel 8 is adsorbed around the bubbles jetted from the bubble-jetting outlet, and the injection material contained in the solution flowing in the injection solution channel 7 is adsorbed therearound. By placing the process target near the entrance of the process-target-placement channel 72 and increasing the voltage applied to the bubble-jetting portion 3, a pump c for forming an injection flow c containing an injection material can be placed also in the process-target-placement channel 72, and the injection flow can be formed into three layers.

[0093] Also, in the embodiment illustrated in FIG. 9(2), a first injection solution channel 8 containing a first injection material is formed around the bubble-jetting portion 3, and a hole 81 for allowing the passage of bubbles onto which the first injection material was adsorbed is formed in the first injection solution channel 8. Furthermore, a second injection solution channel 9 containing a second injection material is formed around the first injection solution channel 8. In the embodiment illustrated in FIG. 9(2), the first injection material flowing in the first injection solution channel 8 can be adsorbed around the bubbles jetted from the bubble-jetting outlet, and the second injection material flowing in the second injection solution channel 9 can be adsorbed around that.

[0094] Although not illustrated in FIG. 9(2), pump connection parts for connecting the pumps for pumping the solutions containing the injection materials may be formed on the ends of both injection solution channels 8, 9. The injection solution channels 8, 9 and the pump connection parts should be formed on the insulating portion 33 by changing the shape of the photomask in manufacturing step (7) mentioned above. When forming the pump connection parts, holes should be formed in the insulating layer 37 on the top surface of the bubble-jetting chip 1 for injection, and silicon tubes, etc., should be connected to the holes.

[0095] An injection device can be produced by using the bubble-jetting chip 1 for injection instead of the bubble-jetting chip 1 of the localized ablation device 6 mentioned above. Except for delivering a solution containing an injection material in the channel 7, the same procedure as the localized ablation method can be used to introduce the injection material while performing localized ablation on a process target. As shall be apparent, if a conductive solution not containing an injection material is used, then use as a localized ablation device also is possible.

[0096] The injection material is not particularly limited, whether gas, solid, or liquid, provided that the material can be dissolved and/or dispersed in a liquid. Examples of gases include air, nitrogen, helium, carbon dioxide, carbon monoxide, argon, and oxygen; examples of solids include DNA, RNA, proteins, amino acids, and inorganic substances; and examples of liquids include chemical solutions and amino acid solutions. Examples of solutions for dissolving and/or dispersing the injection materials include physiological saline and culture media.

[0097] The present invention is described specifically below with examples, but these examples are provided simply for reference to specific embodiments for description of the present invention. Although these illustrations are for describing specific embodiments of the present invention, they do not represent restrictions or limitations on the scope of the present invention disclosed in the present application.

EXAMPLES

Example 1

[0098] [Production of Bubble-Jetting Chip 1]

[0099] (1) A glass substrate was organically cleaned with an ultrasonic cleaner at 100 kHz for 5 minutes each with acetone, ethanol, and ultrapure water in the stated order, and was baked at 120° C. for 30 minutes.

[0100] (2) The glass substrate was cooled to normal temperature, and Au was then formed into a film on the glass substrate using a sputtering device (Vacuum Device MSP-30T) with plasma current value (80 mA) for one minute.

[0101] (3) OFPR-800LB (200 CP) was spun-coated on the glass substrate at 2000 rpm for 30 seconds and 4000 rpm for 2 seconds, and the coated substrate was pre-baked in an oven at 90° C. for 30 minutes. Next, photoexposure was performed using an emulsion mask, and development was performed using NMD-3. After development, the resulting product was rinsed with ultrapure water and dried upon the water being cast off in a spin dryer, etc.

[0102] (4) The areas other than the patterned OFPR were soaked with an Au etchant (AURUM-302, Kanto Chemical) to etch the Au, and the resulting product was rinsed with ultrapure water.

[0103] (5) The glass substrate was immersed in acetone and the remaining OFPR film was removed, with which patterning of the Au electrode portion concluded.

[0104] (6) SU-8 was spun-coated on the glass substrate, and the coated substrate was pre-baked on a hot plate at 95° C. for 50 minutes.

[0105] (7) Photoexposure was performed using an emulsion mask, and then the resulting product was post-exposure baked on a hot plate at 95° C. for 5 minutes.

[0106] (8) Development was performed using PGMEA (2-Methoxy-1-methylethyl acetate; CAS Number: 142300-82-1). After development, the resulting product was rinsed with ultrapure water and dried, with the water being cast off in a spin dryer, etc., with which the SU-8 patterning operation concluded.

[0107] (9) An electrode was connected to the Au patterned part, and Ni plating was grown to the height (100 μm) of the SU-8 pattern along the SU-8 patterning, resulting in a bubble-jetting chip 1.

[0108] (10) Polydimethylsiloxane (PDMS) was spun-coated on an OHP film at 1000 rpm for 20 seconds, and the resulting product was baked at 90° C. for 15 minutes to prepare a sheet having a thickness of about 100 μm. The PDMS sheet was placed covering the top surface of the produced bubble-jetting chip 1, and bonded thereto using an adhesive agent (Super X, Cemedine).

[0109] FIG. 10(1) is a photograph of the bubble-jetting chip 1 produced in example 1, and FIG. 10(2) is a photograph enlarging the vicinity of the bubble-jetting portion. The bubble-jetting outlet 35 was about 50 ∥m in size.

Example 2

[0110] [Production of Bubble-Jetting Chip 1]

[0111] The shape of the emulsion mask in step (7) of the abovementioned example 1 was changed, and a bubble-jetting chip 1 having a plurality of bubble jetting portions formed was fabricated. FIG. 11(1) is a photograph of the bubble-jetting chip 1 produced in example 2, and FIG. 11(2) is a photograph showing an enlargement of the vicinity of the bubble-jetting portion. The bubble-jetting outlet 35 was about 50 μm in size.

Example 3

[0112] [Production of Localized Ablation Device and Injection Device and Bubble Jetting Experiment]

[0113] The bubble-jetting chip 1 produced in example 1 was incorporated in place of the scalpel of an electric scalpel for medical use (product of ConMed Corp., Hyfrecator 2000), a non-dielectric resistor and a DIO port were furthermore incorporated in the electricity output device, and a localized ablation device and injection device were thus produced.

[0114] Next, the bubble-jetting chip 1 was immersed in a 5M NaCl solution, and electricity was outputted to the electrode 31 and the counter electrode 5 with a voltage of 27.7 mA, a current of 309 V, an output frequency of 450 kHz, a sampling frequency for impedance matching of 450 kHz, and feedback at 3.5 kHz. The formation of bubbles was captured using a high-speed camera (VW-9000, product of Keyence Corp.). The counter electrode 5 was produced with a copper plate, and was away from the bubble-jetting chip 1.

[0115] FIG. 12 is a photograph of the generation of bubbles 36 captured by a high-speed camera. As is clear from the photograph, it was confirmed that bubbles 36 could be jetted from the bubble-jetting outlet 35 by using the bubble-jetting chip 1 produced in example 1.

Example 4

[0116] A bubble-jetting chip 1 including a channel 7 was produced by changing the shape of the emulsion mask in step (7) of the abovementioned example 1. FIG. 13(1) is a photograph of the bubble-jetting chip 1 produced in example 4, and FIG. 13(2) is a photograph showing an enlargement of the vicinity of the bubble-jetting portion. The bubble-jetting outlet 35 was 50 μm in size, the electrode 31 was 25 μm in height, the channel 7 was 50 μm in height, and the width was 100 μm.

[0117] [Production of Localized Ablation Device and Injection Device and Bubble Jetting Experiment]

Example 5

[0118] A localized ablation device and an injection device were produced using the same device as in example 3, except that the bubble-jetting chip 1 produced in example 4 was used instead of the bubble-jetting chip 1 produced in example 1, and a bubble jetting experiment was performed.

[0119] FIG. 14 is a photograph of the generation of bubbles 36 captured by a high-speed camera. As is clear from the photograph, it was confirmed that bubbles 36 could be jetted from the bubble-jetting outlet 35 by using the bubble-jetting chip 1 produced in example 4, and that the jetted bubbles 36 reached the process-target-placement channel 72.

[0120] [Key]

[0121] 1: Bubble-jetting chip 1, 2: Substrate, 3: Bubble-jetting portion, 4: Energizing portion, 5: Counter electrode, 6: Localized ablation device, 7: Injection solution channel, 8: First injection solution channel, 9: Second injection solution channel, 31: Electrode, 32: Extended section, 33: Insulating portion, 34: Space, 35: Bubble-jetting outlet, 36: Bubble, 37: Insulating layer, 38: Assist channel, 39: Pump connection part, 61: General commercial AC power supply device, 62: Electric wire, 63: Non-dielectric resistor, 64: High-voltage amplification circuit, 71: Insulating wall, 72: Process-target-placement channel, 81: Hole