MICROMECHANICAL DEVICE HAVING A DECOUPLED MICROMECHANICAL STRUCTURE
20170305740 ยท 2017-10-26
Inventors
Cpc classification
B81B7/0016
PERFORMING OPERATIONS; TRANSPORTING
B81B7/0048
PERFORMING OPERATIONS; TRANSPORTING
B81C2203/0109
PERFORMING OPERATIONS; TRANSPORTING
B81C2203/0118
PERFORMING OPERATIONS; TRANSPORTING
International classification
Abstract
A micromechanical device having a substrate wafer, a functional layer situated above it which has a mobile micromechanical structure, and a cap situated on top thereof, having a first cavity, which is formed at least by the substrate wafer and the cap and which includes the micromechanical structure. The micromechanical device has a fixed part and a mobile part, which are movably connected to each other with at least one spring element, and the first cavity is situated in the mobile part. Also described is a method for producing the micromechanical device.
Claims
1. A micromechanical device, comprising: a substrate wafer; a functional layer disposed thereon which has a mobile micromechanical structure; a cap situated on top thereof; and a first cavity, which is formed at least by the substrate wafer and the cap and includes the micromechanical structure; wherein the micromechanical device has a fixed part and a mobile part, which are movably connected to each other with at least one spring element, the first cavity being situated in the mobile part.
2. The micromechanical device of claim 1, wherein the spring element is etched out of at least one of the functional layer, the substrate wafer, and the cap.
3. The micromechanical device of claim 1, wherein the first cavity is situated inside a second cavity.
4. The micromechanical device of claim 3, wherein the second cavity is formed at least from the fixed part, a first wafer cap, and a second wafer cap.
5. A method for producing a micromechanical device, the method comprising: providing a MEMS wafer having a substrate wafer, a functional layer disposed thereon which has a mobile micromechanical structure, and a cap situated on top thereof, and a first cavity, which is formed at least by the substrate wafer and the cap and which includes the micromechanical structure; bonding a second wafer cap to the cap with a spacer; trenching the MEMS wafer from the direction of the substrate wafer and configuring a fixed part and a mobile part, the first cavity being situated in the mobile part; and bonding a first wafer cap to the substrate wafer with a further spacer and configuring a second cavity, in which the mobile part having the first cavity is situated.
6. The micromechanical device of claim 2, wherein the first cavity is situated inside a second cavity.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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DETAILED DESCRIPTION
[0018]
[0019]
[0020] In contrast to the previously described micromechanical device in the related art, this micromechanical device according to the present invention includes a fixed part 20 and a mobile part 25, which are movably connected to each other with the aid of at least one spring element 350. First cavity 400 is situated in mobile part 25. In the exemplary embodiment at hand, mobile part 25 is exposed from fixed part 20 by trenches through the layer substructure in a region outside a sealing frame 320 of first cavity 400, the layer structure being made up of substrate 100, micromechanical functional layer 200 and cap 300. Elastic structures in the form of spring elements 350 are exposed as well, which connect mobile part 25 to fixed part 20. Substrate 100 may be a substrate wafer, in particular a silicon wafer. As an alternative, functional layer 200 also stands for a system of multiple layers. In this example, cap 300 is a wafer cap. As an alternative, however, cap 300 may also be realized as a thin-film cap, for example. The layer structure may alternatively also be a wafer stack.
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[0024] According to
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[0026] As an alternative, it is also possible to provide only one spring element 350 (not shown).
[0027]
[0028] There are various possibilities for implementing the present invention in a possible process sequence. In the following text, the sequence is to be outlined by way of example using a known process sequence for a current MEMS chip.
[0029] The starting point is a MEMS wafer having an inner mobile structure (
[0030] First, cap 300 is thinned down from this MEMS wafer 600 from the direction of the top surface (
[0031] From the direction of the underside of substrate 100, current MEMS wafer then is initially thinned down and subsequently trenched (
[0032] Now, first wafer cap 520 is bonded to substrate 100 in fixed part 20 (
[0033] At the end, electrical bond pads are optionally exposed by trenching through first external wafer cap (not shown).
[0034] In general terms, the method according to the present invention includes at least the following steps: [0035] (a) Providing a MEMS wafer 600 having a substrate wafer 100, a functional layer 200 disposed thereon which has a mobile micromechanical structure 220, and a cap 300 situated on top thereof, as well as a first cavity 400, which is formed at least by substrate wafer 100 and cap 300 and includes micromechanical structure 220. [0036] (b) Bonding a second wafer cap 540 to cap 300 with the aid of a spacer 560. [0037] (c) Trenching the MEMS wafer 600 from the direction of substrate wafer 100 and developing a fixed part 20 and a mobile part 25, first cavity 400 being situated in mobile part 25. [0038] (d) Bonding a first wafer cap 520 to substrate wafer 100 with the aid of a further spacer 560 and developing a second cavity 500, in which mobile part 25 having first cavity 400 is situated.
THE LIST OF REFERENCE NUMERALS IS AS FOLLOWS:
[0039] 10 micromechanical device
[0040] 20 fixed part
[0041] 25 mobile part
[0042] 100 substrate
[0043] 200 functional plane
[0044] 220 mobile micromechanical structure
[0045] 250 suspension springs
[0046] 300 wafer cap
[0047] 320 sealing frame
[0048] 350 spring element
[0049] 400 first cavity
[0050] 500 second cavity
[0051] 520 first wafer cap
[0052] 540 second wafer cap
[0053] 560 spacer
[0054] 600 MEMS wafer