MEMS resonator
09800223 · 2017-10-24
Assignee
Inventors
- Joep J. M. Bontemps (Groningen, NL)
- Jan Jacob Koning (Nijmegen, NL)
- Casper Van Der Avoort (Waalre, NL)
- Jozef Thomas Martinus van Beek (Rosmalen, NL)
Cpc classification
H03H3/0076
ELECTRICITY
International classification
F16M1/00
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
H03H3/007
ELECTRICITY
Abstract
A bulk-acoustic-mode MEMS resonator has a first portion with a first physical layout, and a layout modification feature. The resonant frequency is a function of the physical layout, which is designed such that the frequency variation is less than 150 ppm for a variation in edge position of the resonator shape edges of 50 nm. This design combines at least two different layout features in such a way that small edge position variations (resulting from uncontrollable process variation) have negligible effect on the resonant frequency.
Claims
1. A bulk-acoustic-mode MEMS resonator having a principal vibration direction, comprising: a resonator body having a first portion with a first physical layout, a layout modification feature having a second physical layout, wherein, along the principal vibration direction, a first part of the resonator has a first gap pattern and a first lateral cross-section and a second part of the resonator has a second gap pattern and a second lateral cross-section and the respective gap patterns and lateral cross-sections are different from each other, a reflection interface between the first portion and the layout modification feature, the first physical layout differs from a first design layout by a first geometric offset in response to process variations during fabrication of the resonator, the second physical layout differs from a second design layout by a second geometric offset in response to the process variations, and a resonant frequency of the bulk resonator is a function of a relationship between the first geometric offset and the second geometric offset.
2. The resonator as claimed in claim 1, wherein a first derivative of frequency with respect to an edge position variation is substantially zero.
3. The resonator as claimed in claim 1, wherein the layout modification feature comprises holes or slits within the first portion.
4. The resonator as claimed in claim 3, wherein the holes or slits have a dimension smaller than the acoustic wavelength.
5. The resonator as claimed in claim 1, wherein the resonant vibration is in a one-directional or two-directional mode.
6. The resonator as claimed in claim 1, further comprising: external suspension springs.
7. The resonator as claimed in claim 1, wherein the physical layouts are designed such that a frequency variation is less than 100 ppm for a variation in edge position of resonator shape edges of 50 nm.
8. The resonator as claimed in claim 1, wherein the physical layouts are designed such that a frequency variation is less than 150 ppm for a variation in edge position of resonator shape edges of 100 nm.
9. The resonator as claimed in claim 1, further comprising: an actuation arrangement, which uses electrostatic actuation or thermal actuation.
10. The resonator as claimed in claim 1, further comprising: a readout arrangement, which uses capacitive readout, piezoresistive readout, or piezoelectric readout.
11. A method of designing a bulk-acoustic-mode MEMS resonator having a principal vibration direction, comprising; designing a resonator body having a first portion with a first physical layout, and a layout modification feature having a second physical layout; modeling a resonant frequency, taking into account the first physical layout and the second physical layout, wherein the first physical layout differs from a first design layout by a first geometric offset in response to fabrication of the resonator, and the second physical layout differs from a second design layout by a second geometric offset in response to the fabrication of the resonator; selecting the physical layouts such that a resonant frequency variation of the bulk resonator is less than a first threshold for the geometric offsets in edge position of resonator shape edges of a second threshold, wherein along a principal vibration direction a first part of the resonator has a first gap pattern and a first lateral cross-section and a second part of the resonator has a second gap pattern and a second lateral cross-section and the respective gap patterns and lateral cross-sections are different from each other, a reflection interface between the first portion and the layout modification feature, and the modeling takes into account the lateral cross-sections and dimensions of the first portion and the layout modification feature, and any suspension system for the resonator body.
12. The method as claimed in claim 11, wherein the first threshold is 150 ppm and the second threshold is 50 nm.
13. The method as claimed in claim 12, wherein the modeling is carried out using finite element analysis.
14. The method as claimed in claim 11, wherein the layout modification feature comprises holes or slits within the first portion, and the modeling takes into account dimensions and positions of the holes or slits, the first portion dimensions, and any suspension system for the resonator body.
15. The resonator of claim 1, wherein the different lateral cross-sections include different widths.
16. The resonator of claim 1, wherein the different lateral cross-sections include different thicknesses.
17. The resonator of claim 1, wherein the first gap pattern is a plurality of holes and the second gap pattern is a slot.
18. The resonator of claim 17, wherein a wider part of the resonator has the plurality of holes while a narrower part of the resonator has the slot.
Description
(1) The invention will now be described by way of example with reference to the accompanying drawings, in which:
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(12) It should be noted that these figures are diagrammatic and not drawn to scale. Relative dimensions and proportions of parts of these figures have been shown exaggerated or reduced in size, for the sake of clarity and convenience in the drawings.
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(14) This invention relates to measures for providing tolerance to geometric offset. This has been considered for flex-mode resonators. In these resonators, the resonance frequency of a mechanical resonator depends on its effective stiffness and mass. A mechanical resonator can be modeled by a mass m, spring k and damper system γ. The resonance frequency is given by:
(15)
(16) The key in designs that are insensitive to geometric offset is that the relative change in mass is equal to the relative change in stiffness for an offset.
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(18) This principle can readily be applied to flex-mode resonators. US 2005/0073078 provides examples of flex-mode designs that are insensitive to geometric offset.
(19) This invention relates specifically to bulk acoustic mode resonators and aims to provide designs which are insensitive to geometric offset for this type of resonator. Bulk-acoustic resonators are much stiffer then flex-mode resonators. Therefore, they can be scaled to much higher frequencies than traditional flex-mode designs. Moreover, the stiffer bulk-acoustic resonator is able to store more energy, which improves phase noise performance.
(20) For bulk acoustic designs, in order to provide insensitivity to geometric offset. the relative change in wave velocity (v) is equal to the relative change in wavelength (λ).
(21) The resonance frequency is determined by a longitudinal wave propagating through the material.
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(23) To create a design that is insensitive to geometric offset, the relative dependency of the wave velocity and wavelength on the offset should be made equal.
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(25) In accordance with the invention, this principle is applied to both one-directional and two-directional bulk-acoustic resonators.
(26) In the fundamental mode, a standing wave of a quarter wavelength (fixed-free) or half wavelength (free-free) propagates in the material. These waves are continuous waves in the material rather than small lattice vibrations. As well as the fundamental mode, the principle also holds for higher order modes.
(27) Lithography and non-accurate pattern transfer account for the majority of micro-machining variations. Although these variations are temporally random, they are spatially systematic. The inaccuracy can thus be modelled as a systematic geometric offset δ that accounts for the variability in resonator dimensions.
(28) This geometric offset represents the variation in edge position of the resonator shape edges between different samples created by a given process. This geometric offset is process dependent and is more or less fixed. This means that the offset has a larger effect on smaller structures.
(29) Variations in dimensions lead to spread in the resonance frequency. In
(30) The main cause of geometric offset is non-accurate pattern transfer. The trenches and holes that need to be etched in the silicon layer (as shown in
(31) For example,
(32) For the bulk-acoustic, square-plate resonator, the resonance frequency is determined by the length of the square.
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(34) The velocity of sound is determined by the material constants; Youngs modulus E and density ρ. The first eigenmode is observed when the square length L equals half of the bulk-acoustic wavelength λ.
(35) The scaling of the resonance frequency with plate dimensions is indicated in
(36) If the plate-length L is changed by the geometric offset δ, the resonance frequency will spread. A geometric offset of ±20 nm can easily result in 1000 ppm frequency spread. If the size of the square plate decreases, the total frequency spread increases.
(37) Holes in the plate affect the velocity of the bulk-acoustic-wave through the material. In the example in
(38) Another method to change the resonance frequency is to add external springs. The square-plate resonator is typically suspended at its four corners. These corner suspensions act as springs.
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(40) For the purposes of FEM simulation (the results of which are below) only one-quarter of the structure needs to be simulated. FEM simulations can be used to find designs that are insensitive to geometric offset. For the square-plate with square holes and T-shaped corner suspension in
(41) This compensated design has been simulated, using three designs that have been given a geometric offset of −100, −50, and +50 nm respectively.
(42) Measurements on these four designs show that the design has been compensated and that first order frequency dependency on geometrical offset is eliminated. Both measurements and simulations only show a second-order dependency on geometrical offset.
(43) The results are depicted in
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(45) The plot 62 in
(46) As shown in
(47) In
(48) The simulation and measurements in
(49) This shows that for a constant hole size, the optimzed pitch depends on the square plate size and thus on the frequency.
(50) The optimization is carried out by finite-element-simulation (FEM).
(51) Bulk acoustic designs of a wide frequency range can be compensated for geometrical offset. The results of simulation can be found in
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(53) There are many combinations of L, h, and pitch that lead to a compensated design.
(54) Thus, all the points in
(55) One solution is shown in both
(56) The solutions shown in
(57) The parameters for the solutions shown in
(58) TABLE-US-00001 fres 52.707 52.669 52.665 52.569 L 80 80 80 80 h 0.35 0.5 0.6 1.01 Nh 8 7 6 5 pitch 10.00 11.43 13.33 16.00 w1 2 2 2 2 l1 4 4 4 4 w2 2 2 2 2 l2 20 20 20 20
(59) The parameters for the solutions shown in
(60) TABLE-US-00002 fres 110.391 52.669 23.282 12.82 86.398 52.569 26.9773 12.6408 L 38 80 182 340 49 80 156 335 1/L 0.026316 0.0125 0.005495 0.002941 0.020408 0.0125 0.00641 0.002985 h 0.5 0.5 0.5 0.5 1.01 1.01 1.01 1.01 Nh 5 7 9 13 3 5 7 9 pitch 7.60 11.43 20.22 26.15 16.33 16.00 22.29 37.22 1/pitch 0.13 0.09 0.05 0.04 0.06 0.06 0.04 0.03 w1 1 2 4 8 1 2 4 8 l1 2 4 8 16 2 4 8 16 w2 1 2 4 8 1 2 4 8 l2 10 20 40 80 10 20 40 80
(61) In the experiments explained above, the square-plate design of
(62) The square plate design is a two-directional, bulk-acoustic resonator. The compensation principle also holds for one-directional, bulk-acoustic resonators.
(63) Thus, for one-directional, bulk-acoustic resonators the same method as for two-directional, bulk-acoustic resonators can be used. The acoustic wavelength is already dependent on geometric offset. By adding holes, the wave velocity again becomes dependent on geometric offset. For a beam with holes an optimized pitch can be found that makes the structure insensitive to geometric offset. Again, this holds for holes of all shapes and sizes. The holes can be placed in an equidistant pattern or randomly over the structure.
(64) There is also a second approach to create compensated structures. If the structure has a non-uniform cross-section, the acoustic wave will show a phase jump over this boundary. At resonance, the standing wave in the structure is composed of multiple standing waves with different wavelengths. This is most easily explained with reference to a one-directional, bulk-acoustic resonator.
(65) As an example, a resonator with uniform thickness and only one step change in width is shown in
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(67) This method can also work for two-directional devices, but examples are less straightforward to give. One example could be a square plate design that has a non-uniform layer thickness.
(68) If a wave hits a physical boundary, part will be transmitted and part will be reflected. For example this is analogous to a wave in a fluid that crosses a boundary in depth, or light hitting a prism. At resonance, the standing wave in the structure is composed of two parts of different wavelength that connect at the boundary. Over this boundary, the composed standing wave shows a discontinuity in phase. An abrupt transition of width can be used, but also a sloped boundary (e.g. a linearly increasing width) can also be considered.
(69) Essentially, a standing wave is required in each portion. For boundary conditions, the design needs to be robust and needs to be processed with high precision. Thus minimum and maximum widths should be set, for example 200 nm and 200 μs.
(70) The desired tolerance to process variations can be achieved with two parts to the resonator, although more complicated designs are of course possible.
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(74) Bulk-acoustic resonators are preferred over flex-mode resonators, because of their increased effective stiffness. This is important for:
(75) (i) Scaling to higher frequencies. Flex-mode resonators are difficult to make for high frequencies (e.g. above 10 MHz), especially thin resonators that vibrate laterally. For these resonators, Q-factors and signal levels decrease significantly at higher frequencies. Bulk-acoustic resonators are a better choice for higher frequencies. Bulk-acoustic resonators have been presented with fundamental frequencies over 1 GHz.
(76) (ii) Improved phase noise performance. With their high stiffness, bulk-acoustic resonators are able to store more vibration energy than a flex-mode resonator. This improves the signal-to-noise ratio of the resonator.
(77) (iii) Higher Q-factor. Because of their large energy storage capability (and low anchor losses) bulk-acoustic resonators have very high Q-factors over 10.sup.5.
(78) The MEMS resonators can be processed on 1.5 μm thick SOI wafers. These SOI wafers are available with very constant device layer thickness. By using thin SOI substrates, surface micro machining with standard CMOS processing tools can be used to fabricate the MEMS resonators. With the high accuracy lithography steppers available, geometric offset is reduced to ±20 nm.
(79) For typical time-keeping and frequency reference applications a high accuracy is required. For mid-end applications an accuracy of about 100 ppm is required. With a geometric offset of ±20 nm, the bulk-acoustic resonators will show 1000 ppm frequency spread or more. The invention enables this frequency spread to be recued, for one-directional and two-directional bulk-acoustic resonators to a few ppm for this processing window of ±20 nm. By providing a design solution, there is no extra cost, since no extra mask layers, process steps, or trimming procedure is needed.
(80) There are two fundamental approaches outlined above, a first is to use apertures (holes or slots) and the other is to use changes in width or thickness of the resonator body. For one-directional designs, a step change in width is preferred, whereas for the two-directional, square-plate resonator the use of apertures is preferred.
(81) The detailed examples above use equidistant square holes. However, equidistant round holes can be used, or an irregular pattern of holes, and of any shape.
(82) It will be apparent from the description above that modeling enables a large number of solutions to be found to provide the desired compensation for geometric offset.
(83) The invention is of particular interest for the entry of MEMS resonators into the time-keeping and frequency reference market.
(84) Various other modifications will be apparent to those skilled in the art.