METHOD OF PRODUCTION OF HIGH-REFRACTIVE THIN GLASS SUBSTRATES
20170338428 · 2017-11-23
Assignee
Inventors
Cpc classification
C03C3/087
CHEMISTRY; METALLURGY
C03C3/078
CHEMISTRY; METALLURGY
Y02E10/549
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
International classification
C03C3/087
CHEMISTRY; METALLURGY
C03C3/078
CHEMISTRY; METALLURGY
Abstract
A redrawing method for the production of thin glasses is provided that allows redraw of high refractive index optical glasses. The includes the steps of providing a vitreous preform with a mean width B, a mean thickness D, and a refractive index n.sub.D of at least 1.68 in a redrawing device, heating at least a part of the preform, redrawing of the preform to a thin glass with a mean width b and a mean thickness d. The heated part of the preform exhibits, for the duration of at most 30 minutes, a temperature above a lower limit of devitrification of the glass. The glass of the preform exhibits a dependence of the viscosity on the temperature, which is characterized by a mean decrease of the viscosity with increasing temperature in an viscosity range of 10.sup.8 to 10.sup.5 dPas of at least 3*10.sup.5 dPas/K.
Claims
1. A method for the production of a high-refractive thin glass, comprising the steps: providing a vitreous preform with an average width (B), an average thickness (D), and a refractive index of at least 1.68 in a redrawing device, heating at least a part of the preform, redrawing the preform to a thin glass with an average width (b) and an average thickness (d), the heated part of the preform exhibits for, a duration of at most 30 minutes, a temperature above a lower limit of devitrification of the glass, and wherein the preform comprises glass that exhibits a dependence of a viscosity on the temperature, the dependence having a mean decrease of viscosity with increasing temperature in an viscosity range of 10.sup.8 to 10.sup.5 dPas of at least 3*10.sup.5 dPas/K, and wherein the heating comprises heating to a temperature (T.sub.2) at which the glass of the preform exhibits a viscosity of at least 10.sup.4 dPas and at most 10.sup.8 dPas.
2. The method of claim 1, wherein the dependence is a mean decrease of the viscosity in a viscosity range of 10.sup.8 to 10.sup.5 dPas of at least 5*10.sup.5 dPas/K.
3. The method of claim 1, wherein the duration is at least 3 seconds.
4. The method of claim 1, wherein the duration is at least 30 seconds.
5. The method of claim 1, wherein the duration is at most 15 minutes.
6. The method of claim 1, wherein the duration is at most 6 minutes.
7. The method of claim 1, further comprising cooling the glass of the preform from a temperature that corresponds to a viscosity of 10.sup.12 dPas to a temperature that corresponds to a viscosity of 10.sup.13 dPas at a mean cooling rate of at most 1000 K/min.
8. The method of claim 7, wherein the mean cooling rate is at most to 500 K/min.
9. The method of claim 1, wherein the glass of the preform, before the heating step, is preheated at least partially, to a temperature (T.sub.1) where the glass exhibits a viscosity of 10.sup.10 to 10.sup.14 dPas.
10. The method of claim 9, wherein, during the preheating, the temperature is higher in border areas of the preform than in a middle of the preform.
11. A thin glass comprising a refractive index of at least 1.68, an average thickness (d) of less than 2 mm, and a liquidus viscosity of less than 10.sup.3 dPas.
12. The thin glass of claim 11, wherein the liquidus viscosity is less than 10.sup.2.5 dPas.
13. The thin glass of claim 11, further comprising at least one fire-polished surfaces having a roughness R.sub.a of at most 20 nm.
14. The thin glass of claim 11, wherein the refractive index is at least 0.001 smaller than a theoretical refractive index.
15. The thin glass of claim 11, further comprising a density of more than 2.6 g/cm.sup.3.
16. The thin glass of claim 15, wherein the density is more than 2.85 g/cm.sup.3.
17. The thin glass of claim 11, further comprising a mean coefficient of linear thermal expansion α.sub.+20/+300° C. of more than 7*10.sup.−6 K.sup.−1.
18. The thin glass of claim 17, wherein the mean coefficient of linear thermal expansion α.sub.+20/+300° C. is more than 8.2*10.sup.−6 K.sup.−1.
19. The thin glass of claim 11, further comprising a warp of less than 1500 μm.
20. The thin glass of claim 19, wherein the warp is less than 300 μm.
21. The thin glass of claim 11, wherein the thin glass is configured for a use selected from the group consisting of an OLED display glass, a LCD 2D display glass, a LCD 3D display glass, a lighting device, an OLED, a wafer-level-optic device, and a filter glass.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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DETAILED DESCRIPTION
[0088] In the following detailed description of preferred embodiments for clarity reasons same reference signs denote essentially same parts in or on these embodiments.
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[0090] Before the preform 1 is led in the deformation region 4, it is pre-heated to the temperature T.sub.1 by means of a pre-heating facility 8, symbolized here by a burner flame. After passing the deformation region 4 the preform 1 is led in a cooling facility 9, which is symbolized here by an ice crystal.
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LIST OF THE REFERENCE SIGNS
[0098] 1 Preform [0099] 2 Heating facility [0100] 3 Blind [0101] 4 Deformation region [0102] 5 Deformation zone [0103] 6 Drawing facility [0104] 7 Feeding facility [0105] 8 Pre-heating facility [0106] 9 Cooling facility [0107] 10 Laser [0108] 11 Scanning mirror