Substrate structure and the process manufacturing the same

Abstract

A multi-layer substrate structure to achieve multiple arrangements of power/ground domains is disclosed. The multi-layer substrate structure comprises a first layer for disposing an integrated circuit thereon and a second layer coupled to the first layer, wherein a connection structure is electrically connected to a plurality of power/ground domains on the second layer. With different combinations of the sawing lines and keep-out regions on the multi-layer substrate structure for cutting off some portions of the connection structure, the invention can achieve multiple arrangements of power/ground domains without impacting the customer's PCB or system board design so as to cut short the cycle time for engineering development phase.

Claims

1. A multi-layer substrate structure with at least two layers comprising a first layer for disposing an integrated circuit thereon and a second layer coupled to the first layer, said multi-layer substrate structure comprising: a plurality of conductive regions on the second layer, wherein each two adjacent conductive regions are separated by an isolation border, wherein the plurality of conductive regions are electrically connected to the integrated circuit; a first keep-out region, enclosing the plurality of conductive regions, wherein the first keep-out region comprises at least one connecting portion, wherein the first keep-out region is filled with an insulating material to separate each of said at least one connecting portion; a connection structure, enclosing the first keep-out region along at least one side of the substrate structure, wherein the connecting structure connects to each of the plurality of conductive region via a corresponding portion of said at least one connecting portion disposed in said first keep-out region, and a sawing line, configured between the connecting structure and the first keep-out region; wherein the connection structure is electrically connected with at least two conductive regions of the plurality of conductive regions and is in contact with at least one isolation border, each of the at least one isolation border being adjacent to at least one of the at least two conductive regions, wherein when the connection structure is not present, the at least two conductive regions of the plurality of conductive regions are not electrically connected to each other, wherein the at least two conductive regions of the plurality of conductive regions can be isolated by cutting the multi-layer substrate structure along the sawing line.

2. The multi-layer substrate structure of claim 1, wherein the connection structure is electrically connected with at least one conductive region of the plurality of conductive regions along one side of the substrate.

3. The multi-layer substrate structure of claim 1, wherein the connection structure is electrically connected with a first conductive region of the plurality of conductive regions along a first side of the substrate and a second conductive region of the plurality of conductive regions along a second side of the substrate.

4. The multi-layer substrate structure of claim 1, wherein the connection structure is electrically connected with at least two conductive regions of the plurality of conductive regions along one side of the substrate.

5. The multi-layer substrate structure of claim 1, wherein the isolation borders are formed with the insulating material.

6. The multi-layer substrate structure of claim 1, wherein each of the plurality of conductive regions belongs to a power or a ground domain that is electrically connected to the integrated circuit.

7. The multi-layer substrate structure of claim 1, wherein the connection structure is electrically connected with each of the plurality of conductive regions and is in contact with each isolation border.

8. The multi-layer substrate structure of claim 1, wherein the connection structure is disposed on the second layer.

9. The multi-layer substrate structure of claim 1, wherein the connection structure is disposed on the second layer and a third layer of said at least two layers.

10. The multi-layer substrate structure of claim 1, further comprising a second keep-out region enclosing the connection structure.

11. A method for forming a multi-layer substrate structure with at least two layers comprising a first layer for disposing an integrated circuit thereon and a second layer coupled to the first layer, said method comprising: forming a plurality of conductive regions on the second layer, wherein each two adjacent conductive regions are separated by an isolation border, wherein the plurality of conductive regions are electrically connected to the integrated circuit; forming a first keep-out region to enclose the plurality of conductive regions, wherein the first keep-out region comprises at least one connecting portion, wherein the first keep-out region is filled with an insulating material to separate each of said at least one connecting portion; forming a connection structure to enclose the first keep-out region along at least one side of the substrate structure, wherein the connecting structure connects to each of the plurality of conductive region via a corresponding portion of said at least one connecting portion disposed in said first keep-out region, wherein the connection structure is electrically connected with at least two conductive regions of the plurality of conductive regions and is in contact with at least one isolation border, each of the at least one isolation border being adjacent to at least one of the at least two conductive regions, wherein when the connection structure is not present, the at least two conductive regions of the plurality of conductive regions are not electrically connected to each other; forming a sawing line, configured between the connecting structure and the first keep-out region; and cutting off the connection structure from the substrate along the sawing line, wherein said cutting off the connection structure from the substrate along the sawing line isolates a first conductive region of the plurality of conductive regions along a first side of the substrate and a second conductive region of the plurality of conductive regions along a second side of the substrate.

12. The method of claim 11, further comprising forming a second keep-out region to enclose the connection structure.

13. A method for forming a multi-layer substrate structure with at least two layers comprising a first layer for disposing an integrated circuit thereon and a second layer coupled to the first layer, said method comprising: forming a plurality of conductive regions on the second layer, wherein each two adjacent conductive regions are separated by an isolation border, wherein the plurality of conductive regions are electrically connected to the integrated circuit; forming a first keep-out region to enclose the plurality of conductive regions, wherein the first keep-out region comprises at least one connecting portion, wherein the first keep-out region is filled with an insulating material to separate each of said at least one connecting portion; forming a connection structure to enclose the first keep-out region along at least one side of the substrate structure, wherein the connecting structure connects to each of the plurality of conductive region via a corresponding portion of said at least one connecting portion disposed in said first keep-out region, wherein the connection structure is electrically connected with at least two conductive regions of the plurality of conductive regions and is in contact with at least one isolation border, each of the at least one isolation border being adjacent to at least one of the at least two conductive regions, wherein when the connection structure is not present, the at least two conductive regions of the plurality of conductive regions are not electrically connected to each other; forming a sawing line, configured between the connecting structure and the first keep-out region; and cutting off the connection structure from the substrate along the sawing line, wherein said cutting off the connection structure from the substrate along the sawing line isolates at least two conductive regions of the plurality of conductive regions along one side of the substrate.

14. The method of claim 13, further comprising forming a second keep-out region to enclose the connection structure.

Description

BRIEF DESCRIPTION OF DRAWINGS

(1) The foregoing aspects and many of the accompanying advantages of this invention will become more readily appreciated as the same becomes better understood by reference to the following detailed description, when taken in conjunction with the accompanying drawings, wherein:

(2) FIG. 1 illustrates a conventional substrate structure;

(3) FIG. 2A illustrates a substrate structure in accordance with one embodiment of this invention;

(4) FIG. 2B illustrates a cross-section view of the substrate structure of FIG. 2A;

(5) FIG. 3 illustrates a flow chart in accordance with one embodiment of this invention;

(6) FIG. 4 illustrates a sawed substrate in accordance with one embodiment of this invention;

(7) FIGS. 5A and 5B illustrate an example in accordance with one embodiment of this invention; and

(8) FIG. 6 illustrates another substrate structure in accordance with one embodiment of this invention.

DETAILED DESCRIPTION OF EMBODIMENT

(9) The detailed explanation of the present invention is described as following. The described preferred embodiments are presented for purposes of illustrations and description, and they are not intended to limit the scope of the present invention.

(10) In this invention, a package structure is disclosed. Compared with conventional structures, the disclosed package structure provides more flexibility.

(11) In brief, please refer to FIG. 2A which illustrates an intermediate layer 210 of a substrate 20 according to one embodiment of this invention, in the layer 210, there is a plurality of conductive region 201, wherein each of the plurality of conductive regions 201 is formed with a conductive material such as certain metal. Between each adjacent conductive region 201 is an isolation border 202 separating said each adjacent conductive region 201, wherein the isolation border 202 is formed with an insulating material such as SiO.sub.2, SiN, Si.sub.3N.sub.4, and etc. A first keep-out region 203 encloses said plurality of conductive regions 201. A connecting structure 204 encloses said first keep-out region 203. Between the connecting structure 204 and the first keep-out region 203 is a sawing line 205 so that the substrate 20 is capable of being sawed along the sawing line 205. The connecting structure 204 connects to each of the plurality of conductive regions 201 via at least one connecting portion 206. That is, the connecting portion 206 is in the first keep-out region 203. The connecting structure 204 is enclosed by a second keep-out region 207. The first keep-out region 203 is filled with an insulating material besides the at least one connecting portion 206. The second keep-out region 207 is also filled with the insulating material.

(12) Please refer to FIG. 2B which illustrates a multi-layer view of the substrate 20. The substrate 20 comprises a first layer 210, a second layer 220, and a third layer 230. An IC chip 240 is mounted on the substrate 20. The plurality of conductive region 201, the isolation border 202, the connecting structure 204, and the connecting portion 206 are in the first layer 210. The third layer 230 comprises a plurality of networks 2301 which connects with ball pads 250 of the substrate 20. The second layer 220 is an insulating layer comprising a plurality of through hole via connects pads of the IC chip 240 and the plurality of conductive regions 201 with the plurality of networks in the third layer 230 so that the pads of the IC chip 240 and the plurality of conductive regions 201 is electrically coupled to the ball pads of the substrate. Although only a substrate with three layers is disclosed, a substrate with more layers is easily to be manufactured with the same concept. Also, a substrate with more than one ring connecting structure is easy to be manufactured and applied.

(13) In one embodiment, please refer to FIG. 3 which illustrates a flow chart in accordance with this invention, first, a substrate as shown in FIG. 2 is provided, as step 301. Second, an arrangement of power/ground domains is decided according to EMI, ESD, or any other concerns, as step 302. The substrate is sawed according to the arrangement of power/ground domains so that at least one conductive region is isolated from the other conductive regions, wherein the substrate is sawed along the sawing line 205, as step 303.

(14) In one embodiment, please refer to FIG. 4 which illustrates a sawed substrate in this invention, a substrate 40 comprises four conductive regions 401, 402, 403, 404, and a connecting structure 405. A portion of the connecting structure 405 is sawed so that the conductive region 401 is not connected with the other conductive regions. In other words, the substrate 40 is divided into two power/ground domains. A first power/ground domain comprises the conductive region 401. A second power/ground domain comprises the conductive regions 402, 403, and 404.

(15) In one embodiment, please refer to FIG. 5A which illustrates an example of in accordance with this invention, a package 50 comprises a substrate 501, an IC chip 502 mounted on the substrate 501, and a connecting structure 503. A first set of pins of the IC chip 502 has more concern in EMI and is located in a first conductive region 5011. A second set of pins of the IC chip 502 has more concern in ESD and is located in a second conductive region 5012. A third set of pins of the IC chip 502 has more concern in noise and is located in a third conductive region 5013. That is, the first set of pins of the IC chip 502 needs an isolated power/ground domain. That is, the first conductive region 5011 needs to be isolated from the second conductive region 5012 and the third conductive region 5013. A portion of the connecting structure 503 is sawed along a sawing line 504 so that the first conductive region 5011 is then electrically isolated from the second conductive region 5012 and the third conductive region 5013, as shown in FIG. 5B.

(16) In one embodiment, please refer to FIG. 6 which illustrates a substrate structure with a plurality of connecting structures, a substrate 60 comprises a first conductive region 601, a second conductive region 602, a third conductive region 603, a fourth conductive region 604, a first connecting structure 605, a second connecting structure 606, and a third connecting structure 607. An IC chip 61 is mounted on the substrate 60, wherein a first ground pin of the IC chip 61 connects to the first conductive region 601; a second ground pin of the IC chip 61 connects to the second conductive region 602; a third ground pin of the IC chip 61 connects to the third conductive region 603; and a fourth ground pin of the IC chip 61 connects to the fourth conductive region 604. When manufacturing, if the first and the second ground pins of the IC chip 61 are most likely to be connected together, the first connecting structure 605 can be used to connect the first conductive region 601 and the second conductive region 602. Likewise, if the third ground pin of the IC chip 61 has a higher possibility to connect to the first and the second ground pins than the fourth ground pin of the IC chip 61, the second connecting structure 606 connects the third conductive region 603 and the first connecting structure 605. Also, the third connecting structure 607 connects the fourth conductive region 604 and the second connecting structure 606. In other words, the fourth ground pin of the IC chip 61 is most likely to be isolated from the other ground pins of the IC chip 61.

(17) While verifying the functionality of the IC chip 61, if it's found that the fourth ground pin of the IC chip 61 needs to be isolated from the other ground pins of the IC chip 61, the third connecting structure 607 is removed by sawing the substrate 60 along a first sawing line 610. If then it's found that the third ground pin of the IC chip 61 still has to be isolated from the first and the second ground pins of the IC chip 61, the second connecting structure 606 is then removed by sawing the substrate 60 along a second sawing line 620. With such structure and such method, the substrate 60 is capable of forming different arrangement of the ground pins of the IC chip 61.

(18) In one embodiment, the connecting structure and the plurality of conductive region are in the same layer on the substrate. In another embodiment, the connecting structure and the plurality of conductive region can be in different layer on the substrate.

(19) According to this invention, a new structure of a substrate of a package is provided. The new structure is capable of being sawed along a sawing line so that the substrate is capable of being divided into a plurality of arrangement of power/ground domains. That is, a plurality of different substrate structure is capable of being derived from the new structure in this invention.

(20) The foregoing descriptions of specific embodiments of the present invention have been presented for purposes of illustrations and description. They are not intended to be exclusive or to limit the invention to the precise forms disclosed, and obviously many modifications and variations are possible in light of the above teaching. The embodiments were chosen and described in order to best explain the principles of the invention and its practical application, to thereby enable others skilled in the art to best utilize the invention and various embodiments with various modifications as are suited to particular use contemplated. It is intended that the scope of the invention be defined by the claims appended hereto and their equivalents.